CN113735129A - Preparation method and application of ultraviolet-resistant dendritic silicon dioxide nano material - Google Patents
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Abstract
The invention discloses a preparation method and application of an anti-ultraviolet dendritic silicon dioxide nano material, wherein the dendritic silicon dioxide nano material loaded with organic Ultraviolet (UV) absorption groups is formed in situ by a simple liquid phase method, the prepared anti-ultraviolet dendritic silicon dioxide nano material has the double effects of UV shielding and absorption, has good anti-ultraviolet aging effect, does not generate side reaction for accelerating high polymer degradation, is a high-efficiency, multifunctional and environment-friendly plastic additive, has important application prospect in the plastic industry, accords with the development requirement of green chemistry, and is beneficial to environmental protection.
Description
The technical field is as follows:
the invention relates to the field of plastic additives and plastic anti-aging, in particular to a preparation method and application of an anti-ultraviolet dendritic silicon dioxide nano material.
Background art:
the ultraviolet aging resistance is a technical problem which is inevitably faced in the outdoor application process of plastic products. When high-energy ultraviolet rays irradiate the surface of the plastic, the caused shallow surface layer macromolecule crosslinking can influence the photochemical property, the biological property and the mechanical strength of the plastic product, and influence the service life and the later recovery treatment of the plastic product. Especially for transparent plastic film materials (thickness 5-100 μm) used outdoors, the whole matrix is equivalent to a shallow surface layer, and the ultraviolet aging causes the comprehensive aging of the material, thereby rapidly reducing the outdoor service life of the material. The addition of a light stabilizing auxiliary to suppress ultraviolet ray deterioration of a plastic film and improve weather resistance is considered to be an economically feasible method most advantageous for industrialization.
The inorganic light-shielding agent is a low-cost, environment-friendly and effective anti-aging auxiliary agent, and refers to an inorganic compound capable of absorbing or reflecting ultraviolet rays, and mainly comprises carbon black, titanium dioxide, zinc oxide, zinc barium and the like. The use of the light-shielding agent prevents direct irradiation of light to the inside of the polymer, and protects the inside of the polymer from ultraviolet rays. However, the use of inorganic uv-screening agents has significant drawbacks: on one hand, the inorganic ultraviolet screening agent is easy to agglomerate in the process of processing or using the polymer; on the other hand, the UV protection effect is single or strong in coloring, if the silicon dioxide only has a shielding effect, the excessive addition of the silicon dioxide can affect the light transmittance of the matrix; thirdly, the semiconductor light-shielding agent is easy to generate side reaction after absorbing UV to accelerate the degradation of high molecules, such as iron oxide and zinc oxide, and free radicals with reducibility and cavities with oxidability are easy to generate under the light irradiation to cause the degradation or crosslinking of a polymer matrix. In order to improve these problems, it is necessary to prepare a novel multifunctional ultraviolet absorber.
The invention content is as follows:
the invention aims to provide a preparation method and application of an anti-ultraviolet dendritic silicon dioxide nano material, wherein the dendritic silicon dioxide nano material loaded with organic Ultraviolet (UV) absorption groups is formed in situ by a simple liquid phase method, the prepared anti-ultraviolet dendritic silicon dioxide nano material has double effects of UV shielding and absorption, reduces the agglomeration of a UV shielding agent in the processing and using processes of plastic products, has good anti-ultraviolet aging effect, does not generate side reaction for accelerating the degradation of macromolecules, is an efficient, multifunctional and environment-friendly plastic additive, has important application prospect in the plastic industry, accords with the development requirement of green chemistry, and is beneficial to environmental protection.
The invention is realized by the following technical scheme:
a preparation method of an anti-ultraviolet dendritic silicon dioxide nano material comprises the following steps:
(1) dissolving an ultraviolet absorbent and a surfactant into a mixed solvent of ethanol and water to prepare a surfactant mixed system, then adding a silicon source, adjusting the pH to 8-10 by using an alkali catalyst, and stirring and reacting for 2-12 hours at 20-80 ℃; the molar ratio of the silicon source to the surfactant to the ultraviolet absorber is (1-100) 1: (0.5 to 20); the ultraviolet absorbent is one or two of 4- (4, 6-diphenyl-S-triazine) -1, 3-resorcinol, 3- [3- (2-H-benzotriazole-2-yl) -4-hydroxy-5-tert-butylphenyl ] -propionic acid-polyethylene glycol 300 ester and 2-hydroxy-4-methoxybenzophenone;
(2) and (2) filtering, washing and freeze-drying the reaction product obtained in the step (1), wherein the freeze-drying temperature is-70-0 ℃, and the anti-ultraviolet dendritic silicon dioxide nano material is obtained.
In the step (1), the surfactant is cetyl trimethyl ammonium bromide.
The silicon source is one or two of tetraethyl orthosilicate, 3-aminopropyltriethoxysilane, 3-chloropropyl trimethoxysilane and the like.
The alkali catalyst is one of ammonia water and sodium hydroxide, and preferably the ammonia water.
The volume ratio of ethanol to water in the mixed solvent of ethanol and water is preferably 1:1 to 4: 1.
The invention also protects the application of the supported dendritic silica nanomaterial prepared by the preparation method as an anti-ultraviolet auxiliary agent in plastics.
The plastic comprises polybutylene adipate/terephthalate, polylactic acid, polyvinyl alcohol and the like.
The invention has the following beneficial effects:
1) according to the invention, the appropriate ultraviolet absorbent is added into the raw materials, and the dendritic silicon dioxide nano material loaded with the organic Ultraviolet (UV) absorption group is formed in situ by a simple liquid phase method, so that the process is simple, the dependence on containers and equipment is avoided, the mass production is easy, the environmental protection is facilitated, the cost is reduced, and the industrial popularization is facilitated.
2) The added ultraviolet absorbent plays a role in reaming and functionalization, not only improves the specific surface area of a product, but also is beneficial to the loading of functional groups and endows the material with ultraviolet absorptivity, and the prepared ultraviolet-resistant dendritic silicon dioxide nano material has double effects of UV shielding and absorption, reduces the agglomeration of the UV shielding agent in the processing and using processes of plastic products and endows the plastic with excellent environmental protection property of the ultraviolet aging resistant auxiliary agent.
3) The prepared ultraviolet-resistant dendritic silicon dioxide nano material has good ultraviolet aging resistant effect, can improve the UV absorptivity of inorganic nano particles, improves the UV aging resistant effect of plastic products, has low use concentration, reduces the influence of inorganic filler on the chromaticity of plastic base materials, does not generate side reaction for accelerating high polymer degradation, is a high-efficiency, multifunctional and environment-friendly plastic additive, has important application prospect in the plastic industry, meets the development requirement of green chemistry, and is beneficial to environmental protection.
Description of the drawings:
FIG. 1 is a TEM photograph of the UV resistant dendritic silica nanomaterial prepared in example 1.
FIG. 2 shows the adsorption-desorption curves (a) and the corresponding pore size distributions (b) for nitrogen-containing silica prepared in example 1 and comparative example 1
Fig. 3 is an ultraviolet-infrared absorption spectrum of the ethanol dispersion solution of silica nanomaterial prepared in examples 1-4 and comparative examples 1-2.
The specific implementation mode is as follows:
the following is a further description of the invention and is not intended to be limiting.
Example 1:
12g of tetraethyl orthosilicate, 1g of gamma-aminopropyltriethoxysilane, 1.0g of 3- [3- (2-H-benzotriazol-2-yl) -4-hydroxy-5-tert-butylphenyl]-propionic acid-polyethylene glycol 300 ester and 0.8g hexadecyl trimethyl ammonium bromide were dissolved in 250mL of a mixed solvent of ethanol/water in a volume ratio of 4:1, adjusted to pH 9 with ammonia water, and reacted at 25 ℃ for 3 hours with stirring; washing the obtained reaction product with absolute ethyl alcohol, filtering, freezing and drying to obtain the ultraviolet-resistant dendritic silicon dioxide nano material SiO2A TEM image of the material is shown in figure 1, a nitrogen adsorption and desorption curve is shown in figure 2, and an ultraviolet-infrared absorption spectrum of the ultraviolet-resistant dendritic silica nanomaterial ethanol dispersion solution is shown in figure 3. As can be seen in FIG. 1, SiO2-1 is a sphere with a diameter of 250nm, with a dendritic structure extending centrally to the periphery.
Comparative example 1:
reference example 1 was made with the exception that the ultraviolet absorber 3- [3- (2-H-benzotriazol-2-yl) -4-hydroxy-5-tert-butylphenyl ] -propionic acid-polyethylene glycol 300 ester was not added. The nitrogen adsorption and desorption curve is shown in figure 2.
Comparative example 2:
reference is made to example 1, with the difference that the UVA-type UV absorber octocrylene (isooctyl 2-cyano-3, 3-diphenylacrylate) is used instead of 3- [3- (2-H-benzotriazol-2-yl) -4-hydroxy-5-tert-butylphenyl ] -propionic acid-polyethylene glycol 300 ester. The ultraviolet-infrared absorption spectrum is shown in figure 3.
From FIG. 2 it can be seen that the addition of the UV absorber 3- [3- (2-H-benzotriazol-2-yl) -4-hydroxy-5-tert-butylphenyl]-propionic acid-polyethylene glycol 300 ester, specific surface area 230m2The/g is increased to 420m2The pore diameter is increased from 1-4 nm to 1-7 nm, which shows that the added ultraviolet absorbent plays a role in reaming and functionalization, not only improves the specific surface area of the product, but also is beneficial to the UV absorbent 3- [3- (2-H-benzotriazole-2-yl) -4-hydroxy-5-tert-butylphenyl]Loading of triazolyl and phenylhydroxy groups in propionic acid-polyethylene glycol 300 ester (UV absorption spectrum see fig. 3), imparting UV absorbance to the material.
FIG. 3 shows that the UV absorbent 3- [3- (2-H-benzotriazole-2-yl) -4-hydroxy-5-tert-butylphenyl ] -propionic acid-polyethylene glycol 300 ester modification can absorb 200-400nm full-band ultraviolet rays, the absorption is mainly from intramolecular hydrogen chelation of benzotriazole group and benzene hydroxyl, and Octocriline (3- [3- (2-H-benzotriazole-2-yl) -4-hydroxy-5-tert-butylphenyl ] -propionic acid-polyethylene glycol 300 ester uses 2-cyano-3, 3-diphenyl acrylic acid isooctane) to destroy the UV absorption group under the synthesis condition, only can absorb 200-300UVB segment, and is very weak to 300-400nm UVA absorption.
Example 2
13g of tetraethyl orthosilicate, 2.0g of 3- [3- (2-H-benzotriazol-2-yl) -4-hydroxy-5-tert-butylphenyl]-propionic acid-polyethylene glycol 300 ester and 0.8g cetyltrimethylammonium bromide were dissolved in 250mL of a solvent of ethanol/water (volume ratio 4:1), adjusted to pH 10 with ammonia water, and reacted at 40 ℃ for 10 hours with stirring; washing, filtering and freeze-drying the obtained reaction product with absolute ethyl alcohol to obtain the anti-ultraviolet dendritic silicon dioxide nano material SiO2-2。
The main difference between example 2 and example 1 is that a single silicon source is used, while the UV absorber content is increased. The reaction product is less in 2 hours, and the reaction temperature needs to be increased to prolong the reaction time when sufficient white product is generated.
Example 3
12g of tetraethyl orthosilicate, 1g of gamma-aminopropyltriethoxysilane, 1.5g of 4- (4, 6-diphenyl-S-triazine) -1, 3-resorcinol and 0.8g of cetyltrimethylammonium bromide were dissolved in 250mL of ethyl acetateAdjusting the pH to 9 by using ammonia water in a solvent of alcohol/water (the volume ratio is 4:1), and stirring and reacting for 2 hours at the temperature of 25 ℃; washing the obtained reaction product with absolute ethyl alcohol, filtering, freezing and drying to obtain the ultraviolet-resistant dendritic silicon dioxide nano material SiO2-3。
Example 4
Dissolving 12g of tetraethyl orthosilicate, 1g of (3-chloropropyl) trimethoxysilane, 1.5g of 2-hydroxy-4-methoxybenzophenone, 0.2g of sodium citrate and 0.6g of hexadecyltrimethylammonium bromide in 250mL of a solvent of ethanol/water (volume ratio 4:1), adjusting the pH to 10 by using ammonia water, and reacting for 2 hours at 60 ℃ with stirring; washing the obtained reaction product with absolute ethyl alcohol, filtering, freezing and drying to obtain the ultraviolet-resistant dendritic silicon dioxide nano material SiO2-4。
Example 4 differs from example 1 in that 2-hydroxy-4-methoxybenzophenone is used instead of 3- [3- (2-H-benzotriazol-2-yl) -4-hydroxy-5-tert-butylphenyl ] -propionic acid-polyethylene glycol 300 ester, with a two-component surfactant, and the reaction temperature is raised, accelerating the reaction.
Application examples 1 to 6
0.2g of the silica nanomaterial obtained in each of examples 1 to 4 and comparative examples 1 to 2 was weighed in a beaker, and 100ml of methylene chloride was added thereto and mixed, followed by ultrasonic dispersion for 30 minutes to prepare a suspension. Then adding 10g of poly (butylene adipate/terephthalate) PBAT (polybutylene terephthalate) and uniformly mixing, pouring the film forming solution into a self-made glass mold, drying for 2 hours at room temperature to prepare a film with the thickness of about 25 mu m, and cutting the film into a sample strip with the width of 1cm for carrying out ultraviolet aging performance test.
Application examples 7 to 9
0.2g of the silica nanomaterial obtained in example 1 and comparative examples 1-2 was weighed in a beaker, and 100ml of dichloromethane was added and mixed, followed by ultrasonic dispersion for 30min to prepare a suspension. Then 8g of poly (butylene adipate/terephthalate) PBAT and 2g of polylactic acid PLA are added and mixed uniformly, then the film forming solution is poured into a self-made glass mold and dried for 2 hours at room temperature to prepare a film with the thickness of about 25 mu m, and the film is cut into a sample strip with the width of 1cm to carry out ultraviolet aging performance test.
According to the GB/T16422.3-2014/ISO 4892-3:2006 standard pairApplication examples 1-9 to carry out accelerated aging experiments in a laboratory, wherein the temperature is 60 ℃, and the irradiance is 0.89 W.m-1·nm-1And sampling at intervals of 6 hours to test the tensile mechanical property. The tensile mechanical property test is carried out according to the GB/T1040.2 standard, and the test speed is 500mm min-1. And (3) drying the aged film and the filter paper in vacuum at 60 ℃, tightly wrapping the filter paper, extracting the film and the filter paper by using dichloromethane in a Soxhlet extractor for 24 hours, and calculating the gel content according to the mass reduction part. Application examples 1-9 aged 36H tensile elongation at break retention is shown in Table 1. As is clear from Table 1, the films to which the silica nanomaterials of examples 1 to 4 were added (application examples 1 to 4) had an elongation at break retention of 46% or more and the films to which the silica nanomaterials of comparative examples 1 and 2 were added had an elongation at break retention of less than 30% after the same amount of addition and UV aging for 36 hours. The polymer can generate gel and chain scission in photoaging to cause performance reduction, and the gel content proves that the silicon dioxide loaded with the UV absorbent can effectively weaken the crosslinking reaction of the polymer under the UV light. Illustrating the ultraviolet resistant dendritic silicon dioxide nano material SiO2The PBAT film can better maintain the mechanical property of the PBAT film under ultraviolet radiation, has excellent ultraviolet aging resistance, and is also suitable for PBAT/PLA blends (application example 7).
TABLE 1
Claims (7)
1. A preparation method of an anti-ultraviolet dendritic silicon dioxide nano material is characterized by comprising the following steps:
(1) dissolving an ultraviolet absorbent and a surfactant into a mixed solvent of ethanol and water to prepare a surfactant mixed system, then adding a silicon source, adjusting the pH to 8-10 by using an alkali catalyst, and stirring and reacting for 2-12 hours at 20-80 ℃; the molar ratio of the silicon source, the ultraviolet absorber and the surfactant is (1-100) and is 1: (0.5-20); the ultraviolet absorbent is one or two of 4- (4, 6-diphenyl-S-triazine) -1, 3-resorcinol, 3- [3- (2-H-benzotriazole-2-yl) -4-hydroxy-5-tert-butylphenyl ] -propionic acid-polyethylene glycol 300 ester and 2-hydroxy-4-methoxybenzophenone;
(2) and (2) filtering, washing and freeze-drying the reaction product obtained in the step (1), wherein the freeze-drying temperature is-70-0 ℃, and the anti-ultraviolet dendritic silicon dioxide nano material is obtained.
2. The method for preparing the ultraviolet resistant dendritic silica nanomaterial according to claim 1, wherein the surfactant is cetyltrimethylammonium bromide.
3. The method for preparing the ultraviolet-resistant dendritic silica nanomaterial according to claim 1, wherein the silicon source is any one or two of tetraethyl orthosilicate, 3-aminopropyltriethoxysilane, and (3-chloropropyl) trimethoxysilane.
4. The method for preparing the ultraviolet resistant dendritic silica nanomaterial according to claim 1, wherein the alkali catalyst is one of ammonia water and sodium hydroxide.
5. The preparation method of the ultraviolet-resistant dendritic silica nanomaterial according to claim 1, wherein a volume ratio of ethanol to water in a mixed solvent of ethanol and water is 1:1 to 4: 1.
6. Use of the supported dendritic silica nanomaterial obtained by the preparation method according to any one of claims 1 to 5 as an anti-UV adjuvant in plastics.
7. Use according to claim 6, wherein the plastic comprises polybutylene adipate/terephthalate, polylactic acid, polyvinyl alcohol.
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|---|---|---|---|---|
| CN115180627A (en) * | 2022-07-11 | 2022-10-14 | 吉林大学 | Preparation method of silicon dioxide particles with branch structures on surfaces |
| CN115180627B (en) * | 2022-07-11 | 2023-09-15 | 吉林大学 | Preparation method of silica particles with branch structure on surface |
| CN117402421A (en) * | 2023-10-23 | 2024-01-16 | 链行走新材料科技(广州)有限公司 | Temperature-resistant polyolefin material and application thereof |
| CN117402421B (en) * | 2023-10-23 | 2024-05-31 | 链行走新材料科技(广州)有限公司 | Temperature-resistant polyolefin material and application thereof |
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