CN114249331A - Hollow silicon oxide nanosphere and preparation method thereof - Google Patents
Hollow silicon oxide nanosphere and preparation method thereof Download PDFInfo
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- CN114249331A CN114249331A CN202111385005.7A CN202111385005A CN114249331A CN 114249331 A CN114249331 A CN 114249331A CN 202111385005 A CN202111385005 A CN 202111385005A CN 114249331 A CN114249331 A CN 114249331A
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 81
- 239000002077 nanosphere Substances 0.000 title claims abstract description 50
- 238000002360 preparation method Methods 0.000 title claims abstract description 36
- 229910052814 silicon oxide Inorganic materials 0.000 title claims abstract description 32
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 claims abstract description 40
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 claims abstract description 39
- 238000000034 method Methods 0.000 claims abstract description 21
- 238000003756 stirring Methods 0.000 claims abstract description 21
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 claims abstract description 20
- 235000011114 ammonium hydroxide Nutrition 0.000 claims abstract description 20
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 claims abstract description 19
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 19
- 238000001354 calcination Methods 0.000 claims abstract description 13
- 239000003093 cationic surfactant Substances 0.000 claims abstract description 11
- 238000006243 chemical reaction Methods 0.000 claims abstract description 9
- 239000007795 chemical reaction product Substances 0.000 claims abstract description 9
- 238000001035 drying Methods 0.000 claims abstract description 9
- 239000012046 mixed solvent Substances 0.000 claims abstract description 9
- 238000005406 washing Methods 0.000 claims abstract description 9
- 239000002245 particle Substances 0.000 claims abstract description 8
- 150000002191 fatty alcohols Chemical class 0.000 claims abstract description 7
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 24
- 239000000377 silicon dioxide Substances 0.000 claims description 22
- LZZYPRNAOMGNLH-UHFFFAOYSA-M Cetrimonium bromide Chemical compound [Br-].CCCCCCCCCCCCCCCC[N+](C)(C)C LZZYPRNAOMGNLH-UHFFFAOYSA-M 0.000 claims description 13
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 12
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 claims description 7
- DNIAPMSPPWPWGF-GSVOUGTGSA-N (R)-(-)-Propylene glycol Chemical compound C[C@@H](O)CO DNIAPMSPPWPWGF-GSVOUGTGSA-N 0.000 claims description 2
- CXRFDZFCGOPDTD-UHFFFAOYSA-M Cetrimide Chemical compound [Br-].CCCCCCCCCCCCCC[N+](C)(C)C CXRFDZFCGOPDTD-UHFFFAOYSA-M 0.000 claims description 2
- WOWHHFRSBJGXCM-UHFFFAOYSA-M cetyltrimethylammonium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCC[N+](C)(C)C WOWHHFRSBJGXCM-UHFFFAOYSA-M 0.000 claims description 2
- CDIPRYKTRRRSEM-UHFFFAOYSA-M docosyl(trimethyl)azanium;bromide Chemical compound [Br-].CCCCCCCCCCCCCCCCCCCCCC[N+](C)(C)C CDIPRYKTRRRSEM-UHFFFAOYSA-M 0.000 claims description 2
- XJWSAJYUBXQQDR-UHFFFAOYSA-M dodecyltrimethylammonium bromide Chemical compound [Br-].CCCCCCCCCCCC[N+](C)(C)C XJWSAJYUBXQQDR-UHFFFAOYSA-M 0.000 claims description 2
- 239000011259 mixed solution Substances 0.000 claims description 2
- SZEMGTQCPRNXEG-UHFFFAOYSA-M trimethyl(octadecyl)azanium;bromide Chemical compound [Br-].CCCCCCCCCCCCCCCCCC[N+](C)(C)C SZEMGTQCPRNXEG-UHFFFAOYSA-M 0.000 claims description 2
- 239000011807 nanoball Substances 0.000 claims 1
- 238000009776 industrial production Methods 0.000 abstract description 3
- 239000002994 raw material Substances 0.000 abstract description 3
- 239000002253 acid Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- 230000006978 adaptation Effects 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 238000006555 catalytic reaction Methods 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- 229920001568 phenolic resin Polymers 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002808 molecular sieve Substances 0.000 description 1
- 239000002086 nanomaterial Substances 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/30—Particle morphology extending in three dimensions
- C01P2004/32—Spheres
- C01P2004/34—Spheres hollow
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
Abstract
The application provides a preparation method of hollow silicon oxide nanospheres, which comprises the following steps: preparation of phase A: adding resorcinol, formaldehyde and strong ammonia water into a mixed solvent of water and fatty alcohol, stirring for 3-4 h, and adding a cationic surfactant to obtain the phase A; preparation of phase B: adding tetraethoxysilane into the phase A, and after the reaction is finished, washing, centrifuging and drying a reaction product to obtain a phase B; preparation of phase C: calcining the phase B to obtain the phase C, namely the hollow silicon oxide nanospheres; the mass ratio of the resorcinol to the formaldehyde to the concentrated ammonia water to the cationic surfactant to the ethyl orthosilicate is 0.5-1: 0.7-1.4: 6-7: 0.2-0.3: 0.13 to 0.23. The method solves the problems that the cost of synthetic raw materials is high and large-scale industrial production cannot be realized in the prior art to a certain extent, and the synthesized hollow silicon oxide nanospheres are excellent in performance and uniform and controllable in particle size.
Description
Technical Field
The application relates to the technical field of nano materials, in particular to a hollow silicon oxide nanosphere and a preparation method thereof.
Background
The hollow silicon oxide has the advantages of good chemical and mechanical stability, simple preparation process, low cost and the like, and the unique hollow structure endows the hollow silicon oxide with lower relative density. The template method is still the main method for synthesizing the hollow silicon oxide, and is mainly divided into three strategies, namely a soft template method, a hard template method, a self-template technology and the like according to the properties of the template. In the above method, although the hard template method can obtain well monodisperse hollow silica nanospheres, the polymer templates such as polystyrene spheres, which are most commonly used at present, are expensive and the preparation cost is high, and when inorganic nanoparticles such as iron oxide are used as templates, strong acid is usually needed to remove the templates, so that large-scale industrial production is difficult to realize.
Therefore, there is a need for a method for preparing hollow silica nanospheres that is low in cost and does not use strong acids.
Disclosure of Invention
In order to solve the problems of high cost of raw materials for synthesis and the problem that large-scale industrial production cannot be realized due to the addition of strong acid in the prior art, the method for preparing the hollow silicon oxide nanospheres is provided, and the particle size of the synthesized hollow silicon oxide nanospheres is controllable. Other features and advantages of the present application will be apparent from the following detailed description, or may be learned by practice of the application.
The application mainly provides a preparation method of hollow silicon oxide nanospheres, which comprises the following steps:
preparation of phase A: adding resorcinol, formaldehyde and strong ammonia water into a mixed solvent of water and fatty alcohol, stirring for 3-4 h, and adding a cationic surfactant to obtain the phase A;
preparation of phase B: adding tetraethoxysilane into the phase A, and after the reaction is finished, washing, centrifuging and drying a reaction product to obtain a phase B;
preparation of phase C: calcining the phase B to obtain the phase C, namely the hollow silicon oxide nanospheres;
the mass ratio of the resorcinol to the formaldehyde to the concentrated ammonia water to the cationic surfactant to the ethyl orthosilicate is 0.5-1: 0.7-1.4: 6-7: 0.2-0.3: 0.13 to 0.23.
In a preferred embodiment of the present application, in the mixed solution of water and fatty alcohol, the volume ratio of water to fatty alcohol is 1:2.5 to 3.5.
In a preferred embodiment of the present application, the aliphatic alcohol may be selected from one of methanol and ethanol.
In a preferred embodiment of the present application, the mass ratio of the resorcinol, the formaldehyde, the ammonia water and the cationic surfactant is 1: 1.4: 6.8: 0.25: 0.13 to 0.23.
In a preferred embodiment of the present application, the cationic surfactant may be selected from one of cetyltrimethylammonium bromide, cetyltrimethylammonium chloride, dodecyltrimethylammonium bromide, tetradecyltrimethylammonium bromide, octadecyltrimethylammonium bromide or docosyltrimethylammonium bromide.
In a preferred embodiment of the present application, in the step of preparing phase C, the calcination temperature is 450 to 550 ℃ and the calcination time is 3 to 6 hours.
In a preferred embodiment of the present application, the hollow silicon oxide nanospheres have a hollow structure, and the particle size of the hollow silicon oxide nanospheres is 300-520 nm.
In a preferred embodiment of the present application, the hollow silica nanospheres have a hollow structure, and the shell thickness of the hollow silica nanospheres is 40-60 nm.
Based on the technical scheme, the application has at least the following beneficial effects:
1. the method has the advantages of low raw material cost, simple process, mild conditions and high yield, and is suitable for popularization and application: the method takes the phenolic resin ball with low cost as a sacrificial template, and prepares the hollow silicon oxide nanospheres with uniform appearance by a simple sol-gel method;
2. the silicon oxide nanosphere with the hollow structure has the hollow structure with the cavity easy to adjust, and the particle size and the wall thickness of the obtained hollow silicon oxide nanosphere can be adjusted and controlled by adjusting and controlling the phenolic resin ball and the adding amount of the silicon source;
3. the hollow silicon oxide nanospheres prepared by the method have adjustable internal cavities and larger surface areas, so that the hollow silicon oxide nanospheres have certain application prospects in the fields of chemical polishing, integrated circuits, catalysis and the like.
It is to be understood that both the foregoing general description and the following detailed description are exemplary and explanatory only and are not restrictive of the application.
Drawings
The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments of the invention and, together with the description, serve to explain the applications.
In the drawings:
FIG. 1 shows a Scanning Electron Microscope (SEM) image of the hollow silica nanospheres prepared in example 1;
FIG. 2 shows a Transmission Electron Microscope (TEM) image of the hollow silica nanospheres prepared in example 1;
fig. 3 shows an XRD spectrum of the hollow silica nanosphere prepared in example 1.
Detailed Description
It should be noted that the example embodiments may be embodied in many different forms and should not be construed as limited to the examples set forth herein; rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the concept of example embodiments to those skilled in the art.
It should also be understood that the following examples are included to further illustrate the present application and are not to be construed as limiting the scope of the present application, and that certain insubstantial modifications and adaptations of the invention by those skilled in the art based on the foregoing description are intended to be covered by the present application. The specific process parameters and the like of the following examples are also only one example of suitable ranges, i.e., those skilled in the art can select the appropriate ranges through the description herein, and are not limited to the specific values exemplified below.
The following are specific examples of the present application:
example 1
Preparation of phase A: and the volume ratio is 1: 3, adding resorcinol, formaldehyde and strong ammonia water into the mixed solvent of water and ethanol, stirring for 4h, adding hexadecyl trimethyl ammonium bromide, and continuously stirring for 0.5h to obtain the phase A.
Preparation of phase B: and adding tetraethoxysilane into the phase A, stirring for 12 hours, repeatedly washing a reaction product with water and ethanol after the reaction is finished, and centrifuging and drying to obtain the phase B.
Preparation of phase C: calcining the B phase for 5h at 500 ℃ to obtain the C phase, namely the hollow silicon oxide nanospheres.
Wherein the mass ratio of the resorcinol, the formaldehyde, the strong ammonia water, the hexadecyl trimethyl ammonium bromide and the ethyl orthosilicate is 1: 1.4: 6.8: 0.25: 0.13.
the Scanning Electron Microscope (SEM) image of the hollow silica nanospheres prepared in this example is shown in fig. 1, and the Transmission Electron Microscope (TEM) image is shown in fig. 2, and as can be seen from fig. 1 and fig. 2, the hollow silica nanospheres prepared in this application have a uniform spherical structure, uniform morphology, and good monodispersity. In this example, the XRD spectrogram of the hollow silica nanosphere prepared in this example is compared with the standard spectrogram, and the silica nanosphere prepared in this example has an amorphous structure.
Example 2
Preparation of phase A: and the volume ratio is 1: 3, adding resorcinol, formaldehyde and strong ammonia water into the mixed solvent of water and ethanol, stirring for 4h, adding hexadecyl trimethyl ammonium bromide, and continuously stirring for 0.5h to obtain the phase A.
Preparation of phase B: and adding tetraethoxysilane into the phase A, stirring for 12 hours, repeatedly washing a reaction product with water and ethanol after the reaction is finished, and centrifuging and drying to obtain the phase B.
Preparation of phase C: calcining the B phase for 5h at 500 ℃ to obtain the C phase, namely the hollow silicon oxide nanospheres.
Wherein the mass ratio of the resorcinol, the formaldehyde, the strong ammonia water, the hexadecyl trimethyl ammonium bromide and the ethyl orthosilicate is 0.5: 0.7: 6.8: 0.25: 0.13.
example 3
Preparation of phase A: and the volume ratio is 1: adding resorcinol, formaldehyde and strong ammonia water into the mixed solvent of water and ethanol of 3, stirring for 3h, adding hexadecyl trimethyl ammonium bromide, and continuously stirring for 0.5h to obtain the phase A.
Preparation of phase B: and adding tetraethoxysilane into the phase A, stirring for 12 hours, repeatedly washing a reaction product with water and ethanol after the reaction is finished, and centrifuging and drying to obtain the phase B.
Preparation of phase C: calcining the B phase for 5h at 500 ℃ to obtain the C phase, namely the hollow silicon oxide nanospheres.
Wherein the mass ratio of the resorcinol, the formaldehyde, the strong ammonia water, the hexadecyl trimethyl ammonium bromide and the ethyl orthosilicate is 1: 1.4: 6.8: 0.25: 0.13.
example 4
Preparation of phase A: and the volume ratio is 1: 3, adding resorcinol, formaldehyde and strong ammonia water into the mixed solvent of water and ethanol, stirring for 4h, adding hexadecyl trimethyl ammonium bromide, and continuously stirring for 0.5h to obtain the phase A.
Preparation of phase B: and adding tetraethoxysilane into the phase A, stirring for 12 hours, repeatedly washing a reaction product with water and ethanol after the reaction is finished, and centrifuging and drying to obtain the phase B.
Preparation of phase C: calcining the B phase for 5h at 500 ℃ to obtain the C phase, namely the hollow silicon oxide nanospheres.
Wherein the mass ratio of the resorcinol, the formaldehyde, the strong ammonia water, the hexadecyl trimethyl ammonium bromide and the ethyl orthosilicate is 1: 1.4: 6.8: 0.25: 0.18.
example 5
Preparation of phase A: and the volume ratio is 1:2.5, adding resorcinol, formaldehyde and strong ammonia water into the mixed solvent of water and ethanol, stirring for 3h, adding hexadecyl trimethyl ammonium bromide, and continuously stirring for 0.5h to obtain the phase A.
Preparation of phase B: and adding tetraethoxysilane into the phase A, stirring for 12 hours, repeatedly washing a reaction product with water and ethanol after the reaction is finished, and centrifuging and drying to obtain the phase B.
Preparation of phase C: calcining the B phase for 3h at 450 ℃ to obtain the C phase, namely the hollow silicon oxide nanospheres.
Wherein the mass ratio of the resorcinol, the formaldehyde, the strong ammonia water, the hexadecyl trimethyl ammonium bromide and the ethyl orthosilicate is 1: 1.4: 7: 0.2: 0.23.
example 6
Preparation of phase A: and the volume ratio is 1: and 3.5, adding resorcinol, formaldehyde and strong ammonia water into the mixed solvent of water and methanol, stirring for 3 hours, adding hexadecyl trimethyl ammonium bromide, and continuously stirring for 0.5 hour to obtain the phase A.
Preparation of phase B: and adding tetraethoxysilane into the phase A, stirring for 12 hours, repeatedly washing a reaction product with water and methanol after the reaction is finished, and centrifuging and drying to obtain the phase B.
Preparation of phase C: and calcining the B phase for 6h at 550 ℃ to obtain the C phase, namely the hollow silicon oxide nanospheres.
Wherein the mass ratio of the resorcinol to the formaldehyde to the concentrated ammonia water to the cationic surfactant to the ethyl orthosilicate is 1: 1: 6: 0.3: 0.23.
next, the hollow silica nanospheres prepared in the above examples were tested to examine their performance.
Experimental example 1
The average particle size and the average shell thickness of 4 groups of hollow silica nanospheres were measured using the hollow silica nanospheres prepared in example 1, example 2, example 3 and example 4.
| Examples | Average particle diameter | Average shell thickness |
| Example 1 | 500nm | 40nm |
| Example 2 | 300nm | 40nm |
| Example 3 | 430nm | 40nm |
| Example 4 | 520nm | 60nm |
Experimental example 2
The specific surface area of the hollow silica nanospheres prepared in each example was measured using the hollow silica nanospheres prepared in all examples, and the measurement results are shown in table 2
| Examples | Specific surface area |
| Example 1 | 386.6m2/g |
| Example 2 | 351.5m2/g |
| Example 3 | 358.1m2/g |
| Example 4 | 362.3m2/g |
| Example 5 | 382.7m2/g |
| Example 6 | 373.8m2/g |
| ZSM-5 molecular sieve | 300-350m2/g |
Based on the experimental examples, the technical method provided by the application can control the particle size and the shell thickness of the prepared hollow silicon oxide nanospheres, so that the hollow silicon oxide nanospheres with various specifications can be prepared by adjusting production parameters according to specific purposes. In addition, hollow silica nanosphere still has great specific surface area, and the hollow silica nanosphere that this application was prepared has certain application prospect in fields such as chemical polishing, integrated circuit and catalysis.
Other embodiments of the present application will be apparent to those skilled in the art from consideration of the specification and practice of the embodiments disclosed herein. This application is intended to cover any variations, uses, or adaptations of the invention following, in general, the principles of the application and including such departures from the present disclosure as come within known or customary practice within the art to which the invention pertains.
Claims (8)
1. A preparation method of hollow silicon oxide nanospheres is characterized by comprising the following steps:
preparation of phase A: adding resorcinol, formaldehyde and strong ammonia water into a mixed solvent of water and fatty alcohol, stirring for 3-4 h, and adding a cationic surfactant to obtain the phase A;
preparation of phase B: adding tetraethoxysilane into the phase A, and after the reaction is finished, washing, centrifuging and drying a reaction product to obtain a phase B;
preparation of phase C: calcining the phase B to obtain the phase C, namely the hollow silicon oxide nanospheres;
the mass ratio of the resorcinol to the formaldehyde to the concentrated ammonia water to the cationic surfactant to the ethyl orthosilicate is 0.5-1: 0.7-1.4: 6-7: 0.2-0.3: 0.13 to 0.23.
2. The method for preparing hollow silica nanospheres according to claim 1, wherein the volume ratio of water to fatty alcohol in the mixed solution of water and fatty alcohol is 1: 2.5-3.5.
3. The method for preparing hollow silica nanospheres according to claim 1, wherein the aliphatic alcohol is selected from one of methanol and ethanol.
4. The method for preparing the hollow silica nanosphere according to claim 1, wherein the mass ratio of the resorcinol, the formaldehyde, the ammonia water, the cationic surfactant and the tetraethoxysilane is 1: 1.4: 6.8: 0.25: 0.13 to 0.23.
5. The method of preparing hollow silica nanospheres according to claim 1, wherein the cationic surfactant is one selected from cetyltrimethylammonium bromide, cetyltrimethylammonium chloride, dodecyltrimethylammonium bromide, tetradecyltrimethylammonium bromide, octadecyltrimethylammonium bromide or docosyltrimethylammonium bromide.
6. The method for preparing hollow silica nanospheres according to claim 1, wherein in the step of preparing the C phase, the calcining temperature is 450-550 ℃ and the calcining time is 3-6 h.
7. The method for preparing the hollow silica nanospheres according to claim 1, wherein the hollow silica nanospheres have a hollow structure, and the particle size of the hollow silica nanospheres is 300-520 nm.
8. A hollow silica nanoball prepared according to the preparation method of claims 1 to 7; the hollow silicon oxide nanospheres are hollow structures, and the thickness of the shells of the hollow silicon oxide nanospheres is 40-60 nm.
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN115106070A (en) * | 2022-06-21 | 2022-09-27 | 南通裕弘分析仪器有限公司 | Preparation method and application of spherical silica gel chromatographic packing with different particle sizes |
| CN116969476A (en) * | 2023-08-11 | 2023-10-31 | 青岛邦凯高新技术材料有限公司 | Preparation method of high-purity silicon dioxide particles |
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