CN113819985A - Wafer anti-interference weighing device and application thereof - Google Patents
Wafer anti-interference weighing device and application thereof Download PDFInfo
- Publication number
- CN113819985A CN113819985A CN202010558992.5A CN202010558992A CN113819985A CN 113819985 A CN113819985 A CN 113819985A CN 202010558992 A CN202010558992 A CN 202010558992A CN 113819985 A CN113819985 A CN 113819985A
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- wafer
- weighing
- weighing device
- measuring chamber
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01G—WEIGHING
- G01G19/00—Weighing apparatus or methods adapted for special purposes not provided for in the preceding groups
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01G—WEIGHING
- G01G21/00—Details of weighing apparatus
- G01G21/23—Support or suspension of weighing platforms
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01G—WEIGHING
- G01G23/00—Auxiliary devices for weighing apparatus
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01G—WEIGHING
- G01G23/00—Auxiliary devices for weighing apparatus
- G01G23/06—Means for damping oscillations, e.g. of weigh beams
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N5/00—Analysing materials by weighing, e.g. weighing small particles separated from a gas or liquid
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- General Health & Medical Sciences (AREA)
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- Pathology (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Abstract
The invention discloses a wafer anti-interference weighing device and application thereof, wherein the wafer anti-interference weighing device comprises: the measuring chamber can provide a vacuum measuring cavity, a vibration reduction platform is arranged in the measuring cavity, a weighing device is placed on the vibration reduction platform, and an electromagnetic shielding structure is further arranged in the measuring chamber. The wafer anti-interference weighing device is reasonable in structure, low in cost, good in anti-interference effect, capable of improving weighing accuracy, small in environmental influence on a clean room due to the fact that environment-friendly materials are used, and capable of being used for repeatability judgment of a thin film process.
Description
Technical Field
The invention relates to the field of semiconductor test equipment, and particularly provides a wafer anti-interference weighing device and application thereof.
Background
In the research and development process, because each layer of film thickness test of the wafer has the authenticity problem of the measurement result, the repeatability of the same film process cannot be judged through the film thickness, and in view of the above, an idea of judging the repeatability of the film process by adopting a weighing method is provided, but because the environment of the wafer needs to ensure certain cleanliness, and because the machine work needs to have partial vibration, sound wave or electromagnetic interference, the phenomenon of inaccurate measurement often occurs in the weighing of the wafer in a clean room, and further the judgment of the repeatability of the film process through the weight is also inaccurate.
Therefore, how to ensure the accuracy of the weighing result and the accuracy of the repeatability judgment of the film process becomes a problem to be solved urgently.
Disclosure of Invention
In view of the above, an object of the present invention is to provide a wafer anti-interference weighing apparatus and an application thereof, so as to solve the problem that the repeatability of the same process cannot be determined by the weight due to inaccurate weighing result of a wafer cleaning room.
One aspect of the present invention provides a wafer anti-interference weighing apparatus, including: the measuring chamber can provide a vacuum measuring cavity, a vibration reduction platform is arranged in the measuring cavity, a weighing device is placed on the vibration reduction platform, and an electromagnetic shielding structure is further arranged in the measuring chamber to avoid the measuring cavity from being subjected to electromagnetic interference.
Preferably, the wafer anti-interference weighing device further comprises a PC end arranged outside the measuring chamber, and the PC end is connected with the weighing device and used for obtaining a weighing result of the weighing device.
Preferably, the vibration reduction platform is connected with a plurality of springs at intervals along the circumferential direction of the vibration reduction platform, and is suspended in the measuring chamber through the springs.
Further preferably, the lower end of the spring is connected with the vibration reduction platform through a distance adjusting structure and used for adjusting the levelness of the vibration reduction platform.
Further preferably, the electromagnetic shielding structure is an electromagnetic shielding coating coated on the measuring chamber.
Preferably, the electromagnetic shielding coating is formed in two layers and is respectively coated on the inner circumferential surface and the outer circumferential surface of the measuring chamber.
Further preferably, the wafer anti-interference weighing device further comprises a pressure control system for adjusting the pressure of the measurement cavity.
Further preferably, the measuring chamber is further provided with a sound insulation interlayer for insulating sound of the measuring cavity.
Further preferably, the measuring chamber comprises a measuring chamber body with an opening at one side and a chamber door matched with the measuring chamber body.
The invention also provides application of the wafer anti-interference weighing device in film process repeatability judgment, wherein the wafer anti-interference weighing device is used for weighing wafers in the same process, and the repeatability of the process is judged by comparing weighing results.
According to the wafer anti-interference weighing device provided by the invention, a stable horizontal placing table can be provided for the weighing device through the vibration reduction platform, the influence of sound wave vibration on measurement can be effectively reduced by vacuumizing the measurement cavity, the electromagnetic influence can be effectively shielded by arranging the electromagnetic shielding structure, the interference of sound wave, electromagnetism and vibration can be effectively reduced, and the accurate measurement of the weight of the wafer can be realized.
The wafer anti-interference weighing device provided by the invention has the advantages of reasonable structure, low cost, good anti-interference effect, capability of improving the weighing accuracy, use of environment-friendly materials, small influence on the environment of a clean room, and capability of being used for repeatability judgment of a thin film process.
Drawings
The invention is described in further detail below with reference to the following figures and embodiments:
fig. 1 is a schematic structural diagram of a wafer interference-proof weighing apparatus according to the present invention;
FIG. 2 is a cross-sectional view of a measurement chamber.
Detailed Description
The invention will be further explained with reference to specific embodiments, without limiting the invention.
As shown in fig. 1 and fig. 2, the present invention provides a wafer anti-interference weighing apparatus to avoid the influence of vibration, sound wave or electromagnetism on the weighing result, including: the measuring chamber 1 can provide a vacuum measuring cavity, the measuring cavity is internally provided with a vibration reduction platform 2, the vibration reduction platform 2 is provided with a weighing device 3, and the measuring chamber 1 is also provided with an electromagnetic shielding structure to avoid the measuring cavity from electromagnetic interference.
This wafer jam-proof weighing device can provide a stable level through the damping platform for weighing device and place the platform, through taking out into vacuum the chamber of will measurationing, can effectively reduce the influence of sound wave vibrations to measurationing, can effectively shield electromagnetic influence through setting up electromagnetic shield structure, and this wafer jam-proof weighing device can effectively reduce the interference of sound wave, electromagnetism and vibration, realizes the accurate measurement to wafer weight.
As an improvement of the technical solution, the wafer anti-interference weighing apparatus further includes a PC terminal 4 disposed outside the measuring chamber 1, the PC terminal 4 is connected to the weighing apparatus 3 for obtaining the weighing result of the weighing apparatus 3, and the weighing result can be displayed on a display screen and can be stored.
As an improvement of the technical solution, as shown in fig. 1, a plurality of springs 5 are connected to the damping platform 2 at intervals along the circumferential direction thereof, and suspended in the measuring chamber 1 through the springs 5, and the springs can effectively reduce the influence of vibration on measurement.
As the improvement of the technical scheme, the lower end of the spring 5 is connected with the vibration reduction platform 2 through a distance adjusting structure and used for adjusting the levelness of the vibration reduction platform 2, and then adjusting the levelness of the weighing device so as to ensure the accuracy of a weighing result.
As an improvement of the technical solution, as shown in fig. 1, the electromagnetic shielding structure is an electromagnetic shielding coating 6 coated on the measurement chamber 1, and the electromagnetic shielding coating 6 is preferably two layers, which are respectively coated on the inner circumferential surface and the outer circumferential surface of the measurement chamber 1.
As an improvement of the technical solution, as shown in fig. 1, the wafer anti-interference weighing apparatus further includes a pressure control system 7 for adjusting the pressure of the measurement chamber, specifically: before weighing through weighing device, will measurationing the chamber evacuation earlier, begin to weigh through weighing device after the pressure stability, the back of finishing weighing, the intracavity is surveyed to the vector aerifys, resumes atmospheric pressure, wherein, the evacuation can be realized through pump and exhaust tube, aerify and can realize through pump and intake pipe, this pressure control system can also include the pressure gauge 71 that is used for measuring measurationing intracavity pressure, the pressure of monitoring also can show and save through PC end 4.
As a modification of the technical solution, as shown in fig. 1, the measuring chamber 1 is further provided with a sound insulation interlayer 8 for sound insulation of the measuring cavity.
As an improvement of the technical solution, as shown in fig. 1, the measuring chamber 1 includes a measuring chamber body 11 with an opening on one side and a chamber door 12 matched with the measuring chamber body 11, the two are sealed by a sealing rubber ring 9, and the sealing rubber ring 9 may be disposed on the measuring chamber body or on the chamber door.
The complete process of weighing a wafer using the wafer tamper-proof weighing apparatus is given below: adjust the damping platform for the level through the spring, weighing device returns 0, and the wafer that awaits measuring is placed on weighing device, closes the device door and opens and will measurand the chamber evacuation, measures intracavity pressure at PC end monitoring, and is stable at a certain fixed range when pressure, begins to monitor wafer weight (the weight information conversion that the PC end surveyed weighing device shows on the display after the signal of telecommunication), treats that the registration is stable back, record weight.
The invention also provides application of the wafer anti-interference weighing device in film process repeatability judgment, which comprises the following steps:
weighing the wafer in the same process by using the wafer anti-interference weighing device;
the repeatability of the process is judged by comparing the weighing results, specifically: the weighing results were the same, indicating that the process was repeatable and, conversely, not repeatable.
The embodiments of the present invention have been written in a progressive manner with emphasis placed on the differences between the various embodiments, and similar elements may be found in relation to each other.
The embodiments of the present invention have been described in detail with reference to the drawings, but the present invention is not limited to the above embodiments, and various changes can be made within the knowledge of those skilled in the art without departing from the gist of the present invention.
Claims (10)
1. Wafer jam-proof weighing device, its characterized in that includes: measuration room (1), measuration room (1) can provide the vacuous chamber of measuration, it is provided with damping platform (2) to measuration the intracavity, place weighing device (3) on damping platform (2), it still is provided with the electromagnetic shield structure to measuration room (1) to avoid measuration the chamber and receive electromagnetic interference.
2. The wafer tamper-proof weighing apparatus of claim 1, wherein: the weighing device is characterized by further comprising a PC end (4) arranged outside the measuring chamber (1), wherein the PC end (4) is connected with the weighing device (3) and used for obtaining a weighing result of the weighing device (3).
3. The wafer tamper-proof weighing apparatus of claim 1, wherein: the vibration reduction platform (2) is connected with a plurality of springs (5) at intervals along the circumferential direction of the vibration reduction platform, and is suspended in the measuring chamber (1) through the springs (5).
4. The wafer tamper-proof weighing apparatus of claim 3, wherein: the lower end of the spring (5) is connected with the vibration reduction platform (2) through a distance adjusting structure and is used for adjusting the levelness of the vibration reduction platform (2).
5. The wafer tamper-proof weighing apparatus of claim 1, wherein: the electromagnetic shielding structure is an electromagnetic shielding coating (6) coated on the measuring chamber (1).
6. The wafer tamper-proof weighing apparatus of claim 5, wherein: the electromagnetic shielding coating (6) is divided into two layers which are respectively coated on the inner circumferential surface and the outer circumferential surface of the measuring chamber (1).
7. The wafer tamper-proof weighing apparatus of claim 1, wherein: and the pressure control system (7) is used for adjusting the pressure of the measuring cavity.
8. The wafer tamper-proof weighing apparatus of claim 1, wherein: the measuring chamber (1) is further provided with a sound insulation interlayer (8) for insulating sound of the measuring cavity.
9. The wafer tamper-proof weighing apparatus of claim 1, wherein: the measuring chamber (1) comprises a measuring chamber body (11) with an opening at one side and a chamber door (12) matched with the measuring chamber body (11).
10. Use of the wafer interference-proof weighing apparatus of any one of claims 1 to 9 for determining repeatability of thin film processes, wherein: and weighing the wafer under the same process by using the wafer anti-interference weighing device, and judging the repeatability of the process by comparing weighing results.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010558992.5A CN113819985A (en) | 2020-06-18 | 2020-06-18 | Wafer anti-interference weighing device and application thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010558992.5A CN113819985A (en) | 2020-06-18 | 2020-06-18 | Wafer anti-interference weighing device and application thereof |
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| Publication Number | Publication Date |
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| CN113819985A true CN113819985A (en) | 2021-12-21 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN202010558992.5A Pending CN113819985A (en) | 2020-06-18 | 2020-06-18 | Wafer anti-interference weighing device and application thereof |
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Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20100206098A1 (en) * | 2007-10-04 | 2010-08-19 | Robert John Wilby | Semiconductor wafer metrology apparatus and method |
| CN101839961A (en) * | 2009-03-19 | 2010-09-22 | 广达电脑股份有限公司 | Test system and method |
| TW201040539A (en) * | 2009-05-08 | 2010-11-16 | Quanta Comp Inc | Testing system and testing method |
| CN204226528U (en) * | 2014-11-13 | 2015-03-25 | 孙艳秋 | The multi-faceted vibration damping equipment of pipe conveying fluid joint |
| TW201543008A (en) * | 2014-04-02 | 2015-11-16 | Metryx Ltd | Semiconductor wafer weighing apparatus and methods |
| CN105705914A (en) * | 2013-11-08 | 2016-06-22 | 赛多利斯实验室仪器有限责任两合公司 | Precision scale having a removable air-conditioning module |
| CN106197625A (en) * | 2016-07-04 | 2016-12-07 | 西北工业大学 | The real-time measurement apparatus of a kind of microgram magnitude quality and measuring method thereof |
| CN108862008A (en) * | 2018-06-26 | 2018-11-23 | 合肥市春华起重机械有限公司 | A kind of crane material placement plate |
| TW202002125A (en) * | 2018-04-19 | 2020-01-01 | 英商美特拉斯有限公司 | Semiconductor wafer mass metrology apparatus and semiconductor wafer mass metrology method |
-
2020
- 2020-06-18 CN CN202010558992.5A patent/CN113819985A/en active Pending
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20100206098A1 (en) * | 2007-10-04 | 2010-08-19 | Robert John Wilby | Semiconductor wafer metrology apparatus and method |
| CN101839961A (en) * | 2009-03-19 | 2010-09-22 | 广达电脑股份有限公司 | Test system and method |
| TW201040539A (en) * | 2009-05-08 | 2010-11-16 | Quanta Comp Inc | Testing system and testing method |
| CN105705914A (en) * | 2013-11-08 | 2016-06-22 | 赛多利斯实验室仪器有限责任两合公司 | Precision scale having a removable air-conditioning module |
| TW201543008A (en) * | 2014-04-02 | 2015-11-16 | Metryx Ltd | Semiconductor wafer weighing apparatus and methods |
| CN204226528U (en) * | 2014-11-13 | 2015-03-25 | 孙艳秋 | The multi-faceted vibration damping equipment of pipe conveying fluid joint |
| CN106197625A (en) * | 2016-07-04 | 2016-12-07 | 西北工业大学 | The real-time measurement apparatus of a kind of microgram magnitude quality and measuring method thereof |
| TW202002125A (en) * | 2018-04-19 | 2020-01-01 | 英商美特拉斯有限公司 | Semiconductor wafer mass metrology apparatus and semiconductor wafer mass metrology method |
| CN108862008A (en) * | 2018-06-26 | 2018-11-23 | 合肥市春华起重机械有限公司 | A kind of crane material placement plate |
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