CN115196604A - Centrifugal airflow opposite-impact type hexagonal boron nitride powder purifying device - Google Patents
Centrifugal airflow opposite-impact type hexagonal boron nitride powder purifying device Download PDFInfo
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- CN115196604A CN115196604A CN202210786360.3A CN202210786360A CN115196604A CN 115196604 A CN115196604 A CN 115196604A CN 202210786360 A CN202210786360 A CN 202210786360A CN 115196604 A CN115196604 A CN 115196604A
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- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 title claims abstract description 51
- 238000000746 purification Methods 0.000 claims abstract description 64
- 238000001816 cooling Methods 0.000 claims abstract description 60
- 230000007246 mechanism Effects 0.000 claims abstract description 32
- 238000005406 washing Methods 0.000 claims abstract description 21
- 239000000463 material Substances 0.000 claims description 88
- 239000006185 dispersion Substances 0.000 claims description 69
- 239000000843 powder Substances 0.000 claims description 68
- 238000006243 chemical reaction Methods 0.000 claims description 55
- 235000017166 Bambusa arundinacea Nutrition 0.000 claims description 35
- 235000017491 Bambusa tulda Nutrition 0.000 claims description 35
- 241001330002 Bambuseae Species 0.000 claims description 35
- 235000015334 Phyllostachys viridis Nutrition 0.000 claims description 35
- 239000011425 bamboo Substances 0.000 claims description 35
- 230000000149 penetrating effect Effects 0.000 claims description 25
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 19
- 238000004140 cleaning Methods 0.000 claims description 17
- 238000012546 transfer Methods 0.000 claims description 16
- 239000004065 semiconductor Substances 0.000 claims description 11
- 238000009826 distribution Methods 0.000 claims description 10
- 238000005057 refrigeration Methods 0.000 claims description 6
- 125000004122 cyclic group Chemical group 0.000 claims description 5
- 238000010438 heat treatment Methods 0.000 claims description 5
- 230000005540 biological transmission Effects 0.000 claims description 4
- 238000003756 stirring Methods 0.000 claims description 4
- 239000000758 substrate Substances 0.000 claims description 4
- 238000005096 rolling process Methods 0.000 claims description 3
- 238000005119 centrifugation Methods 0.000 claims description 2
- 239000002994 raw material Substances 0.000 claims description 2
- 239000000203 mixture Substances 0.000 claims 1
- 239000007769 metal material Substances 0.000 abstract description 2
- 239000007789 gas Substances 0.000 description 85
- 230000009471 action Effects 0.000 description 17
- 229910052582 BN Inorganic materials 0.000 description 15
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- 238000000034 method Methods 0.000 description 12
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- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 5
- 235000011089 carbon dioxide Nutrition 0.000 description 5
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- 238000007599 discharging Methods 0.000 description 5
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- 238000005516 engineering process Methods 0.000 description 4
- CSJDCSCTVDEHRN-UHFFFAOYSA-N methane;molecular oxygen Chemical compound C.O=O CSJDCSCTVDEHRN-UHFFFAOYSA-N 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 230000000903 blocking effect Effects 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 238000011010 flushing procedure Methods 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000009776 industrial production Methods 0.000 description 2
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- 229910002804 graphite Inorganic materials 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
- C01B21/064—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with boron
- C01B21/0648—After-treatment, e.g. grinding, purification
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto
- B08B9/08—Cleaning containers, e.g. tanks
- B08B9/087—Cleaning containers, e.g. tanks by methods involving the use of tools, e.g. brushes, scrapers
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/80—Compositional purity
Abstract
The invention discloses a centrifugal airflow hedging type hexagonal boron nitride powder purifying device which comprises a purifying and cooling box, a heat flow centrifugal purifying mechanism, a purifying airflow hedging disturbing mechanism and a washing box, wherein the heat flow centrifugal purifying mechanism penetrates through the upper wall inside the purifying and cooling box, the purifying airflow hedging disturbing mechanism is arranged on the side wall of the heat flow centrifugal purifying mechanism, and the washing box penetrates through and is fixedly arranged on the lower wall of the purifying and cooling box. The invention belongs to the technical field of inorganic non-metallic material treatment, and particularly provides a centrifugal airflow hedging type hexagonal boron nitride powder purification device.
Description
Technical Field
The invention belongs to the technical field of inorganic non-metallic material treatment, and particularly relates to a centrifugal airflow counter-impact type hexagonal boron nitride powder purification device.
Background
Hexagonal boron nitride is a novel composite material, the crystal structure of which is very similar to that of graphite, and the hexagonal boron nitride not only has the advantages of low density, high melting point, low hardness, good thermal shock resistance and machinability, but also has excellent performances of high temperature resistance, small thermal expansion coefficient, high thermal conductivity, low dielectric constant, reliable electrical insulation and the like.
The existing purification and purification technology of hexagonal boron nitride has more problems:
(1) The prior art generally adopts the method of improving the purity of raw materials or strengthening acid washing, the method not only improves the purification cost, but also only can effectively remove metal impurities in hexagonal boron nitride, and the removal efficiency of carbon-oxygen impurities is low, so that the industrial production requirement is difficult to meet;
(2) The prior art is generally a purification technology in the production process of hexagonal boron nitride, and lacks a purification technology of hexagonal boron nitride finished by conventional industrial production;
(3) The purification technology after the production of the existing hexagonal boron nitride is mainly screening purification of a physical layer, and does not relate to the problem of effectively removing carbon-oxygen impurities in the hexagonal boron nitride, and the impurities are not removed sufficiently, so that the efficiency is lower.
Disclosure of Invention
In order to overcome the defects of the prior art, the invention provides a centrifugal airflow hedging type hexagonal boron nitride powder purification device, aiming at the technical problem that carbon and oxygen impurities in hexagonal boron nitride are difficult to remove, the removal efficiency of the device on the carbon and oxygen impurities in the hexagonal boron nitride is obviously improved by introducing special gas to carry out chemical reaction purification treatment on materials, aiming at the technical problems that the removal of the hexagonal boron nitride impurities is insufficient and the efficiency is low in the prior art, the hexagonal boron nitride powder is chemically treated by utilizing clash generated by hot airflow and the materials under the centrifugal action, the sufficiency of the device on the material purification treatment is obviously improved by arranging a heat flow centrifugal purification mechanism and a purified airflow hedging disturbance mechanism, and the problem that the purification efficiency of the hexagonal boron nitride powder is low in the prior art is effectively solved.
The technical scheme adopted by the invention is as follows: the scheme provides a centrifugal airflow hedging type hexagonal boron nitride powder purifying device which comprises a purifying and cooling box, a heat flow centrifugal purifying mechanism, a purified airflow hedging disturbing mechanism and a washing box, wherein the heat flow centrifugal purifying mechanism penetrates through the upper wall inside the purifying and cooling box, the purified airflow hedging disturbing mechanism is arranged on the side wall of the heat flow centrifugal purifying mechanism, the washing box penetrates through and is fixedly arranged on the lower wall of the purifying and cooling box, and the heat flow centrifugal purifying mechanism and the purified airflow hedging disturbing mechanism carry out chemical treatment on hexagonal boron nitride powder by utilizing the hedging generated by hot airflow and materials under centrifugal action, so that the full degree of the equipment on the material purification treatment is remarkably improved, and the problem of low purification efficiency of the hexagonal boron nitride powder in the prior art is effectively solved; the heat flow centrifugal purification mechanism comprises a feeding device, a centrifugal thermal reaction cylinder and a centrifugal power device, the feeding device is arranged on the upper wall of a purification and cooling box in a penetrating and rotating mode, the centrifugal thermal reaction cylinder is arranged on the side wall of the feeding device in a penetrating and fixed mode in an annular equidistant array mode, the centrifugal thermal reaction cylinder is arranged inside the purification and cooling box, the centrifugal power device is arranged on the bottom wall of the purification and cooling box, the centrifugal power device is connected with the feeding device in a transmission mode, the purification and airflow hedging disturbance mechanism comprises a gas conveying device, a gas dispersion ring and an output pipe, the gas conveying device is fixedly arranged on the upper wall of the purification and cooling box in a penetrating and penetrating mode, the gas dispersion ring is fixedly arranged on the upper wall of the purification and cooling box, the gas dispersion ring is rotatably sleeved on the outer wall of the feeding device, the output pipe is fixedly arranged on the upper wall of the centrifugal thermal reaction cylinder in a penetrating mode respectively, and the gas conveying device, the gas dispersion ring and the output pipe are sequentially connected in a penetrating mode.
Further, feeding device includes the toper charge tank, powder dispersion section of thick bamboo and annular gas shift tank, the toper charge tank rotates and locates purification cooling case upper wall, the powder dispersion section of thick bamboo runs through fixed locating toper charge tank lower wall, the fixed peripheral outer wall of powder dispersion section of thick bamboo that locates of annular gas shift tank, toper charge tank circumference inside wall is fixed and is equipped with annular airflow baffle and atmospheric pressure closed base plate, atmospheric pressure closed base plate upper wall slides and is equipped with toper guide closed head, annular airflow baffle middle part is located to toper guide closed head, powder dispersion section of thick bamboo lateral wall upper edge runs through and is equipped with gaseous check valve, powder dispersion section of thick bamboo outside wall is equipped with the blast pipe, tip and the gaseous check valve through connection that the blast pipe is close to the powder dispersion section of thick bamboo, the tip that the powder dispersion section of thick bamboo was kept away from to the blast pipe runs through purification cooling case upper wall and locates purification cooling case outside, the inside dynamic dispersion ring chamber that is equipped with of annular gas shift tank.
Further, the annular equidistant array of centrifugal thermal reaction cylinder is distributed and runs through and locates powder dispersion section of thick bamboo circumference lateral wall, the fixed hot plate that is equipped with of inside circumference lateral wall of centrifugal thermal reaction cylinder, the tip lower wall that centrifugal thermal reaction cylinder kept away from the powder dispersion section of thick bamboo runs through and is equipped with the powder delivery opening, the fixed storehouse electric putter that is equipped with of tip lateral wall that centrifugal thermal reaction cylinder kept away from the powder dispersion section of thick bamboo, the coaxial fixed striker plate that is equipped with of storehouse electric putter output, the striker plate slides and closely pastes and locates centrifugal thermal reaction cylinder inner wall, the striker plate is close to the lateral wall of powder dispersion section of thick bamboo and is equipped with arc spoiler surface, the fixed semiconductor refrigeration piece that is equipped with of centrifugal thermal reaction cylinder outer wall, the semiconductor refrigeration piece is located the hot plate outside.
Further, centrifugal power device includes centrifugal motor and centrifugal power axle, and the centrifugal motor is fixed to be located and purifies the inside diapire of cooling case, and the inside diapire of cooling case is located in the rotation of centrifugal power axle, and centrifugal power axle upper end and powder dispersion section of thick bamboo lower wall fixed connection, toper charging chute, powder dispersion section of thick bamboo and centrifugal power axle top-down coaxial fixed connection in proper order, and the coaxial fixed centrifugal power gear that is equipped with of centrifugal motor output, and the coaxial fixed centrifugal driven gear that is equipped with of centrifugal power axle lower extreme, centrifugal power gear and the meshing of centrifugal driven gear.
Preferably, the gas dispersing ring is rotatably clamped on the peripheral outer wall of the powder dispersing cylinder, a fixed dispersing ring cavity is arranged in the gas dispersing ring, the lower wall of the gas dispersing ring is annularly distributed in an equidistant array and penetrates through the gas circulation holes, and the lower wall of the gas dispersing ring is rotatably clamped with the upper wall of the annular gas transfer groove.
Preferably, the end part of the output pipe far away from the powder dispersion cylinder is fixedly arranged on the inner upper wall of the centrifugal thermal reaction cylinder, the end part of the output pipe close to the powder dispersion cylinder penetrates through and is fixedly arranged on the circumferential side wall of the annular gas transfer groove, and the end part of the output pipe far away from the powder dispersion cylinder is fixedly provided with an output air nozzle facing the side wall of the striker plate.
According to the scheme, the gas conveying device comprises a gas storage tank, a gas conveying pipe and a conveying pump, the gas storage tank penetrates through and is fixedly arranged on the upper wall of the purification and cooling box, the gas conveying pipe penetrates through and is fixedly arranged on the upper wall of the purification and cooling box, the upper end of the gas conveying pipe is in through connection with the lower end of the gas storage tank, the conveying pump is fixedly arranged on the upper wall of the purification and cooling box, the conveying pump penetrates through and is arranged in the middle of the gas conveying pipe, and the lower end of the gas conveying pipe is in through connection with the side wall of the gas dispersing ring.
As the further preferred of this scheme, it is equipped with annular baffle box to purify the inside diapire of cooling case, annular baffle box inside wall lower edge is equipped with the annular power groove that gathers materials, annular baffle box diapire runs through and is equipped with the hole of gathering materials, the fixed cyclic annular power rack that gathers materials that is equipped with of the inside upper wall of power groove that gathers materials, the annular power groove inner wall that gathers materials slides and is equipped with the slider that gathers materials, it gathers materials fixed the walking motor that is equipped with of slider lateral wall and gathers materials and cleans the motor, gather materials and walk the coaxial fixed walking power gear that is equipped with of motor output that gathers materials, it gathers materials to walk power gear and cyclic annular power rack meshing, gather materials and clean the coaxial fixed flexible cleaning wheel that is equipped with of motor output, flexible cleaning wheel and the inside diapire rolling contact of annular baffle box.
As the further preferred of this scheme, wash the case upper wall and run through fixed the collecting pipe that is equipped with, collecting pipe upper end and collecting hole through connection, wash the case lateral wall and run through and be equipped with the water pipe head, wash the incasement portion upper wall and be equipped with the mixer, wash incasement wall and slide and be equipped with and accept uncovered case.
The invention with the structure has the following beneficial effects:
(1) The heat flow centrifugal purification mechanism and the purified air flow opposite-impact disturbance mechanism carry out chemical treatment on the hexagonal boron nitride powder by utilizing the collision of hot air flow and materials under the centrifugal action, so that the sufficiency of the equipment for purifying the materials is obviously improved, and the problem of lower purification efficiency of the hexagonal boron nitride powder in the prior art is effectively solved;
(2) The centrifugal thermal reaction cylinder disperses the hexagonal boron nitride powder into a plurality of groups by using an array arrangement mode, so that the phenomenon of insufficient purification treatment caused by concentrated accumulation of materials is avoided;
(3) Arc turbulence surface for CO 2 Gas has smooth turning ability and can be used for CO 2 The influence of the kinetic energy of the gas is small, and the baffle plate effectively improves CO with the help of the arc-shaped turbulent flow surface 2 Impact ability of gas on hexagonal boron nitride powder;
(4) The conical material guiding sealing head and the annular airflow baffle plate are automatically opened and closed under the action of gravity and air pressure, so that the possibility that the hexagonal boron nitride powder flies out of the equipment under the action of airflow in the purification treatment process is effectively reduced without other control modes, the material loss is reduced, and the environmental protection requirement is met;
(5) Semiconductor refrigeration spare utilizes the warm sagger effect to heat centrifugal hot reaction section of thick bamboo, carries out the cooling treatment to annular baffle box simultaneously, when improving material chemical reaction purification efficiency, makes the material can realize the cold water washing, has avoided the material to be slightly soluble in water because of overheated, has reduced the material loss.
Drawings
FIG. 1 is a schematic structural diagram of a centrifugal gas flow counter-impact type hexagonal boron nitride powder purification device provided by the present invention;
FIG. 2 is a schematic structural view of the interior of the purification and cooling box according to the present invention;
FIG. 3 is a schematic structural diagram of a heat flow centrifugal purification mechanism and a purification air flow hedging disturbance mechanism according to the present invention;
FIG. 4 is a schematic cross-sectional view of a conical feed vessel according to the present invention;
FIG. 5 is a schematic structural diagram of a powder dispersing cylinder and an annular gas transfer groove according to the present invention;
FIG. 6 is a schematic cross-sectional view of a centrifugal thermal reaction cylinder according to the present invention;
FIG. 7 is a side sectional view of a centrifugal thermal reactor according to the present invention;
FIG. 8 is a schematic structural diagram of a centrifugal power device according to the present invention;
FIG. 9 is a schematic cross-sectional view of a gas distribution ring according to the present invention;
FIG. 10 is a schematic structural diagram of a gas delivery device according to the present invention;
fig. 11 is a side sectional view of a part of a ring-shaped material guide chute according to the present invention;
FIG. 12 is a schematic structural view of a collection slide according to the present invention;
fig. 13 is a side sectional view of a water washing tank according to the present invention.
The device comprises a cleaning and cooling box 1, a cleaning and cooling box 11, an annular guide chute 111, an annular collecting power chute 1110, an annular collecting power rack 1111, a collecting slide block 1112, a collecting traveling motor 1113, a collecting cleaning motor 1114, a traveling power gear 1115, a flexible cleaning wheel 112, a collecting hole 2, a heat flow centrifugal cleaning mechanism 21, a feeding device 211, a conical feeding tank 2110, an annular airflow baffle 2111, an air pressure closed base plate 2112, a conical guide closing head 212, a powder dispersing cylinder, 2120, a gas one-way valve 2121, an exhaust pipe 213, an annular gas transfer tank 2130, a dynamic dispersing ring cavity 2130, a centrifugal thermal reaction cylinder 22, 221, a conical guide closing head 222, a powder outlet port 223, a bin outlet electric rod 2230, a material baffle 2231, an arc-shaped flow disturbing surface 224, a semiconductor refrigerating element 23, a centrifugal power device 231, a centrifugal power device 2310, a centrifugal power gear 232, a centrifugal power shaft 232, a pushing rod 2320, a centrifugal power gear 3, a gas receiving and conveying device 33, a centrifugal gas flow disturbing and conveying pipe head 33, a centrifugal water conveying pipe 31, a centrifugal power conveying device 33, a centrifugal water conveying pipe 33, a centrifugal power conveying device 33, a centrifugal power pipe head 33, a centrifugal power device 33, a centrifugal heat-conveying device 33, a centrifugal water conveying device 33, a centrifugal power device 33, a centrifugal heat-collecting pipe 32, a centrifugal power device 33, a centrifugal heat-conveying device, a centrifugal heat-collecting pipe 32, a centrifugal heat-distributing ring.
The accompanying drawings, which are included to provide a further understanding of the invention and are incorporated in and constitute a part of this specification, illustrate embodiments of the invention and together with the description serve to explain the principles of the invention and not to limit the invention.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments; all other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
In the description of the present invention, it is to be understood that the terms "upper", "lower", "front", "rear", "left", "right", "top", "bottom", "inner", "outer", and the like, indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for convenience in describing the present invention and simplifying the description, but do not indicate or imply that the device or element referred to must have a particular orientation, be constructed in a particular orientation, and be operated, and thus should not be construed as limiting the present invention.
Example (b): referring to fig. 1-3, a centrifugal airflow hedging type hexagonal boron nitride powder purifying device comprises a purifying and cooling box 1, a heat flow centrifugal purifying mechanism 2, a purifying airflow hedging disturbing mechanism 3 and a washing box 4, wherein the heat flow centrifugal purifying mechanism 2 is arranged on the upper wall of the purifying and cooling box 1 in a penetrating manner, the purifying airflow hedging disturbing mechanism 3 is arranged on the side wall of the heat flow centrifugal purifying mechanism 2, and the washing box 4 is fixedly arranged on the lower wall of the purifying and cooling box 1 in a penetrating manner; the heat flow centrifugal purification mechanism 2 comprises a feeding device 21, a centrifugal thermal reaction cylinder 22 and a centrifugal power device 23, the feeding device 21 is arranged on the upper wall of the purification and cooling box 1 in a penetrating and rotating mode, the centrifugal thermal reaction cylinder 22 is fixedly arranged on the side wall of the feeding device 21 in an annular equidistant array mode, the centrifugal thermal reaction cylinder 22 is arranged inside the purification and cooling box 1, the centrifugal power device 23 is arranged on the bottom wall inside the purification and cooling box 1, the centrifugal power device 23 is in transmission connection with the feeding device 21, the purification and gas flow opposite-flushing disturbance mechanism 3 comprises a gas conveying device 31, a gas dispersion ring 32 and an output pipe 33, the gas conveying device 31 is fixedly arranged on the upper wall of the purification and cooling box 1 in a penetrating and rotating mode, the gas dispersion ring 32 is sleeved on the outer wall of the feeding device 21 in a rotating mode, the output pipe 33 is fixedly arranged on the upper wall of the centrifugal thermal reaction cylinder 22 in a penetrating and connecting mode, and the gas conveying device 31, the gas dispersion ring 32 and the output pipe 33 are sequentially connected in a penetrating and connecting mode.
For carbon-oxygen impurities difficult to remove in hexagonal boron nitride powder, dry ice is preferably used as a gas medium in the embodiment, and CO generated by sublimation of dry ice is used 2 The hexagonal boron nitride powder is impacted by air flow, and carbon impurities in the hexagonal boron nitride can react with CO under the high-temperature condition 2 The reaction is carried out, and the reaction is carried out,the oxygen-containing impurities in the hexagonal boron nitride are mainly Na 2 O，Na 2 O at high temperature and CO introduction 2 Under the conditions of (a) to produce the following chemical reaction:
2Na 2 O+O 2 ==2Na 2 O 2
2Na 2 O 2 +2CO 2 ==2Na 2 CO 3 +O 2
introducing CO into hexagonal boron nitride powder 2 The carbon-oxygen impurities in the hexagonal boron nitride can be subjected to chemical reaction to generate water-soluble compounds.
Referring to fig. 4 and 5, the feeding device 21 includes a conical feeding tank 211, a powder dispersing cylinder 212 and an annular gas transferring tank 213, the conical feeding tank 211 is rotatably disposed on the upper wall of the purification and cooling box 1, the powder dispersing cylinder 212 is fixedly disposed on the lower wall of the conical feeding tank 211, the annular gas transferring tank 213 is fixedly sleeved on the outer circumferential wall of the powder dispersing cylinder 212, the inner circumferential wall of the conical feeding tank 211 is fixedly provided with an annular airflow baffle 2110 and an air pressure sealing substrate 2111, the upper wall of the air pressure sealing substrate 2111 is slidably provided with a conical material guiding sealing head 2112, the conical material guiding sealing head 2112 is disposed in the middle of the annular airflow baffle, the upper edge of the sidewall of the powder dispersing cylinder 212 is provided with a gas one-way valve 2110, the outer sidewall of the powder dispersing cylinder 212 is provided with an exhaust pipe 2121, the end of the exhaust pipe 2121 close to the powder dispersing cylinder 212 is in through connection with the gas one-way valve 2120, the end of the exhaust pipe 2121 far away from the powder dispersing cylinder 212 is disposed outside the purification and cooling box 1, and a dynamic dispersing ring 2130 is disposed inside the annular gas transferring tank 213.
Referring to fig. 6 and 7, the centrifugal thermal reaction cylinder 22 is disposed through the circumferential side wall of the powder dispersion cylinder 212 in an annular equidistant array, a heating plate 221 is fixedly disposed on the circumferential side wall inside the centrifugal thermal reaction cylinder 22, a powder outlet 222 is disposed through the lower wall of the end portion of the centrifugal thermal reaction cylinder 22 away from the powder dispersion cylinder 212, a discharging electric push rod 223 is fixedly disposed on the side wall of the end portion of the centrifugal thermal reaction cylinder 22 away from the powder dispersion cylinder 212, a material blocking plate 2230 is coaxially and fixedly disposed at an output end of the discharging electric push rod 223, the material blocking plate 2230 is slidably and closely attached to the inner wall of the centrifugal thermal reaction cylinder 22, an arc-shaped turbulent flow surface 2231 is disposed on the side wall of the material blocking plate 2230 close to the powder dispersion cylinder 212, a semiconductor cooling member 224 is fixedly disposed on the outer wall of the centrifugal thermal reaction cylinder 22, and the semiconductor cooling member 224 is disposed outside the heating plate 221.
Referring to fig. 8, the centrifugal power device 23 includes a centrifugal motor 231 and a centrifugal power shaft 232, the centrifugal motor 231 is fixedly disposed on the inner bottom wall of the purification and cooling box 1, the centrifugal power shaft 232 is rotatably disposed on the inner bottom wall of the purification and cooling box 1, the upper end of the centrifugal power shaft 232 is fixedly connected to the lower wall of the powder dispersion cylinder 212, the conical feeding tank 211, the powder dispersion cylinder 212 and the centrifugal power shaft 232 are sequentially and coaxially and fixedly connected from top to bottom, a centrifugal power gear 2310 is coaxially and fixedly disposed at the output end of the centrifugal motor 231, a centrifugal driven gear 2320 is coaxially and fixedly disposed at the lower end of the centrifugal power shaft 232, and the centrifugal power gear 2310 is engaged with the centrifugal driven gear 2320.
Referring to fig. 9, the gas distribution ring 32 is rotatably clamped to the outer circumferential wall of the powder distribution cylinder 212, a fixed distribution ring cavity 321 is formed in the gas distribution ring 32, gas flow holes 322 are formed in the lower wall of the gas distribution ring 32 in an annular equidistant array, and the lower wall of the gas distribution ring 32 is rotatably clamped to the upper wall of the annular gas transfer groove 213.
Referring to fig. 6 and 7, an end of the takeoff pipe 33 away from the powder dispersing cylinder 212 is fixedly disposed on an inner upper wall of the centrifugal thermal reaction cylinder 22, an end of the takeoff pipe 33 close to the powder dispersing cylinder 212 is fixedly disposed on a circumferential side wall of the annular gas transfer groove 213, an end of the takeoff pipe 33 away from the powder dispersing cylinder 212 is fixedly disposed with a takeoff tuyere 331, and the takeoff tuyere 331 faces a side wall of the striker 2230.
Referring to fig. 10, the gas delivery device 31 includes a gas tank 311, a gas delivery pipe 312 and a delivery pump 313, the gas tank 311 is fixedly disposed on the upper wall of the purification and cooling box 1, the gas delivery pipe 312 is fixedly disposed on the upper wall of the purification and cooling box 1, the upper end of the gas delivery pipe 312 is connected to the lower end of the gas tank 311 in a penetrating manner, the delivery pump 313 is fixedly disposed on the upper wall of the purification and cooling box 1, the delivery pump 313 is disposed in the middle of the gas delivery pipe 312 in a penetrating manner, and the lower end of the gas delivery pipe 312 is connected to the sidewall of the gas distribution ring 32 in a penetrating manner.
Referring to fig. 2, 11 and 12, an annular material guiding groove 11 is formed in the bottom wall of the interior of the purifying and cooling box 1, an annular material collecting power groove 111 is formed in the lower edge of the inner side wall of the annular material guiding groove 11, a material collecting hole 112 is formed in the bottom wall of the annular material guiding groove 11 in a penetrating manner, an annular material collecting power rack 1110 is fixedly arranged on the upper wall of the interior of the annular material collecting power groove 111, a material collecting slider 1111 is slidably arranged on the inner wall of the annular material collecting power groove 111, a material collecting walking motor 1112 and a material collecting cleaning motor 1113 are fixedly arranged on the side wall of the material collecting slider 1111, a walking power gear 1114 is coaxially and fixedly arranged at the output end of the material collecting walking motor 1112, the walking power gear 1114 is meshed with the annular material collecting power rack 1110, a flexible cleaning wheel 1115 is coaxially and fixedly arranged at the output end of the material collecting cleaning motor 1113, and the flexible cleaning wheel 1115 is in rolling contact with the bottom wall of the interior of the annular material guiding groove 11.
Referring to fig. 1 and 13, a material collecting pipe 41 is fixedly arranged on the upper wall of the washing tank 4 in a penetrating manner, the upper end of the material collecting pipe 41 is connected with a material collecting hole 112 in a penetrating manner, a water delivery pipe head 42 is arranged on the side wall of the washing tank 4 in a penetrating manner, a stirrer 43 is arranged on the upper wall inside the washing tank 4, and a receiving open tank 44 is arranged on the inner wall of the washing tank 4 in a sliding manner.
The implementation flow of this embodiment is as follows:
(1) Conveying materials;
(2) Centrifugation and CO 2 High-temperature collision is generated under the impact action, and the material is subjected to chemical treatment;
(3) Cooling, collecting and washing, and purifying the material.
The specific implementation manner of this embodiment is: before the centrifugal airflow opposite-flushing type hexagonal boron nitride powder purification device provided by the scheme is used for material purification treatment, firstly, gas generating materials, namely dry ice, are prepared, the dry ice is placed into the gas storage tank 311, the receiving open box 44 is placed into the water washing box 4, then, water is filled into the receiving open box 44 through the water conveying pipe head 42, in an initial state, the conical material guide sealing head 2112 and the annular airflow baffle 2110 are in a mutually separated state under the action of gravity, the bin outlet electric push rod 223 is in an extending state, and at the moment, the baffle 2230 separates the powder bin outlet 222 and the centrifugal thermal reaction cylinder 22.
The hexagonal boron nitride powder is added to the apparatus by the user from the conical feed tank 211 by means of a material delivery apparatus, and falls under gravity to the powder along the inner wall of 211 and the middle of the annular gas flow shield 2110Starting a centrifugal motor 231 inside a body dispersion cylinder 212, driving a centrifugal power gear 2310 to rotate by the centrifugal motor 231, driving a centrifugal power shaft 232 to rotate by the centrifugal power gear 2310 through a centrifugal driven gear 2320, driving a conical feeding tank 211, a powder dispersion cylinder 212 and an annular gas transfer tank 213 to synchronously rotate by the centrifugal power shaft 232, wherein a gas dispersion ring 32 is kept in a fixed state, the powder dispersion cylinder 212 rotates along the inner wall of the gas dispersion ring 32, in the rotation process of the powder dispersion cylinder 212, hexagonal boron nitride powder inside the powder dispersion cylinder 212 is respectively thrown into each centrifugal thermal reaction cylinder 22 under the action of centrifugal force until reaching the side edge of a baffle 2230, in the process, a heating plate 221 and a semiconductor refrigerating piece 224 are synchronously started, the heating plate 221 heats the hexagonal boron nitride powder inside the centrifugal thermal reaction cylinder 22, a semiconductor refrigerating piece 224 absorbs heat outside the centrifugal thermal reaction cylinder 22 and transfers the heat to the centrifugal thermal reaction cylinder 22, so that the temperature inside the centrifugal thermal reaction cylinder 22 rises again, and at the same time, starting air flow impact on the material, starting an operator starting a transfer pump 313, and enabling the transfer pump 313 to generate CO sublimated in a dry ice gas storage tank in the centrifugal thermal reaction cylinder 22 to generate CO 2 The gas is delivered through the gas delivery tube 312 to the fixed dispersion ring cavity 321 inside the gas dispersion ring 32 2 The gas is pressed into the annular gas transfer groove 213 through the gas circulation hole 322, and then is delivered into the centrifugal heat reaction cylinders 22 through the output pipes 33, respectively, and CO is 2 Gas is impacted on the arc-shaped turbulence surfaces 2231 on the side walls of the material baffle 2230 through the output air nozzles 331 respectively, and impacts the hexagonal boron nitride powder under the centrifugal action after being disturbed by the arc-shaped turbulence surfaces 2231, during the impact process, the air pressure inside the centrifugal thermal reaction cylinder 22 and the powder dispersion cylinder 212 is increased, the conical material guide closing head 2112 moves upwards under the air pressure action and contacts with the annular airflow baffle 2110, at the moment, the upper end of the powder dispersion cylinder 212 is closed by the conical material guide closing head 2112, and the gas inside the powder dispersion cylinder 212 is discharged out of the purification cooling box 1 through the gas one-way valve 2120 and the exhaust pipe 2121.
After the hot air flow treatment is finished, the hexagonal boron nitride powder starts to be cooled and washed by water to remove impurities in the hexagonal boron nitride, an operator closes the conveying pump 313 and starts each bin discharging electric push rod 223, the bin discharging electric push rods 223 synchronously contract, after the bin discharging electric push rods 223 contract, the powder bin outlet 222 is communicated with the centrifugal thermal reaction cylinder 22, the hexagonal boron nitride powder in the centrifugal thermal reaction cylinder 22 is thrown to the powder bin outlet 222 under the action of centrifugal force and falls onto the annular guide chute 11, the material slides to the bottom wall in the annular guide chute 11 under the action of gravity, the semiconductor refrigeration piece 224 cools the space below the centrifugal thermal reaction cylinder 22, namely the annular guide chute 11 is in a low-temperature state, the material is gradually cooled in the process that the hexagonal boron nitride powder slides along the inner side wall of the annular guide chute 11, the material collecting slide block 1111 collects the material on the bottom wall in the annular guide chute 11, the aggregate traveling motor 1112 operates and drives the traveling power gear 1114 to rotate, the traveling power gear 1114 enables the aggregate sliding block 1111 to move circularly along the interior of the annular aggregate power groove 111 through the annular aggregate power rack 1110, in the process, the aggregate cleaning motor 1113 operates and drives the flexible cleaning wheel 1115 to rotate, the flexible cleaning wheel 1115 stirs the material on the bottom wall of the annular guide groove 11, when the material reaches the aggregate hole 112, the material falls into the receiving open box 44 through the aggregate hole 112 and the aggregate pipe 41 under the action of gravity, the stirrer 43 stirs the material in the receiving open box 44, so that the material is washed, water-soluble impurities in the material are dissolved under the stirring action, and an operator filters and dries the washed material to obtain purified hexagonal boron nitride powder.
It is noted that, herein, relational terms such as first and second, and the like may be used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus.
Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.
The present invention and its embodiments have been described above, and the description is not intended to be limiting, and the drawings are only one embodiment of the present invention, and the actual structure is not limited thereto. In summary, those skilled in the art should be able to conceive of the present invention without creative design of the similar structural modes and embodiments without departing from the spirit of the present invention, and all such modifications should fall within the protection scope of the present invention.
Claims (10)
1. The utility model provides a centrifugal gas flow is towards formula hexagonal boron nitride powder purifier which characterized in that: comprises the steps of (a) preparing a mixture of a plurality of raw materials,
a purifying and cooling box (1);
the heat flow centrifugal purification mechanism (2) comprises a feeding device (21), a centrifugal thermal reaction cylinder (22) and a centrifugal power device (23), wherein the feeding device (21) is arranged on the upper wall of the purification and cooling box (1) in a penetrating and rotating mode, the centrifugal thermal reaction cylinder (22) is fixedly arranged on the side wall of the feeding device (21) in a penetrating and distributing mode in an annular equidistant array mode, the centrifugal thermal reaction cylinder (22) is arranged inside the purification and cooling box (1), the centrifugal power device (23) is arranged on the bottom wall inside the purification and cooling box (1), and the centrifugal power device (23) is in transmission connection with the feeding device (21);
the purified air flow hedging disturbing mechanism (3) is arranged on the side wall of the heat flow centrifugal purification mechanism (2);
the water washing tank (4) is fixedly arranged on the lower wall of the purification and cooling tank (1) in a penetrating manner.
2. The device for purifying hexagonal boron nitride powder in a counter-current mode by centrifugal airflow according to claim 1, wherein: purify air current hedging disturbance mechanism (3) and include gas delivery device (31), gas dispersion ring (32) and output tube (33), gas delivery device (31) run through fixed locating purification cooling case (1) upper wall, gas dispersion ring (32) are fixed to be located and are purified cooling case (1) inside upper wall, feeding device (21) outer wall is located to gas dispersion ring (32) rotation joint cover, output tube (33) run through respectively fixed locating centrifugation thermal reaction section of thick bamboo (22) upper wall, gas delivery device (31), gas dispersion ring (32) and output tube (33) are through-connected in proper order.
3. The device for purifying hexagonal boron nitride powder by counter-impact of centrifugal gas flow according to claim 2, wherein: feeding device (21) include toper feed tank (211), powder dispersion section of thick bamboo (212) and annular gas transfer tank (213), toper feed tank (211) rotates and locates purification cooling case (1) upper wall, powder dispersion section of thick bamboo (212) are run through fixed and are located toper feed tank (211) lower wall, powder dispersion section of thick bamboo (212) circumference outer wall is located to annular gas transfer tank (213) fixed cover, toper feed tank (211) circumference inside wall is fixed and is equipped with annular airflow baffle (2110) and atmospheric pressure closed substrate (2111), atmospheric pressure closed substrate (2111) upper wall slides and is equipped with toper guide closed head (2112), annular airflow baffle (2110) middle part is located to toper guide closed head (2112), powder dispersion section of thick bamboo (212) lateral wall top edge runs through and is equipped with gaseous check valve (2120), powder dispersion section of thick bamboo (212) outer wall is equipped with blast pipe (2121), blast pipe (2121) is close to the tip and the gaseous check valve (2120) link up of powder dispersion section of thick bamboo (212) and is kept away from the powder dispersion section of thick bamboo (2120), blast pipe (2121) is equipped with the inside cooling case (213) and purification cooling case (213) outside the end portion of purification cooling case (212) is located annular gas transfer chamber (2120).
4. The device of claim 3, wherein the device comprises: the annular equidistant array distribution of centrifugal thermal reaction section of thick bamboo (22) runs through and locates powder dispersion section of thick bamboo (212) circumference lateral wall, the fixed hot plate (221) that is equipped with of inside circumference lateral wall of centrifugal thermal reaction section of thick bamboo (22), the tip lower wall that powder dispersion section of thick bamboo (212) was kept away from in centrifugal thermal reaction section of thick bamboo (22) runs through and is equipped with powder warehouse exit (222), the fixed warehouse exit electric putter (223) that is equipped with of tip lateral wall of powder dispersion section of thick bamboo (212) is kept away from in centrifugal thermal reaction section of thick bamboo (22), warehouse exit electric putter (223) the coaxial fixed striker plate (2230) that is equipped with of output, striker plate (2230) slip and close subsides are located centrifugal thermal reaction section of thick bamboo (22) inner wall, the lateral wall that striker plate (2230) are close to powder dispersion section of thick bamboo (212) is equipped with arc spoiler (2231), centrifugal thermal reaction section of thick bamboo (22) outer wall is fixed and is equipped with semiconductor refrigeration spare (224), heating plate (221) outside are located to semiconductor refrigeration spare (224).
5. The device for purifying hexagonal boron nitride powder based on counter-current centrifugal airflow of claim 4, wherein: centrifugal power device (23) are including centrifugal motor (231) and centrifugal power axle (232), centrifugal motor (231) are fixed to be located and purify cooling case (1) inside diapire, centrifugal power axle (232) rotate to be located and purify cooling case (1) inside diapire, centrifugal power axle (232) upper end and powder dispersion section of thick bamboo (212) lower wall fixed connection, toper charging tray (211), powder dispersion section of thick bamboo (212) and centrifugal power axle (232) top-down coaxial fixed connection in proper order, centrifugal motor (231) and centrifugal power axle (232) transmission are connected.
6. The device of claim 5, wherein the device comprises: gas dispersion ring (32) rotate the joint cover and locate powder dispersion section of thick bamboo (212) circumference outer wall, inside fixed dispersion ring chamber (321) that is equipped with of gas dispersion ring (32), the cyclic annular equidistant array distribution of gas dispersion ring (32) lower wall runs through and is equipped with gas circulation hole (322), gas dispersion ring (32) lower wall and annular gas transfer groove (213) upper wall rotate the joint.
7. The device for purifying hexagonal boron nitride powder in a counter-current mode by centrifugal airflow according to claim 6, wherein: the end part of the output pipe (33) far away from the powder dispersion cylinder (212) is fixedly arranged on the inner upper wall of the centrifugal heat reaction cylinder (22), the end part of the output pipe (33) close to the powder dispersion cylinder (212) penetrates through and is fixedly arranged on the circumferential side wall of the annular gas transfer groove (213), and the end part of the output pipe (33) far away from the powder dispersion cylinder (212) is fixedly provided with an output air nozzle (331).
8. The device for purifying hexagonal boron nitride powder based on counter-current centrifugal airflow of claim 7, wherein: gas delivery device (31) include gas holder (311), gas delivery pipe (312) and delivery pump (313), gas holder (311) are run through fixed locate and are purified cooling case (1) upper wall, gas delivery pipe (312) are run through fixed locate and are purified cooling case (1) inside upper wall, gas delivery pipe (312) upper end and gas holder (311) lower extreme through connection, delivery pump (313) are fixed to be located and are purified cooling case (1) inside upper wall, delivery pump (313) are run through and are located gas delivery pipe (312) middle part, gas delivery pipe (312) lower extreme and gas dispersion ring (32) lateral wall through connection.
9. The apparatus of claim 8, wherein the apparatus comprises: purify cooling box (1) inside diapire and be equipped with annular baffle box (11), annular baffle box (11) inside wall lower edge is equipped with annular power groove (111) that gathers materials, annular baffle box (11) diapire runs through and is equipped with material gathering hole (112), the annular is gathered materials inside upper wall of power groove (111) and is fixed and be equipped with cyclic annular power rack (1110) that gathers materials, annular power groove (111) inner wall that gathers materials slides and is equipped with slider (1111) that gathers materials, slider (1111) lateral wall is fixed and is equipped with to gather materials and walks capable motor (1112) and gather materials and clean motor (1113), gather materials and walk capable motor (1112) output coaxial fixed and be equipped with and walk capable power gear (1114), it gathers materials power gear (1114) and cyclic annular power rack (1110) meshing to walk, gather materials and clean motor (1113) output coaxial fixed and be equipped with flexible cleaning wheel (1115), flexible cleaning wheel (1115) and annular cleaning groove (11) inside diapire rolling contact.
10. The apparatus of claim 9, wherein the apparatus comprises: the water washing tank is characterized in that a material collecting pipe (41) is fixedly arranged on the upper wall of the water washing tank (4) in a penetrating mode, the upper end of the material collecting pipe (41) is connected with a material collecting hole (112) in a penetrating mode, a water feeding pipe head (42) is arranged on the side wall of the water washing tank (4) in a penetrating mode, a stirring machine (43) is arranged on the upper wall inside the water washing tank (4), and an open tank (44) is arranged on the inner wall of the water washing tank (4) in a sliding mode.
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| CN202210786360.3A CN115196604B (en) | 2022-07-06 | 2022-07-06 | Centrifugal airflow opposite-impact hexagonal boron nitride powder purifying device |
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