CN113943108A - Frosting liquid, frosted glass and processing method thereof - Google Patents
Frosting liquid, frosted glass and processing method thereof Download PDFInfo
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- CN113943108A CN113943108A CN202010680451.XA CN202010680451A CN113943108A CN 113943108 A CN113943108 A CN 113943108A CN 202010680451 A CN202010680451 A CN 202010680451A CN 113943108 A CN113943108 A CN 113943108A
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- 239000005338 frosted glass Substances 0.000 title claims abstract description 71
- 239000007788 liquid Substances 0.000 title abstract description 50
- 238000003672 processing method Methods 0.000 title abstract description 5
- 239000011521 glass Substances 0.000 claims abstract description 89
- 239000000758 substrate Substances 0.000 claims abstract description 70
- 241000533950 Leucojum Species 0.000 claims abstract description 64
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 claims abstract description 46
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 claims abstract description 25
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 23
- 229920002472 Starch Polymers 0.000 claims abstract description 19
- 235000019698 starch Nutrition 0.000 claims abstract description 19
- 239000008107 starch Substances 0.000 claims abstract description 19
- 229910017604 nitric acid Inorganic materials 0.000 claims abstract description 15
- 229910000162 sodium phosphate Inorganic materials 0.000 claims abstract description 15
- 229910052938 sodium sulfate Inorganic materials 0.000 claims abstract description 15
- 239000007832 Na2SO4 Substances 0.000 claims abstract description 14
- 229910000366 copper(II) sulfate Inorganic materials 0.000 claims abstract description 14
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 13
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims abstract description 12
- 239000000375 suspending agent Substances 0.000 claims abstract description 12
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 claims abstract description 8
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 claims abstract description 8
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims abstract description 6
- 238000005530 etching Methods 0.000 claims description 101
- 238000002791 soaking Methods 0.000 claims description 49
- 238000000034 method Methods 0.000 claims description 33
- 239000011159 matrix material Substances 0.000 claims description 22
- 238000004140 cleaning Methods 0.000 claims description 18
- 229910017665 NH4HF2 Inorganic materials 0.000 claims description 11
- 238000007654 immersion Methods 0.000 claims description 11
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 claims description 7
- 239000012530 fluid Substances 0.000 claims description 6
- 238000002834 transmittance Methods 0.000 claims description 6
- 230000032683 aging Effects 0.000 claims description 4
- 239000005354 aluminosilicate glass Substances 0.000 claims description 4
- LDDQLRUQCUTJBB-UHFFFAOYSA-N ammonium fluoride Chemical compound [NH4+].[F-] LDDQLRUQCUTJBB-UHFFFAOYSA-N 0.000 claims description 4
- 238000001035 drying Methods 0.000 claims description 4
- VBKNTGMWIPUCRF-UHFFFAOYSA-M potassium;fluoride;hydrofluoride Chemical compound F.[F-].[K+] VBKNTGMWIPUCRF-UHFFFAOYSA-M 0.000 claims description 4
- 238000012545 processing Methods 0.000 claims description 3
- 238000002310 reflectometry Methods 0.000 claims description 2
- AJPJDKMHJJGVTQ-UHFFFAOYSA-M sodium dihydrogen phosphate Chemical compound [Na+].OP(O)([O-])=O AJPJDKMHJJGVTQ-UHFFFAOYSA-M 0.000 claims description 2
- 230000003534 oscillatory effect Effects 0.000 claims 1
- 230000000007 visual effect Effects 0.000 abstract description 14
- 239000000428 dust Substances 0.000 abstract description 8
- 230000000694 effects Effects 0.000 description 46
- 239000002245 particle Substances 0.000 description 46
- 239000008367 deionised water Substances 0.000 description 16
- 229910021641 deionized water Inorganic materials 0.000 description 16
- 235000011187 glycerol Nutrition 0.000 description 15
- 229910019142 PO4 Inorganic materials 0.000 description 9
- 238000007605 air drying Methods 0.000 description 9
- 239000000203 mixture Substances 0.000 description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 8
- 238000003756 stirring Methods 0.000 description 8
- 230000008569 process Effects 0.000 description 7
- 238000005034 decoration Methods 0.000 description 4
- 239000008187 granular material Substances 0.000 description 4
- 239000013078 crystal Substances 0.000 description 3
- 239000005357 flat glass Substances 0.000 description 3
- 241000251468 Actinopterygii Species 0.000 description 2
- 230000003666 anti-fingerprint Effects 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 230000002349 favourable effect Effects 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- HUAUNKAZQWMVFY-UHFFFAOYSA-M sodium;oxocalcium;hydroxide Chemical compound [OH-].[Na+].[Ca]=O HUAUNKAZQWMVFY-UHFFFAOYSA-M 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000010998 test method Methods 0.000 description 2
- 229910019975 (NH4)2SiF6 Inorganic materials 0.000 description 1
- KLZUFWVZNOTSEM-UHFFFAOYSA-K Aluminum fluoride Inorganic materials F[Al](F)F KLZUFWVZNOTSEM-UHFFFAOYSA-K 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- VEUACKUBDLVUAC-UHFFFAOYSA-N [Na].[Ca] Chemical compound [Na].[Ca] VEUACKUBDLVUAC-UHFFFAOYSA-N 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- CSDREXVUYHZDNP-UHFFFAOYSA-N alumanylidynesilicon Chemical compound [Al].[Si] CSDREXVUYHZDNP-UHFFFAOYSA-N 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- BNIILDVGGAEEIG-UHFFFAOYSA-L disodium hydrogen phosphate Chemical compound [Na+].[Na+].OP([O-])([O-])=O BNIILDVGGAEEIG-UHFFFAOYSA-L 0.000 description 1
- 229910000397 disodium phosphate Inorganic materials 0.000 description 1
- 235000019800 disodium phosphate Nutrition 0.000 description 1
- 230000001804 emulsifying effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000002431 foraging effect Effects 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000001000 micrograph Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 235000010344 sodium nitrate Nutrition 0.000 description 1
- 239000004317 sodium nitrate Substances 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
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- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
The application discloses frosting liquid, frosted glass and a processing method thereof. The frosting solution comprises: etchant, grain forming agent, suspending agent and water, wherein the grain forming agent comprises H3PO4、HNO3、Na2SO4、CuSO4、NaNO3、NaH2PO4And NH4And Cl, wherein the suspending agent is starch and glycerol, and the frosting solution is a supersaturated solution. Therefore, the glass substrate is etched by the frosting liquid, the glass substrate can show a snowflake visual effect, and meanwhile, the glass substrate has excellent performances of anti-reflection light, scratch resistance, dust resistance, fingerprint resistance and the like, the appearance expressive force of the rear cover of the battery is obviously improved, and the diversified requirements of users on electronic equipment are met.
Description
Technical Field
The application relates to the technical field of glass frosting, in particular to frosting liquid, frosted glass and a processing method thereof.
Background
At present, the rear cover of the battery made of glass is more and more popular due to the advantages of excellent texture, easy decoration, no signal shielding and the like. The frosted etching is carried out on the glass substrate, so that the glass substrate can obtain the appearance effect of a matte surface, and the appearance expressive force of the rear cover of the battery is improved.
However, the present frosting solution for frosting and etching glass substrate, frosted glass and processing method thereof still need to be improved.
Disclosure of Invention
The present application is based on the discovery and recognition by the inventors of the following facts and problems:
the appearance of the current battery back cover still cannot meet the requirements of users. As described above, the glass substrate is subjected to frosting etching, whereby the glass substrate can be given a matte appearance. Specifically, the glass reacts with the frosting liquid to form spherical frosting particles, and the frosting particles can weaken reflected light to form diffuse reflection so as to achieve the matte effect. The inventor finds that the frosting liquid has an important influence on the appearance effect of the glass matrix, and particularly, the frosting liquid can influence the shape and arrangement of the formed frosting particles, so that the appearance effect of the glass matrix finally appears. Therefore, there is a need for an improvement of the frosting solution to obtain a new appearance effect for the glass substrate and improve the appearance expression of the rear cover of the battery.
The present application aims to mitigate or solve at least to some extent at least one of the above mentioned problems. In view of the above, the present application provides a frosting solution that can make a glass substrate exhibit a snowflake effect.
In one aspect of the present application, a frosting fluid is presented. The frosting solution comprises: etchant, grain forming agent, suspending agent and water, wherein the grain forming agent comprises H3PO4、HNO3、Na2SO4、CuSO4、NaNO3、NaH2PO4And NH4And Cl, wherein the suspending agent is starch and glycerol, and the frosting solution is a supersaturated solution. Therefore, the glass substrate is etched by the frosting liquid, the glass substrate can show a snowflake visual effect, and meanwhile, the glass substrate has excellent performances of anti-reflection light, scratch resistance, dust resistance, fingerprint resistance and the like, the appearance expressive force of the rear cover of the battery is obviously improved, and the diversified requirements of users on electronic equipment are met.
In another aspect of the present application, a method of processing frosted glass is provided. The method comprises the following steps: and performing swinging soaking etching on a preset area of the glass substrate by using the frosting liquid to form a frosting part so as to obtain the frosted glass. Therefore, the frosted glass obtained by the method can show a snowflake visual effect, has excellent performances of anti-reflection light, scratch resistance, dust resistance, fingerprint resistance and the like, remarkably improves the appearance expressive force of the rear cover of the battery, meets the diversified requirements of users on electronic equipment, and has the advantages of simplicity, practicability, easy operation, low cost and the like.
In another aspect of the present application, a frosted glass is provided. The frosted glass is processed by the method. From this, this frosted glass can demonstrate snowflake visual effect, has excellent properties such as reverberation resistance, anti fish tail, dust resistance, anti fingerprint simultaneously, is showing the outward appearance expressive force that promotes the lid behind the battery, satisfies the demand that the user is diversified to electronic equipment.
Drawings
FIG. 1 shows a photomicrograph of the frosted glass of example 1;
fig. 2 shows a microphotograph of the frosted glass of comparative example 1.
Detailed Description
Examples of the present application are described in detail below, and the examples described by referring to the drawings are illustrative only for the purpose of explaining the present application and are not to be construed as limiting the present application.
In one aspect of the present application, a frosting fluid is presented. According to an example of the present application, the frosting fluid comprises: the etching agent, the grain forming agent, the suspending agent and water, wherein the grain forming agent comprises H3PO4、HNO3、Na2SO4、CuSO4、NaNO3、NaH2PO4And NH4Cl, starch and glycerol as suspending agents, and supersaturated solution as frosting solution. Therefore, the glass substrate is etched by the frosting liquid, the glass substrate can show a snowflake visual effect, and meanwhile, the glass substrate has excellent performances of anti-reflection light, scratch resistance, dust resistance, fingerprint resistance and the like, the appearance expressive force of the rear cover of the battery is obviously improved, and the diversified requirements of users on electronic equipment are met.
The inventor finds that although the frosting solution can realize the snowflake effect of the common soda-lime flat glass at present, the frosting solution which can realize the snowflake effect of the high-alumina-silica glass does not exist. The common sodium-calcium plate glass is applied to the fields of furniture decoration, business space partition and the like, and the high-alumina-silicon glass is applied to the field of electronic equipment, such as a battery rear cover made of the high-alumina-silicon glass. The inventor finds that when the frosting solution for realizing the snowflake effect of the soda-lime flat glass is applied to the high-alumina-silica glass, the defects of uneven snowflake effect etching, too small snowflake particles, uneven snowflake size, frosting leakage and the like are caused, and the decoration requirement of the snowflake effect of the rear cover of the battery is seriously limited.
According to an example of the present application, the etchant in the frosting solution acts to form frosted particles on the glass surface, the grain former (HNO)3、H3PO4And Na2SO4、CuSO4、NaNO3、NaH2PO4And NH4Cl) plays a role in controlling the shape and arrangement of frosting particles, and the crystal grain forming agent can promote the formation of strip-shaped particles in the process of the reaction of the frosting solution and the glass, and the formed strip-shaped particles are arranged into a snowflake shape, so that the glass shows the snowflake visual effect. The suspending agent (starch and glycerol) is used for adjusting the viscosity of the frosting solution and improving the suspension emulsifying property of the frosting solution so as to be beneficial to realizing the purpose of uniform etching, and the generated strip-shaped particles are uniformly distributed on the surface of the glass so as to achieve the uniform snowflake visual effect.
According to an example of the present application, the frosting solution is a supersaturated solution. It should be noted that "supersaturated solution" means that the concentration of soluble solid powder particles in the solution exceeds its saturation concentration. According to the method, the frosting liquid is a supersaturated solution, so that the frosting liquid can always keep a saturated concentration in the etching process, various components in the frosting liquid are continuously supplied, and the reaction concentrations of the various components in the etching process are guaranteed to be unchanged. The supersaturated solution is in a metastable state, and in order to stabilize the supersaturated solution, the application adds a suspending agent (such as starch and glycerol) into the frosting solution, so that solid powder particles which cannot be fully dissolved are uniformly suspended in the frosting solution, and the stability of the system is ensured.
According to examples of the present application, the etchant may include NH4F、NH4HF2And KHF2. Thus, the etching agent can form frosted particles on the surface of the glass, and can be mixed with a crystal grain forming agent and a suspending agentHas good matching performance.
According to an example of the present application, a frosting fluid comprises: 8-15 wt% NH4F; 15-25 wt% NH4HF2(ii) a 5-8 wt% KHF2(ii) a 5-10 wt% of H3PO4(ii) a 10-20 wt% of HNO3(ii) a 0.5-3 wt% of Na2SO4(ii) a 2-6 wt% of CuSO4(ii) a 3-8 wt% NaNO3(ii) a 0.5-2 wt% NaH2PO4(ii) a 0.8-3 wt% NH4Cl; 8-15 wt% starch; 5-10 wt% of glycerol; and 8-15 wt% of water. Therefore, the frosting liquid is used for etching the glass substrate, so that the glass substrate can show a better snowflake effect.
The method optimizes the components of the frosting solution and the content of various components, specifically, the frosting solution is formed by adding an etching agent and a crystal grain forming agent and selecting a proper raw material proportion, the frosting solution reacts with the glass, the generated frosting particles are strip-shaped particles, and the strip-shaped particles are arranged into a snowflake shape, so that the glass substrate presents the snowflake visual effect. In the application, the strip-shaped particles grow on the surface of the glass, that is, the frosting solution reacts with part of the glass to generate the strip-shaped particles, the strip-shaped particles are firmly attached to the unreacted part of the glass, the glass and the strip-shaped particles form a whole, so that the surface of the glass substrate is provided with the strip-shaped bulges, the strip-shaped bulges are arranged into a snowflake shape, and the refraction and the reflection can occur after the light irradiates the strip-shaped bulges, thereby generating the visual effect of the snowflake under the illumination.
In the application, the components for forming the frosting liquid have relatively close performance and good co-solubility, the components have good matching property, the components in the proportion are mutually interacted, a balanced system is formed, strip-shaped particles can be generated after the components react with glass, and the strip-shaped particles are arranged into a snowflake shape. Through a large number of experiments, the inventor finds that the snowflake effect of the glass substrate can be influenced if a certain component in the system is replaced by another component, or a certain component in the system is removed, or the proportion of a certain component is changed. For example, the addition of nitric acid and copper sulfate, the addition of sodium nitrate and sodium sulfate, or the addition of sodium hydrogen phosphate and ammonium chloride will affect the formation and arrangement of the stripe-shaped particles, and the etched glass substrate will not achieve the snowflake effect. As another example, too high or too low a level of the grain-forming material in the system can affect the shape and size of the rod-like particles and thus the snowflake effect of the glass matrix. As another example, by replacing the suspending agent in the system with another suspending agent (e.g., barium sulfate), the suspensibility of the system becomes poor, resulting in poor snow effect achieved by the glass matrix. For another example, starch and glycerin are not added into the system, or the content of starch and glycerin is too high or too low, i.e. the frosting liquid is too thin or too thick, which can cause the phenomenon of frosting leakage, affect the shape and distribution of the strip-shaped particles, and affect the snowflake effect and the aesthetic property of the glass matrix.
According to a specific example of the present application, in the frosting fluid, NH4The content of F may be 8 wt%, 9 wt%, 10 wt%, 11 wt%, 12 wt%, 13 wt%, 14 wt%, 15 wt%; NH (NH)4HF2The content of (B) may be 15 wt%, 18 wt%, 20 wt%, 22 wt%, 25 wt%; KHF2The content of (B) may be 5 wt%, 6 wt%, 7 wt%, 8 wt%; h3PO4The content of (B) may be 5 wt%, 6 wt%, 7 wt%, 8 wt%, 9 wt%, 10 wt%; HNO3May be present in an amount of 10 wt%, 12 wt%, 15 wt%, 18 wt%, 20 wt%; na (Na)2SO4The content of (B) may be 0.5 wt%, 1 wt%, 1.5 wt%, 2 wt%, 2.5 wt%, 3 wt%; CuSO4The content of (B) may be 2 wt%, 3 wt%, 4 wt%, 5 wt%, 6 wt%; NaNO3The content of (B) may be 3 wt%, 4 wt%, 5 wt%, 6 wt%, 7 wt%, 8 wt%; NaH2PO4The content of (B) may be 0.5 wt%, 1 wt%, 1.2 wt%, 1.5 wt%, 2 wt%; NH (NH)4The Cl content may be 0.8 wt%, 1 wt%, 1.5 wt%, 2 wt%, 2.5 wt%, 3 wt%; the content of starch may be 8 wt%, 10 wt%, 12 wt%, 15 wt%; the content of glycerol may be 5 wt%, 6 wt%, 7 wt%, 8 wt%, 9 wt%, 10 wt%; the water content may be 8 wt%, 10 wt%, 12 wt%, 15 wt%. Regarding the specific content of the above components, those skilled in the art can determine the actual contentThe total content of the above components is 100%.
In another aspect of the present application, a method of processing frosted glass is provided. According to an example of the application, the method comprises: the predetermined area of the glass substrate is subjected to swing immersion etching using the frosting liquid described above to form a frosted portion to obtain a frosted glass. Therefore, the frosted glass obtained by the method can show a snowflake visual effect, has excellent performances of anti-reflection light, scratch resistance, dust resistance, fingerprint resistance and the like, greatly enhances the decoration aesthetic feeling of the rear cover of the battery and the fullness degree of the rear cover of the battery when the rear cover of the battery is touched and held, meets the requirement of a user on the diversification of electronic equipment, and has the advantages of simplicity, practicability, easy operation, low cost and the like.
The method for etching the frosting liquid has the advantages that the components of the frosting liquid and the content of each component are optimized, the method for etching the frosting liquid is designed, specifically, the method for etching the glass substrate by adopting the swinging soaking etching method can obtain strip-shaped particles with proper sizes and even distribution, and the strip-shaped particles are arranged into snowflake shapes, so that the frosting glass presents a snowflake effect. The inventor finds that if other etching methods such as standing soaking etching are adopted, the formed strip-shaped particles are not uniformly distributed, and the size of the strip-shaped particles is small, so that frosted glass has small snowflake patterns, the snowflake effect is not obvious, and the attractiveness is influenced.
Since the glass substrate is subjected to frosting etching, the etched portion of the glass substrate exhibits a snowflake effect and also exhibits a certain matte effect.
As mentioned above, aluminosilicate glass (i.e., high aluminosilicate glass) is typically used for the battery back cover. In the present application, the glass substrate is an aluminosilicate glass. The frosting liquid is utilized to carry out swing soaking etching on the aluminum-silicon glass, strip-shaped particles can be generated, and a plurality of strip-shaped particles are arranged into a snowflake shape, so that the rear cover of the battery can obtain a snowflake visual effect, and the requirement of a user on diversification of electronic equipment is met.
According to the example of the application, the part of the glass substrate except the preset area is covered with the anti-etching ink, so that the frosting liquid can be prevented from reacting with the part of the glass substrate except the preset area in the etching process, the aim of selective etching, namely etching the part needing to show the snowflake effect, can be achieved, and the etched part of the glass substrate is the frosting part. The specific composition of the etching resist ink is not particularly limited as long as the portion of the glass substrate covered with the ink can be protected from etching by the frosting liquid, and can be selected by those skilled in the art according to the specific circumstances.
According to the example of the application, before the glass substrate is subjected to the swing immersion etching, a predetermined area of the glass substrate is cleaned in advance, and then the glass substrate is put into a frosting solution to be subjected to the swing immersion etching. The temperature of the swing soaking etching can be 4-8 deg.C, such as 4 deg.C, 5 deg.C, 6 deg.C, 7 deg.C, and 8 deg.C, and the time of swing soaking etching can be 5-10min, such as 5min, 6min, 7min, 8min, 9min, and 10 min. The inventor finds that if the temperature of the swing soaking etching is too high or too low, and the time is too long or too short, the size and arrangement of the strip-shaped particles are affected, and the snowflake effect of the frosted glass is affected. The application carries out the swing and soaks the etching under above-mentioned condition, is favorable to obtaining the strip granule that has suitable size, evenly distributed and size unanimity, and the strip granule arranges into the shape of snowflake for frosted glass demonstrates the snowflake effect of preferred.
According to an example of the application, the swing stroke during the swing immersion etching process is 10-25cm, such as 10cm, 12cm, 15cm, 18cm, 20cm, 22cm, 25cm, preferably 15cm, and the swing rate during the swing immersion etching process is 20-50 reciprocations/min, such as 20 reciprocations/min, 25 reciprocations/min, 30 reciprocations/min, 35 reciprocations/min, 40 reciprocations/min, 45 reciprocations/min, 50 reciprocations/min, preferably 30 reciprocations/min. The inventor finds that if the swing stroke in the swing soaking etching process is too long or too short, the speed is too fast or too slow, and the size and arrangement of strip-shaped particles are also influenced, so that the snowflake effect of frosted glass is influenced. The application carries out the swing and soaks the etching under above-mentioned condition, is favorable to obtaining the strip granule that has suitable size, evenly distributed and size unanimity, and the strip granule arranges into the shape of snowflake for frosted glass demonstrates the snowflake effect of preferred.
Note that the "oscillation stroke" refers to a single stroke of the reciprocating oscillation.
According to the example of the application, the swing immersion etching is carried out under the conditions described above, strip-shaped particles with the depth of 20-30 μm and the span of 600-1500 μm can be obtained, and the strip-shaped particles are uniform in size and distribution and are arranged in a snowflake shape, so that the frosted glass presents a better snowflake effect and has stronger decorative aesthetic feeling.
According to an example of the application, the method further comprises: and cleaning the glass substrate subjected to swing soaking etching, and drying. After the glass substrate is subjected to swing soaking and etching, impurities can be attached to the surface of the glass substrate, part of the frosting liquid is remained on the surface of the glass substrate, the glass substrate is cleaned, the impurities attached to the surface of the glass substrate and the remained frosting liquid can be washed away, and drying can be air drying or drying so as to obtain clean frosted glass.
According to the present application, before the glass substrate is subjected to the swing immersion etching by using the frosting solution, the frosting solution needs to be subjected to standing aging, and the standing aging time can be 0.5-2h, such as 0.5h, 1h, 1.5h, and 2h, so that various components in the frosting solution can be fully reacted to obtain a balanced system. The inventors have found that if the frosting solution is left to stand for a long time for aging, the viscosity of the frosting solution increases, and the frosting glass has a poor snowflake effect. According to a preferred example of the present application, the time for standing aging may be 40 min.
In another aspect of the present application, a frosted glass is provided. According to an example of the present application, the frosted glass is processed using the method described above. From this, this frosted glass can demonstrate snowflake visual effect, has excellent properties such as reverberation resistance, anti fish tail, dust resistance, anti fingerprint simultaneously, is showing the outward appearance expressive force that promotes the lid behind the battery, satisfies the demand that the user is diversified to electronic equipment.
According to the application example, the frosted part of the frosted glass is provided with the strip-shaped bulges, and the strip-shaped bulges are arranged in the shape of snowflakes, so that the frosted glass can show a snowflake effect. According to an example of the application, the depth of the stripe-shaped protrusion is 20-30 μm, such as 20 μm, 22 μm, 25 μm, 28 μm, 30 μm, and the span of the stripe-shaped protrusion is 600-1500 μm, such as 600 μm, 700 μm, 800 μm, 900 μm, 1000 μm, 1100 μm, 1200 μm, 1300 μm, 1400 μm, 1500 μm. Therefore, the frosted glass has a snowflake visual effect. The strip-shaped bulges are arranged on the surface of the glass substrate in a short-range ordered and long-range disordered manner, and are uniformly distributed and consistent in size, so that the frosted glass has an excellent decorative effect.
According to the examples of the present application, the gloss of the frosted portion is 63-65%. Therefore, the frosted glass has a soft snowflake effect and does not bring uncomfortable feeling to human eyes.
According to the example of the present application, the light transmittance of the frosted portion is 59-61%. Therefore, the light transmittance of the frosted glass is reduced, so that the frosted glass can obtain the matte effect.
According to the examples of the present application, the haze of the frosted portion is 35-37%. Therefore, the frosted glass has a better matte effect.
According to an example of the present application, the roughness of the frosted portion is 2.5-3.5 μm. Therefore, the snowflake effect of the frosted glass can be further improved by the aid of the larger roughness, and the frosted glass has good holding feeling and good fingerprint and scratch resistance.
According to the examples of the present application, the reflectivity of the frosted portion is 6.5-7.5%. From this, frosted glass has better antireflection effect, promotes the comfort level that the user watched.
The test methods for the gloss, light transmittance, haze, roughness, and reflectance are not particularly limited, and those skilled in the art can perform the test using conventional test methods.
According to the examples of this application, the lid behind the battery can be utilized the frosted glass who has described earlier to form, from this, the lid behind the battery can demonstrate the visual effect of snowflake, has excellent performance such as reverberation resistance, mar resistance, dust resistance, fingerprint resistance simultaneously, and the apparent expressive force of showing promotes, satisfies user's demand to electronic equipment diversification.
According to an example of the present application, the electronic device may include the battery back cover, the display screen, and the main board described above, the battery back cover defines an accommodating space, the display screen and the main board are disposed in the accommodating space, and the display screen and the main board are electrically connected. Therefore, the electronic equipment has the appearance of a snowflake effect, and can meet the diversified requirements of users on the electronic equipment.
The present invention is described below with reference to specific examples, which are intended to illustrate the present invention and should not be construed as limiting the scope of the present invention. The examples do not specify particular techniques or conditions, according to techniques or conditions described in the literature in the field or according to the product specifications. The reagents or instruments used are not indicated by the manufacturer, and are all conventional products commercially available.
Example 1
(1) The frosting solution is prepared according to the following mixture ratio (wt%): NH (NH)4F 10.8％、NH4HF219.6％、KHF26.3％、H3PO45.7％、HNO317.6％、Na2SO40.9％、CuSO42.3％、NaNO33.6％、NaH2PO41.5％、NH4Cl1.2%, starch 11.2%, glycerin 6.5%, H2O12.8 percent, fully and uniformly stirring until the frosting liquid presents a uniformly suspended supersaturated solution state, and standing and curing for 40 min.
(2) The portions other than the predetermined regions of the high alumina silica glass substrate are covered with the etching resist ink.
(3) And cleaning a preset area of the high-alumina-silica glass matrix by using deionized water, and putting the high-alumina-silica glass matrix into a frosting liquid in a wet state for swinging, soaking and etching.
(4) Controlling the temperature of the swing soaking etching to be 6 ℃, controlling the time of the swing soaking etching to be 8 minutes, controlling the swing stroke of the swing soaking etching to be 15cm, and controlling the swing speed of the swing soaking etching to reciprocate for 30 times/minute.
(5) And (3) timely taking out the etched glass substrate from the frosting liquid after the requirement of the etching time is met, then cleaning the glass substrate by using deionized water, and air-drying to obtain the frosted glass.
When the frosted portion of the frosted glass of this example was observed with a microscope, the striped particles were observed, and the striped particles were arranged in a plurality of directions and in a snowflake shape, and the striped particles were uniformly distributed and uniform in size (refer to fig. 1, which is a photomicrograph magnified 640 times (eyepiece 16 × objective 40)). The frosted glass can be observed by naked eyes, and the uniform snowflake effect can be observed.
Example 2
(1) The frosting solution is prepared according to the following mixture ratio (wt%): NH (NH)4F 11.2％、NH4HF220.5％、KHF26.6％、H3PO46.3％、HNO3 18.6％、Na2SO40.8％、CuSO42.5％、NaNO33.0％、NaH2PO41.8％、NH4Cl1.5%, starch 10.5%, glycerin 5.0%, H2And O11.7 percent, fully and uniformly stirring until the frosting liquid is in a uniformly suspended supersaturated solution state, and standing and curing for 40 min.
(2) The portions other than the predetermined regions of the high alumina silica glass substrate are covered with the etching resist ink.
(3) And cleaning a preset area of the high-alumina-silica glass matrix by using deionized water, and putting the high-alumina-silica glass matrix into a frosting liquid in a wet state for swinging, soaking and etching.
(4) Controlling the temperature of the swing soaking etching to be 6 ℃, controlling the time of the swing soaking etching to be 8 minutes, controlling the swing stroke of the swing soaking etching to be 15cm, and controlling the swing speed of the swing soaking etching to reciprocate for 30 times/minute.
(5) And (3) timely taking out the etched glass substrate from the frosting liquid after the requirement of the etching time is met, then cleaning the glass substrate by using deionized water, and air-drying to obtain the frosted glass.
The frosting part of the frosted glass of the example is observed by using a microscope, strip-shaped particles can be observed, and the strip-shaped particles are arranged along a plurality of directions and are arranged into a snowflake shape, and are uniformly distributed and consistent in size. The frosted glass can be observed by naked eyes, and the uniform snowflake effect can be observed.
Example 3
(1) The frosting solution is prepared according to the following mixture ratio (wt%): NH (NH)4F 10.5％、NH4HF220.6％、KHF26.5％、H3PO45.6％、HNO3 18.5％、Na2SO40.8％、CuSO42.0％、NaNO33.3％、NaH2PO41.6％、NH4Cl1.3%, starch 10.2%, glycerin 6.8%, H2O12.3 percent, fully and uniformly stirring until the frosting liquid presents a uniformly suspended supersaturated solution state, and standing and curing for 40 min.
(2) The portions other than the predetermined regions of the high alumina silica glass substrate are covered with the etching resist ink.
(3) And cleaning a preset area of the high-alumina-silica glass matrix by using deionized water, and putting the high-alumina-silica glass matrix into a frosting liquid in a wet state for swinging, soaking and etching.
(4) Controlling the temperature of the swing soaking etching to be 6 ℃, controlling the time of the swing soaking etching to be 8 minutes, controlling the swing stroke of the swing soaking etching to be 15cm, and controlling the swing speed of the swing soaking etching to reciprocate for 30 times/minute.
(5) And (3) timely taking out the etched glass substrate from the frosting liquid after the requirement of the etching time is met, then cleaning the glass substrate by using deionized water, and air-drying to obtain the frosted glass.
The frosting part of the frosted glass of the example is observed by using a microscope, strip-shaped particles can be observed, and the strip-shaped particles are arranged along a plurality of directions and are arranged into a snowflake shape, and are uniformly distributed and consistent in size. The frosted glass can be observed by naked eyes, and the uniform snowflake effect can be observed.
Comparative example 1
(1) The frosting solution is prepared according to the following mixture ratio (wt%): NH (NH)4F 11.2％、NH4HF220.5％、KHF26.6％、H3PO46.3％、HNO3 18.6％、Na2SO40.8％、CuSO42.5％、NaNO33.0％、NaH2PO41.8％、NH4Cl1.5%, starch 10.5%, sweetOil 5.0%, H2And O11.7 percent, fully and uniformly stirring until the frosting liquid is in a uniformly suspended supersaturated solution state, and standing and curing for 40 min.
(2) The portions other than the predetermined regions of the high alumina silica glass substrate are covered with the etching resist ink.
(3) And (3) cleaning a preset area of the high-alumina-silica glass matrix by using deionized water, and putting the high-alumina-silica glass matrix into frosting liquid in a wet state for standing, soaking and etching, namely, not swinging.
(4) The temperature of the standing soaking etching is controlled to be 6 ℃, and the time of the standing soaking etching is controlled to be 8 minutes.
(5) And (3) timely taking out the etched glass substrate from the frosting liquid after the requirement of the etching time is met, then cleaning the glass substrate by using deionized water, and air-drying to obtain the frosted glass.
When the frosted portion of the frosted glass of this comparative example was observed by a microscope, the striped particles were observed, and the striped particles were arranged in a plurality of directions, but the striped particles were not uniform in size and distribution (see fig. 2, which is a photomicrograph magnified 640 times (eyepiece 16 × objective 40)). When the frosted glass is observed by naked eyes, the snowflake effect is not obvious and uniform, and the decorative effect is not beautiful.
Comparative example 2
(1) The frosting solution is prepared according to the following mixture ratio (wt%): NH (NH)4F 11.2％、NH4HF220.5％、KHF26.6％、H3PO424.3％、Na2SO40.8％、NaNO35.8％、NaH2PO41.8％、NH4Cl 1.5%, starch 10.5%, glycerin 5.0%, H2O12.0 percent, fully and uniformly stirring until the frosting liquid presents a uniformly suspended supersaturated solution state, and standing and curing for 40 min.
(2) The portions other than the predetermined regions of the high alumina silica glass substrate are covered with the etching resist ink.
(3) And cleaning a preset area of the high-alumina-silica glass matrix by using deionized water, and putting the high-alumina-silica glass matrix into a frosting liquid in a wet state for swinging, soaking and etching.
(4) Controlling the temperature of the swing soaking etching to be 6 ℃, controlling the time of the swing soaking etching to be 8 minutes, controlling the swing stroke of the swing soaking etching to be 15cm, and controlling the swing speed of the swing soaking etching to reciprocate for 30 times/minute.
(5) And (3) timely taking out the etched glass substrate from the frosting liquid after the requirement of the etching time is met, then cleaning the glass substrate by using deionized water, and air-drying to obtain the frosted glass.
The frosted glass is observed by naked eyes, and the frosted glass does not show the snowflake effect.
Comparative example 3
(1) The frosting solution is prepared according to the following mixture ratio (wt%): NH (NH)4F 11.2％、NH4HF220.5％、KHF27.6％、H3PO46.3％、HNO3 18.6％、Na2SO40.8％、CuSO42.5％、NaNO34.0%, starch 10.5%, glycerin 5.5%, H2O12.5 percent, fully and uniformly stirring until the frosting liquid presents a uniformly suspended supersaturated solution state, and standing and curing for 40 min.
(2) The portions other than the predetermined regions of the high alumina silica glass substrate are covered with the etching resist ink.
(3) And cleaning a preset area of the high-alumina-silica glass matrix by using deionized water, and putting the high-alumina-silica glass matrix into a frosting liquid in a wet state for swinging, soaking and etching.
(4) Controlling the temperature of the swing soaking etching to be 6 ℃, controlling the time of the swing soaking etching to be 8 minutes, controlling the swing stroke of the swing soaking etching to be 15cm, and controlling the swing speed of the swing soaking etching to reciprocate for 30 times/minute.
(5) And (3) timely taking out the etched glass substrate from the frosting liquid after the requirement of the etching time is met, then cleaning the glass substrate by using deionized water, and air-drying to obtain the frosted glass.
The frosted glass is observed by naked eyes, and the frosted glass does not show the snowflake effect.
Comparative example 4
(1) The frosting solution is prepared according to the following mixture ratio (wt%): NH (NH)4F 11.2％、NH4HF220.5％、KHF26.6％、H3PO46.3％、HNO3 18.6％、Na2SO40.8％、CuSO42.5％、NaNO33.0％、NaH2PO41.8％、NH4Cl1.5%, starch 10.5%, glycerin 5.0%, H2And O11.7 percent, fully and uniformly stirring until the frosting liquid is in a uniformly suspended supersaturated solution state, and standing and curing for 40 min.
(2) The portions other than the predetermined regions of the high alumina silica glass substrate are covered with the etching resist ink.
(3) And cleaning a preset area of the high-alumina-silica glass matrix by using deionized water, and putting the high-alumina-silica glass matrix into a frosting liquid in a wet state for swinging, soaking and etching.
(4) Controlling the temperature of the swing soaking etching to be 6 ℃, controlling the time of the swing soaking etching to be 8 minutes, controlling the swing stroke of the swing soaking etching to be 15cm, and controlling the swing speed of the swing soaking etching to reciprocate for 60 times/minute.
(5) And (3) timely taking out the etched glass substrate from the frosting liquid after the requirement of the etching time is met, then cleaning the glass substrate by using deionized water, and air-drying to obtain the frosted glass.
The frosting part of the frosted glass of the comparative example is observed by using a microscope, and strip-shaped particles can be observed, but the strip-shaped particles are different in size and are not uniformly distributed. The frosted glass is poor in snowflake effect and not attractive in decorative effect when observed by naked eyes. The frosting part was touched by hand, and the scratch had a bad touch.
Comparative example 5
(1) The frosting solution is prepared according to the following mixture ratio (wt%): NH (NH)4F 10.8％、AlF319.6％、NaF 6.3％、H2SO45.7％、HNO317.6％、(NH4)2SiF60.9％、ZnCl22.3％、NaNO33.6％、NaH2PO41.5％、NH4NO31.2%, starch 11.2%, glycerol 6.5%, H2O12.8 percent, fully and uniformly stirring until the frosting liquid presents a uniformly suspended supersaturated solution state, and standing and curing for 40 min.
(2) The portions other than the predetermined regions of the high alumina silica glass substrate are covered with the etching resist ink.
(3) And cleaning a preset area of the high-alumina-silica glass matrix by using deionized water, and putting the high-alumina-silica glass matrix into a frosting liquid in a wet state for swinging, soaking and etching.
(4) Controlling the temperature of the swing soaking etching to be 6 ℃, controlling the time of the swing soaking etching to be 8 minutes, controlling the swing stroke of the swing soaking etching to be 15cm, and controlling the swing speed of the swing soaking etching to reciprocate for 30 times/minute.
(5) And (3) timely taking out the etched glass substrate from the frosting liquid after the requirement of the etching time is met, then cleaning the glass substrate by using deionized water, and air-drying to obtain the frosted glass.
The frosted glass is observed by naked eyes, and the frosted glass does not show the snowflake effect.
The unetched glass and the frosted glass of examples 1-3 were tested for gloss, light transmittance, haze, roughness and reflectance, respectively, and the results are shown in table 1.
TABLE 1
| Performance of | Non-etched glass | Example 1 | Example 2 | Example 3 |
| Gloss (%) | 110.8 | 63.8 | 64.5 | 64.2 |
| Light transmittance (%) | 95.6 | 60.3 | 59.8 | 59.6 |
| Haze (%) | 0.08 | 36.2 | 35.5 | 35.8 |
| Roughness (μm) | 0 | 2.8 | 3.0 | 2.9 |
| Reflectance (%) | 8.8 | 7.3 | 7.0 | 7.2 |
Various examples and features of different examples described in this specification can be combined and combined by one skilled in the art without contradiction.
Although embodiments of the present application have been shown and described above, it is understood that the above embodiments are exemplary and should not be construed as limiting the present application, and that variations, modifications, substitutions and alterations may be made to the above embodiments by those of ordinary skill in the art within the scope of the present application.
Claims (13)
1. A frosting fluid, comprising:
etchant, grain forming agent, suspending agent and water,
the grain former comprises H3PO4、HNO3、Na2SO4、CuSO4、NaNO3、NaH2PO4And NH4And Cl, wherein the suspending agent is starch and glycerol, and the frosting solution is a supersaturated solution.
2. The frosting solution of claim 1, wherein the etchant comprises NH4F、NH4HF2And KHF2。
3. The frosting solution according to claim 1, comprising:
8-15 wt% NH4F；
15-25 wt% NH4HF2；
5-8 wt% KHF2；
5-10 wt% of H3PO4；
10-20 wt% of HNO3；
0.5-3 wt% of Na2SO4；
2-6 wt% of CuSO4；
3-8 wt% NaNO3；
0.5-2 wt% NaH2PO4；
0.8-3 wt% NH4Cl；
8-15 wt% starch;
5-10 wt% of glycerol; and
8-15 wt% of water.
4. A method for processing frosted glass is characterized by comprising the following steps:
performing oscillatory immersion etching on a predetermined region of a glass substrate using the frosting solution according to any one of claims 1 to 3 to form a frosted portion to obtain the frosted glass.
5. The method of claim 4, wherein the temperature of the swing soak etch is 4-8 ℃ and the time of the swing soak etch is 5-10 min.
6. The method of claim 4, wherein the oscillating stroke of the oscillating immersion etching is 10-25cm, and the oscillating speed of the oscillating immersion etching is 20-50 reciprocating times/min.
7. The method according to claim 4, wherein the glass matrix is an aluminosilicate glass.
8. The method of claim 4, wherein the frosting solution is subjected to standing aging for 0.5-2h before the swing immersion etching is performed.
9. The method of claim 4, further comprising:
and cleaning the glass substrate subjected to the swing soaking etching, and drying to obtain the frosted glass.
10. The method according to claim 4, wherein the portions of the glass substrate other than the predetermined areas are covered with an etching-resistant ink.
11. A frosted glass, wherein said frosted glass is processed by the method of any of claims 4 to 10.
12. The frosted glass according to claim 11, wherein the frosted portion of the frosted glass has striped protrusions arranged in a snowflake shape, the striped protrusions have a depth of 20-30 μm, and the striped protrusions have a span of 600-1500 μm.
13. The frosted glass of claim 11, wherein the frosted portion has a gloss of 63-65%;
optionally, the frosted part has a light transmittance of 59-61%;
optionally, the frosting has a haze of 35-37%;
optionally, the frosted part has a roughness of 2.5-3.5 μm;
optionally, the frosted portion has a reflectivity of 6.5-7.5%.
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114751648A (en) * | 2022-04-01 | 2022-07-15 | 惠州市百时达化工有限公司 | Frosting liquid medicine for high-alumina-silica glass etching surface lattice directional arrangement and process |
| CN115124249A (en) * | 2022-01-20 | 2022-09-30 | 佛山犀马精细化工有限公司 | Glass substrate fluorite-shaped fingerprint-resistant and flash-effect etching forming process |
| CN115432934A (en) * | 2022-09-07 | 2022-12-06 | Oppo广东移动通信有限公司 | Frosting liquid, shell assembly, manufacturing method of shell assembly and electronic equipment |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111233339A (en) * | 2020-03-21 | 2020-06-05 | 郑州恒昊光学科技有限公司 | Glass etching solution, high-alumina-silica glass etching method and high-alumina-silica glass with texture on surface |
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Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111233339A (en) * | 2020-03-21 | 2020-06-05 | 郑州恒昊光学科技有限公司 | Glass etching solution, high-alumina-silica glass etching method and high-alumina-silica glass with texture on surface |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115124249A (en) * | 2022-01-20 | 2022-09-30 | 佛山犀马精细化工有限公司 | Glass substrate fluorite-shaped fingerprint-resistant and flash-effect etching forming process |
| CN115124249B (en) * | 2022-01-20 | 2024-01-23 | 佛山犀马精细化工有限公司 | Fluorite-shaped fingerprint-resistant and flashing-effect etching molding process for glass substrate |
| CN114751648A (en) * | 2022-04-01 | 2022-07-15 | 惠州市百时达化工有限公司 | Frosting liquid medicine for high-alumina-silica glass etching surface lattice directional arrangement and process |
| CN114751648B (en) * | 2022-04-01 | 2024-02-27 | 惠州市百时达化工有限公司 | Frosting liquid medicine and process for high-alumina silicate glass etched surface lattice directional arrangement |
| CN115432934A (en) * | 2022-09-07 | 2022-12-06 | Oppo广东移动通信有限公司 | Frosting liquid, shell assembly, manufacturing method of shell assembly and electronic equipment |
| CN115432934B (en) * | 2022-09-07 | 2023-11-03 | Oppo广东移动通信有限公司 | Frosting liquid, shell assembly, manufacturing method of shell assembly and electronic equipment |
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Application publication date: 20220118 |