CN114250438B - Mask plate and circular opening deviation measuring method thereof - Google Patents
Mask plate and circular opening deviation measuring method thereof Download PDFInfo
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- CN114250438B CN114250438B CN202210095374.0A CN202210095374A CN114250438B CN 114250438 B CN114250438 B CN 114250438B CN 202210095374 A CN202210095374 A CN 202210095374A CN 114250438 B CN114250438 B CN 114250438B
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Length Measuring Devices By Optical Means (AREA)
Abstract
The invention discloses a mask plate and a circular opening deviation measuring method thereof, comprising a mask plate body, wherein a plurality of mask plate coating openings are formed in the mask plate body, a plurality of auxiliary marks are arranged beside the mask plate coating openings, and the distance between the auxiliary marks and the corresponding mask plate coating opening boundary is less than half of the side length of the short side of a visible area of a CCD lens. The method adopts sectional measurement, generates an arc by using a designed radius value, calculates the coincidence degree with a target boundary, and judges the deformation degree of the opening; and calculating the discrete value of the fitting circle center of each boundary, judging the offset degree between the boundaries, finally fitting a minimum circle which contains the fitting circle center of each boundary, and subtracting the design value from the opening center point by taking the minimum circle center as the opening center point to calculate the opening TP value. The invention realizes the measurement and judgment of the deviation and deformation of the circular opening of the mask plate, and avoids the deviation of the coating position or shape of the OLED device caused by the bad mask plate, thereby reducing the yield of the device.
Description
Technical Field
The invention belongs to the technical field of OLED display manufacturing, and particularly relates to a mask plate and a circular opening deviation measuring method thereof.
Background
At present, an Organic Light-Emitting diode (OLED) product is a development direction of next-generation display technology, and various application scenarios including wearable products such as mobile phones, flat panels, watches, etc. have been developed. The OLED device is composed of a plurality of layers of organic thin films and metal thin films and is produced by adopting an evaporation process, a mask plate is needed to form a thin film in a specific area during evaporation, and the size of a pixel opening of the mask plate is basically consistent with the size of a product. Generally, before the mask plate is used, the TP value (total pitch) of the target opening is measured, and the TP value characterizes the deviation between the design of the opening and the actual position, if TP is large, the deviation of the coating film easily occurs, so that the position deviation of the vapor deposition film, the color mixing, or the poor sealing caused by the vapor deposition of the material to the packaging boundary are caused. At present, a CCD lens photographing imaging mode is generally used for high-precision measurement, but if the circular opening area is larger than the FOV range of the lens, direct measurement of TP is difficult to realize, so that quality control of the mask plate is difficult. Therefore, we propose a mask plate and a method for measuring the deviation of the circular opening thereof to solve the above-mentioned problems in the background art.
Disclosure of Invention
The invention aims to provide a mask plate and a circular opening deviation measuring method thereof, so as to solve the problems in the background art.
In order to achieve the above purpose, the present invention provides the following technical solutions: the utility model provides a mask, includes the mask body, a plurality of mask coating film trompil has been seted up on the mask body, mask coating film trompil is other to set up a plurality of auxiliary mark, auxiliary mark is less than CCD camera lens visual area minor face side length half apart from the mask coating film trompil boundary's that corresponds distance. Namely, the complete auxiliary mark and the vapor deposition opening boundary area are required to be in the range of the FOV of the lens.
The auxiliary marks are round, rectangular, cross or triangular in shape.
A method for measuring the offset of a circular opening of a mask plate specifically comprises the following steps:
s1, grabbing mask alignment mark by a CCD lens according to preset coordinates, establishing a mask global coordinate system, and taking the mask coordinate system as a reference for CCD lens movement;
s2, moving the CCD lens to a target opening boundary to shoot a picture, and performing first judgment: if the picture contains a complete auxiliary mark, the selection of the boundary arc of the opening target of the coating to be detected is qualified;
s3, generating a gray-scale image of the picture, judging the side containing the auxiliary mark as a non-perforated area, fitting a theoretical circular arc by adopting a perforated design radius, calculating the maximum coincidence degree of the circular arc and the image boundary, and judging for the second time: if the overlap ratio reaches a first preset value, calculating the circle center position of the circular arc; if the overlap ratio is smaller than a first preset value, the deformation of the open hole is larger, and the open hole is judged to be unqualified;
s4, the CCD lens is moved to the boundaries of other holes to be detected to judge the coincidence degree, and if the coincidence degree is larger than a first preset value, circle centers of all boundary curves are fitted;
s5, calculating discrete values of circle centers of the boundary arcs of each section, and judging for the third time: if the discrete value is larger than the second preset value, indicating that larger relative position deviation exists between local boundaries of the coating holes; if the discrete value is smaller than the preset value, fitting a minimum circle which comprises all circle centers, and taking the circle center of the minimum circle as the center point of the coating opening;
s6, generating a global system coordinate of the center point, comparing the global system coordinate with the design value to calculate a position deviation value, namely TP, and performing fourth judgment: if TP is smaller than a third preset value, the position of the opening is proved to be in accordance with the requirement; if TP is larger than a third preset value, the position deviation of the opening is larger, and the opening is judged to be unqualified;
s7, sequentially completing measurement of other film forming openings.
Compared with the prior art, the invention has the beneficial effects that: the mask plate and the circular opening deviation measuring method thereof provided by the invention realize the measurement of measuring the large circular opening position deviation by using the existing measuring instrument and the judgment of the opening deformation degree, avoid the problems of color mixing, poor packaging and the like caused by poor film coating of the mask plate, and improve the product yield.
Drawings
FIG. 1 is a flow chart of a method for measuring circular opening offset of a mask plate according to the present invention;
FIG. 2 is a schematic diagram of mask alignment marks and coordinate system establishment according to the present invention;
FIG. 3 is a schematic diagram of a CCD lens capture assist mark according to the present invention;
FIG. 4 is a schematic diagram of a target arc to be measured according to the present invention;
FIG. 5 is a gray scale image of the present invention;
FIG. 6 is a schematic view of the center of a circle of a fitted arc of the present invention;
FIG. 7 is a schematic view of circle centers of the circular arcs of each section fitted by the invention;
fig. 8 is a schematic view of the smallest circle center of the present invention.
Detailed Description
The following description of the embodiments of the present invention will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present invention, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
The invention provides a mask plate as shown in fig. 2-8, which comprises a mask plate body, wherein a plurality of mask plate coating openings are formed in the mask plate body, a plurality of auxiliary marks are arranged beside the mask plate coating openings, and the distance between the auxiliary marks and the corresponding mask plate coating opening boundaries is less than half of the side length of the short side of a visible area of a CCD lens. Namely, the complete auxiliary mark and the vapor deposition opening boundary area are required to be in the range of the FOV of the lens. The shape of the auxiliary mark is preferably circular (including but not limited to regular shapes such as rectangular, cross or triangle); the number of target test boundaries is at least 3.
Referring to fig. 1, a method for measuring offset of a circular opening of a mask plate specifically includes the following steps:
s1, grabbing mask alignment mark by a CCD lens according to preset coordinates, establishing a mask global coordinate system, and taking the mask coordinate system as a reference for CCD lens movement;
s2, moving the CCD lens to a target opening boundary to shoot a picture, and performing first judgment: if the picture contains a complete auxiliary mark, the selection of the boundary arc of the opening target of the coating to be detected is qualified;
s3, generating a gray-scale image of the picture, judging the side containing the auxiliary mark as a non-perforated area, fitting a theoretical circular arc by adopting a perforated design radius, calculating the maximum coincidence degree of the circular arc and the image boundary, and judging for the second time: if the overlap ratio reaches a first preset value, calculating the circle center position of the circular arc; if the overlap ratio is smaller than a first preset value, the deformation of the open hole is larger, and the open hole is judged to be unqualified;
s4, the CCD lens is moved to the boundaries of other holes to be detected to judge the coincidence degree, and if the coincidence degree is larger than a first preset value, circle centers of all boundary curves are fitted;
s5, calculating discrete values of circle centers of the boundary arcs of each section, and judging for the third time: if the discrete value is larger than the second preset value, indicating that larger relative position deviation exists between local boundaries of the coating holes; if the discrete value is smaller than the preset value, fitting a minimum circle which comprises all circle centers, and taking the circle center of the minimum circle as the center point of the coating opening;
s6, generating a global system coordinate of the center point, comparing the global system coordinate with the design value to calculate a position deviation value, namely TP, and performing fourth judgment: if TP is smaller than a third preset value, the position of the opening is proved to be in accordance with the requirement; if TP is larger than a third preset value, the position deviation of the opening is larger, and the opening is judged to be unqualified;
s7, sequentially completing measurement of other film forming openings.
According to the invention, a plurality of auxiliary marks (marks) are arranged beside a film coating opening of a mask plate, so that a lens can refer to a grabbing target measurement boundary and an opening gray scale image is generated, and the opening and non-opening areas can be conveniently judged; adopting sectional measurement, generating an arc by using a designed radius value, calculating the coincidence degree with a target boundary, and judging the deformation degree of the opening; and calculating the discrete value of the fitting circle center of each boundary, judging the offset degree between the boundaries, finally fitting a minimum circle which contains the fitting circle center of each boundary, and subtracting the design value from the opening center point by taking the minimum circle center as the opening center point to calculate the opening TP value.
In summary, compared with the prior art, the invention realizes the measurement of the deviation of the large circular open pore position by using the existing measuring instrument and the judgment of the open pore deformation degree, avoids the problems of color mixing, poor packaging and the like caused by poor film coating of the mask plate, and improves the product yield.
Finally, it should be noted that: the foregoing description is only illustrative of the preferred embodiments of the present invention, and although the present invention has been described in detail with reference to the foregoing embodiments, it will be apparent to those skilled in the art that modifications may be made to the embodiments described, or equivalents may be substituted for elements thereof, and any modifications, equivalents, improvements or changes may be made without departing from the spirit and principles of the present invention.
Claims (1)
1. A method for measuring the deviation of a circular opening of a mask plate is characterized by comprising the following steps: the method specifically comprises the following steps:
s1, grabbing mask alignment mark by a CCD lens according to preset coordinates, establishing a mask global coordinate system, and taking the mask coordinate system as a reference for CCD lens movement;
the mask plate comprises a mask plate body, a plurality of mask plate coating openings are formed in the mask plate body, a plurality of auxiliary marks are arranged beside the mask plate coating openings, and the distance between the auxiliary marks and the corresponding mask plate coating opening boundaries is smaller than half of the length of the short side of the CCD lens visible region;
s2, moving the CCD lens to a target opening boundary to shoot a picture, and performing first judgment: if the picture contains a complete auxiliary mark, the selection of the boundary arc of the opening target of the coating to be detected is qualified;
s3, generating a gray-scale image of the picture, judging the side containing the auxiliary mark as a non-perforated area, fitting a theoretical circular arc by adopting a perforated design radius, calculating the maximum coincidence degree of the circular arc and the image boundary, and judging for the second time: if the overlap ratio reaches a first preset value, calculating the circle center position of the circular arc; if the overlap ratio is smaller than a first preset value, the deformation of the open hole is larger, and the open hole is judged to be unqualified;
s4, the CCD lens is moved to the boundaries of other holes to be detected to judge the coincidence degree, and if the coincidence degree is larger than a first preset value, circle centers of all boundary curves are fitted;
s5, calculating discrete values of circle centers of the boundary arcs of each section, and judging for the third time: if the discrete value is larger than the second preset value, indicating that larger relative position deviation exists between local boundaries of the coating holes; if the discrete value is smaller than the preset value, fitting a minimum circle which comprises all circle centers, and taking the circle center of the minimum circle as the center point of the coating opening;
s6, generating a global system coordinate of the center point, comparing the global system coordinate with the design value to calculate a position deviation value, namely TP, and performing fourth judgment: if TP is smaller than a third preset value, the position of the opening is proved to be in accordance with the requirement; if TP is larger than a third preset value, the position deviation of the opening is larger, and the opening is judged to be unqualified;
s7, sequentially completing measurement of other film forming openings.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210095374.0A CN114250438B (en) | 2022-01-26 | 2022-01-26 | Mask plate and circular opening deviation measuring method thereof |
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| CN202210095374.0A CN114250438B (en) | 2022-01-26 | 2022-01-26 | Mask plate and circular opening deviation measuring method thereof |
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| CN114250438A CN114250438A (en) | 2022-03-29 |
| CN114250438B true CN114250438B (en) | 2023-07-14 |
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Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN114908316B (en) * | 2022-04-28 | 2023-07-21 | 昆山丘钛微电子科技股份有限公司 | Lens, camera module, lens coating method and mask plate |
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| CN114250438A (en) | 2022-03-29 |
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