CN114859604B - 一种遮光反射膜、背光模组及其制备方法 - Google Patents
一种遮光反射膜、背光模组及其制备方法 Download PDFInfo
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- CN114859604B CN114859604B CN202210619521.XA CN202210619521A CN114859604B CN 114859604 B CN114859604 B CN 114859604B CN 202210619521 A CN202210619521 A CN 202210619521A CN 114859604 B CN114859604 B CN 114859604B
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Classifications
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Abstract
本发明公开了一种遮光反射膜、背光模组及其制备方法，主要用于解决薄型反射膜/片漏光问题，其中，遮光反射膜是基于反射材料和遮光材料为原料，采用一次加工成型法而制得的具有反射面和遮光面的双面薄膜，兼具高遮光效果和高反射率。为更好的制备该遮光反射膜，本发明还提供了采用多层共挤技术制备该遮光反射膜的方法，且该遮光反射膜还可用于背光模组及其制备。
Description
技术领域
本发明属于光学膜材料领域，具体的说，是一种遮光反射膜、背光模组及其制备方法。
背景技术
一直以来，平板显示器广泛应用于电视、电脑显示器、笔记本电脑、手机、数码相机、掌上电脑、GPS导航仪及导光键盘等。这些液晶显示器的画面光源由其中的背光模组所提供，背光模组性能的好坏除了会直接影响LCD显像质量，特别是背光源的亮度，直接影响到LCD表面的亮度。根据光源的位置不同，可以分为侧光式背光模组和直下式背光模组，随着LCD模组不断向更亮、更轻、更薄方向发展，侧光式LED式背光源成为目前背光源发展的主流。
另于键盘***中，近年来使用导光键盘的趋势持续成长。导光键盘的应用除了一般显示器键盘外还包括了笔记本计算机的键盘领域。这些导光键盘亦同由键盘的背光膜组所组成，该特性在于提供各个按键下足够的亮度，使得键盘发出光源。
液晶背光及导光键盘模组主要由光源、反射片、导光板、各类光学膜片组成，具有亮度高，寿命长、发光均匀等特点。反射膜/片的主要作用是将漏出导光板底部的光线高效率且无损耗地反射，从而可以降低光损耗，减少用电量，提供液晶显示面光饱和度。反射膜/片主要为透明树脂如PET+TiO2体系，该体系经过细微发泡而制成反射片，其主要原理是TiO2的折射率很高为2.62，其中泡的直径为数微粒左右，折射率为1.00，与PET树脂之间形成良好的曲折界面，从导光板出来的光经过反射片后，经过多次反复的折射路径，能够使绝大部分的光返回导光板中。
然而，随着显示面板及导光键盘轻薄化的趋势，目前背光模组的轻薄化已成为主流趋势，因此需要使用薄型的反射片来有效減薄背光厚度，但反射片厚度減薄随之带来的是反射片透光而造成背光模组背面漏光现象，进而使得背光模组组装至***结构上造成***漏光，不能满足使用要求。
目前对于薄型反射片透光而造成背光漏光现象，解决方式主要有以下两种：
一是，在反射片背面（非导光板接触面）施以遮光涂层加工，例如：公开号为CN111239873A的发明专利公开的一种高遮光性复合反射板及其制备方法，该专利为解决背光模组重量大、遮光性能差的问题，提供了一种具有反射层/支撑层/遮光层或反射层/遮光层/支撑层多层结构的复合反射板，其中遮光层是用遮光层树脂与固化剂形成涂布液，然后将涂布液涂布于复合板上，进行交联固化而制得。
二是，在反射片背面（非导光板接触面）贴合非透光薄膜或材料，如：公开号为CN111694080A的发明专利公开的一种高遮蔽耐指纹背光模组反射膜及其制备工艺，该专利首先利在基层上涂布实现反射功能的高折射层和具有抗指纹功能的抗指纹涂层，以制备抗指纹反射板，最后在抗指纹反射板表面贴合具有遮光效果的镀银膜。
上述两种方式均是在现有反射片的基础上通过涂布或贴合的方式增加遮光层/膜，以达到减少反射片透光的目的，但在实际生产过程中，却使得反射片的加工程序复杂、工时增加，以及材料成本的提高。
发明内容
本发明旨在解决薄型反射膜/片漏光问题，而提出的一种遮光反射膜/片，该遮光反射膜/片是基于反射材料和遮光材料为原料，采用一次加工成型法而制得的具有反射面和遮光面的双面薄膜，兼具高遮光效果和高反射率。为更好的制备该遮光反射膜/片，本发明还提供了采用多层共挤技术制备该遮光反射膜的方法。同时，本发明还提供了含有该遮光反射膜的背光模组及其制备方法。
本发明通过下述技术方案实现：一种遮光反射膜，将反射材料均质后与遮光材料共挤制得具有双面结构的薄膜，薄膜的一面为反射面，另一面为遮光面，所述反射材料包括光学透明树脂和无机粒子，所述遮光材料包括树脂和遮光母料。
所述反射面包括至少一层由反射材料制得的反射层；所述遮光面包括至少一层由遮光材料制得的遮光层。
所述光学透明树脂选自聚丙烯树脂（PP）、聚对苯二甲酸乙二醇酯（PET）、聚萘二甲酸乙二醇酯（PEN）、聚对苯二甲酸丙二醇酯、聚对苯二甲酸丁二醇酯（PBT）、聚碳酸酯（PC）、聚甲基丙烯酸甲酯（PMMA）中的至少一种。
或者进一步的选择树脂微粒，例如：由聚酯树脂、聚酰胺系树脂、聚氨基甲酸酯树脂、丙烯酸系树脂、甲基丙烯酸系树脂（如PMMA）、聚酰胺树脂、聚乙烯树脂、聚丙烯树脂、聚氯乙烯树脂、聚偏1,1-二氯乙烯树脂、聚苯乙烯树脂、聚乙酸乙烯酯树脂、氟系树脂、有机硅树脂等树脂形成的粒子。
所述无机填料选自碳酸钙、碳酸镁、碳酸锌、氧化钛、氧化锌、氧化铈、氧化镁、硫酸钡、硫化锌、磷酸钙、二氧化硅、氧化铝、云母、云母钛、滑石、粘土、高岭土、氟化锂、氟化钙中的至少一种。
进一步的，在所述反射材料中还可包括其他公知的各种添加剂，例如阻燃剂、抗氧化剂、抗静电剂等。因此，构成反射材料的各组分的用量可以分别为：60～90％光学透明树脂、13.3～43.3％无机填料、3～6%阻燃剂，1～3.0％抗氧化剂和2～5％抗静电剂。
进一步的，遮光材料中的功能成分为遮光母料，如黑色母料，只要不影响加工性能，遮光母料不做特别限定，此外在遮光材料选择的树脂中，同样可以添加其他公知的各种添加剂，例如，阻燃剂、抗氧化剂、抗静电剂等。因此，构成遮光材料的各组分的用量可以分别为：60～90％树脂、0.3～1％黑色母料、3～6%阻燃剂，1～3.0％抗氧化剂和2～5％抗静电剂。
上述提到的树脂为光学透明树脂，且所述遮光材料与反射材料中选择的光学透明树脂相同或不同。进一步的，考虑共挤制程的成型效果及成品耐候性的提升，优选光学透明树脂相同的方案，由于材料收缩率相同可使成品不易变形，且在高温高湿信赖性测试后不易翘曲变形。
上述提到的阻燃剂优选含有机磷系阻燃剂、含硅系阻燃剂中的至少一种。其中，含有机磷系阻燃剂可以使用已知的，具体而言可以为双酚A双磷酸酯、氢醌双磷酸酯、间苯二酚双磷酸酯、三苯酚三磷酸酯、双酚A双（二甲苯基磷酸酯），使用时，应根据需要进行选择。含硅系阻燃剂具体而言可以为二甲氧基二甲基硅烷、二乙氧基二甲基硅烷、乙氧基三甲基硅烷、二乙氧基二苯基硅烷、三乙氧基苯基硅烷、二甲基苯基硅烷、五甲基二硅烷、二甲基乙基硅烷、聚（二甲基硅氧烷）低聚物等。
上述提到的抗氧化剂作为受阻酚系热稳定剂，可以列举如：2-叔丁基-6-（3-叔丁基-2-羟基-5-甲基苄基）基苄基甲基苯基丙烯酸酯、2基苯基丙烯酸酯、6基二叔丁基苯基（甲基丙烯酸酯）及6戊二叔戊基苯基（甲基丙烯酸酯）等。
上述提到的抗静电剂可以列举如：硬脂基三甲基季铵盐酸盐、硬脂酰胺丙基羟乙基季胺硝酸盐、对壬基苯氧基丙基磺酸钠等。
一种遮光反射膜的制备方法，采用上述反射材料和遮光材料，将均质后的反射材料和遮光材料分别送入挤出机中，经多层共挤、拉伸、定型后，即得遮光反射膜。
进一步的，挤出机可采用常规共挤设备，制备过程中，温度控制是关键，直接影响了薄膜的光学表现，包含色相、透光度等。在生产过程中，可将PC熔融温度控制在240℃、PMMA熔融温度控制在200℃、PP熔融温度控制在170℃。
所述拉伸包括对共挤得到的膜片先纵向拉伸1.5～2倍后，再横向拉伸1.5～2倍。
纵向拉伸和横向拉伸过程中，树脂薄膜随着拉伸而产生形变，而作为粒子并不随着拉伸产生形变，因为在粒子周围形成尺寸不一的大量泡孔，以达到漫反射效果。
所述遮光反射膜的厚度为0.05～0.25mm。其中涉及的反射面的厚度为0.025～0.125mm，遮光面的厚度为0.025～0.125mm。
一种背光模组，含有权利要求1所述遮光反射膜。
一种背光模组的制备方法，含有遮光反射膜，所述遮光反射膜采用权利要求6所述方法制得。
本发明与现有技术相比，具有以下优点及有益效果：
（1）本发明可用于解决薄型反射膜/片的漏光问题，提供了一种由反射材料和遮光材料经一次共挤即可制得的具有高遮光和反射效果的遮光反射膜，成型工艺简单、成本较低、工期短、适于规模化生产，且本发明中的遮光反射膜具有双面结构，且薄膜厚度可以控制在0.05～0.25mm。
（2）本发明的共挤制程可以实现反射层和遮光层的厚度调整，以获得不同反射效果之薄膜。例如，在实际应用过程中，依据客户之需求，可任意调整反射层和遮光层各层的厚度和层数，进而满足不同的应用场景。
（3）本发明采用均质后的反射材料作为原料之一，具有良好的共挤制程之成型效果，并且可达到较优质的共挤成品之尺寸稳定性及耐候性。
（4）本发明在共挤制程中，通过调整适宜的温度范围，可以达到高质量的光学特性性能，因为温度过高或过低，容易造成原料的黄化色偏或晶体熔融不良等问题，进而影响成品的色相及透光度。
（5）本发明中，遮光材料和反射材料的选择也是影响共挤制程之成品效果的关键之一，例如，当遮光材料与反射材料在选择相同材料的情况下，由于材料收缩率相同可使成品不易变形，同时成品在高温高湿信赖性测试后也不易翘曲变形，因此，成型效果及成品耐候性均有所提升。
（6）本发明在共挤制程中可进一步利用滚轮表面在遮光反射膜的表面（遮光面）制作不规则的压花结构，在挤出过程时直接制作出遮光层表面呈现不规则深浅之表面特征，例如，在膜的表面形成高低差在100um以内的凹凸结构，且高度平均值需大于最高与最低高度差的1/2，以有利于减少相邻材料间的静电吸附及避免组装人员之手印或轻微刮伤。
（7）本发明利用共挤之制程，形成多层反射层，利用反射材料产生之孔洞密度，形成成品的漫反射（孔洞密度越高，可形成漫反射次数越多），同时利用共挤的制程及拉伸成型工艺，可以调整遮光材料厚度，以满足不同的应用场景，由此得到具备高遮光效果和高反射率的遮光反射膜，且该遮光反射膜满足透光率在0.1%以下，反射率在90%以上的效果。
（8）本发明的遮光反射膜适用于液晶或导光键盘的背光模组，具有V0耐燃等級，亦满足终端品牌客户的安全规范需求。
附图说明
图1为现有采用涂覆或涂布而获得的薄膜反射片。
图2为现有采用贴合而获得的薄膜反射片。
图3为本发明采用共挤而获得的双层遮光反射膜。
图4为本发明采用共挤获得的多层遮光反射膜。
具体实施方式
下面将本发明的发明目的、技术方案和有益效果作进一步详细的说明。
应该指出，以下详细说明都是示例性的，旨在对所要求的本发明提供进一步的说明，除非另有说明，本文使用的所有技术和科学术语具有与本发明所属技术领域的普通技术人员通常理解的相同含义。
为解决薄型反射片透光而造成背光漏光之现象，已知的方法是采用外加制程及材料的方式来降低反射片的透光性，因此，会造成反射板的加工程序复杂、工时长、成本高的缺陷。例如，如图1所示的薄膜反射片（上层为反射材料，下层为遮光材料），采用涂覆或涂布方式，在反射材料上形成遮光材料，或者如图2所示的薄型反射片（上层为反射材料，中间层为粘接层，下层为遮光材料），采用贴合的方式，在反射材料上形成遮光材料，在制备时，薄膜均需要外加制程才能制得，因此，存在上述加工程序复杂、工时长、成本高的缺陷，并不利于企业生产效率的提升及规模化的生产。为解决上述问题，本发明提供了一种新的遮光反射膜的制备方法，遮光反射膜是技术共挤拉伸一体成型而制得，不仅能简化遮光反射膜的制程，提高生产效率，还能在制程中合理控制遮光反射膜的结构，制备得到满足客户需求的，且具备高遮光效果和高反射率的遮光反射膜。
下面以几个典型实施例来列举说明本发明的具体实施方式，当然，本发明的保护范围并不局限于以下实施例。
实施例1：
反射材料配方：80.0％PP、10.0％二氧化钛、4.0% 碳酸锌、3.0%阻燃剂，1.0％抗氧化剂、2.0％抗静电剂。
遮光材料配方：85.0％PP、5.0％黑色母料、5.0%阻燃剂，1.0％抗氧化剂和5.0％抗静电剂。
采用上述配方的反射材料和遮光材料，分别均质后，按体积比3∶2经料斗送入挤出机，控制温度在170℃，经双层挤出模头，挤出得到由反射层和遮光层组成的膜片，膜片总厚度约0.18mm，其中反射层约0.12mm、遮光层亦约0.06mm。
将上述膜片送入拉伸工序，膜片先纵向拉伸1.5倍后，再横向拉伸1.5倍后，即得如图3所示遮光反射膜（上层为反射层，下层为遮光层），遮光反射膜总厚度约0.08mm，其中反射层约0.055mm、遮光层亦约0.025mm。
实施例2：
反射材料配方：75.7％PP、13.3％二氧化硅、6.0%阻燃剂，3.0％抗氧化剂、2.0％抗静电剂。
遮光材料配方：85.0％PP、1.0％黑色母料、6.0%阻燃剂，3.0％抗氧化剂和5.0％抗静电剂。
采用上述配方的反射材料和遮光材料，按实施例1相同方法制备图3所示结构的遮光反射膜。
实施例3：
反射材料配方：60.0％PET、13.3％硫酸钡、20.0%硫化锌、3.6%阻燃剂，1.1％抗氧化剂、2.0％抗静电剂。
遮光材料配方：88.0％PP、0.5％黑色母料、5.5%阻燃剂，2.0％抗氧化剂和4.0％抗静电剂。
采用上述配方的反射材料和遮光材料，按实施例1相同方法制备图3所示结构的遮光反射膜。
实施例4：
反射材料配方：68.0％PMMA、25.0％氧化锌、3.0%阻燃剂，1.5％抗氧化剂、2.5％抗静电剂。
遮光材料配方：89.7％PMMA、0.3％黑色母料、5.0%阻燃剂，2.7％抗氧化剂和3.0％抗静电剂。
采用上述配方的反射材料和遮光材料，按实施例1相同方法（温度在200℃）制备图3所示结构的遮光反射膜。
实施例5：
反射材料配方一：80.0％PP、7.0％二氧化硅、7.0%云母、3.0%阻燃剂，1.0％抗氧化剂、2.0％抗静电剂。
反射材料配方二：80.0％PP、7.0％二氧化硅、7.0%碳酸钙、3.0%阻燃剂，1.0％抗氧化剂、2.0％抗静电剂。
遮光材料配方：89.0％PP、1.0％黑色母料、3.0%阻燃剂，2.0％抗氧化剂和5.0％抗静电剂。
采用上述配方的反射材料和遮光材料，按体积比1.2∶1.2∶1经料斗送入挤出机，控制温度在170℃，经三层挤出模头，挤出得到多层之反射层和遮光层组成的膜片，膜片总厚度约0.3mm，其中多层反射层约0.21mm、多层遮光层亦约0.09mm。
将上述膜片送入拉伸工序，膜片先纵向拉伸2倍后，再横向拉伸2倍后，即得如图4所示遮光反射膜（上两层为反射层，下一层为遮光层），遮光反射膜总厚度约0.075mm，其中两层反射层约0.053mm、一层遮光层亦约0.022mm。
实施例6：
反射材料配方一：66.0％PP、10.0％碳酸镁、10.0%碳酸锌、6.0%阻燃剂，3.0％抗氧化剂、5.0％抗静电剂。
反射材料配方二：76.0％PP、10.0％二氧化硅、6.0%阻燃剂，3.0％抗氧化剂、5.0％抗静电剂。
遮光材料配方：85.0％PP、1.0％黑色母料、6.0%阻燃剂，3.0％抗氧化剂和5.0％抗静电剂。
采用上述配方的反射材料和遮光材料，按实施例5相同方法制备图4所示结构的遮光反射膜。
实施例7：
反射材料配方一：72.0％PC、16.0％碳酸钙、5.0%阻燃剂，2.0％抗氧化剂、5.0％抗静电剂。
反射材料配方二：88.0％PC、6.0%阻燃剂，1.0％抗氧化剂、5.0％抗静电剂。
遮光材料配方：87.2％PC、0.8％黑色母料、5.0%阻燃剂，2.0％抗氧化剂和5.0％抗静电剂。
采用上述配方的反射材料和遮光材料，按实施例5相同方法制备图4所示结构的遮光反射膜。
实施例8：
反射材料配方一：77.0％PET、16.0％二氧化硅、4.0%阻燃剂，1.0％抗氧化剂、2.0％抗静电剂。
反射材料配方二：90.0％PET、6.0%阻燃剂，2.0％抗氧化剂、2.0％抗静电剂。
遮光材料配方：90.0％PET、1.0％黑色母料、5.0%阻燃剂，1.0％抗氧化剂和2.0％抗静电剂。
采用上述配方的反射材料和遮光材料，按实施例5相同方法（温度在260℃）制备图4所示结构的遮光反射膜。
对比例1：
反射材料配方：PET与适当比例的硫酸钡及阻燃剂等。
遮光材料配方： PET与适当比例的阻燃剂及黑色母料。
采用上述配方的反射材料和遮光材料，将适量均质后的反射材料送入挤出机中，控制温度在 260℃下，挤出得到反射膜片，再将适量的遮光材料送入挤出机中，控制温度在260℃下，挤出得到遮光膜片，在反射膜片上贴合胶层，然后再在该胶层上贴合遮光层，制得图1所示结构的薄膜反射片，薄膜反射片总厚度约0.155mm，其中反射材料约0.08mm、遮光材料约0.075mm。
以上实施例1～8和对比例1并未对反射材料和遮光材料的阻燃剂、抗氧化剂、抗静电剂进行特别限定，在实际应用时，可根据产品需求进行常规选择。当然，在本发明的下述测试过程中，所选实施例及对比文件1中阻燃剂、抗氧化剂及抗静电剂选择的成分相同。
对上述实施例1～8、对比例1的遮光反射膜进行透光率和反射率测试，如下表1所示。透光率测试方法采用已知设备如：ASTMD 1003和NDH7000-2，反射率测试方法采用已知设备 ASTM E2177 及UH4150 分光光度计。
表1
由上表可以知道，实施例1～8中采用共挤制备得到的遮光反射膜，较对比例1的薄膜反射片而言，并不会直接影响反射率，同样可以制备得到高遮光效果和高反射率的产品。除此之外，从制备工艺来看，实施例1～8采用的共挤制程较对比例1的更加简化，便于规模化的生产，有利于生产效率的提高。另外，从产品厚度来看，实施例1～8的遮光反射膜由于缺少了粘结层，因此较对比例1的薄膜反射片更薄，亦可满足背光模组轻薄性的用户需求。
以上所述，仅是本发明的较佳实施例，并非对本发明做任何形式上的限制，凡是依据本发明的技术实质对以上实施例所作的任何简单修改、等同变化，均落入本发明的保护范围之内。
Claims (6)
1.一种能提高遮光效果及反射率的遮光反射膜，其特征在于：将均质后的反射材料和遮光材料分别送入挤出机中，经共挤、拉伸、定型后，制得具有双面结构的遮光反射膜，
所述遮光反射膜的厚度为0.05～0.25mm，遮光反射膜的一面为反射面，另一面为遮光面；
所述反射材料中含有百分含量的组分：60～90％光学透明树脂、13.3～43.3％无机填料、3～6%阻燃剂，1～3.0％抗氧化剂和2～5％抗静电剂，所述无机填料选自碳酸钙、碳酸镁、碳酸锌、氧化钛、氧化锌、氧化铈、氧化镁、硫酸钡、硫化锌、磷酸钙、二氧化硅、氧化铝、云母、云母钛、滑石、粘土、高岭土、氟化锂、氟化钙中的至少一种；
所述遮光材料中含有百分含量的组分：60～90％树脂、0.3～1％黑色母料、3～6%阻燃剂，1～3.0％抗氧化剂和2～5％抗静电剂；
所述拉伸包括对共挤得到的膜片先纵向拉伸1.5～2倍后，再横向拉伸1.5～2倍。
2.根据权利要求1所述的一种遮光反射膜，其特征在于：所述反射面包括至少一层由反射材料制得的反射层；所述遮光面包括至少一层由遮光材料制得的遮光层。
3.根据权利要求1所述的一种遮光反射膜，其特征在于：所述光学透明树脂选自聚丙烯树脂、聚对苯二甲酸乙二醇酯、聚萘二甲酸乙二醇酯、聚对苯二甲酸丙二醇酯、聚对苯二甲酸丁二醇酯、聚碳酸酯中的至少一种。
4.根据权利要求3所述的一种遮光反射膜，其特征在于：所述树脂为光学透明树脂，且所述遮光材料与反射材料中选择的光学透明树脂相同或不同。
5.一种背光模组，其特征在于：含有权利要求1所述遮光反射膜。
6.一种背光模组的制备方法，其特征在于：采用权利要求1所述的遮光反射膜制得。
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