CN114211121A - Femtosecond laser ablation-surface film coating composite processing method for super-hydrophobic surface - Google Patents
Femtosecond laser ablation-surface film coating composite processing method for super-hydrophobic surface Download PDFInfo
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/352—Working by laser beam, e.g. welding, cutting or boring for surface treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/60—Preliminary treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
Abstract
The invention discloses a femtosecond laser ablation-surface film coating composite processing method for a super-hydrophobic surface, belonging to the technical field of photoelectricity. Firstly, etching the surface of a substrate material sample by femtosecond pulse laser to obtain a material sample with a micro-nano array surface; and then coating a layer of low-energy-state hydrophobic film on a material sample with a micro-nano array surface to obtain the low-energy-state hydrophobic film-micro-nano array structure surface composite material, thereby realizing the comprehensive hydrophobic performance of physical hydrophobicity and chemical hydrophobicity. The method combines the femtosecond laser etching technology and the low-energy-state hydrophobic film coating technology, has the characteristics of high processing precision, strong stability, high preparation speed and high efficiency and the like, and can be widely applied to processing of micro-nano arrays on the surfaces of various compounds.
Description
Technical Field
The invention belongs to the technical field of photoelectricity, and particularly relates to a femtosecond laser ablation-surface film coating composite processing method for a super-hydrophobic surface.
Background
Under special environments such as oceans, air, sky and the like, various equipment is exposed to severe environments such as humidity, dust, salt mist and the like for a long time for use, the surface of the equipment is easy to generate chemical corrosion and electrochemical corrosion, and the use effect and the service life of the equipment are greatly reduced. Therefore, research and development work of a key technology for the super-hydrophobic treatment of the surfaces of metal and composite material coatings is urgently needed to be carried out, and a feasible scheme is provided for large-scale application of the super-hydrophobic materials.
Natural organisms have been studied to have various superhydrophobic functions. The lotus leaf upper surface is the most typical super-hydrophobic surface, and obtains the name 'sludge-free' due to the self-cleaning function. In 1997, through researches on lotus leaves, German botanicists Barthlott and Neinhuis find that the lotus leaf surface has a composite micro-nano secondary mastoid structure, and the composite micro-nano secondary mastoid structure and the nano-scale wax crystal on the surface of the lotus leaf surface have super-strong hydrophobic capacity and self-cleaning capacity. In addition, there are many biomimetic superhydrophobic phenomena, such as the ability of a water strider to stand on the water, the ability of water droplets to adhere highly to the surface of rose petals, the ability of mosquitoes to repel fog in their compound eyes, the ability of water droplets to fall on the wings and roll out in a wing-oriented direction, and the like, which gradually evolve into special structured surfaces that are resistant to extreme conditions. Inspired by various biological hydrophobic phenomena in nature, the bionic preparation of the surface with the super-hydrophobic function draws wide attention of researchers, and the bionic preparation has important application prospects in the fields of self-cleaning, oil-water separation, pollution prevention, icing prevention, corrosion prevention and the like.
More detailed researches show that the super-hydrophobicity of the surface of the material is determined by low surface energy substances and micro-nano rough structures on the surface of the material. Therefore, the realization of the superhydrophobic performance of the surface is also designed and prepared mainly based on these two aspects. The preparation approaches adopted at present mainly include a spraying method, a sol-gel method, a self-assembly method, an electrochemical etching method, a template copying method, a hydrothermal method and the like, but the methods have problems in the preparation process, such as selectivity to a substrate, complicated preparation steps, use of chemical solvents and the like. In addition, the wettability of the super-hydrophobic surface is mainly determined by the microstructure and the chemical composition of the super-hydrophobic surface, so when the microstructure of the surface of the material is damaged or the low-surface-energy coating is damaged by external force friction, the hydrophobic property of the super-hydrophobic surface is greatly weakened. Therefore, the key to preparing an abrasion-resistant and stable superhydrophobic material is how to maintain good non-wettability of its surface after mechanical force and other repeated cyclic damage. Therefore, the development of a method for rapidly preparing the surface with stable superhydrophobic performance is of great significance for practical large-scale application.
In recent years, due to the rapid development of femtosecond laser technology, femtosecond laser micro-nano processing has been widely applied to the construction of micro-nano rough structures on the surfaces of materials. In the whole laser processing process, the heat effect is small, the processing precision is high, and various pre-designed micro-nano structure patterns can be directly formed on the surface of the material in a non-contact processing mode. Meanwhile, due to the ultra-short pulse width and the ultra-high peak power, most of the existing solid materials, such as semiconductors, metals, ceramics, silicon wafers, glass, polymers, biological tissues and the like, can be processed without the limitation of processing materials. Based on the characteristics, the preparation of the super-hydrophobic surface by constructing a stable micro-nano composite binary structure on the surface of the material by adopting the femtosecond laser has important significance in practical application.
The femtosecond laser can directly form a micro-nano coarse structure on the surface of most solid materials in an ablation melting mode, so that the super-hydrophobic property of the surface of the intrinsic hydrophobic solid material can be realized after the femtosecond laser ablation melting; for the intrinsic hydrophilic material, after the femtosecond laser treatment, the super-hydrophobic property of the material surface can be realized by the low surface energy treatment again. The unique advantages of the femtosecond laser technology in the field of micro-nano processing make the technology become an effective way for preparing the super-hydrophobic surface at present. However, further developments in this area of research still present the following problems:
(1) the femtosecond laser micro-nano structure has low processing speed and consumes time, and the processing efficiency is very important to be improved;
(2) the super-hydrophobic structure has single function and weak stability, and can not meet the requirements of practical application.
Therefore, the combination of physical method hydrophobicity of the micro-nano array structure surface and chemical method hydrophobicity of low-energy-state film coating can be realized by exploring femtosecond laser micro-nano processing and subsequent surface coating technology, and the method has important significance for realizing the super-hydrophobicity of various substrate surfaces.
Disclosure of Invention
The invention provides a femtosecond laser ablation-surface film coating composite processing method for a super-hydrophobic surface, which combines a femtosecond laser etching technology and a low-energy-state hydrophobic film coating technology of a micro-nano array structure surface, explores a micro-nano processing method of the super-hydrophobic surface of a composite material micro-nano array structure, and provides a realization scheme for the rapid and large-area processing application of the super-hydrophobic surface of a composite material coating.
The technical scheme adopted by the invention is as follows:
a femtosecond laser ablation-surface film coating composite processing method of a super-hydrophobic surface is characterized in that firstly, femtosecond pulse laser is adopted to etch the surface of a substrate material sample to obtain a material sample with a micro-nano array surface; and then coating a layer of low-energy-state hydrophobic film on a material sample with a micro-nano array surface to obtain the low-energy-state hydrophobic film-micro-nano array structure surface composite material, thereby realizing the comprehensive hydrophobic performance of physical hydrophobicity and chemical hydrophobicity.
Further, the low-energy-state hydrophobic film is a polymer film or a graphene film or a Polydimethylsiloxane (PDMS) modified graphene film.
Further, the method for coating the low-energy-state hydrophobic film on the surface of the micro-nano array comprises the following steps: and transferring the low-energy-state hydrophobic film to the surface of the composite material sample, then putting the substrate material sample into alcohol for cleaning, and blow-drying and compacting by using dry nitrogen.
Further, the femtosecond pulse laser is adopted to etch the surface of the substrate material sample, and the method comprises the following steps:
step 1-1, polishing the substrate material to ensure that the initial roughness of the substrate material sample is consistent.
Step 1-2, cleaning a substrate material sample;
sequentially adopting methylbenzene, ketone and absolute ethyl alcohol to carry out ultrasonic cleaning on a substrate material sample, and removing organic impurities on the surface (oil stains and the like); and continuously adopting deionized water to carry out ultrasonic cleaning on the substrate material sample, drying and then placing on clean filter paper for later use.
Step 1-3, ablating the surface of a substrate material sample by femtosecond laser;
etching the surface of a substrate material sample by femtosecond pulse laser, and then ultrasonically cleaning the substrate material sample by absolute ethyl alcohol to obtain the substrate material sample with the micro-nano array surface.
Further, when the low-energy-state hydrophobic film is a graphene film, the graphene film is prepared by a Chemical Vapor Deposition (CVD) method.
Further, when the low-energy-state hydrophobic film is a PDMS modified graphene film, the method for preparing the PDMS modified graphene film is as follows: and placing the graphene film and Polydimethylsiloxane (PDMS) in a closed container, and placing the closed container in a muffle furnace for heating treatment to obtain the PDMS modified graphene film with super-hydrophobic property.
Further, in step 1-3, when the femtosecond pulse laser etches the surface of the substrate material sample, the laser setting parameters are as follows: the scanning speed is 0.5mm/s-0.8mm/s, the scanning interval is 50-100 μm, the laser pulse polarization state is linear polarization state, and the used pulse energy is 275 μ J-325 μ J.
Further, the thickness of the low-energy-state hydrophobic film is 0.5-1 mm.
Further, mixing the graphene film and Polydimethylsiloxane (PDMS) at a mass ratio of 1: 31.6-33.2; the conditions for preparing the PDMS modified graphene film are as follows: the temperature is 200 ℃ and 250 ℃, and the reaction time is 1-2 hours.
The femtosecond laser direct writing technology is selected to be used for processing the micro-nano structure of the surface coating of the composite material based on the characteristics of extremely short pulse width, extremely high peak power density, extremely high focusing capacity and the like of the femtosecond laser. The femtosecond laser micro-nano processing technology obtains a focus with ultrahigh energy density by focusing femtosecond pulse laser, induces the 'modification' and 'molding' of the surface of a material under the microscale, fundamentally eliminates the influence and thermal damage of various effects such as a melting zone, a heat affected zone, a shock wave and the like on surrounding materials in the traditional long pulse processing process, greatly reduces the space range related to the processing process, and improves the accuracy degree of laser processing. However, the super-hydrophobic structure directly processed by femtosecond laser has single function and weak stability, and when the microstructure on the surface of the material is repeatedly rubbed by external force and damaged, the hydrophobic property of the material is greatly weakened. The low-energy-state hydrophobic film (the polymer film and the graphene film) is used as a novel two-dimensional carbon material and has certain hydrophobicity, and particularly after the graphene film is modified by polydimethylsiloxane, short-chain Si-O broken by PDMS at high temperature is deposited on the surface of the graphene film for self-assembly, so that the surface energy of the graphene film is reduced, and the hydrophobic property of the graphene film can be further improved. The surface of the substrate material sample is coated with the low-energy-state hydrophobic film, so that the microstructure on the surface of the composite material can be effectively protected, the hydrophobic property of the surface of the composite material can be improved, and the surface of the super-hydrophobic composite material is endowed with multifunction and stability.
The invention provides a femtosecond laser ablation-surface film coating composite processing method of a super-hydrophobic surface, which is a brand-new method for quickly preparing a surface with stable super-hydrophobic property.
Drawings
FIG. 1 is a flow chart of the present invention;
FIG. 2 is a schematic diagram of a super-hydrophobic micro-nano array surface model;
FIG. 3 is an SEM scanning image of a composite material sample with a super-hydrophobic micro-nano array surface;
FIG. 4 is a water drop contact angle test result diagram of the modified graphene-micro nano array surface composite material.
Detailed Description
The following provides a more detailed description of the embodiments and the operation of the present invention with reference to the accompanying drawings.
A femtosecond laser ablation-surface film coating composite processing method of a super-hydrophobic surface is disclosed, and a flow chart is shown in figure 1.
Firstly, parameters such as femtosecond laser energy density, laser polarization state and laser scanning interval are determined through FDTD software simulation. In the actual processing process, along with the increase of the laser pulse energy, the contact angle shows the trend of increasing and then decreasing; therefore, the optimal pulse energy range for processing superhydrophobic surfaces is between 275 muJ-325 muJ. Under the condition that the laser pulse energy is most suitable, the change of the contact angle caused by changing the scanning speed and the polarization state of the laser is not obvious, and the contact angle of the surface of the material processed at the scanning speed of 0.8mm/s is slightly smaller than that of the surface of the material processed at the scanning speed of 0.5 mm/s. In summary, the femtosecond laser processing parameters selected by the femtosecond laser ablation-surface coating composite processing method for the superhydrophobic surface in the embodiment are as follows: laser pulse energy is 300 muJ, laser polarization state is linear polarization state, scanning speed is 0.8mm/s, focal length is 200mm, scanning interval is 50μm, and processing range is maximum 20 x 40mm2。
In this embodiment, taking the modified graphene film as an example, the femtosecond laser ablation-surface coating composite processing method for the superhydrophobic surface specifically includes the following steps:
step 1, preparing a substrate material sample with a micro-nano array surface;
step 1-1, polishing a substrate material;
the method comprises the steps of taking an epoxy glass fiber reinforced plastic composite material as a substrate material for femtosecond laser processing, sequentially using sand paper from thick to thin to polish the substrate material, sequentially using 180#, 400#, 800# and 2000# sand paper, and then polishing by using polishing cloth. After polishing, the substrate material sample was placed in a vessel containing absolute ethanol for 10 minutes for ultrasonic cleaning to remove surface impurities, and finally dried with dry nitrogen. Before the laser processing treatment, the initial roughness of the substrate material sample is ensured to be consistent through the polishing treatment.
Step 1-2, cleaning a substrate material sample;
sequentially placing the polished substrate material sample in a container containing toluene, ketone and absolute ethyl alcohol, sequentially carrying out ultrasonic cleaning for 15-20 minutes, and then drying by dry nitrogen to remove organic impurities such as oil stains on the surface of the substrate material sample; continuously placing the substrate material sample in a container filled with deionized water, carrying out ultrasonic cleaning for 15-20 minutes, and then drying by using dry nitrogen; finally, the material was placed on clean filter paper and air dried for use.
Step 1-3, ablating the surface of a substrate material sample by femtosecond laser;
the laser setting parameters in this embodiment are: the laser scanning speed is 0.8mm/s, the scanning interval is 50 μm, the laser pulse polarization state is linear polarization state, the laser pulse energy is 300 μ J, and the maximum processing range is 20 × 40mm2. And etching the microstructure on the surface of the substrate material sample by femtosecond laser pulse to obtain the substrate material sample with the micro-nano array surface according with the wettability.
Step 1-4, cleaning a sample;
cleaning a substrate material sample etched by the femtosecond laser, placing the substrate material sample in a container filled with absolute ethyl alcohol for ultrasonic cleaning for 10 minutes, finally drying the substrate material sample by dry nitrogen, and placing the substrate material sample on clean filter paper for airing for later use.
Step 2, preparing a PDMS modified graphene film;
step 2-1, cleaning the substrate;
the method comprises the following steps of (1) taking a monocrystalline silicon wafer as a substrate, placing the substrate in a container filled with acetone and absolute ethyl alcohol, carrying out ultrasonic cleaning for 20 minutes, and drying by using dry nitrogen; continuously placing the substrate in a container filled with deionized water, carrying out ultrasonic cleaning for 20 minutes and drying by using dry nitrogen; and finally, placing the substrate on clean filter paper to be dried for later use.
2-2, growing a graphene film (the size of which is determined by the area of a covered workpiece) on the copper substrate by adopting a Chemical Vapor Deposition (CVD) method;
putting the copper foil into a tube furnace as a catalyst and a growth substrate, sealing and vacuumizing to reach the required pressure of 1250pa, slowly raising the temperature, raising the temperature to 1000 ℃ at 15 ℃ per minute, introducing hydrogen for circulation for a period of time, and removing oxides and impurities on the surface of the substrate due to the reduction effect of the hydrogen to obtain the growth substrate with high purity and smooth surface. And after the growth temperature of the graphene film is reached, introducing mixed gas of hydrogen and methane, carrying out thermal decomposition on the methane at a high temperature, and growing the graphene on the substrate for 30 minutes. And finally, after the graphene film is grown, turning off a power supply, slowly cooling the graphene film to room temperature, and continuously introducing hydrogen and argon in the process to prevent the grown graphene from being oxidized.
2-3, stripping the graphene film by using a substrate etching method;
and spin-coating a layer of polymethyl methacrylate (PMMA) on the surface of the graphene film to be used as a transfer medium. And putting the PMMA/graphene/copper substrate compound grown by the CVD method into an Ammonium Persulfate (APS) solution with the concentration of 5% for about 2 hours to corrode the copper substrate, so that the PMMA/graphene film integrally falls off, washing the PMMA/graphene film for more than 20 minutes by using deionized water, and fishing out by using a sample rack.
And 2-4, putting the PMMA/graphene film in a vacuum furnace, preserving heat for 1 hour at the temperature of 60 ℃, drying, then putting the PMMA/graphene film on a silicon wafer substrate, blowing dry nitrogen to compact the silicon wafer, and finally heating and soaking the silicon wafer substrate in water bath at the temperature of 50 ℃ by using propanol for 5 minutes to remove PMMA on the surface of the silicon wafer substrate, thereby obtaining the graphene/silicon wafer composite. And (3) putting the silicon wafer into alcohol for cleaning, and then drying the silicon wafer by using nitrogen to obtain the dry graphene film.
2-5, placing the dried graphene film and Polydimethylsiloxane (PDMS) in a sealed weighing bottle according to the mass ratio of 1:32.3, placing the sealed weighing bottle into a muffle furnace, and keeping the temperature at 234 ℃ for 2 hours to obtain a PDMS modified graphene film with super-hydrophobic property; the thickness of the PDMS-modified graphene film in this example was measured to be about 0.7 mm.
Step 3, preparing a modified graphene-micro nano array surface composite material with super-hydrophobic performance;
and (3) transferring the PDMS modified graphene film to the substrate material sample obtained in the step (1-4), cleaning the sample in alcohol, and blow-drying and compacting by using dry nitrogen to obtain the modified graphene-micro-nano array structure surface composite material.
And 4, observing the surface appearance quality and the defect degree of the composite material sample subjected to femtosecond laser etching by using a Scanning Electron Microscope (SEM), and performing water drop contact angle test on the modified graphene-micro-nano array structure surface composite material.
As shown in fig. 2, a schematic diagram of a model of the surface of the superhydrophobic micro-nano array of the invention is shown. As shown in fig. 2(a), for an uncoated graphene micro-nano array surface model obtained by femtosecond laser processing directly, the substrate material surface after the femtosecond laser processing can obtain a delicate and abundant micro-nano structure, and because the surface structure is uneven, a lot of small air bags can be remained between the solid/liquid surfaces, so that liquid drops can not be in complete contact with the solid surface, and the substrate material surface is represented as super-hydrophobicity; as shown in fig. 2(b), after coating, the micro-nano array surface coated with graphene can further enhance the superhydrophobic performance of the material surface while reducing the wear of the microstructure on the substrate material surface.
As shown in fig. 3, a SEM scanning image of a sample of the superhydrophobic-modified graphene-micro nano array structure surface composite material prepared in this embodiment is shown. As shown in fig. 3(a), when the pulse energy is 300 μ J and the resolution is 100 μm, it can be seen that micron-scale structures are formed on the surface of the composite material, and the formed protruding structures are connected into a piece, which is similar to the shape of a wave, and the surface roughness is increased; as shown in fig. 3(b), the pulse energy is 300 μ J, the resolution is 10 μm, the microstructure is continuously amplified, it can be seen that nano-scale particles are distributed on the microstructure, and the micro-nano double-layer structure can further improve the hydrophobic property of the surface of the composite material.
As shown in fig. 4, a contact angle test result graph of a modified graphene-micro nano array surface composite material water drop is obtained by performing a contact angle test. The figure shows that water drops on the surface of the modified graphene-micro nano array surface composite material, the contact angle is about 153.7-153.9 degrees, and the comprehensive application of the femtosecond laser etching technology and the graphene coating technology can effectively improve the hydrophobic property of the surface of the material.
While the invention has been described with reference to specific embodiments, any feature disclosed in this specification may be replaced by alternative features serving the same, equivalent or similar purpose, unless expressly stated otherwise; all of the disclosed features, or all of the method or process steps, may be combined in any combination, except mutually exclusive features and/or steps; any non-essential addition and replacement made by the technical characteristics of the technical scheme of the invention by a person skilled in the art belong to the protection scope of the invention.
Claims (9)
1. A femtosecond laser ablation-surface film coating composite processing method of a super-hydrophobic surface is characterized in that firstly, femtosecond pulse laser is adopted to etch the surface of a substrate material sample to obtain a material sample with a micro-nano array surface; and then coating a layer of low-energy-state hydrophobic film on a material sample with a micro-nano array surface to obtain the low-energy-state hydrophobic film-micro-nano array structure surface composite material, thereby realizing the comprehensive hydrophobic performance of physical hydrophobicity and chemical hydrophobicity.
2. The femtosecond laser ablation-surface film coating composite processing method for the superhydrophobic surface according to claim 1, wherein the low-energy-state hydrophobic film is a polymer film or a graphene film or a PDMS modified graphene film.
3. The femtosecond laser ablation-surface film covering composite processing method of the super-hydrophobic surface according to claim 2, wherein the way of covering the low energy state hydrophobic film on the surface of the micro-nano array is as follows: and transferring the low-energy-state hydrophobic film to the surface of the composite material sample, then putting the composite material sample into alcohol for cleaning, and blow-drying and compacting by using dry nitrogen.
4. The femtosecond laser ablation-surface film coating combined processing method for the superhydrophobic surface as claimed in claim 2 or 3, wherein the femtosecond pulse laser is adopted to etch the surface of the substrate material sample, comprising the following steps:
step 1-1, polishing the substrate material to ensure that the initial roughness of the substrate material sample is consistent;
step 1-2, cleaning a substrate material sample;
step 1-3, ablating the surface of a substrate material sample by femtosecond laser;
etching the surface of a substrate material sample by femtosecond pulse laser, and then ultrasonically cleaning the substrate material sample by absolute ethyl alcohol to obtain the substrate material sample with the micro-nano array surface.
5. The femtosecond laser ablation-surface film covering composite processing method for the superhydrophobic surface as claimed in claim 2 or 3, wherein when the low-energy state hydrophobic film is a graphene film, a chemical vapor deposition method is adopted to prepare the graphene film.
6. The femtosecond laser ablation-surface film coating composite processing method for the superhydrophobic surface according to claim 2 or 3, wherein when the low-energy state hydrophobic film is a PDMS modified graphene film, the mode for preparing the PDMS modified graphene film is as follows: and placing the graphene film and polydimethylsiloxane into a closed container, and placing the closed container into a muffle furnace for heating treatment to obtain the PDMS modified graphene film with super-hydrophobic property.
7. The femtosecond laser ablation-surface film coating combined processing method for the superhydrophobic surface according to claim 2, wherein in the step 1-3, when the femtosecond pulse laser etches the surface of the substrate material sample, the laser setting parameters are as follows: the scanning speed is 0.5mm/s-0.8mm/s, the scanning interval is 50-100 μm, the laser pulse polarization state is linear polarization state, and the used pulse energy is 275 μ J-325 μ J.
8. The femtosecond laser ablation-surface film coating combined processing method for the superhydrophobic surface according to claim 2, wherein the thickness of the low-energy-state hydrophobic film is 0.5-1 mm.
9. The femtosecond laser ablation-surface film covering composite processing method for the superhydrophobic surface according to claim 6, wherein the mass ratio of the graphene film to the polydimethylsiloxane is 1: 31.6-33.2; the conditions for preparing the PDMS modified graphene film are as follows: the temperature is 200 ℃ and 250 ℃, and the reaction time is 1-2 hours.
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