CN113741571A - Pressure control system for covering normal pressure to high vacuum - Google Patents
Pressure control system for covering normal pressure to high vacuum Download PDFInfo
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- CN113741571A CN113741571A CN202111055751.XA CN202111055751A CN113741571A CN 113741571 A CN113741571 A CN 113741571A CN 202111055751 A CN202111055751 A CN 202111055751A CN 113741571 A CN113741571 A CN 113741571A
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D16/00—Control of fluid pressure
- G05D16/20—Control of fluid pressure characterised by the use of electric means
- G05D16/2006—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means
- G05D16/2066—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means using controlling means acting on the pressure source
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Abstract
The invention discloses a pressure control system covering normal pressure to high vacuum, which comprises a vacuum container, wherein the vacuum container is provided with a vacuum gauge, a mass flow meter, a first vacuum valve and a second vacuum valve, the first vacuum valve is connected with a rough pumping pipeline, the rough pumping pipeline is connected with a rough pumping pump through an opening regulating valve, the second vacuum valve is connected with a high vacuum pump, and the rough pumping pump can be simultaneously used as a backing pump of the high vacuum pump. In the invention, the pressure control range is from normal pressure to 1 × 10‑ 5Pa, can be stabilized under arbitrary pressure, therefore the staff of being convenient for controls, and pressure control precision is higher, can effectually reduce the error, utilizes rough pump to make the pumping rate adjustable, utilizes mass flow meter to carry out the tonifying qi and adjusts, the control of being convenient for.
Description
Technical Field
The invention relates to the technical field of environmental simulation, in particular to a pressure control system covering normal pressure to high vacuum.
Background
In order to research the influence of the high-altitude environment on various devices, high-quality simulation is required to be realized on the high-altitude environment. The most obvious characteristic of the high-altitude environment is the change of the environmental pressure, and the pressure is gradually reduced from the atmospheric pressure to the vacuum environment along with the increase of the altitude. Therefore, it is necessary to realize an arbitrary pressure point at which the test pressure is stabilized from atmospheric pressure to high vacuum. Because the pressure change relates to the change of flow state, the conventional pressure control method adopts the modes of high-frequency valve on-off and the like to control pressure, can realize air extraction in low vacuum and medium vacuum stages, but is difficult to cover the pressure range from atmospheric pressure to high vacuum, and is difficult to ensure the accuracy and stability of pressure control.
Disclosure of Invention
The invention aims to: in order to solve the above problems, a pressure control system covering from normal pressure to high vacuum has been proposed.
In order to achieve the purpose, the invention adopts the following technical scheme:
a pressure control system covering normal pressure to high vacuum comprises a vacuum container, wherein the vacuum container is provided with a vacuum gauge, a mass flow meter, a first vacuum valve and a second vacuum valve;
the pressure control system for covering normal pressure to high vacuum comprises the following steps:
s1, arranging a vacuum container which can bear external pressure of 1 atmosphere and has no obvious air leakage point;
s2, measuring the pressure in the container by a vacuum gauge, wherein the vacuum gauge is a full-range gauge consisting of a rough vacuum gauge and a high vacuum gauge;
s3, pumping the vacuum container by a vacuum pump, wherein the vacuum pump comprises a rough pump and a high vacuum pump, and pumping by the rough pump in the range from normal pressure to 5 Pa; at the moment, a rough vacuum gauge is adopted to measure the pressure of the container, and a resistance gauge or a film gauge is preferably selected;
s4, controlling the pumping speed of the rough pump by using the opening degree regulating valve, closing the opening degree regulating valve to a smaller state near the target pressure, and introducing air by using a mass flowmeter to balance the pressure at the target value;
s5 at 5Pa to 1X 10-5The pressure range of Pa is pumped by a high vacuum pump;
s6, measuring by using a rough vacuum gauge when the pressure is 5Pa to 1Pa, switching to a high vacuum gauge to measure the pressure of the container when the pressure is lower than 1Pa, wherein the high vacuum gauge is preferably a hot cathode ionization gauge, a cold cathode ionization gauge or a BA gauge, the required range meets the requirement, and the sampling frequency is higher than 2 Hz;
and S7, using a mass flow meter to supplement air, and further adjusting the speed and time of air extraction.
Preferably, in S3, the pumping time of the rough pump is calculated according to the following formula:
in the formula: t is pumping time, s;
SP: total effective pumping speed, L/s;
v: the volume of the tank, L;
P1: pressure at the beginning of pumping, Pa;
P2: the pressure, Pa, reached after time t;
k: correction factor, 105～104Pa is 1, 104～103Pa is 1.25, 103～102Pa is 1.5 or 102And the value of 10Pa is 2, and the value of 10-1 Pa is 4.
Preferably, the vacuum gauge bagComprises a rough vacuum gauge and a high vacuum gauge, wherein the vacuum gauge range meets the requirements of normal pressure to 1 multiplied by 10-5Pa, the sampling frequency is better than 2 Hz.
Preferably, the high-vacuum pump meets the condition that the ultimate vacuum degree of the vacuum container is better than 1 x 10-5Pa。
Preferably, the mass flow meters are controlled by PID, the mass flow meters with different ranges are selected to be connected in parallel according to the pumping speeds of the vacuum pumps under different pressures, and the selection principle is that the maximum air inlet flow of the mass flow meters is higher than the pumping speed of the vacuum pump under the target pressure.
In summary, due to the adoption of the technical scheme, the invention has the beneficial effects that:
the pressure range in the application is controllable, and the pressure control range is from normal pressure to 1 multiplied by 10-5Pa, can be stabilized under arbitrary pressure, therefore the staff of being convenient for controls, and pressure control precision is higher, can effectually reduce the error, utilizes rough pump to make the pumping rate adjustable, utilizes mass flow meter to carry out the tonifying qi and adjusts, the control of being convenient for.
Drawings
FIG. 1 illustrates a schematic diagram of a pressure control system provided in accordance with an embodiment of the present invention;
illustration of the drawings:
1. a vacuum vessel; 2. a first vacuum valve; 3. an opening degree regulating valve; 4. a rough pumping pump; 5. a second vacuum valve; 6. a high vacuum pump; 7. a vacuum gauge; 8. a mass flow meter.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Referring to fig. 1, the present invention provides a technical solution:
a pressure control system for covering normal pressure to high vacuum comprises a vacuum container 1The container 1 is provided with a vacuum gauge 7 and a mass flow meter 8, the mass flow meter 8 is controlled by PID, the mass flow meters 8 with different ranges are selected to be connected in parallel according to the pumping speeds of the vacuum pumps under different pressures, the selection principle is that the maximum air inlet flow of the mass flow meter 8 is higher than the pumping speed of the vacuum pump under the target pressure, the vacuum gauge 7 comprises a rough vacuum gauge and a high vacuum gauge, the range of the vacuum gauge 7 meets the conditions from normal pressure to 1Pa, the sampling frequency is better than 2Hz, the container is also provided with a first vacuum valve 2 and a second vacuum valve 5, the first vacuum valve 2 is connected with a rough pumping pipeline, the rough pumping pipeline is connected with a rough pumping pump 4 through an opening regulating valve 3, the second vacuum valve 5 is connected with a high vacuum pump 6, the rough pumping pump 4 can be simultaneously used as a backing pump of the high vacuum pump, and the high vacuum pump 6 meets the condition that the ultimate vacuum degree of the vacuum container 1 is better than 1 multiplied by 1 by 10-5Pa, a rough pump 4 is arranged at the tail ends of the first vacuum valve 2 and the high vacuum pump 6.
A pressure control system for covering from atmospheric pressure to high vacuum comprising the steps of:
s1, arranging a vacuum container 1 which can bear external pressure of 1 atmosphere and has no obvious air leakage point;
s2, measuring the pressure in the container by using a vacuum gauge 7, wherein the vacuum gauge 7 is a full-range gauge consisting of a rough vacuum gauge and a high vacuum gauge;
s3, adopting a vacuum pump to pump the vacuum container 1, wherein the vacuum pump comprises a rough pump 4 and a high vacuum pump 6, and adopting the rough pump 4 to pump in the range from normal pressure to 5 Pa; at the moment, a rough vacuum gauge is adopted to measure the pressure of the container, and a resistance gauge or a film gauge is preferably selected;
s4, controlling the pumping speed of the rough pump 4 by using the opening degree adjusting valve 3, closing the opening degree adjusting valve 3 to a smaller state near the target pressure, and introducing air by using the mass flowmeter 8 to balance the pressure at the target value;
s5 at 5Pa to 1X 10-5The pressure range of Pa is pumped by a high vacuum pump 6;
s6, measuring by using a rough vacuum gauge when the pressure is 5Pa to 1Pa, switching to a high vacuum gauge to measure the pressure of the container when the pressure is lower than 1Pa, wherein the high vacuum gauge is preferably a hot cathode ionization gauge, a cold cathode ionization gauge or a BA gauge, the required range meets the requirement, and the sampling frequency is higher than 2 Hz;
s7, using the mass flowmeter 8 to supplement air, stabilizing the pressure at the required value, and adjusting the speed and time of air extraction;
rough pump 4 and high vacuum pump 6 become the vacuum pump package, adopt different vacuum pumps according to different operating pressure, adopt rough pump 4 to bleed in the range of ordinary pressure to 5Pa, rough pump 4 can select screw pump, scroll pump etc. can start at the ordinary pressure, the limit is superior to the vacuum pump of 1Pa, if the container is great, in order to reduce the time of bleeding, can adopt roots pump to constitute the unit according to actual demand, the whole set of system rough pump 4 requires the fastest time of bleeding to satisfy the user's requirement, the time of bleeding is calculated according to the following formula:
in the formula: t is pumping time, s;
SP: total effective pumping speed, L/s;
v: the volume of the tank, L;
P1: pressure at the beginning of pumping, Pa;
P2: the pressure, Pa, reached after time t;
k: correction factor, 105～104Pa is 1, 104～103Pa is 1.25, 103～102Pa is 1.5 or 102Taking 2 at-10 Pa and 4 at-10-1 Pa;
under the pressure of 5Pa, closing a first vacuum valve 2 of the rough pumping pipeline, opening a second high vacuum valve 5, pumping by using a high vacuum pump 6, wherein the high vacuum pump 6 can adopt vacuum pumps such as a molecular pump, an oil diffusion pump, a low-temperature pump and the like, the starting pressure is required to be more than 5Pa, if the starting pressure is less than 5Pa, the rough pumping pump is used for continuously pumping to the starting pressure of the high vacuum pump, and simultaneously the requirement that the ultimate vacuum degree of the container is required to be better than 1 multiplied by 10-5Pa, ultimate vacuum degree according to the following formula:
in the formula: pj-the ultimate vacuum, Pa, that the vacuum chamber can reach;
P0: ultimate vacuum, Pa, of the vacuum pump;
Q0: during idle load, the gas load of the vacuum chamber after a certain time of air extraction comprises gas leakage QLMaterial surface outgassing Qe，PaL/s；
Seff: effective pumping speed of the pump near the pumping hole of the vacuum chamber, L/s.
In summary, the pressure control system provided by this embodiment, which utilizes the components such as the high vacuum pump 6, the vacuum gauge 7, the opening degree regulating valve 3, and the mass flow meter 8 to realize accurate control from atmospheric pressure to any pressure of the high vacuum pressure, meets the environmental simulation of different pressure conditions.
The previous description of the embodiments is provided to enable any person skilled in the art to make or use the present invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the generic principles defined herein may be applied to other embodiments without departing from the spirit or scope of the invention. Thus, the present invention is not intended to be limited to the embodiments shown herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.
Claims (5)
1. A pressure control system covering normal pressure to high vacuum comprises a vacuum container (1), and is characterized in that the vacuum container (1) is provided with a vacuum gauge (7), a mass flow meter (8), a first vacuum valve (2) and a second vacuum valve (5), the first vacuum valve (2) is connected with a rough pumping pipeline, the rough pumping pipeline is connected with a rough pumping pump (4) through an opening adjusting valve (3), the second vacuum valve (5) is connected with a high vacuum pump (6), and the rough pumping pump (4) can be simultaneously used as a backing pump of the high vacuum pump;
the pressure control system for covering normal pressure to high vacuum comprises the following steps:
s1, arranging a vacuum container (1) which can bear external pressure of 1 atmospheric pressure and has no obvious air leakage point;
s2, measuring the pressure in the container by using a vacuum gauge (7), wherein the vacuum gauge (7) is a full-range gauge consisting of a rough vacuum gauge and a high vacuum gauge;
s3, adopting a vacuum pump to pump the vacuum container (1), wherein the vacuum pump comprises a rough pump (4) and a high vacuum pump (6), and adopting the rough pump (4) to pump in the range from normal pressure to 5 Pa; at the moment, a rough vacuum gauge is adopted to measure the pressure of the container, and a resistance gauge or a film gauge is preferably selected;
s4, controlling the pumping speed of the rough pump (4) by using the opening degree regulating valve (3), closing the opening degree regulating valve (3) to a smaller state near the target pressure, and introducing air by using a mass flowmeter (8) to balance the pressure at the target value;
s5 at 5Pa to 1X 10-5The pressure range of Pa is pumped by a high vacuum pump (6);
s6, measuring by using a rough vacuum gauge when the pressure is 5Pa to 1Pa, switching to a high vacuum gauge to measure the pressure of the container when the pressure is lower than 1Pa, wherein the high vacuum gauge is preferably a hot cathode ionization gauge, a cold cathode ionization gauge or a BA gauge, the required range meets the requirement, and the sampling frequency is higher than 2 Hz;
and S7, using a mass flow meter (8) to supplement air, and further adjusting the speed and time of air extraction.
2. A pressure control system for covering normal pressure to high vacuum according to claim 1, wherein the pumping time of the rough pump (4) in S3 is calculated according to the following formula:
in the formula: t is pumping time, s;
SP: total effective pumping speed, L/s;
v: the volume of the tank, L;
P1: pressure at the beginning of pumping, Pa;
P2: the pressure, Pa, reached after time t;
k: correction factor, 105～104Pa is 1, 104～103Pa is 1.25, 103～102Pa is 1.5 or 102And the value of 10Pa is 2, and the value of 10-1 Pa is 4.
3. A pressure control system covering normal pressure to high vacuum as claimed in claim 1, characterized in that the vacuum gauge (7) comprises a rough vacuum gauge and a high vacuum gauge, the range of the vacuum gauge (7) satisfies normal pressure to 1 x 10-5Pa, the sampling frequency is better than 2 Hz.
4. A pressure control system for covering normal pressure to high vacuum according to claim 1, characterized in that the high vacuum pump (6) satisfies ultimate vacuum degree of the vacuum vessel (1) better than 1 x 10-5Pa。
5. A pressure control system covering normal pressure to high vacuum according to claim 1, characterized in that the mass flow meter (8) adopts PID control, and the mass flow meters (8) with different ranges are connected in parallel according to the pumping speed of the vacuum pump under different pressures, and the maximum intake flow of the mass flow meter (8) is selected to be higher than the pumping speed of the vacuum pump under the target pressure.
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| CN202111055751.XA CN113741571B (en) | 2021-09-09 | 2021-09-09 | Pressure control system for covering normal pressure to high vacuum |
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| CN202111055751.XA CN113741571B (en) | 2021-09-09 | 2021-09-09 | Pressure control system for covering normal pressure to high vacuum |
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| CN113741571B CN113741571B (en) | 2023-08-25 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115328226A (en) * | 2022-08-31 | 2022-11-11 | 湖南顶立科技有限公司 | Pressure regulating device and method applied to vapor deposition equipment |
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| CN115328226A (en) * | 2022-08-31 | 2022-11-11 | 湖南顶立科技有限公司 | Pressure regulating device and method applied to vapor deposition equipment |
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