CN115010380B - Preparation method of photovoltaic glass based on disordered photonic crystals - Google Patents
Preparation method of photovoltaic glass based on disordered photonic crystals Download PDFInfo
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- CN115010380B CN115010380B CN202210948795.3A CN202210948795A CN115010380B CN 115010380 B CN115010380 B CN 115010380B CN 202210948795 A CN202210948795 A CN 202210948795A CN 115010380 B CN115010380 B CN 115010380B
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- 239000011521 glass Substances 0.000 title claims abstract description 55
- 239000004038 photonic crystal Substances 0.000 title claims abstract description 23
- 238000002360 preparation method Methods 0.000 title claims abstract description 15
- 239000004005 microsphere Substances 0.000 claims abstract description 43
- 239000002245 particle Substances 0.000 claims abstract description 43
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 22
- 239000000725 suspension Substances 0.000 claims abstract description 22
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- 239000004793 Polystyrene Substances 0.000 claims abstract description 18
- 229920002223 polystyrene Polymers 0.000 claims abstract description 18
- 239000002904 solvent Substances 0.000 claims abstract description 15
- 238000004140 cleaning Methods 0.000 claims abstract description 13
- 238000000151 deposition Methods 0.000 claims abstract description 11
- 239000007788 liquid Substances 0.000 claims abstract description 5
- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims abstract description 5
- 239000004926 polymethyl methacrylate Substances 0.000 claims abstract description 5
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 5
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 32
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 18
- 238000000034 method Methods 0.000 claims description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 15
- 238000000576 coating method Methods 0.000 claims description 8
- 230000008021 deposition Effects 0.000 claims description 5
- 239000011248 coating agent Substances 0.000 claims description 4
- 239000008367 deionised water Substances 0.000 claims description 4
- 229910021641 deionized water Inorganic materials 0.000 claims description 4
- 238000004062 sedimentation Methods 0.000 claims description 4
- 238000001338 self-assembly Methods 0.000 claims description 4
- 238000004528 spin coating Methods 0.000 claims description 4
- 238000005507 spraying Methods 0.000 claims description 4
- 238000003618 dip coating Methods 0.000 claims description 3
- 238000009210 therapy by ultrasound Methods 0.000 claims description 2
- IDGUHHHQCWSQLU-UHFFFAOYSA-N ethanol;hydrate Chemical compound O.CCO IDGUHHHQCWSQLU-UHFFFAOYSA-N 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
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Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/42—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating of an organic material and at least one non-metal coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/054—Optical elements directly associated or integrated with the PV cell, e.g. light-reflecting means or light-concentrating means
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Abstract
The invention provides a preparation method of photovoltaic glass based on disordered photonic crystals, which comprises the following steps: cleaning the substrate; selecting 3 to 10 kinds of microspheres with step particle sizes within the particle size range of 20nm to 2 mu m, and mixing the microspheres with a solvent to obtain a suspension; the microspheres are selected from polystyrene, silicon dioxide or polymethyl methacrylate; and treating the cleaned substrate by using the turbid liquid, and depositing to obtain the photovoltaic glass. The invention provides a preparation method of disordered photonic crystal-based colored photovoltaic glass, which is characterized in that microspheres with different particle size distributions are deposited on the surface of a substrate, the microspheres with the particle sizes distributed in a gradient manner enable the photovoltaic glass to only display a single structural color irrelevant to an incident angle, and then the filling effect of the microspheres with small particle sizes is utilized, so that defects are reduced, and the color rendering effect is improved.
Description
Technical Field
The invention relates to the technical field of photovoltaic cells, in particular to a preparation method of photovoltaic glass based on disordered photonic crystals.
Background
The color photovoltaic cell meets aesthetic requirements of building curtain walls, photovoltaic power generation glass and decoration fields, so that the color photovoltaic cell is widely concerned, and the construction of the structural color of the photonic crystal is a feasible colorization strategy. However, the color of the photonic crystal structure satisfies the bragg equation, that is, the displayed color is highly related to the angle of incident light, that is, the color is different when the photonic crystal is seen from different angles, and the high order of the photonic crystal brings difficulty to large-area preparation, and inevitable defects can cause color difference and affect visual effect.
Disclosure of Invention
The technical problem solved by the present invention is to provide a method for preparing a photovoltaic glass based on disordered photonic crystals, which displays only a single color independent of the angle of incidence.
In view of the above, the present application provides a method for preparing a photovoltaic glass based on disordered photonic crystals, comprising the following steps:
cleaning the substrate;
selecting 3 to 10 kinds of microspheres with step particle sizes within the particle size range of 20nm to 2 mu m, and mixing the microspheres with a solvent to obtain a suspension; the microspheres are selected from polystyrene, silicon dioxide or polymethyl methacrylate;
and treating the cleaned substrate by using the turbid liquid, and depositing to obtain the photovoltaic glass.
Preferably, the substrate is selected from ultra white glass, FTO with a conductive layer, ITO with a conductive layer, or AZO with a conductive layer.
Preferably, deionized water, acetone and ethanol are adopted for cleaning, and ultrasonic treatment is carried out for 20 to 30min in sequence.
Preferably, the microspheres are silica microspheres with particle sizes of 100nm, 200nm and 250nm, silica microspheres with particle sizes of 50nm, 100nm, 200nm, 250nm and 300nm, polystyrene microspheres with particle sizes of 100nm, 200nm and 250nm, or polystyrene microspheres with particle sizes of 50nm, 100nm, 200nm, 250nm and 300 nm.
Preferably, the concentration of the suspension is 0.5-10wt%, and the solvent is one or two of water and absolute ethyl alcohol.
Preferably, the treatment method is spin coating, dip-coating, spray coating, blade coating, vertical sedimentation self-assembly or slit coating.
Preferably, the thickness of the deposition is 20nm to 50 mu m.
The application provides a preparation method of photovoltaic glass based on disordered photonic crystals, which comprises the steps of firstly cleaning a substrate, mixing microspheres with different particle sizes and step particle sizes with a solvent, finally treating the cleaned substrate by using turbid liquid, and depositing to obtain the photovoltaic glass with gradient distribution; due to the arrangement of the microspheres with the particle sizes distributed in a gradient manner on the surface of the photovoltaic glass, the photovoltaic glass is ordered only in a short range, a photon forbidden band does not exist, and scattering effects in any direction are the same, so that the photovoltaic glass only displays a single color irrelevant to an incident angle, and the microspheres with small particle sizes fill gaps among the microspheres with large particle sizes, and the formation of defects in a preparation process is inhibited.
Drawings
FIG. 1 is a schematic diagram of a disordered photonic crystal structure of a photovoltaic glass surface prepared in accordance with the present invention.
Detailed Description
For a further understanding of the present invention, reference will now be made to the following preferred embodiments of the invention in conjunction with the examples, but it is to be understood that the description is intended to further illustrate the features and advantages of the invention and is not intended to limit the scope of the claims which follow.
The invention provides a disordered photonic crystal-based colored photovoltaic glass, which only displays a single structural color irrelevant to an incident angle through microspheres with gradient particle sizes, and reduces defects and improves a color development effect by utilizing the filling effect of the microspheres with small particle sizes. Fig. 1 is a schematic diagram of a disordered photonic crystal structure of a photovoltaic glass surface, wherein 1 is a substrate, and 2 is a disordered photonic crystal structure composed of microspheres in gradient distribution. Specifically, the embodiment of the invention discloses a preparation method of photovoltaic glass based on disordered photonic crystals, which comprises the following steps:
cleaning the substrate;
selecting 3 to 10 kinds of microspheres with stepped particle diameters from 20nm to 2 mu m, and mixing the microspheres with a solvent to obtain a suspension; the microspheres are selected from polystyrene, silicon dioxide or polymethyl methacrylate;
and treating the cleaned substrate by using the turbid liquid, and depositing to obtain the photovoltaic glass.
In the preparation process, the substrate is firstly cleaned, and deionized water, acetone and ethanol are sequentially adopted for ultrasonic cleaning for 20-30min to ensure that the substrate is thoroughly cleaned. After the substrate is cleaned, it is blown dry with nitrogen. The substrate is selected from ultra-white glass, FTO with a conductive layer, ITO with a conductive layer or AZO with a conductive layer; in particular embodiments, the substrate is selected from FTO transparent conductive glass.
In the application, 3 to 10 kinds of microspheres with step particle sizes are selected to be mixed with a solvent within the particle size range of 20nm to 2 mu m to obtain a suspension; the microspheres are selected from polystyrene, silicon dioxide or polymethyl methacrylate; the particle size of the microspheres is selected in a step-like manner, and the difference between the particle sizes cannot be too large, for example, 20nm and 2 μm cannot be selected at the same time. In specific embodiments, the microspheres are silica microspheres having particle sizes of 100nm, 200nm, and 250nm, silica microspheres having particle sizes of 50nm, 100nm, 200nm, 250nm, and 300nm, polystyrene microspheres having particle sizes of 100nm, 200nm, and 250nm, or polystyrene microspheres having particle sizes of 50nm, 100nm, 200nm, 250nm, and 300 nm. In the present application, the mass percentage ratio of the microspheres with different particle sizes is X 1 、X 2 、X 3 。。。X n ，n=3~10，X 1 +X 2 +X 3 +。。。+X n =100%. The concentration of the suspension is 0.5-10wt%, and the solvent is one or two of water and absolute ethyl alcohol; more specifically, the concentration of the suspension is 1% -5%.
After the preparation work, the substrate is cleaned by the obtained suspension, and the photovoltaic glass is obtained after deposition; the deposition method comprises a spin coating method, a dip-draw method, a spray coating method, a blade coating method, a vertical sedimentation self-assembly method or a slit coating method. The spin coating method, the dip-coating method, the spray coating method, the blade coating method, the vertical sedimentation self-assembly method, or the slit coating method described above are performed according to methods well known to those skilled in the art, and the present application is not particularly limited. In the application, the thickness of the deposition layer is 20nm to 50 mu m; more specifically, the thickness of the deposition layer is 1 to 20 μm.
The invention provides a preparation method of disordered photonic crystal-based colored photovoltaic glass, which is characterized in that microspheres with different particle size distributions are deposited on the surface of a substrate, the microspheres with the particle sizes distributed in a gradient manner enable the photovoltaic glass to only display a single structural color irrelevant to an incident angle, and then the filling effect of the microspheres with small particle sizes is utilized, so that defects are reduced, and the color rendering effect is improved.
For further understanding of the present invention, the following examples are provided to illustrate the preparation method of the photovoltaic glass with disordered photonic crystals, and the scope of the present invention is not limited by the following examples.
Example 1
(1) Cutting FTO transparent conductive glass into pieces of 4cm × 4cm, respectively ultrasonically cleaning in ionized water, acetone and ethanol for 20min, blow-drying with nitrogen, and storing for later use;
(2) Taking silica microspheres with the particle sizes of 100nm, 200nm and 250nm, placing the silica microspheres with the mass of 0.1g, 0.6g and 0.3g in 125ml of absolute ethyl alcohol, and performing ultrasonic dispersion for 1 hour to prepare suspension with the mass fraction of 1%; inserting an FTO glass sheet into the suspension, enabling the conductive surface to face upwards and incline at 45 degrees, placing the FTO glass sheet into a constant temperature and humidity box, keeping the temperature at 55 ℃ and RH at 45 percent until the solvent is completely volatilized, and taking out the FTO glass sheet for later use to obtain a color layer with the thickness of 2.1 mu m.
Example 2
(1) Cutting FTO transparent conductive glass into pieces of 4cm × 4cm, respectively ultrasonically cleaning in ionized water, acetone and ethanol for 20min, blow-drying with nitrogen, and storing for later use;
(2) Taking silica microspheres with the particle sizes of 50nm, 100nm, 200nm, 250nm and 300nm, putting the silica microspheres with the mass of 0.1g, 0.2g, 0.4g, 0.2g and 0.1g in 125ml of absolute ethyl alcohol, and ultrasonically dispersing for 1h to prepare suspension with the mass fraction of 1%; inserting an FTO glass sheet into the suspension, enabling the conductive surface to face upwards and incline at 45 degrees, placing the FTO glass sheet into a constant temperature and humidity box, keeping the temperature at 55 ℃ and RH at 45 percent until the solvent is completely volatilized, and taking out the FTO glass sheet for later use to obtain a color layer with the thickness of 1.8 mu m.
Example 3
(1) Cutting the FTO transparent conductive glass into pieces of 4cm multiplied by 4cm, respectively ultrasonically cleaning the pieces in ionized water, acetone and ethanol for 20min, drying the pieces with nitrogen and storing the pieces for later use;
(2) Taking polystyrene microspheres with the particle sizes of 100nm, 200nm and 250nm, putting the polystyrene microspheres with the mass of 0.1g, 0.6g and 0.3g in 125ml of deionized water, and ultrasonically dispersing for 1h to prepare a suspension with the mass fraction of 1%; and inserting an FTO glass sheet into the suspension, enabling the conductive surface to face upwards and incline at 45 degrees, placing the FTO glass sheet into a constant temperature and humidity box at 55 ℃ and RH45 percent until the solvent is completely volatilized, and taking out the FTO glass sheet for later use to obtain a color layer with the thickness of 2.1 mu m.
Example 4
(1) Cutting FTO transparent conductive glass into pieces of 4cm × 4cm, respectively ultrasonically cleaning in ionized water, acetone and ethanol for 20min, blow-drying with nitrogen, and storing for later use;
(2) Taking polystyrene microspheres with the particle sizes of 50nm, 100nm, 200nm, 250nm and 300nm, putting the polystyrene microspheres with the mass of 0.1g, 0.2g, 0.4g, 0.2g and 0.1g in 125ml of ionized water, and ultrasonically dispersing for 1h to prepare suspension with the mass fraction of 1%; inserting an FTO glass sheet into the suspension, enabling the conductive surface to face upwards and incline at 45 degrees, placing the FTO glass sheet into a constant temperature and humidity box, keeping the temperature at 55 ℃ and RH at 45 percent until the solvent is completely volatilized, and taking out the FTO glass sheet for later use to obtain a color layer with the thickness of 1.8 mu m.
Comparative example 1
(1) Cutting the FTO transparent conductive glass into pieces of 4cm multiplied by 4cm, respectively ultrasonically cleaning the pieces in ionized water, acetone and ethanol for 20min, drying the pieces with nitrogen and storing the pieces for later use;
(2) Taking 1g of silica microspheres with the particle size of 200nm, putting the silica microspheres into 125ml of absolute ethyl alcohol, and performing ultrasonic dispersion for 1 hour to prepare suspension with the mass fraction of 1%; and inserting an FTO glass sheet into the suspension, enabling the conductive surface to face upwards and incline at 45 degrees, placing the FTO glass sheet into a constant temperature and humidity box at 55 ℃ and RH45 percent until the solvent is completely volatilized, and taking out the FTO glass sheet for later use to obtain a color layer with the thickness of 2.0 mu m.
Comparative example 2
(1) Cutting the FTO transparent conductive glass into pieces of 4cm multiplied by 4cm, respectively ultrasonically cleaning the pieces in ionized water, acetone and ethanol for 20min, drying the pieces with nitrogen and storing the pieces for later use.
(2) Taking 1g of polystyrene microspheres with the particle size of 200nm, putting the polystyrene microspheres in 125ml of ionized water, and ultrasonically dispersing for 1h to prepare suspension with the mass fraction of 1%. Inserting an FTO glass sheet into the suspension, enabling the conductive surface to face upwards and incline at 45 degrees, placing the FTO glass sheet into a constant temperature and humidity box, keeping the temperature at 55 ℃ and RH at 45 percent until the solvent is completely volatilized, and taking out the FTO glass sheet for later use to obtain a color layer with the thickness of 2.0 mu m.
Comparative examples 1 and 2 as comparative experiments, ordered photonic crystal color layers were prepared.
TABLE 1 Table of data of reflection peak positions at different reflection angles of the color layers prepared in examples 1 to 2 and comparative example 1
TABLE 2 Table of data of reflection peak positions at different reflection angles of the color layers prepared in examples 3 to 4 and comparative example 2
The reflection peak positions at different incident angles of the polystyrene disordered photonic crystal and the ordered photonic crystal are compared in the table, and it can be seen that the reflection peak positions (colors) of examples 1 and 2 are independent of the incident angle.
The above description of the embodiments is only intended to facilitate the understanding of the method of the invention and its core idea. It should be noted that, for those skilled in the art, it is possible to make various improvements and modifications to the present invention without departing from the principle of the present invention, and those improvements and modifications also fall within the scope of the claims of the present invention.
The previous description of the disclosed embodiments is provided to enable any person skilled in the art to make or use the present invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the generic principles defined herein may be applied to other embodiments without departing from the spirit or scope of the invention. Thus, the present invention is not intended to be limited to the embodiments shown herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.
Claims (7)
1. A preparation method of photovoltaic glass based on disordered photonic crystals comprises the following steps:
cleaning a substrate;
selecting 3-10 microspheres with step particle sizes to mix with a solvent in the particle size range of 20-300 nm to obtain a suspension; the microspheres are selected from polystyrene, silicon dioxide or polymethyl methacrylate;
and treating the cleaned substrate by using the turbid liquid, and depositing to obtain the photovoltaic glass.
2. The method of claim 1, wherein the substrate is selected from the group consisting of ultra white glass, FTO with conductive layer, ITO with conductive layer, and AZO with conductive layer.
3. The preparation method of claim 1, wherein the cleaning is performed by sequentially performing ultrasonic treatment on deionized water, acetone and ethanol for 20-30 min.
4. The production method according to claim 1, wherein the microspheres are silica microspheres having particle diameters of 100nm, 200nm, and 250nm, respectively, silica microspheres having particle diameters of 50nm, 100nm, 200nm, 250nm, and 300nm, polystyrene microspheres having particle diameters of 100nm, 200nm, and 250nm, respectively, or polystyrene microspheres having particle diameters of 50nm, 100nm, 200nm, 250nm, and 300nm, respectively.
5. The method according to claim 1, wherein the suspension has a concentration of 0.5 to 10wt%, and the solvent is one or two selected from water and absolute ethanol.
6. The method according to claim 1, wherein the treatment method is spin coating, dip-coating, spray coating, blade coating, vertical sedimentation self-assembly, or slit coating.
7. The method of claim 1, wherein the deposition has a thickness of 20nm to 50 μm.
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| US8415555B2 (en) * | 2010-08-24 | 2013-04-09 | Corning Incorporated | Dimensional silica-based porous silicon structures and methods of fabrication |
| CN102584024A (en) * | 2012-01-19 | 2012-07-18 | 蚌埠玻璃工业设计研究院 | Preparation method of efficient increased-transmission and antireflection glass |
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