CN112947051A - Control method and device for radio frequency plasma powder making equipment, storage medium and electronic equipment - Google Patents
Control method and device for radio frequency plasma powder making equipment, storage medium and electronic equipment Download PDFInfo
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- CN112947051A CN112947051A CN202110122440.4A CN202110122440A CN112947051A CN 112947051 A CN112947051 A CN 112947051A CN 202110122440 A CN202110122440 A CN 202110122440A CN 112947051 A CN112947051 A CN 112947051A
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B11/00—Automatic controllers
- G05B11/01—Automatic controllers electric
- G05B11/36—Automatic controllers electric with provision for obtaining particular characteristics, e.g. proportional, integral, differential
- G05B11/42—Automatic controllers electric with provision for obtaining particular characteristics, e.g. proportional, integral, differential for obtaining a characteristic which is both proportional and time-dependent, e.g. P.I., P.I.D.
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2/00—Processes or devices for granulating materials, e.g. fertilisers in general; Rendering particulate materials free flowing in general, e.g. making them hydrophobic
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F9/00—Making metallic powder or suspensions thereof
- B22F9/02—Making metallic powder or suspensions thereof using physical processes
- B22F9/14—Making metallic powder or suspensions thereof using physical processes using electric discharge
Abstract
The invention relates to a control method and a control device of a radio frequency plasma powder processing device, a storage medium and electronic equipment, which are used for solving the problem of lower accuracy of operation parameters in the process of spheroidizing powder and comprise the following steps: acquiring target milling information, and calling powder debugging parameters according to the target milling information, wherein the powder debugging parameters are determined by comparing plasma spheroidization rate and productivity; determining the opening resolution of each regulating valve in an air supply subsystem of the powder making equipment according to the powder debugging parameters; within the range of the opening resolution of each regulating valve, regulating the opening degree of each regulating valve through PID control; and controlling the operation parameters of all subsystems in the powder making equipment to prepare the plasma spheroidized powder meeting the target powder making information. Therefore, the powder debugging parameters are determined by comparing the plasma spheroidization rate and the productivity, and the accuracy of the operation parameters in the powder spheroidizing process can be improved.
Description
Technical Field
The invention relates to the technical field of radio frequency control, in particular to a control method and device of a radio frequency plasma powder making device, a storage medium and an electronic device.
Background
The high-frequency induction plasma powder making device takes a radio frequency plasma technology as a core technology, ohmic heating is carried out on irregular powder passing through a plasma torch through the induction effect of a radio frequency electromagnetic field, so that the irregular powder is rapidly melted under the condition of high temperature (10000K) in the descending process, and further the irregular powder is spheroidized to obtain spheroidized powder.
In a related scene, various equipment operation parameters are continuously debugged in the preparation process of the spheroidized powder to obtain a large amount of typical experiment data, actual equipment operation parameters in the preparation process of the spheroidized powder are obtained by combining theoretical operation data according to the typical experiment data, a corresponding equipment database is obtained according to the actual equipment operation parameters in different spheroidized powder preparation processes, and the social fee setting of the equipment operation parameters is carried out according to the equipment database in the preparation process of the spheroidized powder. Because the data volume of the operation parameters obtained by performing a typical experiment is limited, and the equipment parameters of different equipment are the same under different conditions, the spheroidized powder can be obtained differently, and thus, the problem of low accuracy of the operation parameters in the process of spheroidizing the powder exists.
Disclosure of Invention
The present invention is directed to a method and an apparatus for controlling a rf plasma milling apparatus, a storage medium and an electronic apparatus, so as to solve the above-mentioned related technical problems.
In order to achieve the above object, a first aspect of the embodiments of the present invention provides a method for controlling a rf plasma pulverizing apparatus, the method including:
acquiring target milling information, and calling powder debugging parameters according to the target milling information, wherein the powder debugging parameters are determined by comparing plasma spheroidization rate and capacity;
determining the opening resolution of each regulating valve in an air supply subsystem of the powder making equipment according to the powder debugging parameters; and the number of the first and second electrodes,
within the range of the opening resolution of each regulating valve, regulating the opening degree of each regulating valve through PID control;
and controlling the operation parameters of all subsystems in the powder making equipment to prepare the plasma spheroidized powder meeting the target powder making information.
Optionally, the subsystem includes a powder feeding subsystem, and the controlling of the operating parameters of the subsystems in the powder manufacturing apparatus includes:
determining the powder feeding amount of the powder feeding subsystem and the gas carrying amount according to the target powder making information;
determining the opening and closing degree of a powder feeding switch of the powder feeding subsystem according to the powder feeding amount; and the number of the first and second electrodes,
and determining the power of the electromagnetic valve of the gas supply subsystem according to the gas carrying quantity.
Optionally, the gas supply subsystem comprises a reaction gas subsystem, a protection gas subsystem and a carrying gas subsystem;
determining the opening resolution of each regulating valve in the gas supply subsystem of the powder manufacturing equipment according to the powder debugging parameters, and the method comprises the following steps:
determining gas component information of reaction gas in the reaction gas subsystem, pressure information of shielding gas in the shielding gas subsystem and temperature information of the shielding gas in the shielding gas subsystem according to the powder debugging parameters;
and determining the opening resolution of each regulating valve in the gas supply subsystem of the powder making equipment according to the gas component information, the pressure information and the temperature information.
Optionally, the method further comprises:
acquiring target parameter information of a pipeline in the powder making equipment, wherein the target parameter information comprises gas resistance information, gas specific heat capacity information, gas source state information and opening and closing degree information of each regulating valve; and the number of the first and second electrodes,
determining power supply parameters in the powder manufacturing equipment according to the target parameter information based on a mathematical model, wherein the power supply parameters comprise anode voltage, anode current and grid current;
and adjusting the power supply of the powder manufacturing equipment according to the power supply parameters.
Optionally, the method further comprises:
acquiring target display information in the powder manufacturing equipment, wherein the target display information comprises at least one of power supply state information, smoke state information, water temperature information, water pressure information, wind pressure information, voltage and current information, reaction chamber pressure information, protective gas pressure information and ceramic tube temperature information;
inputting the target display information to an editable controller after passing through a relay so that the editable controller adjusts the opening resolution of each adjusting valve in the gas supply subsystem according to the target display information; and the number of the first and second electrodes,
and displaying the target display information on a user interface, and determining whether to send alarm information according to the target display information.
In a second aspect of the embodiments of the present invention, a device for controlling a rf plasma powder manufacturing apparatus is provided, where the device includes:
the system comprises an acquisition module, a data processing module and a data processing module, wherein the acquisition module is configured to acquire target milling information and call powder debugging parameters according to the target milling information, and the powder debugging parameters are determined by comparing plasma spheroidization rate and productivity;
the determining module is configured to determine the opening resolution of each adjusting valve in an air supply subsystem of the powder making equipment according to the powder debugging parameters;
the adjusting module is configured to adjust the opening degree of each adjusting valve through PID control within the range of the opening degree resolution of each adjusting valve;
and the control module is configured to control the operating parameters of all subsystems in the powder making equipment so as to prepare the plasma spheroidized powder meeting the target powder making information.
Optionally, the subsystem comprises a powder feeding subsystem, the control module configured to:
determining the powder feeding amount of the powder feeding subsystem and the gas carrying amount according to the target powder making information;
determining the opening and closing degree of a powder feeding switch of the powder feeding subsystem according to the powder feeding amount; and the number of the first and second electrodes,
and determining the power of the electromagnetic valve of the gas supply subsystem according to the gas carrying quantity.
Optionally, the gas supply subsystem comprises a reaction gas subsystem, a protection gas subsystem and a carrying gas subsystem;
the determination module is configured to:
determining gas component information of reaction gas in the reaction gas subsystem, pressure information of shielding gas in the shielding gas subsystem and temperature information of the shielding gas in the shielding gas subsystem according to the powder debugging parameters;
and determining the opening resolution of each regulating valve in the gas supply subsystem of the powder making equipment according to the gas component information, the pressure information and the temperature information.
Optionally, the apparatus further comprises: an adjustment module configured to:
acquiring target parameter information of a pipeline in the powder making equipment, wherein the target parameter information comprises gas resistance information, gas specific heat capacity information, gas source state information and opening and closing degree information of each regulating valve; and the number of the first and second electrodes,
determining power supply parameters in the powder manufacturing equipment according to the target parameter information based on a mathematical model, wherein the power supply parameters comprise anode voltage, anode current and grid current;
and adjusting the power supply of the powder manufacturing equipment according to the power supply parameters.
Optionally, the apparatus further comprises: a display module configured to:
acquiring target display information in the powder manufacturing equipment, wherein the target display information comprises at least one of power supply state information, smoke state information, water temperature information, water pressure information, wind pressure information, voltage and current information, reaction chamber pressure information, protective gas pressure information and ceramic tube temperature information;
inputting the target display information to an editable controller after passing through a relay so that the editable controller adjusts the opening resolution of each adjusting valve in the gas supply subsystem according to the target display information; and the number of the first and second electrodes,
and displaying the target display information on a user interface, and determining whether to send alarm information according to the target display information.
In a third aspect of the embodiments of the present invention, a computer-readable storage medium is provided, on which a computer program is stored, which when executed by a processor implements the steps of the method according to any one of the first aspect.
In a fourth aspect of the embodiments of the present invention, there is provided an electronic device, including:
a memory having a computer program stored thereon;
a processor for executing the computer program in the memory to implement the steps of the method of any one of the first aspect.
According to the technical scheme, target milling information can be obtained, and powder debugging parameters are called according to the target milling information, wherein the powder debugging parameters are determined by comparing the plasma spheroidization rate and the productivity; determining the opening resolution of each regulating valve in an air supply subsystem of the powder making equipment according to the powder debugging parameters; within the range of the opening resolution of each regulating valve, regulating the opening degree of each regulating valve through PID control; and controlling the operation parameters of all subsystems in the powder making equipment to prepare the plasma spheroidized powder meeting the target powder making information. Therefore, the powder debugging parameters are determined by comparing the plasma spheroidization rate and the productivity, and the accuracy of the operation parameters in the powder spheroidizing process can be improved.
Additional features and advantages of the invention will be set forth in the detailed description which follows.
Drawings
The accompanying drawings, which are included to provide a further understanding of the invention and are incorporated in and constitute a part of this specification, illustrate embodiments of the invention and together with the description serve to explain the principles of the invention and not to limit the invention. In the drawings:
fig. 1 is a flowchart illustrating a method for controlling a rf plasma pulverizing apparatus according to an exemplary embodiment of the present invention.
Fig. 2 is a flowchart illustrating an implementation of step S14 in fig. 1 according to an exemplary embodiment of the present invention.
Fig. 3 is a flowchart illustrating an implementation of step S12 in fig. 1 according to an exemplary embodiment of the present invention.
Fig. 4 is a block diagram of a control apparatus of an rf plasma pulverizing apparatus according to an exemplary embodiment of the present invention.
Detailed Description
The following detailed description of embodiments of the invention refers to the accompanying drawings. It should be understood that the detailed description and specific examples, while indicating the present invention, are given by way of illustration and explanation only, not limitation.
The invention provides a control method of a radio frequency plasma powder manufacturing device, and fig. 1 shows the control method of the radio frequency plasma powder manufacturing device in an exemplary embodiment of the invention, wherein the method comprises the following steps:
in step S11, target milling information is obtained, and powder debugging parameters are called according to the target milling information, wherein the powder debugging parameters are determined by comparing plasma spheroidization rate and productivity;
in step S12, determining the opening resolution of each adjusting valve in the gas supply subsystem of the powder manufacturing apparatus according to the powder debugging parameters;
in step S13, the opening degree of each of the control valves is controlled by PID control within the range of the opening degree resolution of each of the control valves;
in step S14, the operation parameters of the subsystems in the powder manufacturing apparatus are controlled to prepare plasma spheroidized powder satisfying the target powder manufacturing information.
According to the technical scheme, the powder debugging parameters are determined by comparing the plasma spheroidization rate and the productivity, so that the accuracy of the operation parameters in the powder spheroidizing process can be improved.
Optionally, the subsystem includes a powder feeding subsystem, and referring to a flowchart shown in fig. 2 for implementing step S14 in fig. 1, in step S14, the controlling the operation parameters of the subsystems in the powder manufacturing apparatus includes:
in step S141, determining a powder feeding amount of the powder feeding subsystem and a gas carrying amount according to the target pulverizing information;
in step S142, determining the opening/closing degree of a powder feeding switch of the powder feeding subsystem according to the powder feeding amount;
in step S143, the solenoid valve power of the gas supply subsystem is determined according to the amount of the entrained gas.
Optionally, the gas supply subsystem comprises a reaction gas subsystem, a protection gas subsystem and a carrying gas subsystem;
referring to a flowchart shown in fig. 3 for implementing step S12 in fig. 1, in step S12, the determining the opening resolution of each adjusting valve in the gas supply subsystem of the powder manufacturing apparatus according to the powder debugging parameters includes:
in step S121, determining gas component information of the reaction gas in the reaction gas subsystem, pressure information of the shielding gas in the shielding gas subsystem, and temperature information of the shielding gas in the shielding gas subsystem according to the powder debugging parameters;
in step S122, the opening resolution of each regulating valve in the gas supply subsystem of the powder manufacturing apparatus is determined according to the gas composition information, the pressure information, and the temperature information.
Optionally, the method further comprises:
acquiring target parameter information of a pipeline in the powder making equipment, wherein the target parameter information comprises gas resistance information, gas specific heat capacity information, gas source state information and opening and closing degree information of each regulating valve; and the number of the first and second electrodes,
determining power supply parameters in the powder manufacturing equipment according to the target parameter information based on a mathematical model, wherein the power supply parameters comprise anode voltage, anode current and grid current;
and adjusting the power supply of the powder manufacturing equipment according to the power supply parameters.
Optionally, the method further comprises:
acquiring target display information in the powder manufacturing equipment, wherein the target display information comprises at least one of power supply state information, smoke state information, water temperature information, water pressure information, wind pressure information, voltage and current information, reaction chamber pressure information, protective gas pressure information and ceramic tube temperature information;
inputting the target display information to an editable controller after passing through a relay so that the editable controller adjusts the opening resolution of each adjusting valve in the gas supply subsystem according to the target display information; and the number of the first and second electrodes,
and displaying the target display information on a user interface, and determining whether to send alarm information according to the target display information.
The user interface uses an industrial personal computer, the industrial personal computer and the PLC are upper computers, and the upper computers use general configuration software. The control center is used as a control center of the whole set of equipment, and all data in the operation process of the whole set of equipment are recorded, including the states of all switching values and real-time numerical values of the measured data; and the operator adjusts parameters according to the process requirements and controls the parameters of water, electricity and gas in real time.
The automatic control cabinet comprises a PLC system and the functions of signal acquisition, signal control, signal filtering isolation and the like of each electrical device. And optical fiber communication is adopted between the electrical equipment and the PLC, so that mutual influence is prevented.
Control of the radio frequency power supply section: the device comprises a power output given module, an anode voltage accurate measurement and remote data transmission module, an anode current accurate measurement and remote data transmission module, a grid current acquisition module and a logic protection comprehensive processing module. The radio frequency power supply control system automatically or manually outputs the required power value according to the process requirement, and the power setting can be subjected to closed-loop control. The method mainly comprises the steps of displaying all main parameters of a power supply in real time, wherein the main parameters mainly comprise anode voltage, anode current, grid current, filament voltage and the like, setting parameter ranges according to equipment parameter characteristics, and alarming when abnormality occurs to ensure stable operation of the radio frequency plasma powder making system. Meanwhile, each cabinet body of the radio frequency power supply is monitored in real time, and the alarm including power supply state, smoke alarm, water temperature and water pressure alarm, wind pressure alarm, overvoltage and overcurrent and the like is performed, so that equipment maintenance and overhaul are facilitated.
The control core of the radio frequency power supply control system uses a PLC and communicates with a central console of the powder process system by adopting optical fiber communication. The PLC system comprises digital quantity alarm and fault input signals, and all the fault and alarm signals enter the PLC module after being secondarily isolated by the relay, so that the safety of the control system is enhanced; the digital output comprises the start, stop, heating start and stop of a main loop and fault output, the 24V relay is directly controlled to work, and the auxiliary contact controls the high-frequency induction power supply to work. The analog input signal comprises anode voltage, anode current and grid current, is acquired by a Hall sensor with high precision and high isolation voltage, and then is connected into the automatic control cabinet. EMI filtering is added to both the Hall power supply and the output signal, and high-frequency interference is filtered; the analog output signal is an anode voltage given signal, is isolated by the optical fiber module, and is transmitted to the high-frequency power supply part after EMI filtering. In addition, the radio frequency power supply control system has the functions of UPS power-off protection and touch screen control.
Controlling the gas supply system: in order to ensure the stable operation of the equipment, the reaction gas, the protective gas and the carrying gas carry out gas flow regulation according to corresponding set values, and can also be regulated manually, and each parameter is displayed in real time by an industrial personal computer.
The PLC software of the gas supply system needs to implement the following functions:
a. the PLC utilizes PROFINET to carry out real-time communication with the master control PLC, and reliable data information exchange with the master control PLC within a determined time interval is guaranteed.
b. And receiving parameter information such as gas pressure, components, cooling temperature and the like sent by a master control PLC (an operator inputs the value through an upper computer and then transmits the value to the master control PLC through a network), and feeding back various state information of the system and detection data of various sensors to the master control PLC in real time.
c. Controlling each actuating mechanism (flow regulating valve and electromagnetic valve of gas supply system), utilizing PID or other control algorithm to make gas pressure, component or cooling temperature reach set value, and controlling and collecting state information returned by each actuating mechanism.
d. And executing safety information monitoring, a safety interlocking algorithm and safety protection in the system, and uploading related equipment failure or other alarm information to the master control PLC so that the master control PLC executes further emergency protection operation or dispatches other subsystems to jointly complete safety protection operation.
e. In order to ensure the control precision of the system, the control software utilizes a PID control strategy to realize real-time precise control within the range of the opening resolution of the regulating valve by means of the configured regulating valve. In actual debugging, comprehensive model calculation and analysis are carried out on pipeline air resistance, air capacity, air source state, valve parameters and the like, a proper control algorithm is designed, parameter setting is carried out, and the optimal control effect is obtained. The information of the main requirements for the precise control of the gas supply system is shown in table 1:
TABLE 1
| Serial number | Object | Demand parameter information |
| 1 | Gas source | Gas compression rate (flow rate) and gas specific heat capacity |
| 2 | Air inlet regulating valve | Resolution, opening/flow curve or equation |
| 3 | Ventilation main pipeline | Relative to the specific heat capacity and gas resistance of the gas of the air inlet system |
3. Controlling a powder feeding system: the powder feeding amount and the gas flow carrying gas are remotely controlled by an industrial personal computer, and a powder feeding switch is automatically or manually controlled. And displaying the pressure of the cavity of the powder feeder, judging whether the powder feeding is normal or not according to the pressure difference, and automatically alarming if an abnormal phenomenon exists.
4. Hydrogen detection protection control: the hydrogen leakage detection device is monitored in real time, corresponds to a set value, gives an alarm if the set value is exceeded, and stops the hydrogen main valve.
5. Control of the water supply system: the water temperature and the flow of each water path are monitored in real time, when abnormal phenomena occur, the faults of the water pumps are automatically judged, the standby water pumps are automatically switched, and the industrial personal computer prompts the faults.
6. Controlling the pressure of the reaction chamber: and automatically controlling the switching and the adjustment of the vacuum pump according to the set value of the cavity pressure to enable the cavity pressure to approach the set value, wherein the range of the set value of the pressure is 20-101 kPa. When abnormal conditions occur, alarming is carried out, and standby equipment is started to compensate.
7. Controlling high-pressure water: the water inlet and outlet are installed with differential pressure transmitter, when the pressure difference is normal (water leakage), the alarm is stopped, and the pressure difference is displayed on the industrial control computer.
8. Controlling the temperature of the ceramic tube: and monitoring the ceramic tube temperature measuring instrument in real time, and alarming when the temperature of the ceramic tube exceeds an upper limit.
Each part forms a complete control system, when some part has faults or alarms, the faults and the alarm grades are distinguished through time sequence control, the machine is stopped according to time sequence when the faults occur, and online maintenance and fault troubleshooting are carried out according to the alarm grades and the parts when the alarms occur.
Detecting the data fluctuation range exceeding 150% of the historical average value (the cooling water temperature difference is more than 15 ℃, the errors of the cooling water pressure, the air input amount, the vacuum degree and the output power of the high-frequency power supply and the set value are more than 20%), diagnosing and measuring the system faults and the motion system faults. The system firstly cuts off the corresponding line power supply of the fault point, then cuts off the high-frequency power supply, and then continues to operate according to the logic block diagram.
Therefore, a perfect plasma discharge process database can be established, and the states of all switching values and the real-time numerical values of the measured data are recorded; an operator can set system parameters and switching value and issue an operation command through a system interface, and a parameter variable manual adjusting knob is provided; controlling the operation process: controlling the system to operate according to the system setting and adjusting parameters; and (4) alarming the system state abnormity, or starting an extreme abnormal state protection control system.
Based on the same inventive concept, an embodiment of the present invention further provides a control apparatus 400 for a rf plasma powder manufacturing device, and fig. 4 is a block diagram of the control apparatus for a rf plasma powder manufacturing device according to an exemplary embodiment of the present invention, where the apparatus 400 includes: an acquisition module 410, a determination module 420, an adjustment module 430, and a control module 440.
The obtaining module 410 is configured to obtain target milling information and call powder debugging parameters according to the target milling information, wherein the powder debugging parameters are determined by comparing plasma spheroidization rate and productivity;
a determining module 420 configured to determine, according to the powder debugging parameter, an opening resolution of each adjusting valve in a gas supply subsystem of the powder manufacturing apparatus;
an adjusting module 430 configured to adjust the opening degree of each regulating valve through PID control within the range of the opening degree resolution of each regulating valve;
a control module 440 configured to control the operation parameters of the subsystems in the powder manufacturing apparatus to prepare plasma spheroidized powder satisfying the target powder manufacturing information.
The device determines the powder debugging parameters based on the comparison of the plasma spheroidization rate and the productivity, and can improve the accuracy of the operation parameters in the powder spheroidization process.
Optionally, the subsystem comprises a powder feeding subsystem, the control module 440 configured to:
determining the powder feeding amount of the powder feeding subsystem and the gas carrying amount according to the target powder making information;
determining the opening and closing degree of a powder feeding switch of the powder feeding subsystem according to the powder feeding amount; and the number of the first and second electrodes,
and determining the power of the electromagnetic valve of the gas supply subsystem according to the gas carrying quantity.
Optionally, the gas supply subsystem comprises a reaction gas subsystem, a protection gas subsystem and a carrying gas subsystem;
the determination module 420 is configured to:
determining gas component information of reaction gas in the reaction gas subsystem, pressure information of shielding gas in the shielding gas subsystem and temperature information of the shielding gas in the shielding gas subsystem according to the powder debugging parameters;
and determining the opening resolution of each regulating valve in the gas supply subsystem of the powder making equipment according to the gas component information, the pressure information and the temperature information.
Optionally, the apparatus 400 further comprises: an adjustment module configured to:
acquiring target parameter information of a pipeline in the powder making equipment, wherein the target parameter information comprises gas resistance information, gas specific heat capacity information, gas source state information and opening and closing degree information of each regulating valve; and the number of the first and second electrodes,
determining power supply parameters in the powder manufacturing equipment according to the target parameter information based on a mathematical model, wherein the power supply parameters comprise anode voltage, anode current and grid current;
and adjusting the power supply of the powder manufacturing equipment according to the power supply parameters.
Optionally, the apparatus 400 further comprises: a display module configured to:
acquiring target display information in the powder manufacturing equipment, wherein the target display information comprises at least one of power supply state information, smoke state information, water temperature information, water pressure information, wind pressure information, voltage and current information, reaction chamber pressure information, protective gas pressure information and ceramic tube temperature information;
inputting the target display information to an editable controller after passing through a relay so that the editable controller adjusts the opening resolution of each adjusting valve in the gas supply subsystem according to the target display information; and the number of the first and second electrodes,
and displaying the target display information on a user interface, and determining whether to send alarm information according to the target display information.
Embodiments of the present invention also provide a computer-readable storage medium, on which a computer program is stored, which when executed by a processor implements the steps of any of the methods.
An embodiment of the present invention further provides an electronic device, including:
a memory having a computer program stored thereon;
a processor for executing the computer program in the memory to implement the steps of any of the methods.
The preferred embodiments of the present invention have been described in detail with reference to the accompanying drawings, however, the present invention is not limited to the specific details of the above embodiments, and various simple modifications can be made to the technical solution of the present invention within the technical idea of the present invention, and these simple modifications are within the protective scope of the present invention.
It should be noted that the various technical features described in the above embodiments can be combined in any suitable manner without contradiction, and the invention is not described in any way for the possible combinations in order to avoid unnecessary repetition.
In addition, any combination of the various embodiments of the present invention is also possible, and the same should be considered as the content of the present invention as long as it does not depart from the gist of the present invention.
Claims (10)
1. A control method of a radio frequency plasma powder manufacturing device is characterized by comprising the following steps:
acquiring target milling information, and calling powder debugging parameters according to the target milling information, wherein the powder debugging parameters are determined by comparing plasma spheroidization rate and capacity;
determining the opening resolution of each regulating valve in an air supply subsystem of the powder making equipment according to the powder debugging parameters; and the number of the first and second electrodes,
within the range of the opening resolution of each regulating valve, regulating the opening degree of each regulating valve through PID control;
and controlling the operation parameters of all subsystems in the powder making equipment to prepare the plasma spheroidized powder meeting the target powder making information.
2. The method of claim 1 wherein said subsystems comprise a powder delivery subsystem, and said controlling operational parameters of each subsystem of said powder process plant comprises:
determining the powder feeding amount of the powder feeding subsystem and the gas carrying amount according to the target powder making information;
determining the opening and closing degree of a powder feeding switch of the powder feeding subsystem according to the powder feeding amount; and the number of the first and second electrodes,
and determining the power of the electromagnetic valve of the gas supply subsystem according to the gas carrying quantity.
3. The method of claim 1, wherein the gas supply subsystem comprises a reaction gas subsystem, a shielding gas subsystem, and a carrying gas subsystem;
determining the opening resolution of each regulating valve in the gas supply subsystem of the powder manufacturing equipment according to the powder debugging parameters, and the method comprises the following steps:
determining gas component information of reaction gas in the reaction gas subsystem, pressure information of shielding gas in the shielding gas subsystem and temperature information of the shielding gas in the shielding gas subsystem according to the powder debugging parameters;
and determining the opening resolution of each regulating valve in the gas supply subsystem of the powder making equipment according to the gas component information, the pressure information and the temperature information.
4. The method according to any one of claims 1-3, further comprising:
acquiring target parameter information of a pipeline in the powder making equipment, wherein the target parameter information comprises gas resistance information, gas specific heat capacity information, gas source state information and opening and closing degree information of each regulating valve; and the number of the first and second electrodes,
determining power supply parameters in the powder manufacturing equipment according to the target parameter information based on a mathematical model, wherein the power supply parameters comprise anode voltage, anode current and grid current;
and adjusting the power supply of the powder manufacturing equipment according to the power supply parameters.
5. The method according to any one of claims 1-3, further comprising:
acquiring target display information in the powder manufacturing equipment, wherein the target display information comprises at least one of power supply state information, smoke state information, water temperature information, water pressure information, wind pressure information, voltage and current information, reaction chamber pressure information, protective gas pressure information and ceramic tube temperature information;
inputting the target display information to an editable controller after passing through a relay so that the editable controller adjusts the opening resolution of each adjusting valve in the gas supply subsystem according to the target display information; and the number of the first and second electrodes,
and displaying the target display information on a user interface, and determining whether to send alarm information according to the target display information.
6. A control device for a radio frequency plasma powder manufacturing apparatus, the device comprising:
the system comprises an acquisition module, a data processing module and a data processing module, wherein the acquisition module is configured to acquire target milling information and call powder debugging parameters according to the target milling information, and the powder debugging parameters are determined by comparing plasma spheroidization rate and productivity;
the determining module is configured to determine the opening resolution of each adjusting valve in an air supply subsystem of the powder making equipment according to the powder debugging parameters;
the adjusting module is configured to adjust the opening degree of each adjusting valve through PID control within the range of the opening degree resolution of each adjusting valve;
and the control module is configured to control the operating parameters of all subsystems in the powder making equipment so as to prepare the plasma spheroidized powder meeting the target powder making information.
7. The apparatus of claim 6, wherein the subsystem comprises a powder delivery subsystem, the control module configured to:
determining the powder feeding amount of the powder feeding subsystem and the gas carrying amount according to the target powder making information;
determining the opening and closing degree of a powder feeding switch of the powder feeding subsystem according to the powder feeding amount; and the number of the first and second electrodes,
and determining the power of the electromagnetic valve of the gas supply subsystem according to the gas carrying quantity.
8. The apparatus of claim 6, wherein the gas supply subsystem comprises a reaction gas subsystem, a shielding gas subsystem, and a carrying gas subsystem;
the determination module is configured to:
determining gas component information of reaction gas in the reaction gas subsystem, pressure information of shielding gas in the shielding gas subsystem and temperature information of the shielding gas in the shielding gas subsystem according to the powder debugging parameters;
and determining the opening resolution of each regulating valve in the gas supply subsystem of the powder making equipment according to the gas component information, the pressure information and the temperature information.
9. A computer-readable storage medium, on which a computer program is stored which, when being executed by a processor, carries out the steps of the method according to any one of claims 1 to 5.
10. An electronic device, comprising:
a memory having a computer program stored thereon;
a processor for executing the computer program in the memory to carry out the steps of the method of any one of claims 1 to 5.
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| CN116921685A (en) * | 2023-09-15 | 2023-10-24 | 西安赛隆增材技术股份有限公司 | Method and device for preparing powder by utilizing microwave plasma |
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