CN115433902A - Golden composite coating prepared by physical vapor deposition method and preparation process thereof - Google Patents
Golden composite coating prepared by physical vapor deposition method and preparation process thereof Download PDFInfo
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- CN115433902A CN115433902A CN202210893687.0A CN202210893687A CN115433902A CN 115433902 A CN115433902 A CN 115433902A CN 202210893687 A CN202210893687 A CN 202210893687A CN 115433902 A CN115433902 A CN 115433902A
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- 239000002131 composite material Substances 0.000 title claims abstract description 27
- 238000000576 coating method Methods 0.000 title claims abstract description 25
- 239000011248 coating agent Substances 0.000 title claims abstract description 24
- 238000000034 method Methods 0.000 title claims abstract description 15
- 238000005240 physical vapour deposition Methods 0.000 title claims abstract description 14
- 238000002360 preparation method Methods 0.000 title abstract description 11
- 239000010410 layer Substances 0.000 claims abstract description 110
- 239000011241 protective layer Substances 0.000 claims abstract description 16
- 238000004519 manufacturing process Methods 0.000 claims abstract description 14
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 30
- 238000000151 deposition Methods 0.000 claims description 24
- 229910052751 metal Inorganic materials 0.000 claims description 20
- 239000002184 metal Substances 0.000 claims description 20
- 229910052786 argon Inorganic materials 0.000 claims description 15
- 229910052719 titanium Inorganic materials 0.000 claims description 14
- 239000007789 gas Substances 0.000 claims description 13
- 230000008021 deposition Effects 0.000 claims description 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 7
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 7
- 239000000758 substrate Substances 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 6
- 239000002356 single layer Substances 0.000 claims description 6
- 229910001873 dinitrogen Inorganic materials 0.000 claims description 5
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims description 3
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 claims description 3
- 229910001882 dioxygen Inorganic materials 0.000 claims description 3
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 claims description 3
- 238000005086 pumping Methods 0.000 claims description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 2
- 239000010931 gold Substances 0.000 claims description 2
- 229910052737 gold Inorganic materials 0.000 claims description 2
- 229910052757 nitrogen Inorganic materials 0.000 claims 1
- 238000005260 corrosion Methods 0.000 abstract description 7
- 230000007797 corrosion Effects 0.000 abstract description 7
- 239000002253 acid Substances 0.000 abstract description 3
- 239000003513 alkali Substances 0.000 abstract description 3
- 230000001681 protective effect Effects 0.000 abstract description 3
- 238000002845 discoloration Methods 0.000 abstract 1
- 239000010936 titanium Substances 0.000 description 29
- 238000005299 abrasion Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- -1 titanium ions Chemical class 0.000 description 2
- 230000003796 beauty Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0664—Carbonitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a golden composite coating prepared by a physical vapor deposition method and a preparation process thereof. The buffer layer prepared by the invention enhances the bonding strength in the composite coating, the wear-resistant layer improves the bonding force and the wear resistance of the film layer, the color layer has strong acid resistance and alkali resistance, and the protective layer has a protective film layer with high compactness, thereby effectively preventing discoloration and corrosion; the preparation process realizes the voltage-on color-change-resistant golden film layer of the MIM component, prevents the color change condition after voltage is applied, prolongs the service life of the product, and has the advantages of novel design, simple structure, high hardness and high corrosion resistance, simple production process and low production cost.
Description
Technical Field
The invention relates to the technical field of electronic product coatings, in particular to a golden composite coating prepared by a physical vapor deposition method and a preparation process thereof.
Background
At present, electronic products on the market are developed rapidly, consumers have high requirements on the products, such as high-end fashion, high wear resistance, high corrosion resistance and high voltage and color change resistance, and particularly, instruments such as a beauty instrument, a massage instrument and the like are electrified on the products after PVD. The traditional golden PVD manufacturing process has the defects of low hardness, poor corrosion resistance, easy color change when electrified and the like, for example, a golden film layer on the surface of an MIM component is discolored after the direct-current voltage is applied for 20V for 1 hour, so that the use attractiveness and the service life of the product are influenced.
Disclosure of Invention
The invention aims to provide a golden composite coating prepared by a physical vapor deposition method and a preparation process thereof, aiming at the defects of the prior art, the golden composite coating is novel in design, simple in structure, high in hardness and high in corrosion resistance, the preparation process realizes a voltage-on color-changing-resistant golden film layer of an MIM (metal-insulator-metal) component, prevents the color-changing condition after voltage is applied, prolongs the service life of a product, and is simple in production process and low in production cost.
In order to achieve the above object, the present invention is achieved by the following technical solutions.
The utility model provides a physics vapour deposition method preparation golden composite coating, includes the substrate, and the surface of substrate has bottom, buffer layer, wearing layer, colour layer and protective layer from inside to outside deposit in proper order, and wherein the bottom is the Ti metal level, and the buffer layer is the layer that mixes Ti and Si, and the wearing layer is the composite bed that TiN and SiN formed, and the colour layer is the TiCN layer, and the protective layer is TiO.
The invention also provides a process for preparing the golden composite coating by a physical vapor deposition method, which comprises the following process steps:
step one, preparing the bottom layer, namely putting the product and Ti metal into a vacuum furnace, starting heating when the vacuum pumping reaches 0.1Pa, adding 100-180 SCCM of argon into the vacuum furnace, the pressure is 0.15-0.20 Pa, a bias power supply is-250 to-300V, and a Ti arc target is 60-70A, and depositing the Ti metal layer on the surface of the product for 3-5 minutes;
step two, preparing the buffer layer, introducing argon 220SCCM into a vacuum furnace, wherein the pressure is 0.35Pa, the bias voltage is-100 to-150V, and the Ti column target power supply is 20-25A; si column target power supply 10-20A; depositing Ti and Si mixed deposition on the surface of the Ti metal layer to prepare the buffer layer;
step three, preparing the wear-resistant layer, introducing argon gas of 200-250 sccm and nitrogen gas of 100-130 sccm into a vacuum furnace, introducing the pressure of 0.4-0.6 Pa, a Ti and Si target power supply, the current of 15-25A, the bias voltage of-80 to-120V and the time of 30-50 minutes, and depositing TiN single layers and SiN single layers on the upper end of the buffer layer alternately to form the wear-resistant layer;
step four, preparing the color layer, wherein argon gas is introduced into a vacuum furnace at 200-250 sccm, nitrogen gas at 150-220 sccm and acetylene at 50-120 sccm, the pressure is 0.4-0.6 Pa, the Ti current is 15-25A, the bias voltage is-80 to-120V, and the time is 20-35 minutes, so that the color layer is deposited and formed at the upper end of the wear-resistant layer;
and step five, preparing the protective layer, namely introducing 50-200 sccm argon gas, 200-400 sccm oxygen gas, 1.2-0.3 Pa pressure, 3-6A Ti current and-200-500V bias pressure into the vacuum furnace for 5-30 minutes, so as to deposit and form the protective layer on the upper end of the color layer.
And B, preparing the bottom layer in the step I, namely putting the product and the Ti metal into a vacuum furnace, starting heating when the vacuum degree is up to 0.1Pa, and keeping the temperature at 180 ℃ for 35 minutes.
And preparing the buffer layer in the step two, namely depositing a Ti and Si mixed deposition layer on the surface of the metal layer, wherein the deposition time is 5-15 minutes.
The invention has the beneficial effects that: the invention relates to a golden composite coating prepared by a physical vapor deposition method and a preparation process thereof. The wear-resistant layer prepared by the invention improves the toughness and hardness of the composite coating, the buffer layer enhances the bonding strength inside the composite coating, the wear-resistant layers TiN and SiN enable the stress between the buffer layer and the wear-resistant layer to be transmitted in a wave form, the influence of external pressure on the composite coating is weakened, the bonding force and the wear resistance of the film layer are improved, the color layer adopts a TiCN film layer which has strong acid resistance and alkali resistance, and simultaneously meets the requirement of fashionable appearance, and the protective layer has a protective film layer with high compactness and can effectively prevent external mesons from entering and reacting with titanium ions in the film layer to generate oxides to discolor and corrode; the preparation process realizes the voltage-on color-changing-resistant golden film layer of the MIM component, prevents the color changing condition after voltage is on, prolongs the service life of the product, and has the advantages of novel design, simple structure, high hardness and high corrosion resistance, simple production process and low production cost.
Drawings
The invention will be further described with reference to the drawings to which, however, the embodiments shown in the drawings do not constitute any limitation.
FIG. 1 is a schematic view of the present invention.
In fig. 1, included are:
1-substrate 2-bottom layer
3-buffer layer 4-wear layer
5-color layer 6-protective layer.
Detailed Description
The present invention will be described below with reference to specific embodiments.
As shown in fig. 1, a gold composite coating prepared by a physical vapor deposition method comprises a substrate 1, wherein a bottom layer 2, a buffer layer 3, an abrasion-resistant layer 4, a color layer 5 and a protective layer 6 are sequentially deposited on the surface of the substrate 1 from inside to outside, the bottom layer 2 is a Ti metal layer, the buffer layer 3 is a Ti and Si mixed layer, the abrasion-resistant layer 4 is a composite layer formed by TiN and SiN, the color layer 5 is a TiCN layer, and the protective layer 6 is TiO.
A process for preparing a golden composite coating by a physical vapor deposition method comprises the following process steps:
step one, preparing the bottom layer 2, putting the product and Ti metal into a vacuum furnace, starting heating when the vacuum pumping reaches 0.1Pa, adding 100-180 SCCM of argon gas into the vacuum furnace, the pressure is 0.15-0.20 Pa, a bias power supply is-250 to-300V, a Ti arc target is 60-70A, and depositing the Ti metal layer on the surface of the product for 3-5 minutes;
step two, preparing the buffer layer 3, introducing argon gas 220SCCM into a vacuum furnace, wherein the pressure is 0.35Pa, the bias voltage is-100 to-150V, and the Ti column target power supply is 20-25A; si column target power supply 10-20A; depositing Ti and Si mixed deposition on the surface of the Ti metal layer to prepare the buffer layer 3;
step three, preparing the wear-resistant layer 4, introducing argon gas of 200-250 sccm and nitrogen gas of 100-130 sccm into a vacuum furnace, controlling the pressure of 0.4-0.6 Pa, a Ti and Si target power supply, the current of 15-25A, the bias voltage of-80-120V and the time of 30-50 minutes, and depositing TiN single layers and SiN single layers on the upper end of the buffer layer 3 alternately to form the wear-resistant layer 4;
step four, preparing the color layer 5, introducing argon gas into a vacuum furnace for 200-250 sccm, introducing nitrogen gas for 150-220 sccm and acetylene for 50-120 sccm, controlling the pressure to be 0.4-0.6 Pa, controlling the Ti current to be 15-25A, and controlling the bias voltage to be-80-120V for 20-35 minutes, thereby depositing the color layer 5 at the upper end of the wear-resistant layer 4;
and step five, preparing the protective layer 6, introducing 50-200 sccm argon gas, 200-400 sccm oxygen gas, 1.2-0.3 Pa pressure, 3-6A Ti current and-200-500V bias pressure into the vacuum furnace for 5-30 minutes, and depositing the protective layer 6 on the upper end of the color layer 5.
Preferably, in the first step, the bottom layer 2 is prepared by placing the product and Ti metal into a vacuum furnace, heating the product and Ti metal when the vacuum degree reaches 0.1Pa, wherein the temperature is 180 ℃, and keeping the temperature for 35 minutes.
Further, the buffer layer 3 in the second step is prepared, and a mixed deposition layer of Ti and Si is deposited on the surface of the metal layer, wherein the deposition time is 5-15 minutes.
The wear-resistant layer 4 prepared by the invention improves the toughness and hardness of the composite coating, the buffer layer 3 strengthens the bonding strength in the composite coating, the wear-resistant layer 4TiN and SiN enable stress between the buffer layer and the wear-resistant layer 4 to be transmitted in a wave form, the influence of external pressure on the composite coating is weakened, the binding force and the wear resistance of the film layer are improved, the color layer 5 adopts a TiCN film layer which has strong acid resistance and alkali resistance and simultaneously meets the requirement of fashionable appearance, and the protective layer 6 has a high-compactness protective film layer which effectively prevents external mesons from entering and reacting with titanium ions in the film layer to generate oxides to change color and corrode; the preparation process realizes the voltage-on color-changing-resistant golden film layer of the MIM component, prevents the color changing condition after voltage is on, prolongs the service life of the product, and has the advantages of novel design, simple structure, high hardness and high corrosion resistance, simple production process and low production cost.
The above description is only a preferred embodiment of the present invention, and for those skilled in the art, the present invention should not be limited by the description of the present invention, which should be interpreted as a limitation.
Claims (4)
1. A gold composite coating prepared by a physical vapor deposition method is characterized in that: including substrate (1), the surface of substrate (1) is by inside to outside deposit in proper order has bottom (2), buffer layer (3), wearing layer (4), colour layer (5) and protective layer (6), and wherein bottom (2) is the Ti metal level, and buffer layer (3) are the mixed layer of Ti and Si, and wearing layer (4) are the composite bed that TiN and SiN formed, and colour layer (5) are the TiCN layer, and protective layer (6) are TiO.
2. The process for preparing the golden composite coating by the physical vapor deposition method according to claim 1, which is characterized by comprising the following process steps:
step one, preparing the bottom layer (2), putting the product and Ti metal into a vacuum furnace, starting heating when the vacuum pumping reaches 0.1Pa, adding 100-180 SCCM of argon gas into the vacuum furnace, the pressure is 0.15-0.20 Pa, a bias power supply is-250 to-300V, and a Ti arc target is 60-70A, and depositing the Ti metal layer on the surface of the product for 3-5 minutes;
step two, preparing the buffer layer (3), introducing argon gas 220SCCM into a vacuum furnace, wherein the pressure is 0.35Pa, the bias voltage is-100 to-150V, and the Ti column target power supply is 20-25A; si column target power supply 10-20A; depositing Ti and Si mixed deposition on the surface of the Ti metal layer so as to prepare the buffer layer (3);
step three, preparing the wear-resistant layer (4), introducing argon gas of 200-250 sccm and nitrogen gas of 100-130 sccm into a vacuum furnace, introducing the pressure of 0.4-0.6 Pa, a Ti and Si target power supply, the current of 15-25A, the bias voltage of-80-120V and the time of 30-50 minutes, and depositing TiN single layers and SiN single layers on the upper end of the buffer layer (3) alternately to form the wear-resistant layer (4);
step four, preparing the color layer (5), introducing argon gas into a vacuum furnace for 200-250 sccm, nitrogen for 150-220 sccm and acetylene for 50-120 sccm, controlling the pressure to be 0.4-0.6 Pa, controlling the Ti current to be 15-25A, and controlling the bias voltage to be-80-120V for 20-35 minutes, thereby depositing the color layer (5) at the upper end of the wear-resistant layer (4);
and step five, preparing the protective layer (6), introducing 50-200 sccm argon gas, 200-400 sccm oxygen gas, 1.2-0.3 Pa pressure, 3-6A Ti current and-200-500V bias pressure into the vacuum furnace, and depositing for 5-30 minutes to form the protective layer (6) on the upper end of the color layer (5).
3. The process for preparing gold-colored composite coating according to claim 2, wherein the gold-colored composite coating is prepared by physical vapor deposition, and the gold-colored composite coating comprises the following steps: and (3) preparing the bottom layer (2) in the step one, putting the product and Ti metal into a vacuum furnace, starting heating when the vacuum is pumped to 0.1Pa, and keeping the temperature at 180 ℃ for 35 minutes.
4. The process for preparing a gold-colored composite coating according to claim 2, wherein the process comprises the following steps: and (3) preparing the buffer layer in the second step, and depositing a Ti and Si mixed deposition layer on the surface of the metal layer for 5-15 minutes.
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2022
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| KR20140050915A (en) * | 2012-10-22 | 2014-04-30 | (주)오티앤티 | Forming method of gold color coating layer using pvd and prosthesis |
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Address after: 516000 Floor 1-9, Unit 1, Building 1, Zone D, Qunyi Intelligent Manufacturing Industrial Park, South of Sanhe Avenue, Tonghu Town, Zhongkai High-tech Zone, Huizhou City, Guangdong Province Applicant after: Guangdong Jingyan Technology Development Co.,Ltd. Address before: 523000 F, Chang Shi Science and Technology Park, 56 Li Fa Xing FA Road, Wu Sha community, Changan Town, Dongguan, Guangdong Applicant before: GIAN (DONGGUAN) TECHNOLOGY DEVELOPMENT Co.,Ltd. |
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