CN113659092B - Display substrate and display device - Google Patents

Display substrate and display device Download PDF

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Publication number
CN113659092B
CN113659092B CN202110951872.6A CN202110951872A CN113659092B CN 113659092 B CN113659092 B CN 113659092B CN 202110951872 A CN202110951872 A CN 202110951872A CN 113659092 B CN113659092 B CN 113659092B
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layer
light
light emitting
emitting
emitting functional
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CN113659092A (en
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徐瑞乾
向杰
张灿
袁德
郭继成
杨剑
曹良
商菲
张胜德
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BOE Technology Group Co Ltd
Chengdu BOE Optoelectronics Technology Co Ltd
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BOE Technology Group Co Ltd
Chengdu BOE Optoelectronics Technology Co Ltd
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/86—Arrangements for improving contrast, e.g. preventing reflection of ambient light
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/122—Pixel-defining structures or layers, e.g. banks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/60—OLEDs integrated with inorganic light-sensitive elements, e.g. with inorganic solar cells or inorganic photodiodes

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Sustainable Development (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Electroluminescent Light Sources (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

The present disclosure provides a display substrate and a display device. The display substrate comprises a substrate, a first electrode layer, a pixel defining layer, a first light-emitting functional layer, a first light-emitting layer, a second light-emitting functional layer and a second electrode layer, wherein the first electrode layer, the pixel defining layer, the first light-emitting functional layer, the first light-emitting layer, the second light-emitting functional layer and the second electrode layer are sequentially stacked on the substrate; the pixel defining layer comprises a first opening area and a pixel defining unit; the display substrate further includes: the first barrier layer is arranged between the first light-emitting functional layer and the second electrode layer, and the orthographic projection of the first barrier layer on the substrate and the orthographic projection of the pixel defining unit on the substrate are at least partially overlapped and used for isolating the first light-emitting functional layer and the second electrode layer so as to block the combination of electrons and holes in the first light-emitting layer. The display substrate and the display device can effectively reduce the transient photoelectric response time of the display screen under the low gray-scale picture, and improve the compensation precision of the photoelectric sensing device on the display substrate.

Description

Display substrate and display device
Technical Field
The disclosure relates to the technical field of display, in particular to a display substrate and a display device.
Background
At present, along with the increasingly strong competition of the mobile phone industry, various mobile phone brands continuously pursue OLED display screens with high luminous efficiency, low power consumption, long service life and high resolution to meet the market competitiveness of high-end flagship machines, and simultaneously meet shooting performance and consumer use experience under different environments, and more severe specifications are inevitably added to the display screens. Such as: the transient photoelectric response of the mobile phone display screen is too slow in a low gray-scale picture, so that the signal precision of a product photoelectric sensor is affected, and the product photoelectric sensor cannot be compensated and adjusted according to the ambient brightness.
Disclosure of Invention
In view of the foregoing, an object of the present disclosure is to provide a display substrate and a display device.
In view of the above-mentioned objects, the present disclosure provides a display substrate including a substrate and a first electrode layer, a pixel defining layer, a first light emitting function layer, a first light emitting layer, a second light emitting function layer, and a second electrode layer sequentially stacked on the substrate; the pixel defining layer comprises a first opening area and a pixel defining unit for forming the first opening area, the first light emitting layer is at least positioned in the first opening area, and the first light emitting functional layer and the second light emitting functional layer cover the pixel defining layer and the first opening area; the display substrate further includes:
The first barrier layer is arranged between the first light-emitting functional layer and the second electrode layer, and orthographic projection of the first barrier layer on the substrate and orthographic projection of the pixel defining unit on the substrate are at least partially overlapped and used for isolating the first light-emitting functional layer and the second electrode layer so as to separate electrons and holes from being combined on the first light-emitting layer.
Optionally, the edge of the first light emitting layer is disposed on the pixel defining unit, one end of the first barrier layer away from the first opening area is disposed on the first light emitting functional layer, and one end of the first barrier layer close to the first opening area is disposed between the first light emitting layer and the second light emitting functional layer.
Optionally, the edge of the first light emitting layer is disposed on the pixel defining unit, one end of the first barrier layer away from the first opening area is disposed on the first light emitting functional layer, and one end of the first barrier layer close to the first opening area is disposed between the first light emitting layer and the first light emitting functional layer.
Optionally, the method further comprises:
The third light-emitting functional layer is arranged between the first light-emitting functional layer and the first light-emitting layer and is positioned in the first opening area, and the edge of the third light-emitting functional layer is arranged on the pixel defining unit;
One end of the first barrier layer, which is close to the first opening area, is arranged between the first light-emitting functional layer and the third light-emitting functional layer; or one end of the first barrier layer, which is close to the first opening area, is arranged between the third light-emitting functional layer and the first light-emitting layer.
Optionally, the method further comprises:
a second opening region disposed on the pixel defining layer and adjacent to the first opening region, sharing the first light emitting function layer and the second light emitting function layer with the first opening region, and the pixel defining unit being disposed between the second opening region and the first opening region;
A fourth light emitting function layer disposed between the first light emitting function layer and the second light emitting function layer and located in the second opening region, an edge of the fourth light emitting function layer being disposed on the pixel defining unit;
the second light-emitting layer is arranged between the fourth light-emitting functional layer and the second light-emitting functional layer and is positioned in the second opening area, and the edge of the second light-emitting layer is arranged on the pixel defining unit;
One end of the first barrier layer, which is far away from the first opening area, is arranged between the first light-emitting functional layer and the fourth light-emitting functional layer.
Optionally, a second barrier layer is also included, wherein,
The second barrier layer is arranged between the fourth light-emitting functional layer and the second light-emitting layer, and the orthographic projection of the second barrier layer on the substrate is at least partially overlapped with the orthographic projection of the pixel defining unit on the substrate;
Or alternatively
The second barrier layer is arranged between the second light-emitting layer and the second light-emitting functional layer, and the orthographic projection of the second barrier layer on the substrate is overlapped with the orthographic projection of the pixel defining unit on the substrate at least partially.
Optionally, the second barrier layer is disposed between the first barrier layer and the second light-emitting functional layer, and an orthographic projection of the second barrier layer on the substrate overlaps at least partially with an orthographic projection of the first barrier layer on the substrate.
Optionally, the first light-emitting functional layer includes a hole transport layer and/or a hole injection layer, the second light-emitting functional layer includes an electron transport layer and/or an electron injection layer, the second barrier layer is disposed between the fourth light-emitting functional layer and the second light-emitting layer, and the material of the second barrier layer includes a material for blocking holes or an inorganic nonmetallic material;
Or alternatively
The first light-emitting functional layer comprises a hole transport layer and/or a hole injection layer, the second light-emitting functional layer comprises an electron transport layer and/or an electron injection layer, the second barrier layer is arranged between the second light-emitting layer and the second light-emitting functional layer, and the material of the second barrier layer comprises a material or an inorganic nonmetallic material for blocking electrons.
Optionally, the first barrier layer is disposed between the second light-emitting functional layer and the second electrode layer.
Optionally, the first light emitting functional layer includes a hole transport layer and/or a hole injection layer, the second light emitting functional layer includes an electron transport layer and/or an electron injection layer, and the material of the first barrier layer includes a material for blocking electrons or an inorganic nonmetallic material.
Optionally, the first light emitting functional layer includes a hole transport layer and/or a hole injection layer, the second light emitting functional layer includes an electron transport layer and/or an electron injection layer, and the material of the first barrier layer includes a material for blocking holes or an inorganic nonmetallic material.
Optionally, the first barrier layer comprises an annular structure surrounding the first opening area.
Optionally, the annular structure is provided with a plurality of notches to divide the first barrier layer into a plurality of independent barrier units.
Optionally, the material of the first light emitting layer includes a green organic light emitting material.
The present disclosure also provides a display device comprising a display substrate as claimed in any one of the above.
As can be seen from the above, the display substrate and the display device provided by the present disclosure reduce the light emission intensity on the pixel defining layer by disposing the first barrier layer between the first light emitting functional layer and the second electrode layer and disposing the first barrier layer on the pixel defining unit, and blocking the combination of electrons and holes on the first light emitting layer by the first barrier layer; when the driving voltage on the anode layer is removed, the transient photoelectric response time can be reduced to be very small, so that the compensation precision of the photoelectric sensing device on the display substrate is improved under the conditions of high luminous efficiency and low power consumption of the display substrate in a normal working state.
Drawings
In order to more clearly illustrate the technical solutions of the present disclosure or related art, the drawings required for the embodiments or related art description will be briefly described below, and it is apparent that the drawings in the following description are only embodiments of the present disclosure, and other drawings may be obtained according to these drawings without inventive effort to those of ordinary skill in the art.
FIG. 1 is a schematic diagram of a related art display substrate;
FIG. 2 is a microscopic view showing luminescence on a pixel defining layer of a substrate in the related art;
FIG. 3 is a top view of a pixel defining layer and a pixel region according to the related art;
Fig. 4 is a schematic structural view of a first embodiment of a display substrate according to an embodiment of the disclosure;
FIG. 5 is a microscopic view showing luminescence on a pixel defining layer of a substrate according to an embodiment of the present disclosure;
FIG. 6 is a schematic diagram of light emission versus transient response time on a pixel defining layer according to an embodiment of the present disclosure;
Fig. 7 is a schematic structural diagram of a second embodiment of a display substrate according to an embodiment of the disclosure;
Fig. 8 is a schematic structural view of a third embodiment of a display substrate according to an embodiment of the disclosure;
Fig. 9 is a schematic structural view of a fourth embodiment of a display substrate according to an embodiment of the disclosure;
Fig. 10 is a schematic structural view of a fifth embodiment of a display substrate according to an embodiment of the disclosure;
FIG. 11 is a schematic structural view of a sixth embodiment of a display substrate according to an embodiment of the disclosure;
fig. 12 is a schematic structural view of a seventh embodiment of a display substrate according to an embodiment of the disclosure;
fig. 13 is a schematic structural view of an eighth embodiment of a display substrate according to an embodiment of the disclosure;
Fig. 14 is a schematic structural view of a ninth embodiment of a display substrate according to an embodiment of the disclosure;
Fig. 15 is a top view of a pixel defining layer and a pixel region according to an embodiment of the disclosure.
Detailed Description
For the purposes of promoting an understanding of the principles and advantages of the disclosure, reference will now be made to the embodiments illustrated in the drawings and specific language will be used to describe the same.
It should be noted that unless otherwise defined, technical or scientific terms used in the embodiments of the present disclosure should be given the ordinary meaning as understood by one of ordinary skill in the art to which the present disclosure pertains. The terms "first," "second," and the like, as used in embodiments of the present disclosure, do not denote any order, quantity, or importance, but rather are used to distinguish one element from another. The word "comprising" or "comprises", and the like, means that elements or items preceding the word are included in the element or item listed after the word and equivalents thereof, but does not exclude other elements or items. The terms "connected" or "connected," and the like, are not limited to physical or mechanical connections, but may include electrical connections, whether direct or indirect. "upper", "lower", "left", "right", etc. are used merely to indicate relative positional relationships, which may also be changed when the absolute position of the object to be described is changed.
As shown in fig. 1, the OLED display substrate includes a substrate 100 and an Anode layer (Anode) 1', a Pixel Defining Layer (PDL) 2, a Hole Transporting Layer (HTL) 3, an organic light emitting layer (EML) 51', an Electron Transporting Layer (ETL) 6, and a cathode layer (CTD) 7 'sequentially stacked on the substrate 100, wherein the Anode layer 1' includes a plurality of Anode units, and a plurality of opening regions are disposed on the pixel defining layer 2.
For reasons such as process fabrication, when the organic light emitting layer 51' is formed by vapor deposition, the organic light emitting layer 51' is not completely formed in the opening region, and the edge of the organic light emitting layer 51' is formed on the pixel defining layer 2, as shown in fig. 1.
Taking a sub-pixel unit as an example, when the display substrate is lighted, a certain voltage is applied to the anode layer 1 'corresponding to the sub-pixel unit, and the holes on the anode layer 1' and the electrons on the cathode layer 7 'move to the organic light emitting layer 51' under the action of an electric field, and are combined with each other to generate excitons to emit light. In this process, part of the holes migrate to the top of the pixel defining layer 2 along the interface between the organic layers, and combine with the electrons migrating from the cathode layer 7', thereby emitting light on the pixel defining layer 2.
When the voltage on the anode layer 1 'is removed, the voltage on the anode layer 1' is the same as the voltage on the cathode layer 7', and at this time holes and electrons above the anode layer 1' are rapidly consumed and no more light is emitted. However, the charges above the pixel defining layer 2 are not controlled, so that the holes and electrons above the pixel defining layer 2 are not rapidly consumed, but only slowly continue to combine and are released by the light-emitting and heat-generating modes, so that the light continues to be emitted above the pixel defining layer 2, as shown in fig. 2, which results in a transient photoelectric response being too slow. Fig. 3 shows a top view of the pixel defining layer 2 and the pixel area, and the light emitting position and shape in fig. 2 correspond to the position and shape of the pixel defining layer 2 in fig. 3.
In order to realize external compensation of current and brightness of the OLED display substrate, a photoelectric sensing device is generally arranged on a backlight surface of the display substrate, and external natural light is sensed by the photoelectric sensing device so as to calculate external compensation information, so that the brightness, the color and the like of the display device can be adjusted according to different environmental brightness. Since the photo-sensing device is usually attached to the backlight surface of the display substrate, and the area where the anode layer 1' is located reflects the external ambient light, the external ambient light is mainly absorbed by the photo-sensing device after passing through the pixel defining layer 2 between the two anode units. The light above the pixel defining layer 2 can still emit light after the voltage on the anode layer 1' is removed, at this time, the photo-sensing device can sense not only the external environment light, but also the light above the pixel defining layer 2, and the light on the pixel defining layer 2 can affect the signal precision of the photo-sensing device, so that the photo-sensing device can not accurately sense the external environment light, and the IC compensation can not be realized according to the environment brightness.
This process can greatly restrict the external compensation of the display device for current and brightness, and reduce the compensation accuracy of the display device, thereby causing the inability of compensating and adjusting the screen colors under different ambient brightness.
For the above reasons, the embodiments of the present disclosure provide a display substrate, which can reduce the transient photoelectric response time of the display substrate in a low gray-scale screen, thereby improving the compensation accuracy of the display device. As shown in fig. 4, the display substrate includes a substrate 100, and a first electrode layer 1, a pixel defining layer 2, a first light emitting function layer 3, a first light emitting layer 51, a second light emitting function layer 6, and a second electrode layer 7 sequentially stacked on the substrate 100.
The first electrode layer 1 is an anode layer, which may include a plurality of anode units; the second electrode layer 7 is a cathode layer, which is a complete membrane layer structure covering the whole display substrate. The anode layer may be made of metal oxide such as Indium Tin Oxide (ITO), indium zinc oxide (Indium zinc oxide, IZO) or aluminum-doped zinc oxide (ZnO: al). The material of the cathode layer may be metallic molybdenum (Mo), metallic copper (Cu), metallic aluminum (Al), metallic titanium (Ti), and alloy materials thereof.
The pixel defining layer 2 is provided with a plurality of open areas, each for forming one sub-pixel element. As shown in fig. 4, the pixel defining layer 2 includes a first opening region 101 and a pixel defining unit 201 for forming the first opening region 101, and the first light emitting layer 51 is located at least in the first opening region 101. The material of the pixel defining layer 2 may be a transparent organic material such as an organic resin, or the material of the pixel defining layer 2 may be a transparent inorganic material such as SiO x、SiNx、Al2O3 or SiO xNx.
The first light emitting layer (EML) 51 is at least located in the first opening area 101, and a material of the first light emitting layer 51 may be an electroluminescent material, for example, an organic electroluminescent material.
The first light emitting functional layer 3 may include a hole transport layer (hole injection layer, HIL) and/or a hole injection layer (hole transportlayer, HTL). That is, the first light emitting functional layer 3 may include only a hole transporting layer, or the first light emitting functional layer 3 includes only a hole injecting layer, or the first light emitting functional layer 3 includes both a hole transporting layer and a hole injecting layer. The hole transport layer may be made of, for example, PEDOT/PSS (poly 3, 4-ethylenedioxythiophene/polystyrene sulfonate), and the hole injection layer may be made of, for example, tetrafluorotetracyanoquinodimethane.
The second light emitting functional layer 6 may include an electron transport layer (electron transport layer, ETL) and/or an electron injection layer (electron injection layer, EIL). That is, the second light emitting functional layer 6 may include only an electron transporting layer, or the second light emitting functional layer 6 may include only an electron injecting layer, or the second light emitting functional layer 6 may include both an electron transporting layer and an electron injecting layer. The material of the electron transport layer may be, for example, 8-hydroxyquinoline-lithium, and the material of the electron injection layer may be, for example, coumarin 545T.
In this embodiment, the first light emitting functional layer 3 and the second light emitting functional layer 6 are used as a common film layer of a display substrate, and cover the pixel defining 2 layers and the first opening area 101.
As shown in fig. 4, in this embodiment, the display substrate further includes a first barrier layer 9. Wherein a first barrier layer 9 is disposed between the first light emitting functional layer 3 and the second electrode layer 7 and is located on the pixel defining unit 201, and at the same time, the orthographic projection of the first barrier layer 9 on the substrate 100 and the orthographic projection of the pixel defining unit 201 on the substrate 100 at least partially overlap, so that the first light emitting functional layer 3 and the second electrode layer 7 can be partially or completely isolated above the pixel defining unit 201 by the first barrier layer 9. The first blocking layer 9 is used to isolate the first light emitting functional layer 3 and the second electrode layer 7 so as to block the combination of electrons and holes in the first light emitting layer 51. The first barrier layer 9 is formed of a material capable of blocking electrons or holes, and the first barrier layer 9 is disposed between the first light emitting functional layer 3 and the second electrode layer 7, so that transmission of electrons or holes can be blocked, and transmission of electrons or holes to the first light emitting layer 51 is prevented, and the light emitting intensity on the pixel defining unit 201 can be greatly reduced, as shown in fig. 5. Thus the transient photoelectric response of the entire display substrate is determined only by the light emitting device above the anode layer, and the transient photoelectric response time can be reduced to a small value when the driving voltage on the anode layer is removed, as shown in fig. 6. Therefore, the compensation precision of the photoelectric sensing device on the display substrate is improved under the condition of ensuring the high luminous efficiency and low power consumption of the display substrate in a normal working state.
According to the display substrate disclosed by the embodiment of the disclosure, the first barrier layer is arranged between the first light-emitting functional layer and the second electrode layer, and is arranged on the pixel defining unit, and electrons and holes are blocked by the first barrier layer to be combined on the first light-emitting layer, so that the light-emitting intensity on the pixel defining layer is reduced; when the driving voltage on the anode layer is removed, the transient photoelectric response time can be reduced to be very small, so that the compensation precision of the photoelectric sensing device on the display substrate is improved under the conditions of high luminous efficiency and low power consumption of the display substrate in a normal working state.
Alternatively, in the above embodiment, the first electrode layer 1 may be a cathode layer, and the second electrode layer 7 may be an anode layer; accordingly, the first light emitting functional layer 3 may include an electron transport layer and/or an electron injection layer, and the second light emitting functional layer 6 may include a hole transport layer and/or a hole injection layer, which is not limited by the embodiments of the present disclosure.
In some embodiments, as shown in fig. 4, an edge of the first light emitting layer 51 is disposed on the pixel defining unit 201. That is, when the first light emitting layer 51 is deposited by an evaporation process, the edge of the first light emitting layer 51 may extend onto the pixel defining unit 201 due to process manufacturing. One end of the first barrier layer 9 away from the first opening area 101 is disposed on the first light-emitting functional layer 3, and one end of the first barrier layer 9 close to the first opening area 101 is disposed between the first light-emitting layer 51 and the second light-emitting functional layer 6.
As shown in fig. 4, the first barrier layer 9 is connected to the pixel defining unit 201 on the side of the first light emitting functional layer 3 away from the substrate 100, at the side of the first opening region 101 away from the substrate 100 and near the substrate 100. That is, when the display substrate further includes the second opening region 102 adjacent to the first opening region 101, an end of the first barrier layer 9 away from the first opening region 101 is disposed between the first light emitting functional layer 3 and the second light emitting layer 52, wherein the second light emitting layer 52 is formed in the second opening region 102, and an edge of the second light emitting layer 52 is disposed on the pixel defining unit 201, and the pixel defining unit 201 is disposed between the first opening region 101 and the second opening region 102.
In this embodiment, after the evaporation of the first light emitting layer 51 in the first opening region 101 is completed, a high-precision metal mask (FINE METAL MASK, FMM) is used to evaporate a barrier material above the pixel defining unit 201, so as to form a film structure of the first barrier layer 9. In this way, the first light emitting layer 51 above the pixel defining unit 201 is blocked from the second light emitting functional layer 6. Taking the first light-emitting functional layer 3 as a hole transport layer and the second light-emitting functional layer 6 as an electron transport layer as an example, when the sub-pixel unit corresponding to the first opening area 101 is turned on, part of holes still migrate to the upper side of the pixel defining unit 201 along the interface between the organic layers, but due to the arrangement of the first barrier layer 9, electrons cannot pass through the first barrier layer 9, so that the electrons and the holes cannot be combined on the first light-emitting layer 51, and the light-emitting intensity above the pixel defining unit 201 can be greatly reduced.
Alternatively, as shown in fig. 7, when the third light emitting functional layer 41 is further disposed in the first opening area 101, the third light emitting functional layer 41 is disposed between the first light emitting functional layer 3 and the first light emitting layer 51. The third light-emitting functional layer 41 functions similarly to the first light-emitting functional layer 3, and is a film layer for realizing the function of a hole transport layer and/or a hole injection layer.
Alternatively, in this embodiment, when the first light emitting functional layer 3 is a hole transporting layer and/or a hole injecting layer, and the second light emitting functional layer 6 is an electron transporting layer and/or an electron injecting layer, and one end of the first barrier layer 9 away from the first opening region 101 is disposed on the first light emitting functional layer 3, and one end of the first barrier layer 9 close to the first opening region 101 is disposed between the first light emitting layer 51 and the second light emitting functional layer 6, the first barrier layer 9 is used to block the passage of electrons, so the material of the first barrier layer 9 may be selected to be a material for blocking electrons, for example, a material similar to an electron barrier layer; or an inorganic non-metallic material having poor or even non-conductive properties may be selected so that electrons may be blocked from combining with holes on the first light emitting layer 51 through the first blocking layer 9.
Optionally, after forming the first barrier layer 9, the light emitting layers of other sub-pixels, such as the second light emitting layer 52 in the second opening region 102, are formed; after the light emitting layers of all the sub-pixel units are formed, the second light emitting functional layer 6, the second electrode layer 7 and the like are formed.
In some embodiments, the edge of the first light emitting layer 51 is disposed on the pixel defining unit 201, and an end of the first barrier layer 9 away from the first opening area 101 is disposed on the first light emitting functional layer 3, that is, a side of the first barrier layer 9 away from the end of the first opening area 101 and close to the substrate 100 is connected to a side of the first light emitting functional layer 3 away from the substrate 100 on the pixel defining unit 201. The first barrier layer 9 is disposed between the first light emitting layer 51 and the first light emitting functional layer 3 near one end of the first opening area 101.
In this embodiment, after the evaporation of the first light emitting functional layer 3 is completed, a high-precision metal mask plate (FINE METAL MASK, FMM) is used to evaporate a barrier material above the pixel defining unit 201, so as to form a film structure of the first barrier layer 9, and then the first light emitting layer 51 is formed. In this way, the first light emitting functional layer 3 above the pixel defining unit 201 is blocked from the first light emitting layer 51. Taking the first light-emitting functional layer 3 as a hole transport layer and the second light-emitting functional layer 6 as an electron transport layer as an example, when the sub-pixel unit corresponding to the first opening area 101 is turned on, holes are blocked by the first blocking layer 9, so that the concentration of the holes above the pixel defining unit 201 can be reduced, and further, the electron holes cannot be combined on the first light-emitting layer 51, so that the light-emitting intensity above the pixel defining unit 201 can be greatly reduced.
In some alternative embodiments, as shown in fig. 8, the display substrate further comprises a third light emitting functional layer 41. The third light emitting layer 41 is disposed between the first light emitting layer 3 and the first light emitting layer 51 and within the first opening region 101, and an edge of the third light emitting layer 41 is disposed on the pixel defining unit 201. Among them, the third light emitting functional layer 41 functions similarly to the first light emitting functional layer 3, and functions as a hole transporting layer and/or a hole injecting layer. The third light emitting functional layer 41 differs from the first light emitting functional layer 3 in that: the third light-emitting functional layer 41 has a film layer structure for realizing the function of the hole transport layer and/or the hole injection layer provided for the sub-pixel unit, and for example, when the first light-emitting layer 51, which is a green sub-pixel formed in the first opening region 101, is a green light-emitting layer (GMEL), the third light-emitting functional layer 41 is also a functional film layer G' for realizing the hole transport layer and/or the hole injection layer of the green pixel.
Optionally, when the display substrate includes the third light-emitting functional layer 41, an end of the first barrier layer 9 away from the first opening area 101 is still disposed on the first light-emitting functional layer 3, and an end of the first barrier layer 9 close to the first opening area 101 is disposed between the first light-emitting functional layer 3 and the third light-emitting functional layer 41; or the first barrier layer 9 is disposed between the third light-emitting functional layer 41 and the first light-emitting layer 51 near one end of the first opening area 101.
As shown in fig. 8, when the third light emitting function layer 41 is further disposed in the first opening area 101, an end of the first barrier layer 9 away from the first opening area 101 is still disposed on the first light emitting function layer 3, and an end of the first barrier layer 9 close to the first opening area 101 is disposed between the first light emitting function layer 3 and the third light emitting function layer 41. In this way, after the evaporation of the first light emitting functional layer 3 is completed, a high precision metal mask plate (FINE METAL MASK, FMM) is used to evaporate a barrier material above the pixel defining unit 201, so as to form a film layer structure of the first barrier layer 9, and then the third light emitting functional layer 41 and the first light emitting layer 51 are sequentially formed, so that the first light emitting functional layer 3 above the pixel defining unit 201 is separated from the first light emitting layer 51 by the first barrier layer 9. Taking the first light-emitting functional layer 3 as a hole transport layer and the second light-emitting functional layer 6 as an electron transport layer as an example, when the sub-pixel unit corresponding to the first opening area 101 is turned on, holes are blocked by the first blocking layer 9, so that the concentration of the holes above the pixel defining unit 201 can be reduced, and then the combination of electron holes on the first light-emitting layer 51 is reduced, so that the light-emitting intensity above the pixel defining unit 201 can be greatly reduced.
Alternatively, in this embodiment, the first blocking layer 9 may block not only the holes from the first opening region 101 but also the holes from the second opening region 102, so that not only the light emission intensity of the edge of the first light emitting layer 51 on the pixel defining unit 201 but also the light emission intensity of the edge of the second light emitting layer 52 on the pixel defining unit 201 may be reduced.
As shown in fig. 9, when the third light emitting function layer 41 is further disposed in the first opening area 101, an end of the first barrier layer 9 away from the first opening area 101 is still disposed on the first light emitting function layer 3, and an end of the first barrier layer 9 close to the first opening area 101 is disposed between the third light emitting function layer 41 and the first light emitting layer 51. Thus, after the evaporation of the first light emitting functional layer 3 and the third light emitting functional layer 41 is completed, a high precision metal mask plate (FINE METAL MASK, FMM) is used to evaporate a barrier material above the pixel defining unit 201, thereby forming a film layer structure of the first barrier layer 9, and then the first light emitting layer 51 is formed, so that the first light emitting functional layer 3 above the pixel defining unit 201 is separated from the first light emitting layer 51 by the first barrier layer 9. Taking the first light-emitting functional layer 3 as a hole transport layer and the second light-emitting functional layer 6 as an electron transport layer as an example, when the sub-pixel unit corresponding to the first opening area 101 is turned on, part of holes still migrate to the upper side of the pixel defining unit 201 along the interface between the organic layers, but due to the arrangement of the first blocking layer 9, the holes cannot pass through the first blocking layer 9 and then combine with electrons on the first light-emitting layer 51, so that the light-emitting intensity above the pixel defining unit 201 can be greatly reduced.
Alternatively, in the above embodiment, when the first light emitting functional layer 3 is a hole transporting layer and/or a hole injecting layer, and the second light emitting functional layer 6 is an electron transporting layer and/or an electron injecting layer, and one end of the first barrier layer 9 away from the first opening region 101 is disposed on the first light emitting functional layer 3, one end of the first barrier layer 9 close to the first opening region 101 is disposed between the first light emitting functional layer 3 and the third light emitting functional layer 41, or between the third light emitting functional layer 41 and the first light emitting layer 51, the first barrier layer 9 is used to block the passage of holes, and thus the material of the first barrier layer 9 may be selected to be a material for blocking holes, for example, a material similar to a hole barrier layer; or an inorganic non-metallic material with poor or even non-conductive properties may be selected so that holes may be blocked from being bound to electrons on the first light emitting layer 51 through the first blocking layer 9.
In other embodiments, as shown in fig. 10, the first barrier layer 9 is disposed between the second light-emitting functional layer 6 and the second electrode layer 7. In this embodiment, after the evaporation of the film layers such as the second light emitting function layer 6 is completed, a high precision metal mask plate (FINE METAL MASK, FMM) is used to evaporate a barrier material above the pixel defining unit 201, so as to form a film layer structure of the first barrier layer 9, and then the second electrode layer 7, i.e., the cathode layer is formed, so that the second light emitting function layer 6 above the pixel defining unit 201 is separated from the cathode layer by the first barrier layer 9. Taking the first light-emitting functional layer 3 as a hole transport layer and the second light-emitting functional layer 6 as an electron transport layer as an example, when the sub-pixel unit corresponding to the first opening area 101 is turned on, electrons in the cathode layer are blocked from being transported to the direction of the first light-emitting layer 51 by the first blocking layer 9, so that the concentration of electrons above the pixel defining unit 201 is reduced, and then the combination of electron holes on the first light-emitting layer 51 is reduced, so that the light-emitting intensity above the pixel defining unit 201 can be greatly reduced. Alternatively, in the present embodiment, the first barrier layer 9 is used to block the passage of electrons, and thus the material of the first barrier layer 9 may be selected to block electrons, for example, a material similar to an electron blocking layer; or an inorganic non-metallic material having poor or even non-conductive properties may be selected so that electrons may be blocked from combining with holes on the first light emitting layer 51 through the first blocking layer 9.
Alternatively, in this embodiment, the first blocking layer 9 may not only block the electrons from being combined with the holes from the first opening region 101 on the first light emitting layer 51, but also block the electrons from being combined with the holes from the second opening region 102 on the second light emitting layer 52, so that not only the light emitting intensity of the edge of the first light emitting layer 51 on the pixel defining unit 201 but also the light emitting intensity of the edge of the second light emitting layer 52 on the pixel defining unit 201 may be reduced.
In some embodiments of the present disclosure, the display substrate further includes a second opening region 102, a fourth light emitting functional layer 42, and a second light emitting layer 52. As shown in fig. 4, 7, 8, 9, and 10, a second opening region 102 is disposed on the pixel defining layer 2 and adjacent to the first opening region 101, the second opening region 102 shares the first light emitting function layer 3, the second light emitting function layer 6, and a second electrode layer with the first opening region 101, and the pixel defining unit 201 is disposed between the second opening region 102 and the first opening region 101.
The fourth light emitting layer 42 is disposed between the first light emitting layer 3 and the second light emitting layer 6 and in the second opening region 102, and an edge of the fourth light emitting layer 6 is disposed on the pixel defining unit 201. The second light emitting layer 52 is disposed between the fourth light emitting functional layer 42 and the second light emitting functional layer 6 and within the second opening region 102, and an edge of the second light emitting layer 52 is disposed on the pixel defining unit 201. Wherein, the end of the first barrier layer 9 away from the first opening area 101 is disposed between the first light emitting functional layer 3 and the fourth light emitting functional layer 42.
Alternatively, in this embodiment, the second light-emitting layer 52 may be the same as the first light-emitting layer 51, that is, both may be made of the same color organic light-emitting material; the second light emitting layer 52 may be different from the first light emitting layer 51, that is, both may be made of organic light emitting materials of different colors.
In this embodiment, when forming different sub-pixel units on the display substrate, one sub-pixel unit is generally manufactured first, and then another sub-pixel unit is manufactured. For example, when the first opening area 101 is used to form a first sub-pixel unit, the second opening area 102 is used to form a second sub-pixel unit, and the first sub-pixel unit and the second sub-pixel unit are different sub-pixel units: assuming that the first sub-pixel unit is fabricated, after the common first light emitting functional layer 3 is formed on the pixel defining layer 2, the third light emitting functional layer 41 and the first light emitting layer 51 in the first opening region 101 are sequentially formed, and then the fourth light emitting functional layer 42 and the second light emitting layer 52 in the second opening region 102 are sequentially formed, and then the common second light emitting functional layer 6 and the second electrode layer 7 are sequentially formed. Thus, when the first barrier layer 9 is formed, since neither the fourth light emitting function layer 42 nor the second light emitting layer 52 is formed, the formed first barrier layer 9 is close to the end of the second opening region 102, that is, the end of the first barrier layer 9 away from the first opening region 101 is directly formed on the first light emitting function layer 3, and after the fourth light emitting function layer 42 is formed in the second opening region 102, the end of the first barrier layer 9 away from the first opening region 101 is located between the first light emitting function layer 3 and the fourth light emitting function layer 42.
Alternatively, if the manufacturing process steps of the sub-pixel unit are changed, for example, if the fourth light emitting function layer 42 is formed after the third light emitting function layer 41 is formed, the end of the first barrier layer 9 away from the first opening region 101 may also be located between the fourth light emitting function layer 42 and the second light emitting layer 52, which is not limited in the embodiment of the disclosure.
In some embodiments, the display substrate further comprises a second barrier layer. As shown in fig. 11 and 12, the second barrier layer 10 is disposed between the fourth light emitting functional layer 42 and the second light emitting layer 52 and on the pixel defining unit 201, and at the same time, the orthographic projection of the second barrier layer 10 on the substrate 100 and the orthographic projection of the pixel defining unit 201 on the substrate 100 at least partially overlap, so that the fourth light emitting functional layer 42 and the second light emitting layer 52 may be partially or completely isolated above the pixel defining unit 201 by the second barrier layer 10.
Or as shown in fig. 13 and 14, the second barrier layer 10 is disposed between the second light emitting layer 52 and the second light emitting functional layer 6 and is located on the pixel defining unit 201, and at the same time, the orthographic projection of the second barrier layer 10 on the substrate 100 and the orthographic projection of the pixel defining unit 201 on the substrate 100 at least partially overlap, so that the second light emitting layer 52 and the second light emitting functional layer 6 may be partially or completely isolated above the pixel defining unit 201 by the second barrier layer 10.
In this embodiment, by the arrangement of the second barrier layer 10, the combination of electrons and holes from the second opening region 102 on the pixel defining unit 201 can be blocked in the second light emitting layer 52, so that the light emitting intensity above the pixel defining unit 201 can be further reduced. Meanwhile, when the pixel defining units 201 between the sub-pixel units on the display substrate are all required to be provided with the barrier layers, the barrier layers can be arranged through the matching arrangement of the first barrier layer 9 and the second barrier layer 10.
Optionally, the second barrier layer 10 is disposed between the first barrier layer 9 and the second light-emitting functional layer 6, and the orthographic projection of the second barrier layer 10 on the substrate 100 at least partially overlaps the orthographic projection of the first barrier layer 9 on the substrate 100, so that the combination of the electrons and the holes on the pixel defining unit 201 can be better blocked by the cooperation of the first barrier layer 9 and the second barrier layer 10.
Wherein when the first light emitting functional layer 3 includes a hole transporting layer and/or a hole injecting layer, the second light emitting functional layer 6 includes an electron transporting layer and/or an electron injecting layer: if the second barrier layer 10 is disposed between the fourth light emitting functional layer 52 and the second light emitting layer 52, the second barrier layer 10 is used to block holes, and thus the material of the second barrier layer 10 includes a material for blocking holes or an inorganic nonmetallic material; or if the second barrier layer 10 is disposed between the second light emitting layer 52 and the second light emitting functional layer 6, the second barrier layer 10 is used to block electrons, and thus the material of the second barrier layer 10 includes a material for blocking electrons or an inorganic nonmetallic material.
As shown in fig. 11, an end of the first barrier layer 9 away from the first opening region 101 is disposed between the first light emitting function layer 3 and the fourth light emitting function layer 42, an end of the first barrier layer 9 close to the first opening region 101 is disposed between the third light emitting function layer 41 and the first light emitting layer 51, and the second barrier layer 10 is disposed between the fourth light emitting function layer 42 and the second light emitting layer 52. In this embodiment, after forming the first light emitting functional layer 3 and the third light emitting functional layer 41 in the first opening region 101, a high precision metal mask (FINE METAL MASK, FMM) is used to vapor deposit a barrier material over the pixel defining unit 201 to form the first barrier layer 9, and then the first light emitting layer 51 is formed in the first opening region 101; then, a fourth light-emitting functional layer 42 is formed in the second opening region 102, at this time, the edge of the fourth light-emitting functional layer 42 covers part of the first barrier layer 9, then a high-precision metal mask (FINE METAL MASK, FMM) is used to vapor-deposit a barrier material above the pixel defining unit 201 to form a second barrier layer 10, and then a second light-emitting layer 52 is formed. In this embodiment, when the first light-emitting functional layer 3 includes a hole transport layer and/or a hole injection layer, and the second light-emitting functional layer 6 includes an electron transport layer and/or an electron injection layer, since the first barrier layer 9 and the second barrier layer 10 are both used to block the passage of holes, the materials of the first barrier layer 9 and the second barrier layer 10 may be selected to block the holes, for example, a material similar to the hole barrier layer; or an inorganic nonmetallic material with poor conductive performance or even non-conductive performance can be selected, so that holes can be blocked from passing through the first barrier layer 9 and the second barrier layer 10 to be combined with electrons on the first light-emitting layer 51 and the second light-emitting layer 52, and the light-emitting intensity above the pixel defining unit 201 can be greatly reduced.
Alternatively, in the present embodiment, the holes from the first opening region 101 are blocked by the first blocking layer 9, and the holes from the second opening region 102 are blocked by the second blocking layer 10, so that not only the light emission intensity of the edge of the first light emitting layer 51 on the pixel defining unit 201 but also the light emission intensity of the edge of the second light emitting layer 52 on the pixel defining unit 201 can be reduced.
As shown in fig. 12, an end of the first barrier layer 9 away from the first opening region 101 is disposed between the first light emitting function layer 3 and the fourth light emitting function layer 42, an end of the first barrier layer 9 close to the first opening region 101 is disposed between the first light emitting layer 51 and the second light emitting function layer 6, and the second barrier layer 10 is disposed between the fourth light emitting function layer 42 and the second light emitting layer 52. In this embodiment, after forming the first light emitting functional layer 3, the third light emitting functional layer 41, and the first light emitting layer 51 in the first opening region 101, a high precision metal mask (FINE METAL MASK, FMM) is used to vapor deposit a barrier material over the pixel defining unit 201 to form the first barrier layer 9; then, a fourth light-emitting functional layer 42 is formed in the second opening region 102, and at this time, the fourth light-emitting functional layer 42 covers a portion of the first barrier layer 9, then a high-precision metal mask (FINE METAL MASK, FMM) is used to vapor-deposit a barrier material over the pixel defining unit 201 to form a second barrier layer 10, and then a second light-emitting layer 52 is formed. In this embodiment, when the first light emitting functional layer 3 includes a hole transporting layer and/or a hole injecting layer, and the second light emitting functional layer 6 includes an electron transporting layer and/or an electron injecting layer, since the first barrier layer 9 is used to block the passage of electrons and the second barrier layer 10 is used to block the passage of holes, the first barrier layer 9 may be selected from materials for blocking electrons, such as materials like electron barrier layers; or an inorganic non-metallic material having poor or even non-conductive properties may be selected so that electrons may be blocked from combining with holes on the first light emitting layer 51 through the first blocking layer 9. The second barrier layer 10 material may be selected to block holes, for example a material similar to a hole blocking layer; or an inorganic nonmetallic material with poor conductive performance or even non-conductive performance can be selected, so that holes can be blocked from passing through the second barrier layer 10 to combine with electrons on the second light-emitting layer 52, and the light-emitting intensity above the pixel defining unit 201 can be greatly reduced.
Alternatively, in the present embodiment, electrons are blocked by the first blocking layer 9, thereby preventing the electrons from being combined with holes from the first opening region 101 on the first light emitting layer 51; the holes from the second opening region 102 are blocked by the second blocking layer 10, so that the holes and electrons are prevented from being combined on the second light emitting layer 52, and thus not only the light emitting intensity of the edge of the first light emitting layer 51 on the pixel defining unit 201 but also the light emitting intensity of the edge of the second light emitting layer 52 on the pixel defining unit 201 can be reduced.
As shown in fig. 13, an end of the first barrier layer 9 away from the first opening region 101 is disposed between the first light emitting function layer 3 and the fourth light emitting function layer 42, an end of the first barrier layer 9 close to the first opening region 101 is disposed between the third light emitting function layer 41 and the first light emitting layer 51, and the second barrier layer 10 is disposed between the second light emitting layer 52 and the second light emitting function layer 6. In this embodiment, after forming the third light emitting functional layer 41 in the first opening region 101, a high precision metal mask plate (FINE METAL MASK, FMM) is used to vapor-deposit a barrier material over the pixel defining unit 201 to form the first barrier layer 9, and then the first light emitting layer 51 is formed in the first opening region 101; then, a fourth light-emitting functional layer 42 and a second light-emitting layer 52 are sequentially formed in the second opening region 102, at this time, a part of the first barrier layer 9 is covered by the edge of the fourth light-emitting functional layer 42, and then a high-precision metal mask plate (FINE METAL MASK, FMM) is used to vapor-deposit a barrier material above the pixel defining unit 201 to form the second barrier layer 10. In this embodiment, when the first light emitting functional layer 3 includes a hole transporting layer and/or a hole injecting layer, and the second light emitting functional layer 6 includes an electron transporting layer and/or an electron injecting layer, since the first barrier layer 9 is used to block the passage of holes and the second barrier layer 10 is used to block the passage of electrons, the material of the first barrier layer 9 may be selected to block holes, for example, a material similar to that of the hole blocking layer; or an inorganic non-metallic material with poor or even non-conductive properties may be selected so that holes may be blocked from being bound to electrons on the first light emitting layer 51 through the first blocking layer 9. The second barrier layer 10 may be selected to block electrons, for example, a material similar to an electron blocking layer; or an inorganic nonmetallic material with poor conductive performance or even non-conductive performance can be selected, so that electrons can be blocked from passing through the second barrier layer 10 and combining with holes on the second light-emitting layer 52, and the light-emitting intensity above the pixel defining unit 201 can be greatly reduced.
Alternatively, in the present embodiment, holes from the first opening region 101 are blocked by the first blocking layer 9, thereby preventing holes from being combined with electrons on the first light emitting layer 51; the electrons are blocked by the second blocking layer 10, so that the electrons are prevented from being combined with holes from the second opening region 102 on the second light emitting layer 52, and thus not only the light emitting intensity of the edge of the first light emitting layer 51 on the pixel defining unit 201 but also the light emitting intensity of the edge of the second light emitting layer 52 on the pixel defining unit 201 can be reduced.
As shown in fig. 14, an end of the first barrier layer 9 away from the first opening region 101 is disposed between the first light emitting function layer 3 and the fourth light emitting function layer 42, an end of the first barrier layer 9 close to the first opening region 101 is disposed between the first light emitting layer 51 and the second light emitting function layer 6, and the second barrier layer 10 is disposed between the second light emitting layer 52 and the second light emitting function layer 6. In this embodiment, after forming the first light emitting functional layer 3, the third light emitting functional layer 41, and the first light emitting layer 51 in the first opening region 101, a high precision metal mask (FINE METAL MASK, FMM) is used to vapor deposit a barrier material over the pixel defining unit 201 to form the first barrier layer 9; then, a fourth light-emitting functional layer 42 and a second light-emitting layer 52 are sequentially formed in the second opening region 102, and at this time, the fourth light-emitting functional layer 42 covers a part of the first barrier layer 9, and then a high-precision metal mask plate (FINE METAL MASK, FMM) is used to vapor-deposit a barrier material above the pixel defining unit 201 to form the second barrier layer 10. In this embodiment, when the first light emitting functional layer 3 includes a hole transporting layer and/or a hole injecting layer, and the second light emitting functional layer 6 includes an electron transporting layer and/or an electron injecting layer, since the first barrier layer 9 and the second barrier layer 10 are both used for blocking the electrons from passing through, the first barrier layer 9 and the second barrier layer 10 may be selected from materials for blocking electrons, such as materials similar to the electron barrier layer; or an inorganic nonmetallic material with poor conductive performance or even non-conductive performance can be selected, so that electrons can be blocked from passing through the first barrier layer 9 and the second barrier layer 10 and combining with holes on the first light-emitting layer 51 and the second light-emitting layer 52, and the light-emitting intensity above the pixel defining unit 201 can be greatly reduced.
Alternatively, in this embodiment, the first barrier layer 9 and the second barrier layer 10 block electrons, so as to prevent electrons from being combined with holes from the first opening region 101 and the second opening region 102 on the first light emitting layer 51 and the second light emitting layer 52, so that not only the light emitting intensity of the edge of the first light emitting layer 51 on the pixel defining unit 201 but also the light emitting intensity of the edge of the second light emitting layer 52 on the pixel defining unit 201 can be reduced.
In some embodiments, the first barrier layer 9 comprises a ring-shaped structure surrounding the first opening area 101, so that it may be ensured that the first barrier layer 9 may better block the combination of electrons and holes on the pixel defining layer around the first opening area 101. Optionally, the second barrier layer 10 also comprises a ring-shaped structure surrounding the second opening area 102, so that it is ensured that the second barrier layer 10 can better block the combination of electrons and holes on the pixel defining layer around the second opening area 102.
In some alternative embodiments, the annular structure is provided with a plurality of indentations to divide the first barrier layer 9 into a plurality of individual barrier units. As shown in fig. 15, when the first barrier layer 9 is divided into a plurality of independent barrier units, when the high-precision metal mask (FINE METAL MASK, FMM) is used to vapor-deposit the barrier material, the FMM is of a complete structure, so that vapor deposition of the first barrier layer 9 is easier to achieve by the FMM when the first barrier layer 9 is divided into a plurality of independent barrier units by providing a notch in the first barrier layer 9. Optionally, the second barrier layer 10 also comprises a plurality of indentations to divide said second barrier layer 10 into a plurality of individual barrier units.
Alternatively, as shown in fig. 15, the first barrier layer 9 is divided into four separate barrier units, and each barrier unit is adjacent to the barrier units of the other opening regions. That is, when the first barrier layer 9 is formed, the notch is formed as close as possible to the other opening region, so that the effect of blocking the combination of electrons and holes can be ensured to be better. Alternatively, the second barrier layer 10 may have the same structure.
Alternatively, in the above embodiment, the pixel defining unit 201 has a trapezoid structure, and the longer lower base of the trapezoid structure is disposed near the substrate 100, and the shorter upper base is disposed near the second electrode layer 7.
In some embodiments, the front projection of the first barrier layer 9 on the substrate 100 coincides with the front projection of the upper bottom of the pixel defining unit 201 on the substrate 100, so that the requirements of luminous efficiency, power consumption and the like of the display substrate under normal working brightness can be ensured, and the accuracy of receiving signals by the photoelectric sensing device of the display device can be improved. Alternatively, the front projection of the first barrier layer 9 on the substrate 100 may be slightly larger or smaller than the front projection of the upper bottom of the pixel defining unit 201 on the substrate 100, if desired.
Optionally, when the second barrier layer 10 is further provided, the orthographic projection of the second barrier layer 10 on the substrate 100 after being combined with the first barrier layer 9 coincides with the orthographic projection of the upper bottom of the pixel defining unit 201 on the substrate 100, so that the requirements of the luminous efficiency, the power consumption and the like of the display substrate under the normal working brightness can be ensured, and the accuracy of receiving signals by the photoelectric sensing device of the display device can be improved. Alternatively, the front projection of the first barrier layer 9 on the substrate 100 after bonding with the second barrier layer 10 may be slightly larger or smaller than the front projection of the upper base of the pixel defining unit 201 on the substrate 100, if necessary.
In other alternative embodiments, the material of the first light emitting layer 51 includes a green organic light emitting material, that is, the first opening region 101 is used to form a green sub-pixel unit. Since the green organic material has higher luminous efficiency, the first barrier layer 9 may be disposed only on the pixel defining layer around the green sub-pixel unit in this embodiment.
Alternatively, the material of the first light emitting layer 51 may also include one or more of blue organic light emitting material, red organic light emitting material, or white organic light emitting material. That is, in the embodiment of the present disclosure, the first barrier layer 9 may be provided only for one color sub-pixel unit, the first barrier layer 9 may be provided for a plurality of pixel units, or the first barrier layer 9 may be provided for all sub-pixel units, which is not limited in the embodiment of the present disclosure.
Alternatively, in this embodiment, the second barrier layer 10 may be used in combination with the first barrier layer 9 to implement providing a barrier layer for one or more sub-pixel units, which is not limited in the embodiment of the disclosure.
Based on the same inventive concept, the present disclosure also provides a display device including the display substrate according to any one of the above embodiments, corresponding to the display substrate according to any one of the above embodiments. The display device includes the display substrate according to any one of the embodiments, and has the advantages of the embodiments corresponding to the display substrate, which will not be described herein.
Note that, the display device in this embodiment may be: electronic paper, mobile phone, tablet computer, television, notebook computer, digital photo frame, navigator and any other products or components with display function.
It is noted that in the drawings, the size of layers and regions may be exaggerated for clarity of illustration. Moreover, it will be understood that when an element or layer is referred to as being "on" another element or layer, it can be directly on the other element or intervening layers may be present. In addition, it will be understood that when an element or layer is referred to as being "under" another element or layer, it can be directly under the other element or intervening layers or elements may be present. In addition, it will be understood that when a layer or element is referred to as being "between" two layers or elements, it can be the only layer between the two layers or elements, or more than one intervening layer or element may also be present. Like reference numerals refer to like elements throughout.
Those of ordinary skill in the art will appreciate that: the discussion of any of the embodiments above is merely exemplary and is not intended to suggest that the scope of the disclosure, including the claims, is limited to these examples; the technical features of the above embodiments or in the different embodiments may also be combined under the idea of the present disclosure, the steps may be implemented in any order, and there are many other variations of the different aspects of the embodiments of the present disclosure as described above, which are not provided in details for the sake of brevity.
The disclosed embodiments are intended to embrace all such alternatives, modifications and variances which fall within the broad scope of the appended claims. Accordingly, any omissions, modifications, equivalents, improvements, and the like, which are within the spirit and principles of the embodiments of the disclosure, are intended to be included within the scope of the disclosure.

Claims (14)

1. A display substrate comprises a substrate and a first electrode layer, a pixel defining layer, a first light-emitting function layer, a first light-emitting layer, a second light-emitting function layer and a second electrode layer which are sequentially laminated on the substrate; the pixel defining layer comprises a first opening area and a pixel defining unit for forming the first opening area, the first light emitting layer is at least positioned in the first opening area, and the first light emitting functional layer and the second light emitting functional layer cover the pixel defining layer and the first opening area; the display substrate further includes:
a second opening region disposed on the pixel defining layer and adjacent to the first opening region, sharing the first light emitting function layer and the second light emitting function layer with the first opening region, and the pixel defining unit being disposed between the second opening region and the first opening region;
the second light-emitting layer is arranged between the first light-emitting functional layer and the second light-emitting functional layer and is positioned in the second opening area;
The first barrier layer is arranged between the first light-emitting functional layer and the second electrode layer, and the orthographic projection of the first barrier layer on the substrate and the orthographic projection of the pixel defining unit on the substrate are at least partially overlapped, so as to isolate the first light-emitting functional layer and the second electrode layer corresponding to the same sub-pixel unit to separate electrons and holes belonging to the same sub-pixel unit from being combined at the position where the first light-emitting layer covers the pixel defining layer;
One end of the first barrier layer, which is close to the first opening area, is arranged between the first light-emitting layer and the second light-emitting functional layer; one end of the first barrier layer far away from the first opening area is arranged between the first light-emitting functional layer and the second light-emitting layer.
2. The display substrate of claim 1, wherein an edge of the first light emitting layer is disposed on the pixel defining unit.
3. The display substrate according to claim 1, wherein an edge of the first light emitting layer is disposed on the pixel defining unit, and an end of the first barrier layer away from the first opening region is disposed on the first light emitting functional layer.
4. The display substrate of claim 3, further comprising:
The third light-emitting functional layer is arranged between the first light-emitting functional layer and the first light-emitting layer and is positioned in the first opening area, and the edge of the third light-emitting functional layer is arranged on the pixel defining unit.
5. The display substrate of any of claims 2-4, further comprising:
A fourth light emitting function layer disposed between the first light emitting function layer and the second light emitting function layer and located in the second opening region, an edge of the fourth light emitting function layer being disposed on the pixel defining unit;
The second light-emitting layer is arranged between the fourth light-emitting functional layer and the second light-emitting functional layer and is positioned in the second opening area, and the edge of the second light-emitting layer is arranged on the pixel defining unit;
One end of the first barrier layer, which is far away from the first opening area, is arranged between the first light-emitting functional layer and the fourth light-emitting functional layer.
6. The display substrate of claim 5, further comprising a second barrier layer, wherein,
The second barrier layer is arranged between the fourth light-emitting functional layer and the second light-emitting layer, and the orthographic projection of the second barrier layer on the substrate is at least partially overlapped with the orthographic projection of the pixel defining unit on the substrate;
Or alternatively
The second barrier layer is arranged between the second light-emitting layer and the second light-emitting functional layer, and the orthographic projection of the second barrier layer on the substrate is overlapped with the orthographic projection of the pixel defining unit on the substrate at least partially.
7. The display substrate of claim 6, wherein the second barrier layer is disposed between the first barrier layer and the second light emitting functional layer, and an orthographic projection of the second barrier layer on the substrate at least partially overlaps an orthographic projection of the first barrier layer on the substrate.
8. The display substrate according to claim 6, wherein,
The first light-emitting functional layer comprises a hole transport layer and/or a hole injection layer, the second light-emitting functional layer comprises an electron transport layer and/or an electron injection layer, the second barrier layer is arranged between the fourth light-emitting functional layer and the second light-emitting layer, and the material of the second barrier layer comprises a material for blocking holes or an inorganic nonmetallic material;
Or alternatively
The first light-emitting functional layer comprises a hole transport layer and/or a hole injection layer, the second light-emitting functional layer comprises an electron transport layer and/or an electron injection layer, the second barrier layer is arranged between the second light-emitting layer and the second light-emitting functional layer, and the material of the second barrier layer comprises a material or an inorganic nonmetallic material for blocking electrons.
9. The display substrate according to claim 1 or 2, wherein the first light-emitting functional layer comprises a hole transport layer and/or a hole injection layer, the second light-emitting functional layer comprises an electron transport layer and/or an electron injection layer, and the material of the first barrier layer comprises a material for blocking electrons or an inorganic nonmetallic material.
10. A display substrate according to claim 3 or 4, wherein the first light emitting functional layer comprises a hole transporting layer and/or a hole injecting layer, the second light emitting functional layer comprises an electron transporting layer and/or an electron injecting layer, and the material of the first barrier layer comprises a material for blocking holes or an inorganic non-metallic material.
11. The display substrate of claim 1, wherein the first barrier layer comprises a ring-shaped structure surrounding the first opening region.
12. The display substrate of claim 11, wherein the annular structure is provided with a plurality of indentations to divide the first barrier layer into a plurality of individual barrier cells.
13. The display substrate of claim 1, wherein the material of the first light emitting layer comprises a green organic light emitting material.
14. A display device comprising the display substrate according to any one of claims 1-13.
CN202110951872.6A 2021-08-18 2021-08-18 Display substrate and display device Active CN113659092B (en)

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