CN113579987A - Method and device for polishing free-form surface by curvature self-adaptive cluster magneto-rheological process - Google Patents
Method and device for polishing free-form surface by curvature self-adaptive cluster magneto-rheological process Download PDFInfo
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- CN113579987A CN113579987A CN202110838320.4A CN202110838320A CN113579987A CN 113579987 A CN113579987 A CN 113579987A CN 202110838320 A CN202110838320 A CN 202110838320A CN 113579987 A CN113579987 A CN 113579987A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B31/00—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor
- B24B31/10—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor involving other means for tumbling of work
- B24B31/112—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor involving other means for tumbling of work using magnetically consolidated grinding powder, moved relatively to the workpiece under the influence of pressure
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
- B24B1/005—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes using a magnetic polishing agent
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B31/00—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor
- B24B31/12—Accessories; Protective equipment or safety devices; Installations for exhaustion of dust or for sound absorption specially adapted for machines covered by group B24B31/00
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/06—Work supports, e.g. adjustable steadies
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
The invention relates to the technical field of ultra-precision machining, in particular to a method and a device for polishing a free-form surface by curvature self-adaptive cluster magneto-rheological polishing. The polishing method comprises the following steps: placing a workpiece to be processed in a rotary platform assembly, and enabling each polishing head to be positioned above the workpiece to be processed; pouring the magnetorheological polishing solution into a rotary platform assembly; the polishing heads synchronously rotate; rotating the workpiece to be processed through the rotating platform assembly to start polishing; in the polishing process, the polishing head moves up and down to perform constant-pressure polishing; the y-direction linear guide rail component drives the rotating platform component to perform horizontal low-speed reciprocating movement in the y direction, so that the workpiece to be processed is uniformly polished. The invention can perfectly meet the requirement of polishing the free-form surface, ensures constant force processing on the basis of improving the processing efficiency, lightens the processing nonuniformity, and is very suitable for high-efficiency ultra-precise polishing of materials such as optical elements, semiconductors, ceramics and the like of the free-form surface.
Description
Technical Field
The invention relates to the technical field of ultra-precision machining, in particular to a method and a device for polishing a free-form surface by curvature self-adaptive cluster magneto-rheological polishing.
Background
In the 21 st century, the rapid development of microelectronic technology and information technology has led to an increasing demand for various optoelectronic materials and higher requirements for the quality of their surface finish. The free-form surface optical element is a non-rotating anisotropic curved surface element with a complex surface, a curved surface radar antenna, a microscope, a telescope, a camera lens, a curved surface screen board of a mobile phone, an intelligent watch and a palm computer and other curved surface optical elements are mostly formed by precisely processing hard and brittle materials such as optical glass, microcrystalline glass, sapphire and the like, the surface requirement is extremely strict, and the defects of no scratch crack, no lattice distortion, no foreign impurity pollution and the like on the surface are ensured besides the requirements on high surface shape precision and low surface roughness.
The processing of the free curved surface is not independent of the ultra-precision processing technology, however, the curved surface processing technology is still a difficult problem in the processing and manufacturing industry at present due to the influence of factors such as the shape and the material of the curved surface. How to realize the ultra-smooth and high-efficiency processing of the curved optical element has become a research hotspot of domestic and foreign scholars and a focus of competition in the industry.
The magnetorheological polishing combines the subjects of electromagnetism, fluid dynamics and the like, is an advanced optical surface processing technology, forms a flexible ribbon micro-grinding head by utilizing the rheological effect of the magnetorheological fluid in a magnetic field, flexibly processes the surface of a workpiece, does not generate subsurface damage on the processed surface, and has the advantages of stable removal function, controllable processing technological process and the like. The magnetorheological polishing is very suitable for polishing various workpieces with free curved surfaces, but the magnetorheological polishing is realized by scanning processing on the surfaces of the workpieces by a micro grinding head, so that the processing time is longer and the processing efficiency is lower.
US20040142635a1 discloses a carrier assembly, a polishing machine including the carrier assembly, and a method of polishing a micro device workpiece, but it can only polish flat surfaces using magnetorheological methods, and cannot achieve curved surface polishing.
US20030087585a1 discloses a magnetorheological polishing device and method, which can achieve curved surface polishing by using a magnetorheological method, but polishing is performed by using a single point, and the polishing efficiency is extremely low.
Chinese patent CN101579833B discloses a high-efficiency controllable multi-grinding-head magnetorheological polishing device, in which an electromagnet unit adopts an annular array structure to form a multi-grinding-head polishing region, a workpiece is mounted on a polishing main shaft, and polishing is performed by rotation of the polishing main shaft and a polishing disk, and all workpieces are polished simultaneously by multiple points instead of a single point, thereby greatly improving the processing efficiency of the workpiece. However, the device cannot be applied to curved surfaces with irregular curvature change, and the generated electromagnetic field cannot achieve constant force processing for free-form surface processing, so that the difference of material removal rates of the curvature-changed part of the workpiece is large.
Disclosure of Invention
The invention aims to overcome the defects of the prior art and provides a method for polishing a free-form surface by curvature self-adaptive cluster magneto-rheological polishing. The polishing device can well meet the requirement of processing the free-form surface during polishing, ensures constant force processing on the basis of improving the processing efficiency, lightens the processing nonuniformity, is very suitable for carrying out high-efficiency ultra-precision polishing on materials such as optical elements, semiconductors, ceramics and the like of the free-form surface, and is also suitable for carrying out high-efficiency ultra-precision polishing on plane materials such as semiconductor wafers, ceramic substrates and the like.
In order to solve the technical problems, the invention adopts the technical scheme that:
a method for polishing a free-form surface by curvature self-adaptive cluster magneto-rheological polishing comprises the following steps:
s1: placing a workpiece to be processed in a rotary platform assembly, and enabling each polishing head to be positioned above the workpiece to be processed;
s2: configuring magnetorheological polishing liquid matched with the characteristics of different workpieces to be processed according to the characteristics of the workpieces to be processed, and pouring the magnetorheological polishing liquid into a rotary platform component;
s3: each polishing head and the deflection disc are forced to synchronously rotate through the deflection disc assembly; or the micro motor drives each polishing head to synchronously rotate, and the magnetic field generated by the polishing heads acts on the magnetorheological polishing liquid to form the magnetorheological flexible polishing head;
s4: rotating the workpiece to be processed through the rotating platform assembly, and starting polishing the workpiece to be processed;
s5: in the polishing process, the polishing head moves up and down according to the curvature change of the surface of the workpiece to be processed to perform constant-pressure polishing;
s6: the y-direction linear guide rail component drives the rotating platform component to perform horizontal low-speed reciprocating movement in the y direction, so that the workpiece to be processed is uniformly polished.
According to the invention, each polishing head can synchronously rotate and can respectively move up and down, so that on one hand, multi-point polishing can be realized, and the polishing efficiency is improved; and on the other hand, constant-pressure polishing is realized, axial self-adaptive motion of each polishing head is ensured to contact with the surface of the curved surface in the polishing process, the non-uniformity of processing can be reduced, and the problem of ultra-smooth polishing of the curved surface is solved.
Further, in step S1, the positions of the rotating platform assembly and the deflector assembly are adjusted by adjusting the z-direction linear guide assembly and the y-direction linear guide assembly, so that the polishing head is located above the workpiece to be processed.
Further, in step S5, the polishing head is moved up and down by using air pressure, hydraulic pressure, a spring, or the self weight of the polishing head.
Further, the magnetic field intensity formed by the single polishing head in step S3 is at least 500 Gs.
Further, the method for obtaining the magnetorheological polishing fluid in step S2 is as follows: adding 2-20% by mass of free abrasive, 2-40% by mass of magnetic particles, 1-15% by mass of stabilizing agents such as glycerol or oleic acid and 1-10% by mass of antirust agents into deionized water, fully stirring, and vibrating for 5-30 minutes by ultrasonic waves to form the magnetorheological polishing solution.
Further, the free abrasive and the magnetic particles can be replaced by magnetic composite particles which take carbonyl iron powder, ferroferric oxide, iron oxide and other particles as cores and combine diamond, SiC and other abrasives into outer cores through coupling agents.
The invention also provides a yaw disc assembly which comprises a yaw disc frame, a yaw disc shell, a motor base, a yaw disc driving motor, a yaw disc, an eccentric main shaft, a plurality of polishing heads, a plurality of first clamp springs, a plurality of eccentric branch shafts, a plurality of air cylinders and a plurality of polishing heads.
The eccentric main shaft is driven by the eccentric disc driving motor to further drive the eccentric disc to deflect, and the polishing head is driven by the eccentric split shafts to synchronously rotate along with the eccentric disc; under the blocking of the eccentric disc frame, the eccentric split shaft drives the polishing head to rotate; the polishing head can move up and down under the driving of the cylinder, so that the polishing part is always attached to the surface of a workpiece to be processed in the polishing process, the free curved surface is processed under a constant force, the multi-point polishing in the prior art is to uniformly adjust the height of each polishing point, the polishing points are integrally raised or integrally reduced, the situation that the polishing points cannot be contacted possibly exists when the curved surfaces with different curvatures are polished, the uniformity of polishing force cannot be realized, and the phenomenon that different surface polishing degrees are different also exists, so that good polishing cannot be realized. And the multi-point polishing device can polish the workpiece to be processed by replacing a single point, thereby greatly improving the processing efficiency. The polishing head is a device capable of generating a magnetic field and is used for forming the magnetic field in the polishing process and then acting on the magnetorheological polishing liquid to enable the magnetorheological polishing liquid to become a solid flexible grinding head for polishing a workpiece to be processed.
Preferably, the polishing head is a cylindrical body provided with a hollow cavity, and the magnetic pole is arranged in the hollow cavity.
Preferably, the bottom of the cylindrical body is a circular arc-shaped curved surface.
Preferably, the magnet is made of a permanent magnet material, and the polishing head is made of a diamagnetic material.
Preferably, the diamagnetic material is one of stainless steel, magnesium aluminum alloy, copper alloy and ceramic. Preferably, the cylindrical body comprises a connecting part and a polishing part, the magnetic pole is arranged in a hollow cavity arranged in the polishing part, the upper end of the connecting part is connected with a piston rod arranged in the cylinder, and the lower end of the connecting part is connected with the polishing part.
Preferably, the motor base further comprises a yaw disc shell end cover and a yaw disc end cover, wherein one end of the yaw disc shell end cover is connected with the motor base, and the other end of the yaw disc shell end cover is connected with the yaw disc shell; one end of the end cover of the yaw disc is connected with the eccentric main shaft, and the other end of the end cover of the yaw disc is connected with the yaw disc.
Preferably, the device further comprises an eccentric spindle coupler, wherein one end of the eccentric spindle coupler is connected with an output shaft of the yaw disc driving motor, and the other end of the eccentric spindle coupler is connected with the eccentric spindle.
Preferably, the eccentric main shaft bearing is sleeved outside the eccentric main shaft and assembled in the yaw disc shell, and the eccentric main shaft bearing is sleeved outside the eccentric main shaft and assembled in the yaw disc.
Preferably, a cross-sectional area of the connection part is smaller than or equal to a cross-sectional area of the polishing part.
The invention also provides a curvature self-adaptive cluster magnetorheological polishing free-form surface device, which comprises a workbench, a y-direction linear guide rail assembly, a z-direction linear guide rail assembly, a rotating platform assembly and the above-mentioned deflection disc assembly, wherein the y-direction linear guide rail assembly is arranged on the workbench, the rotating platform assembly is arranged on the y-direction linear guide rail assembly, the rotating platform assembly is filled with magnetorheological polishing liquid, a workpiece to be processed is arranged in the magnetorheological polishing liquid, the deflection disc assembly is arranged on the z-direction linear guide rail assembly and is positioned above the rotating platform assembly, a device capable of generating a magnetic field is arranged in the deflection disc assembly, and the device generated by the deflection disc assembly can act on the magnetorheological polishing liquid.
The rotary platform assembly is used for containing magnetorheological polishing solution, and a workpiece to be processed is placed in the magnetorheological polishing solution; the rotary platform component is also used for driving the workpiece to be processed to rotate at a low speed in the polishing process; the deflection disc assembly is used for performing rotary polishing; the processing efficiency is greatly improved by polishing the workpiece to be processed by using multiple points instead of single points. And the z-direction linear guide rail assembly is used for realizing the up-and-down movement of the deflection disc assembly, so that the positioning is convenient before polishing. The y-direction linear guide rail assembly can drive the rotary platform assembly to move horizontally, the polishing area of the workpiece to be processed in the polishing process can be increased, and the polishing efficiency is improved.
Preferably, the rotary platform assembly comprises a rotary table, a rotary table frame, a material placing disc and a rotary table driving motor, wherein the material placing disc is filled with the magnetorheological polishing liquid, the material placing disc is arranged on the rotary table, the rotary table driving motor is fixed on the rotary table, and the rotary table is arranged on the rotary table frame.
Preferably, the z-direction linear guide rail assembly comprises a z-direction base plate, a z-direction lead screw nut, a z-direction guide rail, a z-direction slider, a z-direction support plate and a z-direction driving motor, wherein one end of the z-direction lead screw is connected with an output shaft of the z-direction driving motor, the other end of the z-direction lead screw is supported on the z-direction base plate, the bottom of the z-direction base plate is connected with the workbench, the z-direction guide rail is arranged on the z-direction base plate, the z-direction lead screw nut and the z-direction lead screw form a screw transmission pair, the z-direction support plate is connected with the z-direction lead screw nut, the z-direction slider is connected with the z-direction support plate, the z-direction slider and the z-direction guide rail form a sliding pair, and the deflection disc frame is connected with the z-direction support plate.
Compared with the prior art, the invention has the beneficial effects that:
(1) the eccentric split shaft is driven by the eccentric swing disc assembly to drive the polishing heads to synchronously move, the eccentric split shaft is driven by the eccentric swing disc frame to synchronously rotate the intensive polishing heads, or a plurality of micro motors are arranged to drive the polishing heads to synchronously rotate, so that multi-point cluster type collaborative polishing in the polishing process is realized, and the polishing rate is greatly improved;
(2) in the polishing process, the polishing head can move up and down in a self-adaptive manner according to the curvature of the surface of the workpiece under the action of a constant pressure, so that the free-form surface of the workpiece can be uniformly and constantly polished.
(3) The rotary platform assembly realizes low-speed rotation of a workpiece to be processed, the y-direction linear guide rail assembly realizes low-speed movement of the workpiece to be processed, and the high-speed rotation of the deflection disc assembly is matched together, so that the polishing efficiency and the polishing effect can be greatly improved.
Drawings
FIG. 1 is a schematic structural view of a first embodiment of a yaw deck assembly according to the present invention;
FIG. 2 is a cross-sectional view of an apparatus for curvature adaptive cluster magnetorheological finishing of free-form surfaces in accordance with the present invention;
FIG. 3 is a three-dimensional view of an apparatus for curvature adaptive cluster magnetorheological finishing of a free-form surface in accordance with the present invention;
FIG. 4 is a partial enlarged view of the front view at A;
FIG. 5 is a partial enlarged view of the front view at B;
FIG. 6 is a bottom view of the yaw deck assembly with the yaw deck frame removed;
FIG. 7 is a sectional view of a deflector disc assembly of embodiment 1;
FIG. 8 is a sectional view of a polishing head according to example 1;
FIG. 9 is a sectional view of a deflector assembly of embodiment 2;
FIG. 10 is a sectional view of a polishing head according to example 2;
FIG. 11 is a schematic diagram of an apparatus for curvature adaptive cluster magnetorheological finishing of free-form surfaces according to the present invention 1;
FIG. 12 is a schematic diagram of an apparatus for curvature adaptive cluster magnetorheological finishing of free-form surfaces in accordance with the present invention 2;
FIG. 13 is a flow chart of a method of curvature adaptive cluster magnetorheological finishing of free-form surfaces.
The graphic symbols are illustrated as follows:
1-a workbench; 2-a first set screw; a 3-z direction floor; a bearing seat in the 4-z direction; a 5-z direction screw bearing; a 6-z direction lead screw; a 7-z direction lead screw nut seat; a 8-z direction screw nut bearing; a 9-z direction lead screw nut; a 10-z direction slider; 11-z direction slider cover plate; a 12-z direction support plate; a 13-z direction coupler; a 14-z direction drive motor; 15-a second set screw; 16-a deflection disc rack; 17-a third set screw; 18-a yaw deck housing end cap; 19-a fourth set screw; 20-reserving holes in the trachea; 21-fifth set screw; 22-sixth set screw; 23-a yaw-disc drive motor; 24-eccentric spindle coupling; 25-eccentric main shaft; 27-a motor base; 28-crossed roller bearings; 29-eccentric spindle bearing; 31-a yaw deck housing; 32-a seventh set screw; 33-a yaw pan end cap; 34-a yaw pan; 351-eccentric split shaft; 361-a first sliding bearing; 371 — a first sliding bearing bush; 381-cylinder; 391-a first snap spring; 401-a second sliding bearing; 411-a second sliding bearing bush; 42-eighth set screw; 431-a connecting part; 441-pole; 451-a polishing part; 46-a workpiece to be machined; 47-placing plate; 48-a rotating table; 49-rotating the gantry; 50-ninth set screw; 51-a rotary table drive motor; 52-tenth set screw; 53-eleventh set screw; a 54-y direction support plate; a 55-y direction slider cover plate; a 56-y direction slider; a 57-y direction guide; a 58-y direction lead screw nut seat; a 59-y direction lead screw nut; a 60-y direction lead screw nut bearing; 61-twelfth set screw; 62-a thirteenth set screw; a 63-z direction guide rail; a 64-y direction bearing mount; a 65-y direction screw bearing; a 66-y direction screw rod; 67-fourteenth set screw; a 68-y directional coupler; a 69-y direction drive motor; a 70-y direction floor; 71-a fifteenth set screw; 72-magnetorheological polishing solution; 1001-yaw disc assembly; 1002-y direction linear guide rail assembly; 1003-z direction linear guide rail assembly; 1004 — a rotating platform assembly; a-eccentricity of the eccentric main shaft; b-eccentricity of the eccentric split shaft; .
Detailed Description
The present invention will be further described with reference to the following embodiments. Wherein the showings are for the purpose of illustration only and are shown by way of illustration only and not in actual form, and are not to be construed as limiting the present patent; to better illustrate the embodiments of the present invention, some parts of the drawings may be omitted, enlarged or reduced, and do not represent the size of an actual product; it will be understood by those skilled in the art that certain well-known structures in the drawings and descriptions thereof may be omitted.
Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one such feature. In the description of the present invention, "a plurality" means at least two, e.g., two, three, etc., unless specifically limited otherwise.
In the present invention, unless otherwise expressly stated or limited, the terms "mounted," "connected," "secured," and the like are to be construed broadly and can, for example, be fixedly connected, detachably connected, or integrally formed; can be mechanically or electrically connected; they may be directly connected or indirectly connected through intervening media, or they may be connected internally or in any other suitable relationship, unless expressly stated otherwise. The specific meanings of the above terms in the present invention can be understood by those skilled in the art according to specific situations.
In the present invention, unless otherwise expressly stated or limited, the first feature "on" or "under" the second feature may be directly contacting the first and second features or indirectly contacting the first and second features through an intermediate. Also, a first feature "on," "over," and "above" a second feature may be directly or diagonally above the second feature, or may simply indicate that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature may be directly under or obliquely under the first feature, or may simply mean that the first feature is at a lesser elevation than the second feature.
Example 1
As shown in fig. 1, the present invention is a first embodiment of a yaw disk assembly, comprising a yaw disk frame 16, a yaw disk housing 31, a motor base 27, a yaw disk driving motor 23, a yaw disk 34, an eccentric spindle 25, a plurality of polishing heads, a plurality of first snap springs 391, a plurality of eccentric split shafts 351, a plurality of air cylinders 381, and a plurality of polishing heads, wherein the yaw disk driving motor 23 is fixed on the motor base 27, the motor base 27 is connected with the yaw disk housing 31, the yaw disk housing 31 is fixed on the yaw disk frame 16, the yaw disk driving motor 23 is connected with one end of the eccentric spindle 25, the other end of the eccentric spindle 25 is assembled in the yaw disk 34, the yaw disk 34 is assembled in the yaw disk housing 31, one end of the plurality of eccentric split shafts 351 is assembled in the yaw disk 34, the other end of the plurality of eccentric split shafts 351 and the plurality of first snap springs 391 are coaxially assembled in the yaw disk frame 16, the air cylinders 381 are disposed in the eccentric split shafts 351, and the air cylinders 381 are connected with piston rods, the polishing head is a device capable of generating a magnetic field.
As an embodiment of the present invention, the polishing head is a cylindrical body having a hollow cavity, and the magnetic pole 441 is disposed in the hollow cavity.
In one embodiment of the present invention, the bottom of the columnar body has an arc-shaped curved surface.
Preferably, the magnetic pole is made of permanent magnet material, and the polishing head is made of diamagnetic material. The diamagnetic material is stainless steel, magnesium-aluminum alloy, ceramic and the like.
The magnetic field intensity formed by a single polishing head is 500Gs minimum.
The bottom of the cylindrical body on the end surface of the polishing head is preferably of a hemispherical or semi-elliptical structure, so that the tangent to the surface curvature of the workpiece 46 to be processed can be ensured, and the uniformity of the magnetic field intensity can be ensured.
As an embodiment of the present invention, the cylindrical body includes a connection part 431 and a polishing part 451, the magnetic pole 441 is installed in a hollow cavity provided in the polishing part 451, an upper end of the connection part 431 is connected to a piston rod provided in the cylinder 381, and a lower end of the connection part 431 is connected to the polishing part 451.
The yaw disk 34 is used for bearing the rotation torque of the eccentric main shaft 25, and is driven by the eccentric main shaft 25 to rotate, so as to drive the eccentric sub-shaft 351 arranged on the yaw disk 34 to synchronously rotate. The motor mount 27 may be connected to the yaw disc housing 31 and the yaw disc housing end cap 18 by a fifth set screw 21. The yaw disc housing 31 may be secured to the yaw disc frame 16 by an eighth set screw 42.
As an embodiment of the invention, the device further comprises a yaw disc shell end cover 18 and a yaw disc end cover 33, wherein one end of the yaw disc shell end cover 18 is connected with the motor base 27, and the other end is connected with the yaw disc shell 31; the end cover 33 is connected to the eccentric spindle 25 at one end and to the yaw disk 34 at the other end. The yaw-disc drive motor 23 may be secured to the motor mount 27 by a sixth set screw 22.
The yaw pan housing end cap 18 may be secured to the yaw pan housing 31 by a fourth set screw 19.
As an embodiment of the present invention, the present invention further includes an eccentric spindle coupling 24, one end of the eccentric spindle coupling 24 is connected to an output shaft of the yaw disk drive motor 23, and the other end is connected to the eccentric spindle 25.
The eccentric spindle coupling 24 serves to reinforce the connection so that the eccentric spindle 25 can maintain good contact with the yaw-disc drive motor 23 during rotation.
The present invention further includes a cross roller bearing 28 and an eccentric main shaft bearing 29, wherein the cross roller bearing 28 and the eccentric main shaft bearing 29 are both disposed coaxially with the eccentric main shaft 25, the cross roller bearing 28 is sleeved outside the eccentric main shaft 25 and is assembled in a yaw disk housing 31, and the eccentric main shaft bearing 29 is sleeved outside the eccentric main shaft 25 and is assembled in a yaw disk 34.
As an embodiment of the present invention, the cross-sectional area of the connection portion 431 is smaller than that of the polishing portion 451.
The polishing sections 451 are provided with a larger cross-sectional area, and the gap between the adjacent polishing sections 451 can be reduced to increase the contact area with the workpiece 46 to be processed, further improving the polishing efficiency. The cross-sectional area of the connecting portion 431 is smaller than that of the polishing portion 451, and material can be saved.
The polishing head is used as a main component for polishing, and the polishing part 451 and the connecting part 431 can be detachably connected, so that the magnetic pole 441 can be conveniently detached and replaced. The polishing part 451 is provided with a hollow cavity for placing the magnetic pole 441 therein, and then the polishing part 451 is connected with the connecting part 431; the polishing part 451 can well protect the magnetic pole 441, so as to prevent the magnetic pole 441 from directly contacting with the workpiece 46 to be processed, on one hand, the magnetic pole 441 is easily worn, on the other hand, the polishing effect is influenced because the magnetic pole 441 is made of a harder material, and the polishing part 451 can be made of a material with lower hardness so as to meet the requirement of flexible polishing.
As an embodiment of the present invention, a first sliding bearing 361, a first sliding bearing bushing 371, a second sliding bearing 401, and a second sliding bearing bushing 411 are further included, wherein the eccentric split shaft 351 is coaxially assembled with the first sliding bearing 361 and the first sliding bearing bushing 371 in the wobble plate 34 as shown in fig. 1, and the lower end of the eccentric split shaft 351 is coaxially assembled with the second sliding bearing 401, the second sliding bearing bushing 411, and the first snap spring 391 in the wobble plate frame 16 as shown in fig. 1.
In the present embodiment, as shown in fig. 1, the eccentric main shaft eccentricity a of the eccentric main shaft 25 is equal to the eccentric sub-shaft eccentricity b of the eccentric sub-shaft 351 in value, and the eccentric sub-shaft eccentricity b of the eccentric sub-shaft 351 is in the same direction and opposite to the eccentric main shaft eccentricity a of the eccentric main shaft 25.
In this embodiment, as shown in fig. 1, the rotation of the eccentric main shaft 25 forces the eccentric disc 34 to swing at the eccentric distance a of the eccentric main shaft, the swing of the eccentric disc 34 forces the eccentric sub-shafts 351 to rotate synchronously, and the rotation of the eccentric sub-shafts 351 causes the polishing heads to rotate at the eccentric distance b of the eccentric sub-shafts, thereby realizing the synchronous rotation.
In this embodiment, as shown in fig. 11, 12, and 7, each polishing head can move in the vertical direction according to the change of the curvature of the workpiece 46 to be processed, so that curvature adaptation is achieved, and the workpiece to be processed with any curvature can be adapted.
In this embodiment, as shown in fig. 7 and 9, when the polishing heads move vertically, the air pipes of the air cylinders 381 are forced to operate, the air pipes of the air cylinders 381 are combined into four identical air pipes between the end cover 33 of the yaw disk and the housing 31 of the yaw disk and are connected out from the air pipe preformed holes 20 on the end cover 18 of the yaw disk housing, and the connected air pipes are combined into one air pipe and are used for supplying air externally, so that the uniform pressure of the polishing heads is realized.
In this embodiment, as shown in fig. 7, the array holes on the yaw disk frame 16, the array holes on the yaw disk 34, and the array holes on the yaw disk end cover 18 are arranged regularly, and are all arranged in two circles at equal intervals, eight holes in the inner circle, and twelve holes in the outer circle. Within the scope of the knowledge of those skilled in the art, the polishing heads may be arranged in a circular array, a rectangular array, or other arrangements.
In the scope of the knowledge of those skilled in the art, the air cylinder 381 in this embodiment may also be omitted, and the self weight of the polishing head is used to make the polishing portion always attached to the surface of the workpiece to be processed during the polishing process, so as to achieve uniform force processing.
Example 2
Referring to fig. 10 and 11, a second embodiment of a yaw deck assembly according to the present invention is shown, and this embodiment is similar to embodiment 1 except that the cross-sectional area of the connecting portion 431 is equal to the cross-sectional area of the polishing portion 451.
The cross-sectional area of the connecting portion 431 is equal to the cross-sectional area of the polishing portion 451, so that the polishing portion 431 can be rotated more stably and the polishing effect is better.
Example 3
As shown in fig. 3, a curvature adaptive clustering magnetorheological finishing free-form surface device includes a workbench 1, a y-direction linear guide assembly 1002, a z-direction linear guide assembly 1003, a rotating platform assembly 1004, and a yaw disk assembly 1001 as described above, where the y-direction linear guide assembly 1002 is disposed on the workbench 1, the rotating platform assembly is disposed on the y-direction linear guide assembly 1002, the rotating platform assembly 1004 contains a magnetorheological polishing liquid 72, a workpiece 46 to be processed is disposed in the magnetorheological polishing liquid 72, the yaw disk assembly 1001 is mounted on the z-direction linear guide assembly 1003, the yaw disk assembly 1001 is disposed above the rotating platform assembly 1004, a device capable of generating a magnetic field is disposed in the yaw disk assembly 1001, and a magnetic field generated by the yaw disk assembly 1001 can act on the magnetorheological polishing liquid 72.
Unlike a motor, the eccentric disc frame 16 does not have an active driving function, but here, the eccentric disc frame 16 is fixedly connected with the z-direction linear guide assembly 1003, and the eccentric disc assembly 351 is forced to rotate by blocking the eccentric sub-shaft 351 in the process that the eccentric disc assembly 1001 drives the eccentric sub-shaft 351 to synchronously rotate, which is one of the invention points of the invention, and by utilizing the reverse thinking, under the condition that only one active driving mechanism is arranged, firstly, the eccentric disc 34 drives the motor 23 to drive the eccentric disc assembly 1001 to enable the eccentric sub-shaft 351 to realize primary rotation, then, the eccentric sub-shaft 351 is blocked by the immovable eccentric disc frame 16, because the eccentric disc 34 is always in a rotating state, the eccentric sub-shaft 351 can rotate under the blocking of the eccentric disc frame 16, in the process, the eccentric disc frame 16 plays a driving role on the eccentric sub-shaft 351, so that the eccentric shaft 351 can drive the polishing head to rotate. By arranging the eccentric main shaft 25 and the eccentric disc 34 eccentrically and arranging the eccentric sub-shaft 351 and the polishing heads eccentrically, a plurality of polishing heads do not interfere with each other in the polishing process, and the smooth polishing is ensured. Of course, the polishing head can be rotated by a micro motor instead of the eccentric disc rack 16. Specifically, the number of the micro motors is consistent with the number of the polishing heads, and each micro motor is connected with each polishing head to drive the polishing heads to rotate.
In one embodiment of the present invention, the rotary platform assembly 1004 comprises a rotary table 48, a rotary table rack 49, a disc 47, and a rotary table driving motor 51, wherein the disc 47 contains a magnetorheological polishing fluid 72, the disc 47 is disposed on the rotary table 48, the rotary table driving motor 51 is fixed on the rotary table 48, and the rotary table 48 is disposed on the rotary table rack 49.
In the present embodiment, as shown in fig. 2 and 3, a turntable driving motor 51 is fixed to the turntable 48 by a ninth fixing screw 50. The rotary table 48 can drive the object placing disk 47 to rotate at a low speed, the rotary table 49 is fixed on the y-direction supporting plate 54 through a thirteenth fixing screw 62, and the rotary table assembly can move horizontally along with the movement of the y-direction linear guide rail set. The object placing disc 47 is used for placing a workpiece 46 to be processed and magnetorheological liquid, and the rotating table driving motor 51 drives the rotating table 48 to drive the object placing disc 47 to rotate so as to improve the polishing efficiency and the polishing effect.
In this embodiment, as shown in fig. 10, the yaw deck 16 is fixed to the z-direction support plate 12 by a third fixing screw 17, and the yaw deck 1001 is vertically movable in accordance with the movement of the z-direction linear guide group.
In one embodiment of the present invention, the z-direction linear guide assembly 1003 includes a z-direction base plate 3, a z-direction lead screw 6, a z-direction lead screw nut 9, a z-direction guide 63, a z-direction slider 10, a z-direction support plate 12, a z-direction driving motor 14, wherein one end of a z-direction screw rod 6 is connected with an output shaft of a z-direction driving motor 14, the other end of the z-direction screw rod 6 is supported on a z-direction base plate 3, the bottom of the z-direction base plate 3 is connected with a workbench 1, a z-direction guide rail 63 is arranged on the z-direction base plate 3, a z-direction screw nut 9 and the z-direction screw rod 6 form a screw transmission pair, a z-direction support plate 12 is connected with the z-direction screw nut 9, a z-direction slider 10 is connected with the z-direction support plate 12, the z-direction slider 10 and the z-direction guide rail 63 form a sliding pair, and the wobble plate holder 16 is connected to the z-direction support plate 12.
In this embodiment, as shown in fig. 2 and 3, the z-direction linear guide assembly 1003 further includes a z-direction screw bearing 5, a z-direction bearing seat 4, a z-direction slider cover plate 11, a z-direction screw nut bearing 8, a z-direction screw nut seat 7, and a z-direction coupling 13, wherein the z-direction base plate 3 is fixed on the table 1 by a first fixing screw 2, 2 identical z-direction guide rails 63 are fixed on the z-direction base plate 3 by a fifteenth fixing screw 71, a plurality of z-direction sliders 10, preferably 4, 4 identical z-direction sliders 10 are assembled on the 2 z-direction guide rails 63, the z-direction slider cover plate 11 is fixed on each z-direction slider 10 by a twelfth fixing screw 61, the z-direction bearing seat 4 is fixed on the z-direction base plate 3 by a fourteenth fixing screw 67, the z-direction screw 6 and the z-direction screw bearing 5 are coaxially assembled in the z-direction bearing seat 4, the z-direction lead screw 6 is connected with the z-direction driving motor 14 through a z-direction coupling 13, the z-direction driving motor 14 is fixed on the z-direction base plate 3 through a second fixing screw 15, the rotating table 48 is fixed on the y-direction supporting plate 54 through a tenth fixing screw 52, the z-direction lead screw nut seat 7 is fixed on the z-direction base plate 3 through an eleventh fixing screw 53, the z-direction lead screw nut 9 is coaxially assembled in the z-direction lead screw nut seat 7 with the z-direction lead screw nut bearing 8 and the z-direction lead screw 6, and the z-direction supporting plate 12 is fixed on the z-direction slider 10 through a thirteenth fixing screw 62.
As an embodiment of the present invention, the y-direction linear guide assembly 1002 includes a y-direction base plate 70, a y-direction guide 57, a y-direction slider 56, a y-direction slider cover plate 55, a y-direction lead screw 66, a y-direction lead screw nut 59, a y-direction lead screw nut bearing 60, a y-direction lead screw nut holder 58, a y-direction lead screw bearing 65, a y-direction bearing holder 64, a y-direction support plate 54, a y-direction coupler 68, and a y-direction driving motor 69, wherein the y-direction base plate 70 is disposed on the table 1, 2 identical y-direction guide rails 57 are fixed on the y-direction base plate 70 by a fifteenth fixing screw 71, 4 identical y-direction sliders 56 are assembled on the 2 y-direction guide rails 57, the y-direction slider cover plate 55 is fixed on each y-direction slider 56 by a twelfth fixing screw 61, the y-direction bearing holder 64 is fixed on the y-direction base plate 70 by a fourteenth fixing screw 67, the y-direction lead screw 66 and the y-direction lead screw bearing 65 are coaxially assembled in the y-direction bearing block 64, the y-direction lead screw 66 and the y-direction drive motor 69 are connected by a y-direction coupling 68, the y-direction drive motor 69 is fixed on the y-direction base plate 71 by the second fixing screw 15, the y-direction lead screw nut block 71 is fixed on the y-direction base plate 70 by the eleventh fixing screw 53, the y-direction lead screw nut 59, the y-direction lead screw nut bearing 60 and the y-direction lead screw 66 are coaxially assembled in the y-direction lead screw nut block 58, and the y-direction support plate 54 is fixed on the y-direction slider 56 by the thirteenth fixing screw 62.
Specifically, the polishing device further comprises a first sliding bearing 311, a first sliding bearing bush 312, a second sliding bearing 313, a second sliding bearing bush 314 and a clamp spring 315, wherein the rotating shaft 31, the first sliding bearing 311 and the first sliding bearing bush 312 are coaxially assembled in the wobble plate 21, meanwhile, the lower end of the rotating shaft 31, the second sliding bearing 313, the second sliding bearing bush 314 and the clamp spring 316 are coaxially assembled in the wobble plate 21, and the lower end of the rotating shaft 31 is further connected with the polishing component 32.
It will be appreciated by those skilled in the art that the polishing head may be rotated in the same direction as the turntable 48 during polishing, as shown in FIG. 12, or in the opposite direction, as shown in FIG. 11, to achieve the polishing function.
Example 4
FIG. 13 shows a first embodiment of a method for curvature adaptive cluster magnetorheological finishing of a free-form surface according to the invention, comprising the steps of:
s1: placing the workpiece 46 to be processed within the rotary table assembly 1004 with the respective polishing heads positioned above the workpiece 46 to be processed;
placing the workpiece 46 to be processed in the rotating platform assembly 1004, and adjusting the positions of the rotating platform assembly 1004 and the yaw disk assembly 1001 by adjusting the z-direction linear guide assembly 1003 and the y-direction linear guide assembly 1002 to enable the yaw disk assembly 1001 to be located above the workpiece 46 to be processed;
s2: configuring the matched magnetorheological polishing solution 72 according to the characteristics of different workpieces 46 to be processed and pouring the magnetorheological polishing solution 72 into the rotary platform assembly 1004;
according to the characteristics of the workpiece 46 to be processed, the magnetic pole 323 with proper diameter and magnetic field intensity is selected to be correspondingly arranged in the polishing part 451;
the method for obtaining the magnetorheological polishing solution 72 comprises the following steps: adding 2% by mass of abrasive, 2% by mass of magnetic particles, 1% by mass of glycerin and 1% by mass of antirust agent into deionized water, fully stirring, and vibrating for 5 minutes by ultrasonic waves to form magnetorheological polishing solution 72; .
The grinding materials and the magnetic particles can be replaced by magnetic composite particles which take carbonyl iron powder, ferroferric oxide, iron oxide and other particles as cores and combine the grinding materials such as diamond, SiC and the like into outer cores through coupling agents.
S3: each polishing head is forced to synchronously rotate with the deflector disc 34 by the deflector disc assembly 1001; or the micro-motor drives each polishing head to synchronously rotate, and the magnetic field generated by the polishing heads acts on the magnetorheological polishing solution 72;
one scheme is that a yaw disc driving motor 23 is started, a yaw disc 34 is forced to swing through rotation of an eccentric main shaft 25, the swing of the yaw disc 34 forces an eccentric sub-shaft 351 to synchronously rotate, and the rotation of the eccentric sub-shaft 351 enables a polishing head to rotate at a high speed; the magnetic field intensity formed by a single polishing head is 2500 Gs; of course, the magnetic field intensity generated by the single polishing head can be other values;
s4: the rotary table assembly 1004 rotates the workpiece 46 to be processed to start polishing the workpiece 46 to be processed;
s5: in the polishing process, the polishing head moves up and down according to the curvature change of the surface of the workpiece 46 to be processed to perform constant-pressure polishing;
the y-direction linear guide group drives the rotary platform assembly 1004 to perform y-direction horizontal low-speed reciprocating movement, and under the low-speed rotation and horizontal reciprocating movement of the workpiece 46 to be processed, each polishing head rotates at a high speed and moves in the vertical direction along with the curvature change of the workpiece 46 to be processed, so that the workpiece 46 to be processed is uniformly polished.
Example 5
The following is a second embodiment of the method for curvature adaptive clustering magneto-rheological polishing of a free-form surface of the present invention, which is similar to embodiment 4 except that the method for obtaining the magneto-rheological polishing solution 72 is as follows: adding 10% by mass of abrasive, 20% by mass of magnetic particles, 5% by mass of glycerin stabilizer and 5% by mass of antirust agent into deionized water, fully stirring, and vibrating for 20 minutes by ultrasonic waves to form the magnetorheological polishing solution 72.
Example 6
The following is a third embodiment of the method for curvature adaptive clustering magneto-rheological polishing of a free-form surface of the present invention, which is similar to embodiment 4 except that the method for obtaining the magneto-rheological polishing solution 72 is as follows: adding 20% by mass of abrasive, 40% by mass of magnetic particles, 15% by mass of oleic acid and 10% by mass of antirust agent into deionized water, fully stirring, and vibrating for 30 minutes by ultrasonic waves to form the magnetorheological polishing solution 72.
The invention skillfully adopts the deflection disc assembly 1001 to realize the synchronous rotation of each polishing head, each polishing head can realize constant force processing, and the problems of difficult control of free-form surface polishing processing track, uneven processing stress and uneven removal are well solved. The invention can be applied to the free-form surfaces of hard and brittle materials such as optical glass, microcrystalline glass, sapphire and the like, and the fine polishing of wafers such as single crystal SiC, single crystal Si and the like.
It should be understood that the above-described embodiments of the present invention are merely examples for clearly illustrating the present invention, and are not intended to limit the embodiments of the present invention. Other variations and modifications will be apparent to persons skilled in the art in light of the above description. And are neither required nor exhaustive of all embodiments. Any modification, equivalent replacement, and improvement made within the spirit and principle of the present invention should be included in the protection scope of the claims of the present invention.
Claims (10)
1. A method for polishing a free-form surface by curvature adaptive cluster magneto-rheological is characterized by comprising the following steps:
s1: placing a workpiece to be processed in a rotary platform assembly, and enabling each polishing head to be positioned above the workpiece to be processed;
s2: configuring magnetorheological polishing liquid matched with the characteristics of different workpieces to be processed according to the characteristics of the workpieces to be processed, and pouring the magnetorheological polishing liquid into a rotary platform component;
s3: each polishing head and the deflection disc are forced to synchronously rotate through the deflection disc assembly; or the micro motor drives each polishing head to synchronously rotate, and the magnetic field generated by the polishing heads acts on the magnetorheological polishing liquid to form the magnetorheological flexible polishing head;
s4: rotating the workpiece to be processed through the rotating platform assembly, and starting polishing the workpiece to be processed;
s5: in the polishing process, the polishing head moves up and down according to the curvature change of the surface of the workpiece to be processed to perform constant-pressure curvature self-adaptive polishing;
s6: the y-direction linear guide rail component drives the rotating platform component to perform horizontal low-speed reciprocating movement in the y direction, so that the workpiece to be processed is uniformly polished.
2. The method for curvature adaptive cluster magnetorheological finishing of a free-form surface according to claim 1, wherein the polishing head is positioned above the workpiece to be machined by adjusting the positions of the rotary table assembly and the deflector assembly by adjusting the z-direction linear guide assembly and the y-direction linear guide assembly in step S1.
3. The method for curvature adaptive cluster magnetorheological finishing of a free-form surface according to claim 2, wherein the polishing head is moved up and down by using air pressure, hydraulic pressure, a spring or the self weight of the polishing head in step S5.
4. The method for curvature adaptive clustering magneto-rheological polished free-form surface according to any one of claims 1 to 3, wherein the method for obtaining the magneto-rheological polishing solution in step S2 is as follows: adding 2-20% by mass of free abrasive, 2-40% by mass of magnetic particles, 1-15% by mass of glycerol or oleic acid stabilizer and 1-10% by mass of antirust agent into deionized water, fully stirring, and vibrating for 5-30 minutes by ultrasonic waves to form the magnetorheological polishing solution.
5. A yaw disc assembly applied to curvature self-adaptive cluster magnetorheological polishing free-form surfaces is characterized by comprising a yaw disc frame, a yaw disc shell, a motor base, a yaw disc driving motor, a yaw disc, an eccentric main shaft, a plurality of polishing heads, a plurality of first clamp springs, a plurality of eccentric split shafts, a plurality of air cylinders and a plurality of polishing heads, wherein the yaw disc driving motor is fixed on the motor base, the motor base is connected with the yaw disc shell, the yaw disc shell is fixed on the yaw disc frame, the yaw disc driving motor is connected with one end of the eccentric main shaft, the other end of the eccentric main shaft is assembled in the yaw disc, the yaw disc is assembled in the yaw disc shell, one end of the eccentric split shafts is assembled in the yaw disc, the other end of the eccentric split shafts and the first clamp springs are coaxially assembled in the yaw disc frame, the air cylinders are arranged in the eccentric split shafts, piston rods arranged on the air cylinders are connected with the polishing heads, the polishing head is a device capable of generating a magnetic field.
6. The yaw disc assembly of claim 5, wherein the polishing head is a cylindrical body having a hollow cavity, the hollow cavity is provided with a magnetic pole therein, and the bottom of the cylindrical body is a curved surface of a circular arc shape; the magnetic pole is made of permanent magnet material, and the polishing head is made of diamagnetic material.
7. The yaw disc assembly of claim 6, wherein the cylindrical body comprises a connection portion and a polishing portion, the magnetic pole is mounted in a hollow cavity provided in the polishing portion, an upper end of the connection portion is connected to a piston rod provided in the cylinder, and a lower end of the connection portion is connected to the polishing portion.
8. A curvature self-adaptive cluster magnetorheological polishing free-form surface device is characterized by comprising a workbench, a y-direction linear guide rail assembly, a z-direction linear guide rail assembly, a rotating platform assembly and a yaw disc assembly according to any one of claims 5 to 7, wherein the y-direction linear guide rail assembly is arranged on the workbench, the rotating platform assembly is arranged on the y-direction linear guide rail assembly, the rotating platform assembly is filled with magnetorheological polishing liquid, a workpiece to be processed is arranged in the magnetorheological polishing liquid, the yaw disc assembly is arranged on the z-direction linear guide rail assembly and is positioned above the rotating platform assembly, a device capable of generating a magnetic field is arranged in the yaw disc assembly, and the magnetic field generated by the yaw disc assembly can act on the magnetorheological polishing liquid.
9. The curvature adaptive cluster magnetorheological finishing free-form surface device according to claim 8, wherein the rotating platform assembly comprises a rotating platform, a rotating platform frame, a disc for placing the magnetorheological finishing liquid, and a rotating platform driving motor, wherein the disc for placing the magnetorheological finishing liquid is placed on the rotating platform, the rotating platform driving motor is fixed on the rotating platform, and the rotating platform is placed on the rotating platform frame.
10. The apparatus of curvature adaptive cluster magnetorheological finishing free-form surface of claim 8 or 9, it is characterized in that the z-direction linear guide rail component comprises a z-direction base plate, a z-direction screw rod nut, a z-direction guide rail, a z-direction slide block, a z-direction supporting plate and a z-direction driving motor, wherein one end of the z-direction screw rod is connected with an output shaft of the z-direction driving motor, the other end of the z-direction screw rod is supported on a z-direction base plate, the bottom of the z-direction base plate is connected with the workbench, the z-direction guide rail is arranged on the z-direction base plate, the z-direction screw nut and the z-direction screw rod form a screw transmission pair, the z-direction bearing plate is connected with the z-direction screw nut, the z-direction slider is connected with the z-direction bearing plate, and the z-direction sliding block and the z-direction guide rail form a sliding pair, and the deflection disc frame is connected with the z-direction supporting plate.
Priority Applications (2)
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| CN202110838320.4A CN113579987B (en) | 2021-07-23 | 2021-07-23 | Method and device for polishing free-form surface by curvature self-adaptive cluster magneto-rheological process |
| PCT/CN2021/112375 WO2023000414A1 (en) | 2021-07-23 | 2021-08-13 | Method and apparatus for curvature-adaptive cluster magnetorheological polishing of free curved surface |
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| CN202110838320.4A CN113579987B (en) | 2021-07-23 | 2021-07-23 | Method and device for polishing free-form surface by curvature self-adaptive cluster magneto-rheological process |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116619221A (en) * | 2023-05-09 | 2023-08-22 | 浙江大学 | Gap self-adaptive non-contact polishing device and method |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117086767B (en) * | 2023-10-16 | 2023-12-12 | 蓬莱三和铸造有限公司 | Surface polishing device for semitrailer accessory production |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101579833A (en) * | 2009-06-05 | 2009-11-18 | 东华大学 | High efficiency controllable multiple wheel head magnetic rheology buffing device |
| CN105328516A (en) * | 2015-11-18 | 2016-02-17 | 广东工业大学 | Dynamic magnetic field self-sharpening finishing device for flexible magnetorheological finishing pad and finishing method for dynamic magnetic field self-sharpening finishing device |
| CN106965041A (en) * | 2017-03-20 | 2017-07-21 | 广东工业大学 | A kind of linear planarization processing method and its device based on magnetic rheology effect |
| CN107877269A (en) * | 2017-10-26 | 2018-04-06 | 广东工业大学 | The device and polishing method of a kind of magnetorheological efficiently polishing high-precise ball of cluster |
| CN110561202A (en) * | 2019-10-14 | 2019-12-13 | 吉林大学 | multidimensional ultrasonic-assisted magnetorheological precise grinding and polishing machine tool and machining method |
| CN111069984A (en) * | 2019-12-31 | 2020-04-28 | 广东工业大学 | Dynamic magnetic field magnetorheological polishing device and polishing method |
| CN111941156A (en) * | 2020-09-04 | 2020-11-17 | 深圳市金洲精工科技股份有限公司 | Micro drill polishing method and polishing device |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006224227A (en) * | 2005-02-16 | 2006-08-31 | Olympus Corp | Magnetic polishing method |
| CN101224556A (en) * | 2008-02-04 | 2008-07-23 | 东华大学 | Precise magnetic flowage polishing system for optics parts and method thereof |
| KR101176695B1 (en) * | 2009-01-19 | 2012-08-23 | 연세대학교 산학협력단 | Curve grinding method by using magnetorheological fluid |
| CN103042438B (en) * | 2012-12-31 | 2014-11-05 | 天津大学 | Constant pressure ultrasonic wave aiding magnetorheological finishing method and constant pressure ultrasonic wave aiding magnetorheological finishing device |
| CN203019159U (en) * | 2013-01-05 | 2013-06-26 | 长沙纳美特超精密制造技术有限公司 | Magnetorheological polishing head |
| CN108311958B (en) * | 2018-01-30 | 2020-03-20 | 上海理工大学 | Cluster wheel type magnetic composite fluid polishing device |
| CN212095823U (en) * | 2020-02-28 | 2020-12-08 | 湖南宇环精密制造有限公司 | Floating polishing assembly |
| CN111283482B (en) * | 2020-04-07 | 2020-12-01 | 台州学院 | Multi-head self-adaptive magnetorheological polishing device |
-
2021
- 2021-07-23 CN CN202110838320.4A patent/CN113579987B/en active Active
- 2021-08-13 WO PCT/CN2021/112375 patent/WO2023000414A1/en unknown
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101579833A (en) * | 2009-06-05 | 2009-11-18 | 东华大学 | High efficiency controllable multiple wheel head magnetic rheology buffing device |
| CN105328516A (en) * | 2015-11-18 | 2016-02-17 | 广东工业大学 | Dynamic magnetic field self-sharpening finishing device for flexible magnetorheological finishing pad and finishing method for dynamic magnetic field self-sharpening finishing device |
| CN106965041A (en) * | 2017-03-20 | 2017-07-21 | 广东工业大学 | A kind of linear planarization processing method and its device based on magnetic rheology effect |
| CN107877269A (en) * | 2017-10-26 | 2018-04-06 | 广东工业大学 | The device and polishing method of a kind of magnetorheological efficiently polishing high-precise ball of cluster |
| CN110561202A (en) * | 2019-10-14 | 2019-12-13 | 吉林大学 | multidimensional ultrasonic-assisted magnetorheological precise grinding and polishing machine tool and machining method |
| CN111069984A (en) * | 2019-12-31 | 2020-04-28 | 广东工业大学 | Dynamic magnetic field magnetorheological polishing device and polishing method |
| CN111941156A (en) * | 2020-09-04 | 2020-11-17 | 深圳市金洲精工科技股份有限公司 | Micro drill polishing method and polishing device |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116619221A (en) * | 2023-05-09 | 2023-08-22 | 浙江大学 | Gap self-adaptive non-contact polishing device and method |
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| WO2023000414A1 (en) | 2023-01-26 |
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