CN113930722A - High-red-hardness AlCrN/AlTiN nano multilayer coating and preparation method thereof - Google Patents

High-red-hardness AlCrN/AlTiN nano multilayer coating and preparation method thereof Download PDF

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CN113930722A
CN113930722A CN202111184598.0A CN202111184598A CN113930722A CN 113930722 A CN113930722 A CN 113930722A CN 202111184598 A CN202111184598 A CN 202111184598A CN 113930722 A CN113930722 A CN 113930722A
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alcrn
multilayer coating
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范其香
林静
马德政
张硕
王铁钢
曹凤婷
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Tianjin University of Technology and Education China Vocational Training Instructor Training Center
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
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    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
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    • C23C14/3485—Sputtering using pulsed power to the target
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    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering

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Abstract

The invention discloses a high-red-hardness AlCrN/AlTiN nano multilayer coating and a preparation method thereof, belonging to the technical field of coating preparation. AlCr and AlTi alloy are selected as target materials and are respectively connected with a magnetron sputtering power supply and an arc ion plating power supply to prepare the AlCrN/AlTiN nano multilayer coating with a coherent relationship, and the good high-temperature oxidation resistance of the AlCrN coating and the excellent high-temperature red hardness of the AlTiN coating are comprehensively utilized. The AlCrN/AlTiN nano multilayer coating prepared by the invention has a compact structure, high red hardness, high-temperature oxidation resistance and corrosion resistance, and good combination with a substrate, and can be applied to cutting of hard-to-process materials such as hardened steel and the like.

Description

High-red-hardness AlCrN/AlTiN nano multilayer coating and preparation method thereof
Technical Field
The invention relates to the technical field of coating preparation, in particular to a high-red-hardness AlCrN/AlTiN nano multilayer coating and a preparation method thereof.
Background
With the increasing attention of human beings on the resource and environmental protection, the green dry cutting processing technology gradually draws wide attention and becomes one of the important development directions of the future manufacturing industry. During dry cutting, cutting fluid is not used, a cutter is in direct contact with a workpiece, extrusion friction is severe, cutting temperature and cutting force are increased rapidly, and cutter abrasion is aggravated. When the hard-to-process materials such as high-strength steel, high-temperature alloy and the like are subjected to dry cutting, the cutting temperature can even reach over 1000 ℃. Chemical affinity is easily generated between the workpiece and the cutter at high temperature, physical and chemical reactions such as diffusion, bonding, oxidation and the like are generated, the hardness and toughness of the cutter are reduced, and the cutting life and the processing efficiency are sharply reduced. The high-efficiency cutting processing of difficult-to-process materials such as high-strength steel, high-temperature alloy and the like becomes an important problem to be solved urgently in the manufacturing technology of China.
In the early development stage of the coating, the components of the coating are mainly binary carbides or nitrides such as TiN, TiC, CrN and the like. Such coatings are still used in cutting tools, but do not meet the requirements of advanced machining technology. The nano multilayer coating is a multilayer structure film formed by alternately growing two or more materials with different components or structures in a direction vertical to the one dimension of the coating. A large number of parallel interfaces exist in the composite material, dislocation movement and element diffusion resistance can be increased, and the composite material has a super-hard effect of abnormally increased hardness and elastic modulus, and becomes a research hotspot.
Disclosure of Invention
The invention aims to provide a high-red-hardness AlCrN/AlTiN nano multilayer coating and a preparation method thereof, which utilize the good high-temperature oxidation resistance of the AlCrN coating, the excellent high-temperature red hardness of the AlTiN coating and the coherent interface between nano layers to block dislocation movement and element diffusion, and further enhance the hardness, wear resistance and high-temperature thermal stability of the coating.
In order to achieve the purpose, the technical scheme adopted by the invention is as follows:
a high red hard AlCrN/AlTiN nano multilayer coating is formed by alternately compounding AlCrN layers and AlTiN layers, wherein the AlCrN layers and the AlTiN layers are of face-centered cubic structures and keep a coherent relationship; the single layer of the AlCrN layer and the single layer of the AlTiN layer are both nano-scale in thickness.
The content of N in the AlCrN layer is 40-55 at.%, the content of Al is 25-40 at.%, and the content of Cr is 10-25 at.%; the AlTiN layer contains N40-55 at.%, Al 25-40 at.%, and Ti 10-30 at.%.
The modulation period of the nano multilayer coating is 5-100nm, and the modulation ratio is AlTiN/AlCrN which is 0.5-4; the total thickness of the nano multilayer coating is 1.5-10 microns.
An AlTi metal transition layer with the thickness of 50-300 nm and an AlTiN transition layer with the thickness of 10-300 nm are deposited between the nano multilayer coating and the substrate.
The nano multilayer coating has good red hardness, the hardness is still above 30GPa after heat preservation for 1h at 800 ℃, and the nano multilayer coating has good high-temperature heat stability; and the bonding with the matrix is good, and the bonding force is higher than 60N by adopting a scratch tester for testing.
The preparation method of the high-red-hardness AlCrN/AlTiN nano multilayer coating adopts AlTi alloy and AlCr alloy as target materials, and adopts the composite technology of arc ion plating and magnetron sputtering to deposit the nano multilayer coating on the surface of a metal, hard alloy or ceramic substrate; the method specifically comprises the following steps:
(1) ultrasonic cleaning the base material in acetone, alcohol and deionized water for 15-30 min, and placing the base material on a rotary frame of a coating chamber, wherein the rotary speed of the rotary frame is 5-40 r/min, and the target base distance is 80-150 mm;
(2) vacuumizing to make the air pressure in vacuum chamber less than 9X 10-3When Pa, the furnace chamber is heated to 200-500 deg.C, and the air pressure in the vacuum chamber is less than 9 × 10-3Introducing Ar gas when Pa is reached, wherein the flow of Ar gas is 50-500 sccm, adjusting the pressure of the vacuum chamber to be 0.6-3 Pa, applying negative bias of-600-1000V to the substrate, and performing glow cleaning for 10-30 min; then starting an AlTi target, wherein the target current is 50-200A, adjusting the bias voltage to-200-30V, and depositing an AlTi metal transition layer on the substrate for 5-40 min (preferably 5-30 min);
(3) keeping the AlTi target open, and then introducing N2，N2The flow rate is 100-500 sccm, and the flow rate of Ar is adjusted to make the gas flow rate ratio N2the/Ar is 1-10; adjusting the pressure of the vacuum chamber to 0.6-3 Pa, and depositing an AlTiN transition layer for 5-30 min;
(4) keeping the AlTi target on and N2And introducing Ar, starting an AlCr target with the power of 2-4 kW, and depositing the AlCrN/AlTiN nano multilayer coating for 60-480 min.
In the method, an AlTi target and an AlCr target are respectively connected with an arc ion plating power supply and a direct current pulse magnetron sputtering power supply; the substrate is arranged in the middle of the vacuum chamber, the AlTi target and the AlCr target are oppositely arranged on two sides of the substrate, when the AlCrN/AlTiN nano multilayer coating is deposited in the step (4), the AlTi target and the AlCr target are simultaneously opened, and the AlCrN layer and the AlTiN layer are alternately deposited on the substrate due to the rotation of the rotating frame where the substrate is arranged, so that the AlCrN/AlTiN nano multilayer coating with a small modulation period (the modulation period is 5-20nm) can be prepared; when preparing AlCrN/AlTiN nano multilayer coating with large modulation period (modulation period is 20-100nm), the AlTi target and the AlCr target need to be switched on and off intermittently.
The Al content of the AlTi alloy target material is 30-70 at.%, the Ti content is the rest, the Al content of the AlCr alloy target material is 30-70 at.%, and the Cr content is the rest.
The modulation period and the modulation ratio of the AlCrN/AlTiN nano multilayer coating are jointly controlled by the rotating speed of a rotating frame or the target starting period, the AlTi target current and the AlCr target power; the CrAl target current in the steps (3) - (4) is 50-200A.
The design mechanism of the invention is as follows:
the AlCrN and AlTiN coatings have higher hardness and wear resistance due to the solid solution strengthening and fine grain strengthening effects of Al elements, and are widely applied in industry. The AlCrN coating can generate a layer of Al on the surface at high temperature2O3The stable growing oxide film mainly blocks the diffusion of external O element into the coating, reduces the oxidation rate, has good high-temperature oxidation resistance, but is easy to generate CrN → Cr at high temperature2N+N2→Cr+N2Phase transformation, a sharp decrease in mechanical properties, a poor red hardness, and a decrease in cutting properties. On the contrary, the AlTiN coating is relatively stable during high-temperature annealing and has good red hardness, but Ti is easy to generate loose TiO in an oxidation environment2And phase, accelerate oxidation of the coating, and show poor high temperature oxidation resistance. In order to integrate the advantages of AlCrN and AlTiN, the invention provides an AlCrN/AlTiN nano multilayer coating in a coherent relationship, and simultaneously utilizes a coherent interface between nano layers to block the phase transition and element diffusion of the coating, further enhances the hardness, wear resistance and high-temperature oxidation resistance of the coating, and improves the comprehensive performance of the coatingAnd (4) synthesizing the performance.
The invention has the following advantages:
1. the invention adopts the composite technology of arc ion plating and magnetron sputtering to deposit the AlCrN/AlTiN nano multilayer coating on the metal, hard alloy or ceramic substrate. In the deposition process, the deposition temperature, the deposition pressure, Ar and N in the furnace chamber are strictly controlled2Flow, rotating speed of the rotating frame and power supply power of each target to prepare the AlCrN/AlTiN nano multilayer coating with compact structure and coherent relationship.
2. The AlCrN/AlTiN nano multilayer coating developed by the invention has higher hardness and wear resistance.
3. The AlCrN/AlTiN nano multilayer coating developed by the invention has higher red hardness and high-temperature thermal stability, and can be used in the field of high-speed dry cutting processing.
4. The AlCrN/AlTiN nano multilayer coating developed by the invention has a compact structure and is well combined with a substrate.
5. The AlCrN/AlTiN nano multilayer coating developed by the invention has good process repeatability, can improve the service performance of the cutter when coated on the cutter, and can be applied to cutting of difficult-to-process materials such as die steel and the like.
Drawings
FIG. 1 is an XRD diffraction pattern of AlCrN/AlTiN nano multilayer coating prepared by adopting an arc ion plating and magnetron sputtering composite technology;
FIG. 2 is a surface topography diagram of AlCrN/AlTiN nano multilayer coating prepared by adopting an arc ion plating and magnetron sputtering composite technology;
fig. 3 is a graph of flank wear width and cutting time for H13 steel cutting by using an AlCrN/AlTiN nano multilayer coated tool and an uncoated tool compositely prepared by arc ion plating technology and magnetron sputtering.
Detailed Description
The present invention will be described in further detail with reference to examples.
Example 1
In this example, AlCrN/AlTiN nano-multilayer coatings were deposited on polished cemented carbide wafers with sample sizes of 30mm by 3 mm. Sequentially adopting acetone,Ultrasonically cleaning the substrate with alcohol and distilled water for 20min, drying, and placing on a rotating stand in an arc ion plating and magnetron sputtering composite coating machine, wherein the rotating speed of the rotating stand is set to be 30r/min, and the target base distance is 120 mm. The target material is selected from an AlTi target (Al55Ti45 (at.%)) and an AlCr target (Al60Cr40 (at.%)), and the working gas and the reaction gas are high-purity Ar and N2(the purity is 99.999%).
Vacuum pumping the background of the vacuum chamber to 6.9 x 10-3Pa; the heating system is turned on to make the temperature in the furnace reach 300 ℃, and when the vacuum degree in the furnace reaches 9.0 multiplied by 10 again-3Introducing Ar gas of 250sccm when the pressure is lower than Pa, adjusting a throttle valve to stabilize the pressure at 1Pa, applying negative bias of-800V on the substrate, and glow-cleaning for 20 min. Then starting the AlTi target, setting the current to be 60A, reducing the bias voltage to-120V, and firstly depositing a metal AlTi transition layer for 5 min.
Introducing reaction gas N2(purity 99.999%) 160sccm, the Ar flow rate is reduced to 40sccm, and the gas flow rate ratio N is maintained2And the/Ar is 4, the working air pressure is 0.8Pa by adjusting the size of the throttle valve, and the AlTiN transition layer is deposited for 10 min.
Starting an AlCr target, setting the target power to be 2.2kW, and depositing an AlCrN/AlTiN nano multilayer coating; the coating time lasts for 240 min.
FIG. 1 shows the XRD diffraction pattern of AlCrN/AlTiN nano-multilayer coating prepared in this example, and it can be seen that the coating diffraction peak is located in the middle of fcc-AlN, fcc-CrN and fcc-TiN standard diffraction peaks, and is considered to be composed of (Al, Cr, Ti) N coating with face-centered cubic structure.
FIG. 2 is a surface topography of the AlCrN/AlTiN nano-multilayer coating prepared in this example, with the EDS test coating surface composition of 32.37 at.% Al, 10.24 at.% Cr, 15.26 at.% Ti and 42.13 at.% N.
Through JEM-2010 high-resolution Transmission Electron Microscope (TEM) detection, the AlCrN layer and the AlTiN layer keep a coherent relationship; the content of N in the AlCrN layer is 42.68 at.%, the content of Al is 34.24 at.%, and the content of Cr is 23.08 at.%; the AlTiN layer had an N content of 41.50 at.%, an Al content of 32.09 at.%, and a Ti content of 26.41 at.%.
The modulation period of the nano multilayer coating is 10nm, and the modulation ratio is AlTiN/AlCrN which is 2; the total thickness of the coating is 2.8 μm, the hardness is about 36.7GPa, and the film-substrate bonding force is about 65N. The hardness is 32.6GPa after heat preservation for 1h at the temperature of 800 ℃.
Example 2
This example is a hard alloy end mill with a 6mm diameter AlCrN/AlTiN nano multilayer coating deposited thereon. The substrate is ultrasonically cleaned by acetone, alcohol and distilled water for 20min, dried and placed on a rotating stand in an arc ion plating and magnetron sputtering composite coating machine, the rotating speed of the rotating stand is set to be 30r/min, and the target base distance is 120 mm. The target material is selected from an AlTi target (Al55Ti45 (at.%)) and an AlCr target (Al60Cr40 (at.%)), and the working gas and the reaction gas are high-purity Ar and N2(the purity is 99.999%).
Vacuum pumping the background of the vacuum chamber to 6.9 x 10-3Pa; the heating system is turned on to make the temperature in the furnace reach 400 ℃, and when the vacuum degree in the furnace reaches 9.0 multiplied by 10 again-3Introducing Ar gas of 250sccm when the pressure is lower than Pa, adjusting a throttle valve to stabilize the pressure at 1.5Pa, applying negative bias of-800V on the substrate, and glow-cleaning for 15 min. Then starting the AlTi target, setting the current to be 60A, adjusting a throttle valve to keep the pressure in the furnace at 1Pa, reducing the bias voltage to-90V, and firstly depositing a metal AlTi transition layer for 5 min.
Introducing reaction gas N2(purity 99.999%) 160sccm, the Ar flow rate is reduced to 40sccm, and the gas flow rate ratio N is maintained2And the/Ar is 5, the working air pressure is 0.8Pa by adjusting the size of the throttle valve, and the AlTiN transition layer is deposited for 10 min.
Starting an AlCr target, setting the target power to be 2.2kW, and depositing an AlCrN/AlTiN nano multilayer coating; the coating time lasts for 240 min.
Fig. 3 is a graph of flank wear width and cutting time for H13 steel cutting for the AlCrN/AlTiN nano multilayer coated milling cutter and the uncoated milling cutter prepared in this example.
Example 3
In this example, AlCrN/AlTiN nano-multilayer coatings were deposited on polished cemented carbide wafers with sample sizes of 30mm by 3 mm. Ultrasonically cleaning the substrate with acetone, alcohol and distilled water for 20min, blow-drying, and then placing in arc ion plating and magnetron sputteringOn a rotating frame in the film combining and coating machine, the rotating speed of the rotating frame is set to be 30r/min, and the target base distance is 120 mm. The target material is selected from an AlTi target (Al55Ti45 (at.%)) and an AlCr target (Al60Cr40 (at.%)), and the working gas and the reaction gas are high-purity Ar and N2(the purity is 99.999%).
Vacuum pumping the background of the vacuum chamber to 6.9 x 10-3Pa; the heating system is turned on to make the temperature in the furnace reach 300 ℃, and when the vacuum degree in the furnace reaches 9.0 multiplied by 10 again-3Introducing Ar gas of 250sccm when the pressure is lower than Pa, regulating the pressure of the throttle valve to be 1Pa, applying minus 800V negative bias on the substrate, and glow-cleaning for 20 min. Then starting the AlTi target, setting the current to be 60A, reducing the bias voltage to-150V, and firstly depositing a metal AlTi transition layer for 5 min.
Introducing reaction gas N2(purity 99.999%) 160sccm, the Ar flow rate is reduced to 40sccm, and the gas flow rate ratio N is maintained2And the/Ar is 5, the working air pressure is 0.8Pa by adjusting the size of the throttle valve, and the AlTiN transition layer is deposited for 10 min.
Starting an AlCr target, setting the target power to be 2.2kW, and depositing AlCrN/AlTiN nano multilayer coating, wherein the deposition bias voltage is-150V; the coating time lasts for 240 min.
The AlCrN/AlTiN nano multilayer coating prepared in this example had the same phase composition and organization structure as in example 1, and consisted of a face centered cubic (Al, Cr, Ti) N coating.
EDS test the surface element composition of the coating is as follows: 32.64 at.% Al, 10.86 at.% Cr, 15.25 at.% Ti, and 41.25 at.% N. The modulation period of the nano multilayer coating is 8nm, and the modulation ratio is AlTiN/AlCrN which is 2; the total thickness of the coating is 2.3 μm, and the film-substrate binding force is about 61N. The hardness is about 34.5GPa, and the hardness is 31.5GPa after heat preservation for 1h at 800 ℃.

Claims (9)

1. A high red hard AlCrN/AlTiN nano multilayer coating is characterized in that: the nano multilayer coating is formed by alternately compounding AlCrN layers and AlTiN layers, wherein the AlCrN layers and the AlTiN layers are of face-centered cubic structures and keep a coherent relationship; the single layer of the AlCrN layer and the single layer of the AlTiN layer are both nano-scale in thickness.
2. The high red hardness AlCrN/AlTiN nano multilayer coating of claim 1, wherein: the content of N in the AlCrN layer is 40-55 at.%, the content of Al is 25-40 at.%, and the content of Cr is 10-25 at.%; the AlTiN layer contains N40-55 at.%, Al 25-40 at.%, and Ti 10-30 at.%.
3. The high red hardness AlCrN/AlTiN nano multilayer coating of claim 1, wherein: the modulation period of the nano multilayer coating is 5-100nm, and the modulation ratio is AlTiN/AlCrN which is 0.5-4; the total thickness of the nano multilayer coating is 1.5-10 microns.
4. The high red hardness AlCrN/AlTiN nano multilayer coating of claim 1, wherein: an AlTi metal transition layer with the thickness of 50-300 nm and an AlTiN transition layer with the thickness of 10-300 nm are deposited between the nano multilayer coating and the substrate.
5. The high red hardness AlCrN/AlTiN nano multilayer coating of claim 1, wherein: the nano multilayer coating has good red hardness, the hardness is still above 30GPa after heat preservation for 1h at 800 ℃, and the nano multilayer coating has good high-temperature heat stability; and the bonding with the matrix is good, and the bonding force is higher than 60N by adopting a scratch tester for testing.
6. The method for preparing a high red hardness AlCrN/AlTiN nano multilayer coating according to any one of claims 1 to 5, wherein: the method adopts AlTi alloy and AlCr alloy as target materials, and adopts the composite technology of arc ion plating and magnetron sputtering to deposit the nano multilayer coating on the surface of a metal, hard alloy or ceramic substrate; the method specifically comprises the following steps:
(1) ultrasonic cleaning the base material in acetone, alcohol and deionized water for 15-30 min, and placing the base material on a rotary frame of a coating chamber, wherein the rotary speed of the rotary frame is 5-40 r/min, and the target base distance is 80-150 mm;
(2) vacuumizing to make the air pressure in vacuum chamber less than 9X 10-3Heating the furnace chamber to 200-500 ℃ when the pressure is Pa,the vacuum chamber pressure is again less than 9X 10-3Introducing Ar gas when Pa is reached, wherein the flow of Ar gas is 50-500 sccm, adjusting the pressure of the vacuum chamber to be 0.6-3 Pa, applying negative bias of-600-1000V to the substrate, and performing glow cleaning for 10-30 min; then starting an AlTi target, wherein the target current is 50-200A, adjusting the bias voltage to-200-30V, and depositing an AlTi metal transition layer on the substrate for 5-40 min;
(3) keeping the AlTi target open, and then introducing N2，N2The flow rate is 100-500 sccm, and the flow rate of Ar is adjusted to make the gas flow rate ratio N2the/Ar is 1-10; adjusting the pressure of the vacuum chamber to 0.6-3 Pa, and depositing an AlTiN transition layer for 5-30 min;
(4) keeping the AlTi target on and N2And introducing Ar, starting an AlCr target with the power of 2-4 kW, and depositing the AlCrN/AlTiN nano multilayer coating for 60-480 min.
7. The method for preparing a high red hardness AlCrN/AlTiN nano multilayer coating according to claim 6, wherein: in the method, an AlTi target and an AlCr target are respectively connected with an arc ion plating power supply and a direct current pulse magnetron sputtering power supply; the substrate is arranged in the middle of the vacuum chamber, the AlTi target and the AlCr target are oppositely arranged on two sides of the substrate, when the AlCrN/AlTiN nano multilayer coating is deposited in the step (4), the AlTi target and the AlCr target are simultaneously opened, and the AlCrN layer and the AlTiN layer are alternately deposited on the substrate due to the rotation of the rotating frame where the substrate is arranged, so that the AlCrN/AlTiN nano multilayer coating with a small modulation period (the modulation period is 5-20nm) can be prepared; when preparing AlCrN/AlTiN nano multilayer coating with large modulation period (modulation period is 20-100nm), the AlTi target and the AlCr target need to be switched on and off intermittently.
8. The method for preparing a high red hardness AlCrN/AlTiN nano multilayer coating according to claim 6, wherein: the Al content of the AlTi alloy target material is 30-70 at.%, the Ti content is the rest, the Al content of the AlCr alloy target material is 30-70 at.%, and the Cr content is the rest.
9. The method for preparing a high red hardness AlCrN/AlTiN nano multilayer coating according to claim 6, wherein: the modulation period and the modulation ratio of the AlCrN/AlTiN nano multilayer coating are jointly controlled by the rotating speed of a rotating frame or the target starting period, the AlTi target current and the AlCr target power; the CrAl target current in the steps (3) - (4) is 50-200A.
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115354282A (en) * 2022-09-05 2022-11-18 沈阳乐贝真空技术有限公司 Preparation method of AlCrTiSiN nano composite coating plated alloy saw blade
CN115595532A (en) * 2022-10-12 2023-01-13 株洲华锐精密工具股份有限公司（Cn） Multilayer structure hard coating and preparation method and application thereof

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115354282A (en) * 2022-09-05 2022-11-18 沈阳乐贝真空技术有限公司 Preparation method of AlCrTiSiN nano composite coating plated alloy saw blade
CN115354282B (en) * 2022-09-05 2023-09-22 沈阳乐贝真空技术有限公司 Preparation method of AlCrTiSiN nano composite coating plated alloy saw blade
CN115595532A (en) * 2022-10-12 2023-01-13 株洲华锐精密工具股份有限公司（Cn） Multilayer structure hard coating and preparation method and application thereof

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