CN114411249A - Gas distribution assembly and crystal growth device with same - Google Patents

Gas distribution assembly and crystal growth device with same Download PDF

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Publication number
CN114411249A
CN114411249A CN202111547069.2A CN202111547069A CN114411249A CN 114411249 A CN114411249 A CN 114411249A CN 202111547069 A CN202111547069 A CN 202111547069A CN 114411249 A CN114411249 A CN 114411249A
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furnace body
flow
gas
air dispersing
distribution
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CN202111547069.2A
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CN114411249B (en
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李向阳
陈俊宏
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Zhonghuan Leading Xuzhou Semiconductor Materials Co ltd
Zhonghuan Advanced Semiconductor Materials Co Ltd
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Xuzhou Xinjing Semiconductor Technology Co Ltd
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    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B27/00Single-crystal growth under a protective fluid
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B27/00Single-crystal growth under a protective fluid
    • C30B27/02Single-crystal growth under a protective fluid by pulling from a melt

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

The invention discloses a gas distribution assembly and a crystal growth device with the same, wherein the crystal growth device also comprises a furnace body, a protective gas inlet is formed in the furnace body, the gas distribution assembly is suitable for being arranged in the furnace body and is positioned at the downstream side of the protective gas inlet, the gas distribution assembly comprises a plurality of distribution pieces, the distribution pieces are arranged at intervals along the airflow direction, each distribution piece comprises a plurality of supporting frames and a plurality of air dissipation rib groups, the supporting frames are annular, the supporting frames are sequentially sleeved along the radial direction of the furnace body, each air dissipation rib group comprises air dissipation ribs arranged at intervals along the circumferential direction of the furnace body, two adjacent supporting frames are connected through one air dissipation rib group, and two ends of each air dissipation rib are respectively connected with two corresponding supporting frames. According to the gas distribution assembly provided by the invention, the protective gas flow flowing into the furnace body can be uniform and stable, so that the temperature gradient at the solid-liquid interface for crystal growth is stable, and the crystal quality is improved.

Description

Gas distribution assembly and crystal growth device with same
Technical Field
The invention relates to the technical field of crystal growth, in particular to a gas distribution assembly and a crystal growth device with the same.
Background
In the related technology, during the operation of the single crystal furnace, protective gas is needed to ensure the internal atmosphere of the furnace body; however, when the protective gas flow is introduced into the furnace body, the problem of non-uniform or turbulent flow of the gas flow often occurs, which easily affects the temperature gradient at the solid-liquid interface in the furnace body, and simultaneously, effective removal of impurities such as silicon oxide is difficult to achieve, resulting in poor crystal quality.
Disclosure of Invention
The present invention is directed to solving at least one of the problems of the prior art. Therefore, the invention provides the gas distribution assembly, which can enable the protective gas flow flowing into the furnace body to be uniform and stable, so as to ensure that the temperature gradient at the solid-liquid interface for crystal growth is stable, and improve the crystal quality.
The invention also provides a crystal growing device with the gas distribution assembly.
According to an embodiment of the first aspect of the present invention, the gas flow distribution assembly is used for a crystal growth apparatus, the crystal growth apparatus further includes a furnace body, the furnace body is formed with a shielding gas inlet, the gas flow distribution assembly is adapted to be disposed in the furnace body and located at a downstream side of the shielding gas inlet, and the gas flow distribution assembly includes: a plurality of reposition of redundant personnel pieces, it is a plurality of the reposition of redundant personnel piece is arranged along air current flow direction interval, every the reposition of redundant personnel piece includes a plurality of carriage and a plurality of wind muscle group that looses, the carriage is the annular, and is a plurality of the carriage is followed the setting is established to radial cover in proper order of furnace body, every group the wind muscle group that looses includes a plurality of edges the wind muscle that looses that the circumference interval of furnace body set up, adjacent two through a set of between the carriage the wind muscle group that looses links to each other, every the both ends of the wind muscle that looses respectively with corresponding two the carriage links to each other.
According to the gas distribution assembly provided by the embodiment of the invention, the gas distribution assembly comprises the plurality of distribution members and the distribution members comprise the plurality of support frames and the plurality of air dispersing rib groups, so that the gas distribution assembly can disperse the protective gas flowing into the furnace body conveniently, the gas flow of the protective gas flowing into the furnace body is uniform and stable, the temperature gradient at the solid-liquid interface for crystal growth is stable, the shape of the solid-liquid interface is stable, and impurities such as silicon oxide and the like can be smoothly and stably taken away by the protective gas to fully remove the impurities, so that the growth quality of crystals is improved.
In some embodiments, the number of the air dispersing ribs of at least two adjacent air dispersing rib groups is the same, and the air dispersing ribs of the at least two adjacent air dispersing rib groups are connected in a one-to-one correspondence manner; and/or the air-dispersing ribs of at least two adjacent air-dispersing rib groups are arranged along the circumferential direction of the furnace body in a staggered manner.
In some embodiments, the support frames of at least two adjacent flow dividing pieces are arranged along the radial direction of the furnace body in a staggered manner; and/or the air dispersing ribs of the air dispersing rib group of at least two adjacent flow dividing pieces are arranged along the circumferential direction of the furnace body in a staggered manner.
In some embodiments, two adjacent support frames and two adjacent air diffusing ribs jointly define a diversion hole, and the distribution density of the diversion holes of at least two adjacent diversion members is increased along the airflow direction.
In some embodiments, the plurality of flow dividing members include a first flow dividing member, a second flow dividing member and a third flow dividing member which are arranged in sequence in the airflow direction, the distribution density of the flow dividing holes of the second flow dividing member is greater than that of the flow dividing holes of the first flow dividing member, and the distance between the second flow dividing member and the third flow dividing member is greater than that between the second flow dividing member and the first flow dividing member.
In some embodiments, the gas manifold assembly further comprises: the limiting adjusting module is used for adjusting the position of at least one flow dividing piece in the airflow direction; and/or the position of the air dispersing rib of at least one flow dividing piece in the circumferential direction of the support frame is adjusted.
In some embodiments, the limiting adjustment module comprises a plurality of groups of protruding groups arranged at intervals along the axial direction of the furnace body, the plurality of groups of protruding groups correspond to the plurality of shunting pieces one by one, each group of protruding groups comprises a plurality of supporting protrusions arranged at intervals along the circumferential direction of the furnace body, the supporting protrusions are suitable for being arranged on the inner wall surface of the furnace body, a plurality of grooves arranged at intervals along the circumferential direction of the furnace body are arranged on the bottom wall of the shunting piece, and each supporting protrusion is matched with any one of the at least two grooves to support the shunting piece.
In some embodiments, the limit adjusting module includes a support limit portion, the support limit portion is disposed on an inner wall surface of the furnace body, a sliding groove is disposed on a side wall of the shunt, the sliding groove extends along a circumferential direction of the shunt, the support limit portion is embedded in the sliding groove, and the shunt is suitable for rotating relative to the furnace body.
The crystal growth device according to the embodiment of the second aspect of the present invention comprises a furnace body, wherein a furnace chamber is defined in the furnace body, the furnace chamber comprises a main chamber and an auxiliary chamber, and the auxiliary chamber is arranged on the upper side of the main chamber; the crucible is arranged in the main chamber; a gas flow distribution assembly according to the above-described first aspect of the present invention, disposed within the auxiliary chamber.
According to the crystal growth device provided by the embodiment of the invention, by adopting the gas distribution assembly, the gas distribution assembly comprises a plurality of distribution members, and the distribution members comprise a plurality of supporting frames and a plurality of air dispersing rib groups, so that the gas distribution assembly can conveniently disperse the protective gas flowing into the furnace body, the gas flow of the protective gas flowing into the furnace body is more uniform and stable, the temperature gradient at the solid-liquid interface for crystal growth is more stable, the shape of the solid-liquid interface is more stable, and meanwhile, impurities such as silicon oxide and the like can be smoothly taken away by the protective gas, so that the impurities can be fully removed, and the growth quality of the crystal can be improved.
In some embodiments, a mounting opening is formed in a wall surface of the sub-chamber, the shunt member is drawably disposed in the sub-chamber through the mounting opening, a back plate for closing the mounting opening is disposed on an outer side wall of the shunt member, or an opening and closing door is disposed on the furnace body, the opening and closing door is rotatably disposed at the mounting opening to open or close the mounting opening, and the shunt member is detachably disposed on a side of the opening and closing door facing the mounting opening.
In some embodiments, the inner diameter of the auxiliary chamber is D, the length of the flow dividing member in the airflow direction is h, the distance between two adjacent flow dividing members is D, h is greater than or equal to 0.1D and less than or equal to 0.5D, and D is less than or equal to D.
Additional aspects and advantages of the invention will be set forth in part in the description which follows and, in part, will be obvious from the description, or may be learned by practice of the invention.
Drawings
The above and/or additional aspects and advantages of the present invention will become apparent and readily appreciated from the following description of the embodiments, taken in conjunction with the accompanying drawings of which:
FIG. 1 is a schematic illustration of an installation of a gas manifold assembly according to one embodiment of the present invention;
FIG. 2 is a schematic view of a flow splitter according to a first embodiment of the present invention;
FIG. 3 is a schematic view of a flow splitter according to a second embodiment of the present invention;
FIG. 4 is a schematic view of a flow splitter according to a third embodiment of the present invention;
FIG. 5 is a schematic view of a flow splitter according to a fourth embodiment of the present invention;
FIG. 6 is a schematic view of a flow splitter according to example five of the present disclosure;
FIG. 7 is a schematic view of a flow splitter according to a sixth embodiment of the present invention;
FIG. 8 is a side view of a flow splitter according to a seventh embodiment of the present invention;
FIG. 9 is a schematic view of a plurality of flow splitters of a gas flow splitter assembly according to one embodiment of the present invention.
Reference numerals:
a crystal growth apparatus 100, a shielding gas inlet 2a, a sub-chamber 2b,
A gas distribution component 1,
A flow divider 11, a flow dividing hole 110, a first flow divider 11a, a second flow divider 11b, a third flow divider 11c,
A supporting frame 111, a wind-dispersing rib group 112, a wind-dispersing rib 1121, a chute 113,
Spacing adjusting module 12, support protrusion 121.
Detailed Description
Reference will now be made in detail to embodiments of the present invention, examples of which are illustrated in the accompanying drawings, wherein like or similar reference numerals refer to the same or similar elements or elements having the same or similar function throughout. The embodiments described below with reference to the accompanying drawings are illustrative only for the purpose of explaining the present invention, and are not to be construed as limiting the present invention.
The following disclosure provides many different embodiments, or examples, for implementing different features of the invention. To simplify the disclosure of the present invention, the components and arrangements of specific examples are described below. Of course, they are merely examples and are not intended to limit the present invention. Furthermore, the present invention may repeat reference numerals and/or letters in the various examples. This repetition is for the purpose of simplicity and clarity and does not in itself dictate a relationship between the various embodiments and/or configurations discussed. In addition, the present invention provides examples of various specific processes and materials, but one of ordinary skill in the art may recognize the applicability of other processes and/or the use of other materials.
It should be noted that in the description of the present application, "and/or" is meant to include three parallel schemes, and taking "a and/or B" as an example, the scheme includes a scheme, or B scheme, or a scheme satisfied by both a and B.
Next, a gas flow distribution assembly 1 according to an embodiment of the present invention is described with reference to the drawings. Wherein, the gas shunt assembly 1 is used for the crystal growth device 100, the crystal growth device 100 further comprises a furnace body, the furnace body is formed with a shielding gas inlet 2a, the shielding gas can flow into the furnace body through the shielding gas inlet 2a to ensure the atmosphere in the furnace body and ensure the normal growth of the crystal to avoid the oxidation of the crystal, etc., the gas shunt assembly 1 is suitable for being arranged in the furnace body, and the gas shunt assembly 1 is suitable for being arranged at the downstream side of the shielding gas inlet 2a to disperse the shielding gas flowing into the furnace body, so that the flow of the shielding gas flowing into the furnace body is more uniform and stable, the temperature gradient at the solid-liquid interface for ensuring the growth of the crystal is more stable and the temperature gradient change is more uniform, the shape of the solid-liquid interface is ensured to be more stable, so as to effectively control the distribution of the micro defects of the crystal, and simultaneously, the crystal growth device 100 is favorable for the stable and stable distribution of impurities such as silicon oxide, etc The protective gas is smoothly taken away so as to fully remove impurities and reduce the wire breakage rate, thereby being beneficial to improving the growth quality of the crystal and ensuring the yield of the crystal.
As shown in fig. 1, the gas flow splitting assembly 1 includes a plurality of flow splitting members 11, the plurality of flow splitting members 11 are arranged at intervals along the gas flow direction (for example, from top to bottom in fig. 1), that is, the shielding gas at the shielding gas inlet 2a sequentially flows through the plurality of flow splitting members 11, and each flow splitting member 11 respectively disperses the shielding gas once, so that the shielding gas flowing into the furnace body can be dispersed by the gas flow splitting assembly 1 for multiple times, so as to effectively improve the flow uniformity and stability of the shielding gas.
As shown in fig. 2, each flow divider 11 includes a plurality of support frames 111 and a plurality of air-dispersing rib groups 112, the support frames 111 are annular, the plurality of support frames 111 are sequentially sleeved along the radial direction of the furnace body, two adjacent support frames 111 are arranged at intervals, each air-dispersing rib group 112 includes a plurality of air-dispersing ribs 1121 arranged along the circumferential direction of the furnace body at intervals, two adjacent support frames 111 are connected with each other through a group of air-dispersing rib groups 112, each air-dispersing rib 1121 extends along the radial straight line or curve of the furnace body, and two ends of each air-dispersing rib 1121 are respectively connected with two corresponding support frames 111.
Obviously, the diversion hole 110 can be defined between two adjacent support frames 111 and two adjacent wind ribs 1121, then a plurality of diversion holes 110 of the diversion piece 11 are arranged along the circumference and the radial direction of the furnace body, which is convenient for making the diversion piece 11 have a net structure, when the airflow flows through the diversion piece 11, the airflow is dispersed to the plurality of diversion holes 110 by the diversion piece 11, so as to effectively improve the uniformity of the airflow in the circumference and the radial direction of the furnace body, so that the airflow flows stably, and the diversion piece 11 has a simple structure, which is convenient to process, has low cost, and is convenient for realizing the light-weight design of the gas diversion assembly 1.
It should be noted that, in the description of the present application, "annular" is to be understood in a broad sense, i.e., not limited to "circular ring", but may also be, for example, "polygonal ring" (e.g., "square ring", etc.), etc.; the shapes of the plurality of support frames 111 may be the same or different for a single shunt 11; "plurality" means two or more.
For a single flow divider 11, for example, if there are three support frames 111 of the flow divider 11, there are two groups of air-dispersing rib groups 112, where one group of air-dispersing rib groups 112 is connected between two adjacent support frames 111, and the other group of air-dispersing rib groups 112 is connected between the other two adjacent support frames 111; or, the number of the supporting frames 111 of the flow divider 11 is four, and then the air diffusing rib groups 112 are three, the four supporting frames 111 are sequentially a first supporting frame, a second supporting frame, a third supporting frame and a fourth supporting frame from inside to outside along the radial direction of the furnace body, one group of the air diffusing rib groups 112 is connected between the first supporting frame and the second supporting frame, one group of the other two groups of the air diffusing rib groups 112 is connected between the second supporting frame and the third supporting frame, and the other group of the other two groups of the air diffusing rib groups 112 is connected between the third supporting frame and the fourth supporting frame. Of course, the number of the supporting frames 111 of the flow divider 11 may be five or more.
It should be noted that, in the description of the present application, the direction "inside" is a direction close to the central axis of the flow divider 11, and the opposite direction is defined as "outside".
It can be understood that the number of the supporting frames 111 of the plurality of flow dividing members 11 may be the same or different, that is, the number of the supporting frames 111 of the plurality of flow dividing members 11 is completely the same, or the number of the supporting frames 111 of at least one flow dividing member 11 is different from the number of the supporting frames 111 of the remaining flow dividing members 11; similarly, the number of the air dispersing rib groups 112 of the plurality of flow dividing members 11 may be the same or different; the number of the air-dispersing ribs 1121 of the plurality of air-dispersing rib groups 112 may be the same or different; the plurality of flow dividing members 11 are arranged at uniform intervals along the airflow direction, and can also be arranged at non-uniform intervals; the lengths of the plurality of flow dividing members 11 in the airflow direction may be the same or may not be the same, that is, the lengths of the plurality of flow dividing members 11 in the airflow direction are the same, or the length of at least one flow dividing member 11 in the airflow direction is different from the lengths of the remaining flow dividing members 11.
It can be seen that the arrangement intervals of the plurality of flow dividing members 11, the number of the flow dividing members 11, the lengths of the flow dividing members 11, the number of the support frames 111, the shapes of the support frames 111, the number of the air diffusing rib groups 112, and the number of the air diffusing ribs 1121 may be specifically set according to actual requirements, so that the gas flow dividing assembly 1 is flexibly set, and the gas flow dividing assembly 1 is made to better adapt to the differentiated requirements (for example, different arrangement spaces for the gas flow dividing assembly 1) of different crystal growth devices 100, and the differentiated requirements for the gas flows by different crystal growth devices 100.
According to the gas distribution assembly 1 provided by the embodiment of the invention, by arranging the gas distribution assembly 1 to comprise the plurality of distribution members 11 and enabling the distribution members 11 to comprise the plurality of support frames 111 and the plurality of air dispersing rib groups 112, the gas distribution assembly 1 is convenient to disperse the protective gas flowing into the furnace body, so that the gas flow of the protective gas flowing into the furnace body is uniform and stable, the temperature gradient at the solid-liquid interface for crystal growth is stable, the shape of the solid-liquid interface is stable, and meanwhile, impurities such as silicon oxide and the like are smoothly taken away by the protective gas, so that the impurities are fully removed, and the growth quality of the crystal is improved.
In some embodiments, as shown in fig. 3 to fig. 6, the number of the air dispersing ribs 1121 of at least two adjacent air dispersing rib groups 112 is the same, and the air dispersing ribs 1121 of the at least two adjacent air dispersing rib groups 112 are connected in a one-to-one correspondence, so that the at least two adjacent air dispersing rib groups 112 are better connected into a whole, which is beneficial to ensuring the structural strength of the whole flow dividing member 11.
For example, if there are two air dispersing rib groups 112 of the flow divider 11, the number of the air dispersing ribs 1121 of the two air dispersing rib groups 112 is the same, and the air dispersing ribs 1121 of the two air dispersing rib groups 112 are respectively connected in a one-to-one correspondence; or, the air dispersing rib groups 112 of the flow divider 11 are three groups, wherein the number of the air dispersing ribs 1121 of two groups of air dispersing rib groups 112 is the same, the number of the air dispersing ribs 1121 of the two groups of air dispersing rib groups 112 is different from the number of the air dispersing ribs 1121 of the other group of air dispersing rib groups 112, the air dispersing ribs 1121 of the two groups of air dispersing rib groups 112 are respectively connected in a one-to-one correspondence manner, that is, each air dispersing rib 1121 of one group is respectively connected with one air dispersing rib 1121 of the other group in a corresponding manner; or, the air dispersing rib groups 112 of the flow divider 11 are three groups, the number of the air dispersing ribs 1121 of the three air dispersing rib groups 112 is the same, and the air dispersing ribs 1121 of the three air dispersing rib groups 112 are respectively connected in a one-to-one correspondence manner. Of course, the air dispersing rib groups 112 of the splitter 11 may be four or more groups.
Alternatively, in the example of fig. 3 to fig. 6, the corresponding air-dispersing ribs 1121 of the at least two adjacent air-dispersing rib groups 112 may be connected to form a straight rib, which is beneficial to simplify the structure of the air-dispersing ribs 1121, and simultaneously ensure the structural stability of the air-dispersing ribs 1121.
Of course, the present application is not so limited; in other embodiments, the number of the air dispersing ribs 1121 of the multiple air dispersing rib groups 112 of the flow divider 11 may also be different from each other, for example, in two adjacent air dispersing rib groups 112, the number of the air dispersing ribs 1121 of the air dispersing rib group 112 located on the radial outer side may be greater than the number of the air dispersing ribs 1121 of the air dispersing rib group 112 located on the radial inner side, so that the air dispersing rib group 112 located on the outer side can better adapt to a larger arrangement space thereof, so that the air flow close to the central axis of the flow divider 11 and the air flow far away from the central axis of the flow divider 11 can be effectively dispersed, and the air flow dispersing effect of the flow divider 11 is ensured.
The three air dispersing rib groups 112 of the splitter 11 are described as an example, and those skilled in the art can easily understand that the air dispersing rib groups 112 are other number of schemes after reading the following technical solutions. For example, the three air dispersing rib groups 112 are a first air dispersing rib group, a second air dispersing rib group and a third air dispersing rib group from inside to outside, where the number of the air dispersing ribs 1121 of the first air dispersing rib group is less than the number of the air dispersing ribs 1121 of the second air dispersing rib group is less than the number of the air dispersing ribs 1121 of the third air dispersing rib group, or the number of the air dispersing ribs 1121 of the first air dispersing rib group is less than the number of the air dispersing ribs 1121 of the second air dispersing rib group, which is equal to the number of the air dispersing ribs 1121 of the third air dispersing rib group, or the number of the air dispersing ribs 1121 of the first air dispersing rib group is equal to the number of the air dispersing ribs 1121 of the second air dispersing rib group, which is less than the number of the air dispersing ribs 1121 of the third air dispersing rib group.
In some embodiments, as shown in fig. 2, 3 and 7, the air dispersing ribs 1121 of at least two adjacent air dispersing rib groups 112 are disposed in a staggered manner along the circumferential direction of the furnace body, and for any two adjacent groups of the at least two adjacent air dispersing rib groups 112, each air dispersing rib 1121 of one group is located between two adjacent air dispersing ribs 1121 of the other group in the circumferential direction of the furnace body, and each air dispersing rib 1121 of the other group is located between two adjacent air dispersing ribs 1121 of the one group in the circumferential direction of the furnace body, so that flexible arrangement of the air dispersing ribs 1121 is facilitated, and uniformity of the flow of the shielding gas flowing through the flow divider 11 is ensured.
In addition, through the staggered arrangement of the air dispersing ribs 1121 of at least two adjacent air dispersing rib groups 112 along the circumferential direction of the furnace body, the staggered support of the air dispersing ribs 1121 of the two adjacent air dispersing rib groups 112 on the support frame 111 is facilitated, for a single support frame 111, the circumferential distance between two air dispersing ribs 1121 connected with the support frame 111 is facilitated to be reduced, and the structural stability of the support frame 111 in the circumferential direction is facilitated to be ensured.
It can be understood that, when the air dispersing ribs 1121 of two adjacent air dispersing rib groups 112 are disposed along the circumferential direction of the furnace body in a staggered manner, the number of the air dispersing ribs 1121 of the two adjacent air dispersing rib groups 112 may be the same or different.
For example, if there are two sets of air dispersing rib groups 112 of the flow divider 11, the air dispersing ribs 1121 of the two sets of air dispersing rib groups 112 are arranged along the circumferential direction of the furnace body in a staggered manner; or, the air dispersing rib groups 112 of the flow divider 11 are three groups, the air dispersing ribs 1121 of the second air dispersing rib group and the air dispersing ribs 1121 of the first air dispersing rib group are arranged along the circumferential direction of the furnace body in a staggered manner, and the air dispersing ribs 1121 of the second air dispersing rib group are not arranged along the circumferential direction of the furnace body in a staggered manner with the air dispersing ribs 1121 of the third air dispersing rib group, or the air dispersing ribs 1121 of the second air dispersing rib group and the air dispersing ribs 1121 of the first air dispersing rib group are arranged along the circumferential direction of the furnace body in a staggered manner, and the air dispersing ribs 1121 of the second air dispersing rib group and the air dispersing ribs 1121 of the third air dispersing rib group are also arranged along the circumferential direction of the furnace body in a staggered manner. Of course, the air dispersing rib groups 112 of the splitter 11 may be four or more groups.
In some embodiments, as shown in fig. 3 and fig. 7, the number of the air dispersing ribs 1121 of at least two adjacent air dispersing rib groups 112 is the same, the air dispersing ribs 1121 of the at least two adjacent air dispersing rib groups 112 are connected in a one-to-one correspondence, and the air dispersing ribs 1121 of the at least two adjacent air dispersing rib groups 112 are arranged along the circumferential direction of the furnace body in a staggered manner, at this time, the air dispersing rib groups 112 are three or more than three. Therefore, the processing of the splitter 11 is facilitated to be simplified, and the structural stability of the support frame 111 is ensured.
For example, taking the air dispersing rib groups 112 as three groups as an example, in the example of fig. 3, the number of the air dispersing ribs 1121 of the second air dispersing rib group is the same as the number of the air dispersing ribs 1121 of the first air dispersing rib group, the air dispersing ribs 1121 of the second air dispersing rib group are correspondingly connected to the air dispersing ribs 1121 of the first air dispersing rib group, and the air dispersing ribs 1121 of the second air dispersing rib group and the air dispersing ribs 1121 of the third air dispersing rib group are arranged in a staggered manner along the circumferential direction of the furnace body.
In some embodiments, the supporting frames 111 of at least two adjacent flow dividers 11 are arranged in a staggered manner along the radial direction of the furnace body, and for any two adjacent ones of the at least two adjacent flow dividers 11, on a reference plane, an orthographic projection of each supporting frame 111 of one of the at least two adjacent flow dividers is arranged at an interval with an orthographic projection of the other supporting frame 111 in the radial direction of the furnace body, and the reference plane is perpendicular to the airflow direction, so that the shielding gas airflow sequentially flowing through the at least two adjacent flow dividers 11 can be dispersed by the supporting frames 111 of the at least two adjacent flow dividers 11 for multiple times, so as to further ensure uniformity of the shielding gas airflow in the radial direction of the furnace body. In this case, the number of the support frames 111 of the at least two adjacent shunts 11 may be the same or different.
In some embodiments, as shown in fig. 9, the air dispersing ribs 1121 of the air dispersing rib groups 112 of at least two adjacent flow dividing members 11 are disposed in a staggered manner along the circumferential direction of the furnace body, for any adjacent two of the at least two adjacent flow dividing members 11, on a reference plane, an orthographic projection of the air dispersing rib 1121 of one air dispersing rib group 112 is disposed at an interval from an orthographic projection of the air dispersing rib 1121 of the other corresponding air dispersing rib group 112 in the radial direction of the furnace body, and the reference plane is perpendicular to the air flow direction, so that the shielding air flow sequentially flowing through the at least two adjacent flow dividing members 11 can be dispersed multiple times by the air dispersing ribs 1121 of the at least two adjacent flow dividing members 11, so as to further ensure uniformity of the shielding air flow in the circumferential direction of the furnace body. In this case, the number of the air-dispersing ribs 1121 of the corresponding air-dispersing rib groups 112 of the at least two adjacent flow splitters 11 may be the same or different.
In some embodiments, the supporting frames 111 of at least two adjacent flow dividers 11 are arranged in a staggered manner along the radial direction of the furnace body, and the air dispersing ribs 1121 of the air dispersing rib groups 112 of the at least two adjacent flow dividers 11 are arranged in a staggered manner along the circumferential direction of the furnace body, so that the shielding gas flow sequentially flowing through the at least two adjacent flow dividers 11 can be dispersed by the supporting frames 111 and the air dispersing ribs 1121 of the at least two adjacent flow dividers 11 for multiple times, so as to further ensure the uniformity of the shielding gas flow in the circumferential direction of the furnace body and in the radial direction of the furnace body.
In some embodiments, as shown in fig. 9, two adjacent support frames 111 and two adjacent air dispersing ribs 1121 together define a diversion hole 110, so that each diversion member 11 defines a plurality of diversion holes 110, respectively, and the diversion holes 110 may be formed as passages for shielding air to flow through the diversion members 11; along the flow direction of the gas flow, the distribution density of the branch holes 110 of at least two adjacent branch pieces 11 is increased, that is, in any adjacent two of the at least two adjacent branch pieces 11, the distribution density of the branch holes 110 of the branch piece 11 on the downstream side is greater than the distribution density of the branch piece 11 on the upstream side, so that the gas flow is gradually and uniformly dispersed by the branch pieces 11, and the uniformity of the gas finally flowing out from the gas flow splitting assembly 1 is effectively ensured.
The distribution density of the "distribution holes 110" can be understood as the number of the distribution holes 110 per unit area.
Optionally, the flow area of the branch holes 110 of at least two adjacent branch pieces 11 decreases in the airflow direction, so that the distribution density of the branch holes 110 of the at least two adjacent branch pieces 11 increases. For example, the distribution density of the distribution holes 110 can be increased by increasing the number of the supporting frames 111 and/or increasing the number of the air dispersing pieces.
In some embodiments, as shown in fig. 9, the plurality of flow dividing members 11 include a first flow dividing member 11a, a second flow dividing member 11b and a third flow dividing member 11c which are sequentially arranged in the airflow direction, the distribution density of the flow dividing holes 110 of the second flow dividing member 11b is greater than that of the flow dividing holes 110 of the first flow dividing member 11a, and the distance between the second flow dividing member 11b and the third flow dividing member 11c is greater than that between the second flow dividing member 11b and the first flow dividing member 11a, so that the uniformity of the airflow passing through the second flow dividing member 11b is better than that of the airflow passing through the first flow dividing member 11a to some extent, and thus, on the premise of ensuring the uniformity of the airflow, the distance between adjacent flow dividing members 11 is appropriately increased to appropriately reduce the number of flow dividing members 11, and simplify the structure of the gas flow dividing assembly 1.
Optionally, the distribution density of the distribution holes 110 of the second flow dividing member 11b is smaller than the distribution density of the distribution holes 110 of the third flow dividing member 11c, so as to ensure uniformity of the gas flow throughout the flow.
In some embodiments, as shown in fig. 1, the gas splitting assembly 1 further comprises a limit adjusting module 12, and the limit adjusting module 12 is used for adjusting the position of the at least one splitter 11 in the gas flow direction and/or for adjusting the position of the at least one splitter 11 in the circumferential direction of the furnace body.
For example, when the limiting adjustment module 12 is used to adjust the position of at least one shunt member 11 in the airflow direction, the limiting adjustment module 12 may include a screw nut mechanism, the screw nut mechanism includes a screw and an adjustment nut, the adjustment nut is fixedly disposed on the shunt member 11, the screw is adapted to be rotatably disposed on the furnace body, the screw rotates relative to the furnace body so that the adjustment nut drives the shunt member 11 to move along the length direction of the screw, thereby adjusting the position of the corresponding shunt member 11; of course, the structure of the limit adjusting module 12 is not limited thereto, for example, the limit adjusting module 12 includes a sliding block and a sliding groove, the sliding groove is disposed on the splitter 11, the sliding block is disposed on the inner peripheral wall of the furnace body, and the like.
It can be understood that, when the position of at least one of the flow dividing members 11 in the airflow direction is adjusted by the limit adjusting module 12, the distance between at least two adjacent flow dividing members 11 can be adjusted, so that the distance between two adjacent flow dividing members 11 matches the number of the supporting frames 111 of the flow dividing members 11, the number of the air dispersing ribs 1121, and the like. Of course, when the position limit adjusting module 12 is used to adjust the positions of all the flow dividing members 11 in the air flow direction at the same time, the positions of the air flow dividing assemblies 1 in the air flow direction can be adjusted so as to adapt to different crystal growing apparatuses 100.
Further, the spacing adjusting module 12 is used for adjusting the distance between any two adjacent flow dividing members 11, so that the position of each flow dividing member 11 in the airflow direction is flexibly arranged, and the adjustment of the length of the gas flow dividing assembly 1 in the airflow direction is conveniently realized, so as to adapt to the differentiated requirements of different crystal growing devices 100.
For example, when the limit adjusting module 12 is used for adjusting the position of the at least one shunt piece 11 in the circumferential direction of the furnace body, the limit adjusting module 12 is used for adjusting the installation angle of the at least one shunt piece 11 relative to the furnace body in the circumferential direction of the furnace body, that is, by providing the limit adjusting module 12, the at least one shunt piece 11 can be rotated by a certain angle relative to the furnace body.
It can be understood that the limiting adjusting module 12 is arranged to adjust the circumferential position of at least one splitter 11, so that the air diffusing ribs 1121 of at least two adjacent splitters 11 are arranged in a staggered manner in the circumferential direction of the furnace body, and the uniformity of the shielding gas flow in the circumferential direction of the furnace body is improved.
Further, the limit adjusting module 12 is used for adjusting the position of each flow divider 11 in the circumferential direction of the furnace body.
For example, when the limiting adjustment module 12 is used to adjust the position of the at least one shunt member 11 in the airflow direction and also adjust the position of the at least one shunt member 11 in the circumferential direction of the furnace body, taking the example that the limiting adjustment module 12 includes a screw-nut mechanism, where the screw-nut mechanism includes a plurality of screws and adjustment nuts, the adjustment nuts are fixedly disposed on the shunt member 11, the screws are multiple and are arranged at intervals in the circumferential direction of the furnace body, each screw is adapted to be rotatably disposed on the furnace body, and the adjustment nuts can be in threaded engagement with different screws.
Optionally, the limiting adjustment module 12 may include a plurality of sets of protrusion sets arranged at intervals along the axial direction of the furnace body, the plurality of sets of protrusion sets correspond to the plurality of flow dividing members 11 one by one, and each set of protrusion set is respectively matched with one flow dividing member 11; each group of protrusion sets comprises a plurality of supporting protrusions 121 arranged at intervals along the circumferential direction of the furnace body, the supporting protrusions 121 are suitable for being arranged on the inner wall surface of the furnace body, for example, the supporting protrusions 121 are suitable for being arranged on the wall surface of the auxiliary chamber 2b of the furnace body, a plurality of grooves arranged at intervals along the circumferential direction of the furnace body are arranged on the bottom wall of the flow dividing piece 11, each supporting protrusion 121 is matched with any one of at least two grooves to support the flow dividing piece 11, and therefore the limiting adjusting module 12 not only realizes the supporting and fixing of the flow dividing piece 11, but also enables the flow dividing piece 11 to rotate around the central axis of the furnace body in a certain angle range relative to the furnace body so as to adjust the position of the flow dividing piece 11 in the circumferential direction of the furnace body.
Wherein, the supporting protrusion 121 and the corresponding groove can be in limit fit along the circumferential direction of the furnace body and the axial direction of the furnace body, so as to ensure that the shunt 11 is reliably installed.
The following description will take the example that the protrusion set includes four supporting protrusions 121 and the bottom wall of the flow divider 11 is provided with four grooves, and those skilled in the art can easily understand other arrangements of the protrusion set after reading the following technical solutions; four supporting protrusions 121 are respectively the first supporting protrusion, the second supporting protrusion, the third supporting protrusion and the fourth supporting protrusion which are arranged in sequence along the circumferential direction of the furnace body, four grooves are respectively the first groove, the second groove, the third groove and the fourth groove which are arranged in sequence along the circumferential direction of the furnace body, and then the setting of the protruding group can include the following multiple conditions:
1. the first supporting protrusion can be matched with any one of the first groove and the second groove, the second supporting protrusion can be matched with any one of the second groove and the third groove, the third supporting protrusion can be matched with any one of the third groove and the fourth groove, the fourth supporting protrusion can be matched with any one of the fourth groove and the first groove, at the moment, two installation angles are formed in the circumferential direction of the furnace body corresponding to the flow dividing piece 11, and the flow dividing piece 11 can be switched between the two installation angles to adjust the position of the flow dividing piece 11 in the circumferential direction of the furnace body;
2. the first supporting protrusion can be matched with any one of the first groove, the second groove and the third groove, the second supporting protrusion can be matched with any one of the second groove, the third groove and the fourth groove, the third supporting protrusion can be matched with any one of the third groove, the fourth groove and the fourth groove, the fourth supporting protrusion can be matched with any one of the fourth groove, the first groove and the second groove, at the moment, the corresponding shunt member 11 has three installation angles in the circumferential direction of the furnace body, and the shunt member 11 can be switched among the three installation angles to adjust the position of the shunt member 11 in the circumferential direction of the furnace body;
3. the first supporting protrusion can be matched with any one of the four grooves, the second supporting protrusion can be matched with any one of the four grooves, the third supporting protrusion can be matched with any one of the four grooves, the fourth supporting protrusion can be matched with any one of the four grooves, at this time, the corresponding shunt part 11 has four installation angles in the circumferential direction of the furnace body, and the shunt part 11 can be switched among the four installation angles to adjust the position of the shunt part 11 in the circumferential direction of the furnace body.
Of course, the present application is not so limited; in other embodiments of the present application, the gas flow distribution assembly 1 may not be provided with the limiting adjustment module 12, and at this time, the flow distribution member 11 may be fixedly disposed on an inner wall surface of the furnace body, or a plurality of flow distribution members 11 are fixedly connected, for example, connected by a threaded fastener, one of the flow distribution members 11 is fixedly connected with the furnace body, and the like.
In addition, in another example of the present invention, as shown in fig. 8, the limit adjusting module 12 includes a support limit portion, the support limit portion is disposed on an inner wall surface of the furnace body, a sliding groove 113 is disposed on a side wall of the flow dividing member 11, the sliding groove 113 extends along a circumferential direction of the flow dividing member 11, the support limit portion is embedded in the sliding groove 113, and the flow dividing member 11 is adapted to rotate relative to the furnace body. It can be understood that, support spacing portion and spout 113 and in the upper limit cooperation of the axial of furnace body, and support spacing portion and spout 113 and slide the cooperation in the circumference of furnace body, support spacing portion and have support and spacing effect to reposition of redundant personnel piece 11, through rotating reposition of redundant personnel piece 11, support spacing portion and can move in spout 113, and utilize the cooperation that supports spacing portion and spout 113 can restrict the rotation range of reposition of redundant personnel piece 11, turned angle promptly, thereby realize the regulation of reposition of redundant personnel piece 11 in the ascending position in the circumference of furnace body.
It is understood that the sliding groove 113 may extend in an arc shape or a closed ring shape along the circumferential direction of the supporting frame 111; similarly, the supporting and limiting part can extend to be an arc shape or a closed ring shape along the circumferential direction of the furnace body. For example, the sliding groove 113 is a closed ring shape, and the support limiting part is an arc shape; or, the sliding chute 113 and the supporting and limiting part are both arc-shaped, and at this time, the sliding chute 113 and the supporting and limiting part are respectively provided with a plurality of parts, and each supporting and limiting part is matched with one sliding chute 113; alternatively, the sliding groove 113 and the support limiting portion are respectively in a closed ring shape.
Optionally, the number of the flow dividing members 11 is three or more, so that the length of the flow dividing member 11 in the airflow direction can be properly reduced on the premise of ensuring the flow dividing effect of the airflow flow dividing assembly, thereby reducing the weight of a single flow dividing member 11, and facilitating the movement, transportation, installation and the like of the single flow dividing member 11.
Optionally, the number of the air dispersing ribs 1121 of each air dispersing rib group 112 is four or more, so as to ensure the ability of the splitter 11 to disperse the airflow in the circumferential direction of the furnace body, and ensure the uniformity and stability of the airflow of the shielding gas.
Optionally, the thickness t1 of the supporting frame 111 satisfies 0.5mm ≦ t1 ≦ 5mm, for example, t1 is 0.5mm, or 1mm, or 1.6mm, or 2mm, or 2.3mm, or 3.7mm, or 4.6mm, or 5mm, etc., and the thickness t2 of the air-dispersing rib 1121 satisfies 0.5mm ≦ t2 ≦ 5mm, for example, t2 is 0.5mm, or 0.8mm, or 1.5mm, or 2mm, or 2.3mm, or 3mm, or 4.6mm, or 5mm, etc.
Here, the thickness t1 of the support frame 111 may be understood as a thickness of the support frame 111 in a radial direction thereof, and the thickness t2 of the wind scattering ribs 1121 may be understood as a thickness of the wind scattering ribs 1121 in a circumferential direction of the support frame 111.
Optionally, the thickness t1 of the support frame 111 is equal to the thickness t2 of the air-dispersing ribs 1121, and at this time, if the material of the support frame 111 is the same as the material of the air-dispersing ribs 1121, the material for manufacturing the support frame 111 may be used to manufacture the air-dispersing ribs 1121, so as to simplify the material selection of the flow divider 11 and improve the processing efficiency of the flow divider 11.
Optionally, the flow splitter 11 is made of stainless steel, such as 304L stainless steel, which facilitates the flow splitter 11 to have good overall performance, and ensures that the gas flow splitter assembly 1 is reliable in use.
A crystal growth apparatus 100 according to an embodiment of the second aspect of the present invention is described below.
The crystal growth apparatus 100 according to the second aspect of the present invention includes a furnace body defining a furnace chamber therein, the furnace chamber including a main chamber and a sub-chamber 2b, the sub-chamber 2b being provided on an upper side of the main chamber, a crucible being provided in the main chamber and containing a raw material, and a gas flow distribution assembly 1 provided in the sub-chamber 2 b. Wherein the gas manifold assembly 1 is a gas manifold assembly 1 according to an embodiment of the above first aspect of the invention.
According to the crystal growth device 100 provided by the embodiment of the invention, by adopting the gas distribution assembly 1, the gas distribution assembly 1 comprises the plurality of distribution members 11, the distribution members 11 comprise the plurality of support frames 111 and the plurality of air dispersing rib groups 112, so that the gas distribution assembly 1 can conveniently disperse the protective gas flowing into the furnace body, the gas flow of the protective gas flowing into the furnace body is more uniform and stable, the temperature gradient at the solid-liquid interface for crystal growth is more stable, the shape of the solid-liquid interface is more stable, and meanwhile, impurities such as silicon oxide and the like can be smoothly taken away by the protective gas, so that the impurities can be fully removed, and the growth quality of the crystal can be improved.
For example, in the example of fig. 1, the shielding gas inlet 2a is arranged at the upper part of the sub-chamber 2b, the plurality of flow dividing members 11 are arranged below the shielding gas inlet 2a, and the plurality of flow dividing members 11 are sequentially arranged at intervals from top to bottom along the axial direction of the sub-chamber 2b, the plurality of flow dividing members 11 can be coaxially arranged, wherein the up-down interval h1 between the uppermost flow dividing member 11 and the shielding gas inlet 2a satisfies that h1 is less than or equal to half of the inner diameter of the sub-chamber 2b, so that the shielding gas flowing into the sub-chamber 2b through the shielding gas inlet 2a is rapidly filled in the space above the gas flow dividing assembly 1, thereby facilitating the effect of improving the flow uniformity of the shielding gas; the gas distribution assembly 1 is arranged at the top in the auxiliary chamber 2b, the axial length of the gas distribution assembly 1 is L, the axial length of the auxiliary chamber 2b is L, and L is less than or equal to L/3, so that the gas distribution assembly 1 is prevented from influencing the crystal pulling process of the crystal growing device 100.
It can be understood that the outer peripheral wall of the flow dividing member 11 and the inner wall of the auxiliary chamber 2b can be in abutting fit, so that the flow dividing member 11 is convenient to mount stably, and the flow dividing member 11 is prevented from shaking greatly; of course, the outer peripheral wall of the flow dividing member 11 may also be provided spaced apart from the inner peripheral wall of the sub-chamber 1 b.
In some embodiments, a wall surface of the sub-chamber 2b is formed with a mounting opening, and the flow dividing member 11 is provided to the sub-chamber 2b through the mounting opening, so as to facilitate quick assembly and disassembly of the flow dividing member 11.
Wherein, be equipped with the switch door on the furnace body, the switch door rotationally locates the installing port and is in the department open, or seal the installing port, and 11 detachably of reposition of redundant personnel establish in one side of switch door towards the installing port, then the installing port is opened to the switch door, and reposition of redundant personnel 11 can be installed in auxiliary room 2b through the installing port, and the installing port is closed to the switch door to guarantee the seal of furnace body inner space, the switch door can cooperate with reposition of redundant personnel 11 simultaneously this moment. It will be appreciated that by removably mounting the diverter 11 to the opening and closing door, maintenance of the diverter 11 can be facilitated by opening the opening and closing door. Specifically, the inner wall surface of the switch door is provided with an installation structure for installing the shunt member 11, so that the shunt member 11 is limited and fixed. Wherein, mounting structure can select for the supporting seat, the bayonet socket cooperation on supporting seat and the reposition of redundant personnel piece 11 is in order to be used for supporting reposition of redundant personnel piece 11, the supporting seat can also be with the bayonet socket along the spacing cooperation of circumference of furnace body.
For example, when the supporting seat is a plurality of, a plurality of supporting seats can be followed the circumference interval setting of furnace body, and the structure of two at least supporting seats is different to in order to realize reposition of redundant personnel 11 prevent slow-witted installation.
Or, reposition of redundant personnel 11 can locate auxiliary chamber 2b through the installing port pull, is equipped with the backplate that is used for sealing the installing port on reposition of redundant personnel 11's the lateral wall, then reposition of redundant personnel 11 installs in auxiliary chamber 2b back through the installing port, and the backplate in the outside directly seals the installing port so that guarantee the seal of furnace body inner space, can need not to set up the switch door this moment, is favorable to simplifying crystal growth device's structure, simplifies the dismouting process of reposition of redundant personnel 11. It can be understood that the inner wall surface of the back plate is provided with a mounting structure for mounting the splitter 11, so as to realize the limiting and fixing of the splitter 11.
Wherein, in the circumference of furnace body, the central angle that the installing port corresponds can be for about 180, is convenient for guarantee that reposition of redundant personnel piece 11 cooperates in auxiliary chamber 2b fast, can avoid leading to weakening too big to the furnace body because of setting up the installing port simultaneously.
In some embodiments, as shown in FIG. 1, the inner diameter of the sub-chamber 2b is D, the length of the splitter 11 in the airflow direction is h, 0.1D ≦ h ≦ 0.5D, for example, h may be 0.1D, or 0.25D, or 0.4D, or 0.43D, or 0.5D, etc., so as to ensure uniformity of the shielding gas airflow in the whole sub-chamber 2b and smooth airflow.
In some embodiments, as shown in fig. 1, the inner diameter of the sub-chamber 2b is D, the interval between two adjacent flow dividing members 11 is D, D is less than or equal to D, for example, D may be 0.1D, 0.35D, 0.5D, or 0.7D, etc., which may avoid too small an interval between two adjacent flow dividing members 11, resulting in a large number of flow dividing members 11, a complicated structure of the airflow dividing assembly, or too large an interval between two adjacent flow dividing members 11, resulting in a poor uniformity of the airflow.
Optionally, D is 450mm, h is 50mm, and D is 50 mm.
It should be noted that, in the description of the present application, the inner diameter D of the sub-chamber 2b may be understood as an equivalent diameter corresponding to the inner peripheral wall of the sub-chamber 2 b; the cross-sectional shape of the inner peripheral wall of the sub-chamber 2b may be adapted to the shape of the outermost support frame 111 of the flow divider 11, for example, the cross-sectional shape of the inner peripheral wall of the sub-chamber 2b is circular, the shape of the outermost support frame 111 of the flow divider 11 is circular, and the shape of the remaining support frames 111 of the flow divider 11 may be circular, polygonal ring, or the like.
Alternatively, the crystal growth apparatus 100 uses the czochralski method (i.e., CZ crystal growth), and the shielding gas may be an inert gas, such as argon, nitrogen, or the like, or a mixed gas of argon and nitrogen. The air input of the protective gas is 50 SLM/min-150 SLM/min, and the pressure in the furnace body is 10 torr-60 torr. Wherein, the SLM/min is the flow rate under the standard state, and the flow rate unit is L/min.
Other configurations and operations of crystal growing apparatus 100 according to embodiments of the present invention are known to those of ordinary skill in the art and will not be described in detail herein.
In the description of the present invention, it is to be understood that the terms "central," "longitudinal," "lateral," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," "counterclockwise," "axial," "radial," "circumferential," and the like are used in the orientations and positional relationships indicated in the drawings for convenience in describing the invention and to simplify the description, and are not intended to indicate or imply that the referenced device or element must have a particular orientation, be constructed and operated in a particular orientation, and are not to be considered limiting of the invention. Furthermore, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of the present invention, "a plurality" means two or more unless otherwise specified.
In the description of the present invention, it should be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, e.g., as meaning either a fixed connection, a removable connection, or an integral connection; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meanings of the above terms in the present invention can be understood in specific cases to those skilled in the art.
In the description herein, references to the description of the term "one embodiment," "some embodiments," "an illustrative embodiment," "an example," "a specific example," or "some examples" or the like mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the invention. In this specification, the schematic representations of the terms used above do not necessarily refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.
While embodiments of the invention have been shown and described, it will be understood by those of ordinary skill in the art that: various changes, modifications, substitutions and alterations can be made to the embodiments without departing from the principles and spirit of the invention, the scope of which is defined by the claims and their equivalents.

Claims (11)

1. A gas flow distribution assembly (1), wherein the gas flow distribution assembly (1) is used for a crystal growth apparatus (100), the crystal growth apparatus (100) further comprises a furnace body, the furnace body is formed with a shielding gas inlet (2a), the gas flow distribution assembly (1) is adapted to be disposed in the furnace body and located at a downstream side of the shielding gas inlet (2a), the gas flow distribution assembly (1) comprises:
a plurality of reposition of redundant personnel pieces (11), it is a plurality of reposition of redundant personnel piece (11) are arranged along airflow direction interval, every reposition of redundant personnel piece (11) are including a plurality of carriage (111) and a plurality of wind muscle group (112) that looses, carriage (111) are the annular, and are a plurality of carriage (111) are followed the setting is established to radial cover in proper order of furnace body, every group scattered wind muscle group (112) are including a plurality of edges scattered wind muscle (1121) that the circumference interval of furnace body set up, adjacent two through a set of between carriage (111) scattered wind muscle group (112) link to each other, every the both ends of scattered wind muscle (1121) are respectively with corresponding two carriage (111) link to each other.
2. The gas flow splitting assembly (1) of claim 1,
the number of the air dispersing ribs (1121) of at least two groups of adjacent air dispersing rib groups (112) is the same, and the air dispersing ribs (1121) of the at least two groups of adjacent air dispersing rib groups (112) are correspondingly connected one by one; and/or the presence of a gas in the gas,
the air dispersing ribs (1121) of at least two adjacent air dispersing rib groups (112) are arranged along the circumferential direction of the furnace body in a staggered mode.
3. The gas flow splitting assembly (1) of claim 1,
the supporting frames (111) of at least two adjacent flow dividing pieces (11) are arranged along the radial direction of the furnace body in a staggered manner; and/or the presence of a gas in the gas,
the air dispersing ribs (1121) of the air dispersing rib groups (112) of at least two adjacent flow dividing pieces (11) are arranged along the circumferential direction of the furnace body in a staggered mode.
4. The gas distribution assembly (1) according to claim 1, wherein two adjacent support frames (111) and two adjacent wind scattering ribs (1121) jointly define distribution holes (110), and the distribution density of the distribution holes (110) of at least two adjacent distribution members (11) is increased along the flow direction of the gas flow.
5. The gas flow splitter assembly (1) according to claim 4, wherein the plurality of flow splitters (11) comprises a first flow splitter (11a), a second flow splitter (11b) and a third flow splitter (11c) arranged in the flow direction of the gas flow in this order, the distribution density of the flow splitting holes (110) of the second flow splitter (11b) is greater than the distribution density of the flow splitting holes (110) of the first flow splitter (11a), and the spacing between the second flow splitter (11b) and the third flow splitter (11c) is greater than the spacing between the second flow splitter (11b) and the first flow splitter (11 a).
6. The gas splitting assembly (1) according to any of claims 1-5, further comprising:
a limit adjusting module (12), wherein the limit adjusting module (12) is used for adjusting the position of at least one flow divider (11) in the airflow direction; and/or for adjusting the position of at least one splitter (11) in the circumferential direction of the furnace body.
7. The gas distribution assembly (1) according to claim 6, wherein the limiting adjustment module (12) comprises a plurality of sets of protrusions arranged at intervals along the axial direction of the furnace body, the plurality of sets of protrusions correspond to the plurality of distribution members (11) one by one, each set of protrusions comprises a plurality of supporting protrusions (121) arranged at intervals along the circumferential direction of the furnace body, the supporting protrusions (121) are suitable for being arranged on the inner wall surface of the furnace body, a plurality of grooves arranged at intervals along the circumferential direction of the furnace body are arranged on the bottom wall of each distribution member (11), and each supporting protrusion (121) is matched with any one of at least two grooves to support the distribution member (11).
8. The gas distribution assembly (1) according to claim 6, wherein the limiting adjustment module comprises a supporting limiting portion, the supporting limiting portion is disposed on an inner wall surface of the furnace body, a sliding groove (113) is disposed on a side wall of the distribution member (11), the sliding groove (113) extends along a circumferential direction of the distribution member (11), the supporting limiting portion is embedded in the sliding groove (113), and the distribution member (11) is adapted to rotate relative to the furnace body.
9. A crystal growth apparatus (100), comprising:
the oven comprises an oven body, wherein an oven cavity is defined in the oven body, the oven cavity comprises a main chamber and an auxiliary chamber (2b), and the auxiliary chamber (2b) is arranged on the upper side of the main chamber;
the crucible is arranged in the main chamber;
gas flow distribution assembly (1), the gas flow distribution assembly (1) being a gas flow distribution assembly (1) according to any of claims 1-8 and being provided within the secondary chamber (2 b).
10. The crystal growth apparatus (100) according to claim 9, wherein a mounting opening is formed on a wall surface of the sub-chamber (2b),
reposition of redundant personnel piece (11) are passed through but locate with the installing port pull auxiliary chamber (2b), be equipped with on the lateral wall of reposition of redundant personnel piece (11) and be used for sealing the backplate of installing port, perhaps, be equipped with the switch door on the furnace body, the switch door is rotationally located installing port is in department to open, or seal the installing port, reposition of redundant personnel piece (11) detachably establishes the orientation of switch door one side of installing port.
11. The crystal growth apparatus (100) according to claim 9, wherein the inner diameter of the sub-chamber (2b) is D, the length of the flow dividing member (11) in the flow direction of the gas flow is h, the distance between two adjacent flow dividing members (11) is D, 0.1D ≦ h ≦ 0.5D, and D ≦ D.
CN202111547069.2A 2021-12-16 2021-12-16 Gas diversion assembly and crystal growth apparatus having the same Active CN114411249B (en)

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