CN114879282B - Laser protective film based on dielectric super surface and preparation method thereof - Google Patents
Laser protective film based on dielectric super surface and preparation method thereof Download PDFInfo
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- G—PHYSICS
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- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
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- G—PHYSICS
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- G02B1/14—Protective coatings, e.g. hard coatings
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- G—PHYSICS
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- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02D—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN INFORMATION AND COMMUNICATION TECHNOLOGIES [ICT], I.E. INFORMATION AND COMMUNICATION TECHNOLOGIES AIMING AT THE REDUCTION OF THEIR OWN ENERGY USE
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Abstract
The invention discloses a laser protective film based on a dielectric super-surface and a preparation method thereof, wherein the laser protective film comprises a protective layer, the dielectric super-surface and a substrate; the medium super surface is formed by arranging medium super units on a substrate into a two-dimensional array, wherein the medium super units are sub-wavelengths and the refractive index is higher than a threshold value; by adjusting the material, shape and size of the dielectric superunit, a plurality of resonant modes in the dielectric superunit interfere with each other. The preparation method comprises the following steps: growing a transparent film on the sacrificial substrate as a base; growing a layer of high-refractive-index structural material on a substrate, and preparing a dielectric super-surface on the structural material layer through photoetching and etching; growing a transparent film on the super surface of the medium as a protective layer; and removing the sacrificial substrate by etching to obtain the laser protection film based on the dielectric super surface. The invention realizes high reflectivity of incident light in a target protection wave band and high transmissivity in a visible light wave band, and can be widely applied to the fields of laser glare protection, laser damage resistance and the like.
Description
Technical Field
The invention relates to the technical field of laser protective films, in particular to a laser protective film based on a dielectric super surface and a preparation method thereof.
Background
The protective film is a film which can reflect high-power laser and has higher transmissivity in a visible light wave band, is usually arranged on the surface of an optical sensitive device, the surface of glasses and other devices needing to be protected, and can effectively prevent the device from being damaged, the laser from being dazzled, the laser from being damaged and the like.
Traditional laser protection modes include modes based on electrochromic liquid crystal structures, nano gratings, multilayer reflecting film structures and the like. The electrochromic liquid crystal structure needs a power supply, a sensor, a control circuit and other parts, the liquid crystal color change needs a certain response time, and the transmittance of a visible light wave band is reduced after electrochromic; the nano grating structure utilizes the complex resonance effect of the nano grating, but requires the incident light to be polarized light, and the nano grating is a broadband reflector which cannot be designed for a specific wavelength; the multilayer reflective film structure utilizes the interference cancellation principle of Bragg reflection, but the thickness of each layer of film needs to be precisely controlled in the manufacturing process, the preparation process is complex, and the transmittance in the visible light wave band and the damage threshold of the structure for resisting high-power laser are obviously reduced by the multilayer film structure.
CN113485029a discloses a pair of laser protection glasses, the lens is formed by filling liquid crystal between two transparent conductive glass sheets, when the glasses are not irradiated by strong laser, the liquid crystal molecules in the lenses of the glasses are vertically aligned with the transparent glass on the outer side of the lenses, and all the liquid crystal molecules are aligned consistently, at the moment, the liquid crystal is in a transparent state, the lenses have normal transmittance, and the wearer can normally use and work. When the laser intensity exceeds the threshold value, the light control circuit can automatically apply voltage to the two ends of the lens, the short axis of the liquid crystal molecules deflects towards the direction of the electric field and becomes a scattering state, the transmittance of the lens is rapidly reduced, and the transmittance is lower than 10% in the wavelength range of 400-700 nm. But the system has a response time of 5 ms.
CN112904460a discloses a low transmittance flexible film for laser protection; the invention is based on the principle of optical interference cancellation, and realizes low transmissivity to near infrared laser by alternately stacking high refractive index material layers and low refractive index material layers in multiple layers in the thickness direction of the film and accurately controlling the thickness of the film in the manufacturing process; wherein the high refractive index material layer is formed by combining one or more of TiO 2、Ta2O5、NbO2; the low refractive index material layer is formed by one or a combination of several of SiO 2、Al2O3; the film has an average transmittance of more than 70% for visible light in 400-700 nm band and a laser transmittance of less than 10% for 1-1.1 um band. However, the number of material stacking layers is more than 24, and the manufacturing process is complex.
CN107300782a discloses a visible light-near infrared-mid infrared band laser protection window, the invention selects a substrate with a certain band absorption by adopting a method of combining the substrate and a linear laser protection film, a three-band light splitting film is designed on one side of the absorption substrate, a dual-band antireflection film is designed on the other side of the absorption substrate, the design of a multiband satellite laser protection window is realized, the high transmission of satellite working band and the low transmission of strong laser weapon band are realized, and the attack of the strong laser weapon is effectively protected while the normal working of the satellite is ensured; the transmittance of the laser protection window in the wave band of 0.5-0.8 mu m is more than 95%, and the transmittance near 1.315 mu m is less than 0.1%. However, the substrate selected by the invention has larger absorption, and the anti-damage capability of the transparent window is reduced.
The super surface is a two-dimensional nano-structure array which can regulate and control phase, amplitude, polarization and the like on a sub-wavelength scale. Early super-surfaces were mainly composed of sub-wavelength metal units, but metal materials have larger absorption in the optical frequency band and are easy to generate heat, so that the efficiency and damage threshold of the metal super-surface are low, thereby limiting the application of the metal super-surface in laser protection.
Disclosure of Invention
The invention aims to provide a laser protective film based on a dielectric super-surface and a preparation method thereof, which realize high reflectivity in a specific wave band and high transmissivity in a visible light wave band, thereby being applied to the fields of laser glare protection, laser damage resistance protection and the like.
The technical solution for realizing the purpose of the invention is as follows: a laser protection film based on a dielectric super-surface comprises a protection layer, the dielectric super-surface and a substrate; the medium super surface is formed by arranging medium super units on a substrate into a two-dimensional array, wherein the medium super units are sub-wavelengths and the refractive index is higher than a set threshold value n;
The dielectric super surface is in a set incident angle delta range, and the materials, the shapes and the sizes of the dielectric super units are adjusted to enable a plurality of resonance modes in the dielectric super units to interfere with each other, so that the reflectivity of a target protection wave band is higher than a set threshold value theta 1, and the transmissivity of the dielectric super surface in a visible light wave band is higher than a set threshold value theta 2.
The preparation method of the laser protective film based on the medium super surface is characterized by comprising the following steps of:
Step 1, constructing a medium superunit, and obtaining the scattering characteristics of a single unit, including the reflectivity and the transmissivity, by adopting full-wave simulation under a periodic boundary condition by using a time domain finite difference method; then, carrying out parameter scanning on the unit radius and the incident wavelength to obtain corresponding data;
Step 2, adjusting the size and shape of the medium superunit, selecting the unit size meeting the required reflection wavelength characteristic requirement according to the data obtained in the step 1, and performing optimization design to meet the reflection and visible light wave band transmission requirements in a target protection wave band;
Step 3, performing angle analysis on the selected medium superunit, adopting full-wave simulation under the Bloch boundary condition by using a time domain finite difference method, and then performing parameter scanning on the incident wave angle to obtain corresponding data, wherein the abscissa represents wavelength change and the ordinate represents angle change of the incident light wave;
Step 4, constructing a medium super surface, generating a two-dimensional array of square lattice arrangement or hexagonal lattice arrangement by using a medium super unit, and performing simulation analysis on reflection and transmission characteristics of the medium super surface to compare an optimal two-dimensional array arrangement mode;
and 5, constructing a laser protective film based on the medium super surface, adding a base material and a protective layer to form the laser protective film based on the medium super surface, and performing simulation analysis on the laser protective film to obtain reflection and transmission performance parameters.
Compared with the prior art, the invention has the remarkable advantages that: (1) The super surface formed by the dielectric super units is applied to laser protection, so that absorption can be effectively reduced, the anti-damage threshold of a device is improved, and high reflection in a target protection wave band is realized by mutual interference of resonance modes in the dielectric super units; (2) The design is flexible, any wavelength can be designed, high reflectivity is realized in a specific wave band, and high transmissivity is realized in a visible light wave band; (3) The structure is simple, the device has the characteristics of light weight, light weight and flexibility, and the damage resistance threshold is high; (4) The system does not need a power supply, a sensor, a control circuit and the like, and has simple composition and high stability; (5) The laser protective film based on the medium super surface has simple structure, is compatible with the existing semiconductor manufacturing process, is easy to manufacture, can realize low-cost mass production, can produce a large-area high-quality protective film structure, and can be directly processed on related devices.
Drawings
FIG. 1 is a schematic structural diagram of a laser protective film based on a dielectric supersurface according to the present invention.
FIG. 2 is a schematic diagram of the structure of a dielectric superunit according to the present invention.
FIG. 3 is a graph of transmittance of a cylindrical dielectric supercell with a height of 320 nm.
FIG. 4 is a graph of reflectivity of a cylindrical dielectric supercell with a height of 320 nm.
FIG. 5 is a graph of transmittance as a function of wavelength of incident light over a wavelength range of 400nm to 1200nm for cylindrical superunits having radii of 117nm and 155nm, respectively, and a height of 380 nm.
FIG. 6 is a graph of transmittance of a dielectric superunit having a radius of 117nm and a height of 320 nm.
FIG. 7 is a graph of transmittance of a dielectric superunit having a radius of 155nm and a height of 380 nm.
FIG. 8 is a graph of transmittance of a spherical dielectric superunit.
FIG. 9 is a graph of reflectivity of spherical dielectric superunits.
FIG. 10 is a graph of transmittance as a function of wavelength of incident light over a wavelength range of 400nm to 1200nm for spherical media superunits having radii of 143nm, 174nm, and 218nm, respectively.
FIG. 11 is a graph of transmittance of spherical dielectric superunits with a radius of 143 nm.
FIG. 12 is a graph of transmittance of spherical dielectric superunits having a radius of 174 nm.
FIG. 13 is a graph of transmittance of spherical dielectric superunits with a radius of 218 nm.
Fig. 14 is a process diagram of micro-nano machining of the laser protective film based on the super surface of the medium of the invention.
Detailed Description
The invention relates to a laser protective film based on a dielectric super-surface, which comprises a protective layer, a dielectric super-surface and a substrate; the medium super surface is formed by arranging medium super units on a substrate into a two-dimensional array, wherein the medium super units are sub-wavelengths and the refractive index is higher than a set threshold value n;
The dielectric super surface is in a set incident angle delta range, and the materials, the shapes and the sizes of the dielectric super units are adjusted to enable a plurality of resonance modes in the dielectric super units to interfere with each other, so that the reflectivity of a target protection wave band is higher than a set threshold value theta 1, and the transmissivity of the dielectric super surface in a visible light wave band is higher than a set threshold value theta 2.
In one embodiment, the threshold value n is greater than 3, the threshold value θ1 is greater than 95%, and the threshold value θ2 is greater than 50%.
As a specific embodiment, the two-dimensional array is arranged in a hexagonal lattice or a tetragonal lattice.
As a specific embodiment, the shape of the dielectric superunit adopts a cylinder, sphere or square cylinder with high refractive index.
As a specific implementation mode, the dielectric superunit of the dielectric supersurface adopts a dielectric material of silicon, germanium, gallium nitride or titanium dioxide.
As a specific embodiment, the substrate and the protective layer are made of transparent materials, specifically silicon dioxide, PMMA or aluminum oxide.
As a specific embodiment, the substrate and the protective layer are flexible protective films formed by PDMS or SU 8.
The invention discloses a preparation method of a laser protective film based on a dielectric super surface, which comprises the following steps:
Step 1, constructing a medium superunit, and obtaining the scattering characteristics of a single unit, including the reflectivity and the transmissivity, by adopting full-wave simulation under a periodic boundary condition by using a time domain finite difference method; then, carrying out parameter scanning on the unit radius and the incident wavelength to obtain corresponding data;
Step 2, adjusting the size and shape of the medium superunit, selecting the unit size meeting the required reflection wavelength characteristic requirement according to the data obtained in the step 1, and performing optimization design to meet the reflection and visible light wave band transmission requirements in a target protection wave band;
Step 3, performing angle analysis on the selected medium superunit, adopting full-wave simulation under the Bloch boundary condition by using a time domain finite difference method, and then performing parameter scanning on the incident wave angle to obtain corresponding data, wherein the abscissa represents wavelength change and the ordinate represents angle change of the incident light wave;
Step 4, constructing a medium super surface, generating a two-dimensional array of square lattice arrangement or hexagonal lattice arrangement by using a medium super unit, and performing simulation analysis on reflection and transmission characteristics of the medium super surface to compare an optimal two-dimensional array arrangement mode;
and 5, constructing a laser protective film based on the medium super surface, adding a base material and a protective layer to form the laser protective film based on the medium super surface, and performing simulation analysis on the laser protective film to obtain reflection and transmission performance parameters.
As a specific embodiment, the construction of the laser protection film based on the dielectric super surface in step 5 adds a base material and a protection layer to form the laser protection film based on the dielectric super surface, which specifically comprises the following steps:
(1) Selecting a sacrificial substrate, and growing a layer of transparent film as a base on the sacrificial substrate;
(2) Growing a layer of high-refractive-index structural material on a substrate, and preparing the dielectric super-surface obtained in the step 4 on the structural material layer through photoetching and etching;
(3) Growing a transparent film on the super surface of the medium as a protective layer;
(4) And removing the sacrificial substrate by etching to obtain the laser protection film based on the dielectric super surface.
As a specific embodiment, the protected device is used instead of the sacrificial substrate, and the protective layer is directly prepared on the surface of the protected device through steps (1) to (3).
The invention ensures that a plurality of resonance modes in the medium superunit interfere with each other by adjusting the material, the shape and the size of the medium superunit within a certain incident angle range, realizes the enhancement of reflection and the weakening of transmission near a target protection wave band, and ensures higher transmittance within a visible light wave band. The super surface formed by the dielectric super units is applied to laser protection, so that absorption can be effectively reduced, the anti-damage threshold of a device is improved, and high reflection in a target protection wave band is realized by mutual interference of resonance modes in the dielectric super units; the structure is simple, the device has the characteristics of light weight, light weight and flexibility, and the damage resistance threshold is high; the system does not need a power supply, a sensor, a control circuit and the like, and is simple in composition and high in stability.
The unit of the dielectric super surface can be made of dielectric materials with high refractive index and low absorption such as silicon, germanium, gallium nitride, titanium dioxide and the like, the substrate and the protective layer can be made of transparent materials with low refractive index such as silicon dioxide, PMMA, aluminum oxide and the like, and flexible materials such as PDMS, SU8 and the like can also be selected to form a flexible protective film. The invention has flexible meter, can design any wavelength, realizes high reflectivity in a specific wave band and realizes high transmissivity in a visible light wave band; the laser protective film based on the medium super surface has simple structure, is compatible with the existing semiconductor manufacturing process, is easy to manufacture, can realize low-cost mass production, can produce a large-area high-quality protective film structure, and can be directly processed on related devices.
The invention will be described in further detail with reference to the accompanying drawings and specific examples.
Example 1
The invention introduces a medium super surface, namely a two-dimensional array formed by periodically arranging sub-wavelength high refractive index medium super units on a substrate, wherein the medium super surface has high transmittance in a visible light wave band and high reflectivity in a specific wave band.
Referring to fig. 1 and 2, the laser protection film based on the dielectric super-surface of the present invention includes a substrate, the dielectric super-surface on the substrate, and a protection layer covering the dielectric super-surface.
The medium super surface is a two-dimensional array formed by periodically arranging high-refractive-index medium super units, and the two-dimensional array can reflect most light waves with specific wave bands, so that visible light can normally transmit and can be kept effective in a certain angle range.
Furthermore, the unit material of the medium super surface can be selected from high refractive index materials such as silicon, germanium, gallium nitride, titanium dioxide and the like, the substrate and the protective layer can be selected from low refractive index transparent materials such as silicon dioxide, PMMA, aluminum oxide and the like, and flexible materials such as PDMS, SU8 and other organic polymers can be selected to form the flexible protective film.
Further, the dielectric supersurface has high reflectivity in a specific wavelength band, for example, laser light with a wavelength of 1064nm and high transmittance in a visible light band of 400-780 nm.
The embodiment provides a preparation method of a laser protective film based on a dielectric super-surface, which comprises the following steps:
Step 1: constructing a medium superunit, and obtaining the scattering characteristics of a single unit by adopting full-wave simulation under a periodic boundary condition by using a time domain finite difference method, wherein the scattering characteristics comprise the size of reflectivity and the size of transmissivity; then, carrying out parameter scanning on the unit radius and the incident wavelength to obtain corresponding data;
step 2: the size and the shape of the medium superunit are adjusted, the unit size meeting the required reflection wavelength characteristic requirement is selected according to the data obtained in the step 1, and the optimization design is carried out, so that the high reflection in a specific wave band and the high transmission in a visible light wave band are realized;
Step 3: performing angle analysis on the selected medium superunit, adopting full-wave simulation under the Bloch boundary condition by using a time domain finite difference method, and then performing parameter scanning on the incident wave angle to obtain corresponding data;
step 4: constructing a medium super-surface, generating an array of square lattice arrangement and hexagonal lattice arrangement, and performing simulation analysis on reflection and transmission characteristics of the medium super-surface to compare an optimal two-dimensional array arrangement mode;
Step 5: constructing a laser protection film based on a medium super surface, adding a base material and a protection layer to form the laser protection film based on the medium super surface, and performing simulation analysis on the laser protection film to obtain reflection and transmission performance parameters, wherein the reflection and transmission performance parameters are as follows:
(1) A silicon wafer is selected, and a layer of low refractive index transparent film is grown on the silicon wafer to serve as a basal layer; if the protective film is directly prepared on the surface of the protected device, the silicon wafer in the step is replaced by a target device; and step 4 is omitted;
(2) Growing a high refractive index structural material layer on the substrate layer, and preparing a designed dielectric super surface on the structural layer through the steps of photoetching, etching and the like;
(3) Coating a low refractive index transparent protective layer on the super surface of the medium;
(4) And etching the silicon wafer by wet etching to obtain the protective film.
Example 2
The medium superunit design of the embodiment is specifically as follows:
The reflection wavelength is 1064nm, as shown in fig. 2, the dielectric superunit adopts a cylindrical structure, the material is silicon, the unit period is p=600 nm, the height h=320 nm, according to the result of scanning the wavelength and the unit radius parameters, fig. 3 is a transmittance graph of the cylindrical dielectric superunit with the height of 320nm, the abscissa is the wavelength of incident light, the ordinate is the radius of the cylindrical unit, fig. 4 is a reflectance graph of the cylindrical dielectric superunit with the height of 320nm, the abscissa is the wavelength of incident light, and the ordinate is the radius of the cylindrical unit. Preferably cylindrical units with radii R of 117nm and 155 nm; the reflectivity of the cylindrical unit with the radius of 117nm at 1064nm is 95.00%, and the average transmittance in the visible light band is 80.00%; the reflectance of a cylindrical unit with a radius of 155nm at 1064nm is 96.94%, and the average transmittance in the visible light band is 62.87%.
FIG. 5 is a graph of transmittance as a function of wavelength of incident light over a wavelength range of 400nm to 1200nm for cylindrical superunits with radii of 117nm and 155nm, respectively, and heights of 380 nm.
Generating a two-dimensional super-structure unit array and constructing a laser protection film based on the super surface of a medium
Forming a two-dimensional array in a square arrangement mode at a period of P=600nm by using selected medium superunits, and analyzing reflection and transmission characteristics of the supersurface when the medium superunits are incident at different angles; the analysis results show that a cylindrical cell with a radius of 155nm is able to maintain the reflection transmission characteristics substantially unchanged over a larger angular range than a cell with a radius of 117nm, fig. 6 is a graph of the transmittance of a dielectric supercell with a radius of 117nm and a height of 320nm, the abscissa being the wavelength of the incident light, the ordinate being the angle of the incident light, fig. 7 is a graph of the transmittance of a dielectric supercell with a radius of 155nm and a height of 380nm, the abscissa being the wavelength of the incident light, and the ordinate being the angle of the incident light. As shown in fig. 6 and 7, the reflectivity of a cylindrical unit with the radius of 155nm to 1064nm light waves is more than 90% in the range of +/-10 degrees; the analysis result also shows that the thickness of the substrate and the protective layer does not influence the reflection and transmission characteristics of the laser protective film.
Example 3
The medium superunit design of the embodiment is specifically as follows:
The reflection wavelength is 1064nm, as shown in fig. 2, the dielectric superunit adopts a spherical structure, the material is silicon, the unit period is p=600 nm, according to the result of scanning the wavelength and the unit radius parameters, fig. 8 is a transmittance graph of the spherical dielectric superunit, the abscissa is the wavelength of the incident light, the ordinate is the radius of the unit, fig. 9 is a reflectance graph of the spherical dielectric superunit, the abscissa is the wavelength of the incident light, and the ordinate is the radius of the unit. As shown in FIGS. 8 and 9, spherical units with radii of 143nm, 174nm and 218nm are preferable; a diameter D, a reflectivity of a spherical unit of radius=d/2=143 nm at 1064nm of 94.27% and an average transmittance in the visible light band of 77.31%; the spherical unit with radius=d/2=174 nm has a reflectivity of 97.14% at 1064nm and an average transmittance of 66.40% in the visible band; the spherical units with radius=d/2=218 nm have a reflectivity of 97.02% at 1064nm and an average transmittance of 55.17% in the visible band.
Generating a two-dimensional super-structure unit array and constructing a laser protection film based on the super surface of a medium
The selected dielectric superunits are used to form a two-dimensional array in a square arrangement at a period of p=600 nm, and the reflection and transmission characteristics of the supersurface are analyzed when incident at different angles, and fig. 10 is a graph showing the relationship between the transmittance and the wavelength change of incident light in the wavelength range of 400nm-1200nm for spherical dielectric superunits with radii of 143nm, 174nm and 218nm, respectively. The analysis results show that the reflection and transmission characteristics of the unit with the radius of 174nm can be kept basically unchanged in a larger angle range compared with the unit with the radius of 143nm and 218nm, and as shown in fig. 11, 12 and 13, the reflection rate of the spherical unit with the radius of 174nm to 1064nm light waves is more than 90% in a range of +/-5 degrees. The analysis result also shows that the thickness of the substrate and the protective layer does not influence the reflection and transmission characteristics of the laser protective film.
As shown in fig. 14, compared with the traditional protection mode, the laser protection film based on the dielectric super surface has the advantages of simple structure, mature manufacturing process, easy integration and potential application value in various scenes. The above embodiments are only for illustrating the technical solution of the present application, but not for limiting the same, and modifications to the specific embodiments of the present application or equivalent substitution to some technical features should be included in the scope of the technical solution claimed in the present application.
Claims (8)
1. The laser protective film based on the dielectric super surface is characterized by comprising a protective layer, the dielectric super surface and a substrate; the medium super surface is formed by arranging medium super units on a substrate into a two-dimensional array, wherein the medium super units are sub-wavelengths and the refractive index is higher than a set threshold value n;
The method comprises the steps that the dielectric super surface is in a set incident angle delta range, the materials, the shapes and the sizes of dielectric super units are adjusted, so that a plurality of resonance modes in the dielectric super units interfere with each other, the reflectivity of a target protection wave band is higher than a set threshold value theta 1, and the transmissivity of the dielectric super surface in a visible light wave band is higher than a set threshold value theta 2;
the threshold value n is more than 3, the threshold value theta 1 is more than 95%, and the threshold value theta 2 is more than 50%;
The preparation method of the laser protective film based on the medium super surface comprises the following steps:
Constructing a medium superunit, and obtaining the scattering characteristics of a single unit by adopting full-wave simulation under a periodic boundary condition by using a time domain finite difference method, wherein the scattering characteristics comprise the size of reflectivity and the size of transmissivity; then, carrying out parameter scanning on the unit radius and the incident wavelength to obtain corresponding data;
The size and the shape of the medium superunit are adjusted, the unit size meeting the required reflection wavelength characteristic requirement is selected according to the data obtained in the step 1, and the optimization design is carried out to meet the reflection and visible light wave band transmission requirements in a target protection wave band;
Performing angle analysis on the selected medium superunit, adopting full-wave simulation under the Bloch boundary condition by using a time domain finite difference method, and then performing parameter scanning on the incident wave angle to obtain corresponding data, wherein the abscissa represents wavelength change and the ordinate represents angle change of the incident light wave;
Constructing a medium super surface, generating a two-dimensional array of square lattice arrangement or hexagonal lattice arrangement by using the medium super unit, and performing simulation analysis on reflection and transmission characteristics of the medium super surface to compare an optimal two-dimensional array arrangement mode;
and constructing a laser protective film based on the medium super surface, adding a base material and a protective layer to form the laser protective film based on the medium super surface, and performing simulation analysis on the laser protective film to obtain reflection and transmission performance parameters.
2. The laser protection film based on a dielectric super surface according to claim 1, wherein the two-dimensional array is arranged in a hexagonal lattice or a tetragonal lattice.
3. The laser protection film based on the super surface of claim 1, wherein the super unit of the medium is in the shape of a cylinder, a sphere or a square cylinder.
4. The dielectric supersurface based laser protection film of claim 1 wherein the dielectric supersurface dielectric superunit is comprised of silicon, germanium, gallium nitride or titanium dioxide.
5. The laser protective film based on dielectric supersurface according to claim 1, wherein the substrate and the protective layer are made of transparent materials, in particular silica, PMMA or aluminum oxide.
6. The dielectric supersurface based laser shielding film of claim 1 wherein the substrate and protective layer are flexible shielding films formed of PDMS or SU 8.
7. The preparation method of the laser protective film based on the medium super surface is characterized by comprising the following steps of:
Step 1, constructing a medium superunit, and obtaining the scattering characteristics of a single unit, including the reflectivity and the transmissivity, by adopting full-wave simulation under a periodic boundary condition by using a time domain finite difference method; then, carrying out parameter scanning on the unit radius and the incident wavelength to obtain corresponding data;
Step 2, adjusting the size and shape of the medium superunit, selecting the unit size meeting the required reflection wavelength characteristic requirement according to the data obtained in the step 1, and performing optimization design to meet the reflection and visible light wave band transmission requirements in a target protection wave band;
Step 3, performing angle analysis on the selected medium superunit, adopting full-wave simulation under the Bloch boundary condition by using a time domain finite difference method, and then performing parameter scanning on the incident wave angle to obtain corresponding data, wherein the abscissa represents wavelength change and the ordinate represents angle change of the incident light wave;
Step 4, constructing a medium super surface, generating a two-dimensional array of square lattice arrangement or hexagonal lattice arrangement by using a medium super unit, and performing simulation analysis on reflection and transmission characteristics of the medium super surface to compare an optimal two-dimensional array arrangement mode;
Step 5, constructing a laser protective film based on the medium super surface, adding a base material and a protective layer to form the laser protective film based on the medium super surface, and performing simulation analysis on the laser protective film to obtain reflection and transmission performance parameters;
And 5, constructing a laser protective film based on the medium super surface, adding a base material and a protective layer to form the laser protective film based on the medium super surface, wherein the method comprises the following steps of:
(1) Selecting a sacrificial substrate, and growing a layer of transparent film as a base on the sacrificial substrate;
(2) Growing a layer of high-refractive-index structural material on a substrate, and preparing the dielectric super-surface obtained in the step 4 on the structural material layer through photoetching and etching;
(3) Growing a transparent film on the super surface of the medium as a protective layer;
(4) And removing the sacrificial substrate by etching to obtain the laser protection film based on the dielectric super surface.
8. The method for preparing a dielectric super surface based laser protection film according to claim 7, wherein the protective layer is directly prepared on the surface of the protected device through the steps (1) - (3) by using the protected device instead of the sacrificial substrate.
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