CN112939431B - Low-stress high-generation substrate glass online annealing equipment and annealing method - Google Patents
Low-stress high-generation substrate glass online annealing equipment and annealing method Download PDFInfo
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- CN112939431B CN112939431B CN202110128879.8A CN202110128879A CN112939431B CN 112939431 B CN112939431 B CN 112939431B CN 202110128879 A CN202110128879 A CN 202110128879A CN 112939431 B CN112939431 B CN 112939431B
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- annealing
- annealing furnace
- heating
- unit
- brick
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- 238000000137 annealing Methods 0.000 title claims abstract description 125
- 239000011521 glass Substances 0.000 title claims abstract description 45
- 239000000758 substrate Substances 0.000 title claims abstract description 40
- 238000000034 method Methods 0.000 title claims abstract description 19
- 239000011449 brick Substances 0.000 claims abstract description 63
- 238000010438 heat treatment Methods 0.000 claims abstract description 61
- 238000002791 soaking Methods 0.000 claims description 9
- 229910052751 metal Inorganic materials 0.000 claims description 8
- 239000002184 metal Substances 0.000 claims description 8
- 239000011464 hollow brick Substances 0.000 claims description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 3
- 229910010293 ceramic material Inorganic materials 0.000 claims description 3
- 230000009286 beneficial effect Effects 0.000 abstract description 2
- 238000004519 manufacturing process Methods 0.000 abstract description 2
- 238000011112 process operation Methods 0.000 abstract 1
- 230000035882 stress Effects 0.000 description 5
- 238000009826 distribution Methods 0.000 description 4
- 230000005855 radiation Effects 0.000 description 4
- 239000005357 flat glass Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005265 energy consumption Methods 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 1
- 238000009694 cold isostatic pressing Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- -1 iron-chromium-aluminum Chemical compound 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B25/00—Annealing glass products
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
Abstract
The invention discloses low-stress high-generation substrate glass on-line annealing equipment and an annealing method, wherein the low-stress high-generation substrate glass on-line annealing equipment comprises a plurality of annealing furnace units which are arranged in parallel, adjacent annealing furnace units are not contacted, gaps between the adjacent annealing furnace units are substrate glass passages, each annealing furnace unit comprises a plurality of unit shells which are stacked in sequence, a baffle is detachably connected to the outer wall of the top of each unit shell, the baffle is detachably connected with the adjacent unit shells, each unit shell is of a structure with two open ends, heating bricks are arranged in the inner cavities of the unit shells, and a vapor chamber is arranged on the unit shell positioned in the substrate glass passages. The invention has the advantages of simple processing and manufacturing, easy assembly and high expandability of equipment, and meanwhile, the structure of the invention is beneficial to process operation adjustment and can anneal the glass substrate on line.
Description
Technical Field
The invention belongs to the technical field of glass substrate manufacturing, and particularly relates to low-stress high-generation substrate glass on-line annealing equipment and an annealing method.
Background
The substrate glass needs to be annealed after being formed to eliminate thermal stress generated in the non-uniform cooling process of the glass. High quality substrate glass requires that the glass have a lower stress grade. Uneven stresses in the substrate glass lead to reduced strength of the glass and even affect its optical uniformity, which reduces its subsequent processing and service performance.
In the prior art, the annealing equipment structure of the substrate glass is rough in control of the annealing process, secondary annealing is often needed to reduce the internal stress of the glass, and a large amount of energy and manpower are consumed. As the size of the substrate glass increases, there is an increasing need for an annealing apparatus and an annealing method for in-line one-time annealing.
Disclosure of Invention
In order to solve the problems in the prior art, the invention provides low-stress high-generation substrate glass on-line annealing equipment and an annealing method, solves the problems that the annealing process of the annealing equipment in the prior art is rough, and the annealing equipment needs to perform secondary annealing to reduce the internal stress of the glass, so that a large amount of energy and manpower are consumed.
In order to achieve the above purpose, the present invention provides the following technical solutions: the utility model provides a low stress high generation base plate glass on-line annealing equipment, includes the annealing stove unit of a plurality of parallel arrangement, does not contact between the adjacent annealing stove unit, and clearance between the adjacent annealing stove unit is base plate glass passageway, the annealing stove unit includes a plurality of unit shell that piles up in proper order, all can dismantle on the top outer wall of unit shell and be connected with the baffle, and the connection can be dismantled with adjacent unit shell to baffle, and unit shell is both ends open structure, is provided with the heating brick in the inner chamber of unit shell, is provided with the vapor chamber on the unit shell that is located base plate glass passageway.
Further, the heat-insulating brick is placed in the inner cavity of the unit shell, the heat-insulating brick is of a concave structure, the heating brick is arranged in a groove of the heat-insulating brick, and a gap is reserved between the opening end of the groove of the heat-insulating brick and the inner cavity of the unit shell.
Further, the end face of the heating brick is provided with a heating wire groove, and a heating wire is wound in the heating wire groove.
Further, adjacent annealing furnace units are connected through annealing furnace side plates, and the annealing furnace side plates cover openings of the unit shells.
Further, the annealing furnace side plate comprises a first metal plate, a middle heat-insulating layer and a second metal plate which are sequentially stacked.
Further, a plurality of holes are formed in the side plate of the annealing furnace.
Further, the vapor chamber is made of ceramic materials.
Further, the insulating brick adopts an alumina hollow brick.
The invention also provides an annealing method of the low-stress high-generation substrate glass on-line annealing equipment, which comprises the following steps: the temperature of the heating brick in each unit shell is in a descending trend from the inlet of the annealing furnace unit to the outlet of the annealing furnace unit;
the two ends of the heating brick are respectively opened towards the two ends of the unit shell, the heating power at the two ends of the heating brick is the same, and the heating power at the two ends of the heating brick is larger than the heating power between the two ends of the heating brick.
Further, the inlet of the annealing furnace unit is directed to the outlet of the annealing furnace unit, and the length of the annealing furnace unit is sequentially divided into an upper annealing zone and a lower annealing zone, wherein the temperature drop rate of the heating bricks in the upper annealing zone is lower than that of the heating bricks in the lower annealing zone.
Compared with the prior art, the invention has at least the following beneficial effects:
the invention provides low-stress high-generation substrate glass on-line annealing equipment, which is characterized in that a connecting baffle is detachably arranged on the outer wall of the top of a unit shell, heat flow is controlled in a region, heat flow disturbance and stable heat flow are reduced, so that the substrate glass is heated more uniformly when passing through a substrate glass passageway, uneven heat radiation of a heating brick is converted into heat radiation for soaking through a soaking plate arranged on the outer wall of the unit shell, and the surface of the substrate glass passing through the substrate glass passageway is heated uniformly in the transverse direction.
Further, the insulating brick is arranged in the inner cavity of the unit shell, so that the insulating brick has the heat insulating function while protecting the heating brick, the heat leakage can be reduced, and the energy consumption is saved.
Further, the annealing furnace side plate is used for pressing the middle heat-insulating layer between the first metal plate and the second metal plate, so that the inner cavity of the unit shell is insulated, and heat loss is reduced.
Further, a plurality of holes are formed in the side plate of the annealing furnace, rollers for clamping the substrate glass are conveniently placed, and working conditions of the annealing furnace unit and conditions of the substrate glass can be conveniently observed.
The annealing method provided by the invention can be combined with the annealing equipment provided by the invention to obtain low-stress high-grade substrate glass without secondary annealing operation, thereby saving a large amount of energy and manpower resources.
Drawings
FIG. 1 is an isometric view of an annealing furnace without side plates;
FIG. 2 is a front view of the lehr;
FIG. 3 is a side view of an annealing furnace;
FIG. 4 is a top view of an annealing furnace;
FIG. 5 is a partial view A of FIG. 1;
FIG. 6 is a schematic view of the structure of the side plate of the annealing furnace;
FIG. 7 is a longitudinal temperature profile of an annealing process;
FIG. 8 is a lateral power distribution of an annealing process;
in the accompanying drawings: 1-baffle plates, 2-unit shells, 3-insulating bricks, 4-heating bricks, 5-substrate glass, 6-soaking plates and 7-annealing furnace side plates;
x1 is the temperature change of the heating tiles in the upper annealing zone and x2 is the temperature change of the heating tiles in the lower annealing zone.
Detailed Description
The invention is further described below with reference to the drawings and the detailed description.
As shown in fig. 1 and fig. 2, the invention provides low-stress high-generation substrate glass on-line annealing equipment, which comprises annealing furnace units and annealing furnace side plates 7, wherein a plurality of annealing furnace units are arranged in parallel, each annealing furnace unit is arranged in a non-contact way, as shown in fig. 3 and fig. 4, the gap between adjacent annealing furnace units is a substrate glass passageway, the whole length of each annealing furnace unit is divided into an upper annealing area and a lower annealing area, and the length of the upper annealing area is 4-6 times of the length of the lower annealing area;
in this embodiment, the lehr unit includes a baffle plate 1, a unit housing 2, insulating bricks 3, heating bricks 4, and a soaking plate 6.
Specifically, the unit shells 2 are made of heat-resistant steel materials and are used for mechanical support, two ends of the unit shells 2 are opened, and a plurality of unit shells 2 are stacked in sequence;
baffle 1 is located the top of every unit shell 2, and baffle 1 and unit shell 2 can dismantle the connection, and adjacent unit shell 2 passes through baffle 1 contact, and baffle 1 and adjacent unit shell 2 can dismantle the connection through the bolt, and baffle 1 is used for controlling the heat flow in an area for reduce the effect of heat flow disturbance and stable heat flow, baffle 1 adopts heat-resisting and adiabatic combined material.
The heat-insulating brick 3 is placed in the inner cavity of the unit shell 2, the heat-insulating brick 3 has certain strength and heat-insulating effect, heat leakage is reduced, energy consumption is saved, the heat-insulating brick 3 is of a concave structure, the heating brick 4 is placed in a groove of the heat-insulating brick 3, and a gap is reserved between the opening end of the groove of the heat-insulating brick 3 and the inner cavity of the unit shell 2; the insulating brick 3 is made of alumina hollow bricks or zirconia hollow bricks.
As shown in fig. 5, the heating brick 4 is composed of a plurality of heating units, the grooves of the insulating brick 3 are filled with the plurality of heating bricks 4 in a linear arrangement, two ends of the heating brick 4 face the two ends of the unit housing 2 respectively, two ends of the heating brick 4 are provided with heating wire grooves, and heating wires are wound in the heating wire grooves, and the heating wires adopt platinum or iron-chromium-aluminum resistance wires and the like.
The soaking plate 6 is made of ceramic material with good heat conductivity, is plate-shaped, and is manufactured by adopting a cold isostatic pressing process. The soaking plate 6 is located at the outer side of the unit housing 2 and has a certain space with the heating brick 4, and specifically, the soaking plate 6 is located on the outer wall of the unit housing 2 on the substrate glass aisle. The uneven heat radiation of the single heating brick 4 can be converted into the heat radiation of soaking, so that the surface of the substrate glass 5 on the substrate glass aisle is uniformly heated in the transverse direction.
As shown in fig. 6, the annealing furnace side plate 7 is formed by sequentially stacking three materials, namely a first metal plate, a middle heat-insulating layer and a second metal plate, and is used for insulating heat from openings on two sides of two adjacent annealing furnace units, the annealing furnace side plate 7 covers the opening of the unit housing 2, in this embodiment, a plurality of holes are formed in the annealing furnace side plate 7, and the annealing furnace side plate 7 is directly fixed on the annealing furnace unit through screws in the use process, wherein the plurality of holes formed in the annealing furnace side plate 7 are used for placing rollers for holding the substrate glass 5, and can also be used as observation holes for observing the conditions in the annealing furnace.
The annealing method using the annealing equipment of the invention comprises the longitudinal temperature control of the whole annealing furnace and the transverse power control of the single unit housing 2;
the longitudinal temperature control of the whole annealing furnace is the temperature course of the whole process from the inflow of the substrate glass 5 into the annealing furnace to the outflow of the substrate glass from the forming zone. The inlet of the annealing furnace unit is directed to the outlet of the annealing furnace unit, the length of the annealing furnace unit is sequentially divided into an upper annealing zone and a lower annealing zone, as shown in fig. 7, wherein X1 is the temperature change of the heating brick in the upper annealing zone, X2 is the temperature change of the heating brick in the lower annealing zone, the inlet of the annealing furnace unit is directed to the outlet of the annealing furnace unit, the temperature of the heating brick 4 in each unit housing 2 is in a descending trend, and the temperature descending rate of the heating brick 4 in the upper annealing zone is lower than the temperature descending rate of the heating brick 4 in the lower annealing zone.
The lateral power of the single unit housing 2 is controlled to be symmetrically distributed from the proximal end of the annealing furnace to the distal end of the annealing furnace, and meanwhile, the heat dissipation of the two sides of the annealing furnace is larger than that of the middle, so that the power of the two ends of the annealing furnace is larger, namely the heating power of the two ends of the heating brick 4 is the same, and the heating power of the two ends of the heating brick 4 is larger than that of the heating brick 4. The overall lateral power distribution is shown in fig. 8. It should be noted that this distribution is only a schematic distribution and does not represent the optimal process state.
Finally, it should be noted that: the above examples are only specific embodiments of the present invention, and are not intended to limit the scope of the present invention, but it should be understood by those skilled in the art that the present invention is not limited thereto, and that the present invention is described in detail with reference to the foregoing examples: any person skilled in the art may modify or easily conceive of the technical solution described in the foregoing embodiments, or perform equivalent substitution of some of the technical features, while remaining within the technical scope of the present disclosure; such modifications, changes or substitutions do not depart from the spirit and scope of the technical solutions of the embodiments of the present invention, and are intended to be included in the scope of the present invention. Therefore, the protection scope of the present invention shall be subject to the protection scope of the claims.
Claims (4)
1. The low-stress high-generation substrate glass online annealing equipment is characterized by comprising a plurality of annealing furnace units which are arranged in parallel, wherein adjacent annealing furnace units are not contacted, gaps between the adjacent annealing furnace units are substrate glass passages, each annealing furnace unit comprises a plurality of unit shells (2) which are stacked in sequence, a baffle (1) is detachably connected to the outer wall of the top of each unit shell (2), each baffle (1) is detachably connected with each adjacent unit shell (2), each unit shell (2) is of a structure with two open ends, heating bricks (4) are arranged in the inner cavity of each unit shell (2), and a vapor chamber (6) is arranged on each unit shell (2) positioned in each substrate glass passage;
the annealing method of the low-stress high-generation substrate glass on-line annealing equipment comprises the following steps of:
the temperature of the heating bricks (4) in each unit shell (2) is in a descending trend from the inlet of the annealing furnace unit to the outlet of the annealing furnace unit;
the two ends of the heating brick (4) are respectively opened towards the two ends of the unit shell (2), the heating power at the two ends of the heating brick (4) is the same, and the heating power at the two ends of the heating brick (4) is larger than the heating power between the two ends of the heating brick (4);
the inlet of the annealing furnace unit faces the outlet direction of the annealing furnace unit, the length of the annealing furnace unit is sequentially divided into an upper annealing zone and a lower annealing zone, and the temperature dropping rate of the heating bricks (4) in the upper annealing zone is lower than that of the heating bricks (4) in the lower annealing zone;
the heat-insulating brick is characterized by further comprising a heat-insulating brick (3), wherein the heat-insulating brick (3) is placed in the inner cavity of the unit shell (2), the heat-insulating brick (3) is of a concave structure, the heating brick (4) is arranged in a groove of the heat-insulating brick (3), and a gap is reserved between the opening end of the groove of the heat-insulating brick (3) and the inner cavity of the unit shell (2);
the end face of the heating brick (4) is provided with a heating wire groove, and a heating wire is wound in the heating wire groove;
adjacent annealing furnace units are connected through an annealing furnace side plate (7), and the annealing furnace side plate (7) covers the opening of the unit shell (2);
the annealing furnace side plate (7) comprises a first metal plate, a middle heat-insulating layer and a second metal plate which are sequentially laminated.
2. The low-stress high-generation substrate glass on-line annealing equipment according to claim 1, wherein a plurality of holes are formed on the side plate (7) of the annealing furnace.
3. The low-stress high-generation substrate glass on-line annealing equipment according to claim 1, wherein the soaking plate (6) is made of ceramic materials.
4. The low-stress high-generation substrate glass on-line annealing equipment according to claim 1, wherein the insulating brick (3) is an alumina hollow brick.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110128879.8A CN112939431B (en) | 2021-01-29 | 2021-01-29 | Low-stress high-generation substrate glass online annealing equipment and annealing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110128879.8A CN112939431B (en) | 2021-01-29 | 2021-01-29 | Low-stress high-generation substrate glass online annealing equipment and annealing method |
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| Publication Number | Publication Date |
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| CN112939431A CN112939431A (en) | 2021-06-11 |
| CN112939431B true CN112939431B (en) | 2023-12-12 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN202110128879.8A Active CN112939431B (en) | 2021-01-29 | 2021-01-29 | Low-stress high-generation substrate glass online annealing equipment and annealing method |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN116835874A (en) * | 2022-07-01 | 2023-10-03 | 毛立国 | Low-stress glass production system |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7000433B1 (en) * | 1999-05-17 | 2006-02-21 | Technopat Ag | Device for heating plates of glass |
| CN101439925A (en) * | 2008-12-25 | 2009-05-27 | 杭州蓝星新材料技术有限公司 | On-line film coating environment whole set adjusting device of float glass production line annealing kiln A0 zone |
| CN104310766A (en) * | 2014-09-24 | 2015-01-28 | 河北省沙河玻璃技术研究院 | A heating furnace used for drawing willow glass by secondary melting method |
| CN104962716A (en) * | 2015-07-02 | 2015-10-07 | 周海波 | Gas catalytic flameless near-infrared heating annealing furnace |
| CN107010819A (en) * | 2017-06-08 | 2017-08-04 | 深圳隆庆智能激光科技有限公司 | Mold heating device and 3D glass-forming dies |
| CN215440200U (en) * | 2021-01-29 | 2022-01-07 | 彩虹显示器件股份有限公司 | Low-stress high-generation substrate glass online annealing equipment |
-
2021
- 2021-01-29 CN CN202110128879.8A patent/CN112939431B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7000433B1 (en) * | 1999-05-17 | 2006-02-21 | Technopat Ag | Device for heating plates of glass |
| CN101439925A (en) * | 2008-12-25 | 2009-05-27 | 杭州蓝星新材料技术有限公司 | On-line film coating environment whole set adjusting device of float glass production line annealing kiln A0 zone |
| CN104310766A (en) * | 2014-09-24 | 2015-01-28 | 河北省沙河玻璃技术研究院 | A heating furnace used for drawing willow glass by secondary melting method |
| CN104962716A (en) * | 2015-07-02 | 2015-10-07 | 周海波 | Gas catalytic flameless near-infrared heating annealing furnace |
| CN107010819A (en) * | 2017-06-08 | 2017-08-04 | 深圳隆庆智能激光科技有限公司 | Mold heating device and 3D glass-forming dies |
| CN215440200U (en) * | 2021-01-29 | 2022-01-07 | 彩虹显示器件股份有限公司 | Low-stress high-generation substrate glass online annealing equipment |
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| CN112939431A (en) | 2021-06-11 |
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