CN115327827A - Preparation method of electrochromic film assembly with texture pattern - Google Patents
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- CN115327827A CN115327827A CN202211084133.2A CN202211084133A CN115327827A CN 115327827 A CN115327827 A CN 115327827A CN 202211084133 A CN202211084133 A CN 202211084133A CN 115327827 A CN115327827 A CN 115327827A
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- 238000002360 preparation method Methods 0.000 title abstract description 11
- 239000000758 substrate Substances 0.000 claims abstract description 35
- 238000005530 etching Methods 0.000 claims abstract description 25
- 238000007747 plating Methods 0.000 claims abstract description 12
- 238000010030 laminating Methods 0.000 claims abstract description 7
- 238000004806 packaging method and process Methods 0.000 claims abstract description 7
- 230000001681 protective effect Effects 0.000 claims abstract description 7
- 238000003475 lamination Methods 0.000 claims abstract 3
- 238000000034 method Methods 0.000 claims description 27
- 239000005341 toughened glass Substances 0.000 claims description 10
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 239000010410 layer Substances 0.000 abstract description 70
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- 238000006243 chemical reaction Methods 0.000 abstract description 2
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- 238000010147 laser engraving Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
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- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 238000000151 deposition Methods 0.000 description 3
- 238000001755 magnetron sputter deposition Methods 0.000 description 3
- 229910000314 transition metal oxide Inorganic materials 0.000 description 3
- XMWRBQBLMFGWIX-UHFFFAOYSA-N C60 fullerene Chemical compound C12=C3C(C4=C56)=C7C8=C5C5=C9C%10=C6C6=C4C1=C1C4=C6C6=C%10C%10=C9C9=C%11C5=C8C5=C8C7=C3C3=C7C2=C1C1=C2C4=C6C4=C%10C6=C9C9=C%11C5=C5C8=C3C3=C7C1=C1C2=C4C6=C2C9=C5C3=C12 XMWRBQBLMFGWIX-UHFFFAOYSA-N 0.000 description 2
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- 238000009413 insulation Methods 0.000 description 2
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- 238000011017 operating method Methods 0.000 description 2
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/15—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on an electrochromic effect
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/15—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on an electrochromic effect
- G02F1/153—Constructional details
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/15—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on an electrochromic effect
- G02F1/153—Constructional details
- G02F1/1533—Constructional details structural features not otherwise provided for
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/15—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on an electrochromic effect
- G02F1/153—Constructional details
- G02F1/155—Electrodes
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- Physics & Mathematics (AREA)
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- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
Abstract
The invention provides a preparation method of an electrochromic film assembly with a texture pattern, which comprises the following steps: plating a first transparent conductive layer on a first substrate plate, and then engraving by adopting first laser; sequentially plating an anode electrochromic layer, an ion conduction layer, a cathode electrochromic layer and a second transparent conductive layer, and then etching 5 laminated film layers by adopting second laser to form a pattern area and a blank area; then, etching 4 laminated film layers except the first transparent conducting layer by adopting third laser; then, conducting wire interconnection is respectively carried out on the pattern area and the blank area, and laminating lamination is carried out on the pattern area and the blank area and a second substrate; after lamination, carrying out protective packaging with a third substrate to obtain an electrochromic film assembly with a texture pattern; the preparation method of the invention uses laser technology to carve the needed pattern on the plated electrochromic functional layer, and realizes the mode conversion through the voltage change, so that the electrochromic film component is more practical and beautiful.
Description
Technical Field
The invention belongs to the technical field of electrochromic devices, and particularly relates to a preparation method of an electrochromic film assembly with texture patterns.
Background
An electrochromic device (ECD) is a color display device using an electrochromic material that is colored or decolored by electrochemical oxidation or reduction according to a direction in which current is applied. The electrochromic operating methods are divided into cathodic and anodic operating methods. When the electrode composed at the negative electrode is reduced, the cathodic electrochromic material develops color, while the anodic coloring point to the coloring of the color change material at the anode or at the positive electrode. In addition, if the direction of current flow is reversed, the electrochromic material discolors and thus restores a transparent color. The ECD having such properties is widely used for rear view mirrors and skylights of automobiles, smart windows, outdoor displays, and the like.
Electrochromic materials include transition metal oxides, prussian blue, tetrakiscyanine, viologen (viologen), conductive polymers, fullerene (fullerene), and the like. Electrochromic materials in which the transition metal oxide comprises a cathode, e.g. WO 3 、MoO 3 、Nb 2 O 5 And TiO 2 2 And electrochromic materials for the anode, e.g. NiO, lr 2 O 3 、Rh 2 O 3 、Co 3 O 4 、Fe 2 O 3 、Cr 2 O 3 And V 2 O 5 . Transition metal oxides, prussian blue, and phthalocyanines are inorganic electrochromic materials having excellent UV (ultraviolet) stability.
In the prior art, the main defect of the electrochromic membrane module is that the state can be switched on the whole surface and the change is single. In practical applications, it may be necessary to treat some areas so as not to change color to show a specific pattern, for example, to show a logo of a manufacturer.
CN101512422A discloses a method for forming an electrochromic layer pattern, the method comprising: forming a transparent electrode layer and a photoresist layer on a transparent substrate: forming a photoresist pattern by laser interference lithography: and depositing an electrochromic layer pattern on the transparent electrode through the opening defined by the photoresist pattern by depositing an electrochromic layer on the upper surface of the substrate, and then removing the photoresist pattern. The method can not realize the color changing effect in the area without depositing the electrochromic layer, can not realize the change from transparent to opaque of the whole assembly, and loses the whole shading effect.
Therefore, how to make the electrochromic film assembly more functional and ornamental becomes a technical problem to be solved urgently.
Disclosure of Invention
Aiming at the problems in the prior art, the invention aims to provide a preparation method of an electrochromic film component with a texture pattern, wherein the electrochromic film component is additionally provided with a developing function by laser engraving so as to be more functional and ornamental, and the preparation method is simple in process flow and suitable for industrial production.
In order to achieve the purpose, the invention adopts the following technical scheme:
in a first aspect, the present invention provides a method for preparing an electrochromic film assembly having a textured pattern, the method comprising the steps of:
(1) Plating a first transparent conducting layer on a first substrate plate, and then adopting first laser to perform carving and insulating the first transparent conducting layer;
(2) After the etching is finished, sequentially plating an anode electrochromic layer, an ion conduction layer, a cathode electrochromic layer and a second transparent conductive layer, and then etching 5 laminated film layers by adopting second laser to form a pattern area and a blank area;
(3) After the etching is finished, etching 4 laminated film layers except the first transparent conducting layer by adopting third laser, and insulating the second transparent conducting layer;
(4) Respectively interconnecting the pattern area and the blank area by leads, and laminating the pattern area and the blank area with a second substrate;
(5) And carrying out protective packaging with a third substrate to obtain the electrochromic film assembly with the texture pattern.
In the invention, the first laser engraving is used for insulating the first transparent conducting layer; the second laser engraving is used for insulating a development area (namely a pattern area) from an un-development area (namely a blank area); the third laser engraving is used for the insulation of the second transparent conducting layer and the printing of the bus and is respectively connected with 2 transparent conducting layers.
The following technical solutions are preferred technical solutions of the present invention, but not limited to the technical solutions provided by the present invention, and technical objects and advantageous effects of the present invention can be better achieved and achieved by the following technical solutions.
As a preferred embodiment of the present invention, the first substrate in step (1) includes an ITO substrate.
In a preferred embodiment of the present invention, the power of the first laser in step (1) is 3-5W, such as 3W, 3.5W, 4W, 4.5W or 5W; the frequency is 30-50KHZ, such as 30KHZ, 35KHZ, 40KHZ, 45KHZ or 50 KHZ; the drawing speed is 550 to 650mm/s, for example 550mm/s, 580mm/s, 600mm/s, 620mm/s or 650mm/s, etc., and the selection of the above-mentioned values is not limited to the recited values, and other values not recited within the respective numerical ranges are also applicable.
In a preferred embodiment of the present invention, the power of the second laser in step (2) is 3-5W, such as 3W, 3.5W, 4W, 4.5W or 5W; the frequency is 30-50KHZ, such as 30KHZ, 35KHZ, 40KHZ, 45KHZ or 50 KHZ; the drawing speed is 550 to 650mm/s, for example 550mm/s, 580mm/s, 600mm/s, 620mm/s or 650mm/s, etc., the selection of the above-mentioned values not being limited to the values listed, other values not listed within the respective value range also being applicable.
In a preferred embodiment of the present invention, the power of the third laser in step (3) is 0.8-1.2W, such as 0.8W, 0.9W, 1.0W, 1.1W or 1.2W; a frequency of 30-50KHZ, such as 30KHZ, 35KHZ, 40KHZ, 45KHZ, 50KHZ, etc.; the drawing speed is 550 to 650mm/s, for example 550mm/s, 580mm/s, 600mm/s, 620mm/s or 650mm/s, etc., the selection of the above-mentioned values not being limited to the values listed, other values not listed within the respective value range also being applicable.
In a preferred embodiment of the present invention, the number of the graphic regions in step (2) is at least 1, for example, 1, 2, 3, 4, or 5, but the present invention is not limited to the above-mentioned values, and other values not shown in the above-mentioned range are also applicable.
Preferably, the blank area in step (2) is at least 1, such as 1, 2, 3, 4 or 5, but not limited to the recited values, and other values not recited in the range of values are also applicable.
In the invention, the whole electrochromic film assembly can be divided into a plurality of areas, and a required pattern is engraved in each area by using laser, namely a plurality of pattern areas and a plurality of blank areas are formed.
As a preferred embodiment of the present invention, the second substrate in step (3) includes tempered glass.
As a preferred embodiment of the present invention, the pressure for laminating the laminate in step (3) is 2 to 10atm, for example, 2atm, 4atm, 6atm, 8atm or 10atm, but not limited to the recited values, and other values not recited in the above range are also applicable.
As a preferred embodiment of the present invention, the third substrate in step (4) includes tempered glass.
Preferably, the third substrate of step (4) is located on the side of the first substrate away from the second substrate.
In the invention, after the third base material is assembled in the step (4), edge insulation, cleaning, gasket placement, contact clamp welding and gas filling are sequentially carried out to realize primary packaging, then a connector is placed to control the electrochromic process, and finally an auxiliary sealing element is placed to finish protective packaging.
In a second aspect, the present invention provides a method for applying the electrochromic film assembly with the texture pattern of the first aspect, wherein the method for applying comprises:
a. transparent mode
Independently applying reverse voltage to the graphic area and the blank area of the electrochromic film assembly to enable the electrochromic film assembly to be in a transparent state;
b. image display mode
Applying a forward voltage to a graphic area of the electrochromic film assembly, and applying a reverse voltage to a blank area to enable the electrochromic film assembly to present a graphic;
c. opaque mode
Independently applying a forward voltage to the graphic area and the blank area of the electrochromic film assembly causes the electrochromic film assembly to assume an opaque state as a whole.
As a preferred technical solution of the present invention, the mode a, the mode b and the mode c are freely switched by a controller.
Compared with the prior art, the invention has the following beneficial effects:
the preparation method of the invention uses laser technology to carve the needed pattern on the plated electrochromic functional layer, and realizes the mode conversion through the voltage change, so that the electrochromic film component is more practical and beautiful.
Drawings
Fig. 1 is a schematic diagram of a laser scribing process in a process of manufacturing an electrochromic film assembly with a texture pattern according to embodiment 1 of the present invention.
Fig. 2 is a schematic diagram of laser engraving effect in a process of preparing an electrochromic film assembly with a texture pattern according to embodiment 1 of the present invention.
Fig. 3 is a diagram illustrating a transition process of the electrochromic film assembly with a textured pattern, which is formed by a transparent mode → a developing mode → an opaque mode, according to embodiment 1 of the present invention.
The transparent conductive film comprises a substrate 1-ITO (indium tin oxide), a first transparent conductive layer 2, an anode electrochromic layer 3, an ion conduction layer 4, a cathode electrochromic layer 5 and a second transparent conductive layer 6.
Detailed Description
In order to better illustrate the present invention and facilitate the understanding of the technical solutions of the present invention, the present invention is further described in detail below. However, the following examples are only simple examples of the present invention and do not represent or limit the scope of the present invention, which is defined by the claims.
The following are typical but non-limiting examples of the invention:
example 1:
the embodiment provides a preparation method of an electrochromic film assembly with a texture pattern, which comprises the following steps:
(1) Plating a first transparent conducting layer 2 on an ITO substrate 1 plate by adopting a magnetron sputtering method, and then etching by adopting first laser to insulate the first transparent conducting layer 2; wherein, the power of the first laser is 4W, the frequency is 40KHZ, and the depicting speed is 600mm/s;
(2) After the etching is finished, sequentially plating an anode electrochromic layer 3, an ion conduction layer 4, a cathode electrochromic layer 5 and a second transparent conductive layer 6, and then etching the laminated 5 film layers by adopting second laser to form a pattern area and a blank area; wherein the power of the second laser is 4W, the frequency is 40KHZ, and the depicting speed is 600mm/s;
(3) After the etching is finished, etching 4 laminated film layers except the first transparent conducting layer 2 by adopting third laser, and insulating the second transparent conducting layer 6; wherein the power of the third laser is 1.1W, the frequency is 40KHZ, and the carving speed is 600mm/s;
the materials and thicknesses of the film layers are shown in table 1;
TABLE 1
The schematic diagram of the laser engraving process is shown in fig. 1, and the schematic diagram of the engraving effect is shown in fig. 2;
(4) Respectively interconnecting the pattern area and the blank area by leads, and laminating the pattern area and the blank area with a second substrate (toughened glass) at the pressure of 5atm;
(5) And carrying out protective packaging with a third substrate (tempered glass) to obtain the electrochromic film assembly with the texture pattern.
Example 2:
the embodiment provides a preparation method of an electrochromic film assembly with a texture pattern, which comprises the following steps:
(1) Plating a first transparent conductive layer 2 on an ITO substrate 1 plate by adopting a magnetron sputtering method, and then etching by adopting first laser to insulate the first transparent conductive layer 2; wherein, the power of the first laser is 3W, the frequency is 45KHZ, and the depicting speed is 620mm/s;
(2) After the etching is finished, sequentially plating an anode electrochromic layer 3, an ion conduction layer 4, a cathode electrochromic layer 5 and a second transparent conductive layer 6, and then etching the laminated 5 film layers by adopting second laser to form a pattern area and a blank area; wherein the power of the second laser is 5W, the frequency is 45KHZ, and the carving speed is 580mm/s;
(3) After the etching is finished, etching 4 laminated film layers except the first transparent conducting layer 2 by adopting third laser, and insulating the second transparent conducting layer 6; wherein the power of the third laser is 1.0W, the frequency is 40KHZ, and the carving speed is 600mm/s;
the materials and thicknesses of the respective film layers are shown in table 2;
TABLE 2
(4) Respectively interconnecting the pattern area and the blank area by leads, and laminating the pattern area and the blank area with a second substrate (toughened glass) at the pressure of 10atm;
(5) And carrying out protective packaging with a third substrate (toughened glass) to obtain the electrochromic film assembly with the texture pattern.
Example 3:
the embodiment provides a preparation method of an electrochromic film assembly with a texture pattern, which comprises the following steps:
(1) Plating a first transparent conducting layer 2 on an ITO substrate 1 plate by adopting a magnetron sputtering method, and then etching by adopting first laser to insulate the first transparent conducting layer 2; wherein, the power of the first laser is 5W, the frequency is 40KHZ, and the depicting speed is 570mm/s;
(2) After the etching is finished, sequentially plating an anode electrochromic layer 3, an ion conduction layer 4, a cathode electrochromic layer 5 and a second transparent conductive layer 6, and then etching 5 laminated film layers by adopting second laser to form a pattern area and a blank area; wherein the power of the second laser is 4.5W, the frequency is 38KHZ, and the depicting speed is 600mm/s;
(3) After the etching is finished, etching 4 laminated film layers except the first transparent conducting layer 2 by adopting third laser, and insulating the second transparent conducting layer 6; wherein the power of the third laser is 1.2W, the frequency is 40KHZ, and the depicting speed is 580mm/s;
the materials and thicknesses of the respective film layers are shown in table 3;
TABLE 3
| Material | Thickness/nm | |
| A first transparent conductive layer | ITO | 300 |
| Anodic electrochromic layer | NiWO x | 300 |
| Ion conducting layer | SiO 2 | 70 |
| Cathodic electrochromic layer | WO x | 600 |
| A second transparent conductive layer | ITO | 300 |
(4) Respectively interconnecting the pattern area and the blank area by leads, and laminating the pattern area and the blank area with a second substrate (toughened glass) at the pressure of 2atm;
(5) And carrying out protective packaging with a third substrate (toughened glass) to obtain the electrochromic film assembly with the texture pattern.
Application example 1:
a method for applying a textured patterned electrochromic film assembly prepared by the method of example 1, comprising:
a. transparent mode
Independently applying reverse voltage of-4V to the graphic area and the blank area of the electrochromic film assembly by using a controller to enable the electrochromic film assembly to be in a transparent state;
from mode a to mode b
Applying a forward voltage of 4V to a graphic area of the electrochromic film assembly by using a controller, and applying a voltage to a blank area to be unchanged so that the electrochromic film assembly presents a graphic;
from mode b to mode c
And applying forward voltage 4V to the blank area of the electrochromic film assembly by using a controller, and applying voltage to the graphic area to keep unchanged so as to enable the electrochromic film assembly to be in an opaque state as a whole.
In this application, the transition process of the electrochromic film assembly from transparent mode → imaging mode → opaque mode is shown in fig. 3.
The present invention is illustrated in detail by the examples described above, but the present invention is not limited to the details described above, i.e., it is not intended that the present invention be implemented by relying on the details described above. It will be apparent to those skilled in the art that any modifications to the present invention, equivalents to the operation of the invention, additions of additional operations, selection of specific ways, etc., are within the scope and disclosure of the invention.
Claims (10)
1. A method for preparing an electrochromic film assembly having a textured pattern, the method comprising the steps of:
(1) Plating a first transparent conducting layer on a first substrate plate, and then adopting first laser to perform carving and insulating the first transparent conducting layer;
(2) After the etching is finished, sequentially plating an anode electrochromic layer, an ion conduction layer, a cathode electrochromic layer and a second transparent conductive layer, and then etching 5 laminated film layers by adopting second laser to form a pattern area and a blank area;
(3) After the etching is finished, etching 4 laminated film layers except the first transparent conducting layer by adopting third laser, and insulating the second transparent conducting layer;
(4) Respectively interconnecting the pattern area and the blank area by leads, and laminating the pattern area and the blank area with a second substrate;
(5) And carrying out protective packaging with a third substrate to obtain the electrochromic film assembly with the texture pattern.
2. The method of claim 1, wherein the first substrate of step (1) comprises an ITO substrate.
3. The method according to claim 1 or 2, wherein the first laser in step (1) has a power of 3-5W, a frequency of 30-50KHZ, and a scribing speed of 550-650mm/s.
4. The method according to any one of claims 1 to 3, wherein the power of the second laser in step (2) is 3 to 5W, the frequency is 30 to 50KHZ, and the scribing speed is 550 to 650mm/s.
5. The method according to any one of claims 1 to 4, wherein the power of the third laser in step (3) is 0.8 to 1.2W, the frequency is 30 to 50KHz, and the scribing speed is 550 to 650mm/s.
6. The production method according to any one of claims 1 to 5, wherein the number of the pattern regions in the step (2) is at least 1;
preferably, the blank area in step (2) is at least 1.
7. The production method according to any one of claims 1 to 6, wherein the second substrate of step (3) comprises tempered glass.
8. The production method according to any one of claims 1 to 7, wherein the pressure of the lamination in the step (3) is 2 to 10atm.
9. The production method according to any one of claims 1 to 8, wherein the third substrate of step (4) comprises tempered glass.
10. The method according to any one of claims 1 to 9, wherein the third substrate in step (4) is located on a side of the first substrate away from the second substrate.
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5724175A (en) * | 1997-01-02 | 1998-03-03 | Optical Coating Laboratory, Inc. | Electrochromic device manufacturing process |
| WO2009038265A1 (en) * | 2007-09-21 | 2009-03-26 | Dansuk Industrial Co., Ltd. | Electrochromic device with multiple pattern for camera, and manufacturing process thereof |
| KR20170125573A (en) * | 2016-05-04 | 2017-11-15 | 립하이 주식회사 | Electrochromic apparatus |
| CN111323979A (en) * | 2020-01-03 | 2020-06-23 | 深圳市光羿科技有限公司 | Electrochromic device and preparation method |
| CN112230486A (en) * | 2020-10-26 | 2021-01-15 | 深圳市光羿科技有限公司 | Electrochromic device and electronic terminal comprising same |
-
2022
- 2022-09-06 CN CN202211084133.2A patent/CN115327827A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5724175A (en) * | 1997-01-02 | 1998-03-03 | Optical Coating Laboratory, Inc. | Electrochromic device manufacturing process |
| WO2009038265A1 (en) * | 2007-09-21 | 2009-03-26 | Dansuk Industrial Co., Ltd. | Electrochromic device with multiple pattern for camera, and manufacturing process thereof |
| KR20170125573A (en) * | 2016-05-04 | 2017-11-15 | 립하이 주식회사 | Electrochromic apparatus |
| CN111323979A (en) * | 2020-01-03 | 2020-06-23 | 深圳市光羿科技有限公司 | Electrochromic device and preparation method |
| CN112230486A (en) * | 2020-10-26 | 2021-01-15 | 深圳市光羿科技有限公司 | Electrochromic device and electronic terminal comprising same |
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