CN114836727A - System and method for detecting thickness of each layer of multilayer film system - Google Patents
System and method for detecting thickness of each layer of multilayer film system Download PDFInfo
- Publication number
- CN114836727A CN114836727A CN202210414364.9A CN202210414364A CN114836727A CN 114836727 A CN114836727 A CN 114836727A CN 202210414364 A CN202210414364 A CN 202210414364A CN 114836727 A CN114836727 A CN 114836727A
- Authority
- CN
- China
- Prior art keywords
- film
- coating
- box body
- sample
- detection box
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 13
- 238000001514 detection method Methods 0.000 claims abstract description 82
- 239000011248 coating agent Substances 0.000 claims abstract description 43
- 238000000576 coating method Methods 0.000 claims abstract description 43
- 239000007888 film coating Substances 0.000 claims abstract description 23
- 238000009501 film coating Methods 0.000 claims abstract description 23
- 238000001771 vacuum deposition Methods 0.000 claims abstract description 21
- 230000007246 mechanism Effects 0.000 claims abstract description 12
- 239000000463 material Substances 0.000 claims abstract description 4
- 238000004519 manufacturing process Methods 0.000 claims description 13
- 238000009826 distribution Methods 0.000 claims description 4
- 239000011521 glass Substances 0.000 claims description 4
- 238000009504 vacuum film coating Methods 0.000 claims description 4
- 230000009471 action Effects 0.000 claims description 3
- 239000011159 matrix material Substances 0.000 claims description 3
- 230000008569 process Effects 0.000 abstract description 8
- 239000010408 film Substances 0.000 description 65
- 238000005516 engineering process Methods 0.000 description 5
- 230000006872 improvement Effects 0.000 description 5
- 239000013078 crystal Substances 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- 238000007747 plating Methods 0.000 description 4
- 239000012788 optical film Substances 0.000 description 3
- 230000010355 oscillation Effects 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 238000007689 inspection Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- -1 particularly Substances 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 238000003908 quality control method Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Length Measuring Devices With Unspecified Measuring Means (AREA)
Abstract
The invention belongs to the technical field of vacuum coating, and particularly relates to a system for detecting the thickness of each layer of a multilayer film system, which comprises a detection box body which is arranged on a slide rack in a vacuum coating cavity and can move forwards along with the slide rack, wherein a coating opening window for receiving coating materials is arranged on a front cover of the detection box body, a plurality of samples to be coated and a carrying disc for installing the samples are uniformly arranged in the detection box body, a shifting device capable of shifting the carrying disc to rotate or enabling the next sample to correspond to the position of the coating opening window after the front cover of the detection box body rotates is arranged at the center of the carrying disc, and a trigger mechanism capable of shifting the shifting device to work is arranged in the vacuum coating cavity. The independent detection system can accurately and timely detect the film thickness of each independent film layer in the film coating equipment, the detection process is simple, convenient and quick, and the detection cost is low.
Description
Technical Field
The invention belongs to the technical field of vacuum coating, and particularly relates to a system and a method for rapidly and independently detecting the thickness of each layer of a multilayer film system.
Background
In the automobile industry, the mobile phone industry, the glass coating industry and other products, the film coating needs to be carried out on a transparent substrate, particularly, optical films with special function needs exist, previous production equipment is mainly based on single machine film coating, and the maximum size, the yield and the like of the products are greatly influenced.
The market development demands a production mode with large yield and low cost, and the trend gradually tends to a production mode of a continuous coating production line with the advantage of large-scale yield. Good quality of the produced film usually requires the coating of multiple films, so stable quality control of each film becomes a key point, especially precise film thickness, and the more the number of films, the higher the difficulty.
The film thickness measurement modes commonly used in the industry at present are mainly divided into on-line detection and detection after plating. The former data can be fed back in real time, the latter data is fed back with a certain delay, and the measured data is the total film thickness, and the data of each layer of film thickness cannot be obtained; the on-line detection mainly comprises optical film thickness detection and a quartz crystal oscillation thickness gauge, wherein the precision of the optical film thickness detection is difficult to guarantee under the influence of a test condition (sample wafer continuously moves and shakes and the like), the precision of the quartz crystal oscillation thickness gauge is difficult to guarantee under the influence of the service life of a crystal, the quartz crystal oscillation thickness gauge cannot continuously measure for a long time, only the deposition rate of one coating film source can be measured, and if a plurality of coating film sources exist, a plurality of thickness gauges are needed, so that the cost is very high. Because the deposition rate of sputtering coating is relatively stable, although the coating condition can be gradually changed along with the consumption of the target material, thereby influencing the deposition rate, the current mainstream film thickness detection method is still detection after coating, and the process can be corrected through detection result feedback.
Because the multilayer film system coating equipment is provided with a large number of sputtering cathodes, the number of layers of the film system is increased, the precision requirement on film thickness control is improved, meanwhile, the feedback time is prolonged due to the long process flow, in addition, after maintenance and target replacement are carried out, trial coating is required to determine process parameters, and each layer of film occupies a lot of time when being detected independently, so that the production efficiency is influenced.
Therefore, it is urgent to develop a system and a method for rapidly and independently detecting the film thickness of each layer of a multi-layer film system at low cost.
Disclosure of Invention
The invention aims to overcome the defects of the prior art, and particularly discloses a system for rapidly and independently detecting the film thickness of each layer of a multilayer film system.
In order to achieve the technical purpose, the invention is realized according to the following technical scheme:
the invention relates to a system for detecting the thickness of each layer of a multilayer film system, which comprises a detection box body which is arranged on a slide rack in a vacuum coating cavity and can move forwards along with the slide rack, wherein a coating opening window for receiving coating materials is arranged on a front cover of the detection box body, a plurality of samples to be coated and a carrier disc for mounting the samples are uniformly arranged in the detection box body, a shifting device which can shift the carrier disc or can correspond the next sample to the position of the coating opening window after the front cover of the detection box body rotates is arranged at the central position of the carrier disc, and a trigger mechanism which can trigger the shifting device of the carrier disc to work is arranged in the vacuum coating cavity.
As a further improvement of the technology, the shifting device is a loading disc shifting device capable of shifting the loading disc to rotate, the loading disc shifting device sequentially comprises a one-way ratchet clutch, a connecting shaft and a shifting rod which are fixedly installed at the central position of the loading disc from the inside to the outside of the detection box body, a fixed seat is arranged inside the front cover of the detection box body, the one-way ratchet clutch and the connecting shaft are installed on the fixed seat, one part of the connecting shaft is arranged inside the detection box body, the other part of the connecting shaft is arranged outside the detection box body, a reset spring is sleeved on the connecting shaft section arranged outside the detection box body, and the shifting rod is inclined and arranged towards the direction close to the trigger mechanism in an initial state.
As a further improvement of the technology, the trigger mechanism is a plurality of fixed touch rods fixed between the two adjacent coating sources, the fixed touch rods are horizontally fixed on the vacuum coating cavity and are arranged along the moving direction of the detection box body, and the height of the projection of the deflector rod in the vertical direction is slightly higher than that of the touch rods in the initial state.
As a further improvement of the above technology, the carrier plate is provided with sample positioning devices arranged in a circular matrix for fixing samples.
As a further improvement of the technology, the positioning device comprises a positioning surface for placing a sample and a limit connecting piece with elasticity, which is arranged on the positioning surface.
As a further improvement of the technology, the positioning device comprises a positioning pin shaft fixed on the carrying disc and a limiting connecting piece with elasticity, which is arranged on the positioning pin shaft.
The invention also discloses a detection method of each layer of film thickness detection system of the multilayer film system, which comprises the following specific steps:
(1) firstly, assembling a detection system, installing a new sample to be coated in a detection box body, and marking the sample;
(2) secondly, fixing a detection system provided with a new sample on a slide holder of a vacuum coating cavity, and confirming whether a slide holder shifting device can perform elastic reset before coating;
(3) then, operating the coating equipment to enable the detection system to move forward along with the slide glass rack in the vacuum coating cavity, and when a deflector rod in the carrier disc shifting device touches a first touch rod, driving the carrier disc shifting device to rotate by an angle to enable a first sample to be coated to correspond to the position of an opening window of the detection box body, so as to carry out coating work on a first film layer of the first sample;
(4) then, when the detection system moves forwards along with the slide rack, the first touch rod is separated from the deflector rod, the slide tray shifting device is restored to the original position under the action of the spring restoring force of the return spring until the slide tray shifting device moves to the position of the coating source of the second film layer, the second touch rod touches the deflector rod, the second sample is shifted to the position of the opening window of the detection box body, the coating work of the second film layer of the second sample is carried out, and the coating work of the third film layer of the third sample is carried out according to the circulation until the coating work of the Nth film layer of the Nth sample is carried out;
(5) and after the film coating work of each film layer corresponding to each sample is finished, sequentially taking out each sample wafer which finishes the film coating work, and performing film thickness detection work of each film layer according to the mark made with the corresponding film layer.
(6) And finally, inputting the thickness data of each film layer into a computer to manufacture a film thickness distribution curve, and revising the production process parameters according to the trend of the film thickness distribution curve.
Compared with the prior art, the invention has the beneficial effects that:
(1) according to the detection system, the trigger mechanism triggers the carrier disc shifting device to rotate, so that a sample to be plated accurately corresponds to the position of the film plating opening window, new samples can be switched to carry out film deposition sampling respectively, film plating work of different films of different samples is completed, actual thickness samples of all films of a multilayer film can be obtained respectively in one complete film plating period, accurate basis is provided for detecting the thicknesses of different films, and the detection process is convenient, rapid and easy to realize;
(2) the detection method provided by the invention can be used for detecting the film thickness of different films of different samples by a commonly used film thickness detection method, can be used for quickly obtaining a film coating result, saving the debugging time of the process, detecting the thickness data of each film independently, facilitating the accurate control of the process, feeding back the detection data of each film thickness, accurately confirming the deviation range and degree of process parameters, and quickly, accurately and conveniently correcting the production process.
(3) The detection method of the invention can be used for trial production when maintaining or replacing consumable parts each time, and can also be used for confirming data once, thereby saving debugging time.
Drawings
The invention is described in detail below with reference to the following figures and specific embodiments:
FIG. 1 is a schematic view of a detection system according to the present invention installed in a vacuum coating chamber;
FIG. 2 is a schematic front view of the inspection system of the present invention;
FIG. 3 is a schematic side view of the inspection system of the present invention;
FIG. 4 is an enlarged schematic view of the above-mentioned point A in FIG. 3;
FIG. 5 is a schematic view of the structure of the loading tray sliding apparatus of the present invention touching the triggering mechanism.
Detailed Description
As shown in fig. 1 to 5, the system 10 for detecting the thickness of each layer of film of a multilayer film system according to the present invention includes a detection box body 1 mounted on a slide rack 30 inside a vacuum film coating cavity 100 and capable of moving forward along with the slide rack 30, a film coating opening window 11 for receiving a film coating material is provided on a front cover of the detection box body 1, a plurality of samples 20 to be coated and a carrier disc 2 for mounting the samples 20 are uniformly provided inside the detection box body 1, a toggle device capable of toggling the carrier disc 2 to rotate and then enabling the next sample 20 to correspond to the position of the film coating opening window 11 is provided at a center position of the carrier disc 2, and a trigger mechanism 4 capable of triggering the toggle device to operate is provided inside the vacuum film coating cavity 100.
The slide frame 30 is a device which is always provided in the vacuum coating cavity 100 in the technical field of vacuum coating, the bottom of the vacuum coating cavity 100 is provided with a rolling device 50 on which the slide frame 30 moves, a plurality of coating sources 40 are arranged in the vacuum coating cavity 100 in front of the slide frame 30, and when the slide frame 30 with the sample 20 is close to the coating sources 40, the coating sources 40 are started to start coating of different layers.
As shown in fig. 3 and 5, the shifting device is a carrier disc shifting device 3 for shifting the carrier disc to rotate, the carrier disc shifting device 3 sequentially comprises a unidirectional ratchet clutch 31, a connecting shaft 32 and a shifting lever 33 which are fixedly arranged at the central position of the carrier disc 2 from the inside to the outside of the detection box body 1, a fixed seat 5 is arranged in the front cover of the detection box body 1, the unidirectional ratchet clutch 31 and the connecting shaft 32 are arranged on the fixed seat 5, one part of the connecting shaft 32 is arranged in the detection box body 1, the other part is arranged in the outside of the detection box body 1, a reset spring 34 is sleeved on the connecting shaft 32 section arranged outside the detection box body 1, and the shifting lever 33 is inclined and arranged towards the direction close to the trigger mechanism 4 in the initial state.
In the invention, the carrier plate shifting device 3 can be replaced by a shifting device for shifting the front cover of the detection box body 1, and the working principle of the shifting device is basically the same as that of the carrier plate shifting device 3, and the description is omitted.
As shown in fig. 3 and 5, the triggering mechanism 4 is a plurality of fixed touch rods fixed between two adjacent coating sources 40, and the fixed touch rods are all horizontally fixed on the vacuum coating chamber 100 and all arranged along the moving direction of the detection box body 1, in an initial state, the height of the vertical projection of the shift lever 33 is slightly higher than the height of the touch rods, the detection box body 1 moves forward along with the slide holder 30, when the fixed touch rods touch the shift lever 33, the shift lever 33 drives the connecting shaft 32 and the one-way ratchet clutch 31 to drive the carrier plate 2 to rotate counterclockwise by an angle, at this time, the sample 20 is aligned with the coating window opening 11 to complete the coating work of the first coating of the first sample 20, then the fixed touch rods leave the shift lever 33, the shift lever 33 returns to the original position under the effect of the elastic force, and continues to wait until the next fixed touch rod is touched, and finishing the coating work of the second film layer of the next sample 20, and circulating the steps.
In the present invention, as shown in fig. 4, the sample positioning device 6 for fixing the samples 20 is arranged on the carrying tray 2 in a circular matrix arrangement, and the sample positioning device 6 includes a positioning surface 61 for placing the samples 20 and a limiting connecting member 62 with elasticity, which is mounted on the positioning surface 61, so that the samples 20 can be conveniently mounted on the carrying tray 2, and can be conveniently dismounted. In addition, the sample 20 can also be installed in a combined installation mode of the pin shaft and the limiting connecting piece 62, and the structural principle is the same, which is not described again.
In addition, the invention also discloses a detection method of each layer film thickness detection system of the multilayer film system, which comprises the following specific steps:
(1) firstly, assembling a detection system, installing a new sample 20 to be coated in a detection box body 1, and marking the sample 20;
(2) secondly, fixing the detection system provided with the new sample 20 on a slide rack 30 in the vacuum coating cavity 100, and confirming whether the slide rack shifting device 3 can elastically reset before coating;
(3) then, the film coating equipment is operated, the detection system moves forwards along with the slide glass rack 30 in the vacuum film coating cavity 100, when the deflector rod 33 in the carrier disc shifting device 3 touches the first touch rod 4', the carrier disc shifting device 3 can drive the carrier disc 2 to rotate for an angle, the first sample 20 to be coated corresponds to the position of the opening window 11 of the detection box body 1, and the film coating source 40 is started to perform the film coating work of the first film layer of the first sample 20;
(4) then, when the detection system moves forwards along with the slide holder 30, when the first touch rod 4 is separated from the shift lever 33, under the action of the spring restoring force of the return spring 34, the slide holder shifting device 3 is restored to the original position until the slide holder shifting device moves to the position of the film coating source 40 of the second film layer, the second touch rod touches the shift lever 33, the second sample 20 is shifted to the position of the opening window of the detection box body 1, the film coating source 40 is started, the film coating work of the second film layer of the second sample 20 is carried out, and the film coating work of the third film layer of the third sample 20 is carried out according to the cycle until the film coating work of the Nth film layer of the Nth sample 20 is carried out;
(5) after the film coating work of each film layer corresponding to each sample 20 is completed, each sample wafer on which the film coating work is completed is sequentially taken out, and the film thickness detection work of each film layer is performed according to the mark made with the corresponding film layer.
(6) And finally, inputting the thickness data of each film layer into a computer to manufacture a film thickness distribution curve, and revising the production process parameters according to the trend.
The present invention is not limited to the above-described embodiments, and various changes and modifications of the present invention are also intended to be included within the scope of the claims and the equivalent technical scope of the present invention, provided they do not depart from the spirit and scope of the present invention.
Claims (7)
1. A system for detecting the thickness of each film of a multilayer film system is characterized in that: the vacuum coating detection device comprises a detection box body which is arranged on a slide rack in a vacuum coating cavity and can move forwards along with the slide rack, a coating opening window for receiving coating materials is arranged on a front cover of the detection box body, a plurality of samples to be coated and a carrier disc for mounting the samples are uniformly arranged in the detection box body, a shifting device which can shift the carrier disc or can correspond the next sample to the position of the coating opening window after the front cover of the detection box body rotates is arranged at the central position of the carrier disc, and a trigger mechanism which can trigger the carrier disc shifting device to work is arranged in the vacuum coating cavity.
2. The system for detecting the thickness of each layer of a multilayer film system according to claim 1, wherein: the shifting device is a shifting device capable of shifting a loading disc to rotate, the shifting device sequentially comprises an unidirectional ratchet clutch, a connecting shaft and a shifting lever from the inside to the outside of the detection box body, the unidirectional ratchet clutch, the connecting shaft and the shifting lever are fixedly installed at the central position of the loading disc, a fixed seat is arranged in the front cover of the detection box body, the unidirectional ratchet clutch and the connecting shaft are installed on the fixed seat, one part of the connecting shaft is arranged in the inside of the detection box body, the other part of the connecting shaft is arranged in the outside of the detection box body, a reset spring is sleeved on the connecting shaft section outside the detection box body, and the shifting lever is inclined and arranged towards the direction close to the trigger mechanism in an initial state.
3. The system for detecting the thickness of each layer of a multilayer film system according to claim 2, wherein: the trigger mechanism is a fixed touch rod fixed between two adjacent coating film sources, the fixed touch rod is a plurality of, the fixed touch rod is horizontally fixed on a cavity of the vacuum coating film cavity and arranged along the direction of movement of the detection box body, and the driving lever is slightly higher than the touch rod in the height of projection in the vertical direction in an initial state.
4. The system for detecting the thickness of each layer of a multilayer film system according to claim 1, wherein: and the loading disc is provided with sample positioning devices which are arranged in a circular matrix and used for fixing samples.
5. The system for detecting the thickness of each layer of a multilayer film system according to claim 4, wherein: the positioning device comprises a positioning surface for placing a sample and an elastic limiting connecting piece arranged on the positioning surface.
6. The system for detecting the thickness of each layer of a multilayer film system according to claim 4, wherein: the positioning device comprises a positioning pin shaft fixed on the carrying disc and a limiting connecting piece with elasticity, which is arranged on the positioning pin shaft.
7. The method for detecting the thickness of each layer of a multilayer film system according to claim 4, comprising the steps of:
(1) firstly, assembling a detection system, installing a new sample to be coated in a detection box body, and marking the sample;
(2) secondly, fixing the detection system provided with the new sample on a slide holder of a vacuum coating cavity, and confirming whether the slide holder shifting device can elastically reset before coating;
(3) then, operating the film coating equipment to enable the detection system to move forwards along with the slide glass rack in the vacuum film coating cavity, and when a shifting lever in the carrying disc shifting device touches a first touch rod, driving the carrying disc to rotate for an angle by the carrying disc shifting device, and enabling a first sample to be coated to correspond to the position of an opening window of the detection box body to carry out film coating work on a first film layer of the first sample;
(4) then, when the detection system moves forwards along with the slide rack, the first touch rod is separated from the deflector rod, the slide tray shifting device is restored to the original position under the action of the spring restoring force of the return spring until the slide tray shifting device moves to the position of the coating source of the second film layer, the second touch rod touches the deflector rod, the second sample is shifted to the position of the opening window of the detection box body, the coating work of the second film layer of the second sample is carried out, and the coating work of the third film layer of the third sample is carried out according to the circulation until the coating work of the Nth film layer of the Nth sample is carried out;
(5) and after the film coating work of each film layer corresponding to each sample is finished, sequentially taking out each sample wafer which finishes the film coating work, and performing film thickness detection work of each film layer according to the mark made with the corresponding film layer.
(6) And finally, inputting the thickness data of each film layer into a computer to manufacture a film thickness distribution curve, and revising the production process parameters according to the trend.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210414364.9A CN114836727B (en) | 2022-04-20 | 2022-04-20 | System and method for detecting film thickness of each layer of multilayer film system |
| PCT/CN2022/095141 WO2023201841A1 (en) | 2022-04-20 | 2022-05-26 | Individual-film thickness measurement system for multi-layer film system and measurement method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210414364.9A CN114836727B (en) | 2022-04-20 | 2022-04-20 | System and method for detecting film thickness of each layer of multilayer film system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN114836727A true CN114836727A (en) | 2022-08-02 |
| CN114836727B CN114836727B (en) | 2024-04-09 |
Family
ID=82566223
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202210414364.9A Active CN114836727B (en) | 2022-04-20 | 2022-04-20 | System and method for detecting film thickness of each layer of multilayer film system |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN114836727B (en) |
| WO (1) | WO2023201841A1 (en) |
Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0552648A1 (en) * | 1992-01-17 | 1993-07-28 | Matsushita Electric Industrial Co., Ltd. | Method of and apparatus for forming a multi-layer film |
| WO2003052468A1 (en) * | 2001-12-19 | 2003-06-26 | Nikon Corporation | Film forming device, and production method for optical member |
| TW200502417A (en) * | 2002-12-04 | 2005-01-16 | Leybold Optics Gmbh | Method for producing a multilayer coating and device for carrying out the method |
| CN1674729A (en) * | 2004-03-03 | 2005-09-28 | 三洋电机株式会社 | Method and apparatus for measuring thickness of deposited film and method and apparatus for forming material layer |
| CN101707165A (en) * | 2009-09-29 | 2010-05-12 | 湖北盛佳电器设备有限公司 | Built-in A type intelligent circuit breaker with automatic closing function |
| KR101403763B1 (en) * | 2012-12-21 | 2014-06-11 | 주식회사 야스 | Mearsurement unit of film thickness per unit time for oled in-line deposition system |
| CN108977764A (en) * | 2018-09-18 | 2018-12-11 | 合肥鑫晟光电科技有限公司 | Film layer recording device and its method, mask plate component and evaporated device is deposited |
| CN110257791A (en) * | 2019-04-29 | 2019-09-20 | 昆山国显光电有限公司 | Rate monitoring device, evaporated device and evaporation coating method |
| CN112442662A (en) * | 2019-08-30 | 2021-03-05 | 佳能特机株式会社 | Deposition amount information acquisition device, film forming device, opening/closing device, film forming method, and method for manufacturing electronic device |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001124526A (en) * | 1999-10-29 | 2001-05-11 | Japan Aviation Electronics Industry Ltd | Optical film thickness monitoring mechanism |
| CN100482856C (en) * | 2005-05-24 | 2009-04-29 | 鸿富锦精密工业（深圳）有限公司 | Film coating equipment and its film coating method |
| CN101294270B (en) * | 2008-06-06 | 2011-02-16 | 东北大学 | Equipment and method for producing nichrome composite plate with vacuum arc ion plating |
| JP5141607B2 (en) * | 2009-03-13 | 2013-02-13 | 東京エレクトロン株式会社 | Deposition equipment |
| CN207435532U (en) * | 2017-09-19 | 2018-06-01 | 武汉普迪真空科技有限公司 | A kind of organic vacuum coating mask device |
| CN216348476U (en) * | 2021-08-30 | 2022-04-19 | 滁州中星光电科技有限公司 | Sample thickness inspection device for glass material coating |
-
2022
- 2022-04-20 CN CN202210414364.9A patent/CN114836727B/en active Active
- 2022-05-26 WO PCT/CN2022/095141 patent/WO2023201841A1/en unknown
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0552648A1 (en) * | 1992-01-17 | 1993-07-28 | Matsushita Electric Industrial Co., Ltd. | Method of and apparatus for forming a multi-layer film |
| WO2003052468A1 (en) * | 2001-12-19 | 2003-06-26 | Nikon Corporation | Film forming device, and production method for optical member |
| TW200502417A (en) * | 2002-12-04 | 2005-01-16 | Leybold Optics Gmbh | Method for producing a multilayer coating and device for carrying out the method |
| CN1674729A (en) * | 2004-03-03 | 2005-09-28 | 三洋电机株式会社 | Method and apparatus for measuring thickness of deposited film and method and apparatus for forming material layer |
| CN101707165A (en) * | 2009-09-29 | 2010-05-12 | 湖北盛佳电器设备有限公司 | Built-in A type intelligent circuit breaker with automatic closing function |
| KR101403763B1 (en) * | 2012-12-21 | 2014-06-11 | 주식회사 야스 | Mearsurement unit of film thickness per unit time for oled in-line deposition system |
| CN108977764A (en) * | 2018-09-18 | 2018-12-11 | 合肥鑫晟光电科技有限公司 | Film layer recording device and its method, mask plate component and evaporated device is deposited |
| CN110257791A (en) * | 2019-04-29 | 2019-09-20 | 昆山国显光电有限公司 | Rate monitoring device, evaporated device and evaporation coating method |
| CN112442662A (en) * | 2019-08-30 | 2021-03-05 | 佳能特机株式会社 | Deposition amount information acquisition device, film forming device, opening/closing device, film forming method, and method for manufacturing electronic device |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2023201841A1 (en) | 2023-10-26 |
| CN114836727B (en) | 2024-04-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR102414026B1 (en) | Fast measurement of droplet parameters in industrial printing system | |
| JP2012186390A (en) | Imprint apparatus and manufacturing method of article | |
| CN106918986B (en) | Adjusting method of imprint apparatus, imprint method, and article manufacturing method | |
| CN102689171B (en) | Automatic accurate adjustment system for instrument movement clearance | |
| JP2015123718A (en) | Screen printer | |
| US20150260636A1 (en) | Pressing and tearing apparatus and method for peeling rate tests | |
| CN104885209A (en) | Chuck, in particular for use in a mask aligner | |
| CN216646307U (en) | LED chip appearance defect detection device | |
| CN114836727A (en) | System and method for detecting thickness of each layer of multilayer film system | |
| WO2018064467A1 (en) | System and method for process-induced distortion prediction during wafer deposition | |
| CN101718541B (en) | Automatic measuring device and method of coating layer ND direction film thickness | |
| CN112458407B (en) | Crystal oscillator measurement system, crystal oscillator measurement method and crystal oscillator measurement device | |
| CN116974152A (en) | Material conveying device with multiple degrees of freedom leveling and non-contact exposure equipment | |
| CN113755806A (en) | Reflective magnetron sputtering coating thickness monitoring device, coating machine and method | |
| JP2013110072A (en) | Organic el light emitting device manufacturing method and manufacturing device | |
| WO2020168809A1 (en) | Multi-station 3d printer control method, optical system, and 3d printer | |
| CN111508888A (en) | L ED array transfer device and L ED array transfer method | |
| CN111151469A (en) | Bolt thread on-line measuring equipment | |
| CN217688494U (en) | Multi-light source adjustable image detection device | |
| KR102174367B1 (en) | Thin film depositing apparatus and the thin film depositing method using the same | |
| CN208139988U (en) | A kind of microspur measuring device in place | |
| CN113748483A (en) | Method and system for adjustably coating a film using a magnetron sputtering system | |
| TWI764273B (en) | Target measurement device and method for measuring a target | |
| JPH06336005A (en) | Screen printing system, printing method using the system, and screen plate used in the system | |
| CN111004999B (en) | Magnetron sputtering device for preparing high-flux film and preparation method for preparing high-flux film |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |