CN113376956A - Method and apparatus for cleaning interior of photomask - Google Patents
Method and apparatus for cleaning interior of photomask Download PDFInfo
- Publication number
- CN113376956A CN113376956A CN202110494398.9A CN202110494398A CN113376956A CN 113376956 A CN113376956 A CN 113376956A CN 202110494398 A CN202110494398 A CN 202110494398A CN 113376956 A CN113376956 A CN 113376956A
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- Prior art keywords
- photomask
- dust
- size
- laser
- normal use
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- 238000004140 cleaning Methods 0.000 title claims abstract description 36
- 238000000034 method Methods 0.000 title claims abstract description 33
- 239000000428 dust Substances 0.000 claims abstract description 150
- 239000012788 optical film Substances 0.000 claims abstract description 54
- 238000001514 detection method Methods 0.000 claims description 15
- 230000001678 irradiating effect Effects 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 abstract description 12
- 230000009286 beneficial effect Effects 0.000 abstract description 2
- 239000000463 material Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 230000003749 cleanliness Effects 0.000 description 3
- 230000000007 visual effect Effects 0.000 description 3
- 239000005304 optical glass Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
Abstract
The invention discloses a photomask cleaning method and a photomask cleaning device. The photomask cleaning mode can irradiate dust through the optical film by laser, crush the dust to a size which does not influence the normal use of the photomask, or move the dust to a position which does not influence the normal use of the photomask. The method for cleaning the interior of the photomask at least has the following beneficial effects: can not prying off the condition of optical film, shine the dust through the optical film through the laser, will the dust is broken to not influencing the size that the light shield normally used, perhaps will the dust removes to not influencing the position that the light shield normally used, can reduce the manufacturing cost and the improvement production efficiency of light shield.
Description
Technical Field
The invention relates to the technical field of display, in particular to a method and a device for cleaning the interior of a photomask.
Background
The photomask is commonly called as a mask plate, and the manufacturing process comprises the steps of coating a layer of photosensitive material on optical glass, exposing the optical glass by a photoetching machine, removing unnecessary patterns through the processes of developing, etching, stripping and the like to form a light transmitting area, and forming a light shading area by the reserved part, thereby realizing the purpose of manufacturing various complex patterns. Because the mask has a high requirement for cleanliness, an optical film is usually attached to the effective area of the mask to prevent contamination and prolong the lifetime of the mask, so as to ensure that the pattern is not contaminated.
In the conventional photomask manufacturing process, once dust falls into the photomask, a pattern light-transmitting area on the photomask is shielded, so that a customer product is short-circuited. After the photomask is manufactured, once the dust is found in the photomask, the optical film needs to be pried off, the photomask is cleaned again, then the photomask is detected, and if the dust still exists, the process is repeated until no abnormity is detected.
In the related art, the mask cleaning apparatus includes a laser emitter and a removing member, the temperature to which the removing member is heated is controlled by the energy of laser emitted from the laser emitter, and the removing member is brought into contact with dust to evaporate the dust at a high temperature. However, this technique still requires prying off the optical film to remove the dust by contact with the dust.
The optical film which is pried off can not be used any more, the manufacturing cost of the optical film is high, the dust removing mode causes a great amount of loss of optical film materials, the production cost of the photomask is improved, and the production time of the photomask is prolonged.
Disclosure of Invention
The present invention is directed to solving at least one of the problems of the prior art. Therefore, the invention provides a method for cleaning the interior of a photomask, which can remove dust in the interior of the photomask through an optical film by laser without damaging the optical film.
The invention also provides a cleaning device used in the photomask interior cleaning method.
According to a first aspect of the present invention, a method for cleaning the interior of a photomask comprises the following steps: the method comprises the steps of irradiating dust through an optical film by laser, and crushing the dust to a size which does not affect the normal use of the photomask, or moving the dust to a position which does not affect the normal use of the photomask.
The method for cleaning the interior of the photomask according to the embodiment of the first aspect of the invention has at least the following advantages: can not prying off the condition of optical film, shine the dust through the optical film through the laser, will the dust is broken to not influencing the size that the light shield normally used, perhaps will the dust removes to not influencing the position that the light shield normally used, can reduce the manufacturing cost and the improvement production efficiency of light shield.
According to some embodiments of the invention, before said emitting laser light, further comprising the steps of:
acquiring the size and the position of all the dust on the photomask;
if there is dust whose size affects normal use of the photomask and which is located at a position that affects normal use of the photomask, the dust is irradiated by laser light through the optical film.
According to some embodiments of the invention, after said emitting laser light, further comprising the steps of:
acquiring the size and position of the irradiated dust;
and if the size of the irradiated dust influences the normal use of the photomask and is positioned at a position which influences the normal use of the photomask, re-emitting laser to irradiate the dust through the optical film.
According to some embodiments of the invention, after the acquiring the size and the position of the irradiated dust, the method further comprises the following steps:
and if the size of the irradiated dust does not influence the normal use of the photomask or is positioned at a position which does not influence the normal use of the photomask, acquiring the size and the position of all the dust on the photomask again.
According to some embodiments of the invention, the dimension that does not affect normal use of the reticle is 1 μm or less.
According to some embodiments of the invention, the position that does not affect the normal use of the photomask is a light-shielding region of the photomask.
According to some embodiments of the invention, the laser has a frequency of 3.4kHz to 7.5 kHz.
According to some embodiments of the invention, the laser has a frequency of 5kHz to 7.5 kHz.
The cleaning device according to the embodiment of the second aspect of the invention comprises a laser emitter, an alignment mechanism, a fixing mechanism, a detection machine and a control system.
The fixing mechanism is used for fixing the photomask; the laser emitter is used for emitting laser to the photomask on the fixing mechanism; the alignment mechanism is connected with the laser emitter or the fixing mechanism and is used for adjusting the relative position of the laser emitter and the fixing mechanism; the detection machine is used for detecting the size and the position of dust on the photomask; and the control system is electrically connected with the detector, the alignment mechanism and the laser emitter and can control the alignment mechanism and the laser emitter according to a detection signal sent by the detector.
According to the cleaning device of the embodiment of the second aspect of the invention, at least the following advantages are achieved: the method for cleaning the interior of the photomask has the advantages as described above, and the description thereof is omitted.
According to some embodiments of the invention, the alignment mechanism is a movable platform, and the fixing mechanism is connected to the movable platform.
According to some embodiments of the invention, the cleaning device further comprises a viewing mechanism for obtaining the size and position of the dust.
Additional aspects and advantages of the invention will be set forth in part in the description which follows and, in part, will be obvious from the description, or may be learned by practice of the invention.
Drawings
FIG. 1 is a flow chart of a method for cleaning the interior of a photomask according to an embodiment of the first aspect of the present invention;
fig. 2 is a flowchart of irradiating dust through an optical film by laser in an embodiment of the first aspect of the present invention.
Detailed Description
Reference will now be made in detail to embodiments of the present invention, examples of which are illustrated in the accompanying drawings, wherein like or similar reference numerals refer to the same or similar elements or elements having the same or similar function throughout. The embodiments described below with reference to the accompanying drawings are illustrative only for the purpose of explaining the present invention, and are not to be construed as limiting the present invention.
In the description of the present invention, it should be understood that the orientation or positional relationship referred to in the description of the orientation, such as the upper, lower, front, rear, left, right, etc., is based on the orientation or positional relationship shown in the drawings, and is only for convenience of description and simplification of description, and does not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present invention.
In the description of the present invention, the meaning of a plurality is one or more, the meaning of a plurality is two or more, and the above, below, exceeding, etc. are understood as excluding the present numbers, and the above, below, within, etc. are understood as including the present numbers. If the first and second are described for the purpose of distinguishing technical features, they are not to be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated or implicitly indicating the precedence of the technical features indicated.
In the description of the present invention, unless otherwise explicitly limited, terms such as arrangement, installation, connection and the like should be understood in a broad sense, and those skilled in the art can reasonably determine the specific meanings of the above terms in the present invention in combination with the specific contents of the technical solutions.
In the description of the present invention, reference to the description of the terms "one embodiment," "some embodiments," "an illustrative embodiment," "an example," "a specific example," or "some examples," etc., means that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the present invention. In this specification, the schematic representations of the terms used above do not necessarily refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.
As shown in fig. 1, the method for cleaning the interior of a reticle according to the first embodiment of the present invention includes the following steps:
s100, irradiating dust through the optical film by laser, and crushing the dust to a size which does not influence the normal use of the photomask, or moving the dust to a position which does not influence the normal use of the photomask.
The method for cleaning the interior of the photomask according to the embodiment of the invention at least has the following beneficial effects: under the condition that the optical film is not pried, the laser irradiates dust through the optical film, the dust is smashed to the size which does not influence the normal use of the photomask, or the dust is moved to the position which does not influence the normal use of the photomask, so that the production cost of the photomask can be reduced, and the production efficiency can be improved.
According to some embodiments of the present invention, the irradiating of the dust through the optical film by the laser further comprises:
s110, acquiring the sizes and positions of all dust on the photomask;
and S120, if dust with the size influencing the normal use of the photomask exists and is positioned at the position influencing the normal use of the photomask, irradiating the dust through the optical film by laser.
For example, the size and the position of all dust on the photomask are detected by the detection machine, the size and the position information of the dust are transmitted and sent to the control system, the control system selects and positions the dust with the size affecting the normal use of the photomask and the position affecting the normal use of the photomask, and the control system controls the laser emitter to align with the positioned dust, so that when the laser emitter emits laser, the dust affecting the normal use of the photomask can be irradiated, and the dust can be smashed or moved.
According to some embodiments of the present invention, the method for cleaning the interior of the photomask further comprises the steps of:
s200, acquiring the size and the position of the irradiated dust;
s200a, if the size of the dust after irradiation affects the normal use of the mask and is located at a position that affects the normal use of the mask, the dust is irradiated again by emitting laser through the optical film.
For example, the mask is mounted on a fixture. After the laser irradiates dust through the optical film, the size position of the irradiated dust is obtained through a detector or an observation device, and whether the size of the dust affects the normal use of the photomask or not and whether the position of the dust affects the normal use of the photomask or not are judged.
The detection machine can acquire the position and the size of dust more intelligently, and the detection machine can obtain the size and the position information of the dust on the photomask only by putting the photomask into the detection machine.
In addition, the observation device can be a microscope, the original position of the dust is observed through the microscope, a wider visual field range can be obtained by replacing the low-power lens, the position of the dust irradiated by laser can be better observed, the size of the crushed dust can be more conveniently obtained, the size of the dust in the visual field of the microscope is only required to be combined through the multiple of the high-power lens of the microscope, and then the size of the crushed dust is obtained through conversion. In order to improve the cleaning efficiency of the cleaning method, after the position of the dust is obtained and the dust is irradiated, the original position and the vicinity of the irradiated dust can be observed by the observation device, and the size and the position of the irradiated dust can be obtained more quickly.
If the size of the dust influences the normal use of the photomask and the position of the dust is located at the position influencing the normal use of the photomask, the moving platform is controlled through the control system, so that the fixing device is moved, the relative position of the photomask and the laser emitter is further controlled, the laser emitter is aligned to the dust, the laser emitter emits laser again, and the irradiated dust is irradiated through the optical film.
Then, the position and the vicinity of the original dust are observed again through the detection machine or the observation device, and whether the size of the dust affects the normal use of the photomask and whether the position of the dust is in the position affecting the normal use of the photomask or not is checked.
The steps are repeated until the size of the dust does not influence the normal use of the photomask, or the dust is moved to a position where the size of the dust does not influence the normal use of the photomask.
According to some embodiments of the invention, after obtaining the size and position of the irradiated dust, the method further comprises the following steps:
and S200b, if the size of the dust does not influence the normal use of the photomask or the position of the dust is in the position which does not influence the normal use of the photomask, acquiring the size and the position of all the dust on the photomask.
For example, after laser irradiation, if the size of dust does not affect the normal use of the photomask or the position of dust is located at a position that does not affect the normal use of the photomask. The whole photomask is detected through the detector, the sizes and the positions of all dust on the photomask are obtained again, the size and the position information of the dust are sent to the control system, the control system judges whether the dust influencing the normal use of the photomask still exists on the photomask, the cleaning degree of the photomask is detected, and the dust which is not removed is prevented from being omitted in the cleaning process.
According to some embodiments of the present invention, the dimension that does not affect the normal use of the reticle is 1 μm or less.
According to some embodiments of the present invention, the position that does not affect the normal use of the mask is the light-shielding region of the mask.
According to some embodiments of the invention, the laser has a frequency of 3.4kHz to 7.5 kHz. The laser with the frequency of 3.4 kHz-7.5 kHz can break or move dust through the optical film under the condition of not damaging the optical film.
According to some embodiments of the invention, the laser has a frequency of 5kHz to 7.5 kHz. The laser with the frequency of 3.4 kHz-7.5 kHz can break or move dust through the optical film under the condition of not damaging the optical film, and the optical film with higher cleanliness can be obtained.
The mask with dust inside is scanned by a detector, the size and corresponding position of each dust is recorded, and the mask is used. By observing the use of the photomask and combining the size and position information of each dust, it can be seen that the dust having a size of 1 μm or less will not affect the normal use of the photomask, or the dust in the light-shielding region of the photomask will not affect the normal use of the photomask.
The size of the dust adhering to the mask is about 5 to 8 μm.
The following is experimental data for irradiating dust of a size of 5 μm through an optical film using different laser parameters.
TABLE I test results
In the first table, the state of the optical film refers to the state of the optical film after the optical film is irradiated by the laser with corresponding parameters, such as the optical film is damaged, the optical film is marked, and the optical film is not marked and damaged. The damage refers to the fact that after the optical film is irradiated by laser, the optical film is burned by the laser, and shadows influencing the normal use of the photomask are generated. The mark is a shadow generated by burning the optical film with laser after the optical film is irradiated with the laser, but the shadow does not affect the normal use of the photomask.
The state of the dust refers to the state of the dust generated after the dust is irradiated by the laser with corresponding parameters, such as the dust is smashed or moved, and the dust is not smashed or moved. The dust is generally granular or fibrous, the granular dust contains a large amount of metal elements, the laser easily reacts with the metal elements, and the metal elements can be more easily vaporized, so that the granular dust is crushed. The fibrous dust contains a small amount of metal elements, and the laser light hardly breaks the fibrous dust, but the fibrous dust can be moved by vibrating the fibrous dust. When the laser parameters do not reach the corresponding values, the dust will not be able to be shattered or moved.
From the experimental data in table one, it can be seen that when the frequency of the laser is higher than 7.5kHz, the laser cannot shatter or move the dust. When the frequency of the laser is lower than 3.4kHz, the laser irradiates the optical film, and the optical film is damaged, so that the normal use of the photomask is influenced.
It can be seen that when the frequency of the laser is 3.4kHz to 7.5kHz, the optical film can be used normally and the dust can be broken or moved when the laser irradiates the dust through the optical film.
According to the experimental data in table one, when the frequency of the laser is less than 5kHz and greater than or equal to 3.4kHz, the laser will imprint on the optical film.
It is thus seen that when the frequency of the laser beam is 5kHz to 7.5kHz, the laser beam irradiates dust through the optical film, and the optical film is not marked or damaged, and an optical film having a higher degree of cleanliness can be obtained, and dust can be broken or moved.
The cleaning device comprises a laser emitter, an alignment mechanism, a fixing mechanism, a detector and a control system.
The fixing mechanism is used for fixing the photomask; the laser emitter is used for emitting laser to the photomask on the fixing mechanism; the alignment mechanism is connected with the laser emitter or the fixing mechanism and is used for adjusting the relative position of the laser emitter and the fixing mechanism; the detection machine is used for detecting the size and the position of dust on the photomask; and the control system is electrically connected with the detector, the alignment mechanism and the laser emitter and can control the alignment mechanism and the laser emitter according to a detection signal sent by the detector.
The detection machine can be a photomask defect detection platform, scans the photomask, can more intelligently acquire the size and the position of dust, and transmits the dust to the control system.
According to some embodiments of the invention, the cleaning device further comprises a viewing mechanism for obtaining the size and position of the dust.
For example, a reticle to be cleaned is placed in a fixing mechanism and fixed by the fixing mechanism.
Then, the detection machine is used for scanning and detecting the light cover, so that the size and position information of all dust on the light cover is obtained and is transmitted to the control system.
The control system positions dust having a size of 1 μm or more and located in a light-transmitting area of the photomask, that is, positions dust affecting normal use of the photomask. The control system adjusts the relative position of the photomask and the laser emitter by controlling the alignment mechanism to move the fixing device, so that the laser emitted by the laser emitter can irradiate the positioned dust. After the position of the photomask is adjusted, the control system controls the laser emitter to emit laser to the positioned dust.
Next, the size and position of the dust are acquired by observing the dust after irradiation with an observation mechanism.
If the size of the irradiated dust is still larger than or equal to 1 mu m and is still positioned in the light-transmitting area affecting the photomask, the relative position of the photomask and the laser emitter is adjusted again through the alignment mechanism, and then the control system controls the laser to emit laser again to irradiate the dust through the optical film.
This is repeated until the observation mechanism observes that the size of the dust is smaller than 1 μm or the dust is located in the light-shielding region of the photomask.
If the observation mechanism observes that the size of the dust is smaller than 1 μm or the dust is located in the light-shielding region of the photomask. Then the mask is scanned and detected again by the detector, and the size and position of all dust on the mask are obtained. Ensuring that all dust on the photomask has a size less than 1 μm or is located in the light-shielding area of the photomask.
According to the cleaning device of the embodiment of the second aspect of the invention, at least the following advantages are achieved: the method for cleaning the interior of the photomask has the advantages as described above, and the description thereof is omitted.
According to some embodiments of the invention, the alignment mechanism is a movable platform, and the fixing mechanism is connected to the movable platform.
The observation mechanism can be a microscope, and after the approximate position of the dust is determined, the position of the irradiated dust can be acquired more quickly, and the size of the dust in the visual field can be converted through the lens joint.
The embodiments of the present invention have been described in detail with reference to the accompanying drawings, but the present invention is not limited to the above embodiments, and various changes can be made within the knowledge of those skilled in the art without departing from the gist of the present invention. Furthermore, the embodiments of the present invention and the features of the embodiments may be combined with each other without conflict.
Claims (10)
1. The method for cleaning the interior of the photomask comprises the following steps:
the method comprises the steps of irradiating dust through an optical film by laser, and crushing the dust to a size which does not affect the normal use of the photomask, or moving the dust to a position which does not affect the normal use of the photomask.
2. The method of cleaning the interior of a photomask according to claim 1, wherein the step of irradiating the dust through the optical film by laser light comprises the steps of:
acquiring the size and the position of all the dust on the photomask;
if there is dust whose size affects normal use of the photomask and which is located at a position that affects normal use of the photomask, the dust is irradiated by laser light through the optical film.
3. The method of claim 2, further comprising the steps of:
acquiring the size and position of the irradiated dust;
and if the size of the irradiated dust influences the normal use of the photomask and is positioned at a position which influences the normal use of the photomask, re-emitting laser to irradiate the dust through the optical film.
4. The method of claim 3, further comprising the steps of:
and if the size of the irradiated dust does not influence the normal use of the photomask or is positioned at a position which does not influence the normal use of the photomask, acquiring the size and the position of all the dust on the photomask again.
5. The method for cleaning the interior of a photomask according to any one of claims 1 to 4, wherein the dimension which does not affect the normal use of the photomask is 1 μm or less.
6. The method for cleaning the interior of a photomask according to any one of claims 1 to 4, wherein the position not affecting the normal use of the photomask is a light-shielding region of the photomask.
7. The method of claim 1, wherein the laser has a frequency of 3.4 kHz-7.5 kHz.
8. A cleaning device, comprising:
the fixing mechanism is used for fixing the photomask;
the laser emitter is used for emitting laser to the photomask on the fixing mechanism;
the alignment mechanism is connected with the laser emitter or the fixing mechanism and is used for adjusting the relative position of the laser emitter and the fixing mechanism;
the detection machine is used for detecting the size and the position of dust on the photomask;
and the control system is electrically connected with the detector, the alignment mechanism and the laser emitter and can control the alignment mechanism and the laser emitter according to a detection signal sent by the detector.
9. The method of claim 8, wherein the alignment mechanism is a movable stage, and the fixing mechanism is connected to the movable stage.
10. The method of cleaning the interior of a reticle of claim 9, wherein the cleaning device further comprises a vision mechanism for capturing the size and location of the dust.
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| CN202110494398.9A CN113376956A (en) | 2021-05-07 | 2021-05-07 | Method and apparatus for cleaning interior of photomask |
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| Application Number | Priority Date | Filing Date | Title |
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| CN202110494398.9A CN113376956A (en) | 2021-05-07 | 2021-05-07 | Method and apparatus for cleaning interior of photomask |
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4980536A (en) * | 1987-07-02 | 1990-12-25 | International Business Machines Corporation | Removal of particles from solid-state surfaces by laser bombardment |
| US20030192567A1 (en) * | 2002-04-12 | 2003-10-16 | Yoshihiro Koizumi | Method of making foreign matter harmless |
| JP2005012142A (en) * | 2003-06-23 | 2005-01-13 | Nikon Corp | Method of inspecting and cleaning mask, mask inspecting and cleaning apparatus, and charged-particle beam exposure apparatus |
| JP2014064965A (en) * | 2012-09-25 | 2014-04-17 | Dainippon Printing Co Ltd | Foreign material removing device, foreign material removing method |
-
2021
- 2021-05-07 CN CN202110494398.9A patent/CN113376956A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4980536A (en) * | 1987-07-02 | 1990-12-25 | International Business Machines Corporation | Removal of particles from solid-state surfaces by laser bombardment |
| US20030192567A1 (en) * | 2002-04-12 | 2003-10-16 | Yoshihiro Koizumi | Method of making foreign matter harmless |
| JP2005012142A (en) * | 2003-06-23 | 2005-01-13 | Nikon Corp | Method of inspecting and cleaning mask, mask inspecting and cleaning apparatus, and charged-particle beam exposure apparatus |
| JP2014064965A (en) * | 2012-09-25 | 2014-04-17 | Dainippon Printing Co Ltd | Foreign material removing device, foreign material removing method |
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Application publication date: 20210910 |