CN113387682A - ITO target waste target recycling method - Google Patents
ITO target waste target recycling method Download PDFInfo
- Publication number
- CN113387682A CN113387682A CN202110564896.6A CN202110564896A CN113387682A CN 113387682 A CN113387682 A CN 113387682A CN 202110564896 A CN202110564896 A CN 202110564896A CN 113387682 A CN113387682 A CN 113387682A
- Authority
- CN
- China
- Prior art keywords
- ito
- target
- waste
- temperature
- steps
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/453—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/62204—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products using waste materials or refuse
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/626—Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B
- C04B35/62605—Treating the starting powders individually or as mixtures
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/626—Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B
- C04B35/62605—Treating the starting powders individually or as mixtures
- C04B35/62645—Thermal treatment of powders or mixtures thereof other than sintering
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3286—Gallium oxides, gallates, indium oxides, indates, thallium oxides, thallates or oxide forming salts thereof, e.g. zinc gallate
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3293—Tin oxides, stannates or oxide forming salts thereof, e.g. indium tin oxide [ITO]
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Structural Engineering (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Manufacture And Refinement Of Metals (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention provides a recycling method of an ITO target waste target, which comprises the steps of putting the ITO waste target into a vaporization furnace, raising the temperature in the vaporization furnace to 4000-5000 ℃ in a gradient manner, raising the temperature to 500 ℃ in 0-30min, putting the ITO waste target at the temperature, then preserving the heat, raising the temperature to 3000 ℃ in 30-40min, raising the temperature to 4000-5000 ℃ in 40-60min, then preserving the heat until the ITO waste target is completely vaporized, finally cooling in a nitrogen atmosphere to obtain ITO powder with the purity of 4N and the specific surface of 6-8, carrying out ball milling, cold isostatic pressing, sintering, machining and binding to finally obtain the ITO target, thus adopting the gradient temperature rise, putting the waste target when the temperature is raised to 500 ℃, raising the temperature to 4000-5000 ℃ again, completely vaporizing the waste target, well controlling the complete vaporization of the waste target, and obtaining the ITO powder with high purity and good utilization effect of the waste target.
Description
Technical Field
The invention relates to the field of ITO target materials, in particular to a method for recycling waste ITO target materials.
Background
When the ITO target is used by a customer, the ITO target cannot be used up completely, the utilization rate of the rotary ITO target is 75 percent, the utilization rate of the plane ITO target is 35 percent, and the principles of energy regeneration and environmental protection are relied on, so that a large amount of waste targets need to be recovered. The conventional industry practice is to recover 2N indium from the ITO waste target by dry or wet reduction and refine the indium into 4N indium ingots by a refining mode, and the method has high cost, only utilizes In the ITO waste target and has low recovery value of tin. The prior art patent CN102367519B discloses an efficient recovery method of an ITO waste target, which adopts a plasma gasification method production device to directly gasify an ITO target material to generate ITO powder, the whole recovery process is completed in a plasma gasification device, a stable plasma arc is generated in the device, and the ITO waste target is instantaneously gasified, cooled and collected under the action of the high temperature of the arc. However, the temperature of the arc vaporization of the patent is not limited, only the high temperature of the arc is 3000-6000 ℃, but the vaporization is carried out only by the high temperature of the temperature, the vaporization effect is uncontrollable, and the quality of the recovery effect of the target material is uncontrollable. Therefore, it is necessary to solve this problem.
Disclosure of Invention
In order to solve the problems, the invention provides a recycling method of an ITO target waste target, which comprises the steps of putting the ITO waste target into a vaporization furnace, raising the temperature in the vaporization furnace to 4000-, the problems occurring in the background art are solved.
The invention aims to provide a recycling method of an ITO target waste target, which comprises the steps of putting the ITO waste target into a vaporization furnace, raising the temperature in the vaporization furnace to 4000-;
the temperature rise of the gasification furnace is in gradient rising: heating to 500 ℃ in 0-30min, putting the ITO waste target at the temperature, then preserving heat, heating to 3000 ℃ in 30-40min, heating to 4000-;
and performing ball milling on the ITO powder to obtain nanoscale ITO powder, performing cold isostatic pressing to prepare an ITO blank, sintering to prepare a high-density ITO target intermediate, machining, and binding to finally obtain the ITO target.
The further improvement lies in that: the filling rate of the nitrogen gas is 6L/min after 0-3min, and the filling rate is 2L/min later.
The further improvement lies in that: the ball milling is specifically as follows: and putting the obtained ITO powder into a ball mill for ball milling, sanding and spray granulation in sequence to obtain the nanoscale ITO powder.
The further improvement lies in that: the cold isostatic pressing is specifically as follows: and (3) filling the nano-grade ITO powder prepared by ball milling into a polyurethane mold, and molding by using a cold isostatic pressing device to prepare an ITO blank.
The further improvement lies in that: the sintering specifically comprises the following steps: and sintering the ITO blank prepared by cold isostatic pressing in a high-temperature oxygen sintering furnace to prepare the high-density ITO target intermediate.
The further improvement lies in that: the machining specifically comprises: and (4) carrying out internal and external circular grinding and edge grinding machining on the high-density ITO target intermediate obtained by sintering.
The further improvement lies in that: the binding specifically comprises: binding the high-density ITO target intermediate after machining on the outer surface of the titanium tube.
The invention has the beneficial effects that: the method comprises the steps of putting an ITO waste target into a vaporization furnace, raising the temperature in the vaporization furnace to 4000-; the waste target is placed when the temperature is raised to 500 ℃ by adopting gradient temperature rise, and then the temperature is raised to 4000-; the cooling is carried out in the nitrogen atmosphere, the cooling efficiency is high, the effect is good, the filling rate of nitrogen is 6L/min after 0-3min, and the filling rate is 2L/min, so that the cooling effect is better enhanced; and performing ball milling, sanding, spraying and granulating on the prepared ITO powder to obtain nano ITO powder, preparing an ITO blank, and finally processing and binding by a sintering machine to well utilize the ITO waste target, realize recycling of the ITO waste target and protect the environment.
Detailed Description
In order to further understand the present invention, the following detailed description will be made with reference to the following examples, which are only used for explaining the present invention and are not to be construed as limiting the scope of the present invention.
The embodiment provides a method for recycling waste ITO target, which comprises the following steps:
the method comprises the following steps: putting the ITO waste target into a vaporizing furnace, and raising the temperature of the vaporizing furnace in a gradient way: heating to 500 ℃ in 0-30min, then preserving heat, heating to 3000 ℃ in 30-40min, putting an ITO waste target at the temperature, heating to 4000-;
step two: putting the obtained ITO powder into a ball mill for ball milling, sanding and spray granulation in sequence to obtain nanoscale ITO powder;
step three: loading the nanoscale ITO powder into a polyurethane mold, and molding by using a cold isostatic pressing device to prepare an ITO blank;
step four: placing the ITO blank in a high-temperature oxygen sintering furnace for sintering to prepare a high-density ITO target intermediate;
step five: carrying out internal and external circular grinding and edge grinding machine processing on the high-density ITO target intermediate;
step six: binding the high-density ITO target intermediate after machining on the outer surface of the titanium tube.
The temperature rise of the vaporizing furnace was analyzed:
therefore, gradient temperature rise is adopted, the temperature is raised to 500 ℃ firstly, the waste target is placed, the temperature is raised to 3000 ℃, the waste target is placed, the temperature is raised to 4000-.
Analysis of nitrogen cooling rate:
therefore, the filling rate is 6L/min after 0-3min, and then the filling rate is 2L/min, so that the cooling effect is better enhanced, and the recovery rate of the ITO powder is high.
Claims (7)
1. A method for recycling waste ITO target is characterized by comprising the following steps: placing the ITO waste target into a vaporization furnace, raising the temperature in the vaporization furnace to 4000-;
the temperature rise of the gasification furnace is in gradient rising: heating to 500 ℃ in 0-30min, putting the ITO waste target at the temperature, then preserving heat, heating to 3000 ℃ in 30-40min, heating to 4000-;
and performing ball milling on the ITO powder to obtain nanoscale ITO powder, performing cold isostatic pressing to prepare an ITO blank, sintering to prepare a high-density ITO target intermediate, machining, and binding to finally obtain the ITO target.
2. The method for recycling the waste ITO target as claimed in claim 1, wherein the method comprises the following steps: the filling rate of the nitrogen gas is 6L/min after 0-3min, and the filling rate is 2L/min later.
3. The method for recycling the waste ITO target as claimed in claim 1, wherein the method comprises the following steps: the ball milling is specifically as follows: and putting the obtained ITO powder into a ball mill for ball milling, sanding and spray granulation in sequence to obtain the nanoscale ITO powder.
4. The method for recycling the waste ITO target as claimed in claim 1, wherein the method comprises the following steps: the cold isostatic pressing is specifically as follows: and (3) filling the nano-grade ITO powder prepared by ball milling into a polyurethane mold, and molding by using a cold isostatic pressing device to prepare an ITO blank.
5. The method for recycling the waste ITO target as claimed in claim 1, wherein the method comprises the following steps: the sintering specifically comprises the following steps: and sintering the ITO blank prepared by cold isostatic pressing in a high-temperature oxygen sintering furnace to prepare the high-density ITO target intermediate.
6. The method for recycling the waste ITO target as claimed in claim 1, wherein the method comprises the following steps: the machining specifically comprises: and (4) carrying out internal and external circular grinding and edge grinding machining on the high-density ITO target intermediate obtained by sintering.
7. The method for recycling the waste ITO target as claimed in claim 1, wherein the method comprises the following steps: the binding specifically comprises: binding the high-density ITO target intermediate after machining on the outer surface of the titanium tube.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110564896.6A CN113387682A (en) | 2021-05-24 | 2021-05-24 | ITO target waste target recycling method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110564896.6A CN113387682A (en) | 2021-05-24 | 2021-05-24 | ITO target waste target recycling method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN113387682A true CN113387682A (en) | 2021-09-14 |
Family
ID=77619016
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202110564896.6A Pending CN113387682A (en) | 2021-05-24 | 2021-05-24 | ITO target waste target recycling method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN113387682A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114804853A (en) * | 2022-05-10 | 2022-07-29 | 芜湖映日科技股份有限公司 | Method for recycling IGZO waste target |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004323877A (en) * | 2003-04-22 | 2004-11-18 | Sumitomo Metal Mining Co Ltd | Ito thin film manufacturing target, and method for manufacturing the same |
| US20080073819A1 (en) * | 2006-09-25 | 2008-03-27 | Cheng Loong Corporation | Method of manufacturing sputtering targets |
| CN101269834A (en) * | 2008-05-19 | 2008-09-24 | 昆明理工大学 | Method for producing nano-ITO powder with plasma electrical arc one-step method |
| CN102367519A (en) * | 2011-09-16 | 2012-03-07 | 中国船舶重工集团公司第七二五研究所 | Efficient recovering method for waste indium tin oxide (ITO) targets |
| CN104843771A (en) * | 2015-04-24 | 2015-08-19 | 柳州百韧特先进材料有限公司 | Method for recovering and preparing nanometer TIO powder from ITO target wastes |
| CN112079627A (en) * | 2020-09-16 | 2020-12-15 | 韶关市欧莱高新材料有限公司 | Preparation method for directly crushing ITO waste target to prepare powder and producing ITO target |
-
2021
- 2021-05-24 CN CN202110564896.6A patent/CN113387682A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004323877A (en) * | 2003-04-22 | 2004-11-18 | Sumitomo Metal Mining Co Ltd | Ito thin film manufacturing target, and method for manufacturing the same |
| US20080073819A1 (en) * | 2006-09-25 | 2008-03-27 | Cheng Loong Corporation | Method of manufacturing sputtering targets |
| CN101269834A (en) * | 2008-05-19 | 2008-09-24 | 昆明理工大学 | Method for producing nano-ITO powder with plasma electrical arc one-step method |
| CN102367519A (en) * | 2011-09-16 | 2012-03-07 | 中国船舶重工集团公司第七二五研究所 | Efficient recovering method for waste indium tin oxide (ITO) targets |
| CN104843771A (en) * | 2015-04-24 | 2015-08-19 | 柳州百韧特先进材料有限公司 | Method for recovering and preparing nanometer TIO powder from ITO target wastes |
| CN112079627A (en) * | 2020-09-16 | 2020-12-15 | 韶关市欧莱高新材料有限公司 | Preparation method for directly crushing ITO waste target to prepare powder and producing ITO target |
Non-Patent Citations (2)
| Title |
|---|
| 翁史烈: "《先进燃煤技术与实践》", 30 November 2019, 上海交通大学出版社 * |
| 高虹等: "《新型能源技术与应用》", 28 February 2007, 国防工业出版社 * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114804853A (en) * | 2022-05-10 | 2022-07-29 | 芜湖映日科技股份有限公司 | Method for recycling IGZO waste target |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN103409637B (en) | Full-automatic commercial pure titanium smelting method adopting electron beam cold hearth furnace | |
| CN107129277A (en) | A kind of useless targets of ITO reclaim the method that powder prepares ITO target | |
| CN101224500A (en) | Super particle size molybdenum powder preparing method | |
| CN106334791A (en) | Production method for spherical titanium powder for 3D printing | |
| CN113387682A (en) | ITO target waste target recycling method | |
| CN104550992A (en) | Processing and production method for secondarily reduced powder | |
| CN108069422A (en) | A kind of method of graphite purification | |
| CN106966700A (en) | A kind of short route preparation technology of tin indium oxide sintered body | |
| CN113149611A (en) | ITO powder prepared by recycling ITO waste target blank, target material and preparation method thereof | |
| CN104073771B (en) | A kind of molybdenum mixes the preparation method of sodium sputtering target material | |
| CN105499589A (en) | Method for preparing high-purity superfine low-oxygen titanium hydride powder and dehydrogenated titanium powder | |
| CN104213010B (en) | A kind of high tenacity Nb doping W/TiC composite and preparation method thereof | |
| CN103290226B (en) | Method for recovering and regenerating ultrafine grained cemented carbide containing crystal grain growth inhibitor | |
| CN115026292A (en) | Titanium powder for 3D printing and preparation method and device thereof | |
| CN107055561A (en) | A kind of preparation method of boron alkene | |
| CN103509621A (en) | Technology for preparing high efficiency biomass fuel which is formed after charred | |
| CN104232961B (en) | A kind of high-strength height hard Cu-Cr composite and its preparation method and application | |
| CN111421142A (en) | Preparation method of spherical titanium powder | |
| CN110340344B (en) | Method for improving utilization rate of laser additive manufacturing alloy steel powder | |
| CN115159960A (en) | Preparation method of high-resistivity ITO target material | |
| CN105913888A (en) | Preparation method of nuclear grade boron carbide core block for high-temperature gas cooling pile control rod | |
| CN113233871B (en) | Method for preparing ITO evaporation material from ITO residual target reclaimed material | |
| CN113233888A (en) | Method for preparing IGZO target material by recycling IGZO waste biscuit | |
| CN110723751B (en) | Method for preparing molybdenum trioxide by using waste molybdenum disilicide coating | |
| CN113862507A (en) | Preparation method of high-density high-copper-content copper-tungsten composite material |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20210914 |
|
| RJ01 | Rejection of invention patent application after publication |