CN114192454B - Be applied to adjustable position appearance belt cleaning device of base plate plummer - Google Patents
Be applied to adjustable position appearance belt cleaning device of base plate plummer Download PDFInfo
- Publication number
- CN114192454B CN114192454B CN202111509815.9A CN202111509815A CN114192454B CN 114192454 B CN114192454 B CN 114192454B CN 202111509815 A CN202111509815 A CN 202111509815A CN 114192454 B CN114192454 B CN 114192454B
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- support
- scrapers
- substrate bearing
- spherical
- bearing table
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- 238000004140 cleaning Methods 0.000 title claims abstract description 45
- 239000000758 substrate Substances 0.000 claims abstract description 58
- 230000007246 mechanism Effects 0.000 claims abstract description 39
- 238000007790 scraping Methods 0.000 claims abstract description 4
- 238000003825 pressing Methods 0.000 claims description 5
- 238000009434 installation Methods 0.000 claims description 3
- 230000000694 effects Effects 0.000 abstract description 8
- 230000001360 synchronised effect Effects 0.000 abstract description 8
- 230000008859 change Effects 0.000 abstract description 6
- 239000013618 particulate matter Substances 0.000 description 7
- 239000000463 material Substances 0.000 description 5
- 239000012535 impurity Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000005096 rolling process Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 238000011109 contamination Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/10—Cleaning by methods involving the use of tools characterised by the type of cleaning tool
- B08B1/16—Rigid blades, e.g. scrapers; Flexible blades, e.g. wipers
- B08B1/165—Scrapers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
Landscapes
- Cleaning In General (AREA)
Abstract
The invention discloses an adjustable pose cleaning device applied to a substrate bearing table, which comprises a mounting bracket erected above the surface of the substrate bearing table, a plurality of spherical pair mechanisms connected to the bottom surface of the mounting bracket, a plurality of mandrels inserted in the spherical pair mechanisms and moving in a spherical manner synchronously with the spherical pair mechanisms, a fixed bracket connected to the tail end of each mandrel, and a plurality of scraping plates arranged on the bottom surface of each fixed bracket and extending towards the substrate bearing table. Therefore, when the spherical pair mechanism generates spherical motion, the scrapers are driven by the mandrel to generate synchronous spherical motion, so that the poses of the scrapers are changed, when the poses of the substrate bearing tables are changed, the poses of the scrapers can be correspondingly adjusted along with the pose change of the substrate bearing tables, and the scrapers can be always attached to the surface of the substrate bearing tables, so that the substrate bearing tables with different poses can be adapted, the bearing surface can be stably attached, the cleaning effect is ensured, and the Dimple phenomenon is stably solved.
Description
Technical Field
The invention relates to the technical field of semiconductors, in particular to a pose-adjustable cleaning device applied to a substrate bearing table.
Background
The thinning processing of the workpiece by using hard and brittle sheet materials (such as semiconductor substrate materials of Si, SiC or GaN and the like) has extremely high requirements on the surface quality (flatness, surface roughness and the like) of the material, so that a bearing table for uniformly supporting the workpiece is required in thinning equipment.
Because the material removed in the grinding and thinning process of the workpiece is the scrap powder (particulate matter), the scrap powder may be attached to the bearing table in the workpiece loading, unloading and processing processes, when a new workpiece is loaded on the bearing table, the particulate matter attached to the bearing table supports the workpiece area above the bearing table, so that the workpiece surface in the area above the bearing table is raised compared with other areas, after the workpiece is ground and thinned, the originally raised part removes more material than the originally flat part, and therefore, the processed workpiece generates a pit at the originally raised position, and the result is called a "double phenomenon". The double phenomenon damages the workpiece, deteriorates surface flatness and surface roughness, and risks particle contamination of the workpiece, and requires effective cleaning of the surface (bearing surface) of the susceptor before the workpiece is loaded thereon in order to avoid the double phenomenon.
In the prior art, the mode that is often used for wasing the plummer has rotatory brush to wash and rotatory oilstone to wash, and both all produce relative slip based on the rotatory mode of cleaning element and plummer surface, combine the pure water of input in the cleaning process, get rid of the particulate matter on the plummer. Because the bearing table generally has an inclination angle adjusting function in order to properly adjust the grinding surface type of the workpiece, the posture of the bearing surface of the bearing table in the space is not fixed. However, in the supporting structure for cleaning the brush and/or the oilstone in the prior art, the cleaning component does not have the capability of stably attaching the varying bearing surface of the bearing table, so when the bearing table changes in a large inclination angle position relative to the cleaning component, the fit degree between the cleaning component and the bearing table is reduced, the cleaning component is difficult to be tightly attached, the cleaning effect is poor, and the dim phenomenon cannot be stably solved.
Therefore, how to adapt to substrate bearing tables with different poses, realize stable fit on the bearing surface and ensure the cleaning effect is a technical problem faced by technical personnel in the field.
Disclosure of Invention
The invention aims to provide an adjustable pose cleaning device applied to a substrate bearing table, which can adapt to substrate bearing tables with different poses, realize stable fit on a bearing surface and ensure a cleaning effect.
In order to solve the technical problem, the invention provides an adjustable pose cleaning device applied to a substrate bearing table, which comprises a mounting support erected above the surface of the substrate bearing table, a plurality of spherical pair mechanisms connected to the bottom surface of the mounting support, a plurality of mandrels inserted into the spherical pair mechanisms and moving in a spherical manner synchronously with the spherical pair mechanisms, a fixed support connected to the tail end of each mandrel, and a plurality of scraping plates arranged on the bottom surface of each fixed support and extending towards the substrate bearing table.
Preferably, the mounting bracket further comprises a sliding bracket slidably disposed on the bottom surface of the mounting bracket, the sliding direction of the sliding bracket is parallel to the length direction of the mounting bracket, and each spherical pair mechanism is connected to the bottom surface of the sliding bracket.
Preferably, the spherical pair mechanisms are distributed along the length direction of the sliding support at the bottom surface of the sliding support, and the fixed supports and the scrapers are distributed along the length direction of the sliding support at the bottom surface of the sliding support.
Preferably, two adjacent scrapers are distributed in a staggered manner in the width direction of the sliding support, and there is an overlapping area in the projection of the two adjacent scrapers in the length direction of the sliding support.
Preferably, the spherical pair mechanism comprises a connecting plate connected with the bottom surface of the sliding support, a ball bearing shell arranged on the surface of the connecting plate, and a sphere center arranged in the ball bearing shell, and the mandrel is inserted in the ball bearing shell and connected with the sphere center.
Preferably, the bottom surface of the sliding support is further connected with a limiting plate which is used for abutting against each fixed support and limiting the moving range of each scraper.
Preferably, the scraper mounting device further comprises a horizontal driving component which is arranged on the surface of the mounting bracket and used for driving each scraper to move horizontally along the length direction of the scraper, a through hole is formed in the surface of the mounting bracket, and an output shaft of the horizontal driving component is connected with the top surface of the sliding bracket through a driving plate which vertically penetrates through the through hole.
Preferably, the bottom surface of the mounting bracket is provided with a guide rail extending along the length direction of the mounting bracket, and the top of the sliding bracket is slidably embedded in the guide rail.
Preferably, the substrate support device further comprises a vertical driving component which is erected above the surface of the mounting support and used for driving each scraper to press the surface of the substrate bearing table, and the output end of the vertical driving component is abutted against the surface of the mounting support through a pressing plate.
Preferably, an elastic member is connected between a top surface of each of the fixing brackets and a bottom surface of the sliding bracket.
The invention provides an attitude-adjustable cleaning device applied to a substrate bearing table. The mounting bracket is a main structure of the cleaning device, is generally erected above the surface of the substrate bearing table, and is mainly used for mounting and bearing other parts. The spherical pair mechanisms are connected to the bottom surface of the mounting bracket, are generally arranged at the same time, and can generate spherical motion (namely pitching, rolling and yawing three-degree-of-freedom motion). The mandrel is inserted into each spherical pair mechanism and connected with the spherical pair mechanisms so as to keep synchronous spherical motion with each spherical pair mechanism. The fixed support is connected at the tail end of each mandrel so as to keep synchronous spherical motion with the mandrels. The scraper blade setting is on each fixed bolster, specifically is located the bottom surface of fixed bolster to extend towards the base plate plummer, mainly used butt base plate plummer's surface, and strike off impurity such as particulate matter on base plate plummer surface through relative motion. Therefore, the cleaning device with the adjustable pose, which is applied to the substrate bearing table, provided by the invention has the advantages that the scrapers are arranged on the bottom surfaces of the fixed supports, and the fixed supports are connected with the spherical pair mechanism through the mandrels, so that when the spherical pair mechanism generates spherical motion, the fixed supports and the scrapers can be respectively driven by the mandrels to generate synchronous spherical motion, and the pose of each scraper is further changed; therefore, when the pose of the substrate bearing table changes, the corresponding adjustment can be carried out along with the pose change of the substrate bearing table through the pose change of each scraper, and the scrapers can be attached to the surface of the substrate bearing table all the time, so that the substrate bearing table can adapt to the substrate bearing tables with different poses, the stable attachment of the bearing surface is realized, the cleaning effect is ensured, and the Dimple phenomenon is solved stably.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the provided drawings without creative efforts.
Fig. 1 is a schematic overall structure diagram of an embodiment of the present invention.
Fig. 2 is a front view of fig. 1.
Fig. 3 is a bottom view of fig. 2.
Fig. 4 is a sectional view taken along a-a in fig. 2.
FIG. 5 is a schematic view showing the cleaning operation of the squeegee on the surface of the substrate stage.
Wherein, in fig. 1-5:
the device comprises a mounting support-1, a spherical pair mechanism-2, a mandrel-3, a fixed support-4, a scraper-5, a sliding support-6, a limiting plate-7, a horizontal driving part-8, a vertical driving part-9 and an elastic part-10;
through hole-11, guide rail-12, connecting plate-21, ball bearing shell-22, centre of sphere-23, support cover-31, driving plate-81, pressure strip-91.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be obtained by a person skilled in the art without making any creative effort based on the embodiments in the present invention, belong to the protection scope of the present invention.
Referring to fig. 1, fig. 2, fig. 3, and fig. 4, fig. 1 is a schematic overall structure diagram of an embodiment of the present invention, fig. 2 is a front view of fig. 1, fig. 3 is a bottom view of fig. 2, and fig. 4 is a sectional view of a-a shown in fig. 2.
In a specific embodiment provided by the invention, the posture-adjustable cleaning device applied to the substrate bearing table mainly comprises an installation support 1, a spherical pair mechanism 2, a mandrel 3, a fixed support 4 and a scraper 5.
The mounting bracket 1 is a main structure of the cleaning apparatus, and is generally erected above the surface of the substrate supporting table, and is mainly used for mounting and supporting other components.
The spherical pair mechanisms 2 are connected to the bottom surface of the mounting bracket 1, and are generally arranged at the same time, so that spherical motion (namely pitching, rolling and yawing three-degree-of-freedom motion) can be generated.
The mandrels 3 are inserted in and connected with the respective spherical pair mechanisms 2 so as to maintain synchronous spherical motion with the respective spherical pair mechanisms 2. The fixed support 4 is connected to the end position of each mandrel 3 so as to keep synchronous spherical motion with the mandrels 3.
The scraper blade 5 is arranged on each fixed support 4, specifically is located the bottom surface of fixed support 4 to extend towards the substrate plummer, mainly used for butt the surface of substrate plummer, and scrape impurity such as particulate matter on substrate plummer surface through relative motion.
Thus, in the cleaning device with an adjustable pose applied to the substrate bearing table provided by the embodiment, because the scrapers 5 are arranged on the bottom surface of the fixed support 4, and the fixed support 4 is connected with the spherical pair mechanism 2 through the mandrel 3, when the spherical pair mechanism 2 generates spherical motion, each fixed support 4 and each scraper 5 can be respectively driven by each mandrel 3 to generate synchronous spherical motion, so that the pose of each scraper 5 is changed; therefore, when the pose of the substrate bearing table changes, the pose of each scraper 5 can be correspondingly adjusted along with the pose of the substrate bearing table through the pose change of each scraper, so that the scrapers 5 can be always attached to the surface of the substrate bearing table, the substrate bearing table can adapt to the substrate bearing tables with different poses, the bearing surfaces can be stably attached, the cleaning effect is guaranteed, and the double phenomenon is stably solved.
In consideration of the fact that the carrying surface of the substrate carrying table may have a large area, in order to improve the cleaning efficiency of the scraper 5 as the carrying surface, the sliding bracket 6 is added in the embodiment. Specifically, the sliding bracket 6 is disposed on the bottom surface of the mounting bracket 1 and can reciprocate along the length direction of the mounting bracket 1. Meanwhile, each spherical pair mechanism 2 is connected to the bottom surface of the sliding support 6. So set up, when sliding support 6 slided for installing support 1, the fixed bolster 4 and the scraper blade 5 that link to each other with each spherical pair mechanism 2 also all carry out simultaneous movement simultaneously to realize the translational motion of each scraper blade 5 on the loading face of base plate plummer, and then change the cleaning zone and the cleaning range of scraper blade 5.
As shown in fig. 5, fig. 5 is a schematic view showing the cleaning operation of the squeegee 5 on the surface of the substrate stage.
In view of the fact that the substrate carrier is generally circular, in order to improve the cleaning efficiency of the scrapers 5, in the present embodiment, the spherical pair mechanisms 2 are distributed on the bottom surface of the sliding bracket 6 along the length direction thereof, and at the same time, the fixed brackets 4 and the corresponding scrapers 5 are distributed on the bottom surface of the sliding bracket 6 along the length direction thereof. The number of the fixed brackets 4 is generally equal to the number of the spherical pair mechanisms 2, and the fixed brackets and the spherical pair mechanisms are in one-to-one correspondence, that is, one spherical pair mechanism 2 corresponds to one fixed bracket 4 and one scraper 5.
In general, the longitudinal direction of the slide holder 6 is generally a radial direction of the substrate stage when the cleaning operation is performed, and thus the cleaning range of the squeegee 5 can be spread over the entire carrying surface by the rotation of the substrate stage. Of course, to improve the cleaning range of the squeegee 5, the length of the squeegee 5 can be designed according to the radius of the bearing surface of the substrate bearing table, for example, the length of a single squeegee 5 is about half of the radius of the bearing surface, so that two squeegees 5 can be arranged at the same time to cover the entire bearing surface.
Further, when the scrapers 5 are provided in multiple pieces, in order to avoid interference between two adjacent scrapers 5 and generation of a missing gap, in the embodiment, two adjacent scrapers 5 are distributed in a staggered manner in the width direction of the sliding bracket 6, for example, one of the scrapers 5 is distributed on the left side of the width direction of the sliding bracket 6, and the other scraper 5 is distributed on the right side of the width direction of the sliding bracket 6. Meanwhile, the projections of the two adjacent scrapers 5 in the length direction of the sliding support 6 also have an overlapping region, that is, the two adjacent scrapers 5 are integrally distributed along the length direction of the sliding support 6, and are not butted end to end, but slightly overlapped end to end in the length direction, so that the gap region between the two adjacent scrapers 5 is not missed when the cleaning operation is performed through the overlapping part of the two adjacent scrapers 5.
In an alternative embodiment of the ball pair mechanism 2, the ball pair mechanism 2 essentially comprises a connecting plate 21, a ball bearing housing 22 and a ball center 23. Wherein the top of the connecting plate 21 is connected to the bottom surface of the sliding bracket 6, the ball bearing housing 22 is arranged on the surface of the connecting plate 21 facing inwards, the ball center 23 is arranged in the ball bearing housing 22 and can perform spherical motion in the ball bearing housing 22, and the whole ball bearing structure is formed. Meanwhile, the mandrel 3 is inserted into the ball bearing housing 22 and connected to the ball center 23. So set up, dabber 3 can realize the sphere through centre of sphere 23 smoothly and move.
Further, in order to improve the spherical motion stability and the structural strength of the mandrel 3, the supporting sleeve 31 is further sleeved on the outer end of the mandrel 3 in the embodiment.
In addition, in consideration of the limited range of the posture adjustment of the substrate bearing table, in order to avoid the careless occurrence of the excessive posture change of the scraper 5, the limiting plate 7 is additionally arranged in the embodiment. Specifically, the top end of the limiting plate 7 is connected to the bottom surface of the sliding support 6 and generally faces the spherical pair mechanism 2, and the bottom end of the limiting plate abuts against the side wall of the fixed support 4, so that the limiting plate is mainly used for limiting the pose adjustment range of the scraper 5 through the underframe of the fixed support 4.
In order to facilitate the relative movement between the sliding bracket 6 and the mounting bracket 1, a horizontal driving component 8 is added in the embodiment, and the horizontal driving component 8 can be a cylinder, an electric actuator, and the like. Specifically, the horizontal driving member 8 is disposed on the surface of the mounting bracket 1, and its output shaft extends and retracts in the horizontal direction, and the extending and retracting direction is parallel to the length direction of the mounting bracket 1. Accordingly, a through hole 11 is formed on the surface of the mounting bracket 1, and a driving plate 81 is connected to the output shaft of the horizontal driving part 8, the driving plate 81 penetrating the through hole 11 in the vertical direction and being connected to the top surface of the sliding bracket 6 at the bottom of the mounting bracket 1. So set up, when the output shaft of horizontal drive part 8 is flexible, will drive sliding support 6 through driving plate 81 and carry out synchronous concertina movement, and then slide relative installing support 1. Of course, since the driving plate 81 vertically penetrates through the through hole 11, in order to ensure that the driving plate 81 has a sufficient telescopic movement stroke, the through hole 11 is embodied as a long sliding hole extending along the length direction of the mounting bracket 1.
Further, in order to improve the motion stability of the sliding bracket 6, a guide rail 12 is additionally provided in the present embodiment. Specifically, the guide rail 12 is provided on the bottom surface of the mounting bracket 1 and extends along the length direction of the mounting bracket 1, and may be a sliding groove structure, and the top of the sliding bracket 6 is correspondingly embedded in the guide rail 12, so as to slide in the guide rail 12.
Moreover, for further promoting the scraping and cleaning effect of the scraper 5 on the particulate matter impurities on the surface of the substrate bearing table, the vertical driving component 9 is additionally arranged in the embodiment, and the general vertical driving component 9 can be a cylinder, an electric actuating mechanism and the like. Specifically, the vertical driving member 9 is erected above the surface of the mounting bracket 1, and the output end thereof extends and retracts in the vertical direction. Simultaneously, the bottom at the output of vertical drive part 9 is connected with pressure strip 91, and the bottom surface of this pressure strip 91 is towards the surface of installing support 1, mainly used and installing support 1's surface butt and compress tightly under vertical drive part 9's drive, and then compress tightly whole installing support 1 and each scraper blade 5 on it for the bottom surface of scraper blade 5 closely laminates with the surface of base plate plummer, avoids omitting the less particulate matter of particle diameter when striking off the washing.
Furthermore, in order to enhance the pressing effect of the vertical driving part 9 on the scraper 5, an elastic part 10 is added in the embodiment. Specifically, the elastic members 10 are connected between the top surface of each of the fixed brackets 4 and the bottom surface of the sliding bracket 6, and are distributed in the vertical direction, and are mainly used for enhancing the pressing force of the squeegee 5 against the surface of the substrate stage by the elastic force when receiving the vertical pressing force of the vertical driving part 9.
The previous description of the disclosed embodiments is provided to enable any person skilled in the art to make or use the present invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the generic principles defined herein may be applied to other embodiments without departing from the spirit or scope of the invention. Thus, the present invention is not intended to be limited to the embodiments shown herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.
Claims (7)
1. The pose-adjustable cleaning device is applied to a substrate bearing table and is characterized by comprising an installation support (1) erected above the surface of the substrate bearing table, a plurality of spherical pair mechanisms (2) connected to the bottom surface of the installation support (1), a plurality of mandrels (3) inserted into the spherical pair mechanisms (2) and synchronously moving in a spherical manner with the spherical pair mechanisms, a fixed support (4) connected to the tail end of each mandrel (3), and a plurality of scraping plates (5) arranged on the bottom surface of each fixed support (4) and extending towards the substrate bearing table;
the spherical pair mechanism is characterized by further comprising a sliding support (6) which is slidably arranged on the bottom surface of the mounting support (1), the sliding direction of the sliding support (6) is parallel to the length direction of the mounting support (1), and each spherical pair mechanism (2) is connected to the bottom surface of the sliding support (6);
the spherical pair mechanisms (2) are distributed on the bottom surface of the sliding support (6) along the length direction of the sliding support, and the fixed supports (4) and the scrapers (5) are distributed on the bottom surface of the sliding support (6) along the length direction of the sliding support;
the adjacent two scrapers (5) are in staggered distribution in the width direction of the sliding support (6), the projections of the adjacent two scrapers (5) in the length direction of the sliding support (6) are overlapped, and when cleaning operation is carried out, one of the scrapers (5) is distributed along the radial direction of the substrate bearing table, so that the gap area of the adjacent two scrapers (5) cannot be omitted when the surface of the substrate bearing table is cleaned through the overlapped area.
2. The cleaning device applied to the substrate bearing table in the claim 1 is characterized in that the spherical pair mechanism (2) comprises a connecting plate (21) connected with the bottom surface of the sliding support (6), a ball bearing shell (22) arranged on the surface of the connecting plate (21), and a spherical center (23) arranged in the ball bearing shell (22), and the mandrel (3) is inserted in the ball bearing shell (22) and connected with the spherical center (23).
3. The cleaning device applied to the substrate carrier table in accordance with claim 1, wherein a position limiting plate (7) for abutting against each of the fixing brackets (4) and limiting a range of motion of each of the squeegees (5) is further attached to a bottom surface of the slide bracket (6).
4. The cleaning device with the adjustable pose applied to the substrate bearing table according to claim 1, further comprising a horizontal driving component (8) which is arranged on the surface of the mounting support (1) and used for driving each scraper (5) to translate along the length direction of the scraper, wherein a through hole (11) is formed in the surface of the mounting support (1), and an output shaft of the horizontal driving component (8) is connected with the top surface of the sliding support (6) through a driving plate (81) which vertically penetrates through the through hole (11).
5. The cleaning device with the adjustable pose applied to the substrate bearing table according to claim 4, wherein a guide rail (12) extending along the length direction of the mounting bracket (1) is arranged on the bottom surface of the mounting bracket, and the top of the sliding bracket (6) is slidably embedded in the guide rail (12).
6. The cleaning device with adjustable posture applied to the substrate carrier table according to claim 1, further comprising a vertical driving member (9) erected above the surface of the mounting bracket (1) for driving each of the scrapers (5) to press the surface of the substrate carrier table, and an output end of the vertical driving member (9) abuts against the surface of the mounting bracket (1) through a pressing plate (91).
7. The cleaning device applied to the substrate carrier table in accordance with claim 6, wherein an elastic member (10) is connected between the top surface of each of the fixing brackets (4) and the bottom surface of the sliding bracket (6).
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CN202111509815.9A CN114192454B (en) | 2021-12-10 | 2021-12-10 | Be applied to adjustable position appearance belt cleaning device of base plate plummer |
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CN202111509815.9A CN114192454B (en) | 2021-12-10 | 2021-12-10 | Be applied to adjustable position appearance belt cleaning device of base plate plummer |
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CN114192454B true CN114192454B (en) | 2022-08-12 |
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CN201455770U (en) * | 2009-06-19 | 2010-05-12 | 上海中晶企业发展有限公司 | Plastic plate dressing device for ring-like polishing machine |
CN104492780A (en) * | 2014-12-16 | 2015-04-08 | 苏州光宝康电子有限公司 | Adjusting mechanism of scraper for LCD (liquid crystal display) production |
CN213223373U (en) * | 2020-07-31 | 2021-05-18 | 天津市金桥焊材集团股份有限公司 | Be used for fatlute cleaning device |
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CN203155587U (en) * | 2012-12-31 | 2013-08-28 | 广东风华高新科技股份有限公司 | Film-scraping cleaning machine |
CN106379052B (en) * | 2016-11-17 | 2018-01-19 | 重庆强大巴郡知识产权服务有限公司 | Ceramic tile printing device |
KR20180119766A (en) * | 2017-04-26 | 2018-11-05 | 라룩스코리아 | Automatic scraper table management system and method |
CN108673432A (en) * | 2018-05-28 | 2018-10-19 | 徐州迈斯特机械科技有限公司 | A kind of machine-building workbench |
CN111874629A (en) * | 2020-07-30 | 2020-11-03 | 安徽建科节能建材有限公司 | Material receiving and transferring auxiliary tool for high-temperature strengthening process of toughened glass |
CN113666330A (en) * | 2021-07-14 | 2021-11-19 | 何海涛 | Laser radar silicon substrate etching processing device based on MEMS method |
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2021
- 2021-12-10 CN CN202111509815.9A patent/CN114192454B/en active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN201455770U (en) * | 2009-06-19 | 2010-05-12 | 上海中晶企业发展有限公司 | Plastic plate dressing device for ring-like polishing machine |
CN104492780A (en) * | 2014-12-16 | 2015-04-08 | 苏州光宝康电子有限公司 | Adjusting mechanism of scraper for LCD (liquid crystal display) production |
CN213223373U (en) * | 2020-07-31 | 2021-05-18 | 天津市金桥焊材集团股份有限公司 | Be used for fatlute cleaning device |
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Denomination of invention: An adjustable pose cleaning device applied to substrate bearing platform Effective date of registration: 20231022 Granted publication date: 20220812 Pledgee: China Merchants Bank Co.,Ltd. Jiaxing Branch Pledgor: Zhejiang Xinhui Equipment Technology Co.,Ltd. Registration number: Y2023330002404 |