CN115421356A - Improved exposure system for preparing Micro-LED chip - Google Patents
Improved exposure system for preparing Micro-LED chip Download PDFInfo
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- CN115421356A CN115421356A CN202211031716.9A CN202211031716A CN115421356A CN 115421356 A CN115421356 A CN 115421356A CN 202211031716 A CN202211031716 A CN 202211031716A CN 115421356 A CN115421356 A CN 115421356A
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- 239000000463 material Substances 0.000 claims abstract description 57
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- 238000002360 preparation method Methods 0.000 claims description 11
- 238000009434 installation Methods 0.000 claims description 10
- 238000001035 drying Methods 0.000 claims description 9
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- 238000010521 absorption reaction Methods 0.000 claims description 4
- 238000001914 filtration Methods 0.000 claims description 4
- 239000011261 inert gas Substances 0.000 claims description 3
- 239000007769 metal material Substances 0.000 claims description 3
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/005—Processes
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
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- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention relates to the field of chip manufacturing devices, and discloses an improved exposure system for preparing a Micro-LED chip, which comprises a black box, wherein a processing cavity, an exposure cavity, a reinforcing cavity, a material receiving cavity and a raw material cavity are arranged in the black box; the pretreatment device is positioned in the treatment cavity and used for pretreatment; an exposure device which is positioned in the exposure cavity and performs exposure; the material receiving roller is positioned in the material receiving cavity; the substrate sequentially penetrates through the processing cavity, the exposure cavity, the reinforcing cavity and the material receiving cavity and then is connected with the material receiving roller; the power box is fixedly connected to one side of the camera bellows, the interior of the power box is connected with the kinetic energy mechanism, and the exposure device and the material receiving roller are both connected with the kinetic energy mechanism.
Description
Technical Field
The invention relates to the field of Micro-LED chip manufacturing devices, in particular to an improved exposure system for preparing a Micro-LED chip.
Background
The Micro-LED display technology is a display technology which takes self-luminous micrometer-scale LEDs as light-emitting pixel units and assembles the light-emitting pixel units on a driving panel to form a high-density LED array. Because of the characteristics of small size, high integration level, self-luminescence and the like of micro-LED chips, the micro-LED chips are generally arranged on smaller chips so as to enable LEDs in unit area to be enough to meet the necessary work requirement, but compared with mainstream computer chips, the process of the micro-LED chips does not need to reach the nanometer level, so that the requirement is relatively low during photoetching, pure water is required to be utilized during photoetching so as to dissolve partial components to achieve the erosion effect, but the existing machine generally adopts a volume pool to put sufficient water and then carries out the erosion effect for multiple times, but in the process, the pure water is impure due to multiple times of erosion, the follow-up production is influenced, meanwhile, the disposable quantity is large, the pure water is wasted, and the production cost is increased.
Disclosure of Invention
In order to solve the technical problem of certain waste of cost, the invention provides an improved exposure system for preparing a Micro-LED chip.
The invention is realized by adopting the following technical scheme: an exposure system for preparing an improved Micro-LED chip.
The inner part of the camera bellows is provided with a processing cavity, an exposure cavity, a reinforcing cavity, a material receiving cavity and a raw material cavity;
the pretreatment device is positioned in the treatment cavity and used for pretreatment;
an exposure device which is positioned in the exposure cavity and performs exposure;
the material receiving roller is positioned in the material receiving cavity;
the base plate, it runs through in proper order behind process chamber, the exposure chamber, the reinforcement chamber and the receipts material chamber and is connected with receiving the material roller, and the base plate adopts flexible circuit board, cooperates the use in later stage.
The power box is fixedly connected to one side of the dark box, a kinetic energy mechanism is connected inside the power box, and the exposure device and the material receiving roller are connected with the kinetic energy mechanism.
As a further improvement of the above aspect, the pretreatment apparatus includes:
the replacing roller is rotatably connected to one side of the dark box, and the substrate is wound on the outer side of the replacing roller in the early stage;
the protection box, its slope is fixed in one side of camera bellows, and its inside is provided with a plurality of processing unit, and the protection box internal rotation is connected with a plurality of roller, prescribes a limit to the base plate, shelters from light simultaneously, forms the camera bellows.
The feeding roller is rotatably connected with the wall of the processing cavity, and one side of the feeding roller is provided with a heating and drying roller;
the material blowing mechanism is fixedly connected in the treatment cavity, and the material sucking mechanism is fixedly connected to the bottom of the treatment cavity.
As the further improvement of above-mentioned scheme, the one end of material loading roller runs through in the camera bellows reachs the headstock, be provided with the head tank that is connected with the material loading roller in the headstock, level and smooth a plurality of knife coating of blowing bottom fixedly connected with of material mechanism, level and smooth one side of blowing material mechanism and inhaling material mechanism all is connected with the aspirator pump that is located the headstock, the output of aspirator pump is connected with filtering mechanism, is provided with the pump in the head tank, gives the support of material loading roller with the raw materials, is equipped with specific protectant in the head tank simultaneously, protects, and the both sides of knife coating all are provided with the suction hole that is located level and smooth on inhaling the material mechanism, guarantees inspiratory effect, and the aspirator pump is current structure, realizes gaseous flow.
As a further improvement of the above aspect, the exposure apparatus includes:
the two sliding frames are symmetrically arranged, a plurality of sliding grooves are formed in the camera bellows, one side of each sliding frame is in sliding sleeve connection with the corresponding sliding groove, and one end of each sliding frame is connected with the kinetic energy mechanism;
the pressure sensor is provided with a plurality of pressure sensors, the pressure sensors are fixedly connected to the bottom of the sliding frame above the sliding frame, a first buffer ring is fixedly connected to the lower side of each pressure sensor, the pressure sensors are existing devices, meanwhile, a PLC (programmable logic controller) is installed in the power box, signal processing and signal output are achieved, and personnel can conveniently control the inside of the power box.
The moving box is fixedly connected with the sliding frame at the bottom and is in sliding contact with the dark box;
the actuator is fixedly connected to the movable box, and the top end of the actuator is connected with a second buffer ring;
as a further improvement of the above aspect, the actuator includes:
a plurality of irradiation lamps which are fixedly connected in the movable box, and light transmission plates fixedly connected with the movable box are arranged above the irradiation lamps;
the light guide cylinder is fixedly connected with the movable box, the installation cylinder is sleeved with the top thread of the light guide cylinder, the execution cylinder is sleeved with the top thread of the installation cylinder, a plurality of lenses are fixedly connected in the light guide cylinder and the execution cylinder, the exposure plate is fixedly connected in the installation cylinder, and the light guide cylinder, the installation cylinder and the execution cylinder are limited relatively through pins, so that accurate alignment of each position is guaranteed, and the stability of the whole body is guaranteed.
The execution sleeve is sleeved on the outer side of the execution cylinder, and the top end of the execution sleeve is fixedly connected with the second buffer ring;
the sliding ring is sleeved in the execution sleeve in a sliding mode, the bottom end of the sliding ring is fixedly connected with an adjusting ring fixedly connected with the execution cylinder, and one side of the adjusting ring is fixedly connected with a second spring fixedly connected with the execution sleeve;
and the adjusting ring at one end of the drainage pipe is fixedly connected, one side of the drainage pipe is provided with an absorption pipe fixedly connected with the adjusting ring, and the other end of the absorption pipe is fixedly connected with a connecting pipe connected with the raw material cavity.
As a further improvement of the scheme, one side of the dark box is provided with a stabilizing box, one side of the stabilizing box is connected with a plurality of heaters, one side of each heater is provided with a plurality of steering rollers, and the steering rollers are arranged in parallel to form an arc-shaped structure.
As a further improvement of the above scheme, the first buffer ring and the second buffer ring each include a folding ring, inert gas is filled in the folding ring, a contact ring is fixedly connected to one side of the folding ring, and a plurality of sealing grooves are formed in one side of the contact ring.
As a further improvement of the above aspect, the kinetic energy mechanism includes:
the motor is fixedly connected in the power box, and the output end of the motor is connected with a first gear lack;
the first transmission wheel is rotationally connected with the power box, is in transmission connection with the first gear lacking wheel, is meshed with a first gearbox at the lower side of the first transmission wheel, and is in transmission connection with a first driving wheel below the first gearbox;
the intermediate shaft is fixedly sleeved with the first driving wheel, and a second gear and a friction wheel are fixedly sleeved on the intermediate shaft;
the transmission wheel is in transmission connection with the second gear lacking, a lower driven shaft is fixedly sleeved in the middle of the transmission wheel, and an extrusion wheel matched with the friction wheel is fixedly sleeved on the outer wall of the lower driven shaft;
the rotating wheel is fixedly connected to one end of a driven shaft, and the driven shaft is rotationally connected with the power box;
one end of the crank is rotationally connected with the rotating wheel, and the other end of the crank is rotationally connected with a sliding mechanism;
the second transmission wheel is rotationally connected with the power box, is in transmission connection with the first gear lacking wheel, is engaged and connected with a second gearbox on the upper side of the second transmission wheel, and is in transmission connection with a second driving wheel above the second gearbox;
the sheave mechanism is in transmission connection with the second driving wheel, one side of the sheave mechanism is connected with a material receiving shaft connected with the material receiving roller, and the sheave mechanism is of an existing basic structure and can realize that the whole circular motion drives another object to periodically rotate.
The sliding mechanism comprises first rod pieces which are symmetrically arranged, one of the first rod pieces is rotationally connected with the crank, one end of the other first rod piece is fixedly connected with a second spring which is fixedly connected with the power box, one ends of the two first rod pieces are rotationally connected with a second rod piece, and the other end of the second rod piece is rotationally connected with the exposure device;
the outer wall of the friction wheel is fixedly connected with a plurality of extrusion pieces of arc structures, the extrusion pieces are made of metal materials, and the outer wall of each extrusion piece is fixedly sleeved with a friction plate.
As a further improvement of the scheme, the bottom of the camera bellows is connected with a leakage pipe, the other end of the leakage pipe is connected with a collecting box located below the camera bellows, one side of the raw material cavity is connected with a feeding pipe, the receiving cavity is connected with a detector, the detector is an existing device, the base plate is detected, and the processing requirement can be conveniently determined.
As a further improvement of the scheme, the reinforcing cavity is internally connected with a spraying plate, one side of the spraying plate is connected with a powder feeder positioned on the outer side, the two sides of the reinforcing cavity are fixedly connected with third springs, the other ends of the third springs are fixedly connected with sliding blocks, and two adjusting rollers which are in contact with the substrate are rotatably connected between the sliding blocks.
Compared with the prior art, the invention has the beneficial effects that:
1. through regional periodic water consumption for holistic water environment is comparatively stable, guarantees the quality of exposure, and minimum regional water supply simultaneously can reduce holistic water consumption, and then reduces holistic manufacturing cost, and holistic production reduces in-process such as transport simultaneously, and the dust or other harm of production reduce the breakage rate, further reduce holistic cost.
2. Through whole work, the work of can be disposable completion exposure drying and accomodating reduces the process, makes things convenient for going on of work, increases work efficiency, guarantees the output.
Drawings
FIG. 1 is a schematic front cross-sectional view of the present invention;
FIG. 2 is a schematic left side cross-sectional view of the present invention;
FIG. 3 is a rear cross-sectional view of the present invention;
FIG. 4 is an enlarged schematic view of the structure at A;
FIG. 5 is an enlarged view of the structure at B;
FIG. 6 is a front cross-sectional view of the actuator;
FIG. 7 is a schematic view of a buffer ring structure;
fig. 8 is a front cross-sectional view of the buffer ring.
Description of the main symbols:
1. a dark box; 2. a feedstock chamber; 3. a feed pipe; 4. a material receiving roller; 5. a material receiving cavity; 6. a treatment chamber; 7. a protective box; 8. replacing the roller; 9. a feeding roller; 10. heating and drying the roller; 11. a material sucking mechanism; 12. a leveling and blowing mechanism; 13. an actuator; 14. a carriage; 15. a chute; 16. a turning roll; 17. a mobile box; 18. a collection box; 19. a leak pipe; 21. a stabilization box; 22. A heater; 23. an exposure chamber; 24. a substrate; 25. a third spring; 26. a regulating roller; 27. Reinforcing the cavity; 28. a jet plate; 29. a detector; 30. a motor; 31. a connecting pipe; 32. a second bar member; 33. a rotating wheel; 34. a first drive wheel; 35. a transfer wheel; 37. an extrusion wheel; 38. A lower driven shaft; 39. an intermediate shaft; 40. a friction wheel; 41. a first gearbox; 42. a second missing gear; 43. a first drive pulley; 44. a first missing gear; 45. a second transmission wheel; 46. a second gearbox; 47. a second driving wheel; 48. a sheave mechanism; 49. a material receiving shaft; 50. a power box; 52. a second spring; 53. a first bar member; 54. a crank; 55. a pressure sensor; 56. A sliding ring; 57. a second spring; 58. an extraction tube; 59. an execution cylinder; 61. a lens; 62. A bleeder tube; 63. an adjusting ring; 64. an execution sleeve; 65. a second buffer ring; 66. a first buffer ring; 67. a folding ring; 68. a contact ring; 69. mounting the cylinder; 71. illuminating a lamp; 72. a light-transmitting plate; 73. a light guide tube; 74. and (5) exposing the plate.
Detailed Description
The present invention is further described with reference to the accompanying drawings and the detailed description, and it should be noted that, in the case of no conflict, any combination between the embodiments or technical features described below may form a new embodiment.
Example 1:
referring to fig. 1-8, the inside of the camera bellows 1 is provided with a processing chamber 6, an exposure chamber 23, a reinforcement chamber 27, a material receiving chamber 5 and a raw material chamber 2, the processing chamber 6 is used for exhausting air, the exposure device in the exposure chamber 23 is used for exposing air, the air is transferred to the reinforcement chamber 27 for protection, the material receiving chamber 5 is used for receiving pure water, and the raw material chamber 2 is used for storing pure water.
The pretreatment device is positioned in the treatment cavity 6 for pretreatment, and the pretreatment device carries out early treatment to ensure later use.
And an exposure device which is positioned in the exposure cavity 23 and performs exposure, and the exposure device performs necessary exposure to realize photoetching.
And the material receiving roller 4 is positioned in the material receiving cavity 5, and the processed parts are received by the material receiving roller 4, so that the working requirement is met.
And the substrate 24 sequentially penetrates through the processing cavity 6, the exposure cavity 23, the reinforcing cavity 27 and the material receiving cavity 5 and then is connected with the material receiving roller 4, and the substrate 24 is etched after being processed to meet the processing requirement.
And the power box 50 is fixedly connected to one side of the camera bellows 1, a kinetic energy mechanism is connected inside the power box, the exposure device and the material receiving roller 4 are both connected with the kinetic energy mechanism, and kinetic energy is provided for each device in the device through the kinetic energy mechanism to ensure the rotation of the device.
The pretreatment device comprises:
and a replacing roller 8 which is rotatably connected with one side of the dark box 1, the substrate 24 is wound outside the replacing roller 8 at the early stage, and the unprocessed substrate 24 at the early stage is wound on the replacing roller 8 to realize the supply of raw materials.
And the feeding roller 9 is rotatably connected with the cavity wall of the processing cavity 6, one side of the feeding roller is provided with a heating and drying roller 10, the feeding roller 9 feeds the surface of the substrate 24 through external supply, and then the substrate is dried by the heating and drying roller 10, so that the solidification of liquid is realized, and the preparation in the previous stage is realized.
The leveling and blowing mechanism 12 is fixedly connected in the processing cavity 6, the material sucking mechanism 11 is fixedly connected to the bottom of the processing cavity 6, a blade coating knife at the bottom of the leveling and blowing mechanism 12 carries out necessary blade coating, redundant raw materials are removed, and meanwhile, the raw materials possibly trimmed are adsorbed by the suction of the suction pump, so that the leveling requirement is met.
In the camera bellows 1 reachs headstock 50 is run through to the one end of material loading roller 9, be provided with the raw material tanks that are connected with material loading roller 9 in the headstock 50, level and smooth a plurality of knife coating swoves of the bottom fixedly connected with of blowing material mechanism 12, level and smooth one side of blowing material mechanism 12 and inhaling material mechanism 11 all is connected with the aspirator pump that is located headstock 50, the output of aspirator pump is connected with filtering mechanism, and filtering mechanism filters the material that the knife coating came out, pollution abatement.
The exposure device includes:
the camera bellows comprises a camera bellows 1, a sliding frame 14, a plurality of sliding grooves 15, a kinetic energy mechanism, a plurality of sliding grooves 15, a plurality of sliding racks 14 and a camera bellows 14, wherein the two sliding racks are symmetrically arranged, the sliding racks 15 are arranged on the camera bellows 1, one side of the sliding frame 14 is in sliding sleeve connection with the sliding grooves 15, one end of the sliding frame 14 is connected with the kinetic energy mechanism, and the sliding frame 14 can move up and down under the limit of the sliding grooves 15 and the camera bellows 1, so that the requirement of subsequent work is met.
A plurality of pressure sensors 55 fixedly connected to the bottom of the carriage 14 above, a first buffer ring 66 fixedly connected to the lower side of the pressure sensors 55, the pressure sensors 55 sensing pressure and transmitting the pressure to the outside for detection, and the first buffer ring 66 cooperating with the second buffer ring 65 to press and seal the substrate 24.
And a movable box 17 which is fixedly connected with the sliding frame 14 at the bottom and is in sliding contact with the dark box 1, wherein the movable box 17 moves along with the movement of the sliding frame 14, and drives the actuator 13 to move.
The actuator 13 is fixedly connected to the movable box 17, and the top end of the actuator is connected with a second buffer ring 65;
the actuator 13 includes:
a plurality of radiation lamps 71 are arranged, the radiation lamps are fixedly connected in the movable box 17, a transparent plate 72 fixedly connected with the movable box 17 is arranged above the radiation lamps, the radiation lamps 71 generate light sources to realize strong illumination, and the light enters the light guide cylinder 73 through the transparent plate 72 to ensure the subsequent exposure.
The execution sleeve 64 is sleeved outside the execution cylinder 59, and the top end of the execution sleeve is fixedly connected with the second buffer ring 65;
the sliding ring 56 is slidably sleeved in the execution sleeve 64, the bottom end of the sliding ring is fixedly connected with an adjusting ring 63 fixedly connected with the execution cylinder 59, one side of the adjusting ring 63 is fixedly connected with a second spring 57 fixedly connected with the execution sleeve 64, and the pressure sensor 55 and the execution sleeve 64 are driven to move along with the movement of the sliding frame 14, so that the first buffer sleeve 66 and the second buffer sleeve 65 are close to each other, the base plate 24 is squeezed, sealing is realized, and meanwhile, the volume of the second buffer sleeve 65 is reduced, and the pressure is increased.
And the discharge pipe 62 is fixedly connected with the adjusting ring 63 at one end, one side of the discharge pipe 62 is provided with the suction pipe 58 fixedly connected with the adjusting ring 63, the other end of the suction pipe 58 is fixedly connected with the connecting pipe 31 connected with the raw material cavity 2, after the volume of the second buffer sleeve 65 is reduced, the internal liquid flows out through the discharge pipe 62, and in the subsequent return process, pure water raw material is sucked in the raw material cavity 2 through the suction pipe 58 and the connecting pipe 31.
One side of camera bellows 1 is provided with stabilizes case 21, and one side of stabilizing case 21 is connected with a plurality of heaters 22, and one side of heater 22 is provided with a plurality of steering rolls 16, and steering rolls 16 arrange into the arc structure side by side, and stabilizes case 21 and fixes heater 22, then carries out preliminary stoving and solidification through the heater, guarantees subsequent transportation and subsequent accomodating.
The kinetic energy mechanism includes:
the motor 30 is fixedly connected in the power box 50, the output end of the motor is connected with the first gear 44, the motor 30 provides torque to drive the first gear 44 to periodically rotate, and then the first gear 43 and the second gear 45 are in discontinuous contact, so that torque is transmitted.
The first driving wheel 43 is rotatably connected with the power box 50, is in transmission connection with the first lacking gear 44, is engaged and connected with the first gearbox 41 at the lower side thereof, is in transmission connection with the first driving wheel 34 below the first gearbox 41, and enables the first driving wheel 34 to rotate through the variable speed transmission of the first driving wheel 43 and the first gearbox 41, so that the intermediate shaft 39, the first lacking gear 42 and the friction wheel 40 are further driven to rotate.
The intermediate shaft 39 is fixedly sleeved with the first driving wheel 34, and a second gear 42 and a friction wheel 40 are fixedly sleeved on the intermediate shaft 39;
the transmission wheel 35 is in transmission connection with the second gear lacking 42, a lower driven shaft 38 is fixedly sleeved in the middle of the transmission wheel 35, a squeezing wheel 37 matched with the friction wheel 40 is fixedly sleeved on the outer wall of the lower driven shaft 38, the transmission wheel 35 receives torque transmitted by the second gear lacking 42, and meanwhile a certain friction force is maintained through matching between the friction wheel 40 and the squeezing wheel 37, and a stable state of a certain time is maintained.
The runner 33 is fixedly connected to one end of the driven shaft 38, the driven shaft 38 is rotatably connected to the power box 50, and the runner 33 drives the crank 54 to rotate, and further drives the crank 54 to move.
A crank 54 having one end rotatably connected to the runner 33 and the other end rotatably connected to a slide mechanism;
and the second driving wheel 45 is rotatably connected with the power box 50, is in transmission connection with the first vacant gear 44, is engaged and connected with a second gearbox 46 at the upper side thereof, is in transmission connection with a second driving wheel 47 above the second gearbox 6, and enables the second driving wheel 47 to rotate through the transmission of the second driving wheel 45 and the second gearbox 46.
The geneva gear 48 is in transmission connection with the second driving wheel 47, one side of the geneva gear 48 is connected with a material receiving shaft 49 connected with the material receiving roller 4, and through transmission, the geneva gear 48 is driven by the second driving wheel 47 to realize indirect rotation, further drives the material receiving shaft 49 and the material receiving roller 4 to rotate, and drives the substrate 24 to move by a distance from one end.
The sliding mechanism comprises first rod pieces 53 which are symmetrically arranged, one of the first rod pieces 53 is rotatably connected with a crank 54, one end of the other first rod piece 53 is fixedly connected with a second spring 52 fixedly connected with the power box 50, one end of each of the two first rod pieces 53 is rotatably connected with the second rod piece 32, the other end of the second rod piece 32 is rotatably connected with the exposure device, when the crank drives the first rod pieces 53 to move, the second rod pieces 32 move under the limit of the black box 1 and the sliding frame 14, the sliding frame 14 is further driven to move, the two sliding frames 40 are close to each other to form extrusion, and after no external force is supported subsequently, the second spring 52 enables each rod piece to return to wait for subsequent work.
The outer wall of friction pulley 40 is fixedly connected with a plurality of extrusion pieces of arc structure, the extrusion piece adopts the metal material, the fixed cover of outer wall of extrusion piece has connect the friction plate, wherein friction pulley 40 and second lack and have certain contained angle between gear 42, lack the gear 42 rotation back at the second, the friction plate contacts with extrusion wheel 37, keep the state of driven shaft by frictional force, after the friction plate removed extrusion wheel 37, the second spring 52 effect, then the second lacks the gear effect again, form the circulation of whole cycle.
The bottom of camera bellows 1 is connected with leakage pipe 19, and the other end of leakage pipe 19 is connected with the collecting box 18 that is located camera bellows 1 below, and one side of raw materials chamber 2 is connected with inlet pipe 3, is connected with detector 29 in the chamber of receiving 5, and the excessive pure water is collected to bleeder 19, then recycles, reduces the transitional use of pure water.
Consolidate in the chamber 27 and be connected with injection plate 28, one side of injection plate 28 is connected with and is located the outside and supplies the powder ware, consolidates the both sides fixedly connected with third spring 25 in chamber 27, and the other end fixedly connected with slider of third spring 25 rotates between two sliders and is connected with the dancer roll 26 that contacts with base plate 24, through the effect of third spring 25 for dancer roll 26 can carry out certain removal, guarantees that base plate 24 is in certain tensile state all the time.
During the operation, the substrate 24 penetrates through each chamber by a machine, the initial preparation is carried out, during the operation, the initial preparation and isolation are carried out through the protective box 7, then the necessary coating such as surface colloid is carried out through the feeding roller 9, then the drying and stabilizing are carried out through the operation of the heating and drying roller 10, then the overall leveling and fixing are carried out through the blade coating and the suction of the blowing mechanism 12, then the exposure is carried out through the operation of the actuator 13, then the necessary drying is carried out through the steering of the steering roller 16 and the heating of the heater 22, finally the rotation wheel 33 is driven to rotate through the first lacking gear 44, the first transmission wheel 43, the first gearbox 41, the first driving wheel 34, the middle shaft 39, the second lacking gear 42 and the transmission wheel 35 by the motor 30 and the detection of the detector 29 to wind and connect to the receiving roller 4, the operation is completed, further driving the crank 54 and the first rod 53 to move, so as to drive the two sliding frames 14 to move towards each other through the second rod 32, further driving the first buffer ring 66 and the second buffer ring 65 to move towards each other, thereby realizing extrusion, when the pressure sensor 55 senses a certain pressure, through control, the irradiation lamp 71 works, and then irradiates through the light-transmitting plate 72, the lens 61, the exposure plate 74 and the execution cylinder 59, thereby realizing exposure, in the process that the two sliding frames 14 are close, the mixed and diluted pure water is discharged through the drainage pipe 62, when the subsequent second buffer ring 65 and the first buffer ring 66 move relatively, the volume is enlarged, the clean pure water is sucked in the space below for addition, thereby completing local accurate addition, and the process is matched with the second transmission wheel 45, the second gearbox 46 and the second driving wheel 47, the sheave mechanism 48 and the material receiving shaft 49 operate to draw and receive the substrate 24, thereby achieving stable continuous operation and increasing the working efficiency.
The above embodiments are only preferred embodiments of the present invention, and the protection scope of the present invention is not limited thereby, and any insubstantial changes and substitutions made by those skilled in the art based on the present invention are within the protection scope of the present invention.
Claims (10)
1. An improved exposure system for preparing a Micro-LED chip, comprising:
the inner part of the camera bellows is provided with a processing cavity, an exposure cavity, a reinforcing cavity, a material receiving cavity and a raw material cavity;
the pretreatment device is positioned in the treatment cavity and used for carrying out pretreatment;
an exposure device which is positioned in the exposure cavity and performs exposure;
the material receiving roller is positioned in the material receiving cavity;
the substrate sequentially penetrates through the processing cavity, the exposure cavity, the reinforcing cavity and the material receiving cavity and is connected with the material receiving roller;
the power box is fixedly connected to one side of the camera bellows, a kinetic energy mechanism is connected inside the power box, and the exposure device and the material receiving roller are both connected with the kinetic energy mechanism.
2. The improved exposure system for Micro-LED chip fabrication as recited in claim 1, wherein said pre-processing means comprises:
the replacing roller is rotationally connected to one side of the dark box, and the substrate is wound on the outer side of the replacing roller at the early stage;
the protection box is obliquely fixed on one side of the dark box, and a plurality of processing units are arranged in the protection box;
the feeding roller is rotatably connected with the wall of the processing cavity, and one side of the feeding roller is provided with a heating and drying roller;
the leveling and blowing mechanism is fixedly connected in the treatment cavity, and the bottom of the treatment cavity is fixedly connected with a material sucking mechanism.
3. The improved exposure system for Micro-LED chip preparation as recited in claim 2, wherein one end of said feeding roller penetrates through the dark box to reach the inside of the power box, a raw material box connected with the feeding roller is arranged inside the power box, a plurality of knife blades are fixedly connected to the bottom of the leveling and blowing mechanism, one side of each of the leveling and blowing mechanism and the suction mechanism is connected with a suction pump located inside the power box, and the output end of the suction pump is connected with a filtering mechanism.
4. The improved exposure system for Micro-LED chip preparation as recited in claim 1, wherein said exposure means comprises:
the two sliding frames are symmetrically arranged, the camera bellows is provided with a plurality of sliding chutes, one side of each sliding frame is in sliding sleeve joint with the corresponding sliding chute, and one end of each sliding frame is connected with the kinetic energy mechanism;
the pressure sensors are provided with a plurality of pressure sensors and fixedly connected to the bottom of the sliding frame above the pressure sensors, and a first buffer ring is fixedly connected to the lower side of each pressure sensor;
the movable box is fixedly connected with the sliding frame at the bottom and is in sliding contact with the dark box;
and the actuator is fixedly connected to the movable box, and the top end of the actuator is connected with a second buffer ring.
5. The improved exposure system for Micro-LED chip preparation as recited in claim 4, wherein said actuator comprises:
a plurality of irradiation lamps which are fixedly connected in the movable box, and light transmission plates fixedly connected with the movable box are arranged above the irradiation lamps;
the light guide cylinder is fixedly connected with the movable box, the top of the light guide cylinder is in threaded sleeve connection with an installation cylinder, the top of the installation cylinder is in threaded sleeve connection with an execution cylinder, a plurality of lenses are fixedly connected in the light guide cylinder and the execution cylinder, and an exposure plate is fixedly connected in the installation cylinder;
the execution sleeve is sleeved on the outer side of the execution cylinder, and the top end of the execution sleeve is fixedly connected with the second buffer ring;
the sliding ring is sleeved in the execution sleeve in a sliding mode, the bottom end of the sliding ring is fixedly connected with an adjusting ring fixedly connected with the execution cylinder, and one side of the adjusting ring is fixedly connected with a second spring fixedly connected with the execution sleeve;
and the adjusting ring at one end of the drainage pipe is fixedly connected, one side of the drainage pipe is provided with an absorption pipe fixedly connected with the adjusting ring, and the other end of the absorption pipe is fixedly connected with a connecting pipe connected with the raw material cavity.
6. The improved exposure system for Micro-LED chip preparation as set forth in claim 4, wherein a stabilization box is disposed on one side of the dark box, a plurality of heaters are connected to one side of the stabilization box, and a plurality of turning rollers are disposed on one side of the heaters and arranged in an arc structure.
7. The improved exposure system for Micro-LED chip preparation as recited in claim 4, wherein each of said first and second buffer rings comprises a folded ring, said folded ring being filled with an inert gas, a contact ring being fixedly attached to one side of said folded ring, and a plurality of sealing grooves being formed in one side of said contact ring.
8. The improved Micro-LED chip preparation exposure system of claim 1, wherein said kinetic energy mechanism comprises:
the motor is fixedly connected in the power box, and the output end of the motor is connected with a first gear lack;
the first transmission wheel is rotationally connected with the power box, is in transmission connection with the first gear lacking wheel, is meshed with a first gearbox at the lower side of the first transmission wheel, and is in transmission connection with a first driving wheel below the first gearbox;
the intermediate shaft is fixedly sleeved with the first driving wheel, and a second gear and a friction wheel are fixedly sleeved on the intermediate shaft;
the transmission wheel is in transmission connection with the second gear lacking, a lower driven shaft is fixedly sleeved in the middle of the transmission wheel, and an extrusion wheel matched with the friction wheel is fixedly sleeved on the outer wall of the lower driven shaft;
the rotating wheel is fixedly connected to one end of a driven shaft, and the driven shaft is rotationally connected with the power box;
one end of the crank is rotationally connected with the rotating wheel, and the other end of the crank is rotationally connected with a sliding mechanism;
the second transmission wheel is rotationally connected with the power box, is in transmission connection with the first gear-lacking wheel, is engaged and connected with a second gearbox on the upper side of the second transmission wheel, and is in transmission connection with a second driving wheel above the second gearbox;
the grooved pulley mechanism is in transmission connection with the second driving wheel, and one side of the grooved pulley mechanism is connected with a material receiving shaft connected with the material receiving roller;
the sliding mechanism comprises first rod pieces which are symmetrically arranged, one of the first rod pieces is rotationally connected with the crank, one end of the other first rod piece is fixedly connected with a second spring which is fixedly connected with the power box, one ends of the two first rod pieces are rotationally connected with a second rod piece, and the other end of the second rod piece is rotationally connected with the exposure device;
the outer wall of the friction wheel is fixedly connected with a plurality of extrusion pieces of arc structures, the extrusion pieces are made of metal materials, and the outer wall of each extrusion piece is fixedly sleeved with a friction plate.
9. The improved exposure system for Micro-LED chip preparation as recited in claim 1, wherein a leakage pipe is connected to the bottom of the dark box, a collection box is connected to the other end of the leakage pipe and located below the dark box, a feeding pipe is connected to one side of the raw material chamber, and a detector is connected to the collection chamber.
10. The improved exposure system for Micro-LED chip preparation as recited in claim 1, wherein said strengthening chamber is connected with a jet plate, one side of said jet plate is connected with a powder feeder positioned at the outer side, both sides of said strengthening chamber are fixedly connected with a third spring, the other end of said third spring is fixedly connected with a slide block, and an adjusting roller in contact with the substrate is rotatably connected between two said slide blocks.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211031716.9A CN115421356A (en) | 2022-08-26 | 2022-08-26 | Improved exposure system for preparing Micro-LED chip |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211031716.9A CN115421356A (en) | 2022-08-26 | 2022-08-26 | Improved exposure system for preparing Micro-LED chip |
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| CN202211031716.9A Pending CN115421356A (en) | 2022-08-26 | 2022-08-26 | Improved exposure system for preparing Micro-LED chip |
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| US20060038968A1 (en) * | 2004-08-19 | 2006-02-23 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| CN101477312A (en) * | 2003-09-03 | 2009-07-08 | 株式会社尼康 | Exposure apparatus and device producing method |
| US20100149501A1 (en) * | 2008-12-11 | 2010-06-17 | Asml Netherlands B.V. | Fluid extraction system, lithographic apparatus and device manufacturing method |
| CN114007330A (en) * | 2021-10-11 | 2022-02-01 | 星源电子科技(深圳)有限公司 | Flexible printing device for flexible miniLED backlight module |
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2022
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Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101477312A (en) * | 2003-09-03 | 2009-07-08 | 株式会社尼康 | Exposure apparatus and device producing method |
| US20060038968A1 (en) * | 2004-08-19 | 2006-02-23 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US20100149501A1 (en) * | 2008-12-11 | 2010-06-17 | Asml Netherlands B.V. | Fluid extraction system, lithographic apparatus and device manufacturing method |
| CN114007330A (en) * | 2021-10-11 | 2022-02-01 | 星源电子科技(深圳)有限公司 | Flexible printing device for flexible miniLED backlight module |
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