CN114959625A - Film coating device and cleaning method thereof - Google Patents
Film coating device and cleaning method thereof Download PDFInfo
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- CN114959625A CN114959625A CN202210553516.3A CN202210553516A CN114959625A CN 114959625 A CN114959625 A CN 114959625A CN 202210553516 A CN202210553516 A CN 202210553516A CN 114959625 A CN114959625 A CN 114959625A
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- 238000000034 method Methods 0.000 title claims abstract description 24
- 238000004140 cleaning Methods 0.000 title claims abstract description 14
- 239000007888 film coating Substances 0.000 title description 8
- 238000009501 film coating Methods 0.000 title description 8
- 238000009833 condensation Methods 0.000 claims abstract description 146
- 230000005494 condensation Effects 0.000 claims abstract description 146
- 238000001179 sorption measurement Methods 0.000 claims abstract description 97
- 230000002776 aggregation Effects 0.000 claims abstract description 85
- 238000005054 agglomeration Methods 0.000 claims abstract description 33
- 238000000576 coating method Methods 0.000 claims abstract description 33
- 239000011248 coating agent Substances 0.000 claims abstract description 30
- 239000000126 substance Substances 0.000 claims description 136
- 230000015271 coagulation Effects 0.000 claims description 48
- 238000005345 coagulation Methods 0.000 claims description 48
- 230000004931 aggregating effect Effects 0.000 claims description 18
- 238000007747 plating Methods 0.000 claims description 10
- 238000009423 ventilation Methods 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 abstract description 8
- 238000004220 aggregation Methods 0.000 description 52
- 239000000463 material Substances 0.000 description 31
- 239000002184 metal Substances 0.000 description 11
- 239000002245 particle Substances 0.000 description 11
- 238000010586 diagram Methods 0.000 description 4
- 239000011261 inert gas Substances 0.000 description 4
- 230000001112 coagulating effect Effects 0.000 description 3
- 239000008187 granular material Substances 0.000 description 3
- 238000012423 maintenance Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/10—Energy storage using batteries
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroluminescent Light Sources (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The embodiment of the invention discloses a coating device and a cleaning method thereof. The coating device comprises: the first chamber comprises a foreign matter condensation assembly and a foreign matter adsorption assembly, wherein the foreign matter condensation assembly and the foreign matter adsorption assembly are arranged at the bottom of the first chamber, the foreign matter adsorption assembly is positioned between the foreign matter condensation assembly and the side wall of the first chamber, and the foreign matter adsorption assembly and the foreign matter condensation assembly are correspondingly arranged. The foreign matter agglomeration component agglomerates the foreign matters in the first chamber and enables the foreign matters to move towards the side wall of the first chamber, and the foreign matter adsorption component adsorbs the foreign matters agglomerated by the foreign matter agglomeration component. According to the invention, the foreign matter in the first cavity is condensed by the foreign matter condensing assembly and moves towards the side wall of the first cavity, and the foreign matter adsorption assembly adsorbs the foreign matter condensed by the foreign matter condensing assembly and moves towards the side wall of the first cavity, so that the foreign matter dispersed in the first cavity is reduced, the influence of the foreign matter on the display panel in the manufacturing process is reduced, and the product yield of the display panel is improved.
Description
Technical Field
The invention relates to the technical field of display, in particular to a film coating device and a cleaning method thereof.
Background
At present, in the production process of the display panel, an evaporation coating and/or vacuum sputtering coating technology is inevitably used, in the coating process, various reasons such as film cracking and falling, large particle peeling of a target material back-plating area, carrying of environmental foreign matters by a carrier and the like exist to cause the increase of foreign matters in a chamber in the coating process, and because the sensitivity of the display panel in the process to the foreign matters (particularly the foreign matters with the diameter less than 1 micron) is strong, the foreign matters are one of main reasons for causing the product yield of the display panel to be difficult to improve.
Therefore, a coating apparatus and a cleaning method thereof are needed to solve the above technical problems.
Disclosure of Invention
The invention provides a film coating device and a cleaning method thereof, which can solve the technical problem that the yield of a display panel is difficult to improve because foreign matters exist in a cavity in the film coating process of the display panel at present.
The invention provides a film coating device, which comprises a first chamber, wherein the first chamber comprises a foreign matter condensation component and a foreign matter adsorption component which are arranged at the bottom of the first chamber, the foreign matter adsorption component is positioned between the foreign matter condensation component and the side wall of the first chamber, and the foreign matter adsorption component and the foreign matter condensation component are correspondingly arranged;
the foreign matter condensation assembly condenses the foreign matters in the first chamber and moves the foreign matters to the side wall of the first chamber, and the foreign matter adsorption assembly adsorbs the foreign matters condensed by the foreign matter condensation assembly.
Preferably, the first chamber further comprises an air vent pipe arranged at the bottom of the first chamber;
the foreign matter coagulation component comprises a first foreign matter coagulation part and a second foreign matter coagulation part which are positioned at two opposite sides of the vent pipe;
the foreign matter adsorption component comprises a first foreign matter adsorption part positioned on one side of the first foreign matter condensation part, which is far away from the ventilation pipeline, and a second foreign matter adsorption part positioned on one side of the second foreign matter condensation part, which is far away from the ventilation pipeline;
wherein the first foreign matter adsorbing member is provided corresponding to the first foreign matter aggregating member, and the second foreign matter adsorbing member is provided corresponding to the second foreign matter aggregating member.
Preferably, the first foreign matter condensation member includes a first foreign matter condensation member and a second foreign matter condensation member located on a side of the first foreign matter condensation member away from the air duct;
the second foreign matter coagulation part comprises a third foreign matter coagulation member and a fourth foreign matter coagulation member positioned on the side of the third foreign matter coagulation member away from the vent pipe;
the first foreign matter condensing member and the bottom of the first chamber form a first included angle in the direction from the second foreign matter condensing member to the first foreign matter condensing member, the second foreign matter condensing member and the bottom of the first chamber form a second included angle, and the first included angle is smaller than the second included angle;
and in the direction from the fourth foreign matter coagulation member to the third foreign matter coagulation member, the third foreign matter coagulation member forms a third included angle with the bottom of the first chamber, the fourth foreign matter coagulation member forms a fourth included angle with the bottom of the first chamber, and the third included angle is smaller than the fourth included angle.
Preferably, the first foreign-matter condensing part further includes a fifth foreign-matter condensing member located between the first foreign-matter condensing member and the second foreign-matter condensing member;
the second foreign matter agglomerating component further comprises a sixth foreign matter agglomerating member located between the third foreign matter agglomerating member and the fourth foreign matter agglomerating member;
a fifth included angle is formed between the fifth foreign matter condensation member and the bottom of the first chamber along the direction from the second foreign matter condensation member to the first foreign matter condensation member, and the fifth included angle is larger than the first included angle and smaller than the second included angle;
and in the direction from the fourth foreign matter coagulation member to the third foreign matter coagulation member, a sixth included angle is formed between the sixth foreign matter coagulation member and the bottom of the first chamber, and the sixth included angle is larger than the third included angle and smaller than the fourth included angle.
Preferably, the first foreign-matter coagulation member forms a first foreign-matter coagulation region, the second foreign-matter coagulation member forms a second foreign-matter coagulation region, and the fifth foreign-matter coagulation member forms a fifth foreign-matter coagulation region;
the third foreign-matter agglomeration member forms a third foreign-matter agglomeration zone, the fourth foreign-matter agglomeration member forms a fourth foreign-matter agglomeration zone, and the sixth foreign-matter agglomeration member forms a sixth foreign-matter agglomeration zone;
wherein the fifth foreign matter condensation area overlaps with the first foreign matter condensation area and the second foreign matter condensation area, respectively, and the sixth foreign matter condensation area overlaps with the third foreign matter condensation area and the fourth foreign matter condensation area, respectively.
Preferably, the first foreign matter adsorption part includes a first foreign matter adsorption member at an end away from the bottom of the first chamber, and the second foreign matter adsorption part includes a second foreign matter adsorption member at an end away from the bottom of the first chamber;
wherein the first foreign matter adsorbing member is at least partially located in the second foreign matter condensation region, and the second foreign matter adsorbing member is at least partially located in the fourth foreign matter condensation region.
Preferably, the first foreign matter aggregation member includes a first vibration generation part, the second foreign matter aggregation member includes a second vibration generation part, and the fifth foreign matter aggregation member includes a fifth vibration generation part;
the third foreign-matter agglomerating member includes a third vibration generating portion, the fourth foreign-matter agglomerating member includes a fourth vibration generating portion, and the sixth foreign-matter agglomerating member includes a sixth vibration generating portion;
wherein, the first vibrations emergence portion, the fifth vibrations emergence portion and the vibration frequency of second vibrations emergence portion reduces in proper order, the third vibrations emergence portion the sixth vibrations emergence portion and the vibration frequency of fourth vibrations emergence portion reduces in proper order.
Preferably, the first chamber further comprises a foreign matter removing assembly disposed on a side wall of the first chamber, and the foreign matter adsorbed by the foreign matter adsorbing assembly is discharged out of the first chamber through the foreign matter removing assembly.
The invention also provides a cleaning method of the coating device, which comprises the following steps:
opening the first foreign matter agglomerating member and the third foreign matter agglomerating member;
opening a fifth foreign matter agglomerating member and a sixth foreign matter agglomerating member and closing the first foreign matter agglomerating member and the third foreign matter agglomerating member;
opening a second foreign matter condensing member and a fourth foreign matter condensing member and closing the fifth foreign matter condensing member and the sixth foreign matter condensing member;
opening a foreign matter adsorption assembly and closing the second foreign matter coagulation member and the fourth foreign matter coagulation member;
wherein the foreign matter adsorbing member adsorbs the foreign matters aggregated by the second foreign matter aggregating member and the fourth foreign matter aggregating member.
Preferably, after the step of opening the foreign substance adsorption module and closing the second foreign substance condensation member and the fourth foreign substance condensation member, the method further includes:
and opening the foreign matter removing assembly and closing the foreign matter adsorbing assembly.
According to the invention, the foreign matter in the first cavity is condensed by the foreign matter condensing assembly and moves towards the side wall of the first cavity, and the foreign matter adsorption assembly adsorbs the foreign matter condensed by the foreign matter condensing assembly and moves towards the side wall of the first cavity, so that the foreign matter dispersed in the first cavity is reduced, the influence of the foreign matter on the display panel in the manufacturing process is reduced, and the product yield of the display panel is improved.
Drawings
In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings needed to be used in the description of the embodiments will be briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without creative efforts.
FIG. 1 is a schematic view of a first structure of a coating apparatus according to an embodiment of the present invention;
FIG. 2 is a schematic diagram of a second structure of a coating apparatus according to an embodiment of the present invention;
FIG. 3 is a schematic view of a third structure of a coating apparatus according to an embodiment of the present invention;
FIG. 4 is a schematic diagram of a fourth structure of a coating apparatus according to an embodiment of the present invention;
FIG. 5 is a schematic view of a fifth structure of a coating apparatus according to an embodiment of the present invention;
FIG. 6 is a schematic diagram of a sixth structure of a coating apparatus provided in an embodiment of the present invention;
FIG. 7 is a schematic diagram illustrating a seventh structure of a coating apparatus according to an embodiment of the present invention;
FIG. 8 is a schematic view of an eighth structure of a coating device according to an embodiment of the present invention;
FIG. 9 is a flowchart of a cleaning method for a plating apparatus according to an embodiment of the present invention.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention. Furthermore, it should be understood that the detailed description and specific examples, while indicating the present invention, are given by way of illustration and explanation only, and are not intended to limit the present invention. In the present invention, unless otherwise specified, the use of directional terms such as "upper" and "lower" generally means upper and lower in the actual use or operation of the device, particularly in the orientation of the figures of the drawings; while "inner" and "outer" are with respect to the outline of the device.
At present, due to the high sensitivity to foreign matters in a chamber in the film coating process of the display panel, the yield of the display panel is difficult to improve due to the foreign matters in the chamber.
Referring to fig. 1 to 8, an embodiment of the invention provides a coating apparatus 100, including: the first chamber 101, the first chamber 101 includes a foreign matter agglomeration member 102 and a foreign matter adsorption member 103 disposed at the bottom of the first chamber 101, the foreign matter adsorption member 103 is located between the foreign matter agglomeration member 102 and the sidewall of the first chamber 101, and the foreign matter adsorption member 103 is disposed corresponding to the foreign matter agglomeration member 102.
The foreign matter agglomeration unit 102 agglomerates the foreign matter in the first chamber 101 and moves the foreign matter to the sidewall of the first chamber 101, and the foreign matter adsorption unit 103 adsorbs the foreign matter agglomerated by the foreign matter agglomeration unit 102.
According to the invention, the foreign matter in the first cavity is condensed by the foreign matter condensing assembly and moves towards the side wall of the first cavity, and the foreign matter adsorption assembly adsorbs the foreign matter condensed by the foreign matter condensing assembly and moves towards the side wall of the first cavity, so that the foreign matter dispersed in the first cavity is reduced, the influence of the foreign matter on the display panel in the manufacturing process is reduced, and the product yield of the display panel is improved.
The technical solution of the present invention will now be described with reference to specific embodiments.
Referring to fig. 1 and fig. 2, in the present embodiment, the first chamber 101 further includes an air duct 104 disposed at the bottom of the first chamber 101;
the foreign matter agglomeration assembly 102 comprises a first foreign matter agglomeration part 105 and a second foreign matter agglomeration part 106 which are positioned at two opposite sides of the vent pipe 104;
the foreign substance adsorption module 103 includes a first foreign substance adsorption member 107 located on a side of the first foreign substance condensation member 105 away from the air duct 104, and a second foreign substance adsorption member 108 located on a side of the second foreign substance condensation member 106 away from the air duct 104;
the first foreign-matter adsorbing member 107 is provided corresponding to the first foreign-matter aggregating member 105, and the second foreign-matter adsorbing member 108 is provided corresponding to the second foreign-matter aggregating member 106.
The air duct 104 is used for introducing an inert gas, such as argon or nitrogen, into the first chamber 101, and the air duct 104 may include a main duct connected to a source of the inert gas, a first air duct near one side of the first foreign matter coagulating member 105, a second air duct near one side of the second foreign matter coagulating member 106, and a connecting duct connecting the first air duct and the second air duct, and the connecting duct may be disposed parallel to the bottom of the first chamber 101.
The coating device 100 further includes a material source located between the first air duct and the second air duct, wherein the material source is used for providing materials for the display panel in the coating process.
The coating device 100 comprises a film forming area and an edge area surrounding the film forming area, and the foreign matter adsorption assembly 103 is located in the edge area.
The first chamber 101 includes a first side wall on a side of the first foreign substance adsorption member 107 away from the air duct 104 and a second side wall on a side of the second foreign substance adsorption member 108 away from the air duct 104.
The side of the edge region away from the side wall of the first chamber 101 has a minimum distance from the side wall of the first chamber 101, that is, the width of the edge region is less than or equal to 20 cm in a direction perpendicular to the side wall of the first chamber 101.
That is, the vertical distance between the first foreign substance adsorption member 107 and the first side wall is 20 cm or less, and the vertical distance between the second foreign substance adsorption member 108 and the second side wall is 20 cm or less.
The foreign matter adsorption component 103 is arranged in the edge region, and when the foreign matter adsorption component 103 is used for adsorbing the foreign matter in the first chamber 101, the foreign matter is fixed in the edge region, so that the interference of the foreign matter to the display panel in the film forming region in the film forming process of the display panel is reduced, and the interference of the foreign matter adsorption component 103 to the film forming process of the display panel in the film forming region is avoided.
The foreign matter condensation assembly 102 is located in a region between the air duct 104 and the side wall of the first chamber 101, that is, a vertical distance between a side of the first foreign matter condensation member 105 away from the first side wall and the first side wall is less than or equal to 60 cm, and a vertical distance between a side of the second foreign matter condensation member 106 away from the second side wall and the second side wall is less than or equal to 60 cm.
The foreign matter condensing assembly 102 is disposed in the region between the ventilation duct 104 and the sidewall of the first chamber 101, so that the foreign matter in the first chamber 101 is condensed and gradually transferred to the foreign matter adsorbing assembly 103 located at the edge region, that is, the foreign matter is condensed and transferred to the edge region of the first chamber 101, thereby reducing the interference of the foreign matter on the display panel in the film forming region during the film coating process of the display panel.
Meanwhile, the distance between the first foreign substance adsorbing member 107 and the first side wall is larger than the distance between the first foreign substance adsorbing member 105 and the first side wall, and the distance between the second foreign substance adsorbing member 108 and the second side wall is larger than the distance between the second foreign substance adsorbing member 106 and the second side wall.
The first foreign substance adsorbing member 107 is provided to correspond to the first foreign substance aggregating member 105, the first foreign substance adsorbing member 107 is provided between the first foreign substance aggregating member 105 and the first sidewall, the second foreign substance adsorbing member 108 is provided to correspond to the second foreign substance aggregating member 106, and the second foreign substance adsorbing member 108 is provided between the second foreign substance aggregating member 106 and the second sidewall, which facilitates the first foreign substance aggregating member 105 and the second foreign substance aggregating member 106 to aggregate foreign substances in a wider range in the first chamber 101 and to finally transfer the foreign substances to the first foreign substance adsorbing member 107 and the second foreign substance adsorbing member 108.
In some embodiments, the average diameter of the foreign matters adsorbed by the foreign matter adsorbing assembly 103 from the foreign matter condensing assembly 102 is greater than 1 micron, that is, the average diameter of the foreign matters in the first chamber 101 after the condensing action of the foreign matter condensing assembly 102 is increased and finally is greater than 1 micron, which is beneficial to reducing the foreign matters with the diameter less than 1 micron in the first chamber 101, and improves the product yield of the display panel; meanwhile, in the manufacturing process of the display panel, foreign matters more than 1 micron can be detected and repaired, so that the repair success rate of the display panel is further improved, and the product yield of the display panel is improved.
Referring to fig. 1, 3 to 4 and 6, in some embodiments, the first foreign matter aggregation part 105 includes a first foreign matter aggregation member 109 and a second foreign matter aggregation member 110 located on a side of the first foreign matter aggregation member 109 away from the ventilation duct 104.
The second foreign-matter agglomerating unit 106 includes a third foreign-matter agglomerating member 111 and a fourth foreign-matter agglomerating member 112 located on a side of the third foreign-matter agglomerating member 111 remote from the air duct 104.
The first foreign substance adsorption part 107 is provided corresponding to the second foreign substance condensation member 110, and the second foreign substance adsorption part 108 is provided corresponding to the fourth foreign substance condensation member 112.
Wherein, along the direction from the second foreign matter coagulation member 110 to the first foreign matter coagulation member 109, the first foreign matter coagulation member 109 forms a first included angle θ with the bottom of the first chamber 101 1 The second foreign matter condensation member 110 forms a second included angle θ with the bottom of the first chamber 101 2 The first included angle theta 1 Is smaller than the second included angle theta 2 。
The third foreign matter agglomerating member 111 forms a third included angle theta with the bottom of the first chamber 101 in a direction from the fourth foreign matter agglomerating member 112 to the third foreign matter agglomerating member 111 3 The fourth foreign matter condensation member 112 forms a fourth included angle θ with the bottom of the first chamber 101 4 Said third angle θ 3 Is less than the fourth included angle theta 4 。
The first included angle theta 1 The third included angle theta 3 May be 40 to 70 degrees, and the second included angle theta 2 The fourth included angle theta 4 May be 70 to 90 degrees by the secondAn included angle theta 1 The second included angle theta 2 And said third angle theta 3 The fourth included angle theta 4 The gradual lifting of the first foreign substance condensation member 105 and the second foreign substance condensation member 106 is advantageous to expand the foreign substance condensation range, and to gradually guide the foreign substances in the first chamber 101 to the first foreign substance adsorption member 107 and the second foreign substance adsorption member 108.
The first foreign-matter agglomerating member 109 forms a first foreign-matter agglomerating region S1, the second foreign-matter agglomerating member 110 forms a second foreign-matter agglomerating region S2, the third foreign-matter agglomerating member 111 forms a third foreign-matter agglomerating region S3, and the fourth foreign-matter agglomerating member 112 forms a fourth foreign-matter agglomerating region S4.
The first foreign matter coagulation zone S1 and the second foreign matter coagulation zone S2 overlap, and the third foreign matter coagulation zone S3 and the fourth foreign matter coagulation zone S4 overlap. By the overlapping of the first foreign substance condensation region S1 and the second foreign substance condensation region S2, the overlapping of the third foreign substance condensation region S3 and the fourth foreign substance condensation region S4 facilitates the transfer of the foreign substances condensed by the first foreign substance condensation member 109 to the second foreign substance condensation region S2 and condensation again through the second foreign substance condensation member 110, and the transfer of the foreign substances condensed by the third foreign substance condensation member 111 to the fourth foreign substance condensation region S4 and condensation again through the fourth foreign substance condensation member 112.
The first foreign substance adsorption part 107 includes a first foreign substance adsorption member 115 at an end distant from the bottom of the first chamber 101, and a first fixing member at an end close to the bottom of the first chamber 101; the second foreign substance adsorption part 108 includes a second foreign substance adsorption member 116 at an end distant from the bottom of the first chamber 101, and a second fixing member at an end close to the bottom of the first chamber 101.
The first foreign substance adsorption member 115 is located at least partially in the second foreign substance condensation region S2, and the second foreign substance adsorption member 116 is located at least partially in the fourth foreign substance condensation region S4, which facilitate the direct adsorption of foreign substances in the second foreign substance condensation region S2 by the first foreign substance adsorption member 115, and the direct adsorption of foreign substances in the fourth foreign substance condensation region S4 by the second foreign substance adsorption member 116, thereby increasing the adsorption rate of foreign substances by the first foreign substance adsorption unit 107 and the second foreign substance adsorption unit 108.
The first foreign material adsorption member 115 may include a first metal coil, and the first fixing member fixes the first metal coil and connects to a power supply, and the second foreign material adsorption member 116 may include a second metal coil, and the second fixing member fixes the second metal coil and connects to a power supply; the power supply can be a direct current stabilized power supply and is used for supplying current to the first metal coil and the second metal coil so as to enable the first metal coil and the second metal coil to generate electromagnetic property and adsorb foreign matters. The first metal coil includes a first connection portion and a first coil portion, and the second metal coil includes a second connection portion and a second coil portion; the first connecting portion connects the first coil portion and the first fixing member, the second connecting portion connects the second coil portion and the second fixing member, and the first connecting portion and the second connecting portion may be metal straight bars, and support the first coil portion and the second coil portion while performing a connecting function. The first coil portion is located at least partially within the second foreign matter condensation zone S2, the second coil portion is located at least partially within a fourth foreign matter condensation zone S4; preferably, the first coil part is located in the second foreign matter condensation area S2, and the second coil part is located in the fourth foreign matter condensation area S4, which is further advantageous for improving the foreign matter adsorption efficiency of the first coil part and the second coil part, thereby reducing foreign matters in the first chamber 101.
The first foreign matter aggregation member 109 includes a first vibration generation portion, and the second foreign matter aggregation member 110 includes a second vibration generation portion; the third foreign-substance aggregation member 111 includes a third vibration generation portion, and the fourth foreign-substance aggregation member 112 includes a fourth vibration generation portion. The first foreign matter agglomerating member 109, the second foreign matter agglomerating member 110, the third foreign matter agglomerating member 111, and the fourth foreign matter agglomerating member 112 may be sound wave generators, and in this case, the first vibration generator, the second vibration generator, the third vibration generator, and the fourth vibration generator generate sound waves, the sound waves drive the gas in the first chamber 101 to vibrate, and the foreign matters in the first chamber 101 are agglomerated and agglomerated at an antinode of a standing wave of the sound waves. When the first foreign-matter agglomerating member 109, the second foreign-matter agglomerating member 110, the third foreign-matter agglomerating member 111, and the fourth foreign-matter agglomerating member 112 are sound generators, and when the first foreign-matter agglomerating member 109, the second foreign-matter agglomerating member 110, the third foreign-matter agglomerating member 111, and the fourth foreign-matter agglomerating member 112 are respectively turned on, the foreign matters in the first chamber 101 are respectively agglomerated and agglomerated in the first foreign-matter agglomerating region S1, the second foreign-matter agglomerating region S2, the third foreign-matter agglomerating region S3, and the fourth foreign-matter agglomerating region S4.
Because different vibration frequency is different to the amplitude of the foreign matter of different particle diameters, the sound wave of higher frequency is more effective to the gathering of small-size granule, and lower frequency is more effective to the gathering of large-size granule, consequently, the vibration frequency of first vibrations portion of taking place is greater than the vibration frequency of second vibrations portion of taking place, the vibration frequency of third vibrations portion of taking place is greater than the vibration frequency of fourth vibrations portion of taking place, so that small-size granule diameter foreign matter in the first cavity 101 to when the lateral wall of first cavity 101 removed, the particle diameter of constantly increasing the foreign matter increases the foreign matter that the particle diameter is greater than 1 micron in the first cavity 101 reduces the particle diameter and is less than 1 micron of foreign matter, is favorable to improving the repair success rate in the display panel processing procedure and further improves display panel's product yield. Preferably, the first and fourth vibration generators may have a vibration frequency of 20 to 13 khz, and the second and fourth vibration generators may have a vibration frequency of 1 to 13 khz.
When the first vibration generating unit, the second vibration generating unit, the third vibration generating unit and the fourth vibration generating unit generate sound waves, the first foreign matter condensation area S1, the second foreign matter condensation area S2, the third foreign matter condensation area S3 and the fourth foreign matter condensation area S4 are conical areas, and vertex angles of the first foreign matter condensation area S1, the second foreign matter condensation area S2, the third foreign matter condensation area S3 and the fourth foreign matter condensation area S4 are respectively located at a side where the first foreign matter condensation area S1 is close to the first vibration generating unit, a side where the second foreign matter condensation area S2 is close to the second vibration generating unit, a side where the third foreign matter condensation area S3 is close to the third vibration generating unit and a side where the fourth foreign matter condensation area S4 is close to the fourth vibration generating unit.
The first foreign substance condensation region S1 has a first axis of symmetry, the second foreign substance condensation region S2 has a second axis of symmetry, the third foreign substance condensation region S3 has a third axis of symmetry, the fourth foreign substance condensation region S4 has a fourth axis of symmetry, the first coil portion extends spirally along a first central axis, the second coil portion extends spirally along a second central axis, the first central axis is parallel to the second axis of symmetry, and the second central axis is parallel to the fourth axis of symmetry, which is advantageous for increasing the overlapping area of the first coil portion and the second foreign substance condensation region S2 and the overlapping area of the second coil portion and the fourth foreign substance condensation region S4, and for increasing the foreign substance adsorption efficiency of the first foreign substance adsorption member 115 and the second foreign substance adsorption member 116. Preferably, the first central axis coincides with the second axis of symmetry, and the second central axis coincides with the fourth axis of symmetry, so as to maximize an overlapping area of the first coil portion and the second foreign substance condensation region S2 and an overlapping area of the second coil portion and the fourth foreign substance condensation region S4.
In order to realize the parallelism between the first central axis and the second symmetry axis and the parallelism between the second central axis and the fourth symmetry axis, a seventh included angle formed by the first foreign substance adsorption member 107 and the bottom of the first chamber 101 and the second included angle θ are formed in the first direction 2 Similarly, an eighth included angle formed by the second foreign material adsorbing member 108 and the bottom of the first chamber 101 is equal to the fourth included angle θ 4 Also, the first direction is parallel to the bottom of the first chamber 101.
Referring to fig. 2 to 8, in some embodiments, the first foreign matter agglomeration part 105 further includes a fifth foreign matter agglomeration member 113, and the fifth foreign matter agglomeration member 113 is located between the first foreign matter agglomeration member 109 and the second foreign matter agglomeration member 110.
The second foreign-substance binding member 106 further includes a sixth foreign-substance binding member 114, and the sixth foreign-substance binding member 114 is located between the third foreign-substance binding member 111 and the fourth foreign-substance binding member 112.
Wherein, along the direction from the second foreign matter coagulation member 110 to the first foreign matter coagulation member 109, the fifth foreign matter coagulation member 113 forms a fifth included angle θ with the bottom of the first chamber 101 5 Said fifth angle θ 5 Is greater than the first included angle theta 1 And is less than the second included angle theta 2 。
The sixth foreign matter agglomerating member 114 forms a sixth angle θ with the bottom of the first chamber 101 in a direction from the fourth foreign matter agglomerating member 112 to the third foreign matter agglomerating member 111 6 Said sixth angle θ 6 Is greater than the third included angle theta 3 And is less than the fourth included angle theta 4 。
The fifth foreign matter coagulation member 113 is additionally arranged between the first foreign matter coagulation member 109 and the second foreign matter coagulation member 110, and the fifth included angle theta 5 Greater than the first included angle theta 1 Is smaller than the second included angle theta 2 The sixth foreign matter aggregation member 114 is additionally provided between the third foreign matter aggregation member 111 and the fourth foreign matter aggregation member 112, and the sixth angle θ is set to be smaller than the first angle 6 Is greater than the third included angle theta 3 Is less than the fourth included angle theta 4 Make the first included angle theta 1 The fifth included angle theta 5 The second included angle theta 2 And the magnitude of said third angle theta is gradually increased 3 The sixth included angle theta 6 The fourth included angle theta 4 The gradual lifting of the first chamber is advantageous for further expanding the foreign matter condensation range of the foreign matter condensation member and the second foreign matter condensation member 106, and for forming the first chamber101 to the first foreign substance adsorption member 107 and the second foreign substance adsorption member 108 more effectively.
When the fifth foreign matter aggregation member 113 is additionally provided to the first foreign matter aggregation part 105 and the sixth foreign matter aggregation member 114 is additionally provided to the second foreign matter aggregation part 106, the first included angle θ is larger than the second included angle θ 1 The third included angle theta 3 Preferably, the range of (A) is 40-50 degrees, and the fifth included angle theta is 5 The sixth included angle theta 6 The preferred range of (a) is 60-70 degrees, and the second included angle theta is 2 The fourth included angle theta 4 Preferably in the range of 80 to 90 degrees, to achieve more continuous and sufficient stepwise guiding of foreign matters in the first chamber 101 to the first foreign-matter adsorption member 107 and the second foreign-matter adsorption member 108.
The fifth foreign matter condensing member 113 forms a fifth foreign matter condensing region, and the sixth foreign matter condensing member 114 forms a sixth foreign matter condensing region, in which case the fifth foreign matter condensing region overlaps with the first foreign matter condensing region S1 and the second foreign matter condensing region S2, respectively, the sixth foreign matter condensing region overlaps with the third foreign matter condensing region S3 and the fourth foreign matter condensing region S4, respectively, the first foreign matter condensing region S1 and the second foreign matter condensing region S2 may or may not overlap, and the third foreign matter condensing region S3 and the fourth foreign matter condensing region S4 may or may not overlap. By the overlapping of the fifth foreign-matter condensation region with the first foreign-matter condensation region S1 and the second foreign-matter condensation region S2, respectively, and the overlapping of the sixth foreign-matter condensation region with the third foreign-matter condensation region S3 and the fourth foreign-matter condensation region S4, respectively, the transfer of the foreign matter condensed by the first foreign-matter condensation member 109 to the second foreign-matter condensation region S2 and the multiple condensation by the second foreign-matter condensation member 110, the fifth foreign-matter condensation member 113 are facilitated, and the foreign matter condensed by the third foreign-matter condensation member 111 is transferred to the fourth foreign-matter condensation region S4 and the multiple condensation by the fourth foreign-matter condensation member 112, the sixth foreign-matter condensation member 114.
The fifth foreign matter agglomerating member 113 includes a fifth vibration generating portion, the sixth foreign matter agglomerating member 114 includes a sixth vibration generating portion, the vibration frequencies of the first vibration generating portion, the fifth vibration generating portion and the second vibration generating portion are sequentially reduced, and the vibration frequencies of the third vibration generating portion, the sixth vibration generating portion and the fourth vibration generating portion are sequentially reduced.
The fifth and sixth foreign substance condensing members 113 and 114 may be sound wave generators, in which case the fifth and sixth vibration generators generate sound waves, the sound waves drive the gas in the first chamber 101 to vibrate, and the foreign substances in the first chamber 101 are condensed and condensed at the antinodes of the standing waves of the sound waves. When the fifth and sixth foreign substance condensing members 113 and 114 are sound generators and the fifth and sixth foreign substance condensing members 113 and 114 are opened, the foreign substances in the first chamber 101 are condensed and condensed in the fifth and sixth foreign substance condensing regions, respectively.
Because different vibration frequencies have different amplitudes for foreign matters with different particle sizes, the sound wave with higher frequency is more effective for gathering small-particle-size particles, the sound wave with lower frequency is more effective for gathering large-particle-size particles, therefore, the vibration frequency of the first vibration generating part, the fifth vibration generating part and the second vibration generating part is reduced in sequence, the vibration frequency of the third vibration generating part, the sixth vibration generating part and the fourth vibration generating part are sequentially reduced, which is beneficial to moving small-particle-size foreign matters in the first chamber 101 to the side wall of the first chamber 101, the particle size of the foreign matter is continuously increased, the foreign matter with the particle size larger than 1 micron in the first chamber 101 is increased, the foreign matter with the particle size smaller than 1 micron is reduced, the repair success rate in the manufacturing process of the display panel is improved, and the product yield of the display panel is further improved. Preferably, the first and fourth vibration generators may have a vibration frequency of 15 to 20 khz, the fifth and sixth vibration generators may have a vibration frequency of 8 to 13 khz, and the second and fourth vibration generators may have a vibration frequency of 1 to 5 khz.
When the fifth vibration generating part and the sixth vibration generating part generate sound waves, the fifth foreign matter condensation area and the sixth foreign matter condensation area are conical areas, and the vertex angles of the fifth foreign matter condensation area and the sixth foreign matter condensation area are respectively positioned on one side of the fifth foreign matter condensation area close to the fifth vibration generating part and one side of the sixth foreign matter condensation area close to the sixth vibration generating part.
Referring to fig. 1 and 2, in some embodiments, the first chamber 101 further includes a foreign material removing assembly 117 disposed on a sidewall of the first chamber 101, and the foreign material adsorbed by the foreign material adsorbing assembly 103 is discharged out of the first chamber 101 through the foreign material removing assembly 117.
The foreign material removal assembly 117 may include a turbo-molecular pump for discharging the foreign material out of the first chamber 101 by vacuum suction.
The foreign material removing assembly 117 may be disposed at a sidewall of the first chamber 101. The foreign material removing assembly 117 may be disposed corresponding to the foreign material adsorption assembly 103.
When the foreign material removing assembly 117 is disposed corresponding to the foreign material adsorbing assembly 103, after the foreign material adsorbing assembly 103 adsorbs the foreign material agglomerated by the foreign material agglomerating assembly 102, the foreign material adsorbing assembly 103 may be immediately closed and the foreign material removing assembly 117 may be opened, so that the foreign material originally adsorbed by the foreign material adsorbing assembly 103 is immediately discharged from the first chamber 101.
Since the foreign matter removing assembly 117 may generate an air flow disturbance problem when removing the foreign matter, the foreign matter removing assembly 117 is not disposed corresponding to the foreign matter adsorbing assembly 103, at this time, after the foreign matter adsorbing assembly 103 adsorbs the foreign matter coagulated by the foreign matter coagulating assembly 102, the foreign matter adsorbing assembly 103 needs to keep adsorbing the foreign matter until the coating apparatus 100 enters the equipment maintenance stage, and the foreign matter adsorbing assembly 103 is closed and the foreign matter removing assembly 117 is opened at the equipment maintenance stage, so that the foreign matter originally adsorbed by the foreign matter adsorbing assembly 103 is discharged from the first chamber 101.
The embodiment of the invention discloses a coating device 100, wherein the foreign matter in the first chamber 101 is condensed by the foreign matter condensation component 102 and moves towards the side wall of the first chamber 101, the foreign matter adsorption component 103 adsorbs the foreign matter condensed by the foreign matter condensation component 102 and moves towards the side wall of the first chamber 101, the foreign matter dispersed in the first chamber 101 is reduced, the influence of the foreign matter on a display panel in the process is reduced, and the product yield of the display panel is improved.
Referring to fig. 9, an embodiment of the present invention further provides a cleaning method for a coating apparatus, including:
s100, the first foreign-matter aggregation member 109 and the third foreign-matter aggregation member 111 are opened.
In some embodiments, step S100 comprises:
s101, introducing inert gas into the first chamber 101 of the coating device.
The first chamber 101 includes an air duct 104 disposed at the bottom of the first chamber 101, and the inert gas is introduced into the first chamber 101 through the air duct 104.
S102, the first foreign matter aggregation member 109 and the third foreign matter aggregation member 111 are opened.
The first foreign matter aggregation member 109 and the third foreign matter aggregation member 111 are respectively provided with a first foreign matter aggregation region S1 and a third foreign matter aggregation region S3, and the foreign matters in the first chamber 101 are aggregated and aggregated in the first foreign matter aggregation region S1 and the third foreign matter aggregation region S3 after the first foreign matter aggregation member 109 and the third foreign matter aggregation member 111 are opened.
S200, opening a fifth foreign-matter agglomeration member 113 and a sixth foreign-matter agglomeration member 114, and closing the first foreign-matter agglomeration member 109 and the third foreign-matter agglomeration member 111.
After the fifth and sixth foreign matter agglomerating members 113 and 114 are turned on, a fifth foreign matter agglomerating region overlapping the first foreign matter agglomerating region S1 such that the foreign matters located in the first foreign matter agglomerating region S1 move from the first foreign matter agglomerating region S1 to the fifth foreign matter agglomerating region and continue to agglomerate, and a sixth foreign matter agglomerating region overlapping the third foreign matter agglomerating region S3 such that the foreign matters located in the third foreign matter agglomerating region S3 move from the third foreign matter agglomerating region S3 to the sixth foreign matter agglomerating region and continue to agglomerate are formed, respectively.
The opening of the fifth foreign matter aggregation member 113 and the closing of the first foreign matter aggregation member 109 may be performed simultaneously or the fifth foreign matter aggregation member 113 may be opened in advance for a certain period of time and then the first foreign matter aggregation member 109 is closed; the sixth foreign matter agglomerating member 114 may be opened simultaneously with the third foreign matter agglomerating member 111 being closed or the sixth foreign matter agglomerating member 114 may be opened for a while before the third foreign matter agglomerating member 111 is closed.
S300, opening the second foreign substance aggregation member 110 and the fourth foreign substance aggregation member 112, and closing the fifth foreign substance aggregation member 113 and the sixth foreign substance aggregation member 114.
After the second foreign matter cohesion member 110 and the fourth foreign matter cohesion member 112 are opened, a second foreign matter cohesion region S2 and a fourth foreign matter cohesion region S4 are formed, respectively, the fifth foreign matter cohesion region overlaps with the second foreign matter cohesion region S2 such that foreign matters located in the fifth foreign matter cohesion region move from the fifth foreign matter cohesion region to the second foreign matter cohesion region S2 and continue to be coagulated, and the sixth foreign matter cohesion region overlaps with the fourth foreign matter cohesion region S4 such that foreign matters located in the sixth foreign matter cohesion region move from the sixth foreign matter cohesion region to the fourth foreign matter cohesion region S4 and continue to be coagulated.
The opening of the second foreign substance cohesion member 110 and the closing of the fifth foreign substance cohesion member 113 may be performed simultaneously or the fifth foreign substance cohesion member 113 may be closed after the second foreign substance cohesion member 110 is opened in advance for a certain period of time; the opening of the fourth foreign substance condensing member 112 and the closing of the sixth foreign substance condensing member 114 may be performed simultaneously or the sixth foreign substance condensing member 114 may be closed after the fourth foreign substance condensing member 112 is opened for a certain period of time in advance.
S400, turning on the foreign matter adsorption assembly and turning off the second foreign matter aggregation member 110 and the fourth foreign matter aggregation member 112.
The foreign matter adsorbing member 103 adsorbs foreign matters aggregated by the second foreign matter aggregating member 110 and the fourth foreign matter aggregating member 112.
The foreign substance adsorption module 103 includes a first foreign substance condensation member 105 provided corresponding to the second foreign substance condensation member 110, and a second foreign substance adsorption member 108 provided corresponding to the fourth foreign substance condensation member 112.
The first foreign matter adsorption part 107 may be opened simultaneously with the closing of the second foreign matter aggregation member 110, or the first foreign matter adsorption part 107 may be opened for a while before the second foreign matter aggregation member 110 is closed, so that the foreign matters aggregated by the second foreign matter aggregation member 110 are adsorbed by the first foreign matter adsorption part 107; the second foreign substance adsorption part 108 may be turned on simultaneously with the turning off of the fourth foreign substance aggregation member 112, or the second foreign substance adsorption part 108 may be turned on for a while before the turning off of the fourth foreign substance aggregation member 112, so that the foreign substances aggregated by the fourth foreign substance aggregation member 112 are adsorbed by the second foreign substance adsorption part 108.
The first foreign-substance aggregation member 109, the second foreign-substance aggregation member 110, and the third foreign-substance aggregation member 111. The specific structures, positions, etc. of the fourth foreign matter aggregation member 112, the fifth foreign matter aggregation member 113, the sixth foreign matter aggregation member 114 and the foreign matter adsorption assembly 103 are described in the foregoing coating apparatus, and will not be described in detail herein.
In some embodiments, the steps of turning on the foreign substance adsorption assembly and turning off the second foreign substance condensing member 110 and the fourth foreign substance condensing member 112 further include:
s500, opening the foreign substance removing assembly 117 and closing the foreign substance adsorbing assembly 103.
In some embodiments, the foreign material removing assembly 117 may be turned on simultaneously with the foreign material adsorbing assembly 103, or the foreign material removing assembly 117 may be turned on for a period of time before turning off the foreign material adsorbing assembly 103, so that the foreign materials adsorbed by the foreign material adsorbing assembly 103 are discharged from the first chamber 101.
Step S500 may be performed immediately after step S400 is completed, or may be performed when the coating apparatus is in an equipment maintenance stage.
The structure, position, etc. of the foreign material removing assembly 117 are already described in the foregoing coating device, and will not be described in detail herein.
The cleaning method of the coating device disclosed by the embodiment of the invention comprises the foreign matter condensation member, the second foreign matter condensation member 110 and the third foreign matter condensation member 111. The fourth foreign matter condensing member 112, the fifth foreign matter condensing member 113 and the sixth foreign matter condensing member 114 condense the foreign matters in the first chamber 101 and move the foreign matters toward the side wall of the first chamber 101, and the foreign matter adsorbing assembly 103 adsorbs the foreign matters condensed by the second foreign matter condensing member 110 and the fourth foreign matter condensing member 112 and moved toward the side wall of the first chamber 101, thereby reducing the foreign matters dispersed in the first chamber 101, reducing the influence of the foreign matters on the display panel in the manufacturing process and improving the product yield of the display panel.
The embodiment of the invention discloses a coating device and a cleaning method thereof. The coating device comprises: the first chamber comprises a foreign matter condensation assembly and a foreign matter adsorption assembly, wherein the foreign matter condensation assembly and the foreign matter adsorption assembly are arranged at the bottom of the first chamber, the foreign matter adsorption assembly is positioned between the foreign matter condensation assembly and the side wall of the first chamber, and the foreign matter adsorption assembly and the foreign matter condensation assembly are correspondingly arranged. The foreign matter agglomeration component agglomerates the foreign matters in the first chamber and enables the foreign matters to move towards the side wall of the first chamber, and the foreign matter adsorption component adsorbs the foreign matters agglomerated by the foreign matter agglomeration component. According to the invention, the foreign matter in the first cavity is condensed by the foreign matter condensing assembly and moves towards the side wall of the first cavity, and the foreign matter adsorption assembly adsorbs the foreign matter condensed by the foreign matter condensing assembly and moves towards the side wall of the first cavity, so that the foreign matter dispersed in the first cavity is reduced, the influence of the foreign matter on the display panel in the manufacturing process is reduced, and the product yield of the display panel is improved.
The above detailed description is provided for the coating device and the cleaning method thereof according to the embodiments of the present invention, and the principle and the embodiments of the present invention are explained by applying specific examples, and the above description of the embodiments is only used to help understanding the method and the core idea of the present invention; meanwhile, for those skilled in the art, according to the idea of the present invention, there may be variations in the specific embodiments and the application scope, and in summary, the content of the present specification should not be construed as a limitation to the present invention.
Claims (10)
1. A coating device is characterized by comprising a first chamber, wherein the first chamber comprises a foreign matter condensation assembly and a foreign matter adsorption assembly which are arranged at the bottom of the first chamber, the foreign matter adsorption assembly is positioned between the foreign matter condensation assembly and the side wall of the first chamber, and the foreign matter adsorption assembly and the foreign matter condensation assembly are correspondingly arranged;
the foreign matter condensation assembly condenses the foreign matters in the first chamber and moves the foreign matters to the side wall of the first chamber, and the foreign matter adsorption assembly adsorbs the foreign matters condensed by the foreign matter condensation assembly.
2. The plating device according to claim 1, wherein the first chamber further comprises an air vent pipe provided at a bottom of the first chamber;
the foreign matter condensation assembly comprises a first foreign matter condensation part and a second foreign matter condensation part which are positioned at two opposite sides of the ventilation pipeline;
the foreign matter adsorption component comprises a first foreign matter adsorption part positioned on one side of the first foreign matter condensation part, which is far away from the ventilation pipeline, and a second foreign matter adsorption part positioned on one side of the second foreign matter condensation part, which is far away from the ventilation pipeline;
wherein the first foreign matter adsorbing member is provided corresponding to the first foreign matter aggregating member, and the second foreign matter adsorbing member is provided corresponding to the second foreign matter aggregating member.
3. The plating device according to claim 2, wherein the first foreign-matter condensing member includes a first foreign-matter condensing member and a second foreign-matter condensing member located on a side of the first foreign-matter condensing member away from the air duct;
the second foreign matter coagulation part comprises a third foreign matter coagulation member and a fourth foreign matter coagulation member positioned on the side of the third foreign matter coagulation member away from the vent pipe;
the first foreign matter condensing member and the bottom of the first chamber form a first included angle in the direction from the second foreign matter condensing member to the first foreign matter condensing member, the second foreign matter condensing member and the bottom of the first chamber form a second included angle, and the first included angle is smaller than the second included angle;
and in the direction from the fourth foreign matter coagulation member to the third foreign matter coagulation member, the third foreign matter coagulation member forms a third included angle with the bottom of the first chamber, the fourth foreign matter coagulation member forms a fourth included angle with the bottom of the first chamber, and the third included angle is smaller than the fourth included angle.
4. The plating device according to claim 3, wherein the first foreign-matter condensing part further comprises a fifth foreign-matter condensing member located between the first foreign-matter condensing member and the second foreign-matter condensing member;
the second foreign matter agglomerating component further comprises a sixth foreign matter agglomerating member located between the third foreign matter agglomerating member and the fourth foreign matter agglomerating member;
a fifth included angle is formed between the fifth foreign matter condensation member and the bottom of the first chamber along the direction from the second foreign matter condensation member to the first foreign matter condensation member, and the fifth included angle is larger than the first included angle and smaller than the second included angle;
and in the direction from the fourth foreign matter coagulation member to the third foreign matter coagulation member, a sixth included angle is formed between the sixth foreign matter coagulation member and the bottom of the first chamber, and the sixth included angle is larger than the third included angle and smaller than the fourth included angle.
5. The plating device according to claim 4, wherein the first foreign-matter condensation member forms a first foreign-matter condensation region, the second foreign-matter condensation member forms a second foreign-matter condensation region, and the fifth foreign-matter condensation member forms a fifth foreign-matter condensation region;
the third foreign-matter agglomeration member forms a third foreign-matter agglomeration zone, the fourth foreign-matter agglomeration member forms a fourth foreign-matter agglomeration zone, and the sixth foreign-matter agglomeration member forms a sixth foreign-matter agglomeration zone;
wherein the fifth foreign matter condensation area overlaps with the first foreign matter condensation area and the second foreign matter condensation area, respectively, and the sixth foreign matter condensation area overlaps with the third foreign matter condensation area and the fourth foreign matter condensation area, respectively.
6. The plating device according to claim 5, wherein the first foreign-substance adsorption part includes a first foreign-substance adsorption member at an end remote from the bottom of the first chamber, and the second foreign-substance adsorption part includes a second foreign-substance adsorption member at an end remote from the bottom of the first chamber;
wherein the first foreign matter adsorbing member is at least partially located in the second foreign matter condensation region, and the second foreign matter adsorbing member is at least partially located in the fourth foreign matter condensation region.
7. The plating device according to claim 4, wherein the first foreign-matter condensing member includes a first vibration generating portion, the second foreign-matter condensing member includes a second vibration generating portion, and the fifth foreign-matter condensing member includes a fifth vibration generating portion;
the third foreign-matter agglomerating member includes a third vibration generating portion, the fourth foreign-matter agglomerating member includes a fourth vibration generating portion, and the sixth foreign-matter agglomerating member includes a sixth vibration generating portion;
wherein, the first vibrations emergence portion, the fifth vibrations emergence portion and the vibration frequency of second vibrations emergence portion reduces in proper order, the third vibrations emergence portion the sixth vibrations emergence portion and the vibration frequency of fourth vibrations emergence portion reduces in proper order.
8. The plating device according to claim 1, wherein the first chamber further comprises a foreign substance removal assembly disposed at a side wall of the first chamber, and the foreign substances adsorbed by the foreign substance adsorption assembly are discharged out of the first chamber through the foreign substance removal assembly.
9. A cleaning method of a coating device is characterized by comprising the following steps:
opening the first foreign matter agglomerating member and the third foreign matter agglomerating member;
opening a fifth foreign matter agglomerating member and a sixth foreign matter agglomerating member and closing the first foreign matter agglomerating member and the third foreign matter agglomerating member;
opening a second foreign matter condensing member and a fourth foreign matter condensing member and closing the fifth foreign matter condensing member and the sixth foreign matter condensing member;
opening a foreign matter adsorption assembly and closing the second foreign matter coagulation member and the fourth foreign matter coagulation member;
wherein the foreign matter adsorbing member adsorbs the foreign matters aggregated by the second foreign matter aggregating member and the fourth foreign matter aggregating member.
10. The cleaning method for a plating device according to claim 9, further comprising, after the step of turning on the foreign matter adsorption means and turning off the second foreign matter condensation member and the fourth foreign matter condensation member:
and opening the foreign matter removing assembly and closing the foreign matter adsorbing assembly.
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| CN114277337A (en) * | 2021-12-16 | 2022-04-05 | 深圳市华星光电半导体显示技术有限公司 | Vapor deposition device and method for manufacturing vapor deposition device |
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| US5531862A (en) * | 1993-07-19 | 1996-07-02 | Hitachi, Ltd. | Method of and apparatus for removing foreign particles |
| US6109880A (en) * | 1994-10-31 | 2000-08-29 | Saes Pure Gas, Inc. | Getter pump module and system including focus shields |
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