CN115248403A - MEMS fluxgate sensor based on conical magnetic gathering device and manufacturing method thereof - Google Patents
MEMS fluxgate sensor based on conical magnetic gathering device and manufacturing method thereof Download PDFInfo
- Publication number
- CN115248403A CN115248403A CN202210737848.7A CN202210737848A CN115248403A CN 115248403 A CN115248403 A CN 115248403A CN 202210737848 A CN202210737848 A CN 202210737848A CN 115248403 A CN115248403 A CN 115248403A
- Authority
- CN
- China
- Prior art keywords
- coil
- magnetic
- manufacturing
- mems
- magnetic core
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 41
- 238000001514 detection method Methods 0.000 claims abstract description 56
- 238000000034 method Methods 0.000 claims description 54
- 230000008569 process Effects 0.000 claims description 53
- 239000000758 substrate Substances 0.000 claims description 31
- 230000005284 excitation Effects 0.000 claims description 29
- 239000004642 Polyimide Substances 0.000 claims description 28
- 229920001721 polyimide Polymers 0.000 claims description 28
- 238000009713 electroplating Methods 0.000 claims description 27
- 238000001259 photo etching Methods 0.000 claims description 22
- 229920002120 photoresistant polymer Polymers 0.000 claims description 21
- 239000004020 conductor Substances 0.000 claims description 20
- 238000000059 patterning Methods 0.000 claims description 19
- 238000004528 spin coating Methods 0.000 claims description 17
- 239000002184 metal Substances 0.000 claims description 9
- 238000007517 polishing process Methods 0.000 claims description 9
- 238000004544 sputter deposition Methods 0.000 claims description 9
- 238000004140 cleaning Methods 0.000 claims description 6
- 238000001035 drying Methods 0.000 claims description 6
- 239000000463 material Substances 0.000 claims description 4
- 230000001681 protective effect Effects 0.000 claims description 3
- 238000005498 polishing Methods 0.000 claims 1
- 230000003321 amplification Effects 0.000 abstract description 2
- 238000003199 nucleic acid amplification method Methods 0.000 abstract description 2
- 238000005516 engineering process Methods 0.000 description 9
- 230000008901 benefit Effects 0.000 description 7
- 230000035945 sensitivity Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 238000011049 filling Methods 0.000 description 3
- 229910002555 FeNi Inorganic materials 0.000 description 2
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 238000010923 batch production Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 230000005415 magnetization Effects 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/0011—Arrangements or instruments for measuring magnetic variables comprising means, e.g. flux concentrators, flux guides, for guiding or concentrating the magnetic flux, e.g. to the magnetic sensor
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
- G01R33/04—Measuring direction or magnitude of magnetic fields or magnetic flux using the flux-gate principle
- G01R33/05—Measuring direction or magnitude of magnetic fields or magnetic flux using the flux-gate principle in thin-film element
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Measuring Magnetic Variables (AREA)
Abstract
The invention provides an MEMS fluxgate sensor based on a conical magnetic concentrator and a manufacturing method thereof, the MEMS fluxgate sensor comprises a magnetic core, two groups of conical magnetic force line concentrators, two groups of exciting coils, a detection coil and four electrode pins, wherein the two groups of conical magnetic force line concentrators are symmetrically arranged at the left end and the right end of the magnetic core, the detection coil is wound around the periphery of the middle part of the magnetic core, the two groups of exciting coils are wound around the periphery of the magnetic core at the left side and the right side of the detection coil, the two groups of exciting coils are connected, two ends of the two groups of exciting coils are respectively connected to two of the electrode pins, and two ends of the detection coil are respectively connected to the other two electrode pins. The invention improves the gathering and amplification of the weak magnetic field to be detected through the conical magnetic force line collector, thereby improving the detection resolution of the MEMS fluxgate on the weak magnetic field, and can improve the resistance of the MEMS fluxgate on the magnetic impact of the large magnetic field by utilizing the conical magnetic force line collector, thereby improving the stability and the impact resistance of the detection.
Description
Technical Field
The invention belongs to the technical field of magnetic field detection elements, and particularly relates to an MEMS fluxgate sensor based on a conical magnetic concentrator and a manufacturing method thereof.
Background
The fluxgate is a common magnetic field detection element, and the basic principle is that under the magnetization action of an alternating excitation signal, the magnetic permeability of a soft magnetic core is periodically changed between saturation and non-saturation, so that an induction coil surrounding the magnetic core induces a signal reflecting an external magnetic field.
The traditional fluxgate is characterized in that a soft magnetic strip-shaped magnetic core is fixed on a framework, and then an excitation coil and a detection coil are wound on the framework, because the traditional machining method is utilized, the traditional fluxgate has the defects of large volume, high weight, low sensitivity and poor long-term stability, the cost of secondary batch production is high, the consistency is poor, the assembly error is large, the fluxgate is easily influenced by temperature, stress and mechanical vibration, the output error is large, a complex calibration and compensation circuit is required, and simultaneously, a fluxgate probe and the circuit are separately machined, so that the traditional fluxgate cannot be applied to occasions with small volume, small mass and high spatial resolution, such as magnetic heads, sensor arrays, portable equipment, electronic compasses, current sensors, the field of biomedicine and the like.
With the development of microelectronic technology, it becomes possible to manufacture fluxgates by micro-nano processing method. The micro fluxgate manufactured based on the micro-processing technology has the advantages of miniaturization, low power consumption, high integration, good consistency and the like, can be integrated with an IC circuit easily, has great application potential in attitude control and navigation of a small satellite, an intelligent bomb and the like, has the advantages of small volume, light weight, convenience in installation, easiness in integration and the like, and can obtain great economic benefits and remarkable social benefits in the aspects of power supply monitoring, current detection and the like of a new energy automobile.
Although the related MEMS fluxgate has been developed successfully, the detection sensitivity of the MEMS fluxgate is still a certain gap from the conventional fluxgate, which limits the application and popularization of the MEMS fluxgate sensor in high-precision magnetic field and current detection.
Disclosure of Invention
The invention aims to solve the technical problems that the detection sensitivity of the existing MEMS fluxgate is different from that of the traditional fluxgate to limit the application and popularization of the MEMS fluxgate sensor in high-precision magnetic field and current detection, and provides an MEMS fluxgate sensor based on a conical magnetic concentrator and a manufacturing method thereof.
In order to achieve the purpose, the invention adopts the following technical scheme:
the utility model provides a MEMS fluxgate sensor based on toper type magnetic line of force collector, includes magnetic core, two sets of toper type magnetic line of force collectors, two sets of exciting coil, detection coil and four electrode pins, two sets of toper type magnetic line of force collectors set up symmetrically both ends about the magnetic core, and the tip of toper type magnetic line of force collectors is close to the magnetic core and with the interval has between the magnetic core, detection coil is around establishing the periphery at magnetic core middle part, two sets of exciting coil are around establishing the magnetic core periphery of the detection coil left and right sides, and two sets of exciting coil link to each other, and the both ends of two sets of exciting coil are connected respectively on two of them electrode pins, the both ends of detection coil are connected respectively on two other electrode pins.
As a preferable technical solution, the magnetic core includes a first magnetic strip portion and a second magnetic strip portion, the first magnetic strip portion and the second magnetic strip portion are arranged in parallel and connected at left and right ends so that the whole magnetic core is "0" shaped, each set of excitation coil includes two excitation coils, and the two excitation coils are respectively wound on the first magnetic strip portion and the second magnetic strip portion.
As a preferred technical scheme, the MEMS fluxgate sensor is filled with polyimide, the surfaces of the magnetic core, the two sets of tapered magnetic line collectors, the two sets of excitation coils, and the detection coil are wrapped with polyimide, and the four electrode pins are exposed out of the surface of the MEMS fluxgate sensor.
The invention also provides a manufacturing method of the MEMS fluxgate sensor, which comprises the steps of dividing the exciting coil and the detecting coil into a bottom coil, a connecting conductor pillar for connecting the bottom coil and the top coil, and the top coil which are manufactured and molded in sequence;
the manufacturing method comprises the following steps:
s1, a seed layer is sputtered on a substrate material, then a bottom coil graph is patterned through a photoetching process, then a metal line of a bottom coil is manufactured through an electroplating process, and photoresist is removed;
s2, continuously patterning a first layer of pillar patterns connected with the conductor pillars on the manufactured metal lines, manufacturing the first layer of pillars by using an electroplating process, and removing the photoresist and the seed layer after the manufacturing is finished;
s3, spin-coating thick polyimide on the surface of the substrate by a spin-coating process to cover the first layer of the pillars, and performing high-temperature curing;
s4, removing the polyimide on the top of the first layer of pillars through a polishing process, flattening the whole substrate, and cleaning and drying the substrate;
s5, continuously sputtering a seed layer on the flattened substrate, patterning the conical magnetic force line collector through a photoetching process, and manufacturing the conical magnetic force line collector through an electroplating process;
s6, removing the photoresist, patterning the magnetic core pattern through a photoetching process, and manufacturing the magnetic core through an electroplating process;
s7, removing the photoresist, patterning a second layer of pillar patterns connected with the conductor pillars through a photoetching process, manufacturing second layers of pillars through an electroplating process, and removing the photoresist and the seed layer;
s8, spin-coating thick polyimide on the surface of the substrate by a spin-coating process to cover the second layer of pillars, and performing high-temperature curing;
s9, removing the polyimide on the top of the second layer of columns through a polishing process, flattening the whole substrate, and cleaning and drying the substrate;
s10, continuously sputtering a seed layer on the flattened substrate, patterning the top coil through a photoetching process, manufacturing metal lines of the top coil through an electroplating process, and removing photoresist after manufacturing;
s11, patterning an electrode pin pattern through a photoetching process, manufacturing an electrode pin through an electroplating process, and then removing the photoresist and the seed layer;
s12, spin-coating a thick polyimide protective film on the whole device;
and S13, removing the polyimide on the top of the electrode pin by a polishing process.
After the technical scheme is adopted, the invention has the following advantages:
the magnetic force line collector is used for collecting the weak magnetic field, so that the intensity of the detectable magnetic field is improved, and the detection capability of the magnetic sensor can be further improved. The conical magnetic force line collector has a certain tip effect, improves the magnetic collection capability and improves the detection capability of the sensor on a weak magnetic field. Compared with the prior art, the invention improves the gathering and amplification of the weak magnetic field to be detected by utilizing the conical magnetic force line collector, thereby improving the detection resolution of the MEMS fluxgate on the weak magnetic field, and can improve the resistance of the MEMS fluxgate on the magnetic impact of the large magnetic field by utilizing the conical magnetic force line collector, thereby improving the stability and the impact resistance of the detection, which can promote the specific application of the MEMS fluxgate sensor in the field of high-precision magnetic field detection.
Drawings
FIG. 1 is a schematic structural diagram of a MEMS fluxgate sensor based on a cone-shaped magnetic line concentrator;
FIG. 2 is a top view of a MEMS fluxgate sensor based on a tapered magnetic line concentrator;
FIG. 3 is a schematic diagram of a loop of wire for the excitation coil;
FIG. 4 is a schematic diagram of a conductor loop of the detection coil;
in the figure:
1-a substrate; 2-a magnetic core; 21-magnetic strip part one; 22-magnetic stripe one; 3-conical magnetic force line collector; 4-exciting the coil; 41-bottom excitation coil; 42-top layer excitation coil; 43-excitation coil connection conductor; 5-a detection coil; 51-bottom layer detection coil; 52-top layer detection coils; 53-detection coil connection conductor; 6-electrode pin.
Detailed Description
The present invention will be described in further detail with reference to the following drawings and specific examples.
As shown in fig. 1-2, an MEMS fluxgate sensor based on a conical magnetic line concentrator includes a magnetic core 2, two sets of conical magnetic line concentrators 3, two sets of excitation coils 4, a detection coil 5, and four electrode pins 6.
The two groups of conical magnetic force line collectors 3 are symmetrically arranged at the left end and the right end of the magnetic core 2, and the small ends of the conical magnetic force line collectors 3 are close to the magnetic core 2 and have a distance with the magnetic core 2.
The detection coil 5 is wound around the periphery of the middle part of the magnetic core 2, and the two groups of excitation coils 4 are wound around the peripheries of the magnetic cores 2 on the left and right sides of the detection coil 5.
In this embodiment, each set of excitation coils 4 includes two excitation coils 4, four excitation coils 4 of the two sets of excitation coils 4 are connected, and two ends of the four excitation coils 4 are respectively connected to two of the electrode pins 6.
Two ends of the detection coil 5 are respectively connected to the other two electrode pins 6.
In this embodiment, the magnetic core 2 includes a first magnetic stripe portion 21 and a second magnetic stripe portion 22, and the first magnetic stripe portion 21 and the second magnetic stripe portion 22 are arranged in parallel and connected at left and right ends, so that the entire magnetic core 2 is a closed loop in a "0" shape. The two excitation coils 4 of each set of excitation coils 4 are respectively wound on the first magnet strip portion 21 and the second magnet strip portion 22.
The exciting coil 4 is located on the substrate 1, and as shown in fig. 3, the exciting coil 4 includes a bottom layer exciting coil 41 and a top layer exciting coil 42, and the bottom layer exciting coil 41 and the top layer exciting coil 42 are connected by an exciting coil connecting conductor 43.
The detection coil 5 is located on the substrate 1, and as shown in fig. 4, the detection coil 5 includes a bottom layer detection coil 51 and a top layer detection coil 52, and the bottom layer detection coil 51 and the top layer detection coil 52 are connected by a detection coil connection conductor 53.
Polyimide is filled in the MEMS fluxgate sensor, the surfaces of the magnetic core 2, the two groups of conical magnetic force line collectors 3, the two groups of exciting coils 4 and the detection coil 5 are wrapped by the polyimide, and the four electrode pins 6 are exposed out of the surface of the MEMS fluxgate sensor. The exciting coil 4 and the detecting coil 5 are insulated and isolated from the magnetic core 2 and the conical magnetic force line collector 3 by polyimide insulating materials.
When the magnetic core is in work, the magnetic core 2 is in a saturated state due to alternating current of the exciting coil 4, and no signal is output by the detecting coil 5 when an external magnetic field is not available; when an external magnetic field exists, the conical magnetic force line collector 3 collects and amplifies the external magnetic field, the detection coil 5 outputs a signal, the signal is even harmonic, and a second harmonic signal can be obtained after filtering. The magnitude of the second harmonic signal is proportional to the external magnetic field, and thus the magnitude and direction of the external magnetic field can be measured.
In this embodiment, the conical magnetic force line collector 3 is made of an FeNi alloy material by an electroplating process, and is annealed after being processed, so as to improve the soft magnetic property and the directivity, and the thickness is 25 μm.
In this embodiment, the excitation coil 4 and the detection coil 5 are three-dimensional spiral coils, and are manufactured by an electroplating process, the line width of each turn of conductor is 55 μm, the thickness is 30 μm, and the gap is 55 μm.
In this embodiment, the lengths of the excitation coil connecting conductors 43 of the bottom layer excitation coil 41 and the top layer excitation coil 42 of the excitation coil 4 are 1250 μm.
In this embodiment, the lengths of the detection coil connecting conductors 53 of the bottom detection coil 51 and the top detection coil 52 of the detection coil 5 are 3500 μm.
In this embodiment, the excitation coil connecting conductor 43 and the detection coil connecting conductor 53 are processed in two layers, the first layer is 25 μm, and the second layer is 35 μm, in a quadrangular prism shape and 60 μm in height.
In this embodiment, the magnetic core 2 is made of NiFe alloy material and has a thickness of 25 μm.
The manufacturing method of the MEMS fluxgate sensor comprises the following steps:
s1, manufacturing an overlay alignment mark on a substrate material so as to improve alignment precision during exposure, then sputtering a seed layer, then patterning a bottom coil pattern through a photoetching process, then manufacturing a metal line of the bottom coil through an electroplating process, and removing photoresist;
s2, continuously patterning a first layer of pillar patterns connected with the conductor pillars on the manufactured metal lines, manufacturing the first layer of pillars by using an electroplating process, and removing the photoresist and the seed layer after the manufacturing is finished;
s3, spin-coating thick polyimide on the surface of the substrate by a spin-coating process to cover the first layer of the pillars, and performing high-temperature curing;
s4, removing the polyimide on the top of the first layer of pillars through a polishing process, flattening the whole substrate, and cleaning and drying the substrate;
s5, continuously sputtering a seed layer on the flattened substrate, patterning the conical magnetic force line collector through a photoetching process, and manufacturing the conical magnetic force line collector through an electroplating process;
s6, removing the photoresist, patterning the magnetic core pattern through a photoetching process, and manufacturing the magnetic core through an electroplating process;
s7, removing the photoresist, patterning a second layer of column sub-patterns connected with the conductor columns through a photoetching process, manufacturing second layers of columns through an electroplating process, and removing the photoresist and the seed layer;
s8, spin-coating thick polyimide on the surface of the substrate through a spin-coating process to cover the second layer of pillars, and performing high-temperature curing;
s9, removing the polyimide on the top of the second layer of columns through a polishing process, flattening the whole substrate, and cleaning and drying the substrate;
s10, continuously sputtering a seed layer on the flattened substrate, patterning the top coil through a photoetching process, manufacturing metal lines of the top coil through an electroplating process, and removing photoresist after manufacturing;
s11, patterning an electrode pin pattern through a photoetching process, manufacturing an electrode pin through an electroplating process, and then removing the photoresist and the seed layer;
s12, spin-coating a thick polyimide protective film on the whole device;
and S13, removing the polyimide on the top of the electrode pin by a polishing process.
The MEMS fluxgate sensor is manufactured by adopting a Micro Electro Mechanical System (MEMS) technology, and an alignment mark is firstly manufactured on a substrate material so as to improve alignment precision during exposure; then, a seed layer is sputtered, and the bottom layer coil and the first layer of connecting conductor post of the exciting coil and the detecting coil are manufactured by utilizing the photoetching technology and the electroplating technology; filling and leveling by utilizing a polyimide spin coating process, then sputtering a seed layer again, manufacturing a NiFe conical magnetic line concentrator by adopting photoetching and electroplating technologies, and annealing; and continuously manufacturing the FeNi magnetic core and the second layer connecting conductor column by adopting photoetching and micro-electroplating processes, removing the bottom layer by adopting an ion beam etching technology, filling and leveling by adopting a spin-coating polyimide process, then sputtering the seed layer again, manufacturing top coils and electrode pins of the excitation coil and the detection coil by utilizing photoetching and micro-electroplating technologies, filling and leveling by utilizing the polyimide process, and finally only exposing the electrode pins.
The MEMS fluxgate technology utilizing the tapered magnetic force line collector can realize that the manufacturing process is compatible with the IC process, can be manufactured together with a matched detection circuit, realizes that the whole sensor not only has the advantages of thinness and miniaturization of the original fluxgate, but also has the advantages of high sensitivity, repeatability, dynamic property and impact resistance, greatly promotes the practical application process of the MEMS fluxgate, and particularly in the field of high-precision weak magnetic field detection.
Other embodiments of the present invention than the preferred embodiments described above will be apparent to those skilled in the art from the present invention, and various changes and modifications can be made therein without departing from the spirit of the present invention as defined in the appended claims.
Claims (4)
1. The utility model provides a MEMS fluxgate sensor based on toper type magnetic force line collector, its characterized in that includes magnetic core, two sets of toper type magnetic force line collectors, two sets of exciting coil, detection coil and four electrode pins, two sets of toper type magnetic force line collectors set up symmetrically both ends about the magnetic core, the tip of toper type magnetic force line collector is close to the magnetic core and with the interval has between the magnetic core, the detection coil is around establishing the periphery at magnetic core middle part, two sets of exciting coil are around establishing the magnetic core periphery of the left and right sides of detection coil, two sets of exciting coil link to each other, and the both ends of two sets of exciting coil are connected respectively on two of them electrode pins, the both ends of detection coil are connected respectively on two other electrode pins.
2. The MEMS fluxgate sensor based on the tapered magnetic line concentrator as claimed in claim 1, wherein the magnetic core comprises a first magnetic stripe portion and a second magnetic stripe portion, the first magnetic stripe portion and the second magnetic stripe portion are disposed in parallel and connected at left and right ends so that the whole magnetic core is "0" shaped, each set of excitation coil comprises two excitation coils, and the two excitation coils are respectively wound on the first magnetic stripe portion and the second magnetic stripe portion.
3. The MEMS fluxgate sensor based on the conical magnetic force line concentrator according to claim 1 or 2, wherein the MEMS fluxgate sensor is filled with polyimide, the polyimide is wrapped on the surfaces of the magnetic core, the two sets of conical magnetic force line concentrators, the two sets of excitation coils and the detection coil, and the four electrode pins are exposed on the surface of the MEMS fluxgate sensor.
4. A method of manufacturing a MEMS fluxgate sensor according to claims 1-3,
dividing the exciting coil and the detecting coil into a bottom coil, a connecting conductor post for connecting the bottom coil and the top coil, and the top coil in sequence;
the manufacturing method comprises the following steps:
s1, a seed layer is sputtered on a substrate material, then a bottom coil graph is patterned through a photoetching process, then a metal line of a bottom coil is manufactured through an electroplating process, and photoresist is removed;
s2, continuously patterning a first layer of pillar graph connected with the conductor pillar on the manufactured metal line, manufacturing the first layer of pillar by utilizing an electroplating process, and removing the photoresist and the seed layer after the manufacturing is finished;
s3, spin-coating thick polyimide on the surface of the substrate through a spin-coating process to cover the first layer of the post, and performing high-temperature curing;
s4, removing the polyimide on the top of the first layer of pillars through a polishing process, flattening the whole substrate, and cleaning and drying the substrate;
s5, continuously sputtering a seed layer on the flattened substrate, patterning the conical magnetic line concentrator through a photoetching process, and manufacturing the conical magnetic line concentrator through an electroplating process;
s6, removing the photoresist, patterning the magnetic core pattern through a photoetching process, and manufacturing the magnetic core through an electroplating process;
s7, removing the photoresist, patterning a second layer of pillar patterns connected with the conductor pillars through a photoetching process, manufacturing second layers of pillars through an electroplating process, and removing the photoresist and the seed layer;
s8, spin-coating thick polyimide on the surface of the substrate by a spin-coating process to cover the second layer of pillars, and performing high-temperature curing;
s9, removing the polyimide on the top of the second layer of columns through a polishing process, flattening the whole substrate, and cleaning and drying the substrate;
s10, continuously sputtering a seed layer on the flattened substrate, patterning the top coil through a photoetching process, manufacturing a metal line of the top coil through an electroplating process, and removing photoresist after manufacturing is finished;
s11, patterning an electrode pin pattern through a photoetching process, manufacturing an electrode pin through an electroplating process, and then removing the photoresist and the seed layer;
s12, spin-coating a thick polyimide protective film on the whole device;
and S13, polishing away the polyimide on the top of the electrode pin by a polishing process.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210737848.7A CN115248403A (en) | 2022-06-27 | 2022-06-27 | MEMS fluxgate sensor based on conical magnetic gathering device and manufacturing method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210737848.7A CN115248403A (en) | 2022-06-27 | 2022-06-27 | MEMS fluxgate sensor based on conical magnetic gathering device and manufacturing method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN115248403A true CN115248403A (en) | 2022-10-28 |
Family
ID=83699637
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202210737848.7A Pending CN115248403A (en) | 2022-06-27 | 2022-06-27 | MEMS fluxgate sensor based on conical magnetic gathering device and manufacturing method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN115248403A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116997244A (en) * | 2023-08-01 | 2023-11-03 | 北京航空航天大学青岛研究院 | Magnetic flux collector, manufacturing method thereof and magnetic sensing chip |
Citations (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1564276A (en) * | 2004-04-22 | 2005-01-12 | 上海交通大学 | Mini magnetic core solenoidal microinduction element and its prepn. method |
| CN101481083A (en) * | 2009-02-12 | 2009-07-15 | 上海交通大学 | Miniaturized fluxgate sensor of micro-electro-mechanism system |
| CN101481080A (en) * | 2009-02-12 | 2009-07-15 | 上海交通大学 | Method for manufacturing miniaturized fluxgate sensor |
| CN101650412A (en) * | 2009-08-28 | 2010-02-17 | 中国科学院电工研究所 | Nuclear magnetic resonance radio-frequency micro-coil and manufacturing method thereof |
| CN101672901A (en) * | 2008-09-05 | 2010-03-17 | 哈尔滨工业大学 | Method for manufacturing micro fluxgate sensor |
| CN101885467A (en) * | 2010-07-28 | 2010-11-17 | 上海交通大学 | Manufacturing method of micro fluxgate sensor with amorphous magnetic core |
| CN101907690A (en) * | 2010-07-28 | 2010-12-08 | 上海交通大学 | Miniaturized amorphous magnetically soft alloy magnetic core solenoid flux gate sensor |
| CN102353913A (en) * | 2011-07-13 | 2012-02-15 | 中国人民解放军国防科学技术大学 | Measuring transducer driven by monoaxial piezoelectricity for low-intensity magnetic field |
| CN102981131A (en) * | 2012-11-16 | 2013-03-20 | 上海交通大学 | Low-noise micro plane fluxgate sensor based on main and auxiliary coil double incentive |
| CN103116144A (en) * | 2013-01-22 | 2013-05-22 | 中国人民解放军国防科学技术大学 | Z-direction magnetic field sensor with magnetic orbit structure |
| CN103323794A (en) * | 2013-06-21 | 2013-09-25 | 中国人民解放军国防科学技术大学 | GMR-MEMS integrated weak magnetic sensor adopting plane micro-coil |
| CN106569154A (en) * | 2016-11-15 | 2017-04-19 | 上海交通大学 | Three-shaft fluxgate sensor |
| CN106569153A (en) * | 2016-11-15 | 2017-04-19 | 上海交通大学 | Fluxgate sensor chip |
| CN109682882A (en) * | 2019-01-24 | 2019-04-26 | 电子科技大学 | A kind of Eddy Current Testing Transducer of high spatial resolution |
| CN113460955A (en) * | 2021-06-30 | 2021-10-01 | 上海交通大学 | Manufacturing method of fast micro-electromechanical fluxgate chip |
| CN114415086A (en) * | 2022-01-06 | 2022-04-29 | 中国科学院空天信息创新研究院 | Two-stage amplification low-frequency magnetoresistive sensor and preparation method thereof |
-
2022
- 2022-06-27 CN CN202210737848.7A patent/CN115248403A/en active Pending
Patent Citations (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1564276A (en) * | 2004-04-22 | 2005-01-12 | 上海交通大学 | Mini magnetic core solenoidal microinduction element and its prepn. method |
| CN101672901A (en) * | 2008-09-05 | 2010-03-17 | 哈尔滨工业大学 | Method for manufacturing micro fluxgate sensor |
| CN101481083A (en) * | 2009-02-12 | 2009-07-15 | 上海交通大学 | Miniaturized fluxgate sensor of micro-electro-mechanism system |
| CN101481080A (en) * | 2009-02-12 | 2009-07-15 | 上海交通大学 | Method for manufacturing miniaturized fluxgate sensor |
| CN101650412A (en) * | 2009-08-28 | 2010-02-17 | 中国科学院电工研究所 | Nuclear magnetic resonance radio-frequency micro-coil and manufacturing method thereof |
| CN101885467A (en) * | 2010-07-28 | 2010-11-17 | 上海交通大学 | Manufacturing method of micro fluxgate sensor with amorphous magnetic core |
| CN101907690A (en) * | 2010-07-28 | 2010-12-08 | 上海交通大学 | Miniaturized amorphous magnetically soft alloy magnetic core solenoid flux gate sensor |
| CN102353913A (en) * | 2011-07-13 | 2012-02-15 | 中国人民解放军国防科学技术大学 | Measuring transducer driven by monoaxial piezoelectricity for low-intensity magnetic field |
| CN102981131A (en) * | 2012-11-16 | 2013-03-20 | 上海交通大学 | Low-noise micro plane fluxgate sensor based on main and auxiliary coil double incentive |
| CN103116144A (en) * | 2013-01-22 | 2013-05-22 | 中国人民解放军国防科学技术大学 | Z-direction magnetic field sensor with magnetic orbit structure |
| CN103323794A (en) * | 2013-06-21 | 2013-09-25 | 中国人民解放军国防科学技术大学 | GMR-MEMS integrated weak magnetic sensor adopting plane micro-coil |
| CN106569154A (en) * | 2016-11-15 | 2017-04-19 | 上海交通大学 | Three-shaft fluxgate sensor |
| CN106569153A (en) * | 2016-11-15 | 2017-04-19 | 上海交通大学 | Fluxgate sensor chip |
| CN109682882A (en) * | 2019-01-24 | 2019-04-26 | 电子科技大学 | A kind of Eddy Current Testing Transducer of high spatial resolution |
| CN113460955A (en) * | 2021-06-30 | 2021-10-01 | 上海交通大学 | Manufacturing method of fast micro-electromechanical fluxgate chip |
| CN114415086A (en) * | 2022-01-06 | 2022-04-29 | 中国科学院空天信息创新研究院 | Two-stage amplification low-frequency magnetoresistive sensor and preparation method thereof |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116997244A (en) * | 2023-08-01 | 2023-11-03 | 北京航空航天大学青岛研究院 | Magnetic flux collector, manufacturing method thereof and magnetic sensing chip |
| CN116997244B (en) * | 2023-08-01 | 2024-05-31 | 北京航空航天大学青岛研究院 | Magnetic flux collector, manufacturing method thereof and magnetic sensing chip |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US8587300B2 (en) | Magneto-impedance sensor element and method for producing the same | |
| US10066940B2 (en) | Single-chip differential free layer push-pull magnetic field sensor bridge and preparation method | |
| US7834620B2 (en) | Orthogonal fluxgate magnetic field sensor | |
| CN103105592B (en) | Single-chip three-shaft magnetic field sensor and production method | |
| CN102981131B (en) | Low-noise micro plane fluxgate sensor based on main and auxiliary coil double incentive | |
| CN103033770A (en) | Giant magneto-impedance effect two-dimensional magnetic field sensor | |
| CN103116144B (en) | Z-direction magnetic field sensor with magnetic orbit structure | |
| CN103323795B (en) | Integrated three-axis magnetic sensor | |
| JP6302613B1 (en) | Manufacturing method of nano coil type GSR sensor element | |
| US6690164B1 (en) | Perpendicular detection fluxgate micromagnetometer and method for the production thereof | |
| CN103116143A (en) | Integrated high-accuracy triaxial magnetic sensor | |
| CN101907690A (en) | Miniaturized amorphous magnetically soft alloy magnetic core solenoid flux gate sensor | |
| CN103274351B (en) | Electrochemistry geophone electrode sensitive core based on MEMS and manufacturing method thereof | |
| WO1993008450A1 (en) | Thin film compass and method for manufacturing the same | |
| CN115248403A (en) | MEMS fluxgate sensor based on conical magnetic gathering device and manufacturing method thereof | |
| CN113460955B (en) | Method for manufacturing fast microcomputer electromagnetic passgate chip | |
| CN104614690A (en) | Micro-array type fluxgate sensor | |
| CN106443525B (en) | Torsional mode micro-mechanical magnetic field sensor and preparation method thereof | |
| CN106569154A (en) | Three-shaft fluxgate sensor | |
| Shanglin et al. | Flexible-substrate Fluxgate Current Sensor Based on MEMS Technology. | |
| CN115113111A (en) | Sensor structure and preparation method thereof | |
| CN114879103A (en) | Preparation method and structure of micro-electromechanical fluxgate sensor | |
| CN218122222U (en) | MEMS fluxgate sensor based on multiple annular magnetic cores | |
| CN204359918U (en) | A kind of microminiaturized Crossed Circle fluxgate sensor | |
| Liu et al. | Improved performance of the micro planar double-axis fluxgate sensors with different magnetic core materials and structures |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20221028 |