CN113219779A - Screen, preparation method thereof and projection system - Google Patents
Screen, preparation method thereof and projection system Download PDFInfo
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- CN113219779A CN113219779A CN202010067441.9A CN202010067441A CN113219779A CN 113219779 A CN113219779 A CN 113219779A CN 202010067441 A CN202010067441 A CN 202010067441A CN 113219779 A CN113219779 A CN 113219779A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B21/00—Projectors or projection-type viewers; Accessories therefor
- G03B21/54—Accessories
- G03B21/56—Projection screens
- G03B21/60—Projection screens characterised by the nature of the surface
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Abstract
The application discloses screen and preparation method, projection system thereof, this screen includes: a substrate; the surface diffusion layer is arranged on one side surface of the substrate; the Fresnel layer is arranged on the surface of one side of the substrate, which is far away from the surface diffusion layer; the projection reflection layer is arranged on the surface of one side, far away from the substrate, of the Fresnel layer; the material of the projection reflection layer comprises a reflection material and an absorption material, and/or the Fresnel layer comprises a plurality of microstructure units which are sequentially arranged outwards based on the same circle center. The screen provided by the application can improve the gain of the screen and the contrast of ambient light resistance.
Description
Technical Field
The application relates to the technical field of projection, in particular to a screen, a manufacturing method of the screen and a projection system.
Background
In recent years, ultra-short focus projection has been receiving more and more attention because it has a low projection ratio and can greatly shorten the minimum arrangement distance between the projector and the projection screen.
The inventor of the present application finds that, in the use of ultra-short-focus projection, the conventional white screen is easily interfered by ambient light, and the contrast of the picture is not high in a bright light environment of a living room, so that the color cannot be well displayed. However, to improve the contrast of the picture, it is necessary to reduce the reflectance to the ambient light while maintaining the gain of the screen as much as possible. The existing wire grid screen improves the ambient light contrast by a mode of absorbing light on one side and reflecting light on the other side, but a wire grid microstructure cannot well collimate the light of a projector, and meanwhile, the gain of the screen is reduced by adopting a white Lambert scattering coating on the surface, so the improvement effect is very limited.
Disclosure of Invention
The technical problem mainly solved by the application is to provide a screen, a manufacturing method thereof and a projection system, which can improve the gain of the screen and the contrast of ambient light resistance.
In order to solve the technical problem, the application adopts a technical scheme that: there is provided a screen comprising: a substrate; the surface diffusion layer is arranged on one side surface of the substrate; the Fresnel layer is arranged on the surface of one side of the substrate, which is far away from the surface diffusion layer; the projection reflection layer is arranged on the surface of one side, far away from the substrate, of the Fresnel layer; the Fresnel layer comprises a plurality of micro-structure units, and the micro-structure units are sequentially arranged outwards based on the same circle center.
In order to solve the above technical problem, another technical solution adopted by the present application is: provided is a method of manufacturing a screen, the method including: carrying out roughness treatment on one side surface of the substrate to form a surface diffusion layer on one side surface of the substrate; forming a Fresnel layer on the surface of the other side of the substrate; forming a projection reflection layer on the surface of one side, far away from the substrate, of the Fresnel layer; the Fresnel layer comprises a plurality of micro-structure units, and the micro-structure units are sequentially arranged outwards based on the same circle center.
In order to solve the above technical problem, another technical solution adopted by the present application is: provided is a method of manufacturing a screen, the method including: performing roughness treatment on one side surface of a first substrate to form a surface diffusion layer on one side surface of the first substrate; forming a Fresnel layer on one side surface of the second substrate; forming a projection reflection layer on the surface of one side, far away from the second substrate, of the Fresnel layer; the first substrate and the second substrate are arranged in a stacked mode, and the surface of the first substrate, on which the surface diffusion layer is not formed, is in contact with the surface of the second substrate, on which the Fresnel layer is not formed, wherein the material of the projection reflection layer comprises a reflection material and an absorption material, and/or the Fresnel layer comprises a plurality of microstructure units which are sequentially arranged outwards based on the same circle center.
The beneficial effect of this application is: the screen of this application can make the projection reflection stratum have narrow diffusion angle owing to set up the material of projection reflection stratum and include reflecting material and absorbing material simultaneously, combines the fresnel layer to have good collimation characteristic simultaneously, can improve the gain and the anti ambient light contrast of screen.
Drawings
In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings needed to be used in the description of the embodiments are briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present application, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without creative efforts. Wherein:
FIG. 1 is a schematic cross-sectional view of an embodiment of the screen of the present application;
FIG. 2 is a schematic diagram of a Fresnel layer structure according to an embodiment of the screen of the present application;
FIG. 3 is a top view of a Fresnel lens;
FIG. 4 is a light ray diagram corresponding to the screen of FIG. 1;
FIG. 5 is a simplified schematic diagram of the relative positions of the screen and the projector;
FIG. 6 is a light intensity distribution graph;
FIG. 7 is a pattern of light spots;
FIG. 8 is a schematic flow chart diagram of one embodiment of a method of making a screen according to the present application;
FIG. 9 is a diagram of a manufacturing process corresponding to the method of FIG. 8;
FIG. 10 is a schematic flow chart diagram of another embodiment of a method of making a screen of the present application;
FIG. 11 is a diagram of a manufacturing process corresponding to the method of FIG. 10;
fig. 12 is a schematic structural diagram of an embodiment of the projection system of the present application.
Detailed Description
The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application, and it is obvious that the described embodiments are only a part of the embodiments of the present application, and not all the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present application.
Referring to fig. 1, fig. 1 is a schematic cross-sectional view of a screen 100 according to an embodiment of the present disclosure, which includes a substrate 110, a surface diffusion layer 120, a fresnel layer 130, and a projection reflection layer 140.
The surface diffusion layer 120 is disposed on a side surface of the substrate 110, the fresnel layer 130 is disposed on a side surface of the substrate 110 away from the surface diffusion layer 120, and the projection reflection layer 140 is disposed on a side surface of the fresnel layer 130 away from the substrate 110, that is, the projection reflection layer 140, the fresnel layer 130, the substrate 110, and the surface diffusion layer 120 are sequentially stacked, wherein the surface diffusion layer 120 faces the viewer.
The substrate 110 is a transparent substrate, and may be made of organic material such as PET (polyethylene terephthalate), PC (polycarbonate), PVC (polyvinyl chloride resin), or PMMA (polymethyl methacrylate). The substrate 110 may be a single-layer structure or a composite structure, and when the substrate 110 is a composite structure, the substrate 110 is formed by stacking a plurality of sub-substrates.
The fresnel layer 130 has good collimation characteristics, and is mainly used to perform fresnel reflection on ambient light and projector light and to perform collimation on projector light. In an application scenario, the fresnel layer 130 is made of a resin material, wherein the resin material may be an epoxy glue system, an acrylate glue system, a polyester glue system, a polyurethane glue system, or a polyimide glue system. The substrate 110 and the fresnel layer 130 may be made of the same substrate, and specifically, during the making, the substrate is processed by UV glue transfer printing or hot stamping, so as to form the substrate 110 and the fresnel layer 130.
The material of the projection reflection layer 140 includes a reflective material as well as an absorptive material.
The simultaneous arrangement of the absorbing material and the reflecting material may provide the projection reflecting layer 140 with a narrow diffusion angle. The mixing of the reflective material with the absorbing material enables the diffusion angle of the incident light to be reduced, on the one hand due to the properties of the reflective material, and on the other hand in that the absorbing material absorbs the incident light at large angles. Specifically, the absorbing material may be carbon black and the reflecting material may be silver powder.
Since most of the ambient light comes from the ceiling, the narrow diffusion angle can improve the gain of the screen 100, and on the other hand, the wide-angle ambient incident light can be reflected by the fresnel layer 130 to the direction of the floor, and will not enter the field of view of the audience like diffuse reflection, which can improve the contrast of the screen 100 against ambient light. In an application scenario, the weight ratio of the absorbing material to the reflecting material in the projection reflecting layer 140 is 1: 1.
The surface diffusion layer 120 faces the user side when the screen 100 is used. Specifically, the divergence angle of the outgoing light rays emitted after being reflected by the fresnel layer 130 is generally small, and the surface diffusion layer 120 can increase the divergence angle of the outgoing light rays and increase the visible range of the projection picture. The surface diffusion layer 120 may be a single-layer structure or a multi-layer composite structure, and the substrate 110 and the surface diffusion layer 120 may be made of the same substrate, and in this case, during the preparation, the substrate 110 and the surface diffusion layer 120 on the surface of the substrate 110 are formed by performing roughening treatment on the surface of the substrate in a manner of sand blasting, chemical etching, or the like.
With reference to fig. 2 and 3, in the present embodiment, the fresnel layer 130 is a portion of the concentric annular fresnel lens shown in fig. 3, which is cut off from the fresnel lens by off-axis cutting, so as to obtain the fresnel structure layer shown in fig. 2. Off-axis is taken in a manner that does not include the center of the fresnel lens. The concentric circular Fresnel lens is intercepted by adopting an off-axis intercepting mode, so that the intercepted rectangular surface does not contain the circle center mainly because the Fresnel layer has a part of non-working surface near the circle center, and the incident light of the projection equipment can not effectively reflect the projection light to the visual field range of an observer in a part of area of the screen. Specifically, the fresnel layer 130 includes a plurality of microstructure units, which are arc-shaped and sequentially arranged outward based on the same center. The longitudinal center line of the screen is taken as a symmetry axis, the arc-shaped microstructure units on the left side and the right side of the screen are symmetrical about the longitudinal center line, and the same circle center of the arc-shaped microstructure units is positioned on the extension line of the longitudinal center line.
In the present embodiment, the diffusion of the projection reflection layer 140 and the diffusion of the fresnel layer 130 work together to make the angle range of the field of view of the screen 100 be ± 30 ° to ± 60 °.
In the present embodiment, the reflectance of the projection reflection layer 140 is 10% to 50%, preferably 15% to 45%, and for example, the reflectance of the projection reflection layer 140 is 10%, 15%, 45%, or 50%, and the diffusion angle is ± 5 ° to ± 35 °.
In this embodiment, the material of the fresnel layer 130 further includes a diffusing material, which can increase the angle of view.
In the present embodiment, the reflective material includes a metal material, for example, the reflective material includes at least one of aluminum sheet, aluminum powder, and silver powder, wherein the metal material is used for scattering incident light; and/or the absorbing material comprises organic pigment and inorganic pigment, wherein the organic pigment can be organic pigment such as azo and the like, and the inorganic pigment can be inorganic pigment such as carbon black, graphite or metal oxide and the like; and/or the diffusion material comprises at least one of epoxy organic resin particles, acrylic organic resin particles, silicone organic resin particles, or the diffusion material comprises other inorganic scattering materials. In an application scenario, the raw materials of the projection reflection layer 140 include an auxiliary agent and a solvent in addition to a reflection material, a diffusion material and an absorption material, wherein the auxiliary agent and the solvent include a mixture of a leveling agent, a wetting agent, a defoaming agent and the like in a certain proportion for increasing the coating effect, or a mixture of anhydrous acetone, anhydrous xylene, anhydrous cyclohexanone, anhydrous butanone, ethyl acetate, anhydrous acetic acid butyl acetate and the like in a certain proportion. In another application scenario, an auxiliary agent and a solvent are used in the process of preparing the projection reflective layer 140, but the auxiliary agent and the solvent are volatilized due to heating volatilization after the preparation is completed, that is, the auxiliary agent and the solvent are not included in the projection reflective layer 140 after the preparation is completed.
In an application scenario, the particle size range of the particles in the projection reflective layer 140 is 0.5 to 10 micrometers, for example, 0.5 micrometer, 5 micrometers, or 10 micrometers, so as to ensure that the projection reflective layer 140 does not scatter incident light at a large angle.
With reference to fig. 1 and fig. 2, in the present embodiment, the fresnel layer 130 includes a plurality of microstructure units 131, each microstructure unit 131 is sequentially arranged and has a circular arc shape, and each microstructure unit arranged in the circular arc shape has a common center of circle, and the center of circle is located outside the screen and below the screen. Specifically, the center of the circle is located on an extension line of a longitudinal center line of the screen. From the cross-sectional structure of the screen, the cross-section of the plurality of microstructure units 131 forms a sawtooth structure, each microstructure unit 131 includes a first incident surface 1311 and a second incident surface 1312 which intersect, the first incident surface 1311 is used for reflecting the ambient light and the projector light, wherein the first incident surface 1311 and the substrate 110 are defined to form a first included angle θ1The included angle between the second incident surface 1312 and the substrate 110 is a second included angle θ2。
First included angle theta corresponding to microstructure unit 1311The radius r corresponding to the microstructure unit 131 is a cubic function of a unit, and the second included angle theta2Is in the range of 70 degrees to 90 degrees, e.g., the second angle θ2At 70 degrees, 80 degrees, 89 degrees or 90 degrees.
Specifically, the second included angle θ 2 is set to be 70 degrees to 90 degrees, as shown in fig. 9, which can ensure that the light of the projector can enter the first incident surface 1311, and can also facilitate processing.
In this embodiment, the microstructure unit 131 corresponds toFirst included angle theta1The radii r corresponding to the microstructure units 131 satisfy the following unitary cubic function relationship:
θ1＝4.571083383282×10-9r3±1.806338129502×10-5r2+3.095398653774×10-2r +3.037333879930+ Δ θ, where-3 < Δ θ < 3.
Specifically, the boundary edge of the first incident surface 1311 and the second incident surface 1312 corresponding to each microstructure unit 131 is an arc, the arc is a part of a circle, and the radius of the circle corresponding to the arc is the radius r corresponding to the microstructure unit 131.
Specifically, the microstructure unit 131 has a corresponding first included angle θ1Depending on the lens parameters of the projector and the tolerance range of the design, the lens parameters include the projection ratio, which is the ratio of the vertical distance (a) from the light outlet of the projector to the surface of the screen 100 to the width of the projected image, and the installation offset of the lens relative to the screen 100, which includes a parameter a and a parameter B1, as shown in fig. 5, where a is the vertical distance from the light outlet of the projector to the surface of the screen 100 and B1 is the vertical distance from the light axis of the projector to the bottom surface of the screen 100.
And a first included angle theta corresponding to the microstructure unit 131 is set1The radius r corresponding to the microstructure unit 131 satisfies the unitary cubic function relationship, so that the screen 100 can be used with a projector having the following parameters: the range of the projection ratio is 0.22-0.24, and the installation offset is as follows: a 517mm, B1 249mm, and the mounting offsets a and B1 have a deviation of ± 50 mm.
When the screen 100 is used with the projector, the picture reflected by the screen 100 can ensure that the user can watch the picture within a range of 2 meters to 5 meters in front of the screen 100.
In a specific application scenario, the first included angle θ1Varying within the range of 0-30 deg.
In the embodiment, the projection reflection layer 140 is uniformly disposed on the surface of the fresnel layer 130, and the thickness of the projection reflection layer 140 ranges from 1/10 to 1/5 of the distance between two adjacent microstructure units 131.
Specifically, the projection reflection layer 140 is uniformly disposed on the surface of the fresnel layer 130, so that the reflectivity of the projection reflection layer 140 is uniform, and the first included angle θ of the microstructure unit 131 is not changed to ensure that the projection reflection layer 140 is disposed1And a second angle theta2The thickness of the projection reflection layer 140 is set to be not more than 1/5 of the distance between two adjacent microstructure units 131, specifically, the thickness of the projection reflection layer 140 is set to be 1/10-1/5 of the distance between two adjacent microstructure units 131, for example, the thickness of the projection reflection layer 140 is 1/10, 1/8 or 1/5 of the distance between two adjacent microstructure units 131.
In a specific application scenario, the thickness of the projection reflective layer 140 ranges from 10 to 30 micrometers, for example, the thickness of the projection reflective layer 140 is 10 micrometers, 20 micrometers or 30 micrometers.
In the present embodiment, the surface diffusion layer 120 has an anisotropic diffusion angle, i.e., a diffusion angle in the horizontal direction (i.e., a horizontal diffusion angle) and a diffusion angle in the vertical direction (i.e., a vertical diffusion angle) are different, and the light spots are distributed in an elliptical shape, as shown in fig. 6 and 7.
In an application scenario, in order to effectively enlarge the horizontal field of view of the screen 100 without reducing the reflection gain of the screen 100, the horizontal diffusion angle of the surface diffusion layer 120 is set to be greater than the vertical diffusion angle. For example, the surface diffusion layer 120 is provided with a horizontal diffusion angle of 20 degrees and a vertical diffusion angle of 10 degrees.
In the present embodiment, the surface roughness Ra of the surface diffusion layer 120 ranges from 0.5 micrometers to 50 micrometers, and for example, the surface roughness Ra is 0.5 micrometers, 5 micrometers, 20 micrometers, or 50 micrometers.
Specifically, the surface roughness Ra of the surface diffusion layer 120 is set to be in a range of 0.5 to 50 micrometers, so that the final viewing angle of the screen 100 can be controlled within a range of ± 20 to 50 degrees, and a ceiling ghost image caused by fresnel reflection can be eliminated.
In this embodiment, the cross section of the microstructure unit 131 is triangular, while in other embodiments, the cross section of the microstructure unit 131 may also be other shapes such as trapezoid, in short, when viewed from the longitudinal cross section of the screen, as long as the plurality of microstructure units 131 form a saw-tooth structure, the application is not limited with respect to the specific shape thereof.
Meanwhile, in the present embodiment, the plurality of microstructure units 131 are arranged in a periodic manner, and in other embodiments, the plurality of microstructure units 131 may not be arranged in a periodic manner.
Referring to fig. 8, fig. 8 is a schematic flow chart of an embodiment of a method for manufacturing a screen according to the present application.
With reference to fig. 9, the preparation method includes:
s210: a surface of one side of the substrate 210 is subjected to a roughness treatment to form a surface diffusion layer 220 on the surface of one side of the substrate 210.
The roughness treatment may be performed by sandblasting, chemical etching, or the like.
S220: a fresnel layer 230 is formed on the other side surface of the substrate 210.
The fresnel layer 230 may be formed by UV glue transfer printing or hot embossing.
S230: a projection reflection layer 240 is formed on a surface of the fresnel layer 230, which is far away from the substrate 210, wherein a material of the projection reflection layer 240 includes a reflection material and an absorption material, and/or the fresnel layer 230 includes a plurality of microstructure units, and the plurality of microstructure units are sequentially arranged outwards based on a same circle center. The Fresnel layer is a portion cut from the Fresnel lens by off-axis cutting.
The formation method of the projection reflection layer 240 may be spraying, screen printing, or the like.
The structure of the screen prepared by the preparation method of the embodiment is the same as that of the screen 100 in the embodiment, and the detailed structure of the screen can be referred to the embodiment, which is not described herein again.
Referring to fig. 10, fig. 10 is a schematic flow chart of another embodiment of the screen manufacturing method of the present application. With reference to fig. 11, the preparation method includes:
s310: a roughness treatment is performed on one side surface of the first substrate 311 to form a surface diffusion layer 320 on one side surface of the first substrate 311.
The roughness treatment may be performed by sandblasting, chemical etching, or the like.
S320: a fresnel layer 330 is formed on one side surface of the second substrate 312.
The fresnel layer 330 may be formed by UV glue transfer printing or hot embossing.
S330: a projection reflection layer 340 is formed on a surface of the fresnel layer 330 on a side away from the second substrate 312.
The formation method of the projection reflection layer 340 may be spraying, screen printing, or the like.
S340: the first substrate 311 and the second substrate 312 are stacked, and the surface of the first substrate 311, on which the surface diffusion layer 320 is not formed, is in contact with the surface of the second substrate 312, on which the fresnel layer 330 is not formed, wherein the material of the projection reflection layer 340 includes a reflection material and an absorption material, and/or the fresnel layer 330 includes a plurality of microstructure units, and the plurality of microstructure units are sequentially arranged outwards based on the same circle center. The Fresnel layer is a portion cut from the Fresnel lens by off-axis cutting.
When the first substrate 311 and the second substrate 312 are stacked, the first substrate 311 and the second substrate 312 may be bonded together by an adhesive such as glue.
The material of the first substrate 311 and the material of the second substrate 312 may be the same or different, and the screen manufactured by the manufacturing method of this embodiment has the same structure as the screen 100 in the above embodiment, and the detailed structure of the screen may refer to the above embodiment, which is not described herein again.
Referring to fig. 12, fig. 12 is a schematic structural diagram of an embodiment of a projection system according to the present application. The projection system 400 includes a projector 410 and a screen 420.
The projector 410 may be a short-focus projector or a long-focus projector, and is not limited herein.
The screen 420 has the same structure as the screen 100 in any of the above embodiments, and reference may be made to the above embodiments specifically, which are not described herein again.
In summary, the screen of the present application can make the projection reflection layer have a narrow diffusion angle due to the material of the projection reflection layer including both the reflection material and the absorption material, and can improve the gain and the ambient light contrast of the screen in combination with the excellent collimation characteristic of the fresnel layer.
The above description is only for the purpose of illustrating embodiments of the present application and is not intended to limit the scope of the present application, and all modifications of equivalent structures and equivalent processes, which are made by the contents of the specification and the drawings of the present application or are directly or indirectly applied to other related technical fields, are also included in the scope of the present application.
Claims (11)
1. A screen, comprising:
a substrate;
the surface diffusion layer is arranged on one side surface of the substrate;
the Fresnel layer is arranged on the surface of one side of the substrate, which is far away from the surface diffusion layer;
the projection reflection layer is arranged on the surface of one side, far away from the substrate, of the Fresnel layer;
the Fresnel layer comprises a plurality of micro-structure units, and the micro-structure units are sequentially arranged outwards based on the same circle center.
2. A screen as recited in claim 1, wherein the fresnel layer is formed by off-axis sectioning from a portion of a fresnel lens that is concentric circular.
3. A screen according to claim 2,
the microstructure unit comprises a first incidence surface and a second incidence surface which are intersected, the first incidence surface is used for reflecting ambient light and projector light, wherein an included angle between the first incidence surface and the substrate is defined as a first included angle, and an included angle between the second incidence surface and the substrate is defined as a second included angle;
the first included angle corresponding to the microstructure unit and the radius corresponding to the microstructure unit are in a unitary cubic function relationship, and the angle range of the second included angle is 70-90 degrees.
4. A screen according to claim 1,
the projection reflection layer is uniformly arranged on the surface of the Fresnel layer, and the thickness range of the projection reflection layer is 1/10-1/5 of the distance between every two adjacent microstructure units.
5. A screen according to claim 1,
the reflective material comprises a metallic material; and/or the presence of a gas in the gas,
the absorbing material comprises organic pigment and inorganic pigment.
6. A screen as recited in claim 1, wherein the surface diffusion layer has a different horizontal diffusion angle than a vertical diffusion angle.
7. A screen according to claim 6,
the horizontal diffusion angle of the surface diffusion layer is larger than the vertical diffusion angle.
8. A screen according to claim 1,
the surface roughness Ra of the surface diffusion layer ranges from 0.5 micrometer to 50 micrometers.
9. A screen as recited in claim 1, wherein the material of the projection reflective layer further comprises a diffusing material.
10. A method of manufacturing a screen, the method comprising:
carrying out roughness treatment on one side surface of the substrate to form a surface diffusion layer on one side surface of the substrate;
forming a Fresnel layer on the surface of the other side of the substrate;
forming a projection reflection layer on the surface of one side, far away from the substrate, of the Fresnel layer;
the Fresnel layer comprises a plurality of micro-structure units, and the micro-structure units are sequentially arranged outwards based on the same circle center.
11. A method of manufacturing a screen, the method comprising:
performing roughness treatment on one side surface of a first substrate to form a surface diffusion layer on one side surface of the first substrate;
forming a Fresnel layer on one side surface of the second substrate;
forming a projection reflection layer on the surface of one side, far away from the second substrate, of the Fresnel layer;
laminating the first substrate and the second substrate, and contacting the surface of the first substrate, on which the surface diffusion layer is not formed, with the surface of the second substrate, on which the Fresnel layer is not formed;
the Fresnel layer comprises a plurality of micro-structure units, and the micro-structure units are sequentially arranged outwards based on the same circle center.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010067441.9A CN113219779A (en) | 2020-01-20 | 2020-01-20 | Screen, preparation method thereof and projection system |
| PCT/CN2020/137118 WO2021147577A1 (en) | 2020-01-20 | 2020-12-17 | Screen and preparation method therefor, and projection system |
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| Application Number | Priority Date | Filing Date | Title |
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| CN202010067441.9A CN113219779A (en) | 2020-01-20 | 2020-01-20 | Screen, preparation method thereof and projection system |
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| CN113219779A true CN113219779A (en) | 2021-08-06 |
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| CN202010067441.9A Pending CN113219779A (en) | 2020-01-20 | 2020-01-20 | Screen, preparation method thereof and projection system |
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| WO (1) | WO2021147577A1 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20220221780A1 (en) * | 2019-05-30 | 2022-07-14 | Appotronics Corporation Limited | Projection screen |
| CN116047854A (en) * | 2023-04-03 | 2023-05-02 | 深圳市真屏科技发展有限公司 | Optical structure projection film and one-time processing forming method thereof |
| WO2024022515A1 (en) * | 2022-07-28 | 2024-02-01 | 青岛海信激光显示股份有限公司 | Projection screen, projection system, die and die master |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| KR102014256B1 (en) * | 2012-01-18 | 2019-08-26 | 엘지전자 주식회사 | Display screen for image display system and method for manufacturing the same |
| JP2015069150A (en) * | 2013-09-30 | 2015-04-13 | 大日本印刷株式会社 | Reflection screen and image display system including reflection screen |
| US10197905B2 (en) * | 2014-01-15 | 2019-02-05 | Lg Electronics Inc. | Reflective screen, display having the same and method for manufacturing reflective screen |
| JP6492597B2 (en) * | 2014-12-04 | 2019-04-03 | 大日本印刷株式会社 | Reflective screen, video display system |
| JP7034618B2 (en) * | 2017-07-19 | 2022-03-14 | 株式会社有電社 | Reflective screen |
| CN110554558A (en) * | 2018-05-31 | 2019-12-10 | 深圳光峰科技股份有限公司 | High-contrast reflecting screen |
| CN208999755U (en) * | 2018-11-16 | 2019-06-18 | 烟台市谛源光科有限公司 | A kind of short focus projection front projection curtain |
| CN110262178A (en) * | 2019-07-22 | 2019-09-20 | 顾亮 | A kind of arc reflection curtain for ultrashort burnt orthographic projection |
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2020
- 2020-01-20 CN CN202010067441.9A patent/CN113219779A/en active Pending
- 2020-12-17 WO PCT/CN2020/137118 patent/WO2021147577A1/en active Application Filing
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20220221780A1 (en) * | 2019-05-30 | 2022-07-14 | Appotronics Corporation Limited | Projection screen |
| US11892765B2 (en) * | 2019-05-30 | 2024-02-06 | Appotronics Corporation Limited | Projection screen |
| WO2024022515A1 (en) * | 2022-07-28 | 2024-02-01 | 青岛海信激光显示股份有限公司 | Projection screen, projection system, die and die master |
| CN116047854A (en) * | 2023-04-03 | 2023-05-02 | 深圳市真屏科技发展有限公司 | Optical structure projection film and one-time processing forming method thereof |
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| WO2021147577A1 (en) | 2021-07-29 |
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