CN115148639B - 一种免交叉污染的晶圆槽式清洗机 - Google Patents
一种免交叉污染的晶圆槽式清洗机 Download PDFInfo
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- CN115148639B CN115148639B CN202210815965.0A CN202210815965A CN115148639B CN 115148639 B CN115148639 B CN 115148639B CN 202210815965 A CN202210815965 A CN 202210815965A CN 115148639 B CN115148639 B CN 115148639B
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/67326—Horizontal carrier comprising wall type elements whereby the substrates are vertically supported, e.g. comprising sidewalls
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202210815965.0A CN115148639B (zh) | 2022-07-12 | 2022-07-12 | 一种免交叉污染的晶圆槽式清洗机 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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CN202210815965.0A CN115148639B (zh) | 2022-07-12 | 2022-07-12 | 一种免交叉污染的晶圆槽式清洗机 |
Publications (2)
Publication Number | Publication Date |
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CN115148639A CN115148639A (zh) | 2022-10-04 |
CN115148639B true CN115148639B (zh) | 2023-04-07 |
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Application Number | Title | Priority Date | Filing Date |
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CN202210815965.0A Active CN115148639B (zh) | 2022-07-12 | 2022-07-12 | 一种免交叉污染的晶圆槽式清洗机 |
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CN (1) | CN115148639B (zh) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN116062440B (zh) * | 2022-12-19 | 2023-11-14 | 苏州赛森电子科技有限公司 | 一种上料机构及硅片清洗机 |
CN116387238B (zh) * | 2023-06-05 | 2023-08-11 | 盛奕半导体科技(无锡)有限公司 | 一种臭氧清洗设备以及在半导体湿法清洗工艺中的应用 |
CN117059530B (zh) * | 2023-10-11 | 2023-12-08 | 恒超源洗净科技(深圳)有限公司 | 一种硅片清洗槽及具有该清洗槽的清洗设备 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0228973B1 (fr) * | 1986-01-06 | 1991-04-17 | CENTRE STEPHANOIS DE RECHERCHES MECANIQUES HYDROMECANIQUE ET FROTTEMENT Société anonyme | Procédé et moyens de préhension et de transport des plaquettes de silicium |
JP2001210696A (ja) * | 2000-01-28 | 2001-08-03 | Ohkura Electric Co Ltd | ウェーハ移載機のピッチ変換機構 |
JP2009141300A (ja) * | 2007-12-05 | 2009-06-25 | Omiya Kogyo Kk | 半導体ウエハなどのピッチ変換装置 |
JP7506971B2 (ja) * | 2019-07-23 | 2024-06-27 | 川崎重工業株式会社 | ブレード間隔調整装置 |
CN113471122B (zh) * | 2021-06-29 | 2024-05-17 | 北京北方华创微电子装备有限公司 | 晶圆清洗设备及其晶圆传输装置 |
CN114275314A (zh) * | 2021-12-23 | 2022-04-05 | 薛城区质量计量检测中心 | 一种产品质量检验用样品存放装置 |
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Effective date of registration: 20230317 Address after: 201900 No. 181, Shanlian Road, Baoshan City Industrial Park, Baoshan District, Shanghai Applicant after: Shanghai Shenhe Investment Co.,Ltd. Address before: 241200 Fanchang County Economic Development Zone, Wuhu City, Anhui Province Applicant before: Anhui senmino Intelligent Equipment Co.,Ltd. Applicant before: Shanghai Shenhe Investment Co.,Ltd. |
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Effective date of registration: 20230720 Address after: No. 21, Nanhai Road, Yi'an District, Tongling City, Anhui Province 244151 Patentee after: Anhui fulede Changjiang semiconductor material Co.,Ltd. Address before: 201900 No. 181, Shanlian Road, Baoshan City Industrial Park, Baoshan District, Shanghai Patentee before: Shanghai Shenhe Investment Co.,Ltd. |