CN112987433A - Color-adjustable glass and preparation method thereof - Google Patents
Color-adjustable glass and preparation method thereof Download PDFInfo
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- CN112987433A CN112987433A CN201911287197.0A CN201911287197A CN112987433A CN 112987433 A CN112987433 A CN 112987433A CN 201911287197 A CN201911287197 A CN 201911287197A CN 112987433 A CN112987433 A CN 112987433A
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- 239000011521 glass Substances 0.000 title claims abstract description 61
- 238000002360 preparation method Methods 0.000 title abstract description 9
- 239000010410 layer Substances 0.000 claims abstract description 248
- 239000010416 ion conductor Substances 0.000 claims abstract description 42
- 239000011241 protective layer Substances 0.000 claims abstract description 16
- 239000000758 substrate Substances 0.000 claims abstract description 14
- 239000000463 material Substances 0.000 claims description 34
- 238000000034 method Methods 0.000 claims description 17
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 12
- 239000010955 niobium Substances 0.000 claims description 12
- 239000010936 titanium Substances 0.000 claims description 12
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 10
- 229910052758 niobium Inorganic materials 0.000 claims description 10
- 229910052715 tantalum Inorganic materials 0.000 claims description 10
- 229910052719 titanium Inorganic materials 0.000 claims description 10
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 8
- JAONJTDQXUSBGG-UHFFFAOYSA-N dialuminum;dizinc;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Al+3].[Al+3].[Zn+2].[Zn+2] JAONJTDQXUSBGG-UHFFFAOYSA-N 0.000 claims description 8
- 238000002156 mixing Methods 0.000 claims description 8
- 239000011734 sodium Substances 0.000 claims description 8
- 239000011777 magnesium Substances 0.000 claims description 7
- 239000011572 manganese Substances 0.000 claims description 7
- 229910052708 sodium Inorganic materials 0.000 claims description 7
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims description 6
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 6
- 229910052733 gallium Inorganic materials 0.000 claims description 6
- 229910052741 iridium Inorganic materials 0.000 claims description 6
- 229910052744 lithium Inorganic materials 0.000 claims description 6
- 229910052749 magnesium Inorganic materials 0.000 claims description 6
- 229910052748 manganese Inorganic materials 0.000 claims description 6
- 229910052750 molybdenum Inorganic materials 0.000 claims description 6
- 229910052759 nickel Inorganic materials 0.000 claims description 6
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 6
- 229910052700 potassium Inorganic materials 0.000 claims description 6
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 6
- 229910052721 tungsten Inorganic materials 0.000 claims description 6
- 239000011787 zinc oxide Substances 0.000 claims description 6
- 229910052739 hydrogen Inorganic materials 0.000 claims description 5
- 229910052742 iron Inorganic materials 0.000 claims description 5
- 229910052720 vanadium Inorganic materials 0.000 claims description 5
- 150000004767 nitrides Chemical class 0.000 claims description 4
- 229910052710 silicon Inorganic materials 0.000 claims description 4
- 229910052718 tin Inorganic materials 0.000 claims description 4
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 3
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims description 3
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 3
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 claims description 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 3
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 3
- 229910017052 cobalt Inorganic materials 0.000 claims description 3
- 239000010941 cobalt Substances 0.000 claims description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 3
- 239000001257 hydrogen Substances 0.000 claims description 3
- 229910052738 indium Inorganic materials 0.000 claims description 3
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 3
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 claims description 3
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims description 3
- 239000011733 molybdenum Substances 0.000 claims description 3
- 239000011591 potassium Substances 0.000 claims description 3
- 239000010703 silicon Substances 0.000 claims description 3
- 229910052709 silver Inorganic materials 0.000 claims description 3
- 239000004332 silver Substances 0.000 claims description 3
- 239000011135 tin Substances 0.000 claims description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 3
- 239000010937 tungsten Substances 0.000 claims description 3
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims description 3
- 229910052725 zinc Inorganic materials 0.000 claims description 3
- 239000011701 zinc Substances 0.000 claims description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 1
- 239000013077 target material Substances 0.000 description 21
- 238000004544 sputter deposition Methods 0.000 description 11
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 10
- 230000008859 change Effects 0.000 description 10
- 239000001301 oxygen Substances 0.000 description 10
- 229910052760 oxygen Inorganic materials 0.000 description 10
- 238000004519 manufacturing process Methods 0.000 description 9
- 230000008569 process Effects 0.000 description 9
- 238000000151 deposition Methods 0.000 description 7
- 239000007789 gas Substances 0.000 description 7
- 230000007613 environmental effect Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 239000006121 base glass Substances 0.000 description 2
- 229910010293 ceramic material Inorganic materials 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- GDMRBHLKSYSMLJ-UHFFFAOYSA-N [F].O=[Si] Chemical compound [F].O=[Si] GDMRBHLKSYSMLJ-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 239000005329 float glass Substances 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 239000002346 layers by function Substances 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 238000006722 reduction reaction Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/15—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on an electrochromic effect
- G02F1/153—Constructional details
- G02F1/1533—Constructional details structural features not otherwise provided for
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
The embodiment of the invention discloses a toning glass and a preparation method thereof. The toning glass comprises a substrate glass layer, and a first conducting layer, a first auxiliary toning layer, a first ion conductor layer, a first main toning layer, a second conducting layer, a second auxiliary toning layer, a second ion conductor layer, a second main toning layer, a third conducting layer and a top protective layer which are sequentially formed on one side of the substrate glass layer. The color-changing glass can improve the color-changing uniformity of the color-changing glass in large-area product devices.
Description
Technical Field
The invention relates to the technical field of glass, in particular to color-mixing glass and a preparation method thereof.
Background
In the current process of the industrialized production of the color-mixing glass, the electrochromic product has a plurality of defects on the color-mixing uniformity and the color-mixing cycle life of large-area product devices, and the inorganic color-mixing material is mainly WO3A material. WO3The material is a well-known high-efficiency cathode color-changing material, and WO is controlled through chemical oxidation and reduction reactions3The valence state change of the medium W can realize the absorption regulation and control effect on the spectrum. However, the current electrochromic products have the defects of large-area nonuniform color change, short cycle life and the like, and after the current electrochromic products are cycled for a certain number of times, the color change function near the electrode is seriously attenuated or even does not change color, so that the application of the current electrochromic products in engineering is greatly influenced.
Disclosure of Invention
In order to solve the above problems, embodiments of the present invention provide a color-tunable glass and a method for manufacturing the same, which can improve the color-tuning uniformity of the color-tunable glass in a large-area product device.
Specifically, the embodiment of the invention provides toning glass, which comprises a substrate glass layer, and a first conducting layer, a first auxiliary toning layer, a first ion conductor layer, a first main toning layer, a second conducting layer, a second auxiliary toning layer, a second ion conductor layer, a second main toning layer, a third conducting layer and a top protective layer which are sequentially formed on one side of the substrate glass layer.
In one embodiment of the present invention, the materials of the first main color modulation layer and the second main color modulation layer are respectively selected from oxides of at least two combinations of tungsten, molybdenum, niobium, titanium and tantalum; the thickness ranges of the first main color modulation layer and the second main color modulation layer are respectively 30nm-500 nm.
In one embodiment of the present invention, the materials of the first main color modulation layer and the second main color modulation layer are the same; the thicknesses of the first main color modulation layer and the second main color modulation layer are equal.
In one embodiment of the present invention, the materials of the first auxiliary color-adjusting layer and the second auxiliary color-adjusting layer are respectively selected from oxides of at least two elements of nickel, vanadium, cobalt, iridium, iron and manganese; the thickness ranges of the first auxiliary color modulation layer and the second auxiliary color modulation layer are respectively 20nm-500 nm.
In one embodiment of the present invention, the first auxiliary color modulation layer and the second auxiliary color modulation layer are made of the same material; the thicknesses of the first auxiliary color modulation layer and the second auxiliary color modulation layer are equal.
In an embodiment of the present invention, the materials of the first conductive layer, the second conductive layer, and the third conductive layer are respectively selected from one or a combination of at least two of fluorosilicone oxide, indium tin oxide, indium gallium zinc oxide, aluminum zinc oxide, gallium zinc oxide, and silver.
In one embodiment of the invention, the thickness of the first conductive layer and the second conductive layer ranges from 1 nm to 1100 nm; the thickness range of the third conducting layer is 10-1000 nm.
In one embodiment of the present invention, the materials of the first ion conductor layer and the second ion conductor layer are respectively selected from one or a combination of at least two of hydrogen, lithium, sodium, potassium and magnesium; the thickness ranges of the first ion conductor layer and the second ion conductor layer are 10nm-100nm respectively.
In one embodiment of the present invention, the material of the top protective layer is selected from an oxide or nitride or oxynitride of one of silicon, titanium, zinc, tin, niobium, tantalum.
On the other hand, the preparation method of the toning glass provided by the embodiment of the invention comprises the following steps: providing a substrate glass layer;
forming a first conductive layer on the substrate glass layer; forming a first auxiliary color adjusting layer on the first conductive layer; forming a first ion conductor layer on the first auxiliary color modulation layer; forming a first main color modulation layer on the first ion conductor layer; forming a second conductive layer on the first main color modulation layer; forming a second auxiliary color adjusting layer on the second conductive layer; forming a second ion conductor layer on the second auxiliary color modulation layer; forming a second main color modulation layer on the second ion conductor layer; forming a third conductive layer on the second main color modulation layer; and forming a top protective layer on the third conductive layer.
One or more of the above technical solutions may have the following advantages or beneficial effects: the toning glass provided by the embodiment of the invention adopts a specific film structure combining the main toning layer and the auxiliary toning layer with the auxiliary toning layer and the main toning layer, can actively adjust energy-saving parameters according to environmental changes, and improves the color change uniformity of electrochromic products in large-area product devices. In addition, the color of the toning glass prepared by the specific preparation process is more stable, the large-area color uniformity is better, the production process is simplified, the production cost is reduced, and the production efficiency is improved.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings needed to be used in the description of the embodiments are briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without creative efforts.
Fig. 1 is a schematic structural diagram of a tinted glass according to an embodiment of the present invention.
Fig. 2 is a schematic flow chart of a method for preparing tinted glass according to an embodiment of the present invention.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the scope of the present invention.
As shown in fig. 1, one embodiment of the present invention provides a tinted glass 600. The color control glass 600 includes, for example, a base glass layer 10, and a first conductive layer 11, a first main color control layer 12, a first ion conductor layer 13, a first auxiliary color control layer 14, a second conductive layer 21, a second auxiliary color control layer 22, a second ion conductor layer 23, a second main color control layer 24, a third conductive layer 30, and a top protective layer 40, which are formed in this order on the same side of the base glass layer 10.
The toning glass provided by the embodiment of the invention adopts a specific film structure combining the main toning layer, the auxiliary toning layer and the main toning layer, can actively adjust energy-saving parameters according to environmental changes, and improves the color change uniformity of electrochromic products in large-area product devices.
Specifically, the substrate glass layer 10 may be, for example, float glass, ultra-white glass, high-alumina glass, medium-alumina glass material, or the like. The thickness of the substrate glass layer 10 may range, for example, from 0.05 to 25 mm.
The materials of the first conductive layer 11, the second conductive layer 21, and the third conductive layer 30 are inorganic color-changing materials, respectively. The inorganic color-changing material is selected from one or a combination of at least two of fluorine silicon oxide (FTO), Indium Tin Oxide (ITO), Indium Gallium Zinc Oxide (IGZO), Aluminum Zinc Oxide (AZO), Gallium Zinc Oxide (GZO) and silver (Ag). The combination of at least two herein may be, for example, a combination of two such as AZO and GZO, or a combination of three such as FTO, ITO, GZO, even more, and the like. Preferably, at least two of the first conductive layer 11, the second conductive layer 21, and the third conductive layer 30 are made of the same material. The thickness ranges of the first conductive layer 11 and the second conductive layer 21 are 1-1100nm respectively. The thickness of the third conductive layer 30 ranges from 10 to 1000 nm. Preferably, the thicknesses of the first conductive layer 11, the second conductive layer 21, and the third conductive layer 30 are in the range of 10 to 300nm, respectively. Further preferably, the thicknesses of the first conductive layer 11, the second conductive layer 21, and the third conductive layer 30 are equal to each other.
The first main color modulation layer 12 and the second main color modulation layer 24 are spectrum main modulation functional layers. The materials of the first main color modulation layer 12 and the second main color modulation layer 24 are inorganic color-changing materials respectively. The inorganic colour change material may for example be selected from oxides of combinations of at least two elements of tungsten (W), molybdenum (Mo), niobium (Nb), titanium (Ti), tantalum (Ta), for example oxides of any two combinations of W, Mo, Nb, Ti, Ta, such as WMoOx, wnbo x, or oxides of WMoOx, WNbTaOx, or even combinations of more of the three. The stoichiometric ratio of the oxide may be sufficient oxygen or less than the stoichiometric ratio of oxygen. Preferably, the materials of the first and second main color modulation layers 12 and 24 are the same. The first main color modulation layer 12 and the second main color modulation layer 24 have a thickness range of 30 to 500nm, respectively. Preferably, the first and second main color modulation layers 12, 24 are equal in thickness.
The materials of the first ion conductor layer 13 and the second ion conductor layer 23 are respectively selected from one or a combination of at least two of hydrogen (H), lithium (Li), sodium (Na), potassium (K), and magnesium (Mg), for example, a combination of two thereof such as Li and Na, a combination of three thereof such as Na, K, and Mg, and even more thereof. Preferably, the materials of the first ion conductor layer 13 and the second ion conductor layer 23 are the same. The thicknesses of the first ion conductor layer 13 and the second ion conductor layer 23 are respectively 10nm to 100 nm. Preferably, the thicknesses of the first ion conductor layer 13 and the second ion conductor layer 23 are equal.
The first auxiliary color modulation layer 14 and the second auxiliary color modulation layer 22 are spectrum auxiliary adjustment function layers. The materials of the first auxiliary color control layer 14 and the second auxiliary color control layer 22 are respectively selected from oxides of at least two combinations of nickel (Ni), vanadium (V), cobalt (Co), iridium (Ir), iron (Fe), and manganese (Mn). Specifically, the materials of the first and second auxiliary color control layers 14 and 22 may be, for example, oxides of a combination of two of Ni, V, Co, Ir, Fe, Mn such as an oxide of NiVOx, NiCoOx, NiIrOx, NiFeOx, or a combination of three, or even an oxide of a combination of more. The stoichiometric ratio of the oxide may be sufficient oxygen or less than the stoichiometric ratio of oxygen. Preferably, the materials of the first and second auxiliary color modulation layers 14 and 22 are the same. The first auxiliary color modulation layer 14 and the second auxiliary color modulation layer 22 have a thickness range of 20nm to 500nm, respectively. Preferably, the thicknesses of the first and second auxiliary color modulation layers 14 and 22 are equal.
The material of the top protective layer 40 is selected from an oxide or nitride or oxynitride of one of silicon (Si), titanium (Ti), zinc (Zn), tin (Sn), niobium (Nb), tantalum (Ta). For example, the material of the top protective layer 40 is Si3N4。Si3N4The ceramic material is a high-temperature ceramic material, has high hardness, high melting point and stable chemical property, has strong corrosion resistance, mechanical scratch resistance and high-temperature oxidation resistance, and can play a good role in protection when being used as a top protective layer. The thickness of the top protective layer is 0.2-100 nm.
In addition, the embodiment of the invention also provides a preparation method of the toning glass, for example, the preparation method is used for preparing the toning glass 600. As shown in fig. 2, the method for preparing the tinted glass, for example, comprises the steps of:
s11: a substrate glass layer is provided.
S12: a first conductive layer is formed on the substrate glass layer. Specifically, the substrate glass layer is heated to a preset temperature, wherein the preset temperature range is, for example, 280-300 ℃, one or a combination of at least two of FTO, ITO, IGZO, AZO, GZO and Ag is used as a target material, and the first conductive layer is obtained by deposition under a preset vacuum sputtering pressure. The preset vacuum sputtering pressure is, for example, 1.0E-3～9.0E-3mbar. Preferably, the first conductive layer may also be a pre-prepared conductive film layer. This allows better index matching between the layers.
S13: a first auxiliary color control layer is formed on the first conductive layer. Specifically, oxide of at least two combinations of Ni, V, Co, Ir, Fe and Mn is used as a target material, and the target material is deposited under the condition of preset vacuum sputtering air pressure to obtain a first auxiliary color control layer. The stoichiometric ratio of the oxide in the target material may be sufficient oxygen or less than the stoichiometric ratio of oxygen. Preferably, the first auxiliary toner layer may also be formed simultaneously using a plurality of target sites to obtain better binding force between the film layers. The process gas ratios employed for the plurality of target sites may be non-uniform.
S14: a first ion conductor layer is formed on the first auxiliary color modulation layer. One or a combination of at least two of H, Li, Na, K and Mg is used as a target material, and the target material is deposited under the condition of preset vacuum sputtering air pressure to obtain a first ion conductor layer. Preferably, the first ion conductor layer can also be formed by using a plurality of target sites at the same time, so as to obtain better bonding force between films. The process gas ratios employed for the plurality of target sites may be non-uniform.
S15: a first main color modulation layer is formed on the first ion conductor layer. The oxide of at least two of W, Mo, Nb, Ti and Ta is used as the target material. The stoichiometric ratio of the oxide may be sufficient oxygen or less than the stoichiometric ratio of oxygen. And (3) depositing the target material under a preset vacuum sputtering pressure to obtain a first main color control layer. Preferably, the first main color modulation layer may also be formed using a plurality of target sites at the same time, so that a better bonding force between the film layers may be obtained. The process gases employed by the plurality of target sites may or may not be uniform.
S16: a second conductive layer is formed on the first main color modulation layer. Specifically, one or a combination of at least two of FTO, ITO, IGZO, AZO, GZO and Ag is used as a target material, and the target material is deposited under the condition of preset vacuum sputtering air pressure to obtain the second conductive layer. Preferably, the second conductive layer may also be a pre-prepared conductive film layer. This allows better index matching between the layers.
S17: a second auxiliary color modulation layer is formed on the second conductive layer. Specifically, at least two oxides of Ni, V, Co, Ir, Fe and Mn are used as target materials, and the target materials are deposited under the condition of preset vacuum sputtering air pressure to obtain a second auxiliary color control layer. The stoichiometric ratio of the oxide in the target material may be sufficient oxygen or less than the stoichiometric ratio of oxygen. Preferably, the second auxiliary toning layer can also be formed by using a plurality of target sites at the same time, so as to obtain better binding force between the film layers. The process gas ratios employed for the plurality of target sites may be non-uniform.
S18: and forming a second ion conductor layer on the second auxiliary color modulation layer. And taking one or the combination of at least two of H, Li, Na, K and Mg as a target material, and depositing the target material under the condition of preset vacuum sputtering air pressure to obtain a second ion conductor layer. Preferably, the second ion conductor layer can also be formed by using a plurality of target sites at the same time, so as to obtain better bonding force between films. The process gas ratios employed for the plurality of target sites may be non-uniform.
S19: a second primary color modulation layer is formed on the second ion conductor layer. The oxide of at least two of W, Mo, Nb, Ti and Ta is used as the target material. And (3) depositing the target material under a preset vacuum sputtering pressure to obtain a second main color control layer. Preferably, the second main color modulation layer can also be formed simultaneously using a plurality of target sites, so that a better bonding force between the film layers can be obtained. The process gases employed by the plurality of target sites may or may not be uniform.
S20: a third conductive layer is formed on the second main color modulation layer. And taking one or a combination of at least two of FTO, ITO, IGZO, AZO, GZO and Ag as a target material, and depositing the target material under a preset vacuum sputtering pressure to obtain the third conducting layer. Preferably, the third conductive layer may also be a pre-prepared conductive film layer. This allows better index matching between the layers.
S21: and forming a top protective layer on the third conductive layer. Taking oxide or nitride or oxynitride of one of Si, Ti, Zn, Sn, Nb and Ta as a target material, and depositing the target material under a preset vacuum sputtering pressure to obtain the top protective layer. Preferably, the top protective layer can also be formed simultaneously with multiple target sites to achieve better adhesion between the layers. The process gas ratios employed for the plurality of target sites may be non-uniform.
In addition, the method for preparing the toning glass provided by the embodiment of the invention can also comprise a heat treatment step. Specifically, a vacuum heat treatment and annealing process is performed, wherein the heat treatment temperature is, for example, 300-. Furthermore, the method for preparing the toning glass provided by the embodiment of the invention can also comprise pre-vacuum transition and parallel connection of electrodes to finish the preparation of the toning glass. The pre-vacuum transition and the electrode connection can be completed by adopting the method in the prior art, and the details are not repeated here.
In summary, the toning glass provided by the embodiment of the invention adopts a specific film structure combining the main toning layer, the auxiliary toning layer and the auxiliary toning layer with the main toning layer, can actively adjust energy-saving parameters according to environmental changes, and can improve the color change uniformity of the toning glass in large-area product devices through the adjustment and matching of the electric control system. In addition, the method for preparing the color mixing glass provided by the embodiment of the invention adopts a magnetron reactive sputtering deposition method to form each film layer, avoids multiple access of coating equipment in the production process, simplifies the production process, further reduces the production cost, improves the production efficiency, ensures that the color of the produced color mixing glass is more stable and has better large-area color uniformity, and can be widely applied to the fields of building glass outer walls, interior decoration, automobile skylight glass, automobile rearview mirrors, high-speed rail windows, airplane suspension windows, sunlight rooms, sunglasses, ski goggles and the like which need to be dimmed. In addition, compared with the prior art, the coloring efficiency of the toned glass provided by the embodiment of the invention is higher, the color change speed is greatly improved, and the color change speed is reduced to 3-6 minutes from the original 10-20 minutes from the full transparent state to the full colored state. Moreover, the glass has better and more stable color retention, and the color can be kept for a longer time after the color is changed by one-time excitation.
In addition, it should be understood that the foregoing embodiments are merely exemplary illustrations of the present invention, and the technical solutions of the embodiments can be arbitrarily combined and collocated without conflict between technical features and structural contradictions, which do not violate the purpose of the present invention.
Finally, it should be noted that: the above examples are only intended to illustrate the technical solution of the present invention, but not to limit it; although the present invention has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some technical features may be equivalently replaced; and such modifications or substitutions do not depart from the spirit and scope of the corresponding technical solutions of the embodiments of the present invention.
Claims (10)
1. The toning glass is characterized by comprising a substrate glass layer, a first conducting layer, a first auxiliary toning layer, a first ion conductor layer, a first main toning layer, a second conducting layer, a second auxiliary toning layer, a second ion conductor layer, a second main toning layer, a third conducting layer and a top protective layer, wherein the first conducting layer, the first auxiliary toning layer, the first ion conductor layer, the first main toning layer, the second conducting layer, the second auxiliary toning layer, the second ion conductor layer, the second main toning layer, the third conducting layer and the top protective layer are.
2. The toning glass according to claim 1, wherein the materials of the first main toning layer and the second main toning layer are respectively selected from oxides of at least two combinations of tungsten, molybdenum, niobium, titanium and tantalum; the thickness ranges of the first main color modulation layer and the second main color modulation layer are respectively 30nm-500 nm.
3. The tinted glass of claim 2, wherein the first primary tinted layer and the second primary tinted layer are the same material; the thicknesses of the first main color modulation layer and the second main color modulation layer are equal.
4. The toning glass according to claim 1, wherein the materials of the first auxiliary toning layer and the second auxiliary toning layer are respectively selected from oxides of at least two element combinations of nickel, vanadium, cobalt, iridium, iron and manganese; the thickness ranges of the first auxiliary color modulation layer and the second auxiliary color modulation layer are respectively 20nm-500 nm.
5. The tinted glass of claim 4, wherein the first and second auxiliary tinted layers are the same material; the thicknesses of the first auxiliary color modulation layer and the second auxiliary color modulation layer are equal.
6. The toned glass according to claim 1, wherein the materials of the first conductive layer, the second conductive layer and the third conductive layer are respectively selected from one or a combination of at least two of fluorosilicone oxide, indium tin oxide, indium gallium zinc oxide, aluminum zinc oxide, gallium zinc oxide and silver.
7. The toned glass according to claim 1, wherein the thicknesses of the first conductive layer and the second conductive layer are in the range of 1-1100nm, respectively; the thickness range of the third conducting layer is 10-1000 nm.
8. The toning glass according to claim 1, wherein the materials of the first ion conductor layer and the second ion conductor layer are respectively selected from one or a combination of at least two of hydrogen, lithium, sodium, potassium and magnesium; the thickness ranges of the first ion conductor layer and the second ion conductor layer are 10nm-100nm respectively.
9. Toning glass according to claim 1, characterised in that the material of the top protective layer is selected from the group consisting of oxides or nitrides or oxynitrides of one of silicon, titanium, zinc, tin, niobium, tantalum.
10. A method for preparing color-mixing glass is characterized by comprising the following steps:
providing a substrate glass layer;
forming a first conductive layer on the substrate glass layer;
forming a first auxiliary color adjusting layer on the first conductive layer;
forming a first ion conductor layer on the first auxiliary color modulation layer;
forming a first main color modulation layer on the first ion conductor layer;
forming a second conductive layer on the first main color modulation layer;
forming a second auxiliary color adjusting layer on the second conductive layer;
forming a second ion conductor layer on the second auxiliary color modulation layer;
forming a second main color modulation layer on the second ion conductor layer;
forming a third conductive layer on the second main color modulation layer; and
and forming a top protective layer on the third conductive layer.
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