CN113433801B - Laser energy uniformity correction method and device - Google Patents
Laser energy uniformity correction method and device Download PDFInfo
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- CN113433801B CN113433801B CN202110691376.1A CN202110691376A CN113433801B CN 113433801 B CN113433801 B CN 113433801B CN 202110691376 A CN202110691376 A CN 202110691376A CN 113433801 B CN113433801 B CN 113433801B
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70558—Dose control, i.e. achievement of a desired dose
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
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- G—PHYSICS
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/7065—Defects, e.g. optical inspection of patterned layer for defects
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Abstract
The invention discloses a method and a device for correcting energy uniformity of a laser, wherein the method comprises the following steps: acquiring a test sample image, wherein the test sample image is obtained by controlling a close-spaced laser to expose an exposure medium; confirming whether exposure defects exist according to the test sample drawing, and controlling each laser to independently expose the exposure medium according to the exposure direction when the exposure defects exist; and determining the laser with the problem according to the exposure result of each laser and compensating the laser. The invention can correct the laser with non-uniform energy in the close-packed laser, so that the energy of the laser is in a uniform range, thereby improving the image printing quality.
Description
Technical Field
The invention relates to the technical field of lasers, in particular to a laser energy uniformity correction method and device capable of correcting laser energy.
Background
The printing plate making technology goes through type typesetting, photomechanical making, electronic color separation plate making, laser phototypesetting plate making (CTF technology), computer-to-plate (CTP technology). With the continuous development of the CTP technology, the kinds of CTP devices are increasing, such as inner drum CTP devices, outer drum CTP devices, and flat-bed CTP devices. The CTP device is a light processing device adopting a light source close-packed technology, which generally refers to a structure in which a plurality of light sources are arranged in one or more rows, and the imaging light spots finally formed by the structure are in a straight line and generate a strip-shaped light processing image during light processing.
Currently, when CTP equipment processes an exposure medium, each laser correspondingly outputs a light source, and each light source corresponds to an exposure point. However, due to the differences in the manufacturing processes of the lasers and the differences in the driving capabilities of the driving circuits corresponding to each laser, the power output by different lasers under the same parameter condition is prone to be different, and the final result of the differences is that the laser energy is different. In the prior art, the difference of laser energy cannot be accurately controlled through a production process, and the energy difference of the laser is usually improved by adjusting the current of the laser. However, in these lasers, the current may be adjusted too much, resulting in large energy of the laser and resulting in the final dot overexposure phenomenon, or the current may be adjusted too little, resulting in small energy of the laser and resulting in incomplete final dot exposure. The final print quality is affected due to the non-uniformity of the laser energy. Therefore, how to determine and correct the problematic laser is an urgent problem to be solved.
Disclosure of Invention
The invention aims to provide a laser energy uniformity correction method, which can determine a laser with problems and correct the laser so as to enable the energy of the laser to be uniform and improve the image quality. The invention also discloses a device for realizing the method for correcting the energy uniformity of the laser.
In order to achieve the above object, the present invention provides a method for correcting energy uniformity of a laser, the method comprising the following steps:
acquiring a test sample image, wherein the test sample image is obtained by controlling a close-spaced laser to expose an exposure medium;
confirming whether exposure defects exist according to the test sample drawing, and controlling each laser to independently expose the exposure medium according to the exposure direction when the exposure defects exist;
and determining the laser with the problem according to the exposure result of each laser and compensating the laser.
Preferably, the test pattern comprises a dot test pattern, and the dot test pattern is obtained by controlling a close-packed laser to expose an exposure medium according to the following steps:
dividing every N multiple lasers in the close-packed lasers into a group and controlling the light and dark alternate arrangement of the multiple groups of lasers;
and controlling the closely-spaced lasers to expose the exposure medium along the exposure direction, and after each step is performed for N times, alternately changing the brightness and the darkness of each group of lasers, wherein N is an integer greater than or equal to 1.
Preferably, the test pattern comprises a line test pattern, and the line test pattern is obtained by controlling a close-packed laser to expose an exposure medium through the following steps:
dividing every N multi-channel lasers in the close-packed lasers into one group and controlling the alternation of light and dark of a plurality of groups of lasers;
and controlling a close-packed laser to carry out exposure treatment on the exposure medium along an exposure direction, wherein N is an integer greater than or equal to 1.
Preferably, the test pattern further includes a dot test pattern and a line test pattern, wherein the dot test pattern is obtained by controlling a close-packed laser to expose an exposure medium, and the method includes the following steps:
dividing every N multiple lasers in the close-packed lasers into a group and controlling the light and dark alternate arrangement of the multiple groups of lasers;
controlling the closely-spaced lasers to expose the exposure medium along the exposure direction, and after each step is performed for N times, alternately changing the brightness and the darkness of each group of lasers;
the line test sample is obtained by controlling a close-packed laser to expose an exposure medium through the following steps:
dividing every N multi-path lasers in the close-packed lasers into one group and controlling the alternation of light and dark of a plurality of groups of lasers;
and controlling a close-packed laser to carry out exposure treatment on the exposure medium along an exposure direction, wherein N is an integer greater than or equal to 1.
Preferably, the confirming whether the exposure defect exists according to the test pattern comprises:
and judging whether the positions of incomplete exposure or vertical stripes exist in the test sample image, and determining that the test sample image has exposure defects when the positions exist.
Preferably, the laser for which the problem is determined according to the exposure result of each laser comprises:
and judging whether the width of an exposure image formed by the exposure of each laser is matched with the theoretical width value or not, and determining that the laser has the problem of uneven energy when the width of the exposure image is not matched with the theoretical width value.
Preferably, compensating the laser comprises:
acquiring the current value of the laser in real time;
and judging whether the current value is matched with the current value of the normal laser, and adjusting the current of the laser when the current value is not matched with the current value of the normal laser until the current value acquired in real time is matched with the current value of the normal laser.
Preferably, the adjusting the current of the laser comprises:
the present current value is added or subtracted to the stepped current value.
Preferably, the exposure direction is selected from one of a direction of rotation of the exposure medium and a direction of translation of the exposure medium.
The invention also discloses a laser energy uniformity correction device, which comprises
The judging module is used for confirming whether the exposure defect exists according to the test sample;
the control module is used for controlling each laser to independently carry out exposure treatment on the exposure medium according to the exposure direction when the judging module judges that the exposure defect exists;
and the compensation module is used for determining the laser with the problem according to the exposure result of each path of laser and compensating the laser.
The invention has the beneficial effects that:
the invention firstly carries out exposure treatment on the exposure medium by controlling the closely-spaced lasers to obtain a test sample drawing, and then controls each path of laser in the closely-spaced lasers to respectively carry out exposure treatment on the exposure medium when the existence of exposure defects is confirmed according to the test sample drawing so as to determine which lasers need to carry out energy compensation and carry out compensation treatment on the lasers, and finally the energy of the lasers is in a uniform range, thereby improving the image printing quality.
Drawings
FIG. 1 is a flow chart of a method for laser energy uniformity correction in accordance with the present invention;
FIG. 2 is a schematic diagram of the arrangement of multiple closely spaced lasers;
FIG. 3 is a schematic diagram of a first dot test pattern;
FIG. 4 is a schematic diagram of a second dot test pattern;
FIG. 5 is a schematic view of a first sample line test;
FIG. 6 is a schematic view of a second line test sample;
FIG. 7 is a schematic diagram of each laser exposing the exposure medium;
FIG. 8 is a schematic view of the exposure direction of a closely-spaced laser;
FIG. 9 is a block diagram of a laser energy uniformity correction apparatus according to the present invention.
Detailed Description
The technical solution of the embodiment of the present invention will be clearly and completely described below with reference to the accompanying drawings of the present invention.
The invention discloses a laser energy uniformity correction method, which comprises the steps of firstly carrying out exposure treatment on an exposure medium by controlling closely-spaced lasers to obtain a test sample drawing, and then controlling each path of laser in the closely-spaced lasers to respectively carry out exposure treatment on the exposure medium when the existence of exposure defects is confirmed according to the test sample drawing to determine which lasers need to carry out energy compensation and carry out compensation treatment on the lasers, so that the energy of the lasers is finally in a uniform range, and further the image printing quality is improved.
As shown in fig. 1, a method for calibrating energy uniformity of a laser disclosed in the invention comprises the following steps:
s100, obtaining a test sample image, wherein the test sample image is obtained by controlling a closely-spaced laser to expose an exposure medium;
in particular, the test pattern can be used to detect the energy uniformity of the laser. In implementation, the test sample image is observed to check whether the position of the exposure defect, such as incomplete exposure or vertical stripes, exists in the test sample image. When a certain position in the test sample image has an exposure defect, the problem that one or more lasers in the close-spaced lasers have non-uniform energy is shown. The test pattern herein includes a dot test pattern and/or a line test pattern, wherein, as shown in fig. 3 and 4, the dot test pattern refers to an exposure image formed on an exposure medium in a dot shape, and a shaded portion indicates the exposure image formed by exposure; as shown in fig. 5 and 6, the line test pattern means that the exposure image formed on the exposure medium is in the form of a line, and the hatched portion indicates the exposure image formed by exposure. The lattice point test sample pattern and the line test sample pattern can be obtained by controlling the close-spaced laser to expose the exposure medium.
And S200, determining whether exposure defects exist according to the test sample, and controlling each laser to independently perform exposure processing on the exposure medium according to the exposure direction when the exposure defects exist.
Specifically, after the test pattern is acquired, the test pattern is observed to determine whether a certain position in the test pattern has an exposure defect. When a problem that a certain position in the test pattern has an exposure defect is found, each path of laser in the close-packed lasers is controlled to independently expose the exposure medium according to the exposure direction, that is, in the close-packed lasers, only one path of laser exposes the exposure medium according to the exposure direction each time until each path of laser exposes the exposure medium, as shown in fig. 7. The exposure direction here is selected from one of the exposure medium rotation direction and the exposure medium translation direction, and as shown in fig. 8, for a drum CTP device, since the exposure medium is wound on a drum, when the laser L exposes the exposure medium, the exposure medium rotates along with the rotation of the drum, and thus the exposure direction is the exposure medium rotation direction w; and for the platform type CTP device, because the exposure medium is translated, the exposure direction is the translation direction w of the exposure medium.
And S300, determining the lasers with problems according to the exposure result of each laser and compensating the lasers.
Specifically, after each laser exposes the exposure medium, it can be determined whether the laser has the problem of energy nonuniformity according to the exposure result of each laser. For the laser with the problem, compensation processing is carried out on the laser so that the energy uniformity of the close-packed laser meets the requirement.
In this embodiment, the method for correcting the energy uniformity of a laser according to the present invention is described in detail in three embodiments:
example one
In this embodiment, the method for correcting the energy uniformity of the laser according to the present invention is described in detail by taking the test pattern as a dot test pattern as an example. A method for correcting the energy uniformity of a laser comprises the following steps:
s100', acquiring a dot test sample image, wherein the dot test sample image is obtained by controlling a closely-spaced laser to expose an exposure medium;
specifically, as described above, the dot test pattern refers to a test pattern in which an exposure image formed on an exposure medium is dotted. The energy uniformity of the laser in the close-packed laser can be preliminarily detected through the lattice point test pattern. In this embodiment, the dot test pattern is obtained through the following steps:
firstly, dividing every N multiple lasers in the close-packed lasers into one group and controlling the light and dark of multiple groups of lasers to be alternately arranged, as shown in fig. 2, the close-packed lasers comprise 96 lasers and are linearly arranged, the 96 lasers in the close-packed lasers can be divided into 96 groups, each group of 1 laser is arranged from left to right, as shown in fig. 2, the 1 st group of lasers are light, the 2 nd group of lasers are dark, the 3 rd group of lasers are light, and so on, the 96 th group of lasers are dark, and the light and the dark are alternately arranged in the 96 groups of lasers. Of course, in the above 96-channel laser, it can be divided into 48 groups, each group includes 2 channels, and from left to right direction shown in fig. 2, 2 lasers in the 1 st group of lasers are all bright, 2 lasers in the 2 nd group of lasers are all dark, and so on, 2 lasers in the 48 th group of lasers are all dark. During implementation, the lasers can be grouped according to actual requirements, and the light and dark sequences of the multiple groups of lasers can be realized.
Finally, controlling the closely-spaced lasers to expose the exposure medium along the exposure direction, and after each step is performed for N times, alternately changing the brightness and the darkness of each group of lasers, for example, the closely-spaced lasers comprise 96 paths of lasers, and dividing the 96 paths of lasers in the closely-spaced lasers into 96 groups, so that the 1 st group of lasers are bright, the 2 nd group of lasers are dark, the 3 rd group of lasers are bright, and the like, and the 96 th group of lasers are dark initially from left to right; after stepping 1 time in the exposure direction, each set of lasers alternates light and dark, i.e.: the 1 st group of lasers are changed from bright to dark, the 2 nd group of lasers are changed from dark to bright, the 3 rd group of lasers are changed from bright to dark, and the like, and the 96 th laser is changed from dark to bright. When stepping 1 more time in the exposure direction, each set of lasers continues to alternate light and dark, i.e.: the group 1 lasers are changed from dark to light, the group 2 lasers are changed from light to dark, the group 3 lasers are changed from dark variables, and so on, and the group 96 lasers are changed from light to dark. For another example, the 96 lasers in the close-packed lasers are divided into 48 groups, and as can be seen from the above, initially, from left to right, 2 lasers in the 1 st group of lasers are bright, 2 lasers in the 2 nd group of lasers are dark, 2 lasers in the 3 rd group of lasers are dark, and so on, 2 lasers in the 48 th group of lasers are dark. After stepping 1 time in the exposure direction, each set of lasers does not alternate light and dark. After stepping 2 times along the exposure direction, each group of lasers alternately changes light and dark, 2 lasers in the 1 st group of lasers change from light to dark after stepping 2 times, 2 lasers in the 2 nd group of lasers change from dark to light after stepping 2 times, 2 lasers in the 3 rd group of lasers change from light to dark after stepping 2 times, and so on, and 2 lasers in the 48 th group of lasers change from dark to light after stepping 2 times.
Through the process, the test sample of the network points can be obtained. In this embodiment, the dot test pattern includes a first dot test pattern and a second dot test pattern, where the first dot test pattern is obtained by grouping 1 of multiple lasers in a close-packed laser, and controlling the close-packed laser to expose the exposure medium according to the method. The second dot test pattern is obtained by grouping 2 multi-path lasers in the close-packed lasers and controlling the close-packed lasers to expose the exposure medium according to the method.
S200', determining whether an exposure defect exists according to the dot test pattern, and controlling each laser to independently expose the exposure medium according to the exposure direction when the exposure defect exists.
Specifically, after the halftone dot test pattern is acquired, whether the position of incomplete exposure, that is, the position of an exposure defect, exists in the halftone dot test pattern is determined by observing the halftone dot test pattern. In practice, either one of the first halftone test pattern and the second halftone test pattern may be selected to observe the position of the exposure defect, or the two may be combined to determine the position of the exposure defect.
When the position of the exposure defect in the dot test pattern is determined, which one or more lasers have the problem of larger energy deviation needs to be further determined, and at the moment, each laser needs to be controlled to independently expose the exposure medium according to the exposure direction. In the embodiment, as shown in fig. 7, in the close-packed laser, 1 laser is controlled to expose the exposure medium in the exposure direction each time until all the lasers expose the exposure medium in the exposure direction. For example, the close-packed laser comprises 96 lasers, and the 1-path laser can be controlled to expose the exposure medium along the exposure direction each time according to the sequence from left to right, that is, after the 1 st-path laser is exposed, the 2 nd-path laser is controlled to expose until the 96 th-path laser completes exposure. By controlling the 1 path of laser to carry out exposure treatment on the exposure medium each time, the interference of other paths of lasers can be avoided, and the accuracy of identification is improved.
And S300', determining the laser with the problem according to the exposure result and compensating the laser.
Specifically, after each laser exposes the exposure medium, the exposure result of each laser can be used to determine whether the laser has the problem of energy nonuniformity. In practice, the existence of the unevenness of the laser can be determined by the width of the exposure image formed by exposing the laser on the exposure medium. When the width of the exposure image is not matched with the theoretical value, the problem that the energy of the laser of the path is uneven is shown, if the width of the exposure image is larger than the theoretical value, the problem that the energy of the laser of the path is larger is shown, and otherwise, the problem that the energy of the laser of the path is smaller is shown. If the close-packed laser comprises 96 lasers, the total size of the light spot is 960um, so that the exposure width of each laser is 10 um. During implementation, whether the width of the exposure image of each laser is equal to 10um matching or not can be judged, and if not, the problem of energy non-uniformity of the laser is indicated.
When the laser energy is determined to have a deviation, energy compensation processing needs to be carried out on the laser so as to realize laser correction. Generally, the energy of the laser is related to the current, and the energy of the laser can be adjusted by adjusting the current. When energy compensation is carried out on the laser, firstly, the current value of the laser is obtained in real time, secondly, the obtained current value is compared with the current value of the normal laser, and when the current value is not matched with the current value of the normal laser, the current is adjusted until the current value is the same as the current value of the normal laser, and if the current value obtained in real time is larger than the current value of the normal laser, the current is further reduced until the current value is the same as the current value of the normal laser. During implementation, the current value of the laser and the current magnitude of the laser can be obtained through the corresponding circuit and the upper computer software, and the current value and the stepping current value are added or subtracted when the current magnitude is adjusted, wherein the stepping current value is the product of the current value and a preset percentage, and of course, the stepping current value can also be a fixed value. By the compensation method, the lasers with problems are compensated until the width of the exposure image of each laser is matched with a theoretical value, so that the energy uniformity correction of the lasers is realized, and the quality of the printed image is improved.
Example two
In this embodiment, the method for calibrating the energy uniformity of the laser according to the present invention is described in detail by taking the test pattern as a line test pattern as an example. A method for correcting the energy uniformity of a laser comprises the following steps:
s100', obtaining a line test sample image, wherein the line test sample image is obtained by controlling a closely-spaced laser to expose an exposure medium;
specifically, as described above, the line test pattern refers to a test pattern in which an exposure image formed on an exposure medium is in the form of a line. The energy uniformity of the closely-spaced laser can be detected through the line test pattern. In this embodiment, the line test pattern is obtained by the following steps:
firstly, dividing every N multiple lasers in the close-packed lasers into one group and controlling the light and dark alternation of multiple groups of lasers, for example, the close-packed lasers comprise 96 lasers, the 96 lasers in the close-packed lasers can be divided into 96 groups, each group of 1 laser is arranged from left to right direction shown in figure 2, the 1 st group of lasers are light, the 2 nd group of lasers are dark, the 3 rd group of lasers are light, and so on, the 96 th group of lasers are dark, and the light and the dark are arranged alternately in the 96 groups of lasers. Of course, in the above 96-channel laser, it can be divided into 48 groups, each group includes 2 channels, and from left to right direction shown in fig. 2, 2 lasers in the 1 st group of lasers are all bright, 2 lasers in the 2 nd group of lasers are all dark, and so on, 2 lasers in the 48 th group of lasers are all dark. During implementation, the lasers can be grouped according to actual requirements, and the light and dark sequences of the multiple groups of lasers can be realized.
And finally, controlling the closely-spaced lasers to carry out exposure treatment on the exposure medium along the exposure direction, for example, taking the closely-spaced lasers including 96 lasers as an example, dividing the 96 lasers in the closely-spaced lasers into 96 groups, and as can be seen from the above, initially, from left to right, the 1 st group of lasers are bright, the 2 nd group of lasers are dark, the 3 rd group of lasers are bright, and so on, the 96 th group of lasers are dark. After stepping 1 time along the exposure direction, each group of lasers do not alternate bright and dark and still keep the original state, namely: the 1 st group of lasers still become bright, the 2 nd group of lasers still become dark, the 3 rd group of lasers still become bright, and so on, the 96 th laser still becomes dark. Until exposure is completed on the exposure medium. For another example, the 96 lasers in the close-packed lasers are divided into 48 groups, and as can be seen from the above, initially, from the left to the existing direction, 2 lasers in the 1 st group of lasers are bright, 2 lasers in the 2 nd group of lasers are dark, 2 lasers in the 3 rd group of lasers are dark, and so on, 2 lasers in the 48 th group of lasers are dark, and after stepping 1 time along the exposure direction, each group of lasers do not alternate bright and dark, and after stepping 2 times along the exposure direction, each group of close-packed lasers still do not alternate bright and dark, that is, unlike the first embodiment, each group of lasers do not alternate bright and dark after stepping N times.
In this embodiment, the line test sample pattern includes a first line test sample pattern and a second line test sample pattern, where the first line test sample pattern is obtained by grouping 1 of multiple lasers in the close-packed laser, and controlling the close-packed laser to expose the exposure medium according to the above method. The second line test sample pattern was obtained by grouping multiple lasers in a close-packed laser into a group of 2 and controlling the close-packed laser to expose the exposure medium in the manner described above.
And S200', determining whether an exposure defect exists according to the line test sample, and controlling each laser to independently expose the exposure medium according to the exposure direction when the exposure defect exists.
Specifically, after the line test sample diagram is obtained, the line test sample diagram is observed to determine whether a vertical line exists at a certain position in the line test sample diagram, that is, whether an exposure defect exists at the position. In practice, either one of the first and second line test sample patterns may be selected to observe the location of the exposure defect thereon, or both may be combined to determine the location of the exposure defect.
After the positions of the exposure defects in the dot test pattern are determined, which laser or lasers have the problem of large energy deviation needs to be further determined. For how to determine which laser or lasers have a larger energy deviation, see embodiment one, and are not described in detail herein.
And S300', determining the laser with the problem according to the exposure result and compensating the laser.
Specifically, how to determine the laser with the problem and how to compensate the laser according to the exposure result are described in the first embodiment, and details are not repeated herein.
EXAMPLE III
In this embodiment, the method for correcting the energy uniformity of the laser according to the present invention is described in detail by taking a test pattern as a dot test pattern and a line test pattern as examples. A method for correcting the energy uniformity of a laser comprises the following steps:
s100' ″, acquiring a network point test sample image and a line test sample image, wherein the network point test sample image and the line test sample image are both obtained by controlling a close-packed laser to expose an exposure medium;
specifically, as described above, the dot test pattern refers to a test pattern in which an exposure image formed on an exposure medium is dotted; the line test pattern is a test pattern in which an exposure image formed on an exposure medium is in the form of a line. The energy uniformity of the laser in the close-packed laser can be preliminarily detected through the lattice point test sample pattern and the line test sample pattern. The details of how to obtain the dot test pattern by controlling the close-packed laser to expose the exposure medium are not described in embodiment one, and meanwhile, the details of how to obtain the line test pattern by controlling the close-packed laser to expose the exposure medium are also described in embodiment two.
S200', whether exposure defects exist is confirmed according to the dot test sample drawing and the line test sample drawing, and when the exposure defects exist, each laser is controlled to independently expose the exposure medium according to the exposure direction.
Specifically, after the dot test pattern and the line test pattern are obtained, whether vertical stripes or positions with incomplete exposure, that is, positions with exposure defects, exist in the dot test pattern and/or the line test pattern is determined by observing the dot test pattern and the line test pattern. In the implementation, at least one of the first dot test sample image and the second dot test sample image and at least one of the first line test sample image and the second line test sample image can be selected to observe whether the position of the exposure defect exists, and in the implementation, the first dot test sample image, the second dot test sample image, the first line test sample image and the second line test sample image are simultaneously selected to observe whether the exposure defect exists optimally.
And S300, determining the laser with the problem according to the exposure result and compensating the laser.
Specifically, how to determine the laser with the problem and how to compensate the laser according to the exposure result are described in detail in the first embodiment or the second embodiment, which is not described in detail herein.
As shown in fig. 9, the present invention further discloses a laser energy uniformity correction apparatus, which includes an image obtaining module, a determining module, a control module and a compensating module, wherein the image obtaining module is configured to obtain a test sample, the test sample is obtained by controlling a close-packed laser to expose an exposure medium, the determining module is configured to determine whether there is an exposure defect according to the test sample, the control module is configured to control each laser to individually expose the exposure medium according to an exposure direction when there is the exposure defect, and the compensating module is configured to determine a laser having a problem according to an exposure result of each laser and compensate the laser.
Specifically, the test patterns include a dot test pattern and/or a line test pattern, where how the image obtaining module obtains the dot test pattern and/or the line test pattern is described in detail above, and is not described in detail here. The judging module can determine whether the dot test sample pattern and/or the line test sample pattern has exposure defects by judging whether vertical stripes or incompletely exposed positions exist in the dot test sample pattern and/or the line test sample pattern. How the control module controls each laser to independently expose the exposure medium according to the exposure direction, how to determine the laser with problems according to the exposure result of each laser, and how to compensate the laser are described in detail above, and are not described in detail herein.
The invention can correct the laser with non-uniform energy in the close-packed laser, so that the energy of the laser is in a uniform range, thereby improving the image printing quality.
Therefore, the scope of the present invention should not be limited to the disclosure of the embodiments, but includes various alternatives and modifications without departing from the scope of the present invention, which is defined by the claims of the present patent application.
Claims (10)
1. A method for correcting the energy uniformity of a laser is characterized by comprising the following steps:
acquiring a test sample image, wherein the test sample image is obtained by controlling a close-spaced laser to expose an exposure medium;
confirming whether exposure defects exist according to the test sample drawing, and controlling each laser to independently expose the exposure medium according to the exposure direction when the exposure defects exist;
and determining the laser with the problem according to the exposure result of each laser and compensating the laser.
2. The method according to claim 1, wherein the test patterns comprise dot test patterns obtained by controlling a closely-spaced laser to expose an exposure medium by:
dividing every N multiple lasers in the close-packed lasers into a group and controlling the light and dark alternate arrangement of the multiple groups of lasers;
and controlling the closely-spaced lasers to expose the exposure medium along the exposure direction, and after each step is performed for N times, alternately changing the brightness and the darkness of each group of lasers, wherein N is an integer greater than or equal to 1.
3. The method of claim 1, wherein the test pattern comprises a line test pattern obtained by controlling a closely-spaced laser to expose an exposure medium by:
dividing every N multi-path lasers in the close-packed lasers into one group and controlling the alternation of light and dark of a plurality of groups of lasers;
and controlling a close-packed laser to carry out exposure treatment on the exposure medium along an exposure direction, wherein N is an integer greater than or equal to 1.
4. The method according to claim 1, wherein the test patterns further include dot test patterns and line test patterns, wherein the dot test patterns are obtained by controlling a close-spaced laser to expose an exposure medium by:
dividing every N multiple lasers in the close-packed lasers into a group and controlling the light and dark alternate arrangement of the multiple groups of lasers;
controlling the closely-spaced lasers to expose the exposure medium along the exposure direction, and after each step is performed for N times, alternately changing the brightness and the darkness of each group of lasers;
the line test sample is obtained by controlling a close-packed laser to expose an exposure medium through the following steps:
dividing every N multi-channel lasers in the close-packed lasers into one group and controlling the alternation of light and dark of a plurality of groups of lasers;
and controlling a close-packed laser to carry out exposure treatment on the exposure medium along an exposure direction, wherein N is an integer greater than or equal to 1.
5. The method of claim 1, wherein the determining whether an exposure defect exists according to the test pattern comprises:
and judging whether the positions of incomplete exposure or vertical stripes exist in the test sample image, and determining that the test sample image has exposure defects when the positions exist.
6. The method of claim 1, wherein determining the problematic laser from the exposure results of each laser comprises:
and judging whether the width of an exposure image formed by the exposure of each laser is matched with the theoretical width value or not, and determining that the laser has the problem of uneven energy when the width of the exposure image is not matched with the theoretical width value.
7. The laser energy uniformity correction method of claim 1, wherein compensating the laser comprises:
acquiring the current value of the laser in real time;
and judging whether the current value is matched with the current value of the normal laser, and adjusting the current of the laser when the current value is not matched with the current value of the normal laser until the current value acquired in real time is matched with the current value of the normal laser.
8. The laser energy uniformity correction method of claim 7, wherein said adjusting the laser current comprises:
the present current value is added or subtracted to the stepped current value.
9. The method of claim 1, wherein the exposure direction is selected from one of a direction of rotation of the exposure medium and a direction of translation of the exposure medium.
10. A laser energy uniformity correction apparatus, the laser energy uniformity correction apparatus comprising:
the image acquisition module is used for acquiring a test sample image, and the test sample image is obtained by controlling the close-spaced laser to expose an exposure medium;
the judging module is used for confirming whether the exposure defect exists according to the test sample;
the control module is used for controlling each laser to independently carry out exposure treatment on the exposure medium according to the exposure direction when the judging module judges that the exposure defect exists;
and the compensation module is used for determining the laser with the problem according to the exposure result of each path of laser and compensating the laser.
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| JP2003255552A (en) * | 2002-03-06 | 2003-09-10 | Nec Corp | Laser irradiation device, exposure method using scanning laser beam, and manufacturing method for color filter using scanning laser beam |
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| JPH1158665A (en) * | 1997-08-27 | 1999-03-02 | Asahi Chem Ind Co Ltd | Laser plate making apparatus |
| JP2004144885A (en) * | 2002-10-23 | 2004-05-20 | Toppan Printing Co Ltd | Method for correcting laser beam and laser drawing method |
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