CN113561035B - Point cloud alternating magnetorheological polishing device and method - Google Patents
Point cloud alternating magnetorheological polishing device and method Download PDFInfo
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- CN113561035B CN113561035B CN202110873692.0A CN202110873692A CN113561035B CN 113561035 B CN113561035 B CN 113561035B CN 202110873692 A CN202110873692 A CN 202110873692A CN 113561035 B CN113561035 B CN 113561035B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B29/00—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents
- B24B29/02—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents designed for particular workpieces
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
- B24B1/005—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes using a magnetic polishing agent
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/10—Greenhouse gas [GHG] capture, material saving, heat recovery or other energy efficient measures, e.g. motor control, characterised by manufacturing processes, e.g. for rolling metal or metal working
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- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
The invention discloses a point cloud alternating magneto-rheological polishing device and a point cloud alternating magneto-rheological polishing method, wherein the point cloud alternating magneto-rheological polishing device comprises the following steps: the flexible polishing device comprises a tool, a planar optical element and a flexible polishing die, wherein the bottom end of the flexible polishing die is movably arranged on a non-magnetic-conductive material supporting plate, and the top of the flexible polishing die is contacted with the bottom surface of the planar optical element; the electromagnet magnetic field source comprises a plurality of electromagnets arranged in an array, the electromagnets are fixed on the bottom surface of the non-magnetic material supporting plate, and two adjacent electromagnets are connected in series through copper wires; the flexible polishing mold is driven to move by adopting the electromagnet as an excitation source, and the flexible polishing mold can rapidly move along the sequence of the magnetic field generated by the electromagnet under the attraction of the magnetic field of the electromagnet, so that the surface of the flexible polishing mold and the surface of the plane optical element have relative motion to form shearing force, and the aim of plastically removing the plane optical element is fulfilled.
Description
Technical Field
The invention relates to the technical field of magnetorheological polishing, in particular to a point cloud alternating magnetorheological polishing device and a point cloud alternating magnetorheological polishing method.
Background
In the leading technical field of urgent research in the current country, the third generation semiconductor material has become a core technology with national strategic significance, and the ultra-smooth polishing technology of the large-size and high-quality third generation semiconductor material substrate is one of the key technologies. The third generation semiconductor material substrate manufacturing technology with ultra-smoothness and no subsurface damage has become a common bottleneck technical problem in the third generation semiconductor, and needs to be solved urgently.
The magnetorheological polishing technology is a technology which combines the electromagnetism and the fluid dynamics theory and is applied to optical processing, and the polishing tool utilizes the special characteristics of the magnetorheological body, does not generate surface damage, can fundamentally solve the problems existing in the previous polishing method, and meets the development requirements of the development of modern science and technology on the semiconductor material substrate.
Magnetorheological finishing has enabled the fabrication of ultra-smooth surface planar optical elements, including third generation semiconductor materials, but with smaller dimensions of the planar optical elements that can be fabricated. Most of the existing magnetorheological polishing technologies are point-shaped polishing, the removal efficiency can reach hundreds of nm per minute, and workpieces with ultra-smooth surfaces can be manufactured. The point-by-point and surface processing mode is used for processing large-aperture planar optical elements, and although magnetorheological polishing has high removal efficiency, the point-by-surface processing mode is assisted by the auxiliary multi-dimensional motion and the residence time cooperative control, so that the large-area polishing process is complex and low in efficiency. There are also cluster magnetorheological polishing technologies, such as patents CN202010618758.7, CN201710628330.9, and CN202011530282.8, which can be used for processing large-sized planar optical elements, but a large-sized permanent magnet grinding disc needs to be manufactured, however, increasing the processing efficiency of the planar optical elements requires increasing the rotation speed of the grinding disc, and under the condition of meeting the requirement of the motion structure stability of equipment, the requirements on equipment manufacturing are extremely strict, and the cost is also very high.
Therefore, how to provide a point cloud alternating magnetorheological polishing device and method is a problem that needs to be solved urgently by the technical personnel in the field.
Disclosure of Invention
In order to achieve the purpose, the invention adopts the following technical scheme:
based on the problems, the invention provides a point cloud alternating magnetorheological polishing device and a point cloud alternating magnetorheological polishing method.
In order to realize the technical effects, the invention adopts the technical scheme that:
a point cloud alternating magnetorheological finishing device comprising:
the tool is disc-shaped, and the center of the tool is connected with a rotating shaft;
the plane optical element and the tool are coaxially arranged and connected to the bottom surface of the tool;
the bottom end of the flexible polishing die is movably arranged on the non-magnetic material-conducting supporting plate, and the top of the flexible polishing die is in contact with the bottom surface of the planar optical element;
the electromagnet magnetic field source comprises a plurality of electromagnets arranged in an array, the electromagnets are fixed to the bottom surface of the non-magnetic-conductive material supporting plate, and two adjacent electromagnets are connected in series through copper wires.
Furthermore, the electromagnet comprises an electromagnetic iron magnetic core and a copper coil, wherein the copper coil is arranged on the electromagnetic iron magnetic core in a winding mode, and two copper wires are reserved at two ends of the copper coil and are connected in series.
Furthermore, the non-magnetic material supporting plate is made of ceramic, glass, metal aluminum, metal copper and the like.
Furthermore, the flexible polishing die comprises a first permanent magnet, a second permanent magnet, a magnetic conduction block and magnetized magnetorheological polishing liquid, the first permanent magnet and the second permanent magnet are connected to the magnetic conduction block through magnetic attraction, and the top of the first permanent magnet and the top of the second permanent magnet are connected with the magnetorheological polishing liquid.
A point cloud alternating magnetorheological polishing method comprises the following steps:
the method comprises the following steps: switching on square wave current to the electromagnet magnetic field sources, and sequentially generating magnetic fields by the electromagnet magnetic field sources;
step two: the flexible polishing mould is attracted above an electromagnet magnetic field source generating a magnetic field under the attraction of the magnetic field, and can rapidly move along the sequence of the magnetic field generated by the electromagnet under the attraction of the electromagnet magnetic field;
step three: the flexible polishing die and the surface of the planar optical element have relative motion to form shearing force, so that the aim of plastically removing the material of the planar optical element is fulfilled;
step four: simultaneously, in order to increase the complexity of the motion trail, the planar optical element is fixedly arranged on the tool, and the tool can rotate at a certain speed.
Further, the second step further comprises: a plurality of flexible polishing moulds are arranged in a cloud-like manner, the running track is complicated according to the arrangement mode of the electromagnet magnetic field sources, the flexible polishing moulds are prevented from colliding in the running process, and point cloud alternating magnetorheological polishing is realized.
According to the technical scheme, compared with the prior art, the permanent magnet is used as an excitation source of the point-shaped polishing die, namely, after the magnetorheological polishing liquid is added to the permanent magnet in the N level or the S level, the flexible polishing die can be formed, has a stable removal function, and can be used for forming deterministic removal on the surface of the planar optical element.
An electromagnet is used as an excitation source for driving the flexible polishing die to move, so that the traditional mechanical transmission motion is replaced.
Within the size range of the planar optical element to be machined, a series of small-size electromagnet magnetic field sources are arranged in an array mode, coils of the magnetic field sources are connected in series, the electromagnet magnetic field sources arranged in the array mode are controlled by square wave current, the electromagnets generate magnetic fields according to time sequence, the flexible polishing die can rapidly move along the sequence of the magnetic fields generated by the electromagnets under the attraction of the electromagnet magnetic fields, and then the flexible polishing die and the surface of the planar optical element have relative motion to form shearing force, so that the purpose of plastically removing the planar optical element is achieved. Meanwhile, in order to increase the complexity of the motion trail, the planar optical element is fixedly arranged on the clamp, and the clamp can rotate at a certain speed. In a similar way, a plurality of flexible polishing dies can be arranged, the arrangement is similar to a cloud shape, the arrangement mode of the operation track according to the electromagnet magnetic field source can be complicated, and point cloud alternating magnetorheological polishing can be realized as long as the plurality of flexible polishing dies are ensured not to collide in the operation process.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the embodiments or the prior art descriptions will be briefly described below, it is obvious that the drawings in the following description are only embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the provided drawings without creative efforts.
FIG. 1 is a schematic structural view of a single flexible polishing mold point cloud alternating magnetorheological polishing device;
FIG. 2 is a front view of a single flexible polishing mold point cloud alternating magnetorheological polishing apparatus;
FIG. 3 is a schematic view of a point cloud alternating magnetorheological polishing apparatus with a plurality of flexible polishing molds;
FIG. 4 is a schematic diagram of an electromagnet;
fig. 5 is a schematic structural diagram of a flexible polishing mold.
Wherein:
1-assembling; 2-a planar optical element; 3-flexible polishing mould; 4-a non-magnetically permeable material support plate; 5-an electromagnet magnetic field source; 6-electromagnetic iron magnetic core; 7-a copper coil; 31-a first permanent magnet; 32-a second permanent magnet; 33-a third permanent magnet; 34-magnetized magnetorheological polishing fluid.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
In the description of the present invention, it is to be understood that the terms "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc., indicate orientations or positional relationships based on those shown in the drawings, and are only for convenience of description and simplicity of description, but do not indicate or imply that the referenced devices or elements must have a particular orientation, be constructed and operated in a particular orientation, and thus, are not to be construed as limiting the present invention.
Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of the present invention, "a plurality" means two or more unless specifically defined otherwise.
In the present invention, unless expressly stated or limited otherwise, the recitation of a first feature "on" or "under" a second feature may include the recitation of the first and second features being in direct contact, and may also include the recitation that the first and second features are not in direct contact, but are in contact via another feature between them. Also, the first feature being "on," "above" and "over" the second feature includes the first feature being directly on and obliquely above the second feature, or merely indicating that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature includes the first feature being directly under and obliquely below the second feature, or simply meaning that the first feature is at a lesser elevation than the second feature.
The embodiment of the invention discloses a point cloud alternating magneto-rheological polishing device and a point cloud alternating magneto-rheological polishing method, wherein the point cloud alternating magneto-rheological polishing device comprises the following steps: the flexible polishing mould comprises a permanent magnet magnetic field source and an electromagnet magnetic field source, wherein the permanent magnet magnetic field source and the electromagnet magnetic field source are used for driving the flexible polishing mould to move, and the flexible polishing moulds are arranged to realize cloud distribution and polishing simultaneously. Specifically, the method comprises the following steps:
the tool 1 is disc-shaped, the center of the tool 1 is connected with a rotating shaft, and the tool can rotate under the drive of a motor;
the planar optical element 2 is coaxially arranged with the tool 1, is connected to the bottom surface of the tool 1, and is fixedly installed on the tool 1 in an adhesive manner if the planar optical element 2 is connected to the bottom surface of the tool 1;
the bottom end of the flexible polishing die 3 is movably arranged on the non-magnetic material-conducting supporting plate 4, and the top of the flexible polishing die 3 is contacted with the bottom surface of the planar optical element 2; the supporting plate 4 made of non-magnetic material can be made of materials which are not easy to deform, such as ceramic, glass, metal aluminum, metal copper and the like, and has the thickness as small as possible;
and the electromagnet magnetic field source 5 comprises a plurality of electromagnets arranged in an array, the electromagnets are fixed on the bottom surface of the non-magnetic material supporting plate 4, and two adjacent electromagnets are connected in series through copper wires. Specifically, the electromagnet comprises an electromagnet magnetic core 6 and a copper coil 7, and the copper coil 7 is installed on the electromagnet magnetic core 6 in a winding mode.
As shown in fig. 2, the point cloud alternating magnetorheological polishing devices with a plurality of flexible polishing molds are different from the point cloud alternating magnetorheological polishing device with a single flexible polishing mold in that the number of the flexible polishing molds is multiple, and as long as the flexible polishing molds do not collide in the movement process, the flexible polishing molds can be distributed in multiple rows as much as possible.
The flexible polishing die 3 comprises a first permanent magnet 31, a second permanent magnet 32, a magnetic conduction block 33 and magnetized magnetorheological polishing liquid 34, the first permanent magnet 31 and the second permanent magnet 32 are connected to the magnetic conduction block 33 through magnetic attraction, and the top parts of the first permanent magnet 31 and the second permanent magnet 32 are connected with the magnetorheological polishing liquid 34.
The first permanent magnet 31 is attracted to the magnetic conduction block 33 due to the existence of the magnetic field, and the second permanent magnet 32 is attracted to the first permanent magnet 31 and the magnetic conduction block 33 simultaneously due to the principle that the magnetic fields attract each other in opposite directions. After the magnetorheological fluid is placed on the upper surfaces of the first permanent magnet 31 and the second permanent magnet 32, magnetized magnetorheological polishing fluid 34 is formed.
The first permanent magnet 31 and the second permanent magnet 32 can be square, cylindrical or irregular, and the permanent magnet can be variously changed in shape as long as the splicing combination is performed by the method of the present invention.
A point cloud alternating magneto-rheological polishing method comprises the following steps:
the method comprises the following steps: switching on square wave current to an electromagnet magnetic field source, and sequentially generating magnetic fields by the electromagnet magnetic field source;
step two: the flexible polishing mould is attracted above an electromagnet magnetic field source generating a magnetic field under the attraction of the magnetic field, and can rapidly move along the sequence of the magnetic field generated by the electromagnet under the attraction of the electromagnet magnetic field;
step three: the flexible polishing die and the surface of the planar optical element have relative motion to form shearing force, so that the aim of plastically removing the material of the planar optical element is fulfilled;
step four: simultaneously, in order to increase the complexity of the motion trail, the planar optical element is fixedly arranged on the tool, and the tool can rotate at a certain speed.
Advantageously, in the second step, a plurality of flexible polishing dies can be arranged in a cloud-like arrangement manner, the running track can be complicated according to the arrangement manner of the electromagnet magnetic field sources, and point cloud alternating magnetorheological polishing can be realized as long as the flexible polishing dies are not collided in the running process.
The embodiments in the present description are described in a progressive manner, each embodiment focuses on differences from other embodiments, and the same and similar parts among the embodiments are referred to each other. The device disclosed by the embodiment corresponds to the method disclosed by the embodiment, so that the description is simple, and the relevant points can be referred to the method part for description.
The previous description of the disclosed embodiments is provided to enable any person skilled in the art to make or use the present invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the generic principles defined herein may be applied to other embodiments without departing from the spirit or scope of the invention. Thus, the present invention is not intended to be limited to the embodiments shown herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.
Claims (5)
1. A point cloud alternating magnetorheological polishing device is characterized by comprising:
the tool (1) is disc-shaped, and the center of the tool (1) is connected with a rotating shaft;
the plane optical element (2) is coaxially arranged with the tool (1) and is connected to the bottom surface of the tool (1);
the bottom end of the flexible polishing die (3) is movably arranged on the non-magnetic-conductive material supporting plate (4), and the top of the flexible polishing die (3) is in contact with the bottom surface of the planar optical element (2); the flexible polishing die (3) comprises a first permanent magnet (31), a second permanent magnet (32), a magnetic conduction block (33) and magnetized magnetorheological polishing liquid (34), the first permanent magnet (31) and the second permanent magnet (32) are connected to the magnetic conduction block (33) in an attracting mode through magnetic force, and the magnetorheological polishing liquid (34) is connected to the tops of the first permanent magnet (31) and the second permanent magnet (32);
the electromagnet magnetic field source (5) comprises a plurality of electromagnets arranged in an array, the electromagnets are fixed to the bottom surface of the non-magnetic-conductive material supporting plate (4), and two adjacent electromagnets are connected in series through copper wires.
2. The point cloud alternating magnetorheological finishing device according to claim 1, wherein the electromagnet comprises an electromagnet core (6) and a copper coil (7), and the copper coil (7) is wound on the electromagnet core (6).
3. The point cloud alternating magnetorheological finishing device according to claim 1, wherein the non-magnetic material supporting plate (4) is made of ceramic, glass, aluminum metal or copper metal.
4. A polishing method using the point cloud alternating magnetorheological polishing apparatus according to any one of claims 1 to 3, comprising the steps of:
the method comprises the following steps: switching on square wave current to an electromagnet magnetic field source, and sequentially generating magnetic fields by the electromagnet magnetic field source;
step two: the flexible polishing mould is attracted above an electromagnet magnetic field source generating a magnetic field under the attraction of the magnetic field, and can rapidly move along the sequence of the magnetic field generated by the electromagnet under the attraction of the electromagnet magnetic field;
step three: the flexible polishing die and the surface of the planar optical element have relative motion to form shearing force, so that the aim of plastically removing the material of the planar optical element is fulfilled;
step four: simultaneously, in order to increase the complexity of the motion trail, the planar optical element is fixedly arranged on the tool, and the tool can rotate at a certain speed.
5. The polishing method of the point cloud alternating magnetorheological polishing device according to claim 4, wherein the second step further comprises the following steps: a plurality of flexible polishing molds are arranged.
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| CN202110873692.0A CN113561035B (en) | 2021-07-30 | 2021-07-30 | Point cloud alternating magnetorheological polishing device and method |
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| CN202110873692.0A CN113561035B (en) | 2021-07-30 | 2021-07-30 | Point cloud alternating magnetorheological polishing device and method |
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| CN113561035B true CN113561035B (en) | 2023-04-11 |
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| CN107378651A (en) * | 2017-08-04 | 2017-11-24 | 北京交通大学 | A kind of magnetorheological plane polishing device |
| CN207564218U (en) * | 2017-06-30 | 2018-07-03 | 浙江师范大学 | A kind of magnetorheological floating burnishing device |
| CN110281085A (en) * | 2019-07-25 | 2019-09-27 | 广东工业大学 | A kind of magnetorheological grinding and polishing device of cluster and its application method |
| CN111283543A (en) * | 2020-03-27 | 2020-06-16 | 台州学院 | Complex mold surface polishing device |
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2021
- 2021-07-30 CN CN202110873692.0A patent/CN113561035B/en active Active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005040944A (en) * | 1993-06-04 | 2005-02-17 | Byelocorp Scientific Inc | Magnetorheological polishing device and method |
| CN103273385A (en) * | 2013-06-09 | 2013-09-04 | 湖南大学 | Surface contact magneto-rheological flat polishing device and method with uniform magnetic field |
| CN106826411A (en) * | 2017-02-21 | 2017-06-13 | 广东工业大学 | A kind of actuated by cams magnet type magneto-rheological fluid dynamic pressure burnishing device and polishing method |
| CN207564218U (en) * | 2017-06-30 | 2018-07-03 | 浙江师范大学 | A kind of magnetorheological floating burnishing device |
| CN107378651A (en) * | 2017-08-04 | 2017-11-24 | 北京交通大学 | A kind of magnetorheological plane polishing device |
| CN110281085A (en) * | 2019-07-25 | 2019-09-27 | 广东工业大学 | A kind of magnetorheological grinding and polishing device of cluster and its application method |
| CN111283543A (en) * | 2020-03-27 | 2020-06-16 | 台州学院 | Complex mold surface polishing device |
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