CN113165083B - 涂层刀具和具备它的切削刀具 - Google Patents
涂层刀具和具备它的切削刀具 Download PDFInfo
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- CN113165083B CN113165083B CN201980078836.4A CN201980078836A CN113165083B CN 113165083 B CN113165083 B CN 113165083B CN 201980078836 A CN201980078836 A CN 201980078836A CN 113165083 B CN113165083 B CN 113165083B
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- 238000005520 cutting process Methods 0.000 title claims abstract description 71
- 239000010410 layer Substances 0.000 claims abstract description 163
- 230000003628 erosive effect Effects 0.000 claims abstract description 30
- 239000002245 particle Substances 0.000 claims abstract description 26
- 239000000758 substrate Substances 0.000 claims abstract description 26
- 239000011248 coating agent Substances 0.000 claims abstract description 16
- 238000000576 coating method Methods 0.000 claims abstract description 16
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims abstract description 10
- 239000011247 coating layer Substances 0.000 claims abstract description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 13
- 239000007788 liquid Substances 0.000 claims description 5
- 239000011159 matrix material Substances 0.000 claims description 4
- 239000007789 gas Substances 0.000 description 41
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 14
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 14
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 12
- 239000001257 hydrogen Substances 0.000 description 8
- 229910052739 hydrogen Inorganic materials 0.000 description 8
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 8
- 210000001787 dendrite Anatomy 0.000 description 7
- 229910052757 nitrogen Inorganic materials 0.000 description 7
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 6
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 238000005299 abrasion Methods 0.000 description 6
- 229910002091 carbon monoxide Inorganic materials 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 239000000843 powder Substances 0.000 description 6
- 238000012360 testing method Methods 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 239000010936 titanium Substances 0.000 description 5
- 238000005229 chemical vapour deposition Methods 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 238000003754 machining Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 3
- 239000011195 cermet Substances 0.000 description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 3
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 229910003460 diamond Inorganic materials 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- 239000011812 mixed powder Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 239000012495 reaction gas Substances 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 229910000851 Alloy steel Inorganic materials 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- 229910000975 Carbon steel Inorganic materials 0.000 description 1
- 229910001018 Cast iron Inorganic materials 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- 229910001141 Ductile iron Inorganic materials 0.000 description 1
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 1
- 229910000997 High-speed steel Inorganic materials 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 238000003991 Rietveld refinement Methods 0.000 description 1
- 229910010038 TiAl Inorganic materials 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000009412 basement excavation Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000010962 carbon steel Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 239000002173 cutting fluid Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000635 electron micrograph Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 229910000037 hydrogen sulfide Inorganic materials 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- UNASZPQZIFZUSI-UHFFFAOYSA-N methylidyneniobium Chemical compound [Nb]#C UNASZPQZIFZUSI-UHFFFAOYSA-N 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/403—Oxides of aluminium, magnesium or beryllium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
- B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
- B23B27/148—Composition of the cutting inserts
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/36—Carbonitrides
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/32—Carbides
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/34—Nitrides
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- C23C28/042—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
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- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/044—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material coatings specially adapted for cutting tools or wear applications
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- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/048—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material with layers graded in composition or physical properties
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- C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
- C23C30/005—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process on hard metal substrates
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B2222/00—Materials of tools or workpieces composed of metals, alloys or metal matrices
- B23B2222/04—Aluminium
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B2224/00—Materials of tools or workpieces composed of a compound including a metal
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- B23B—TURNING; BORING
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- B23B—TURNING; BORING
- B23B2224/00—Materials of tools or workpieces composed of a compound including a metal
- B23B2224/36—Titanium nitride
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- B23B—TURNING; BORING
- B23B2228/00—Properties of materials of tools or workpieces, materials of tools or workpieces applied in a specific manner
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B23B—TURNING; BORING
- B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
- B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
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- Chemical Kinetics & Catalysis (AREA)
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- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
本发明的涂层刀具具备基体、和位于该基体之上的涂层。所述涂层具有：位于所述基体的附近，厚度为1μm以上的第一层；与该第一层相接，并且位于与所述第一层相比距基体远的位置，含多个Al2O3粒子的第二层。关于使纯水中分散有3质量％的平均粒径为1.1～1.3μm的球形的Al2O3粒子的液体A冲突而得到的侵蚀率，所述第二层的侵蚀率A2与所述第一层的侵蚀率A1之差(A2－A1)为0.60～－0.30μm/g。本发明的切削刀具具备：从第一端朝向第二端延伸，在所述第一端侧具有卡槽的刀柄；和位于所述卡槽的上述的涂层刀具。
Description
技术领域
本发明涉及在基体的表面具有涂层的涂层刀具和具备它的切削刀具。
背景技术
已知有在硬质合金、金属陶瓷和陶瓷等的基体表面形成有层叠TiN层、TiCN层和Al2O3层而成的涂层的切削刀具等的涂层刀具。
切削刀具，伴随着最近的切削加工的高效率化，被用于刃口受到大冲击这样的重载断续切削等的机会增加。在这样苛刻的切削条件下，涂层遭受大的冲击，容易发生涂层的崩损和剥离。因此对于涂层来说，除了耐磨耗性以外，还要求耐崩损性的提高。
在上述切削刀具中，作为使耐崩损性提高的技术，在专利文献1中公开有一种按顺序成膜结合膜和Al2O3层，在结合膜上设置向Al2O3层侧延伸的树状突起和与树状突起相连的枝状突起，从而提高结合膜与Al2O3层的结合力，抑制涂层的剥离的技术。专利文献1的树状突起，公开的是Ti(CO)或Ti(CNO)，枝状突起是(TiAl)(CNO)，并记载有在形成树状突起后，先停止流通原料气体，一边保持温度，一边改变压力、原料气体的种类，形成与树状突起组成不同的枝状突起。
在先技术文献
专利文献
专利文献1：日本专利第5303732号公报
发明内容
本发明的涂层刀具具备：基体、和位于该基体之上的涂层。所述涂层具有：位于所述基体的附近，厚度为1μm以上的第一层；和与该第一层相接，并且位于与所述第一层相比距基体远的位置的、含有多个Al2O3粒子的第二层。关于使纯水中分散有3质量％的平均粒径为1.1～1.3μm的球形的Al2O3粒子的液体A冲突而得到的侵蚀率，所述第二层的侵蚀率A2与所述第一层的侵蚀率A1之差(A2－A1)为0.60～－0.30μm/g。本发明的切削刀具具备：从第一端向第二端延伸，在所述第一端侧具有卡槽的刀柄；位于所述卡槽的上述的涂层刀具。
附图说明
图1是表示本发明的涂层刀具的一例的概略立体图。
图2是用于说明图1的涂层刀具的涂层的截面的构成的示意图。
图3是表示本发明的切削刀具的一例的俯视图。
具体实施方式
本发明的涂层刀具，在图1所示的例子中，是主视大体呈四边形的板状。但是，并不限定为该形状。在涂层刀具1具有第一面2(以下记述为主面2。)和第二面3，并在第一面2与第二面3相交的部分的至少一部分上具有刃口4。第一面2是被称为前刀面的面，第二面3是被称为后刀面的面。因此，也可以说在前刀面2与后刀面3相交的部分的至少一部分上具有刃口4。
另外，如图2的用于说明涂层刀具1的涂层7的截面的构成的示意图所示，涂层刀具1具备基体5、和位于该基体5的表面的涂层7。
构成涂层刀具1的基体5的材质，可列举硬质合金、陶瓷或金属。作为硬质合金，可以是含有碳化钨(WC)、和钴(Co)或镍(Ni)等的铁属金属的硬质合金。作为其他的硬质合金，可以是含有碳氮化钛(TiCN)、和钴(Co)或镍(Ni)等的铁属金属的Ti基金属陶瓷。陶瓷也可以是Si3N4、Al2O3、金刚石、立方氮化硼(cBN)。作为金属可以是碳钢、高速钢、合金钢。在上述材质之中，作为涂层刀具1使用时，基体5由硬质合金或金属陶瓷构成，在耐崩损性和耐磨耗性的方面良好。
涂层7具有：位于基体5的附近的、厚度为1μm以上的第一层7a；和与第一层7a相接，并且位于与第一层7a相比距基体5远的位置的、含有多个Al2O3粒子的第二层7b。
本发明的涂层刀具1具有这样的结构，并且关于使相对于纯水100质量％分散有3质量％的平均粒径1.1～1.3μm的球形的Al2O3粒子得到的液体A冲突而得到的侵蚀率，第二层7b的侵蚀率A2与第一层7a的侵蚀率A1之差(A2－A1)为0.60～－0.30μm/g。
还有，所谓侵蚀率，就是通过使液体A冲突测试体，从而评价被除去的测试体的深度而得到的。因此，若该侵蚀率小，则测试体的耐磨耗性高。换言之，侵蚀率小的测试体难以磨耗。还有，在测量侵蚀率时，可以使液体A相对于对象物的表面以大体直角接触，以98～102m/s的速度使液体冲突。
在侵蚀率的测量中，可以使用Palmeso公司制的MSE试验机MSE－Al2O3。
如本发明的涂层刀具1这样，涂膜7是层叠膜时，位于距基体5远一方的第二层7b先因磨耗而变薄。该磨耗并非均匀地发生，而是存在易磨耗的部分和难磨耗的部分。在易磨耗的部分，第二层7b先消失，最早露出第一层7a。在其周围存在第二层7b残留的部分。换言之，就是在第一层7a露出的部分的周围，以第一层7a与第二层7b的界面露出的状态存在。
在此状态下，若使第一层7a与第二层7b的侵蚀率之差在本发明的范围，则能够抑制磨损的状态急剧变化，因此，本发明的涂层刀具1耐剥离性高。
还有，也可以有1.0μm以下的中间层(未图示)位于第一层7a与第二层7b之间。像这样在第一层7a与Al2O3层7b之间存在中间层时，如果中间层的厚度为1.0μm以下，则也是在第一层7a之上具有与第一层7a相接而定位的第二层7b的结构。
还有，如果中间层是第一中间层(未图示)和第二中间层(未图示)的层叠体，其总厚度在1μm以下时，在本发明中也视为中间层。
可以是侵蚀率A1小于侵蚀率A2。换言之，可以是第一层7a比第二层7b难以磨损。若具有这样的构成，则能够在第一层露出之后，抑制第一层急剧地磨损。
另外，侵蚀率A2可以为1.0～1.5μm/g，侵蚀率A1可以为0.7～1.2μm/g。若具有这样的构成，则耐剥离性更高。
第一层7a可以是例如含多个TiN粒子的TiN层、含多个TiC粒子的TiC层、含多个TiCN粒子的TiCN层和含多个TiCNO粒子的TiCNO层。第二层7b可以是例如含多个Al2O3粒子的Al2O3层和含多个ZrO2粒子的ZrO2层。
这些所谓TiN层、TiC层、TiCN层、TiCNO层意思是分别以TiN、TiC、TiCN、TiCNO作为主成分而含有。所谓主成分是指各个层所包含的结晶之中，含有50质量％以上。其含量例如通过使用了X射线衍射的Rietveld法分析而求得即可。
另外，涂层7也可以具有与第二层7b相接，并且位于与第二层7b相比距基体5远的位置的第三层7c。第三层7c可以是含多个TiN粒子的TiN层、含多个TiC粒子的TiC层、含多个TiCN粒子的TiCN层。若具有这样的第三层7c，则耐磨损性、耐崩损性优异，摩擦小，因此能够顺畅地排出切屑。另外，第三层7c也可以是最表层。
另外，第三层的侵蚀率A3与第二层的侵蚀率A2之差(A3－A2)可以是0.0～2.0μm/g。
另外，基体5可以是以WC为主成分的所谓硬质合金。另外，也可以使用以cBN或金刚石为主成分的基体5。
另外，可以在基体5与第一层7a之间还具有由TiN构成的衬底层(未图示)。衬底层具有在基体5含有Co、C(碳)、W(钨)等成分时，抑制这些成分扩散至存在于衬底层之上的层中的功能。衬底层可以为0.1μm～1.0μm的厚度。
另外，可以在第一层7a与第二层7b之间还具有TiCN和TiCNO层(未图示)作为中间层。中间层也可以由多个中间层构成。该中间层的厚度分别低于1μm。
还有，各层的构造和厚度，以及构成各层的结晶的形状等，可以通过观察涂层刀具1的截面的电子显微镜照片(扫描型电子显微镜(SEM)照片或透射电子显微镜(TEM)照片)进行测量。
此外，上述涂层刀具1，是将形成前刀面与后刀面的交叉部的刃口抵住被切削物而进行切削加工的刀具，能够发挥上述优异的效果。另外，本发明的涂层刀具1，除了切削刀具以外，也可以应用到滑动零件和模具等的耐摩零件，挖掘工具、刀具等的工具，耐冲击零件等的各种用途，这种情况下也具有优异的机械可靠性。
接下来，对于本发明的工具的制造方法，说明一例。
首先，在通过烧成而能够形成作为基体的硬质合金的碳化物、氮化物、碳氮化物、氧化物等的无机物粉末中，适宜添加金属粉末、碳粉末等，加以混合，制作混合粉末。其次，使用该混合粉末，通过冲压成型、浇铸成型、挤压成型、冷等静压成型等的公知的成型方法，成型为特定的刀具形状。将该成型体，在真空中或非氧化性气氛中烧成，由此制作上述基体。而后，对于基体的表面，根据要求而实施研磨加工和刃口部的珩磨加工。
接下来，在其表面通过化学气相沉积(CVD)法成膜涂层。
首先，将基体放置在炉膛内，成膜作为衬底层的TiN层。使成膜温度为830℃，气压为8kPa，反应气体的组成中，使四氯化钛(TiCl4)气体为0.1～20体积％，氮(N2)气为20体积％，余量是氢(H2)气而进行成膜。
其次，成膜作为TiCN层的第一层。使成膜温度为830℃，气压为9kPa，作为反应气体组成，以体积％计，使四氯化钛(TiCl4)气体为5.0～20体积％，氮(N2)气为10～90体积％，乙腈(CH3CN)气体为0.3体积％～3.0体积％，余量为氢(H2)气，进行成膜。这时，使乙腈(CH3CN)气体的含有比率在成膜后期比成膜初期有所增加，由此能够成为如下结构：使构成第一TiCN层的碳氮化钛柱状结晶的平均结晶宽度，在表面侧一方比基体侧大。第一层的厚度为1μm以上。第一层的厚度也可以为3～20μm。
接着，制作作为TiCN层的第一中间层。使成膜温度为950℃，气压为9kPa，反应气体的组成中，使四氯化钛(TiCl4)气体为10～20体积％，甲烷(CH4)气体为0.5～10体积％，氮(N2)气为10～70体积％，余量为氢(H2)气而进行成膜。该第一中间层的厚度低于1μm。
接着，成膜作为TiCNO层的第二中间层。首先，使成膜温度为950℃，气压为9kPa，反应气体组成中，使四氯化钛(TiCl4)气体为10～20体积％，甲烷(CH4)气体为0.5～10体积％，氮(N2)气为10～20体积％，一氧化碳(CO)气体为0.1～3.0体积％，余量为氢(H2)气而进行成膜。该第二中间层的厚度低于1μm。另外，第一中间层与第二中间层的厚度之和低于1μm。
作为Al2O3层的第二层，是使成膜温度为980℃～1100℃，气压为5kPa～20kPa，反应气体的组成中，使三氯化铝(AlCl3)气体为5～20体积％，氯化氢(HCl)气体为2～8体积％，二氧化碳(CO2)气体为3～8体积％，硫化氢(H2S)气体为0.001～0.01体积％，余量为氢气(H2)而进行成膜。第二层的厚度可以为1～15μm，
然后，是最表层，成膜作为第三层的TiN层。使成膜温度为1010℃，气压为10kPa，反应气体组成中，使四氯化钛(TiCl4)气体为0.06～5体积％，氮(N2)气为10～30体积％，余量为氢(H2)气，进行成膜。第三层的厚度可以为0.1～2μm。
还有，在上述的例子中，显示的是设有第一中间层和第二中间层和第三层的例子，但也可以直接在基体的表面层叠作为TiCN层的第一层和作为Al2O3层的第二层。
以上，对于本发明的涂层刀具1进行了说明，但本发明不限定为上述的实施方式，在不脱离本发明的要旨的范围，也可以进行各种改良和变更。
＜切削刀具＞
接下来，使用附图对于本发明的切削刀具进行说明。
本发明的切削刀具101，如图3所示，例如，是从第一端(图3中的上端)朝向第二端(图3中的下端)延伸的棒状体。切削刀具101，如图3所示，具备：在第一端侧(前端侧)具有卡槽103的刀柄105；位于卡槽103的上述的涂层刀具1。切削刀具101，因为具备涂层刀具1，所以能够长期进行稳定的切削加工。
卡槽103是安装涂层刀具1的部分，具有相对于刀柄105的下表面平行的支承面，和相对于支承面倾斜的限制侧面。另外，卡槽103在刀柄105的第一端侧开口。
涂层刀具1位于卡槽103。这时，涂层刀具1的下表面可以直接接触卡槽103，另外，在涂层刀具1与卡槽103之间也可以夹隔垫片(未图示)。
涂层刀具1以使第一面2和第二面3相交的棱线上的作为刃口4使用的部分的至少一部分，从刀柄105向外方突出的方式被安装在刀柄105上。在本实施方式中，涂层刀具1由固定螺栓107安装在刀柄105上。即，在涂层刀具1的贯通孔中***固定螺栓107，将该固定螺栓107的前端***形成于卡槽103的螺栓孔(未图示)而使螺栓部之间拧紧，由此涂层刀具1被安装在刀柄105上。
作为刀柄105的材质，能够使用钢、铸铁等。在这些构件之中也可以使用韧性高的钢。
在本实施方式中，例示的是用于所谓的车削加工的切削刀具101。作为车削加工，例如，可列举内径加工、外径加工和开槽加工等。还有，作为切削刀具101不限定用于车削加工。例如，用于滚削加工的切削刀具也可以使用上述的实施方式的涂层刀具1。
实施例
首先，按照平均粒径1.2μm的金属钴粉末6质量％，平均粒径2.0μm的碳化钛粉末0.5质量％，平均粒径2.0μm的碳化铌粉末5质量％，余量为平均粒径1.5μm的碳化钨粉末这一比例，添加以上粉末并混合，通过冲压成型而成型为刀具形状(CNMG120408)。其后，实施脱蜡处理，在1500℃，0.01Pa的真空中进行1小时烧成，制作由硬质合金构成的基体。其后，对制作的基体进行刷光加工，对于作为刃口的部分实施R珩磨。
其次，对于上述的硬质合金的基体，通过化学气相沉积(CVD)法，将表1所示的单独的成膜条件如表2、表3所述那样加以组合而成膜涂层，制作涂层刀具。但是，在第一层与第二层之间，按顺序制膜作为TiCNO层的第一中间层和作为TiCN层的第二中间层。第一中间层的厚度为0.5μm，第二中间层的厚度为0.1μm。
在表1中，T1～T5是TiCN层的成膜条件。另外，A1～A5是Al2O3层的成膜条件。S1～S3是TiN层的成膜条件。
在表1中，各化合物以化学符号表述。第一层的厚度均为6μm。第二层的厚度均为4μm。第三层的厚度为0.5μm。
表2所示的第一层均是TiCN层。另外，表2所示的第二层均是Al2O3层。另外，表3所示的第三层均是TiN层。
在表1中，各原料气体由化学符号表述，各原料气体所占的比例以体积％表示。
还有，表中未记述的第一中间层，是使成膜温度为950℃，气压为9kPa，反应气体的组成中，使四氯化钛(TiCl4)气体为15体积％，甲烷(CH4)气体为5体积％，氮(N2)气为20体积％，余量为氢(H2)气而进行成膜。
另外，表中未记述的第二中间层层9，首先，是使成膜温度为950℃，气压为9kPa，反应气体组成中，使四氯化钛(TiCl4)气体为15体积％，甲烷(CH4)气体为5体积％，氮(N2)气为15体积％，一氧化碳(CO)气体为1.0体积％，余量为氢(H2)气而进行成膜。
上述试料中，对于含涂层在内的截面进行SEM观察，测量各层的厚度。其次，对于涂层从直角的方向，使液体A以100m/s的速度进行冲突，测量各层的侵蚀率(μm/g)。
接着，使用得到的涂层刀具，在下述的条件下，进行断续切削试验，评价磨损寿命。试验结果显示在表2、3中。
＜断续切削条件＞
被切削材：球墨铸铁4长开槽套筒材料(FCD700)
工具形状：CNMG120412
切削速度：200m/分钟
进刀速度：0.3mm/rev
切入：1.5mm
其他：使用水溶性切削液
评价项目：剥离发生或因突发缺损导致刀头脱落时的切削时间。
【表1】
【表2】
【表3】
如表2所示，作为本发明的涂层刀具的试料No.4、9、10，剥离的发生得到抑制，寿命长。
另外，如表3所示，第二层的侵蚀率A2与第三层的侵蚀率A3之差(A3－A2)为0.0～2.0μm/g的试料No.26、28，寿命更长。
符号说明
1 涂层刀具
2 前刀面
3 后刀面
4 刃口
5 基体
7 涂层
7a 第一层
7b 第二层
7c 第三层
101 切削刀具
103 卡槽
105 刀柄
107 固定螺栓
Claims (6)
1.一种涂层刀具，其具备基体和位于该基体之上的涂层而成，
所述涂层具有：第一层，所述第一层位于所述基体的附近，厚度为1μm以上；第二层，所述第二层与该第一层相接，并且位于与所述第一层相比距基体远的位置，并包含多个Al2O3粒子，
关于使纯水中分散有3质量％的平均粒径为1.1～1.3μm的球形的Al2O3粒子的液体A以98～102m/s的速度冲突而得到的侵蚀率，
所述第二层的侵蚀率A2与所述第一层的侵蚀率A1之差(A2－A1)为0.60～－0.30μm/g。
2.根据权利要求1所述的涂层刀具，其中，所述侵蚀率A1小于所述侵蚀率A2。
3.根据权利要求1所述的涂层刀具，其中，所述侵蚀率A2为1.0～1.5μm/g，所述侵蚀率A1为0.7～1.2μm/g。
4.根据权利要求2所述的涂层刀具，其中，所述侵蚀率A2为1.0～1.5μm/g，所述侵蚀率A1为0.7～1.2μm/g。
5.根据权利要求1～4中任一项所述的涂层刀具，其中，所述第一层中含有多个TiN粒子、多个TiC粒子、多个TiCN粒子中的任意一种。
6.根据权利要求1～4中任一项所述的涂层刀具，其中，
所述涂层具有第三层，所述第三层与所述第二层相接，并且位于与该第二层相比距所述基体远的位置，
所述第三层的侵蚀率A3与所述第二层的侵蚀率A2之差(A3－A2)为0.0～2.0μm/g。
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