CN112925171A - Patterned electronic light source based on anodic aluminum oxide template and manufacturing method thereof - Google Patents
Patterned electronic light source based on anodic aluminum oxide template and manufacturing method thereof Download PDFInfo
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- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 title claims abstract description 21
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 15
- 239000000463 material Substances 0.000 claims abstract description 29
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 25
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 25
- 230000000694 effects Effects 0.000 claims abstract description 20
- 238000010894 electron beam technology Methods 0.000 claims abstract description 15
- 238000005286 illumination Methods 0.000 claims abstract description 12
- 230000001678 irradiating effect Effects 0.000 claims abstract description 5
- 238000000034 method Methods 0.000 claims description 27
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 13
- 229910052751 metal Inorganic materials 0.000 claims description 11
- 239000002184 metal Substances 0.000 claims description 11
- 238000000206 photolithography Methods 0.000 claims description 10
- 230000003647 oxidation Effects 0.000 claims description 9
- 238000007254 oxidation reaction Methods 0.000 claims description 9
- 238000004070 electrodeposition Methods 0.000 claims description 6
- 230000003287 optical effect Effects 0.000 claims description 6
- 238000001027 hydrothermal synthesis Methods 0.000 claims description 5
- 238000000137 annealing Methods 0.000 claims description 3
- 238000004140 cleaning Methods 0.000 claims description 3
- 239000004020 conductor Substances 0.000 claims description 3
- 230000008020 evaporation Effects 0.000 claims description 3
- 238000001704 evaporation Methods 0.000 claims description 3
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 3
- 238000007747 plating Methods 0.000 claims description 3
- 229910052697 platinum Inorganic materials 0.000 claims description 3
- 238000005498 polishing Methods 0.000 claims description 3
- 238000004528 spin coating Methods 0.000 claims description 3
- 230000002194 synthesizing effect Effects 0.000 claims description 3
- 229910052725 zinc Inorganic materials 0.000 claims description 3
- 239000000758 substrate Substances 0.000 abstract description 5
- 230000001133 acceleration Effects 0.000 abstract description 3
- 238000001259 photo etching Methods 0.000 abstract description 3
- 238000000609 electron-beam lithography Methods 0.000 description 6
- 238000000151 deposition Methods 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Images
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
- G03F7/70391—Addressable array sources specially adapted to produce patterns, e.g. addressable LED arrays
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/045—Anodisation of aluminium or alloys based thereon for forming AAO templates
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/12—Anodising more than once, e.g. in different baths
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
Abstract
The invention discloses a patterned electronic light source based on an anodized aluminum template and a manufacturing method thereof, wherein the electronic light source comprises an electronic emitter and a light projection illumination system. The invention takes an anodic aluminum oxide template as a base, an external photoelectric effect material is filled in a nanometer hole of the anodic aluminum oxide template to be used as a photoelectron emission nanometer electrode array, and the local nanometer electrode is controlled to emit electrons by irradiating the nanometer electrode array through light projection; the nano-photoelectrode that is illuminated by light will emit electrons, while the nano-photoelectrode that is not illuminated by light will not emit electrons; therefore, the shape of the electron beam emitted by the electron light source can be changed according to the preset pattern, and the electron beam can be emitted in a large area. The electron beam emitted by the electron light source does not need a mask plate, and can form a reduced electron light source image after passing through components such as an acceleration component, a diaphragm component, a magnetic lens component and the like, and the reduced electron light source image is projected on a target substrate. The invention can conveniently and rapidly edit the final electronic projected pattern, namely the electronic photoetching pattern, by changing the light projected pattern.
Description
Technical Field
The invention relates to the technical field of electronics, in particular to a patterned electronic light source based on an anodic aluminum oxide template and a manufacturing method thereof.
Background
Photolithography systems play a crucial role in the fabrication process of semiconductor integrated circuits. With the higher integration level and the smaller size of the components, the requirement on the resolution of the lithography system is higher. By utilizing the fluctuation of electrons, the electron beam lithography using electrons as an illumination light source can theoretically obtain extremely high resolution. For example, 20kV accelerated electrons can obtain a wavelength of 0.0086 nm.
Electron beam lithography is classified into direct-write electron beam lithography and projection electron beam lithography. Direct-write e-beam lithography works on a principle similar to a scanning electron microscope, and is exposed by controlling an electron beam to scan over a target substrate. The resolution is high, a mask plate is not needed, and the scanning working mode is low in productivity and far from meeting the requirement. The working principle of projection electron beam lithography is similar to that of photo-lithography, and large-scale simultaneous exposure can be realized, so that the productivity is greatly improved, but the mask plate is high in cost, and the development and application of the mask plate are limited by the problems of proximity effect, space charge effect and the like.
The electronic light source of the invention takes the photoelectric material nano electrode array deposited in the anodic aluminum oxide template as an electronic emitter, and the nano photoelectric electrode array emitter is irradiated by light projection so as to control the emitter to emit locally according to a preset pattern, thereby achieving the purpose of patterning the electronic light source. The emitted electron beam does not need a mask plate, and can form a reduced electron light source image after passing through components such as an accelerating component, a diaphragm and a magnetic lens, and the reduced electron light source image is projected on a target substrate.
Disclosure of Invention
The invention aims to provide a patterned electronic light source based on an anodic aluminum oxide template and a manufacturing method thereof.
In order to achieve the purpose, the invention provides the following technical scheme:
an anodized aluminum template-based patterned electron light source comprising:
the electron emitter comprises an emission electrode layer and a base electrode layer, wherein the emission electrode layer comprises a porous anodic alumina template, a photoelectric material grows or deposits in nano holes of the porous anodic alumina template, the photoelectric material is an external photoelectric effect material, and the base electrode layer comprises a metal conducting layer formed on the back surface of the emission electrode layer;
and the light projection irradiation system is used for projecting and irradiating the edited pattern onto the electron emitter so that the electron emitter locally emits an electron beam containing preset pattern information according to the projection of the preset pattern.
As a further scheme of the invention: the light projection and illumination system is a projection system of common photolithography.
As a further scheme of the invention: the light projection and irradiation system comprises a common mask plate and an optical lens, so that the common mask plate and the optical lens are utilized to finish the editing and projection of the pattern.
As a further scheme of the invention: the nano holes of the porous anodic alumina template are used for growing or depositing the photoelectric material in the nano holes of the alumina template by a hydrothermal method or an electrochemical deposition method.
As a further scheme of the invention: the external photoelectric effect material is Zn or Pt.
The method for manufacturing the patterned electron light source based on the anodized aluminum template, wherein the light projection and irradiation system is a projection system of common photolithography, and the method for manufacturing the electron emitter comprises the following steps:
s1: preparing an emitting electrode layer;
s11: synthesizing an anodic aluminum oxide template: a secondary anodic oxidation method is adopted to obtain a hole structure with more regular shape and arrangement;
s12: filling an external photoelectric effect material in the nano holes of the anodic aluminum oxide template to form an emitting electrode layer with a nano photoelectrode array;
s2: forming a base electrode layer: and forming a metal conductive layer on the back surface of the emission electrode layer to serve as a base electrode layer.
As a further scheme of the invention: the method for manufacturing the anodized aluminum template of step S11 includes the following steps:
s111: preparing a high-purity aluminum sheet, and carrying out pretreatment such as mechanical flattening, annealing, cleaning, polishing and the like;
s112: and (3) carrying out primary anodic oxidation on the treated high-purity aluminum sheet, removing an oxide layer, and carrying out secondary anodic oxidation to obtain the porous anodic alumina template with the holes arranged in order.
As a further scheme of the invention: the diameter of the holes is 2-90 nanometers.
As a further scheme of the invention: the step S12 specifically includes:
and filling an external photoelectric effect material in the nano holes by using a hydrothermal method or an electrochemical deposition method to form an emitting electrode layer of the vertical nano electrode array.
As a further scheme of the invention: the step S2 specifically includes:
removing aluminum on the back surface of the anodic aluminum oxide template, plating a layer of metal conductive material on the back surface by using methods such as magnetron sputtering, evaporation or spin coating, and the like, and forming a base electrode layer.
Compared with the prior art, the invention has the beneficial effects that:
the invention provides a patterned electronic light source based on an anodic aluminum oxide template, wherein the electronic light source is based on the anodic aluminum oxide template, an external photoelectric effect material is filled in a nano hole of the electronic light source to serve as a photoelectron emission nano electrode array, and the local nano electrode emission electrons are controlled by irradiating the nano electrode array through light projection; the nano-photoelectrode that is illuminated by light will emit electrons, while the nano-photoelectrode that is not illuminated by light will not emit electrons; therefore, the shape of the electron beam emitted by the electron light source can be changed according to the preset pattern, and the electron beam can be emitted in a large area. The electron beam emitted by the electron light source does not need a mask plate, and can form a reduced electron light source image after passing through components such as an acceleration component, a diaphragm component, a magnetic lens component and the like, and the reduced electron light source image is projected on a target substrate. The invention can conveniently and rapidly edit the final electronic projected pattern, namely the electronic photoetching pattern, by changing the light projected pattern.
Drawings
FIG. 1 is a cross-sectional view of an electron light source according to embodiment 1 of the present invention;
FIGS. 2a-d are simplified schematic diagrams of a method of fabricating an electron emitter according to an embodiment of the invention.
Detailed Description
The technical solutions of the present invention will be described clearly and completely with reference to the following embodiments, and it should be understood that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be obtained by a person skilled in the art without inventive effort based on the embodiments of the present invention, are within the scope of the present invention.
Referring to fig. 1, in an embodiment of the invention, an anodized aluminum template-based patterned electron light source includes an electron emitter and a light projection illumination system; the light projection and illumination system is responsible for editing the preset pattern and projecting and illuminating the edited pattern onto the electronic emitter. The electron emitter emits electrons locally according to the projection of the preset pattern to form an electron beam containing the preset pattern information.
The electron emitter comprises an emitting electrode layer and a base electrode layer, wherein the emitting electrode layer comprises a porous anodic aluminum oxide template, a photoelectric material grows or deposits in nano holes of the porous anodic aluminum oxide template, the photoelectric material is an external photoelectric effect material, and the base electrode layer comprises a metal conducting layer formed on the back of the emitting electrode layer. The anode alumina template is used as a field emission cathode, and has the advantages of low starting voltage, simple method and process, easy realization of large-area emission, uniform emission and the like.
When the filled photoelectric material is an external photoelectric effect material, the base electrode layer on the back can adopt a metal conductive layer, a light beam with a preset pattern irradiates an electron light source from the front side of the emitting electrode layer, the irradiated nano electrode array emits electrons, and the non-irradiated nano electrode array does not emit electrons.
In the present embodiment, the light projection and illumination system is a projection system of general photolithography; the light projection and irradiation system comprises a common mask plate and an optical lens, so that the common mask plate and the optical lens are utilized to finish the editing and projection of the pattern.
In this embodiment, the nano-pores of the porous anodic alumina template are subjected to a hydrothermal method or an electrochemical deposition method to grow or deposit a photoelectric material in the nano-pores of the alumina template; the external photoelectric effect material is Zn or Pt.
The method for manufacturing the patterned electron light source based on the anodized aluminum template, wherein the light projection and irradiation system is a projection system of common photolithography, and the method for manufacturing the electron emitter comprises the following steps:
(1) preparing an emitting electrode layer;
(11) synthesizing an anodic aluminum oxide template: a secondary anodic oxidation method is adopted to obtain a hole structure with more regular shape and arrangement;
(12) filling an external photoelectric effect material in the nano holes of the anodic aluminum oxide template to form an emitting electrode layer with a nano photoelectrode array;
(2) forming a base electrode layer: and forming a metal conductive layer on the back surface of the emission electrode layer to serve as a base electrode layer.
The specific embodiment is as follows:
a patterned electronic light source based on an anodized aluminum template comprises an electron emitter and a light projection and illumination system. The light projection and illumination system adopts a projection system of common photo-lithography. A cross-sectional view of the electron emitter is shown in fig. 1. The transmitter comprises two parts: the base electrode layer is a conductive metal layer, and can be selected from gold, copper, aluminum and the like; and the black part of the emission electrode layer is a nano electrode array for depositing an external photoelectric effect material, and the white part of the emission electrode layer is an alumina template framework.
When the light projection irradiation system projects a preset pattern on the surface of the electron emitter, because the emitter contains the nano electrode array of the external photoelectric effect material, the irradiated nano electrode can emit photoelectrons, and the non-irradiated nano electrode can not emit electrons, so that the aim of emitting electron beams according to the preset pattern is fulfilled. The emitted photoelectrons can be compensated by switching on the power supply through the base electrode. The density of emitted photoelectrons can be controlled by the density of the nanoelectrodes and the intensity of the illumination.
The method for manufacturing the patterned electron light source based on the anodized aluminum template is only described here as the method for manufacturing the electron emitter, since the light projection and illumination system uses the projection system of the conventional photolithography, and the specific steps are shown in fig. 2 a-d.
(1) Referring to fig. 2a, a piece of high purity aluminum sheet is prepared and is subjected to pretreatment such as mechanical flattening, annealing, cleaning, polishing, etc.
(2) And (3) carrying out primary anodic oxidation on the treated high-purity aluminum sheet, removing an oxide layer, and carrying out secondary anodic oxidation to obtain a porous anodic alumina template with regularly arranged holes, as shown in figure 2 b. The diameter of the holes and the distance between the holes are not too large and should be controlled within the range of several nanometers to dozens of nanometers.
(3) After the hole expansion treatment, the outer photoelectric effect material is filled in the nano holes by using methods such as a hydrothermal method or electrochemical deposition method, and the like, so as to form a vertical nano electrode array, as shown in fig. 2 c.
(4) Removing the aluminum on the back surface, plating a layer of metal conductive material on the back surface by magnetron sputtering, evaporation or spin coating, etc., and forming a base electrode layer, as shown in fig. 2 d.
The invention provides a patterned electronic light source based on an anodic aluminum oxide template, wherein the electronic light source is based on the anodic aluminum oxide template, an external photoelectric effect material is filled in a nano hole of the electronic light source to serve as a photoelectron emission nano electrode array, and the local nano electrode emission electrons are controlled by irradiating the nano electrode array through light projection; the nano-photoelectrode that is illuminated by light will emit electrons, while the nano-photoelectrode that is not illuminated by light will not emit electrons; therefore, the shape of the electron beam emitted by the electron light source can be changed according to the preset pattern, and the electron beam can be emitted in a large area. The electron beam emitted by the electron light source does not need a mask plate, and can form a reduced electron light source image after passing through components such as an acceleration component, a diaphragm component, a magnetic lens component and the like, and the reduced electron light source image is projected on a target substrate. The invention can conveniently and rapidly edit the final electronic projected pattern, namely the electronic photoetching pattern, by changing the light projected pattern.
The above description is only for the preferred embodiment of the present invention, but the scope of the present invention is not limited thereto, and any person skilled in the art should be considered to be within the technical scope of the present invention, and the technical solutions and the inventive concepts thereof according to the present invention are equivalent to or changed within the technical scope of the present invention.
Claims (10)
1. An anodized aluminum template-based patterned electronic light source, comprising:
the electron emitter comprises an emission electrode layer and a base electrode layer, wherein the emission electrode layer comprises a porous anodic alumina template, a photoelectric material grows or deposits in nano holes of the porous anodic alumina template, the photoelectric material is an external photoelectric effect material, and the base electrode layer comprises a metal conducting layer formed on the back surface of the emission electrode layer;
and the light projection irradiation system is used for projecting and irradiating the edited pattern onto the electron emitter so that the electron emitter locally emits an electron beam containing preset pattern information according to the projection of the preset pattern.
2. The anodized aluminum template-based patterned electronic light source of claim 1, wherein the light projection illumination system is a projection system for general photolithography.
3. The anodized aluminum template-based patterned electronic light source of claim 1, wherein the light projection and illumination system comprises a common mask plate and an optical lens, so that the pattern editing and projection can be completed by using the common mask plate and the optical lens.
4. The patterned anodized aluminum template-based electronic light source of claim 1, wherein the nanopores of the porous anodized aluminum template are used to grow or deposit a photovoltaic material in the nanopores of the aluminum template by hydrothermal or electrochemical deposition.
5. The anodized aluminum template-based patterned electron light source of claim 1, wherein the external photoelectric effect material is Zn or Pt.
6. The method according to any one of claims 1 to 5, wherein the light projection system is a general photolithography projection system, and the method for manufacturing the electron emitter comprises the following steps:
s1: preparing an emitting electrode layer;
s11: synthesizing an anodic aluminum oxide template: a secondary anodic oxidation method is adopted to obtain a hole structure with more regular shape and arrangement;
s12: filling an external photoelectric effect material in the nano holes of the anodic aluminum oxide template to form an emitting electrode layer with a nano photoelectrode array;
s2: forming a base electrode layer: and forming a metal conductive layer on the back surface of the emission electrode layer to serve as a base electrode layer.
7. The method as claimed in claim 6, wherein the step S11 comprises the following steps:
s111: preparing a high-purity aluminum sheet, and carrying out pretreatment such as mechanical flattening, annealing, cleaning, polishing and the like;
s112: and (3) carrying out primary anodic oxidation on the treated high-purity aluminum sheet, removing an oxide layer, and carrying out secondary anodic oxidation to obtain the porous anodic alumina template with the holes arranged in order.
8. The method of claim 7, wherein the diameter of the holes is between 2 nm and 90 nm.
9. The method as claimed in claim 6, wherein the step S12 is specifically as follows:
and filling an external photoelectric effect material in the nano holes by using a hydrothermal method or an electrochemical deposition method to form an emitting electrode layer of the vertical nano electrode array.
10. The method as claimed in claim 6, wherein the step S2 is specifically as follows:
removing aluminum on the back surface of the anodic aluminum oxide template, plating a layer of metal conductive material on the back surface by using methods such as magnetron sputtering, evaporation or spin coating, and the like, and forming a base electrode layer.
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5118952A (en) * | 1986-08-18 | 1992-06-02 | Fujitsu Limited | Patterned photo cathode and its fabrication method for electron image projection |
| CN1469200A (en) * | 2002-07-15 | 2004-01-21 | ���ǵ�����ʽ���� | Electronic photoetching equipment with pattern emitter |
| CN102262989A (en) * | 2011-06-27 | 2011-11-30 | 福州大学 | Method for manufacturing anodic aluminum oxide template and method for manufacturing field emission cathode array material by using template |
| CN108048882A (en) * | 2017-12-07 | 2018-05-18 | 天津大学 | A kind of method that graphical cobalt nanowire array is prepared based on anodic oxidation aluminium formwork method |
| CN109887816A (en) * | 2019-02-22 | 2019-06-14 | 福建工程学院 | A kind of reflective field emission electron light source device and preparation method |
-
2021
- 2021-01-20 CN CN202110077236.5A patent/CN112925171A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5118952A (en) * | 1986-08-18 | 1992-06-02 | Fujitsu Limited | Patterned photo cathode and its fabrication method for electron image projection |
| CN1469200A (en) * | 2002-07-15 | 2004-01-21 | ���ǵ�����ʽ���� | Electronic photoetching equipment with pattern emitter |
| CN102262989A (en) * | 2011-06-27 | 2011-11-30 | 福州大学 | Method for manufacturing anodic aluminum oxide template and method for manufacturing field emission cathode array material by using template |
| CN108048882A (en) * | 2017-12-07 | 2018-05-18 | 天津大学 | A kind of method that graphical cobalt nanowire array is prepared based on anodic oxidation aluminium formwork method |
| CN109887816A (en) * | 2019-02-22 | 2019-06-14 | 福建工程学院 | A kind of reflective field emission electron light source device and preparation method |
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Application publication date: 20210608 |