CN113784492A - Method for generating large-volume uniform plasma in air flow or nitrogen flow - Google Patents
Method for generating large-volume uniform plasma in air flow or nitrogen flow Download PDFInfo
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Abstract
The invention belongs to the technical field of application of atmospheric pressure low-temperature plasma, and relates to a method for generating large-volume uniform plasma in air flow or nitrogen flow. The invention adopts a discharge mode, leads the airflow into the discharge space in parallel, and generates and maintains uniform discharge through the redistribution action of the airflow on heat and particles in the discharge space. The discharge mode adopted by the invention is combined with the required discharge gap and airflow speed, the discharge parameters are dynamically adjusted, and large-volume uniform plasma can be realized under the required working condition. The method has beneficial technical effects in the relevant application field, and is beneficial to improving the processing uniformity and efficiency.
Description
Technical Field
The invention belongs to the technical field of atmospheric pressure low-temperature plasma, and relates to a method for generating large-volume uniform plasma in air flow or nitrogen flow.
Background
Dielectric barrier discharge is an economical and reliable way of generating low temperature plasma at atmospheric pressure. By inserting an insulating medium between the discharge electrodes, the conversion of discharge into arc discharge can be suppressed, and ablation of the electrode material and damage to the material to be processed can be avoided. Because it does not need vacuum system, can work under the atmospheric pressure environment directly, the apparatus structure is also flexible and simple, so apply very extensively, can be used in many fields such as flow control, material treatment, ozone production, waste gas treatment, etc. However, in atmospheric air and nitrogen dielectric barrier discharges, the discharge is usually in a filamentary mode, and the appearance of the discharge appears as a randomly appearing discharge filament in time and space. This is also the case in many applications today. The discharge wire has concentrated plasma density and uneven energy deposition, which is easy to cause thermal damage and uneven treatment effect of materials. In order to improve the uniformity of the process and the efficiency of the process during application, it is necessary to improve the uniformity of the discharge.
Nanosecond pulse-driven dielectric barrier discharge is considered to be capable of simultaneously generating a large number of electron avalanches and suppressing electron instability and thermal instability due to a steep upper edge and a short pulse width compared with conventional alternating current discharge, thereby more hopefully realizing uniform discharge. Nevertheless, the uniform discharge generated at present can only achieve partial uniform discharge and small-volume uniform discharge. In a parallel plate electrode structure expected to realize large-volume uniform discharge, nanosecond pulse-driven dielectric barrier discharge can only generate uniform discharge in a discharge gap within 2-3 mm. Generating and maintaining a large volume of uniform plasma at a large gap is a major difficulty in the art.
The application of a gas flow into the discharge space is an economical and simple way of regulating the discharge characteristics, and in certain application fields such as flow control, ozone generation, waste gas treatment, etc., the presence of a gas flow is inevitable, and therefore the generation of a large volume of uniform plasma in a gas flow environment is also one of the urgent needs of the relevant industrial application fields. The introduction of high velocity gas flow generally causes a reduction in the intensity of the discharge and even extinguishes the discharge. In the invention, a proper discharge structure and an airflow introduction mode are selected, and a method for dynamically adjusting discharge parameters in the discharge process is provided, so that large-volume uniform plasma can be generated under a discharge gap of 1-10 mm.
Disclosure of Invention
Aiming at the limitation that the uniform discharge of atmospheric pressure air and nitrogen can only be generated in a partial discharge area or a small gap at present and the defect that the discharge is easy to blow out in an air flow environment, the invention provides a method for generating large-volume uniform plasma in air flow or nitrogen flow.
The technical scheme of the invention is as follows:
a method of generating a large volume uniform plasma in an air or nitrogen stream capable of generating a large volume uniform plasma at a gap of 1-10 mm.
The plasma generation system comprises a nanosecond pulse power supply, an air duct system and a dielectric barrier discharge flat plate electrode unit.
The air duct system consists of a single-stage impeller vortex air pump (discharging air) or a nitrogen bottle (discharging nitrogen), an air duct and a Laval nozzle; the air flow is generated by a single-stage impeller vortex air pump, and nitrogen flow is provided by an air bottle in the experiment; the airflow flows through the air duct and the Laval nozzle to enter the discharge gap; the air flow rate can be adjusted by means of a ball valve in the front end of the laval nozzle.
The dielectric barrier discharge flat plate electrode unit is composed of an upper wiring terminal, an upper electrode, a bolt, an upper dielectric plate, a gasket, a lower dielectric plate, a lower electrode, a nut and a lower wiring terminal. Wherein the upper and lower electrodes are made of glass plated with Indium Tin Oxide (ITO) conductive films;
the upper electrode is connected with the high-voltage end of the nanosecond pulse power supply through an upper wiring end, and the upper wiring end is a copper foil A; the lower electrode is connected with a grounding end of a nanosecond pulse power supply through a lower wiring end, and the lower wiring end is a copper foil B; the upper blocking medium and the lower blocking medium are made of quartz glass, and the upper quartz glass and the lower quartz glass are provided with four through holes; the discharge gap is adjusted by four nylon gaskets with certain thickness; the upper quartz glass, the gasket and the lower quartz glass are fixed through four nylon bolts and nylon nuts.
The upper electrode and the lower electrode are both transparent glass plated with ITO conductive films, one surface plated with the ITO conductive films is in contact with quartz glass, 704 silicon rubber is coated on the outer side edges of the glass plated with the ITO conductive films, and the quartz glass and the glass plated with the ITO conductive films are bonded through the 704 silicon rubber and keep good contact. The ITO conductive film is connected into a circuit through a copper foil, the transparent upper electrode and the transparent lower electrode can realize the observation of discharge conditions from all directions such as an upper plane, a lower plane, a side plane and the like, and simultaneously allow the diagnosis of discharge characteristics by using a transmission method (such as Pockels effect measurement of surface charge, laser diagnosis and shooting of a texture image).
The laval nozzle is in close contact with the discharge device and the gas flow enters the discharge space parallel to the air gap.
The nanosecond pulsed power supply is to provide a sufficiently high voltage and frequency. The degree of discharge uniformity depends on the voltage and frequency of the pulsed power supply. Under large-gap and atmospheric flow, high voltage and high frequency are correspondingly adopted to ensure the uniformity of discharge.
The nanosecond pulse power supply consists of an autotransformer, a three-level magnetic compression pulse power supply and a booster, the pulse rising edge is about 40ns, and the pulse width is about 200 ns; the pulse repetition frequency may be set to 100, 300, 600, 1000, 1200Hz, etc.; the peak value of the pulse voltage can be adjusted through the autotransformer, and the voltage adjusting range is 0-40 kV.
The air duct system can generate air flow of 0-240m/s and nitrogen flow of 0-80m/s in the discharge space, and the air flow speed is regulated by a ball valve at the front end of the Laval nozzle.
The uniform discharge plasma can be generated under the drive of unipolar nanosecond pulses and bipolar nanosecond pulses. The nanosecond pulse power supply with the frequency of more than 1200Hz and the voltage of more than 40kV can generate large-volume uniform plasma under higher gas flow speed and larger discharge gap.
The device and the method for generating the large-volume uniform plasma in the air flow and nitrogen flow environment comprise the following steps:
firstly, selecting a nylon gasket with a certain thickness according to a required discharge gap, and assembling a dielectric barrier discharge flat electrode unit through a nylon bolt and a nylon nut;
secondly, fixing the dielectric barrier discharge flat electrode unit on a nylon frame, and closely contacting with an airflow outlet of a Laval nozzle to enable airflow to flow into a discharge space in parallel with a discharge gap;
thirdly, connecting the discharge device into the circuit, rotating the autotransformer knob to a proper position, adjusting the power voltage to a proper value, and turning on the power supply to generate stable discharge;
fourthly, adjusting the ball valve to the position with the required air flow speed, turning on a switch of an air pump or an air bottle, and introducing air flow;
and fifthly, observing the discharge uniformity degree, and shooting a discharge image with the exposure time not less than one period by using a high-speed camera or an ICCD. If the discharge wire is thick and bright, the voltage is reduced, the frequency is reduced, and the discharge in the whole discharge area is uniformly dispersed; if the discharge wire is thin and weak, the voltage is increased, the frequency is increased, and the discharge in the whole discharge area is uniformly dispersed.
Compared with the prior art, the invention has the following beneficial technical effects:
the device and the method can generate uniform discharge in common air and nitrogen under atmospheric pressure, and can effectively reduce the cost of purchasing vacuum equipment and expensive rare gas in practical application.
The experimental device adopts the transparent ITO film plated on the common glass as the upper electrode and the lower electrode, and the mode has three advantages. Firstly, the glass coated with the ITO film with proper specification can be directly purchased, the expensive cost caused by film coating customization on a quartz glass medium in the past can be reduced, the common glass is convenient to cut, and the required electrode size and electrode shape can be freely cut by a glass cutter; secondly, the discharge observation of each discharge from the depression surface, the bottom, the side surface and the like can be realized by adopting the transparent upper electrode and the transparent lower electrode; third, the transparent upper and lower electrodes allow the discharge characteristics to be diagnosed using a transmission method.
The invention adopts a discharge mode, leads the airflow into the discharge space in parallel, and generates and maintains uniform discharge through the redistribution action of the airflow on heat and particles in the discharge space.
The discharge mode adopted by the invention is combined with the required discharge gap and airflow speed, the discharge parameters are dynamically adjusted, and large-volume uniform plasma can be realized under the required working condition. The method has beneficial technical effects in the relevant application field, and is beneficial to improving the processing uniformity and efficiency.
Drawings
FIG. 1 is a high volume uniform plasma generation system;
FIG. 2 is a dielectric barrier discharge structure;
FIG. 3 is a top down image of a discharge in stationary air and flowing air at different voltages;
FIG. 4 is a top down image of static air and flowing air discharges at different frequencies;
FIG. 5 is a plane discharge image in a stationary nitrogen gas and a flowing nitrogen gas.
In the figure, 1 is a nanosecond pulse power supply; 2 is a fan; 3 is an air duct; 4 is a Laval nozzle; 5 is copper foil A; 6 is glass A plated with ITO film; 7 is a nylon bolt; 8 is quartz glass A; 9 is a nylon gasket; 10 is quartz glass B; 11 is a nylon nut; 12 is glass B plated with ITO film; and 13 is copper foil B.
Detailed Description
The present invention will be described in further detail with reference to the accompanying drawings.
A method of generating a large volume uniform plasma in an air or nitrogen stream capable of generating a large volume uniform plasma at a gap of 1-10 mm. The plasma generation system is shown in fig. 1 and comprises a nanosecond pulse power supply, an air duct system and a dielectric barrier discharge flat plate electrode unit. The air duct system consists of a single-stage impeller vortex air pump (discharging air) or a nitrogen bottle (discharging nitrogen), an air duct and a Laval nozzle; the air flow is generated by a single-stage impeller vortex air pump, and nitrogen flow is provided by an air bottle in the experiment; the airflow flows through the air duct and the Laval nozzle to enter the discharge gap; the gas flow rate can be adjusted by a ball valve at the front end of the laval nozzle, the air flow is adjusted in the range of 0-240m/s, and the nitrogen flow is adjusted in the range of 0-80 m/s. The nanosecond pulse power supply consists of an autotransformer, a three-level magnetic compression pulse power supply and a booster, the rising edge of the pulse is about 40ns, and the pulse width is about 200 ns; the pulse repetition frequency may be set to 100, 300, 600, 1000, 1200Hz, etc.; the peak value of the pulse voltage can be adjusted through the autotransformer, and the voltage adjusting range is 0-40 kV.
As shown in fig. 2, the dielectric barrier discharge flat electrode unit includes an upper terminal, an upper electrode, a bolt, an upper dielectric plate, a gasket, a lower dielectric plate, a lower electrode, a nut, and a lower terminal. Wherein the upper and lower electrodes are ITO-plated conductive filmsThe thickness of the glass is 1.1mm, the transmittance is 84%, the sheet resistance of the ITO film is less than or equal to 6 omega, the thickness of the film layer is 185nm, the size of the discharge area can be controlled by changing the size of the glass, and in the air discharge shown in the attached figures 3 and 4, the size of the discharge area is 110 multiplied by 50 multiplied by 5mm3In the nitrogen discharge shown in FIG. 5, the discharge area size is 80X 20X 5mm3(ii) a The upper electrode is connected with the high-voltage end of the nanosecond pulse power supply through an upper wiring end, the upper wiring end is a copper foil, and the copper foil is tightly attached to the left edge of the electrode to prevent obstruction on the observation of a plane of depression; the lower electrode is connected with a grounding end of the nanosecond pulse power supply through a lower connecting end, the lower connecting end is a copper foil, and the copper foil is tightly attached to the right edge of the electrode to prevent obstruction to observation; the upper and lower barrier medium is quartz glass with relative dielectric constant of 3.8 and size of 160 × 110 × 2mm3The upper quartz glass and the lower quartz glass are respectively provided with four through holes with the diameter of 7mm, and the through holes are arranged at positions close to the edges of the quartz glass so as to prevent interference on observation; the discharge gap is adjusted by four nylon gaskets with certain thickness, and in the air and nitrogen discharge shown in the attached figures 3, 4 and 5, the thickness of the nylon gaskets is 5 mm; the upper quartz glass, the gasket and the lower quartz glass are fixed through four nylon bolts and nylon nuts, so that the upper quartz glass blocking medium and the lower quartz glass blocking medium are parallel to each other.
The upper electrode and the lower electrode are both transparent glass plated with an ITO conductive film, one surface of the glass plated with the ITO conductive film is in contact with quartz glass, 704 silicon rubber is coated on the outer edge of the glass plated with the ITO conductive film, and the quartz glass and the glass plated with the ITO conductive film are bonded through the 704 silicon rubber and keep good contact. The ITO conductive film is connected into a circuit through a copper foil, the transparent upper electrode and the transparent lower electrode can realize the observation of discharge conditions from all directions such as an upper plane, a lower plane, a side plane and the like, and simultaneously allow the diagnosis of discharge characteristics by using a transmission method (such as Pockels effect measurement of surface charge, laser diagnosis and shooting of a texture image).
The method for generating the large-volume uniform plasma in the air flow and nitrogen flow environment by adopting the device comprises the following steps:
firstly, selecting a nylon gasket with a certain thickness according to a required discharge gap, and assembling a dielectric barrier discharge flat electrode unit through a nylon bolt and a nylon nut;
secondly, fixing the dielectric barrier discharge flat electrode unit on a nylon frame, and closely contacting with an airflow outlet of a Laval nozzle to enable airflow to flow into a discharge space in parallel with a discharge gap;
thirdly, connecting the discharge device into the circuit, rotating the autotransformer knob to a proper position, adjusting the power voltage to a proper position, and turning on the power supply to generate stable discharge;
fourthly, adjusting the ball valve to the position with the required air flow speed, turning on a switch of an air pump or an air bottle, and introducing air flow;
and fifthly, observing the discharge uniformity degree, and shooting a discharge image with the exposure time not less than one period by using a high-speed camera or an ICCD. If the discharge wire is thick and bright, the voltage is reduced, the frequency is reduced, and the discharge in the whole discharge area is uniformly dispersed; if the discharge wire is thin and weak, the voltage is increased, the frequency is increased, and the discharge in the whole discharge area is uniformly dispersed.
In order to prove that the device and the method can achieve expected effects, the discharge uniformity is contrastively researched by utilizing the device and the method provided by the invention in experiments;
with the above plasma generation system, discharge was performed in a stationary gas (gas flow rate of 0m/s) and a flowing gas (gas flow rate of 10m/s), respectively. Using a high-speed motion analyzer, the discharge is image-captured from the top side, and the exposure time of the camera is one discharge cycle.
Firstly, the influence of the discharge uniformity and the discharge parameters in the air flow on the uniformity degree of the discharge plasma is researched. Different driving voltages (i.e. 30.5kV, 34.3kV, 36.4kV) and different driving frequencies (i.e. 100Hz, 600Hz, 1200Hz) were used in the air discharge. The fixed discharge frequency was 1200Hz, and the top-down discharge images at different voltages are shown in FIG. 3. In still air, there are a large number of bright spots in the top-down discharge image at different voltages, which is an indication of the presence of uneven filament discharge. In flowing air, at a low voltage of 30.5kV, a large amount of filament-like discharge still exists in the discharge space. According to the method steps for generating the large-volume uniform plasma in the air flow and nitrogen flow environment, the voltage is increased to 34.3kV, and the filiform discharge in the discharge space is obviously weakened; further increasing the voltage to 36.4kV, the filament discharge in the discharge space substantially disappears, and a large-volume uniform plasma is generated as a whole. The fixed discharge voltage was 36.4kV, and the top-down discharge pattern at different frequencies is shown in FIG. 4. In still air, a large number of areas in the top-down image appear as filament discharges at different frequencies. In flowing air, at a low frequency of 100Hz, a large number of filament-like discharges still exist in the discharge space. According to the method for generating the large-volume uniform plasma in the air flow and nitrogen flow environment, the frequency is increased to 600Hz, and the filiform discharge in the discharge space is obviously weakened; further, by increasing the frequency to 1200Hz, the filament discharge in the discharge space is substantially eliminated, and a large-volume uniform plasma is generated as a whole.
Next, the discharge uniformity in the nitrogen flow was investigated. A drive voltage of 36.4kV and a drive frequency of 1200Hz were used in the nitrogen discharge. The top discharge images in the stationary nitrogen gas and the flowing nitrogen gas are shown in FIG. 5. In the still nitrogen gas, there were noticeable spots in the top-down discharge image, and the discharge was in the filament discharge mode. In flowing nitrogen, the top-down discharge image was uniformly dispersed as a whole.
The research results can prove that the experimental device and the experimental method provided by the invention can generate large-volume uniform discharge plasma in air and nitrogen. In industrial applications, such as material surface treatment and ozone generation, only 10m/s of air flow or nitrogen flow is needed to significantly improve the uniformity of discharge, thereby effectively improving the treatment effect and treatment efficiency. For some special applications, such as flow control, waste gas treatment, etc., the device may inevitably need to be introduced with a higher speed gas flow, and according to the method provided by the invention, the generation of large-volume uniform plasma under high-speed gas flow can be realized by purchasing nanosecond pulse power supplies capable of providing higher frequency or higher voltage. Therefore, the device and the method provided by the invention can generate large-volume uniform plasma in the air flow and nitrogen flow environment, and the generated large-volume uniform plasma has great application value in the fields of ozone generation, material surface treatment, flow control, waste gas treatment and the like.
The examples are only for showing the embodiments of the present invention, but not for limiting the scope of the patent of the present invention, it should be noted that, for those skilled in the art, many variations and modifications can be made without departing from the concept of the present invention, and these are all within the scope of the protection of the present invention.
Claims (7)
1. A method of generating a volumetrically uniform plasma in an air or nitrogen stream, characterized by the steps of:
firstly, selecting a nylon gasket (9) according to a required discharge gap, and assembling a dielectric barrier discharge flat plate electrode unit through a nylon bolt (7) and a nylon nut (11);
the dielectric barrier discharge flat plate electrode unit comprises an upper wiring terminal, an upper electrode, an upper dielectric plate, a gasket, a lower dielectric plate, a lower electrode and a lower wiring terminal; the upper and lower electrodes are made of glass plated with indium tin oxide conductive films; the upper electrode is connected with the high-voltage end of the nanosecond pulse power supply (1) through an upper wiring end, and the upper wiring end is a copper foil A (5); the lower electrode is connected with the grounding end of the nanosecond pulse power supply (1) through a lower wiring end, and the lower wiring end is a copper foil B (13); the upper blocking medium and the lower blocking medium are quartz glass A (8) and quartz glass B (10), and the upper quartz glass A (8) and the lower quartz glass B (10) are respectively provided with four through holes; the discharge gap is adjusted by a nylon gasket (9) with a certain thickness; an upper quartz glass A (8), a nylon gasket (9) and a lower quartz glass B (10) are fixed through a nylon bolt (7) and a nylon nut (11);
secondly, fixing the dielectric barrier discharge flat electrode unit on a nylon frame, and tightly contacting with an airflow outlet of a Laval nozzle (4) to enable airflow to flow into a discharge space in parallel with a discharge gap;
thirdly, connecting a high-voltage output end and a grounding end of the nanosecond pulse power supply (1) with a copper foil A and a copper foil B respectively, and turning on the power supply to generate stable discharge;
fourthly, adjusting the ball valve to the position with the required air flow speed, opening an air pump switch or an air bottle valve, and introducing air flow;
fifthly, observing the discharge uniformity, and shooting a discharge image with the exposure time not less than one period by using a high-speed camera or an ICCD (integrated compact disc); if the discharge wire is thick and bright, the voltage is reduced, the frequency is reduced, and the discharge in the whole discharge area is uniformly dispersed; if the discharge wire is thin and weak, the voltage is increased, the frequency is increased, and the discharge in the whole discharge area is uniformly dispersed.
2. The method of claim 1, wherein the upper and lower electrodes are transparent ITO-coated conductive film glass, wherein one side of the ITO-coated conductive film is in contact with quartz glass, the outer edge of the ITO-coated conductive film glass is coated with 704 silicone rubber, and the quartz glass and the ITO-coated conductive film glass are bonded and kept in good contact with each other by the 704 silicone rubber; the ITO conductive film is connected to a circuit through a copper foil, and the transparent upper and lower electrodes can realize the observation of discharge from various directions such as the upper and lower depression surfaces and the side surface, and simultaneously allow the diagnosis of discharge characteristics by using a transmission method.
3. A method of generating a volumetrically uniform plasma in an air or nitrogen stream as claimed in claim 1 or 2, wherein said transmission method comprises one of Pockels effect measurement of surface charge, laser diagnosis or shadowgraph.
4. A method for generating a large volume of uniform plasma in air or nitrogen flow according to claim 1 or 2, characterized in that the laval nozzle (4) is connected to a single stage impeller vortex gas pump or a nitrogen cylinder, the air flow being generated by a single stage impeller vortex gas pump, the nitrogen flow being supplied through the cylinder in the experiment, and the air duct (3); the airflow flows through the air duct (3) and the Laval nozzle (4) to enter the discharge gap; the air flow speed can be adjusted by a ball valve at the front end of the Laval nozzle (4).
5. A method for generating a large volume of uniform plasma in air or nitrogen flow according to claim 1 or 2, characterized in that said nanosecond pulsed power supply (1) consists of an autotransformer, a three-stage magnetic compression pulsed power supply and a voltage booster, the pulse rising edge is about 40ns, the pulse width is about 200 ns; the pulse repetition frequency may be set to 100, 300, 600, 1000, 1200Hz, etc.; the peak value of the pulse voltage can be adjusted through the autotransformer, and the voltage adjusting range is 0-40 kV.
6. A method for generating a large volume of uniform plasma in air or nitrogen flow according to claim 3, characterized in that said nanosecond pulsed power supply (1) consists of an autotransformer, a three-stage magnetic compression pulsed power supply and a voltage booster, the pulse rising edge is about 40ns, the pulse width is about 200 ns; the pulse repetition frequency may be set to 100, 300, 600, 1000, 1200Hz, etc.; the peak value of the pulse voltage can be adjusted through the autotransformer, and the voltage adjusting range is 0-40 kV.
7. A method for generating a large volume of uniform plasma in air or nitrogen flow according to claim 4, characterized in that said nanosecond pulsed power supply (1) consists of an autotransformer, a three-stage magnetic compression pulsed power supply and a voltage booster, the pulse rising edge is about 40ns, the pulse width is about 200 ns; the pulse repetition frequency may be set to 100, 300, 600, 1000, 1200Hz, etc.; the peak value of the pulse voltage can be adjusted through the autotransformer, and the voltage adjusting range is 0-40 kV.
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| CN210868290U (en) * | 2019-11-29 | 2020-06-26 | 大连理工大学 | Device for generating uniform space plasma by atmospheric pressure dielectric barrier discharge |
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| CN105422401A (en) * | 2015-12-08 | 2016-03-23 | 南京航空航天大学 | Jet flow thrust vector device based on plasma flow control |
| CN107135597A (en) * | 2017-06-26 | 2017-09-05 | 大连理工大学 | Wide arc gap, the device of large area Uniform Discharge plasma and application method are produced in a kind of atmospheric air |
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Application publication date: 20211210 |