CN113155836A - Photomask surface quality detection method based on visual detection technology - Google Patents
Photomask surface quality detection method based on visual detection technology Download PDFInfo
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- CN113155836A CN113155836A CN202110488511.2A CN202110488511A CN113155836A CN 113155836 A CN113155836 A CN 113155836A CN 202110488511 A CN202110488511 A CN 202110488511A CN 113155836 A CN113155836 A CN 113155836A
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- 238000001514 detection method Methods 0.000 title claims abstract description 25
- 238000005516 engineering process Methods 0.000 title claims abstract description 6
- 230000000007 visual effect Effects 0.000 title claims abstract description 5
- 238000005457 optimization Methods 0.000 claims description 23
- 238000000034 method Methods 0.000 claims description 11
- 230000002159 abnormal effect Effects 0.000 claims description 8
- 230000008054 signal transmission Effects 0.000 claims description 7
- 238000012544 monitoring process Methods 0.000 claims description 5
- 238000011179 visual inspection Methods 0.000 claims description 2
- 238000007689 inspection Methods 0.000 claims 4
- 230000000694 effects Effects 0.000 description 4
- 230000009286 beneficial effect Effects 0.000 description 1
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- 238000000206 photolithography Methods 0.000 description 1
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Abstract
The invention discloses a photomask surface quality detection method based on a visual detection technology, wherein a detection device comprises a photomask carrying platform, an LED backlight source, a mounting plate and an image acquisition mechanism, wherein a photomask to be detected is mounted on the photomask carrying platform, the LED backlight source is mounted right below the photomask to be detected, the mounting plate is mounted above the photomask carrying platform, and the image acquisition mechanism is mounted on the mounting plate.
Description
Technical Field
The invention relates to the technical field of photomask detection, in particular to a photomask surface quality detection method based on a visual detection technology.
Background
Mask (Mask) in IC manufacturing process, a pattern is formed on a semiconductor by photolithography, and in order to copy the pattern on a wafer, the principle of Mask action is required, which is similar to that in developing a photo, an image is copied onto the photo by using a negative film.
After the photomask is used, the surface quality needs to be detected, and the existing detection device has low intelligence degree and low detection efficiency, so that improvement is needed.
Disclosure of Invention
The present invention is directed to a method for inspecting mask surface quality based on visual inspection technology, so as to solve the problems mentioned in the background art.
In order to achieve the purpose, the invention provides the following technical scheme: the detection device comprises a photomask carrying platform, an LED backlight source, a mounting plate and an image acquisition mechanism, wherein the photomask to be detected is mounted on the photomask carrying platform, the LED backlight source is mounted under the photomask to be detected, the mounting plate is mounted above the photomask carrying platform, and the image acquisition mechanism is mounted on the mounting plate.
Preferably, image acquisition mechanism includes high definition wide-angle camera and control box, high definition wide-angle camera installs in the mounting panel below, the control box is installed in the mounting panel up end.
Preferably, be equipped with the controller in the control box, central processing unit, image acquisition unit, image optimization unit, database unit, alarm unit and signal transmission unit are established to the controller, high definition wide-angle camera is connected to the image acquisition unit input, image acquisition unit output passes through image optimization unit and connects central processing unit, central processing unit connects database unit and alarm unit respectively, central processing unit passes through signal transmission unit and connects backstage monitoring terminal.
Preferably, the detection method comprises the following steps:
A. firstly, turning on an LED backlight source, and acquiring a photomask surface image by a high-definition wide-angle camera;
B. the image acquisition unit transmits the acquired image to the image optimization unit for optimization;
C. the optimized image signal is processed by the central processing unit and then transmitted to the database unit to be compared with a preset normal image;
D. if an abnormal image is detected, an alarm signal is sent out immediately;
E. meanwhile, the central processing unit transmits the abnormal images to the background monitoring terminal in real time for reference of technicians.
Preferably, the image optimization unit optimization method in step B is as follows:
a. acquiring a photomask image gray level histogram;
b. setting a gray stretching intermediate value, reducing the gray values of all pixels with gray values smaller than the gray stretching intermediate value by a first set value, and simultaneously increasing the gray values of all pixels with gray values larger than the gray stretching intermediate value by the first set value;
c. judging whether a pixel appears in a set target gray level interval in the processed image gray level histogram;
d. when no pixel appears in the set target gray scale interval, judging whether the processing times of the step b reach the times of a second set value, and stopping processing the image gray scale if the processing times of the step b reach the times of the second set value;
e. when no pixel appears in the set target gray scale interval and the processing frequency of the step b does not reach a second set value, returning to the step b to further process the image gray scale;
f. and when pixels appear in the set target gray scale interval, stopping processing the image gray scale.
Compared with the prior art, the invention has the beneficial effects that: the invention has simple structure and convenient operation, can effectively collect the surface image of the photomask and has high detection efficiency; the image optimization unit optimization method is used for reducing the gray values of all pixels with the gray values smaller than the gray stretching intermediate value by a first set value by setting the gray stretching intermediate value as a threshold value of gray stretching processing, increasing the gray values of all pixels with the gray values larger than the gray stretching intermediate value by the first set value at the same time, and stopping processing until the pixels appear in a set target gray interval or a processing frequency set value is reached, so that the abnormal image identification effect is enhanced, the noise of a polluted part is reduced, and the effect of improving the image identification accuracy is achieved.
Drawings
FIG. 1 is a schematic structural view of the present invention;
FIG. 2 is a block diagram of the control scheme of the present invention;
FIG. 3 is a flow chart of the present invention;
in the figure: the device comprises a photomask carrying platform 1, an LED backlight source 2, a mounting plate 3, a photomask to be detected 4, a high-definition wide-angle camera 5, a control box 6, a central processing unit 7, an image acquisition unit 8, an image optimization unit 9, a database unit 10, an alarm unit 11, a signal transmission unit 12 and a background monitoring terminal 13.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
In the description of the present invention, it should be noted that the terms "upper", "lower", "inner", "outer", "front", "rear", "both ends", "one end", "the other end", and the like indicate orientations or positional relationships based on those shown in the drawings, and are only for convenience of description and simplicity of description, but do not indicate or imply that the referred device or element must have a specific orientation, be constructed in a specific orientation, and be operated, and thus, should not be construed as limiting the present invention. Furthermore, the terms "first" and "second" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.
In the description of the present invention, it is to be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "disposed," "connected," and the like are to be construed broadly, such as "connected," which may be fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meanings of the above terms in the present invention can be understood in specific cases to those skilled in the art.
Referring to fig. 1-3, the present invention provides a technical solution: the detection device comprises a photomask carrying platform 1, an LED backlight source 2, a mounting plate 3 and an image acquisition mechanism, wherein the photomask 4 to be detected is mounted on the photomask carrying platform 1, the LED backlight source 2 is mounted under the photomask 4 to be detected, the mounting plate 3 is mounted above the photomask carrying platform 1, and the image acquisition mechanism is mounted on the mounting plate 3.
According to the invention, the image acquisition mechanism comprises a high-definition wide-angle camera 5 and a control box 6, wherein the high-definition wide-angle camera 5 is arranged below a mounting plate 3, and the control box 6 is arranged on the upper end surface of the mounting plate 3; be equipped with the controller in the control box 6, central processing unit 7, image acquisition unit 8, image optimization unit 9, database unit 10, alarm unit 11 and signal transmission unit 12 are established to the controller, high definition wide-angle camera 5 is connected to image acquisition unit 8 input, central processing unit 7 is connected through image optimization unit 9 to image acquisition unit 8 output, central processing unit 7 connects database unit 10 and alarm unit 11 respectively, central processing unit 7 passes through signal transmission unit 12 and connects backstage monitor terminal 13.
The working principle is as follows: the detection method comprises the following steps:
A. firstly, turning on an LED backlight source, and acquiring a photomask surface image by a high-definition wide-angle camera;
B. the image acquisition unit transmits the acquired image to the image optimization unit for optimization;
C. the optimized image signal is processed by the central processing unit and then transmitted to the database unit to be compared with a preset normal image;
D. if an abnormal image is detected, an alarm signal is sent out immediately;
E. meanwhile, the central processing unit transmits the abnormal images to the background monitoring terminal in real time for reference of technicians.
The image optimization unit optimization method in the step B is as follows:
a. acquiring a photomask image gray level histogram;
b. setting a gray stretching intermediate value, reducing the gray values of all pixels with gray values smaller than the gray stretching intermediate value by a first set value, and simultaneously increasing the gray values of all pixels with gray values larger than the gray stretching intermediate value by the first set value;
c. judging whether a pixel appears in a set target gray level interval in the processed image gray level histogram;
d. when no pixel appears in the set target gray scale interval, judging whether the processing times of the step b reach the times of a second set value, and stopping processing the image gray scale if the processing times of the step b reach the times of the second set value;
e. when no pixel appears in the set target gray scale interval and the processing frequency of the step b does not reach a second set value, returning to the step b to further process the image gray scale;
f. and when pixels appear in the set target gray scale interval, stopping processing the image gray scale.
In conclusion, the photomask surface image acquisition device is simple in structure, convenient to operate, capable of effectively acquiring photomask surface images and high in detection efficiency; the image optimization unit optimization method is used for reducing the gray values of all pixels with the gray values smaller than the gray stretching intermediate value by a first set value by setting the gray stretching intermediate value as a threshold value of gray stretching processing, increasing the gray values of all pixels with the gray values larger than the gray stretching intermediate value by the first set value at the same time, and stopping processing until the pixels appear in a set target gray interval or a processing frequency set value is reached, so that the abnormal image identification effect is enhanced, the noise of a polluted part is reduced, and the effect of improving the image identification accuracy is achieved.
It will be evident to those skilled in the art that the invention is not limited to the details of the foregoing illustrative embodiments, and that the present invention may be embodied in other specific forms without departing from the spirit or essential attributes thereof. The present embodiments are therefore to be considered in all respects as illustrative and not restrictive, the scope of the invention being indicated by the appended claims rather than by the foregoing description, and all changes which come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein. Any reference sign in a claim should not be construed as limiting the claim concerned.
Claims (5)
1. The utility model provides a light shield surface quality detection device based on visual inspection detection technique which characterized in that: the detection device comprises a photomask carrying platform (1), an LED backlight source (2), a mounting plate (3) and an image acquisition mechanism, wherein the photomask (4) to be detected is mounted on the photomask carrying platform (1), the LED backlight source (2) is mounted under the photomask (4) to be detected, the mounting plate (3) is mounted above the photomask carrying platform (1), and the image acquisition mechanism is mounted on the mounting plate (3).
2. The apparatus of claim 1, wherein the inspection device comprises: image acquisition mechanism includes high definition wide-angle camera (5) and control box (6), install in mounting panel (3) below high definition wide-angle camera (5), install in mounting panel (3) up end control box (6).
3. The apparatus of claim 2, wherein the inspection device comprises: be equipped with the controller in control box (6), be equipped with central processing unit (7), image acquisition unit (8), image optimization unit (9), database unit (10), alarm unit (11) and signal transmission unit (12) in the controller, high definition wide-angle camera (5) are connected to image acquisition unit (8) input, central processing unit (7) are connected through image optimization unit (9) to image acquisition unit (8) output, database unit (10) and alarm unit (11) are connected respectively to central processing unit (7), backstage monitor terminal (13) is connected through signal transmission unit (12) in central processing unit (7).
4. The detection method for realizing the photomask surface quality detection device based on the visual detection technology is characterized by comprising the following steps of: the detection method comprises the following steps:
A. firstly, turning on an LED backlight source, and acquiring a photomask surface image by a high-definition wide-angle camera;
B. the image acquisition unit transmits the acquired image to the image optimization unit for optimization;
C. the optimized image signal is processed by the central processing unit and then transmitted to the database unit to be compared with a preset normal image;
D. if an abnormal image is detected, an alarm signal is sent out immediately;
E. meanwhile, the central processing unit transmits the abnormal images to the background monitoring terminal in real time for reference of technicians.
5. The inspection method of claim 4, wherein the inspection method comprises: the image optimization unit optimization method in the step B is as follows:
a. acquiring a photomask image gray level histogram;
b. setting a gray stretching intermediate value, reducing the gray values of all pixels with gray values smaller than the gray stretching intermediate value by a first set value, and simultaneously increasing the gray values of all pixels with gray values larger than the gray stretching intermediate value by the first set value;
c. judging whether a pixel appears in a set target gray level interval in the processed image gray level histogram;
d. when no pixel appears in the set target gray scale interval, judging whether the processing times of the step b reach the times of a second set value, and stopping processing the image gray scale if the processing times of the step b reach the times of the second set value;
e. when no pixel appears in the set target gray scale interval and the processing frequency of the step b does not reach a second set value, returning to the step b to further process the image gray scale;
f. and when pixels appear in the set target gray scale interval, stopping processing the image gray scale.
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| CN202110488511.2A CN113155836A (en) | 2021-05-06 | 2021-05-06 | Photomask surface quality detection method based on visual detection technology |
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN106803238A (en) * | 2016-12-26 | 2017-06-06 | 杭州施强教育科技有限公司 | A kind of answering card image noise reduction processing method |
| CN206223679U (en) * | 2015-11-09 | 2017-06-06 | 艾斯迈科技股份有限公司 | Photomask detection device |
| CN108037142A (en) * | 2017-12-04 | 2018-05-15 | 江苏维普光电科技有限公司 | Mask plate optical defect detection method based on image intensity value |
| CN108037140A (en) * | 2017-12-04 | 2018-05-15 | 江苏维普光电科技有限公司 | A kind of mask plate detection method of surface flaw |
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- 2021-05-06 CN CN202110488511.2A patent/CN113155836A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN206223679U (en) * | 2015-11-09 | 2017-06-06 | 艾斯迈科技股份有限公司 | Photomask detection device |
| CN106803238A (en) * | 2016-12-26 | 2017-06-06 | 杭州施强教育科技有限公司 | A kind of answering card image noise reduction processing method |
| CN108037142A (en) * | 2017-12-04 | 2018-05-15 | 江苏维普光电科技有限公司 | Mask plate optical defect detection method based on image intensity value |
| CN108037140A (en) * | 2017-12-04 | 2018-05-15 | 江苏维普光电科技有限公司 | A kind of mask plate detection method of surface flaw |
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