CN113617350A - Defective carbon material and preparation method and application thereof - Google Patents
Defective carbon material and preparation method and application thereof Download PDFInfo
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- CN113617350A CN113617350A CN202110918159.1A CN202110918159A CN113617350A CN 113617350 A CN113617350 A CN 113617350A CN 202110918159 A CN202110918159 A CN 202110918159A CN 113617350 A CN113617350 A CN 113617350A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J21/00—Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
- B01J21/18—Carbon
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/34—Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation
- B01J37/349—Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation making use of flames, plasmas or lasers
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/72—Treatment of water, waste water, or sewage by oxidation
- C02F1/725—Treatment of water, waste water, or sewage by oxidation by catalytic oxidation
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2101/00—Nature of the contaminant
- C02F2101/30—Organic compounds
- C02F2101/308—Dyes; Colorants; Fluorescent agents
Abstract
The invention relates to the technical field of sewage advanced treatment, in particular to a preparation method of a defective carbon material and application of catalytic decontamination. The invention provides a preparation method of a defective carbon material, which comprises the following steps: and carrying out plasma etching on the carbon material to obtain the defective carbon material. The defect carbon material prepared by the preparation method can effectively activate persulfate, peracetic acid and ozone, and can effectively degrade organic pollutants in sewage. The preparation method is simple in preparation process, easy to operate, low in cost, suitable for industrial production and has a great commercial prospect.
Description
Technical Field
The invention relates to the technical field of sewage advanced treatment, in particular to a preparation method of a defective carbon material and application of the defective carbon material in catalytic decontamination.
Background
In recent years, a large amount of toxic and harmful organic pollutants such as phenols, dyes, antibiotics and the like enter the water environment, and potential environmental risks are brought. Advanced oxidation technologies have great advantages for the effective control and removal of these organic contaminants.
An advanced oxidation method based on persulfate, peracetic acid and ozone activation is a hot spot of research and attention in recent years, and has a good application prospect. Common methods for activating oxidants (including persulfate, peroxyacetic acid and ozone) include heat treatment, microwave irradiation, ultraviolet irradiation, ultrasonic coupling and the like. However, the above method requires additional energy and the equipment system is complicated. Compared with the prior art, the heterogeneous catalyst based on the carbon material has the advantages of wide material source, low price, convenient use, great development potential and application prospect.
Disclosure of Invention
The invention aims to provide a preparation method of a defective carbon material and application of the defective carbon material in catalytic decontamination. The defect carbon material prepared by the preparation method can effectively activate persulfate, peracetic acid and ozone, and can effectively degrade organic pollutants in sewage.
In order to achieve the above object, the present invention provides the following technical solutions:
the invention provides a preparation method of a defective carbon material, which comprises the following steps:
and carrying out plasma etching on the carbon material to obtain the defective carbon material.
Preferably, before the plasma etching, the method further comprises the step of flatly paving a carbon material in a cavity of the plasma etching machine, wherein the flatly paved density is 0.8-8 mg/cm2。
Preferably, the carbon material includes one or more of carbon nanotube, graphene, biochar, carbon nitride and nitrogen-doped graphene.
Preferably, the etching gas used for plasma etching is air, nitrogen, argon or oxygen.
Preferably, the pressure of the etching gas is 1-100 Pa.
Preferably, the power of the plasma etching is 1-500 kW, and the time is 0.5-300 min.
The invention also provides the defective carbon material prepared by the preparation method in the technical scheme.
The invention also provides application of the defective carbon material in the technical scheme in activating an oxidant to degrade organic pollutants.
Preferably, the method comprises the following steps:
mixing organic pollutant wastewater to be treated, an oxidant and a defective carbon material, and stirring the obtained mixture;
the oxidant comprises persulfate, peroxyacetic acid or saturated ozone water.
Preferably, the concentration of the oxidant in the mixture is (10-1000) mg/L;
the concentration of the defective carbon material in the mixture is (0.01-100) g/L;
the stirring treatment time is 5-180 min.
The invention provides a preparation method of a defective carbon material, which comprises the following steps: and carrying out plasma etching on the carbon material to obtain the defective carbon material. According to the invention, the six-membered ring carbon skeleton in the carbon material is directly modified by plasma etching, so that the defects and surface functional groups of the material are regulated and controlled, and compared with the traditional high-temperature calcination, heteroatom doping and other modes, the material has the advantages of low energy consumption, no medicament consumption and waste generation, direct and efficient regulation and control of the surface defects and the surface functional groups of the carbon material and the like. The carbon material has the characteristics of high electron density due to surface defects and surface functional groups, and can be used as an active site to efficiently catalyze persulfate, peroxyacetic acid and ozone, so that pollutants can be rapidly removed, and the problems of high energy consumption and secondary pollution in the traditional catalysis method can be effectively solved. The preparation method is simple in preparation process, easy to operate, low in cost, suitable for industrial production and has a great commercial prospect.
Drawings
FIG. 1 is a Raman spectrum of a defective carbon material prepared in examples 1 to 3;
FIG. 2 is a C/C of phenols of examples 1 to 3 and comparative examples 1 to 5 at different timings0；
FIG. 3 is a C/C of phenol of example 3 and comparative examples 6 to 7 at different times0；
FIG. 4 is a C/C of phenol of example 4 and comparative examples 8 to 9 at different times0；
FIG. 5 shows the C/C of atrazine in example 5 and comparative examples 10 to 11 at different times0；
FIG. 6 is a C/C of phenols of examples 3, 6, 7 and comparative example 2 at different times0。
Detailed Description
The invention provides a preparation method of a defective carbon material, which comprises the following steps:
and carrying out plasma etching on the carbon material to obtain the defective carbon material.
In the present invention, all the starting materials for the preparation are commercially available products known to those skilled in the art unless otherwise specified.
In the invention, the carbon material preferably comprises one or more of carbon nanotubes, graphene, biochar, carbon nitride and nitrogen-doped graphene, more preferably carbon nanotubes, and most preferably multiwalled carbon nanotubes; when the carbon material is two or more of the above specific choices, the present invention does not have any particular limitation on the ratio of the specific materials, and the specific materials may be mixed in any ratio.
Before the plasma etching, the invention also preferably comprises paving the carbon material in the cavity of the plasma etching machine. Specifically, the carbon material is spread and dispersed in a glass culture dish and then placed in the cavity of the plasma etching machine. In the invention, the content of the carbon material in the glass culture dish is preferably 0.8-8 mg/cm2More preferably 2 to 5mg/cm2。
In the present invention, the plasma etching is preferably performed in a plasma etcher, that is, a glass culture dish tiled with carbon material is placed in a cabin of the plasma etcher.
In the present invention, the etching gas used for the plasma etching is preferably air, nitrogen, argon or oxygen, and more preferably nitrogen. In the invention, the pressure of the etching gas is preferably 1-100 Pa, and more preferably 5-30 Pa.
In the invention, the power of the plasma etching is preferably 1-100W, and more preferably 50-100W; the time is preferably 1 to 120min, more preferably 10 to 100min, and most preferably 30 to 70 min.
In the invention, the specific process of the plasma etching is preferably as follows: spreading and dispersing carbon material in glass culture dish, placing in the cavity of the plasma etching machine, starting plasma processing equipment, and vacuumizing to 10%-1And Pa, introducing etching gas, turning on a radio frequency power supply to perform plasma etching, turning off the radio frequency power supply after the etching is finished, slowly introducing the gas until the air pressure inside and outside the chamber is balanced, opening the chamber door, and taking out the sample to obtain the defective carbon material.
The invention also provides the defective carbon material prepared by the preparation method in the technical scheme.
The invention also provides application of the defective carbon material in the technical scheme in activating an oxidant to degrade organic pollutants.
In the present invention, the application comprises the following steps:
mixing organic pollutant wastewater to be treated, an oxidant and a defective carbon material, and stirring the obtained mixture;
the oxidant comprises persulfate, peroxyacetic acid or saturated ozone water.
In the invention, the concentration of the oxidant in the mixture is preferably (10-1000) mg/L, more preferably (10-800) mg/L, and most preferably (10-500) mg/L.
In the invention, the concentration of the defective carbon material in the mixture is preferably (0.01-100) g/L, more preferably (0.05-50) g/L;
in the invention, the stirring time is preferably 5-180 min, more preferably 10-150 min, and most preferably 30-100 min; the stirring rate is not particularly limited in the present invention, and may be carried out at a rate known to those skilled in the art. In the present invention, the stirring process is preferably a catalytic degradation process of organic pollutants in the wastewater.
According to the invention, the defect carbon material is used for catalyzing persulfate, peroxyacetic acid and ozone, so that the degradation effect of pollutants can be effectively improved, and the problems of high energy consumption and secondary pollution in the traditional catalysis method can be effectively avoided.
The method for producing the defective carbon material and the application thereof in catalytic decontamination provided by the present invention will be described in detail with reference to the following examples, which should not be construed as limiting the scope of the present invention.
Example 1
According to 3mg/cm2Spreading and dispersing the multi-wall carbon nano-tubes in a glass culture dish, placing the glass culture dish in a cabin body of a plasma etching machine, starting plasma processing equipment, and vacuumizing to 10 DEG C-1Pa, introducing high-purity nitrogen to adjust the gas flow so that the pressure in the cabin body is kept at 5Pa, turning on the radio frequency power supply to adjust the plasma power to 60W for plasma etching for 10min, turning off the radio frequency power supply after etching is finished, slowly releasing nitrogen until the air pressure in the cabin is balanced, opening the cabin door, and taking out a sample to obtain a defective carbon material (marked as PE-10);
10mg PE-10, 197mL of phenol solution with a mass concentration of 1mg/L and 3mL of potassium hydrogen Persulfate (PMS) aqueous solution with a concentration of 10g/L were mixed, degradation was performed for 30min under stirring, wherein samples were filtered at 0, 1, 3, 5, 7, 10, 15, 20, 30min, and the concentration of organic matter was detected by high performance liquid chromatography.
Example 2
According to 4mg/cm2Spreading and dispersing the multi-wall carbon nano-tubes in a glass culture dish, placing the glass culture dish in a cabin body of a plasma etching machine, and starting plasmaSub-treatment apparatus, evacuating to 10-1Pa, introducing high-purity nitrogen to adjust the gas flow so that the pressure in the cabin body is kept at 7Pa, turning on the radio frequency power supply to adjust the plasma power to 70W for plasma etching for 30min, turning off the radio frequency power supply after etching is finished, slowly releasing nitrogen until the air pressure in the cabin is balanced, opening the cabin door, and taking out a sample to obtain a defective carbon material (marked as PE-30);
10mg PE-30, 197mL of phenol solution with a mass concentration of 1mg/L and 3mL of potassium hydrogen Persulfate (PMS) aqueous solution with a concentration of 10g/L are mixed, degradation is carried out for 30min under the condition of stirring, sampling and filtering are carried out at 0, 1, 3, 5, 7, 10, 15, 20 and 30min, and the concentration of organic matters is detected by high performance liquid chromatography.
Example 3
According to 5mg/cm2Spreading and dispersing the multi-wall carbon nano-tubes in a glass culture dish, placing the glass culture dish in a cabin body of a plasma etching machine, starting plasma processing equipment, and vacuumizing to 10 DEG C-1Pa, introducing high-purity nitrogen to adjust the gas flow so that the pressure in the cabin body is kept at 10Pa, turning on the radio frequency power supply to adjust the plasma power to 100W for plasma etching for 50min, turning off the radio frequency power supply after etching is finished, slowly releasing nitrogen until the air pressure in the cabin is balanced, opening the cabin door, and taking out a sample to obtain a defective carbon material (marked as PE-50);
10mg PE-50, 197mL of phenol solution with a mass concentration of 1mg/L and 3mL of potassium hydrogen Persulfate (PMS) aqueous solution with a concentration of 10g/L were mixed, degradation was performed for 30min under stirring, wherein samples were filtered at 0, 1, 3, 5, 7, 10, 15, 20, 30min, and the concentration of organic matter was detected by high performance liquid chromatography.
Example 4
According to 5mg/cm2Spreading and dispersing the multi-wall carbon nano-tubes in a glass culture dish, placing the glass culture dish in a cabin body of a plasma etching machine, starting plasma processing equipment, and vacuumizing to 10 DEG C-1Pa, introducing high-purity nitrogen to adjust the gas flow so that the pressure in the cabin body is kept at 23Pa, turning on the radio frequency power supply to adjust the plasma power to 100W for plasma etching for 50min, and turning off the radio frequency power supply after the etching is finishedA source, slowly releasing nitrogen until the air pressure inside and outside the cabin is balanced, opening the cabin door, and taking out a sample to obtain a defective carbon material (marked as PE-50);
10mg PE-50, 197mL of phenol solution with mass concentration of 1mg/L and 3mL of peracetic acid (PAA) aqueous solution with mass concentration of 15% (the concentration of the peracetic acid in the mixed solution is 35mg/L) are mixed, degradation is carried out for 60min under the condition of stirring, wherein sampling filtration is carried out at 0, 1, 3, 5, 10, 15, 20, 30, 45 and 60min, and the concentration of organic matters is detected by high performance liquid chromatography.
Example 5
According to 5mg/cm2Spreading and dispersing the multi-wall carbon nano-tubes in a glass culture dish, placing the glass culture dish in a cabin body of a plasma etching machine, starting plasma processing equipment, and vacuumizing to 10 DEG C-1Pa, introducing high-purity nitrogen to adjust the gas flow so that the pressure in the cabin body is kept at 15Pa, turning on a radio frequency power supply to adjust the plasma power to 100W for plasma etching for 50min, turning off the radio frequency power supply after etching is finished, slowly releasing nitrogen until the air pressure in the cabin is balanced, opening a cabin door, and taking out a sample to obtain a defective carbon material (marked as PE-50');
25mgPE-50', 400mL atrazine solution with mass concentration of 1mg/L and 100mL saturated ozone (O) with concentration of 28.8mg/L3) Mixing the aqueous solutions (the concentration of the ozone in the mixed solution is 5.7mg/L), degrading for 30min under stirring, sampling and filtering at 0, 3, 5, 10, 15, 20 and 30min, and detecting the concentration of organic matters by high performance liquid chromatography.
Example 6
According to 5mg/cm2Spreading and dispersing the multi-wall carbon nano-tubes in a glass culture dish, placing the glass culture dish in a cabin body of a plasma etching machine, starting plasma processing equipment, and vacuumizing to 10 DEG C-1Pa, introducing high-purity oxygen to adjust the gas flow so that the pressure in the cabin body is kept at 17Pa, turning on the radio frequency power supply to adjust the plasma power to 100W for plasma etching for 50min, turning off the radio frequency power supply after etching is finished, slowly releasing oxygen until the air pressure in and out of the cabin is balanced, opening the cabin door, taking out a sample to obtain a defective carbon material (marked as PEO-50))；
10mg of PEO-50, 197mL of phenol solution with a mass concentration of 1mg/L and 3mL of potassium hydrogen Persulfate (PMS) aqueous solution with a concentration of 10g/L are mixed, degradation is carried out for 30min under the condition of stirring, sampling and filtering are carried out at 0, 1, 3, 5, 7, 10, 15, 20 and 30min, and the concentration of organic matters is detected by high performance liquid chromatography.
Example 7
According to 5mg/cm2Spreading and dispersing the multi-wall carbon nano-tubes in a glass culture dish, placing the glass culture dish in a cabin body of a plasma etching machine, starting plasma processing equipment, and vacuumizing to 10 DEG C-1Pa, introducing high-purity argon to adjust the gas flow so that the pressure in the cabin body is kept at 8Pa, turning on a radio frequency power supply to adjust the plasma power to 100W for plasma etching for 50min, turning off the radio frequency power supply after etching is finished, slowly releasing argon until the air pressure in the cabin is balanced, opening a cabin door, and taking out a sample to obtain a defective carbon material (marked as PEAr-50);
10mg of PEAr-50, 197mL of phenol solution with the mass concentration of 1mg/L and 3mL of potassium hydrogen Persulfate (PMS) aqueous solution with the mass concentration of 10g/L are mixed, degradation is carried out for 30min under the condition of stirring, sampling and filtering are carried out at 0, 1, 3, 5, 7, 10, 15, 20 and 30min, and the concentration of organic matters is detected by high performance liquid chromatography.
Comparative example 1
30mg of potassium hydrogen Persulfate (PMS) and 200mL of 1mg/L aqueous phenol solution were mixed, degradation was performed for 30min with stirring, wherein samples were filtered at 0, 1, 3, 5, 7, 10, 15, 20, 30min, and the concentration of organic matter was detected by high performance liquid chromatography.
Comparative example 2
10mg of multi-walled carbon nanotubes, 197mL of a phenol solution with a mass concentration of 1mg/L and 3mL of a potassium hydrogen Persulfate (PMS) aqueous solution with a concentration of 10g/L were mixed, degradation was performed for 30min under stirring, wherein samples were taken at 0, 1, 3, 5, 7, 10, 15, 20, 30min for filtration, and the concentration of organic matter was detected by high performance liquid chromatography.
Comparative example 3
10mg of PE-10 prepared in example 1 was mixed with 200mL of a phenol solution having a mass concentration of 1mg/L, and degradation was carried out for 30min under stirring, wherein samples were filtered at 0, 1, 3, 5, 7, 10, 15, 20, and 30min, and the concentration of organic substances was detected by high performance liquid chromatography.
Comparative example 4
10mg of PE-30 prepared in example 2 and 200mL of a phenol solution having a mass concentration of 1mg/L were mixed, and degradation was carried out for 30min under stirring, wherein samples were taken at 0, 1, 3, 5, 7, 10, 15, 20, and 30min for filtration, and the concentration of organic substances was detected by high performance liquid chromatography.
Comparative example 5
10mg of PE-50 prepared in example 3 and 200mL of a phenol solution having a mass concentration of 1mg/L were mixed, and degradation was carried out for 30min under stirring, wherein samples were taken at 0, 1, 3, 5, 7, 10, 15, 20, and 30min for filtration, and the concentration of organic substances was detected by high performance liquid chromatography.
Comparative example 6
197mL of phenol solution with a mass concentration of 1mg/L and 3mL of potassium hydrogen Persulfate (PMS) aqueous solution with a concentration of 10g/L are mixed, wherein the potassium hydrogen persulfate in the potassium hydrogen persulfate solution is activated by ultraviolet light, and the UV light intensity under the condition of 254nm is 3.13 multiplied by 10-2J/(L · s); the degradation is carried out for 30min under stirring, wherein samples are taken and filtered at 0, 1, 3, 5, 7, 10, 15, 20, 30min, and the concentration of organic substances is detected by high performance liquid chromatography.
Comparative example 7
12 μ g FeCl2197mL of a phenol solution having a mass concentration of 1mg/L and 3mL of a potassium hydrogen Persulfate (PMS) aqueous solution having a concentration of 35mg/L were mixed, and degradation was carried out for 30min under stirring, wherein sampling filtration was carried out at 0, 1, 3, 5, 7, 10, 15, 20, 30min, and the concentration of organic matter was detected by high performance liquid chromatography.
Comparative example 8
197mL of phenol solution with a mass concentration of 1mg/L and 3mL of aqueous peracetic acid (PAA) solution with a mass concentration of 15% (the concentration of the peracetic acid in the mixed solution is 35mg/L) were mixed, and degradation was performed for 60min with stirring, wherein samples were filtered at 0, 1, 3, 5, 10, 15, 20, 30, 45, 60min, and the concentration of organic matter was detected by high performance liquid chromatography.
Comparative example 9
10mg of multi-walled carbon nanotubes, 197mL of phenol solution with a mass concentration of 1mg/L and 3mL of aqueous solution of peracetic acid (PAA) with a mass concentration of 15% (the concentration of the peracetic acid in the mixed solution is 35mg/L) are mixed, degradation is carried out for 60min under the condition of stirring, sampling and filtering are carried out at 0, 1, 3, 5, 10, 15, 20, 30, 45 and 60min, and the concentration of organic matters is detected by high performance liquid chromatography.
Comparative example 10
400mL of atrazine solution with the mass concentration of 1mg/L and 100mL of saturated ozone (O) with the mass concentration of 28.8mg/L3) Mixing the aqueous solutions (the concentration of the ozone in the mixed solution is 5.7mg/L), degrading for 30min under stirring, sampling and filtering at 0, 3, 5, 10, 15, 20 and 30min, and detecting the concentration of organic matters by high performance liquid chromatography.
Comparative example 11
Mixing 25mg MWCNT, 400mL atrazine solution with mass concentration of 1mg/L and 100mL saturated ozone (O) with concentration of 28.8mg/L3) Mixing the aqueous solutions (the concentration of the ozone in the mixed solution is 5.7mg/L), degrading for 30min under stirring, sampling and filtering at 0, 3, 5, 10, 15, 20 and 30min, and detecting the concentration of organic matters by high performance liquid chromatography.
Test example
The results of Raman spectroscopy on the defective carbon materials prepared in examples 1 to 3 are shown in FIG. 1, and it can be seen from FIG. 1 that I of MWCNT isD/IGRatio of 0.64, I of PE-10D/IGRatio of 0.90, I of PE-30D/IGRatio of 0.96, I of PE-50D/IGThe ratio is 0.99, so that the defect degree of the MWCNT can be obviously increased by the plasma etching technology, and the defects of the MWCNT can be increased;
FIG. 2 is a C/C of phenols of examples 1 to 3 and comparative examples 1 to 5 at different timings0Wherein, C/C0C represents the concentration of organic matter remaining in the reaction solution after degradation for a certain period of time, C0Is the origin of the organic matterConcentration;
the degradation rates of the examples 1 to 3 and the comparative examples 1 to 5 were counted, wherein the degradation rate was calculated by the following method:
as can be seen by combining the graph 2 and the calculation formula, the persulfate alone in the comparative example 1 has no obvious effect on degrading phenol, and the MWCNT/PMS in the comparative example 2 only degrades phenol to 23 percent within 30 min; the comparative examples 3-5 PE-T have no obvious adsorption effect on phenol; in the embodiment 1, the PE-10 activated PMS system can degrade phenol to 78% in 30min, and in the embodiments 2-3, the PE-30 and PE-50 activated PMS systems can degrade phenol to nearly 100% in 15 min;
FIG. 3 is a C/C of phenol of example 3 and comparative examples 6 to 7 at different times0As can be seen from FIG. 3 and the above calculation formula, the 30min phenol removal rate of the UV/PMS system (comparative example 6) is 68%, and Fe2+The 30min phenol removal rate of a PMS system (comparative example 7) is 1 percent, and the phenol removal efficiency of a PE-50 activated PMS system is obviously higher than that of UV activated PMS and Fe2+Activating;
FIG. 4 is a C/C of phenol of example 4 and comparative examples 8 to 9 at different times0As can be seen from the combination of FIG. 4 and the above calculation formula, PAA alone (comparative example 8) has no phenol degradation effect, MWCNT/PAA (comparative example 9) degrades phenol for 60min to 38%, and PE-50/PAA (example 4) degrades phenol for 60min to 97%;
FIG. 5 shows the C/C of atrazine in example 5 and comparative examples 10 to 11 at different times0As can be seen from FIG. 5 and the above calculation equation, O alone3(comparative example 10) degradation effect on atrazine reached 77% in 30min, MWCNT/O3Comparative example 11 degradation of atrazine by 81% in 30min, whereas PE-50/O3(example 5) 93% can be achieved after 15min of atrazine degradation;
FIG. 6 is a C/C of phenols of examples 3, 6, 7 and comparative example 2 at different times0As can be seen from FIG. 6 and the above calculation formula, the MWCNT/PMS of comparative example 2 only degrades phenol to 23% within 30min, while the material efficiency of oxygen etching is goodThe best results are obtained, the degradation effect of PEO-50/PMS on phenol reaches 100% in 10min, the degradation effect of PE-50/PMS on phenol reaches 100% in 15min through nitrogen etching, and the degradation effect of PEAr-50/PMS on phenol reaches 100% in 20min through argon etching.
The foregoing is merely a preferred embodiment of the present invention, and it should be noted that those skilled in the art can make various improvements and modifications without departing from the principle of the present invention, and these improvements and modifications should also be construed as the protection scope of the present invention.
Claims (10)
1. A method for producing a defective carbon material, comprising the steps of:
and carrying out plasma etching on the carbon material to obtain the defective carbon material.
2. The method of claim 1, further comprising, prior to the plasma etching, tiling a carbon material in the chamber of the plasma etcher, the tiled density being 0.8 to 8mg/cm2。
3. The method according to claim 1 or 2, wherein the carbon material comprises one or more of carbon nanotubes, graphene, biochar, carbon nitride, and nitrogen-doped graphene.
4. The method according to claim 1, wherein an etching gas used for the plasma etching is air, nitrogen, argon, or oxygen.
5. The method according to claim 4, wherein the pressure of the etching gas is 1 to 100 Pa.
6. The method according to claim 1, 4 or 5, wherein the plasma etching has a power of 1 to 500kW and a time of 0.5 to 300 min.
7. A defective carbon material produced by the production method according to any one of claims 1 to 6.
8. Use of the defective carbon material of claim 7 in activating an oxidizing agent to degrade organic contaminants.
9. The use according to claim 8, comprising the steps of:
mixing organic pollutant wastewater to be treated, an oxidant and a defective carbon material, and stirring the obtained mixture;
the oxidant comprises persulfate, peroxyacetic acid or saturated ozone water.
10. The use according to claim 9, wherein the concentration of the oxidant in the mixture is (10-1000) mg/L;
the concentration of the defective carbon material in the mixture is (0.01-100) g/L;
the stirring treatment time is 5-180 min.
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| CN113457658A (en) * | 2021-08-06 | 2021-10-01 | 南昌航空大学 | Surface modification method of biomass carbon material |
| CN114426765A (en) * | 2022-03-29 | 2022-05-03 | 湖南金悦降解塑料制品有限公司 | Biodegradable plastic and degradation method thereof |
| CN114870882A (en) * | 2022-06-13 | 2022-08-09 | 齐齐哈尔大学 | Catalyst for quickly activating peroxyacetic acid to oxidize and degrade antibiotic wastewater based on microwaves and preparation and application methods thereof |
| CN115888787A (en) * | 2022-10-28 | 2023-04-04 | 华侨大学 | Ozone-enhanced graphite nitrogen-doped graphene catalytic material and preparation method thereof |
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