CN113993624B - 热平台和制造热平台的方法 - Google Patents
热平台和制造热平台的方法 Download PDFInfo
- Publication number
- CN113993624B CN113993624B CN202080045341.4A CN202080045341A CN113993624B CN 113993624 B CN113993624 B CN 113993624B CN 202080045341 A CN202080045341 A CN 202080045341A CN 113993624 B CN113993624 B CN 113993624B
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- Prior art keywords
- thermal
- platform
- layer
- substrate
- heating element
- Prior art date
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- 238000004519 manufacturing process Methods 0.000 title claims description 31
- 239000000758 substrate Substances 0.000 claims abstract description 52
- 238000010438 heat treatment Methods 0.000 claims abstract description 44
- 239000012530 fluid Substances 0.000 claims abstract description 32
- 229920000620 organic polymer Polymers 0.000 claims abstract description 25
- 239000004642 Polyimide Substances 0.000 claims abstract description 19
- 229920001721 polyimide Polymers 0.000 claims abstract description 19
- 239000011810 insulating material Substances 0.000 claims abstract description 14
- 229910052751 metal Inorganic materials 0.000 claims description 60
- 239000002184 metal Substances 0.000 claims description 60
- 238000002161 passivation Methods 0.000 claims description 42
- 239000000463 material Substances 0.000 claims description 38
- 238000000034 method Methods 0.000 claims description 38
- 238000009413 insulation Methods 0.000 claims description 33
- 238000000151 deposition Methods 0.000 claims description 10
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 10
- 239000010931 gold Substances 0.000 claims description 9
- 238000000059 patterning Methods 0.000 claims description 8
- 239000010409 thin film Substances 0.000 claims description 7
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 6
- 229910052737 gold Inorganic materials 0.000 claims description 6
- 238000009713 electroplating Methods 0.000 claims description 5
- 238000005459 micromachining Methods 0.000 claims description 5
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 4
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 4
- 229910052697 platinum Inorganic materials 0.000 claims description 4
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 4
- 235000012239 silicon dioxide Nutrition 0.000 claims description 2
- 239000000377 silicon dioxide Substances 0.000 claims description 2
- 238000004528 spin coating Methods 0.000 claims description 2
- 238000006243 chemical reaction Methods 0.000 abstract description 80
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 12
- 229910052710 silicon Inorganic materials 0.000 abstract description 11
- 239000010703 silicon Substances 0.000 abstract description 11
- 239000000126 substance Substances 0.000 abstract description 10
- 238000012545 processing Methods 0.000 abstract description 6
- 239000003153 chemical reaction reagent Substances 0.000 abstract description 4
- 239000007864 aqueous solution Substances 0.000 abstract description 3
- 239000007788 liquid Substances 0.000 abstract description 3
- 239000012774 insulation material Substances 0.000 abstract description 2
- 239000000243 solution Substances 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 151
- 238000013461 design Methods 0.000 description 10
- 239000003054 catalyst Substances 0.000 description 7
- 229920000642 polymer Polymers 0.000 description 6
- 238000003752 polymerase chain reaction Methods 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- 238000001816 cooling Methods 0.000 description 5
- 238000001311 chemical methods and process Methods 0.000 description 4
- 239000007769 metal material Substances 0.000 description 4
- 230000008901 benefit Effects 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 230000007062 hydrolysis Effects 0.000 description 3
- 238000006460 hydrolysis reaction Methods 0.000 description 3
- 230000011987 methylation Effects 0.000 description 3
- 238000007069 methylation reaction Methods 0.000 description 3
- 239000013545 self-assembled monolayer Substances 0.000 description 3
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000005284 excitation Effects 0.000 description 2
- 238000002955 isolation Methods 0.000 description 2
- 239000007791 liquid phase Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 229910000510 noble metal Inorganic materials 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 150000004756 silanes Chemical class 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 150000003573 thiols Chemical class 0.000 description 2
- MAKDTFFYCIMFQP-UHFFFAOYSA-N titanium tungsten Chemical compound [Ti].[W] MAKDTFFYCIMFQP-UHFFFAOYSA-N 0.000 description 2
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- NJSVDVPGINTNGX-UHFFFAOYSA-N [dimethoxy(propyl)silyl]oxymethanamine Chemical compound CCC[Si](OC)(OC)OCN NJSVDVPGINTNGX-UHFFFAOYSA-N 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- 150000001413 amino acids Chemical class 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000009529 body temperature measurement Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000010574 gas phase reaction Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 150000002540 isothiocyanates Chemical class 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- -1 platinum group metals Chemical class 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 102000004169 proteins and genes Human genes 0.000 description 1
- 108090000623 proteins and genes Proteins 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000007514 turning Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L7/00—Heating or cooling apparatus; Heat insulating devices
- B01L7/52—Heating or cooling apparatus; Heat insulating devices with provision for submitting samples to a predetermined sequence of different temperatures, e.g. for treating nucleic acid samples
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L7/00—Heating or cooling apparatus; Heat insulating devices
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/02—Details
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L2200/00—Solutions for specific problems relating to chemical or physical laboratory apparatus
- B01L2200/12—Specific details about manufacturing devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L2200/00—Solutions for specific problems relating to chemical or physical laboratory apparatus
- B01L2200/14—Process control and prevention of errors
- B01L2200/143—Quality control, feedback systems
- B01L2200/147—Employing temperature sensors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L2300/00—Additional constructional details
- B01L2300/08—Geometry, shape and general structure
- B01L2300/0887—Laminated structure
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L2300/00—Additional constructional details
- B01L2300/12—Specific details about materials
- B01L2300/123—Flexible; Elastomeric
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L2300/00—Additional constructional details
- B01L2300/18—Means for temperature control
- B01L2300/1805—Conductive heating, heat from thermostatted solids is conducted to receptacles, e.g. heating plates, blocks
- B01L2300/1827—Conductive heating, heat from thermostatted solids is conducted to receptacles, e.g. heating plates, blocks using resistive heater
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L2300/00—Additional constructional details
- B01L2300/18—Means for temperature control
- B01L2300/1883—Means for temperature control using thermal insulation
Landscapes
- Health & Medical Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Clinical Laboratory Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Molecular Biology (AREA)
- Apparatus Associated With Microorganisms And Enzymes (AREA)
- Micromachines (AREA)
Abstract
Description
材料 | TCR(每度电阻的分数变化) |
TiW | 0.0003 |
TiN | 0.0004 |
Au | 0.0037 |
Ti | 0.0038 |
Pt | 0.0039 |
Ru | 0.0041 |
Mo | 0.00435 |
W | 0.0045 |
Ni | 0.0064 |
Claims (27)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201962864668P | 2019-06-21 | 2019-06-21 | |
US62/864,668 | 2019-06-21 | ||
PCT/EP2020/067365 WO2020254691A1 (en) | 2019-06-21 | 2020-06-22 | A thermal platform and a method of fabricating a thermal platform |
Publications (2)
Publication Number | Publication Date |
---|---|
CN113993624A CN113993624A (zh) | 2022-01-28 |
CN113993624B true CN113993624B (zh) | 2024-02-09 |
Family
ID=71138739
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202080045341.4A Active CN113993624B (zh) | 2019-06-21 | 2020-06-22 | 热平台和制造热平台的方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US20220126300A1 (zh) |
EP (1) | EP3986615A1 (zh) |
CN (1) | CN113993624B (zh) |
WO (1) | WO2020254691A1 (zh) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2557592A (en) * | 2016-12-09 | 2018-06-27 | Evonetix Ltd | Temperature control device |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1463038A (zh) * | 2002-05-31 | 2003-12-24 | 富士通株式会社 | 半导体器件及其制造方法 |
CN101143341A (zh) * | 2006-07-14 | 2008-03-19 | 霍夫曼-拉罗奇有限公司 | 用于监测加热和冷却的温度传感器元件 |
CN101247715A (zh) * | 2007-02-15 | 2008-08-20 | 保力马科技株式会社 | 热扩散片及其制造方法 |
CN101445216A (zh) * | 2008-12-04 | 2009-06-03 | 北京大学 | 分体式微机电***及其制备方法 |
CN101542763A (zh) * | 2006-11-21 | 2009-09-23 | 赢创德固赛有限责任公司 | 热电元件、其制造方法及其使用 |
CN102668058A (zh) * | 2009-10-21 | 2012-09-12 | 朗姆研究公司 | 具有用于半导体处理的平坦加热器区域的加热板 |
CN102928610A (zh) * | 2011-07-22 | 2013-02-13 | 泰肯贸易股份公司 | 用于操纵液滴中样品的盒子和*** |
CN104303056A (zh) * | 2012-03-08 | 2015-01-21 | 昌和生物医学科技(扬州)有限公司 | 用于改进疾病检测的微器件 |
WO2018104698A1 (en) * | 2016-12-09 | 2018-06-14 | Evonetix Ltd | Temperature control device |
WO2018147029A1 (ja) * | 2017-02-07 | 2018-08-16 | 株式会社 日立ハイテクノロジーズ | 自動分析装置 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1161985B1 (en) * | 2000-06-05 | 2005-10-26 | STMicroelectronics S.r.l. | Process for manufacturing integrated chemical microreactors of semiconductor material, and integrated microreactor |
US7216660B2 (en) * | 2000-11-02 | 2007-05-15 | Princeton University | Method and device for controlling liquid flow on the surface of a microfluidic chip |
AU2002353778A1 (en) * | 2001-08-14 | 2003-03-18 | The Penn State Research Foundation | Fabrication of molecular scale devices using fluidic assembly |
EP1453758A2 (en) * | 2001-12-06 | 2004-09-08 | Nanostream, Inc. | Adhesiveless microfluidic device fabrication |
US7473030B2 (en) * | 2002-04-01 | 2009-01-06 | Palo Alto Research Center Incorporated | Thermal sensing |
US6730883B2 (en) * | 2002-10-02 | 2004-05-04 | Stratagene | Flexible heating cover assembly for thermal cycling of samples of biological material |
KR100535817B1 (ko) * | 2003-12-26 | 2005-12-12 | 한국전자통신연구원 | 바이오 칩을 위한 플라스틱 구조체, 그를 이용한 미소가열기, 미소 반응기, 미소 반응기 어레이 및 마이크로어레이 |
DK1859330T3 (da) * | 2005-01-28 | 2012-10-15 | Univ Duke | Apparater og fremgangsmåder til håndtering af små dråber på et trykt kredsløbskort |
EP1927000B1 (en) * | 2005-09-20 | 2016-09-14 | BAE Systems PLC | Sensor device with backside contacts |
US7790503B2 (en) * | 2007-12-18 | 2010-09-07 | Stats Chippac, Ltd. | Semiconductor device and method of forming integrated passive device module |
US8785821B2 (en) * | 2009-07-06 | 2014-07-22 | Sokudo Co., Ltd. | Substrate processing apparatus with heater element held by vacuum |
US20120074131A1 (en) * | 2010-09-29 | 2012-03-29 | Seagate Technology Llc | Integrated resistive heaters for microelectronic devices and methods utilizing the same |
US9554422B2 (en) * | 2011-05-17 | 2017-01-24 | Canon U.S. Life Sciences, Inc. | Systems and methods using external heater systems in microfluidic devices |
US9059109B2 (en) * | 2012-01-24 | 2015-06-16 | Taiwan Semiconductor Manufacturing Company, Ltd. | Package assembly and method of forming the same |
US9223317B2 (en) * | 2012-06-14 | 2015-12-29 | Advanced Liquid Logic, Inc. | Droplet actuators that include molecular barrier coatings |
US9539576B2 (en) * | 2013-09-18 | 2017-01-10 | Neumodx Molecular, Inc. | Thermocycling system and manufacturing method |
-
2020
- 2020-06-22 EP EP20734508.3A patent/EP3986615A1/en active Pending
- 2020-06-22 US US17/621,184 patent/US20220126300A1/en active Pending
- 2020-06-22 CN CN202080045341.4A patent/CN113993624B/zh active Active
- 2020-06-22 WO PCT/EP2020/067365 patent/WO2020254691A1/en active Application Filing
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1463038A (zh) * | 2002-05-31 | 2003-12-24 | 富士通株式会社 | 半导体器件及其制造方法 |
CN101143341A (zh) * | 2006-07-14 | 2008-03-19 | 霍夫曼-拉罗奇有限公司 | 用于监测加热和冷却的温度传感器元件 |
CN101542763A (zh) * | 2006-11-21 | 2009-09-23 | 赢创德固赛有限责任公司 | 热电元件、其制造方法及其使用 |
CN101247715A (zh) * | 2007-02-15 | 2008-08-20 | 保力马科技株式会社 | 热扩散片及其制造方法 |
CN101445216A (zh) * | 2008-12-04 | 2009-06-03 | 北京大学 | 分体式微机电***及其制备方法 |
CN102668058A (zh) * | 2009-10-21 | 2012-09-12 | 朗姆研究公司 | 具有用于半导体处理的平坦加热器区域的加热板 |
CN102928610A (zh) * | 2011-07-22 | 2013-02-13 | 泰肯贸易股份公司 | 用于操纵液滴中样品的盒子和*** |
CN104303056A (zh) * | 2012-03-08 | 2015-01-21 | 昌和生物医学科技(扬州)有限公司 | 用于改进疾病检测的微器件 |
WO2018104698A1 (en) * | 2016-12-09 | 2018-06-14 | Evonetix Ltd | Temperature control device |
WO2018147029A1 (ja) * | 2017-02-07 | 2018-08-16 | 株式会社 日立ハイテクノロジーズ | 自動分析装置 |
Also Published As
Publication number | Publication date |
---|---|
WO2020254691A1 (en) | 2020-12-24 |
US20220126300A1 (en) | 2022-04-28 |
EP3986615A1 (en) | 2022-04-27 |
CN113993624A (zh) | 2022-01-28 |
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Inventor after: B. Stensen Inventor after: W. Ryan Inventor after: An Xingyuan Inventor after: R. Lakshmanan Inventor after: H.Jian Inventor after: C. McLaughlin Inventor after: S. Giri Inventor after: M. Cohen Inventor after: H. Bernie Inventor after: D. McAuliffe Inventor before: B. Stensen Inventor before: W. Ryan Inventor before: C. Anthony Inventor before: R. Lakshmanan Inventor before: H.Jian Inventor before: C. McLaughlin Inventor before: S. Giri Inventor before: M. Cohen Inventor before: H. Bernie Inventor before: D. McAuliffe Inventor after: B. Stensen Inventor after: W. Ryan Inventor after: R. Trogan Inventor after: An Xingyuan Inventor after: R. Lakshmanan Inventor after: H.Jian Inventor after: C. McLaughlin Inventor after: S. Giri Inventor after: M. Cohen Inventor after: H. Bernie Inventor after: D. McAuliffe Inventor before: B. Stensen Inventor before: W. Ryan Inventor before: An Xingyuan Inventor before: R. Lakshmanan Inventor before: H.Jian Inventor before: C. McLaughlin Inventor before: S. Giri Inventor before: M. Cohen Inventor before: H. Bernie Inventor before: D. McAuliffe |
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