CN114900938A - High-density plasma source with controllable ion velocity vector - Google Patents
High-density plasma source with controllable ion velocity vector Download PDFInfo
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Abstract
The invention relates to the technical field of plasma sources, and provides a high-density plasma source with controllable ion velocity vectors, wherein working medium gas is distributed by a flow controller and then enters an MPDA (multi-point plasma data acquisition) module through a pipeline for preliminary ionization, and the obtained low-density plasma enters a ceramic discharge cavity through an entrance end; under the constraint of the magnetic field of the magnetic mirror array, the seed electrons in the ceramic discharge cavity continuously ionize low-density plasma; adjusting the ion speed direction and size of the high-density high-energy plasma; the high-density high-energy plasma breaks through the restraint of the magnetic mirror array, converges towards the plasma leading-out end of the ceramic discharge cavity and accelerates the high-density high-energy plasma to be sprayed out from the magnetic spray pipe at the plasma leading-out end. The scheme of the invention realizes the purposes of high energy, high ionization rate and strong controllability of the generated plasma.
Description
Technical Field
The invention relates to the technical field of plasma sources, in particular to a high-density plasma source with controllable ion velocity vectors.
Background
The plasma is referred to as a fourth state of matter, and is a mixed gas composed of charged particles such as electrons and ions and neutral particles (atoms, molecules, fine particles, and the like), which macroscopically exhibits quasi-neutrality and has a collective effect.
The plasma is typically generated by heating a gas, a gas discharge. The gas can be partially ionized or completely ionized in the heating process, namely, outer electrons of atoms can be broken from the constraint of atomic nuclei to become free electrons, and the atoms losing the outer electrons become charged ions. When the proportion of charged particles exceeds a certain level, the ionized gas exhibits significant electromagnetic properties.
The plasma source is a device for generating plasma, and generally generates plasma by ionizing working medium gas through electrode discharge or generates discharge by heating electrons through waves to impact neutral working medium gas. The low-temperature plasma sources commonly used in laboratories are of various types, and the action mechanisms of different plasma sources are different. Common low temperature plasma sources include the following: (1) and D, discharging the direct current, inserting two metal electrodes into the low-pressure gas, applying direct current voltage, and gradually increasing the voltage to a certain value to find that the gas is conductive and emits light. (2) In the alternating current discharge, when an alternating current electric field is applied to two electrodes of the discharge tube, each electrode is alternately an anode or a cathode. If the applied voltage in the half-cycle exceeds the breakdown voltage, an AC discharge is obtained. (3) An Electron Cyclotron Resonance (ECR) plasma source (Electron Cyclotron Resonance) operates in the microwave band, and heats a plasma by microwaves. (4) The Helicon-Wave Plasma source (HWP) couples energy to the Helicon Wave through an antenna by an external radio frequency power supply, and the Helicon Wave transmits the energy to electrons in a Landau damping mode, thereby generating a stable discharge phenomenon. (5) A radio frequency capacitively Coupled Plasma source (CCP) is characterized in that a radio frequency power supply is connected to two capacitor plates, an oscillating electric field is generated between the two capacitor plates, electrons are accelerated in the oscillating electric field, and continuously impact neutral particles to form an electron avalanche effect, so that discharge is stabilized.
The ion speed of the plasma generated by the common plasma source is not controllable, and the density of the generated plasma is low, so that the research requirements of high density and controllable ion speed cannot be met.
Disclosure of Invention
In view of the above, the present invention provides a high-density plasma source with a controllable ion velocity vector, so as to solve the problems in the prior art that the ion velocity in the plasma generated by the plasma source is not controllable, the density of the generated plasma is low, and the research requirements of high density and controllable ion velocity cannot be met.
In a first aspect of the present invention, there is provided a high density plasma source with controllable ion velocity vector, comprising two sets of the following devices: the device comprises an MPDA module 5, a magnetic mirror power supply 6, an electromagnetic coil 7, an ICR antenna 11, an ICR power source 8, a working medium storage tank 1, a flow controller 2 and a pipeline 3, and further comprises a pulse electromagnetic valve antenna 12, a pulse electromagnetic control unit 14, a magnetic spray pipe 15 and a ceramic discharge cavity 16, wherein the two sets of equipment are symmetrically arranged on two sides of the ceramic discharge cavity 16;
the MPDA module 5 comprises an MPDA power supply 4 and a magnetic plasma arc plasma source (MPDA), working medium gas in the working medium storage tank 1 enters the flow controller 2 through a pipeline 3 and then enters the MPDA module 5 through the pipeline 3, the working medium gas is primarily ionized, and generated seed electrons and low-density plasma enter the ceramic discharge cavity 16;
the electromagnetic coil 7 is positioned outside the ceramic discharge cavity 16, the magnetic mirror power supply 6 and the electromagnetic coil 7 form a magnetic mirror array, the low-density plasma is restrained and gathered under the control of the electromagnetic coil 7, the seed electrons continuously ionize the low-density plasma, and the ionization rate of the plasma is improved;
the ICR antenna 11 is wound on the outer side of the ceramic discharge cavity 16, the ICR antenna 11 and the ICR power source 8 form an ICR discharge module, and the ICR discharge module is used for injecting energy into the low-density plasma to obtain high-density high-energy plasma;
the pulse electromagnetic valve antenna 12 is wound on a magnetic core 13 to form a coil and is connected with the pulse electromagnetic control unit 14, high-frequency changing current is introduced into the pulse electromagnetic valve antenna 12 to obtain a magnetic field generated by alternating current, the direction and the size of the induced magnetic field are changed by controlling the inclination angle, the pulse duty ratio and the current size of the coil, the ion velocity direction and the ion velocity size of the high-density high-energy plasma are adjusted, and the high-density high-energy plasma is focused and then accelerated to be led out;
the magnetic nozzle 15 forms an electromagnetic accelerating structure for further accelerating the high-density high-energy plasma, so that the high-density high-energy plasma is accelerated and ejected at a plasma leading-out end of the ceramic discharge cavity 16.
Further, the seed electrons include high-energy electrons.
Furthermore, the ICR discharge module is an electrodeless structure so as to reduce the corrosion to the electrode and realize a high-power working mode.
Furthermore, the magnetic mirror array is used for restraining the low-density plasma under a set energy threshold value by adjusting a magnetic mirror power supply 6 and obtaining high-density plasma through multiple times of energy injection.
Furthermore, the ICR antenna 11 is located at a position close to the magnetic mirror array, and cooling water 9 is introduced into the ICR antenna to achieve the purpose of reducing the working temperature of the antenna;
the ICR power source 8 is used for feeding power into the ceramic discharge cavity 16 through the ICR antenna 11, heating ions in the plasma and improving the density and ion energy of the low-density plasma.
Furthermore, the outer surface of the ICR antenna 11 is wrapped by a soft iron metal layer with a set thickness, and is insulated from the ICR antenna 11, so as to reflect the electromagnetic wave radiated outwards by the ICR antenna 11.
Further, the pulsed electromagnetic control unit 14 is also used for changing the confinement of the plasma in the ceramic discharge chamber 16 by adjusting the current.
In a second aspect of the present invention, there is provided a method for generating a high-density plasma, comprising the steps of:
s1, distributing the working medium gas through the flow controller 2, and then entering the MPDA module 5 through the pipeline 3 for preliminary ionization, wherein the obtained low-density plasma enters the ceramic discharge cavity 16;
s2, under the restraint of the magnetic field of the magnetic mirror array, the seed electrons in the ceramic discharge cavity 16 continuously ionize the low-density plasma to improve the plasma ionization rate;
s3, the ICR power source 8 transmits electromagnetic energy to plasma in the ceramic discharge cavity 16 through the ICR antenna 11, and uses cooling water 9 to cool the ICR antenna 11 in the transmission process so as to reduce power loss, and high-density and high-energy plasma is formed under the action of magnetic field energy and input power;
s4, the pulse electromagnetic control unit 14 controls the inclination angle, the pulse duty ratio and the current of a coil formed by the pulse electromagnetic valve antenna 12 and the magnetic core 13 through a control power supply to change the direction and the size of an induced magnetic field, and adjusts the ion velocity direction and the size of the high-density high-energy plasma;
s5 the induced magnetic field induces and generates current in an angular direction close to the wall surface of the ceramic discharge cavity 16, a Hall electric field which is crossed and vertical to the axial direction of the ceramic discharge cavity 16 is generated, ions of the high-density high-energy plasma are accelerated, the ion concentration density of the high-density high-energy plasma in the Hall electric field direction is increased, and the ions of the high-density high-energy plasma are further accelerated in the radial direction by the directional electric field generated by the high-density area and the low-density area;
s6, the high-density high-energy plasma breaks through the restraint of the magnetic mirror array and converges towards the plasma leading-out end of the ceramic discharge cavity 16, the magnetic spray pipe 15 fixedly connected with the plasma leading-out end converts the axial velocity component of the ions of the high-density high-energy plasma to the radial direction, indirectly accelerates the ions of the high-density high-energy plasma, improves the energy of the generated ions, and accelerates and sprays the high-density high-energy plasma.
Compared with the prior art, the invention has the following beneficial effects:
1. the invention discloses a high-density plasma source with controllable ion velocity vector, which uses a pulse electromagnetic control device consisting of a conducting wire wound on a magnetic core and a control power supply to gather and directionally accelerate ions and improve the ion velocity. Meanwhile, the direction and the size of the induced magnetic field are changed by controlling the inclination angle, the pulse duty ratio and the current of the coil, so that the adjustment of the direction and the size of the ion speed is realized.
2. The invention discloses a high-density plasma source with controllable ion velocity vectors, which uses an antenna wound by a lead, and an ICR power source can couple energy into plasma through the antenna to realize a high-power working mode.
3. The invention discloses a high-density plasma source with controllable ion velocity vectors, which uses two MPDAs as a generating device of first-stage plasma, has the characteristics of high electron energy, high ionization rate, strong controllability and the like of the generated plasma, and is a mode for generating the plasma by the device.
4. The invention discloses a high-density plasma source with controllable ion velocity vectors, which uses a magnetic mirror controlled by an electromagnetic coil to restrain plasma and generates high-density and high-ionization-rate plasma. The further acceleration of the magnetic jet pipe improves the ion ejection speed.
Drawings
In order to more clearly illustrate the technical solution of the present invention, the drawings needed for the embodiment or the prior art description will be briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings without creative efforts.
FIG. 1 is a schematic view of a high density plasma source with controllable ion velocity vector according to the present invention;
fig. 2 is a flow chart of a method for generating high-density plasma with controllable ion velocity vector according to the present invention.
The reference symbols in the drawings have the following meanings:
1-working medium storage tank, 2-flow controller, 3-pipeline, 4-MPDA power supply, 5-MPDA, 6-magnetic mirror power supply, 7-electromagnetic coil, 8-ICR power supply, 9-cooling water, 11-Faraday shielding layer, 11-ICR antenna, 12-pulse electromagnetic valve antenna, 13-magnetic core, 14-pulse electromagnetic unit control power supply, 15-magnetic spray pipe and 16-ceramic discharge cavity;
Detailed Description
In the following description, for purposes of explanation and not limitation, specific details are set forth, such as particular system structures, techniques, etc. in order to provide a thorough understanding of the embodiments of the invention. It will be apparent, however, to one skilled in the art that the present invention may be practiced in other embodiments that depart from these specific details. In other instances, detailed descriptions of well-known systems, devices, circuits, and methods are omitted so as not to obscure the description of the present invention with unnecessary detail.
A high density plasma source in which an ion velocity vector is controllable according to the present invention will be described in detail with reference to the accompanying drawings.
Fig. 1 is a schematic view of a high density plasma source with controllable ion velocity vector according to the present invention.
As shown in fig. 1, the high density plasma source includes:
two MPDA modules 5, two magnetic mirror power supplies 6, two electromagnetic coils 7, two ICR antennas 11, two ICR power sources 8, two pipelines 3, a pulse electromagnetic valve antenna 12, a pulse electromagnetic control unit 14, a magnetic spray pipe 15 and a ceramic discharge cavity 16,
the MPDA modules 5 are positioned on two sides of the ceramic discharge cavity 16, comprise an MPDA power supply and an MPDA and are used for enabling the working medium gas in the working medium storage tank 1 to enter the flow controller 2 through a pipeline and then enter the MPDA modules 5 through a pipeline 3, enabling the neutral working medium gas to be primarily ionized, and enabling the generated seed electrons and the generated low-density plasma to be introduced into the ceramic discharge cavity; the seed electrons include high energy electrons.
Wherein the low density plasma is 1 × 10 13 -1×10 15 /cm 3 A range of plasmas.
High-energy electrons generated by the MPDA are used as seed electrons, the low-density plasma is continuously ionized under the constraint of the magnetic mirror, the ionization rate of the plasma can be improved, energy is added to the ions through the ICR antenna, and the requirement of a high-power working mode can be met.
The ICR antenna 11 and the ICR power source 8 form an ICR discharge module, and the ICR discharge module is used for injecting energy into low-density plasma to obtain high-density high-energy plasma;
the ICR discharge module is an electrodeless structure, so that the corrosion to the electrode is reduced, and a high-power working mode is realized.
The ceramic discharge cavity 16 is a cylindrical structure with holes at two ends and a center, and mainly comprises two parts, namely a plasma inlet end at two sides and a plasma outlet end at the center. An MPDA device is respectively fixed at the plasma inlet ends at two sides and is connected with an MPDA power supply 4, a flow controller 2, a pipeline 3 and a working medium storage tank 1, wherein the flow controller can adjust the flow of the working medium, and the adjustment of the plasma source is realized.
Magnetic mirror arrays formed by electromagnetic coils are fixed on two sides of the ceramic discharge cavity 16, plasmas can be restricted under a set energy threshold value by adjusting power supply of the magnetic mirror arrays, higher energy can be obtained under multiple times of energy injection, and ionization rate of the plasmas is improved.
The pulse electromagnetic control unit 14 is wound on a magnetic core by a 5-turn pulse electromagnetic valve antenna 12 and is used for introducing high-frequency changing current to obtain a magnetic field generated by alternating current, changing the direction and the size of an induced magnetic field by controlling the inclination angle, the pulse duty ratio and the size of the coil, adjusting the ion velocity direction and the size of the high-density plasma, and accelerating the extraction after focusing the high-density high-energy plasma by the magnetic field generated by the alternating current;
the induced magnetic field induces and generates current in an angular direction close to the wall surface of the discharge cavity to generate a crossed Hall electric field, the Hall electric field perpendicular to the axis direction of the ceramic discharge cavity accelerates ions, the concentration density of the ions is increased in the direction, and the directional electric fields generated by the high-density area and the low-density area further accelerate the ions in the radial direction. The high-energy plasma breaks through the restraint of the magnetic mirror and converges towards the plasma leading-out end of the ceramic discharge cavity. The magnetic nozzle fixed on the plasma leading-out end can restrain plasma, convert the axial velocity component of ions to the radial direction, indirectly accelerate the ions and improve the ion energy generated by the device.
The pulsed electromagnetic control unit 14 is also used to change the confinement of the plasma in the ceramic discharge chamber 16 by adjusting the current.
The pulse electromagnetic control unit 14 changes the restraint on the plasma in the ceramic discharge cavity 16 by adjusting the current, so as to adjust the quantity and the speed of ions, and realize the controllable speed of the ions generated by the plasma source.
The ICR antenna 11 is positioned close to the magnetic mirror array, and cooling water is introduced into the ICR antenna to achieve the purpose of reducing the working temperature of the antenna;
the magnetic mirror array is used for restraining low-density plasma under a set energy threshold value by adjusting a magnetic mirror power supply 6 and obtaining high-density plasma through multiple times of energy injection.
And the ICR power source 8 is used for feeding power into the ceramic discharge cavity 16 through the ICR antenna 11, heating ions in the plasma and improving the density and ion energy of the low-density plasma.
Since the power coupling between the ICR power source 8 and the plasma is transmitted through the ICR antenna 11, there will be partial power loss on the antenna, which results in the temperature increase of the antenna and the reduction of the power transmission capability, so it is necessary to use cooling water to cool the antenna.
The outer surface of the ICR antenna 11 is wrapped by a Faraday shield layer with a predetermined thickness, for example, a soft iron metal layer, and insulated from the ICR antenna 11, so as to reflect the electromagnetic waves radiated from the ICR antenna 11.
Based on the same conception, the invention also provides a high-density plasma generating method with controllable ion velocity vector, which specifically comprises the following steps:
s1, distributing the working medium gas through a flow controller, and then entering the MPDA module 5 through the pipeline 3 for preliminary ionization, wherein the obtained low-density plasma enters the ceramic discharge cavity 16 through the entrance end of the ceramic discharge cavity 16;
s2 under the restraint of the magnetic field of the magnetic mirror array, the seed electrons in the ceramic discharge cavity 16 continuously ionize the low-density plasma to improve the ionization rate of the plasma;
s3, the ICR power source 8 transmits electromagnetic energy to plasma in the ceramic discharge cavity 16 through the ICR antenna 11, and uses cooling water to cool the ICR antenna 11 in the transmission process so as to reduce power loss, and high-density and high-energy plasma is formed under the action of magnetic field energy and input power;
the S4 pulse electromagnetic control unit 14 changes the direction and the size of the induced magnetic field by controlling the inclination angle, the pulse duty ratio and the current size of the coil through the adjustment of the control power supply, and adjusts the ion velocity direction and the size of the high-density high-energy plasma;
s5 the induced magnetic field induces and generates current in an angular direction near the wall surface of the ceramic discharge cavity, and generates a crossed Hall electric field perpendicular to the axis direction of the ceramic discharge cavity to accelerate ions of the high-density high-energy plasma, so that the ion concentration density of the high-density high-energy plasma in the Hall electric field direction is increased, and the directional electric field generated by the high-density area and the low-density area further accelerates the ions of the high-density high-energy plasma in the radial direction;
s6 the high-density high-energy plasma breaks through the restraint of the magnetic mirror array and converges to the plasma leading-out end of the ceramic discharge cavity 16, the magnetic spray pipe fixed at the plasma leading-out end converts the axial velocity component of the ions of the high-density high-energy plasma to the radial direction, indirectly accelerates the ions of the high-density high-energy plasma, improves the energy of the generated ions, and accelerates the high-density high-energy plasma to be sprayed out from the magnetic spray pipe 15 at the plasma leading-out end.
And a magnetic spray pipe 15 structure formed by samarium cobalt permanent magnets is fixed at the plasma leading-out end, and plays roles of accelerating and focusing the plasma in the leading-out process.
All the above optional technical solutions may be combined arbitrarily to form optional embodiments of the present application, and are not described herein again.
It should be understood that, the sequence numbers of the steps in the foregoing embodiments do not imply an execution sequence, and the execution sequence of each process should be determined by its function and inherent logic, and should not constitute any limitation to the implementation process of the embodiments of the present invention.
The above examples are only intended to illustrate the technical solution of the present invention, but not to limit it; although the present invention has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some technical features may be equivalently replaced; such modifications and substitutions do not substantially depart from the spirit and scope of the embodiments of the present invention, and are intended to be included within the scope of the present invention.
Claims (8)
1. A high-density plasma source with controllable ion velocity vector is characterized by comprising the following two sets of equipment: the device comprises an MPDA module (5), a magnetic mirror power supply (6), an electromagnetic coil (7), an ICR antenna (11), an ICR power source (8), a working medium storage tank (1), a flow controller (2), a pipeline (3), a pulse electromagnetic valve antenna (12), a pulse electromagnetic control unit (14), a magnetic spray pipe (15) and a ceramic discharge cavity (16), wherein the two sets of equipment are symmetrically arranged on two sides of the ceramic discharge cavity (16);
the MPDA module (5) comprises an MPDA power supply (4) and a magnetic plasma arc plasma source (MPDA), working medium gas in the working medium storage tank (1) enters the flow controller (2) through a pipeline (3) and then enters the MPDA module (5) through the pipeline (3), the working medium gas is preliminarily ionized, and generated seed electrons and low-density plasma enter the ceramic discharge cavity (16);
the electromagnetic coil (7) is positioned outside the ceramic discharge cavity (16), the magnetic mirror power supply (6) and the electromagnetic coil (7) form a magnetic mirror array, the low-density plasma is restrained and gathered under the control of the electromagnetic coil (7), the seed electrons continuously ionize the low-density plasma, and the plasma ionization rate is improved;
the ICR antenna (11) is wound on the outer side of the ceramic discharge cavity (16), the ICR antenna (11) and the ICR power source (8) form an ICR discharge module, and the ICR discharge module is used for injecting energy into the low-density plasma to obtain high-density high-energy plasma;
the pulse electromagnetic valve antenna (12) is wound on a magnetic core (13) to form a coil and is connected with the pulse electromagnetic control unit (14), high-frequency changing current is introduced into the pulse electromagnetic valve antenna (12) to obtain a magnetic field generated by alternating current, the direction and the size of an induced magnetic field are changed by controlling the inclination angle, the pulse duty ratio and the size of the coil, the direction and the size of the ion velocity of the high-density high-energy plasma are adjusted, and the high-density high-energy plasma is focused by the magnetic field generated by the alternating current and then is accelerated to be led out;
the magnetic spray pipe (15) forms an electromagnetic accelerating structure and is used for further accelerating the high-density high-energy plasma, so that the high-density high-energy plasma is accelerated and sprayed out from a plasma leading-out end of the ceramic discharge cavity (16).
2. The high density plasma source of claim 1, wherein the seed electrons comprise high energy electrons.
3. The high density plasma source of claim 1, wherein the ICR discharge module is an electrodeless structure to reduce erosion of the electrodes and achieve a high power mode of operation.
4. The high density plasma source of claim 1, wherein the magnetic mirror array is configured to obtain the high density plasma through multiple energy injections by adjusting a magnetic mirror power supply (6) to confine the low density plasma at a set energy threshold.
5. The high density plasma source of claim 1,
the ICR antenna (11) is positioned close to the magnetic mirror array, and cooling water (9) is introduced into the ICR antenna to achieve the purpose of reducing the working temperature of the antenna;
the ICR power source (8) is used for feeding power into the ceramic discharge cavity (16) through the ICR antenna (11), heating ions in the plasma and improving the density and ion energy of the low-density plasma.
6. The high density plasma source of claim 1, wherein the ICR antenna (11) is wrapped with a Faraday shield (10) of a predetermined thickness on its outer surface and insulated from the ICR antenna (11) to reflect the electromagnetic waves radiated from the ICR antenna (11) back.
7. The high-density plasma source according to claim 1, wherein the pulsed electromagnetic control unit (14) is further adapted to vary the confinement of the plasma in the ceramic discharge chamber (16) by adjusting the current.
8. A high-density plasma generating method using the high-density plasma source according to any one of claims 1 to 7, comprising the steps of:
s1, distributing the working medium gas through a flow controller (2), and then feeding the working medium gas into an MPDA module (5) through a pipeline (3) for preliminary ionization, wherein the obtained low-density plasma enters a ceramic discharge cavity (16);
s2, under the restraint of the magnetic field of the magnetic mirror array, the seed electrons in the ceramic discharge cavity (16) continuously ionize the low-density plasma to improve the plasma ionization rate;
s3, the ICR power source (8) transmits electromagnetic energy to plasma in the ceramic discharge cavity (16) through the ICR antenna (11), and the ICR antenna (11) is cooled by using cooling water (9) in the transmission process so as to reduce power loss, and high-density and high-energy plasma is formed under the action of magnetic field energy and input power;
s4, the pulse electromagnetic control unit (14) controls the inclination angle of a coil formed by the pulse electromagnetic valve antenna (12) and the magnetic core (13), the pulse duty ratio and the current by controlling a power supply to change the direction and the size of an induced magnetic field, and adjusts the ion velocity direction and the size of the high-density high-energy plasma;
s5, inducing a magnetic field to generate current in an angular direction near the wall surface of the ceramic discharge cavity (16), generating a Hall electric field which is crossed and vertical to the axial direction of the ceramic discharge cavity (16), accelerating ions of the high-density high-energy plasma, increasing the ion concentration density of the high-density high-energy plasma in the Hall electric field direction, and further accelerating the ions of the high-density high-energy plasma in the radial direction by the directional electric field generated by the high-density area and the low-density area;
s6, the high-density high-energy plasma breaks through the restraint of the magnetic mirror array and converges towards the plasma leading-out end of the ceramic discharge cavity (16), and the magnetic spray pipe (15) fixedly connected with the plasma leading-out end converts the axial velocity component of the ions of the high-density high-energy plasma to the radial direction, indirectly accelerates the ions of the high-density high-energy plasma, improves the energy of the generated ions, and accelerates and sprays the high-density high-energy plasma.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210622397.2A CN114900938A (en) | 2022-06-01 | 2022-06-01 | High-density plasma source with controllable ion velocity vector |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN202210622397.2A CN114900938A (en) | 2022-06-01 | 2022-06-01 | High-density plasma source with controllable ion velocity vector |
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