CN114073459B

CN114073459B - Control method of cleaning base station, cleaning base station and cleaning system

Info

Publication number: CN114073459B
Application number: CN202110802124.1A
Authority: CN
Inventors: 翟泽; 钟艳
Original assignee: Zhejiang Shaoxing Supor Domestic Electrical Appliance Co Ltd
Current assignee: Zhejiang Shaoxing Supor Domestic Electrical Appliance Co Ltd
Priority date: 2021-07-15
Filing date: 2021-07-15
Publication date: 2023-02-28
Anticipated expiration: 2041-07-15
Also published as: CN114073459A

Abstract

The application provides a control method of a cleaning base station, the cleaning base station and a cleaning system. The cleaning base station can acquire first contamination data in a memory of the cleaning device via the electrical connection. The cleaning base station may determine a first target contamination level of the cleaning device from the first contamination data based on the first mapping relationship. The cleaning base station may determine the first target cleaning mode through the second mapping relationship after determining the first target contamination level of the cleaning member. The cleaning base station can determine the execution equipment in the first target cleaning mode and the corresponding control parameters thereof according to the first target cleaning mode and the first target pollution level. And the cleaning base station controls the corresponding execution equipment to clean the cleaning equipment according to the control parameters. The method improves the cleaning effect of the cleaning piece and improves the utilization rate of the clean water.

Description

Control method of cleaning base station, cleaning base station and cleaning system

Technical Field

The present application relates to the field of device control, and in particular, to a control method for a cleaning base station, and a cleaning system.

Background

With the development of science and technology, the types and functions of cleaning equipment are more and more complete. Cleaning of the cleaning device after use is a step that cannot be bypassed during use of the cleaning device. Therefore, the use efficiency of the cleaning equipment can be effectively improved by improving the cleaning efficiency of the cleaning equipment.

At present, for some cleaning devices which can be used together with a cleaning base station, the cleaning base station can also be used for cleaning the cleaning devices. For example, when the cleaning device is placed on a cleaning base station, the cleaning base station can be cleaned by a preset program by spraying water to the mop, controlling the floor to rotate and scrape, and the like.

However, the cleaning method for cleaning the base station is generally single. Regardless of the degree of contamination to which the cleaning device is exposed, the cleaning station typically initiates the same cleaning procedure to complete the cleaning of the cleaning device. The cleaning method for cleaning the base station has the problems of low cleaning efficiency and high clear water consumption during cleaning.

Disclosure of Invention

The application provides a control method for a cleaning base station, the cleaning base station and a cleaning system, which are used for solving the problem that the cleaning efficiency of the cleaning base station is low in the prior art.

In a first aspect, the present application provides a control method for cleaning a base station, the method including:

when a self-cleaning instruction is received, acquiring first pollution data collected by a cleaning device in a cleaning process, wherein the cleaning device is used for cleaning;

determining a first target pollution level of the cleaning equipment according to a first mapping relation between the first pollution data and the pollution level;

determining the first target cleaning mode according to a second mapping relation between the first target pollution level and the cleaning mode;

controlling a cleaning assembly of a cleaning base station to wash the cleaning device in the first target cleaning mode.

In the application, by selecting the first target cleaning mode, cleaning pieces with different pollution levels can be cleaned to different degrees, so that the cleaning effect of the cleaning pieces is improved. Meanwhile, different cleaning modes are used for cleaning pieces with different pollution levels, unnecessary water consumption is avoided, and the utilization rate of clean water is improved.

Optionally, the first contamination data comprises at least one of the following data items:

the cleaning device comprises accumulated use time of the cleaning device from the end of the last washing to the current time, use power of the cleaning device in the last cleaning process, image data of a cleaning object of the cleaning device in the last cleaning process, and position data of the cleaning object of the cleaning device in the last cleaning process.

Optionally, the first contamination data includes at least two of the following items: the accumulated usage duration, the usage power, the image data, and the location data;

determining a first target pollution level of the cleaning device according to a first mapping relationship between the first pollution data and the pollution level, including:

determining a pollution level corresponding to each data item according to a first mapping relation between each data item in the first pollution data and the pollution level;

and determining a first target pollution level according to the pollution level of each data item and the preset priority of each data item.

In the present application, the first target contamination level of the cleaning members is determined by priority. Furthermore, the cleaning base station can execute different degrees of cleaning according to the first target pollution level, and the cleaning effect of the cleaning piece is improved.

Optionally, the determining a first target pollution level according to the pollution level of each data item and the preset priority of each data item includes:

determining a first pollution level of the data item with the highest priority according to the preset priority of each data item, and judging whether the first pollution level is higher than the pollution levels of other data items, wherein the difference value of the weighted average of the first pollution level and the pollution levels of other data items is greater than a first preset value;

if so, taking the first pollution level as the first target pollution level;

if not, acquiring a second pollution level corresponding to the data item with the lowest priority, judging whether the second pollution level is lower than the pollution levels of other data items, and the difference value of the weighted average value of the second pollution level and the pollution levels of other data items is larger than a second preset value, if so, rejecting the data item corresponding to the second pollution level, determining a first target pollution level according to the weighted average value of the pollution levels corresponding to the remaining data items, and if not, determining the first target pollution level according to the weighted average value of the pollution levels corresponding to the data items, wherein the preset priority of each data item is positively correlated with the weighting coefficient.

In the present application, by using the priority, the accuracy of the first target contamination level is improved, thereby improving the cleaning effect of the cleaning member.

Optionally, the cleaning modes comprise a spray cleaning and/or a soak cleaning, each cleaning mode corresponding to at least one contamination level.

Optionally, when the cleaning mode includes spray cleaning, determining the first target cleaning mode according to a second mapping relationship between the first target contamination level and the cleaning mode specifically includes:

determining water injection information of at least one water injection pump of the cleaning base station according to the first target cleaning mode and the first target pollution level, wherein the water injection information comprises at least one of water injection duration, water injection pressure and water injection frequency, and each water injection pump is connected with one or more water injection ports;

and controlling the water injection pump to inject water through a water injection port connected with the water injection pump according to the water injection information, and cleaning the cleaning equipment.

In this application, through controlling the water injection pump, realized the washing that sprays of cleaning member, improved the cleaning performance of cleaning member to the utilization ratio of clear water has been improved through the mode that sprays.

Optionally, the method further includes:

determining first control information of a first motor of the cleaning equipment according to the first target cleaning mode and the first target pollution level, wherein the first control information comprises at least one of the rotating speed, the rotating direction, the rotating time length and the rotating frequency of the first motor, and the first motor is used for controlling the cleaning piece of the cleaning equipment to rotate;

according to the first control information of the first motor, the first motor is controlled to drive the cleaning piece of the cleaning equipment to rotate in the spraying and cleaning process, and the cleaning piece of the cleaning equipment is cleaned by matching with the water injection pump.

In this application, use water injection pump and first motor through the cooperation, make the cleaning member can be more even by the washing, simultaneously, make the cleaning member can improve clean efficiency through spin-drying repeatedly in clean process.

Optionally, when the cleaning mode includes soaking and cleaning, determining the first target cleaning mode according to the second mapping relationship between the first target contamination level and the cleaning mode specifically includes:

determining second control information of a second motor of the cleaning base station according to the first target cleaning mode and the first target pollution level, wherein the second control information comprises at least one of the rotating speed, the rotating direction, the rotating time length and the rotating frequency of the second motor, and the second motor is used for controlling a cleaning assembly of the cleaning base station to clean the cleaning equipment in a soaking state;

and controlling the second motor to drive the cleaning assembly to clean the cleaning equipment in a soaking state according to the second control information of the second motor.

In this application, through controlling the second motor, realized soaking washing of cleaning member, improved the cleaning performance of cleaning member through the mode of soaking.

Optionally, acquiring the water level of the reservoir of the cleaning assembly through a water level sensor of the cleaning assembly;

and when the water level reaches a preset water level, starting the second motor.

In this application, through using level sensor, make to soak and wash and can begin when the water level of cistern reaches predetermineeing the water level, guaranteed that cleaning member can fully soak in aqueous in the cleaning process, improved the cleaning performance.

Optionally, after controlling the cleaning assembly to wash the cleaning device in the first target cleaning mode, the method further comprises:

acquiring second pollution data of the cleaned sewage through water quality detection equipment of the cleaning assembly;

determining a second pollution level of the cleaning equipment according to a third mapping relation between the second pollution data and the pollution level;

determining a second target cleaning mode according to the second pollution level and the second mapping relation;

controlling the cleaning assembly to wash the cleaning device in the second target cleaning mode.

In this application, acquire the pollution level of washing back sewage every time, ensure when stopping to wash, this cleaning member reaches anticipated cleaning performance, has improved the cleaning performance of cleaning member.

Optionally, the acquiring of the pollution data collected by the cleaning device in the cleaning process specifically includes:

and acquiring pollution data collected by the cleaning equipment in the cleaning process when a self-cleaning instruction is received.

Optionally, before acquiring the pollution data collected by the cleaning device during the cleaning process when the self-cleaning instruction is received, the method further comprises at least one of the following:

responding to the pressing operation of a self-cleaning key, and generating a self-cleaning instruction according to the pressing operation;

generating the self-cleaning instructions upon detecting that the cleaning apparatus is located on the cleaning base station;

when the cleaning equipment is positioned on the cleaning base station and the accumulated use time of the cleaning equipment from the last cleaning to the current time reaches a preset time, generating the self-cleaning instruction;

and when the cleaning equipment is positioned on the cleaning base station and the accumulated use times of the cleaning equipment from the last cleaning to the current time reaches a preset time, generating the self-cleaning instruction.

In the application, the self-cleaning mode is started by acquiring the self-cleaning instruction, so that the cleaning efficiency of the cleaning equipment is improved, the user experience is improved, and the automation degree of the product is improved.

In a second aspect, the present application provides a control apparatus for cleaning a base station, the apparatus comprising:

the cleaning device comprises a first acquisition module, a second acquisition module and a control module, wherein the first acquisition module is used for acquiring first pollution data collected by a cleaning device in a cleaning process when a self-cleaning instruction is received, and the cleaning device is used for cleaning;

the first determining module is used for determining a first target pollution level of the cleaning equipment according to a first mapping relation between the first pollution data and the pollution level;

the second determination module is used for determining the first target cleaning mode according to a second mapping relation between the first target pollution level and the cleaning mode;

the first control module is used for controlling a cleaning assembly of the cleaning base station to clean the cleaning equipment in the first target cleaning mode.

the first determining module specifically includes:

the first determining submodule is used for determining the pollution level corresponding to each data item according to the first mapping relation between each data item in the first pollution data and the pollution level;

and the second determining submodule is used for determining a first target pollution level according to the pollution level of each data item and the preset priority of each data item.

Optionally, the second determining sub-module is specifically configured to determine, according to the preset priority of each data item, a first pollution level of the data item with the highest priority, and determine whether the first pollution level is higher than pollution levels of other data items, where a difference between the first pollution level and a weighted average of pollution levels of other data items is greater than a first preset value; if so, taking the first pollution level as the first target pollution level; if not, acquiring a second pollution level corresponding to the data item with the lowest priority, judging whether the second pollution level is lower than the pollution levels of other data items, and the difference value of the weighted average value of the second pollution level and the pollution levels of other data items is larger than a second preset value, if so, rejecting the data item corresponding to the second pollution level, determining a first target pollution level according to the weighted average value of the pollution levels corresponding to the remaining data items, and if not, determining the first target pollution level according to the weighted average value of the pollution levels corresponding to the data items, wherein the preset priority of each data item is positively correlated with the weighting coefficient.

Optionally, when the cleaning mode includes spray cleaning, the determining, according to the second determining module, specifically includes:

a third determining submodule, configured to determine water injection information of at least one water injection pump of the cleaning base station according to the first target cleaning mode and the first target pollution level, where the water injection information includes at least one of water injection duration, water injection pressure, and water injection frequency, and each water injection pump is connected to one or more water injection ports;

and the first control submodule is used for controlling the water injection pump to inject water through a water injection port connected with the water injection pump according to the water injection information and cleaning the cleaning equipment.

Optionally, the apparatus further comprises:

a fourth determining submodule, configured to determine first control information of a first motor of the cleaning device according to the first target cleaning mode and the first target pollution level, where the first control information includes at least one of a rotation speed, a rotation direction, a rotation duration, and a rotation frequency of the first motor, and the first motor is used to control a cleaning member of the cleaning device to rotate;

and the second control submodule is used for controlling the first motor to drive the cleaning piece of the cleaning equipment to rotate in the spraying and cleaning process according to the first control information of the first motor, and the cleaning piece of the cleaning equipment is cleaned by matching with the water injection pump.

Optionally, when the cleaning mode includes soaking and cleaning, the second determining module specifically includes:

a fifth determining submodule, configured to determine second control information of a second motor of the cleaning base station according to the first target cleaning mode and the first target pollution level, where the second control information includes at least one of a rotation speed, a rotation direction, a rotation duration, and a rotation frequency of the second motor, and the second motor is configured to control a cleaning assembly of the cleaning base station to clean the cleaning device in a soaking state;

and the third control sub-module is used for controlling the second motor to drive the cleaning component to clean the cleaning equipment in a soaking state according to the second control information of the second motor.

Optionally, the apparatus further comprises:

the acquisition submodule is used for acquiring the water level of a reservoir of the cleaning assembly through a water level sensor of the cleaning assembly;

and the starting module is used for starting the second motor when the water level reaches a preset water level.

Optionally, the apparatus further comprises:

the second acquisition module is used for acquiring second pollution data of the cleaned sewage through the water quality detection equipment of the cleaning assembly;

the third determining module is used for determining a second pollution level of the cleaning equipment according to a third mapping relation between the second pollution data and the pollution level;

a fourth determining module, configured to determine a second target cleaning mode according to the second pollution level and the second mapping relationship;

and the second control module is used for controlling the cleaning assembly to clean the cleaning equipment in the second target cleaning mode.

Optionally, upon receiving a self-cleaning instruction, the apparatus further comprises: a trigger module, the trigger module comprising at least one of:

In a third aspect, the present application provides a cleaning base station, including a cleaning component, a memory, and a processor, where the processor is connected to the cleaning component and the memory respectively;

the processor is configured to execute the method for controlling a cleaning base station according to the computer program stored in the memory of the first aspect and any one of the possible designs of the first aspect.

In a fourth aspect, the present application provides a cleaning system comprising: the cleaning base station and the cleaning device as in the second aspect and any one of the possible designs of the second aspect, wherein the cleaning base station has a washing assembly for receiving the cleaning device and washing the cleaning device.

In a fifth aspect, the present application provides a readable storage medium having stored therein a computer program which, when executed by at least one processor of a cleaning base station, causes the processor to perform the method of controlling a cleaning base station of the first aspect and any one of the possible designs of the first aspect.

In a sixth aspect, the present application provides a computer program product comprising a computer program which, when executed by at least one processor of a cleaning base station, causes the processor to carry out the method of controlling a cleaning base station of the first aspect as well as any one of the possible designs of the first aspect.

According to the control method for the cleaning base station, first pollution data in a storage of the cleaning equipment are obtained; determining a first target pollution level of the cleaning device according to the first pollution data based on the first mapping relation; determining a first target cleaning mode according to the first target pollution level and the second mapping relation; determining execution equipment in the first target cleaning mode and corresponding control parameters thereof according to the first target cleaning mode and the first target pollution level; and controlling the corresponding execution equipment to carry out cleaning on the cleaning equipment according to the control parameters, so that the cleaning pieces with different pollution levels can carry out cleaning in different degrees, and the cleaning effect of the cleaning pieces is improved. Meanwhile, different cleaning modes are used for cleaning pieces with different pollution levels, unnecessary water consumption is avoided, and the utilization rate of clean water is improved.

Drawings

In order to more clearly illustrate the technical solutions in the present application or prior art, the drawings used in the embodiments or the description of the prior art are briefly described below, and it is obvious that the drawings in the following description are some embodiments of the present application, and it is obvious for those skilled in the art to obtain other drawings without creative efforts.

Fig. 1 is a schematic view of a cleaning base station and a cleaning apparatus according to an embodiment of the present disclosure;

fig. 2 is a flowchart of a control method for cleaning a base station according to an embodiment of the present application;

fig. 3 is a flowchart of a control method for cleaning a base station according to an embodiment of the present application;

fig. 4 is a flowchart of a control method for cleaning a base station according to an embodiment of the present application;

fig. 5 is a schematic structural diagram of a control device for cleaning a base station according to an embodiment of the present disclosure;

fig. 6 is a schematic hardware structure diagram of a clean base station according to an embodiment of the present disclosure;

fig. 7 is a schematic structural diagram of a cleaning system according to an embodiment of the present application.

Reference numerals

1: cleaning the base station; 11: a cleaning assembly; 12: a first metal spring sheet;

2: cleaning equipment; 21: a cleaning member; 22: a pipe body; 23: and a second metal elastic sheet.

Detailed Description

To make the purpose, technical solutions and advantages of the present application clearer, the technical solutions in the present application will be clearly and completely described below with reference to the drawings in the present application, and it is obvious that the described embodiments are some, but not all embodiments of the present application. All other embodiments obtained by a person of ordinary skill in the art based on the embodiments in the present application without making any creative effort belong to the protection scope of the present application.

The terms "first," "second," "third," "fourth," and the like in the description and in the claims of the present application and in the above-described drawings are used for distinguishing between similar elements and not necessarily for describing a particular sequential or chronological order. It will be appreciated that the data so used may be interchanged where appropriate. For example, first information may also be referred to as second information, and similarly, second information may also be referred to as first information, without departing from the scope herein.

The word "if," as used herein, may be interpreted as "at … …" or "at … …" or "in response to a determination," depending on the context.

Also, as used herein, the singular forms "a", "an" and "the" are intended to include the plural forms as well, unless the context indicates otherwise.

It will be further understood that the terms "comprises," "comprising," "includes" and/or "including," when used in this specification, specify the presence of stated features, steps, operations, elements, components, items, species, and/or groups, but do not preclude the presence, or addition of one or more other features, steps, operations, elements, components, items, species, and/or groups thereof.

The terms "or" and/or "as used herein are to be construed as inclusive or meaning any one or any combination. Thus, "A, B or C" or "A, B and/or C" means "any of the following: A. B. C. a and B. A and C. B and C. A. B and C ". An exception to this definition will occur only when a combination of elements, functions, steps or operations are inherently mutually exclusive in some way.

At present, to some cleaning devices that can cooperate clean basic station to use, control a plurality of outlet holes and spray water to cleaning member (for example rag) to control a plurality of floor and scrape cleaning member, only can wash the spot on cleaning member surface, have the relatively poor problem of cleaning effect to cleaning member. In the present application, the inventors have proposed a method of determining a first target cleaning pattern of a cleaning assembly based on contamination data of cleaning members, taking into account the water consumption during cleaning of the cleaning members, and the need to improve the cleaning effect of the cleaning members. Wherein, the cleaning assembly is a cleaning device installed on the cleaning base station. The cleaning assembly is used for cleaning a cleaning device. Wherein the cleaning piece is a component on the cleaning equipment. The second cleaning member may be a mop, a power mop, a vacuum cleaner or the like. This application makes the cleaning member can be when being in different pollution degree, and the washing of different degrees is carried out to the correspondence through using the clean mode of first target of clean basic station automatic selection to improve cleaning efficiency. Meanwhile, the selection of the first target cleaning mode directly correlates the water consumption when cleaning the cleaning piece with the pollution level of the cleaning piece, avoids unnecessary water consumption, and realizes the control of water consumption.

The technical solution of the present application will be described in detail below with specific examples. The following several specific embodiments may be combined with each other, and details of the same or similar concepts or processes may not be repeated in some embodiments.

Fig. 1 shows a scene schematic diagram of a cleaning base station and a cleaning device provided by an embodiment of the present application. As shown in fig. 1, the cleaning apparatus 2 may be placed on a cleaning base station 1.

The cleaning device 2 may be, among other things, a device commonly used for cleaning, such as a mop, a power mop, a vacuum cleaner, etc. At least one cleaning member 21 may be included in the cleaning apparatus. Wherein, the cleaning piece 21 is a component for cleaning on the cleaning device 2 and is positioned at the bottom of the cleaning device. The cleaning element 21 may be a mop swab of an electric mop, a roller brush of a vacuum cleaner, etc. When the cleaning elements 21 are mops, the cleaning device 2 may comprise one or more mops, i.e. may comprise one or more cleaning elements 21. The cleaning device 2 may also include a memory and a processor. Wherein the processor is configured to execute the cleaning method of the cleaning device 2 according to the cleaning instruction when the user performs cleaning using the cleaning device 2. Wherein the memory is used for storing cleaning instructions and for storing contamination data generated by the cleaning device 2 during the cleaning process.

Wherein the cleaning base station 1 may comprise a cleaning assembly 11 therein. Wherein the cleaning assembly 11 may comprise a cleaning tank. When the cleaning device 2 is placed in the cleaning base station 1, the cleaning members 21 are placed in the cleaning assembly 11. For example, when the cleaning device 2 is a vacuum cleaner, the cleaning member 21 is a roll brush of the vacuum cleaner. When the cleaner is placed in the cleaning station 1, the rolling brush can be placed in the cleaning tank of the cleaning assembly. The cleaning base station 1 can be used to clean the cleaning device 2 and to house the cleaning device 2.

When the cleaning device 2 is placed in the cleaning base station 1, the accommodating groove of the cleaning base station 1 is clamped with the pipe body 22 of the cleaning device 2. The clamping position is provided with a first metal elastic sheet 12 and a second metal elastic sheet 23. The first metal dome 12 is located on the clean base station 1, and the second metal dome 23 is located on the surface of the pipe body 22. When the first metal dome 12 and the second metal dome 23 are in contact, the cleaning base station 1 and the cleaning device 2 can be electrically connected.

In the present application, the cleaning base station is taken as an execution subject, and the control method of the cleaning base station in the following embodiment is executed. Specifically, the execution subject may be a hardware device of the clean base station, or a software application implementing the following embodiments in the clean base station, or a computer readable storage medium installed with the software application implementing the following embodiments, or code of the software application implementing the following embodiments.

Fig. 2 shows a flowchart of a control method for cleaning a base station according to an embodiment of the present application. On the basis of the embodiment shown in fig. 1, as shown in fig. 2, with a clean base station as an execution subject, the method of this embodiment may include the following steps:

s101, when a self-cleaning instruction is received, first pollution data collected by a cleaning device in a cleaning process are acquired, and the cleaning device is used for cleaning.

In this embodiment, when self-cleaning is initiated, the cleaning apparatus and the cleaning base station are necessarily in an electrically connected state as shown in FIG. 1. Specifically, the cleaning device and the cleaning base station are electrically connected through the metal elastic sheet. The cleaning base station can acquire first contamination data in a memory of the cleaning device via the electrical connection.

In one example, the first contamination data stored in the memory of the cleaning device may be data generated by the cleaning device during a cleaning process. For example, the data item of the first contamination data may be a cumulative usage time period of the cleaning device from the end of the last washing to the present time, a usage power of the cleaning device during the last cleaning, image data of the cleaning object of the cleaning device during the last cleaning, position data of the cleaning object of the cleaning device during the last cleaning, and the like.

S102, determining a first target pollution level of the cleaning equipment according to a first mapping relation between the first pollution data and the pollution level.

In this embodiment, after the clean base station acquires the first pollution data, different processing methods may be determined for different first pollution data. The processing method may include different calculation modes or different mapping relationships. The cleaning base station may determine a first target contamination level of the cleaning device from the first contamination data based on the first mapping relationship. The first target contamination level may be used to represent a degree of contamination of a cleaning member of the cleaning apparatus. Wherein the contamination level can index the degree of contamination of the cleaning elements. Specifically, the pollution level can be divided into multiple levels according to actual needs. For example, the pollution levels may include high, medium, and low levels. Alternatively, the contamination levels may include 12 contamination levels from a mild level 1 to a severe level 12.

In one implementation, when the first pollution data acquired by the cleaning base station only includes one data item, the cleaning base station may use different mapping relationships to implement mapping to the pollution level for different data items of the first pollution data.

For example, when the first pollution data is a cumulative usage time of the cleaning apparatus from the last washing end to the current time, the first mapping may be used to represent a mapping between the cumulative usage time and a pollution level. For example, when the cumulative usage period is longer than 10 hours, the pollution level is high. When the cumulative use time is 5 to 10 hours, the pollution level is medium. When the cumulative use period is less than 5 hours, the pollution level is low.

For another example, when the first contamination data is the power usage of the cleaning device during the last cleaning process, the power usage may be a series of data points sampled according to the preset sampling frequency in time series. The cleaning base station can calculate parameters such as average use power, maximum use power, minimum use power and total use power of the cleaning equipment in the last cleaning process according to the series of practical powers. The first mapping may implement a mapping to a pollution level based on one or more of the parameters described above. For example, the first mapping may map the pollution level according to the average power usage. Alternatively, the first mapping relation may map the pollution level according to the maximum power usage and the average power usage.

As another example, when the first contamination data is image data of a cleaning object in the last cleaning process of the cleaning apparatus, the image data may be image data of the floor surface. The cleaning base station extracts image features from the image data of the ground, and then first pollution data of the ground are obtained through analysis and calculation. The first mapping relationship may be used to map a pollution level from the first pollution data. Since the degree of contamination of the cleaning member is also high after the cleaning device has finished cleaning the floor surface when the degree of contamination of the floor surface is high, the level of contamination of the floor surface can be equal to the level of contamination of the cleaning member. And the cleaning base station extracts image features from the image data of the ground, and then analyzes and calculates to obtain the type of the ground. Such as ceramic tiles, wood floors, concrete floors, carpets, etc. The first mapping relationship may be used to map different pollution levels according to different ground types. For example, cement floors are generally dusty and, therefore, the corresponding pollution level of the cement floors is high.

For another example, when the first contamination data is position data of the cleaning object during the last cleaning process by the cleaning apparatus, the position data may be used to indicate different areas cleaned by the cleaning apparatus. In the process, the user needs to input the floor plan in advance. When the cleaning base station acquires the position data, the cleaning base station may determine an area corresponding to the position data according to a previously input user profile. The first mapping relation is used for determining the corresponding pollution degree according to different areas. For example, when the area is a kitchen, the corresponding pollution level is high.

In another implementation manner, when the first pollution data acquired by the clean base station includes at least two data items, the clean base station may determine the first target pollution level according to the following steps:

step 1, the cleaning base station determines the pollution level corresponding to each data item according to the first mapping relation between each data item in the first pollution data and the pollution level.

And 2, determining a first target pollution level by the clean base station according to the pollution level of each data item and the preset priority of each data item.

In this step, the cleaning base station stores the preset priority of each data item in advance. The predetermined priority may be the ordering of the various data items. For example, when the data items include the accumulated usage time period, the usage power, the image data, and the location data, the priorities thereof may be ranked from high to low as the accumulated usage time period, the usage power, the image data, and the location data. In one approach, the cleaning base station may directly determine the pollution level of the data item with the highest priority as the first target pollution level. However, the calculated priorities of different data items may be different, and only the pollution level of the data item with the highest priority is used, so that the problem of imprecise and inaccurate results exists. Thus, the clean base station may specifically implement the calculation of the first target pollution level based on the priority by:

and 2.1, the clean base station determines a first pollution level of the data item with the highest priority according to the preset priority of each data item. The clean base station may compare the first pollution level with the pollution levels of the other data items according to preset conditions. Wherein the first comparison condition may be to determine whether the first pollution level is higher than the pollution levels of the other data items. The second comparison condition may be configured to determine whether a difference between the first pollution level and the weighted average is greater than a first preset value after calculating the weighted average of the pollution levels of the other data items. Wherein the weight of the pollution level of the other data items can be determined according to reality. For example, when the other data items include the use power, the image data, and the position data, the weight thereof may be 1. Wherein, the first preset value may be an empirical value. When the difference between the first pollution level and the weighted average is greater than a first preset value, it may be determined that the first pollution level is much greater than the other pollution levels. When cleaning the cleaning member according to the contamination level, the cleaning member can be surely washed.

And 2.2, if the first pollution level meets the first comparison condition and the second comparison condition, taking the first pollution level as a first target pollution level by the cleaning base station.

And 2.3, if the first pollution level does not meet the first comparison condition and/or the second comparison condition, the cleaning base station acquires a second pollution level corresponding to the data item with the lowest priority. And the cleaning base station judges whether the second pollution level meets the first comparison condition and the second comparison condition. And when the second pollution level meets the first comparison condition and the second comparison condition, the cleaning base station rejects the data items corresponding to the second pollution level, and determines a first target pollution level according to the weighted average of the pollution levels corresponding to the remaining data items. And when the second pollution level does not meet the first comparison condition and/or the second comparison condition, the cleaning base station determines a first target pollution level according to the weighted average of the pollution levels corresponding to the data items. Wherein the preset priority of each data item is positively correlated with the weighting coefficient.

S103, determining a first target cleaning mode according to a second mapping relation between the first target pollution level and the cleaning mode.

In this embodiment, the cleaning base station may determine the first target cleaning mode through the second mapping relationship after determining the first target contamination level of the cleaning member. Wherein the second mapping relationship includes a plurality of cleaning modes.

In one example, the cleaning modes include spray cleaning, soak cleaning, spray cleaning, and soak cleaning. Wherein each cleaning mode corresponds to at least one contamination level. For example, when the contamination level includes 12 stages, stages 1 to 4 may correspond to spray cleaning, stages 5 to 8 may correspond to soak cleaning, and stages 9 to 12 may correspond to spray cleaning and soak cleaning. The spray cleaning and the soak cleaning may specifically include a cooperation mode in which the spray cleaning is performed first and then the soak cleaning is performed in the cleaning mode, the spray cleaning is performed after the soak cleaning is performed in the cleaning mode, and the spray cleaning and the soak cleaning are performed alternately for a plurality of times in the cleaning mode.

In a first implementation manner, when the first target cleaning mode includes spray rinsing, the cleaning assembly may further include at least one water injection port and at least one water injection pump. Each water injection pump is connected with one or more water injection ports. The cleaning base station may also determine a control parameter in the first target cleaning mode according to the first target cleaning mode and the first target pollution level. For example, when the first target cleaning mode is the shower cleaning, the control parameters may include a water injection time period and a water injection pressure. The cleaning parts with different pollution degrees can be cleaned by different water injection durations and water injection pressures. For example, when the degree of contamination is high, a long water injection time and a water injection pressure can be selected to realize a long-time high-pressure flushing, thereby cleaning the cleaning member. The determining process of the control parameter may specifically include:

step 1, determining water injection information of at least one water injection pump of a cleaning base station according to a first target cleaning mode and a first target pollution level, wherein the water injection information comprises at least one of water injection duration, water injection pressure and water injection frequency, and each water injection pump is connected with one or more water injection ports.

In this step, the cleaning base station may determine water injection information of the water injection pump according to the first target cleaning mode and the first target pollution level. The water filling information may include a water filling time, a water filling pressure, a water filling frequency, and the like. The water injection frequency is used for determining the time interval between two times of water injection when water injection needs to be carried out for multiple times. Wherein the water injection pressure is used to determine the rinsing force with which the cleaning member is rinsed. The greater the flushing force, the easier the cleaning element is to flush. Wherein the water injection duration is used for determining the flushing duration for flushing the cleaning piece. The longer the rinsing period, the cleaner the cleaning element is rinsed.

Wherein each water injection pump may correspond to one or more water injection ports. Each water injection port may correspond to one cleaning member. One cleaning member may correspond to a plurality of water filling ports. When the cleaning base station determines the water injection information of one water injection pump, the water injection water pressure and the water injection time of one or more water injection ports corresponding to the water injection pump are determined according to the water injection pump.

And 2, controlling a water injection pump to inject water through a water injection port connected with the water injection pump according to the water injection information, and cleaning the cleaning equipment.

In this step, after the cleaning base station determines the water injection information, each water injection pump is controlled to inject water according to the water injection information, so that cleaning of cleaning pieces of the cleaning equipment is achieved.

In a second implementation, when the first target cleaning mode includes spray cleaning, the spray pump may be engaged with the cleaning member in the spray cleaning process, thereby improving the cleaning efficiency. The second implementation is implemented based on the first implementation. When the second implementation is mentioned in the following embodiments, the first implementation is necessarily used at the same time. When the cleaning piece is matched with spray cleaning, the cleaning equipment also comprises a first motor. The first motor is connected with the cleaning base station. The first motor can control the cleaning piece of the cleaning equipment to rotate in the spraying and cleaning process according to the control instruction of the cleaning base station. In this process, in addition to the control of the filling pump by the cleaning base station in the above example, the cleaning base station may also perform the following steps to achieve the control of the first electric machine. The method specifically comprises the following steps:

step 1, determining first control information of a first motor of the cleaning equipment according to a first target cleaning mode and a first target pollution level, wherein the first control information comprises at least one of the rotating speed, the rotating direction, the rotating time length and the rotating frequency of the first motor, and the first motor is used for controlling the cleaning piece of the cleaning equipment to rotate.

In this step, the cleaning base station may determine first control information of the first motor according to the first target cleaning mode and the first target contamination level. The first control information may include the rotation speed, the rotation direction and the rotation duration of the first motor, the rotation frequency, and the like. The rotation duration, the rotation frequency and the rotation speed of the first motor may be related to the water injection duration and the water injection frequency of the water injection pump. When the rotating speed of the first motor is low, the cleaning piece rotates to improve the effect that water at the water filling port uniformly acts on the surface of the cleaning piece. When the rotating speed of the first motor is higher, the cleaning piece can be dehydrated through the rotation of the cleaning piece. Under the first target cleaning mode, the first motor can control the cleaning piece to use different rotating speeds at different moments to realize the cleaning of the cleaning piece.

For example, during spray cleaning, the water injection pump continues to inject water. Meanwhile, the first motor controls the cleaning piece to continuously rotate. Wherein the rotational speed of the cleaning elements during rotation is determined according to a predetermined rotational speed.

In another example, the water injection pump continuously injects water during the spray cleaning process. Meanwhile, the first motor controls the cleaning piece to rotate intermittently according to a first preset frequency. Wherein the rotational speed of the cleaning elements during rotation is determined according to a predetermined rotational speed.

For another example, in the spray cleaning process, the water injection pump injects water intermittently according to a second preset frequency. Meanwhile, the first motor controls the cleaning piece to rotate continuously. Wherein the rotational speed of the cleaning elements during rotation is determined according to a predetermined rotational speed.

For another example, in the spray cleaning process, the water injection pump injects water intermittently according to a third preset frequency. Meanwhile, the first motor controls the cleaning piece to intermittently rotate according to a fourth preset frequency. Wherein the rotational speed of the cleaning elements during rotation is determined according to a predetermined rotational speed.

The first preset frequency, the second preset frequency, the third preset frequency and the fourth preset frequency may be different frequencies. Alternatively, some or all of the four preset frequencies may be the same frequency.

And 2, controlling the first motor to drive a cleaning piece of the cleaning equipment to rotate in the spraying and cleaning process according to the first control information of the first motor, and cleaning the cleaning piece of the cleaning equipment by matching with a water injection pump.

In this step, after determining the first control information, the cleaning base station controls the first motor to drive the cleaning element to rotate according to the first control information.

In a third implementation, when the first target cleaning mode includes soak cleaning, the cleaning assembly includes a reservoir, a second motor, and a cleaning assembly. The second motor is used for controlling the cleaning assembly to clean the cleaning equipment in a soaking state. Wherein the cleaning assembly may include one or more of a scraping mechanism, a cleaning member, an agitation mechanism, a cleaning disc, and the like. For example, when the cleaning component is a scraping mechanism, the cleaning base station can control the scraping mechanism to scrape the cleaning member in a soaking state, so that the cleaning member is cleaned. For another example, when the cleaning assembly is an agitating mechanism, the cleaning base station may control the agitating mechanism to agitate water in the reservoir through the second motor, so that the water in the reservoir is surged, thereby cleaning the cleaning member.

Wherein, the cleaning base station can determine whether to start the second motor by acquiring the water level of the reservoir. Specifically, the cleaning assembly further comprises a water level sensor. The cleaning base station can acquire the water level in the reservoir through the water level sensor. When the water level reaches the preset water level, the cleaning base station controls the second motor to start cleaning the cleaning piece.

The step of determining the control parameter of the second motor by the cleaning base station may specifically include:

step 1, determining second control information of a second motor of the cleaning base station according to the first target cleaning mode and the first target pollution level, wherein the second control information comprises at least one of the rotating speed, the rotating direction, the rotating time length and the rotating frequency of the second motor, and the second motor is used for controlling a cleaning assembly of the cleaning base station to clean the cleaning equipment in a soaking state.

And 2, acquiring the water level of a reservoir of the cleaning assembly through a water level sensor of the cleaning assembly.

And 3, starting the second motor when the water level reaches the preset water level.

And 4, controlling the second motor to drive the cleaning assembly to clean the cleaning equipment in a soaking state according to second control information of the second motor.

In a fourth implementation, the first target cleaning mode may include a spray cleaning and a soak cleaning. At this time, the cleaning mode may be a combination of the first and third implementations described above. Alternatively, the cleaning mode may also be a combination of the first implementation, the second implementation, and the third implementation described above.

And S104, controlling a cleaning assembly of the cleaning base station to clean the cleaning equipment in the first target cleaning mode.

In this embodiment, after the cleaning base station determines the device parameters in the first target cleaning mode according to the above S103, the cleaning base station may control the corresponding component to clean the cleaning member of the second cleaning device according to the control parameter.

According to the control method of the cleaning base station, the cleaning base station can acquire the first pollution data in the storage of the cleaning equipment through the electric connection. The cleaning base station may determine a first target contamination level of the cleaning device from the first contamination data based on the first mapping relationship. The cleaning base station may determine the first target cleaning mode through the second mapping relationship after determining the first target contamination level of the cleaning member. And determining the execution equipment in the first target cleaning mode and the corresponding control parameters thereof according to the first target cleaning mode and the first target pollution level. And the cleaning base station controls the corresponding execution equipment to clean the cleaning equipment according to the control parameters. In this application, through selecting first target cleaning mode, make the cleaning member of different pollution levels can carry out the washing of different degrees to improve the cleaning performance of this cleaning member. Meanwhile, different cleaning modes are used for cleaning pieces with different pollution levels, unnecessary water consumption is avoided, and the utilization rate of clean water is improved.

Fig. 3 shows a flowchart of a control method for cleaning a base station according to an embodiment of the present application. On the basis of the embodiments shown in fig. 1 and fig. 2, as shown in fig. 3, with a clean base station as an execution subject, the method of the embodiment may include the following steps:

s201, when a self-cleaning instruction is received, first pollution data collected by a cleaning device in a cleaning process are acquired, and the cleaning device is used for cleaning.

S202, determining a first target pollution level of the cleaning equipment according to a first mapping relation between the first pollution data and the pollution level.

S203, determining a first target cleaning mode according to a second mapping relation between the first target pollution level and the cleaning mode.

S204, controlling a cleaning assembly of the cleaning base station to clean the cleaning equipment in the first target cleaning mode.

Steps S201 to S204 are similar to the implementation of steps S101 to S104 in the embodiment of fig. 2, and this embodiment is not described herein again.

S205, acquiring second pollution data of the cleaned sewage through water quality detection equipment of the cleaning assembly.

In this embodiment, after the cleaning assembly completes the above cleaning, the cleaning base station may obtain second pollution data of the sewage through the water quality monitoring device. Wherein, this water quality monitoring equipment can install in the bottom of cistern. The cleaning base station may turn on the water quality monitoring device before the first target cleaning mode ends the cleaning. The water quality monitoring apparatus may acquire a detection value of the sewage within a preset time period before the first target cleaning mode is ended. Or, the water quality monitoring device can also be arranged in a sewage discharge pipeline. The clean base station can start the sewage monitoring equipment when starting sewage discharge, and acquire the detection value of sewage in real time during the sewage discharge. The cleaning base station can determine the average value of the plurality of detection values in the sewage discharge process as the second pollution data of the sewage.

In one example, the water quality detection device may be a camera. The second pollution data can be obtained by analyzing sewage pictures shot by a camera above the sewage disc. The cleaning base station can extract the characteristic information in the sewage picture after acquiring the sewage picture. The second pollution data is the sewage picture.

S206, determining a second pollution level of the cleaning equipment according to a third mapping relation between the second pollution data and the pollution level.

In this embodiment, the third mapping relationship is used to determine the pollution level according to the second pollution data. When the second pollution data is a detection value of sewage, the third mapping relationship may be a mapping relationship from an average detection value to a pollution level. When the second pollution data is characteristic information of the sewage image, the third mapping relationship may be a classification algorithm. The cleaning base station can determine the pollution level corresponding to the sewage picture through the classification algorithm.

And S207, comparing the second pollution level with a preset pollution level. And when the second pollution level is less than or equal to the preset pollution level, ending the cycle. And jumping to S203 when the second pollution level is greater than the preset pollution level.

According to the control method of the cleaning base station, the cleaning base station can acquire the first pollution data in the storage of the cleaning equipment through the electric connection. The cleaning base station may determine a first target contamination level of the cleaning device from the first contamination data based on the first mapping relationship. The cleaning base station may determine the first target cleaning mode through the second mapping relationship after determining the first target contamination level of the cleaning member. The cleaning base station may determine the first target cleaning mode according to a second mapping relationship between the first target contamination level and the cleaning mode. After the cleaning assembly finishes the cleaning, the cleaning base station can acquire second pollution data of the sewage through the water quality monitoring equipment. The cleaning base station may determine a second contamination level of the cleaning device based on a third mapping relationship of the second contamination data to the contamination level. The clean base station compares the second pollution level to a preset pollution level. And when the second pollution level is less than or equal to the preset pollution level, ending the cycle. When the second pollution level is greater than the preset pollution level, the cleaning base station may determine a second target cleaning mode according to the second mapping relationship and the second pollution level. The cleaning base station may control the cleaning assembly to wash the cleaning device in the second target cleaning mode. In this application, through the pollution level who obtains washing back sewage each time, ensure when stopping to wash, this cleaning member reaches anticipated cleaning performance, has improved cleaning performance of cleaning member.

Fig. 4 shows a flowchart of a control method for cleaning a base station according to an embodiment of the present application. On the basis of the embodiments shown in fig. 1 to 3, as shown in fig. 4, with the clean base station as an execution subject, the method of the embodiment may include the following steps:

s301, when a self-cleaning instruction is received, pollution data collected by the cleaning equipment in the cleaning process are obtained.

In this embodiment, the cleaning base station executes the self-cleaning command after the self-cleaning command is triggered in executing the embodiments shown in fig. 2 and 3. When a self-cleaning command is triggered, the cleaning base station receives the self-cleaning command and initiates a self-cleaning mode in the cleaning base station. The self-cleaning mode is the cleaning steps described above with respect to fig. 2 and 3.

The triggering mode of the self-cleaning instruction can comprise at least one of the following modes:

in one implementation, when a self-cleaning button on a cleaning base station or cleaning device is pressed, the cleaning base station generates a self-cleaning instruction in response to a pressing operation of a self-cleaning button.

In another implementation, the self-cleaning instructions are generated when the cleaning base station detects that the cleaning device is located on the cleaning base station.

In another implementation, when the cleaning base station detects that the cleaning device is located on the cleaning base station and the accumulated usage duration acquired by the cleaning base station from the cleaning device reaches a preset duration, a self-cleaning instruction is generated. The accumulated usage time is the accumulated usage time of the cleaning device from the end of the last washing to the present moment.

In yet another implementation, the self-cleaning instruction is generated when the cleaning base station detects that the cleaning device is located on the cleaning base station and the cumulative number of uses the cleaning base station obtains from the cleaning device reaches a preset number. The accumulated number of use is the accumulated number of use of the cleaning device from the end of the last washing to the present moment.

S302, when a self-cleaning instruction is received, first pollution data collected by a cleaning device in the cleaning process are acquired, wherein the cleaning device is used for cleaning.

S303, determining a first target pollution level of the cleaning equipment according to the first mapping relation between the first pollution data and the pollution level.

S304, determining a first target cleaning mode according to a second mapping relation between the first target pollution level and the cleaning mode.

And S305, controlling the cleaning assembly to clean the cleaning device in the first target cleaning mode.

The implementation of steps S302 to S305 is similar to that of steps S101 to S104 in the embodiment of fig. 2, and this embodiment is not described herein again.

According to the control method for the cleaning base station, when the self-cleaning instruction is triggered, the cleaning base station receives the self-cleaning instruction. When receiving the self-cleaning instruction, the cleaning base station acquires pollution data collected by the cleaning equipment in the cleaning process. The cleaning base station can acquire first contamination data in a memory of the cleaning device via the electrical connection. The cleaning base station may determine a first target pollution level of the cleaning device from the first pollution data based on the first mapping relationship. The cleaning base station may determine the first target cleaning mode through the second mapping relationship after determining the first target contamination level of the cleaning member. The cleaning base station may determine the execution device in the first target cleaning mode and the corresponding control parameter thereof according to the first target cleaning mode and the first target pollution level. And the cleaning base station controls the corresponding execution equipment to clean the cleaning equipment according to the control parameters. In the application, the self-cleaning mode is started by acquiring the self-cleaning instruction, so that the cleaning efficiency of the cleaning equipment is improved, the user experience is improved, and the automation degree of the product is improved.

Fig. 5 shows a schematic structural diagram of a control device for cleaning a base station according to an embodiment of the present application. As shown in fig. 5, the control device 30 of the cleaning base station is configured to implement the operation corresponding to the cleaning base station in any of the above method embodiments, and the control device 30 of the cleaning base station of this embodiment may include:

the first acquiring module 31 is configured to acquire first pollution data collected by a cleaning device in a cleaning process when the self-cleaning instruction is received, where the cleaning device is a device for cleaning.

A first determination module 32 for determining a first target contamination level of the cleaning device based on a first mapping between the first contamination data and the contamination level.

A second determining module 33, configured to determine the first target cleaning mode according to a second mapping relationship between the first target contamination level and the cleaning mode.

A first control module 34 for controlling the cleaning assembly of the cleaning station to wash the cleaning device in a first target cleaning mode.

In one example, the first pollution data includes at least one of the following data items:

the accumulated use time of the cleaning device from the end of the last washing to the current time, the use power of the cleaning device in the last cleaning process, the image data of the cleaning object of the cleaning device in the last cleaning process, and the position data of the cleaning object of the cleaning device in the last cleaning process.

In one example, the first contamination data includes at least two of the following data items: the usage duration, the usage power, the image data, and the position data are accumulated.

The first determining module 32 specifically includes:

and the first determining submodule is used for determining the pollution level corresponding to each data item according to the first mapping relation between each data item in the first pollution data and the pollution level.

In one example, the second determining sub-module is specifically configured to determine, according to a preset priority of each data item, a first pollution level of the data item with the highest priority, and determine whether the first pollution level is higher than pollution levels of other data items, where a difference between the first pollution level and a weighted average of pollution levels of other data items is greater than a first preset value. And if so, taking the first pollution level as a first target pollution level. If not, acquiring a second pollution level corresponding to the data item with the lowest priority, judging whether the second pollution level is lower than the pollution levels of other data items, determining a first target pollution level according to the weighted average of the pollution levels corresponding to the remaining data items, if not, determining a first target pollution level according to the weighted average of the pollution levels corresponding to the data items, wherein the preset priority of each data item is positively correlated with the weighting coefficient, and if so, eliminating the data items corresponding to the second pollution level.

In one example, the cleaning modes include a spray cleaning and/or a soak cleaning, each cleaning mode corresponding to at least one contamination level.

In an example, when the cleaning mode includes spray cleaning, according to the second determining module 33, the method specifically includes:

and the third determining submodule is used for determining water injection information of at least one water injection pump of the cleaning base station according to the first target cleaning mode and the first target pollution level, wherein the water injection information comprises at least one of water injection duration, water injection pressure and water injection frequency, and each water injection pump is connected with one or more water injection ports.

In one example, the second determining module 33 further includes:

and the fourth determining submodule is used for determining first control information of a first motor of the cleaning equipment according to the first target cleaning mode and the first target pollution level, wherein the first control information comprises at least one of the rotating speed, the rotating direction, the rotating time length and the rotating frequency of the first motor, and the first motor is used for controlling the cleaning piece of the cleaning equipment to rotate.

In one example, when the cleaning mode includes soaking and washing, the second determining module 13 specifically includes:

and the fifth determining submodule is used for determining second control information of a second motor of the cleaning base station according to the first target cleaning mode and the first target pollution level, wherein the second control information comprises at least one of the rotating speed, the rotating direction, the rotating time length and the rotating frequency of the second motor, and the second motor is used for controlling a cleaning assembly of the cleaning base station to clean the cleaning equipment in a soaking state.

And the third control sub-module is used for controlling the second motor to drive the cleaning component to clean the cleaning equipment in the soaking state according to second control information of the second motor.

In one example, the second determining module 33 further includes:

and the acquisition submodule is used for acquiring the water level of the reservoir of the cleaning assembly through the water level sensor of the cleaning assembly.

In one example, the apparatus further comprises:

and the second acquisition module is used for acquiring second pollution data of the cleaned sewage through the water quality detection equipment of the cleaning assembly.

And the third determining module is used for determining the second pollution level of the cleaning equipment according to the third mapping relation between the second pollution data and the pollution level.

And the fourth determining module is used for determining a second target cleaning mode according to the second pollution level and the second mapping relation.

And the second control module is used for controlling the cleaning assembly to clean the cleaning equipment in a second target cleaning mode.

In one example, upon receiving a self-cleaning instruction, the apparatus further comprises: a trigger module, the trigger module including at least one of:

and responding to the pressing operation of the self-cleaning key, and generating a self-cleaning instruction according to the pressing operation.

A self-cleaning instruction is generated when it is detected that the cleaning apparatus is located on the cleaning base station.

And when the cleaning equipment is positioned on the cleaning base station and the accumulated use time of the cleaning equipment from the last cleaning to the current time reaches the preset time, generating a self-cleaning instruction.

And when the cleaning equipment is positioned on the cleaning base station and the accumulated use times of the cleaning equipment from the last cleaning to the current moment reach the preset times, generating a self-cleaning instruction.

The clean base station provided in this embodiment may be used to execute the control method of the clean base station, and the implementation manner and the technical effect are similar, and this embodiment is not described herein again.

Fig. 6 shows a hardware structure diagram of a clean base station according to an embodiment of the present application. As shown in fig. 6, the cleaning base station 40 is configured to implement the operation corresponding to the cleaning base station in any of the above method embodiments, and the cleaning base station 40 of this embodiment may include: a memory 41, a processor 42 and a cleaning assembly 43.

A memory 41 for storing a computer program. The Memory 41 may include a Random Access Memory (RAM), a Non-Volatile Memory (NVM), at least one disk Memory, a usb flash drive, a removable hard drive, a read-only Memory, a magnetic disk or an optical disk.

A processor 42 for executing the computer program stored in the memory to implement the control method of cleaning the base station in the above-described embodiments. Reference may be made in particular to the description relating to the method embodiments described above. The Processor 42 may be a Central Processing Unit (CPU), other general purpose Processor, a Digital Signal Processor (DSP), an Application Specific Integrated Circuit (ASIC), or the like. A general purpose processor may be a microprocessor or the processor may be any conventional processor or the like. The steps of a method disclosed in connection with the present invention may be embodied directly in a hardware processor, or in a combination of the hardware and software modules within the processor.

Alternatively, the memory 41 may be separate or integrated with the processor 42.

The cleaning base station 40 may also include a bus when the memory 41 is a separate device from the processor 42. The bus is used to connect the memory 41 and the processor 42. The bus may be an Industry Standard Architecture (ISA) bus, a Peripheral Component Interconnect (PCI) bus, an Extended ISA (EISA) bus, or the like. The bus may be divided into an address bus, a data bus, a control bus, etc. For ease of illustration, the buses in the figures of the present application are not limited to only one bus or one type of bus.

The cleaning assembly 43, under the control of the processor 42, may perform a corresponding cleaning operation to clean the cleaning device.

In one example, when spray rinsing is included in the cleaning mode, the cleaning assembly 43 includes at least one fill port and at least one fill pump, each of which is connected to one or more fill ports. Wherein, the water injection pump is connected with the processor 42 and is used for controlling the water injection pump to inject water through a water injection port connected with the water injection pump according to the water injection information output by the processor 42 and cleaning the cleaning equipment.

In one example, when the cleaning mode includes a soak wash, the cleaning assembly 43 includes a water reservoir, a second motor, and a wash assembly. The second motor is connected to the processor 42, and is configured to control the cleaning assembly to clean the cleaning device in the soaking state according to the second control information output by the processor 42.

In one example, the cleaning assembly 43 further includes a water level sensor. The water level sensor is connected to the processor 42 for outputting a water level measurement to the processor 42.

In one example, a water quality detection device is also included in the cleaning assembly 43. The water quality detecting apparatus is connected to the processor 42 for outputting the measured value of the water quality detection to the processor 42

The clean base station provided in this embodiment may be configured to execute the method for controlling a clean base station, and the implementation manner and the technical effect are similar, which are not described herein again.

Fig. 7 shows a schematic structural diagram of a cleaning system provided in an embodiment of the present application. As shown in fig. 7, the cleaning system 50 may include: cleaning base station 51 and cleaning device 52

Wherein the clean base station 51 may be as shown in fig. 6. The cleaning base 52 has a washing assembly for receiving the cleaning device 52 and washing the cleaning device 52.

The present application also provides a computer-readable storage medium, in which a computer program is stored, and the computer program is used for implementing the methods provided by the above-mentioned various embodiments when being executed by a processor.

The computer-readable storage medium may be a computer storage medium or a communication medium. Communication media includes any medium that facilitates transfer of a computer program from one place to another. Computer storage media may be any available media that can be accessed by a general purpose or special purpose computer. For example, a computer readable storage medium is coupled to the processor such that the processor can read information from, and write information to, the computer readable storage medium. Of course, the computer readable storage medium may also be integral to the processor. The processor and the computer-readable storage medium may reside in an Application Specific Integrated Circuits (ASIC). Additionally, the ASIC may reside in user equipment. Of course, the processor and the computer-readable storage medium may also reside as discrete components in a communication device.

In particular, the computer-readable storage medium may be implemented by any type of volatile or non-volatile Memory device or combination thereof, such as Static Random-Access Memory (SRAM), electrically-Erasable Programmable Read-Only Memory (EEPROM), erasable Programmable Read-Only Memory (EPROM), programmable Read-Only Memory (PROM), read-Only Memory (ROM), magnetic Memory, flash Memory, magnetic disk, or optical disk. A storage media may be any available media that can be accessed by a general purpose or special purpose computer.

The present application also provides a computer program product comprising a computer program stored in a computer readable storage medium. The computer program can be read by at least one processor of the device from a computer-readable storage medium, and execution of the computer program by the at least one processor causes the device to implement the methods provided by the various embodiments described above.

Embodiments of the present application further provide a chip, where the chip includes a memory and a processor, where the memory is used to store a computer program, and the processor is used to call and run the computer program from the memory, so that a device in which the chip is installed executes the method in the above various possible embodiments.

In the several embodiments provided in the present application, it should be understood that the disclosed apparatus and method may be implemented in other ways. For example, the above-described apparatus embodiments are merely illustrative, and for example, a division of modules is merely a division of logical functions, and an actual implementation may have another division, for example, a plurality of modules may be combined or may be integrated into another system, or some features may be omitted, or not executed. In addition, the shown or discussed coupling or direct coupling or communication connection between each other may be through some interfaces, indirect coupling or communication connection between devices or modules, and may be in an electrical, mechanical or other form.

Wherein the modules may be physically separated, e.g. mounted at different locations of one device, or mounted on different devices, or distributed over multiple network elements, or distributed over multiple processors. The modules may also be integrated together, for example, in the same device, or in a set of codes. The respective modules may exist in the form of hardware, or may also exist in the form of software, or may also be implemented in the form of software plus hardware. The method and the device can select part or all of the modules according to actual needs to achieve the purpose of the scheme of the embodiment.

When the respective modules are implemented as integrated modules in the form of software functional modules, they may be stored in a computer-readable storage medium. The software functional module is stored in a storage medium and includes several instructions to enable a computer device (which may be a personal computer, a server, or a network device) or a processor to execute some steps of the methods according to the embodiments of the present application.

It should be understood that, although the respective steps in the flowcharts in the above-described embodiments are sequentially shown as indicated by arrows, the steps are not necessarily performed sequentially as indicated by the arrows. The steps are not performed in the exact order shown and may be performed in other orders unless explicitly stated herein. Moreover, at least some of the steps in the figures may include multiple sub-steps or multiple stages that are not necessarily performed at the same time, but may be performed at different times, in different orders, and may be performed alternately or at least partially with respect to other steps or sub-steps of other steps.

Finally, it should be noted that: the above embodiments are only used to illustrate the technical solutions of the present application, and not to limit the same. Although the present application has been described in detail with reference to the foregoing embodiments, it should be understood by those of ordinary skill in the art that: it is also possible to modify the solutions described in the previous embodiments or to substitute some or all of the technical features. And the modifications or the substitutions do not make the essence of the corresponding technical solutions depart from the scope of the technical solutions of the embodiments of the present application.

Claims

1. A method for controlling a cleaning base station, the method comprising:

controlling a cleaning assembly of a cleaning base station to wash the cleaning device in the first target cleaning mode;

the first contamination data comprises at least one data item or at least two data items;

when the first contamination data comprises at least two data items, then the determining a first target contamination level of the cleaning device from a first mapping between the first contamination data and contamination level comprises:

if so, taking the first pollution level as the first target pollution level;

2. The method of claim 1, wherein the first pollution data comprises at least one of:

the cleaning device comprises accumulated use time of the cleaning device from the last washing end to the current time, use power of the cleaning device in the last cleaning process, image data of a cleaning object of the cleaning device in the last cleaning process, and position data of the cleaning object of the cleaning device in the last cleaning process.

3. The method of claim 2, wherein the first contamination data includes at least two of the following data items: the accumulated usage duration, the usage power, the image data, and the location data;

determining a first target contamination level of the cleaning device according to a first mapping relationship between the first contamination data and the contamination level, including:

4. The method of claim 1, wherein the cleaning modes comprise a spray cleaning and/or a soak cleaning, each cleaning mode corresponding to at least one contamination level.

5. The method according to claim 4, wherein when the cleaning mode includes spray rinsing, the determining the first target cleaning mode according to the second mapping relationship between the first target pollution level and the cleaning mode specifically includes:

6. The method of claim 5, further comprising:

7. The method according to claim 4, wherein when the cleaning mode includes soaking and washing, the determining the first target cleaning mode according to the second mapping relationship between the first target pollution level and the cleaning mode specifically includes:

8. The method of claim 7, further comprising:

acquiring the water level of a reservoir of the cleaning assembly through a water level sensor of the cleaning assembly;

9. The method of any one of claims 1-8, wherein after controlling the cleaning assembly to wash the cleaning device in the first target cleaning mode, the method further comprises:

acquiring second pollution data of the cleaned sewage through the water quality detection equipment of the cleaning assembly;

10. The method of any of claims 1-8, wherein prior to acquiring contamination data collected by the cleaning apparatus during a cleaning process upon receiving a self-cleaning instruction, the method further comprises at least one of:

11. A cleaning base station, the cleaning base station comprising: the cleaning device comprises a cleaning component, a memory and a processor, wherein the processor is connected with the cleaning component and the memory respectively;

the processor is configured to implement the control method of cleaning a base station according to any one of claims 1 to 10, according to the computer program stored in the memory.

12. A cleaning system, characterized in that the cleaning system comprises: a cleaning apparatus and a cleaning base station as claimed in claim 11, the cleaning base station having a washing assembly for receiving the cleaning apparatus and washing the cleaning apparatus.

13. A computer-readable storage medium, in which a computer program is stored which, when being executed by a processor, is adapted to carry out a method of controlling a cleaning base station according to any one of claims 1-10.