CN112835270B - Rotary measurement and control device of rotary platform - Google Patents
Rotary measurement and control device of rotary platform Download PDFInfo
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- CN112835270B CN112835270B CN202110067126.0A CN202110067126A CN112835270B CN 112835270 B CN112835270 B CN 112835270B CN 202110067126 A CN202110067126 A CN 202110067126A CN 112835270 B CN112835270 B CN 112835270B
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- 238000005259 measurement Methods 0.000 title claims abstract description 44
- 239000000725 suspension Substances 0.000 claims abstract description 12
- 238000005339 levitation Methods 0.000 claims description 43
- 230000033001 locomotion Effects 0.000 claims description 40
- 230000007246 mechanism Effects 0.000 claims description 15
- 238000012360 testing method Methods 0.000 claims description 13
- IJJWOSAXNHWBPR-HUBLWGQQSA-N 5-[(3as,4s,6ar)-2-oxo-1,3,3a,4,6,6a-hexahydrothieno[3,4-d]imidazol-4-yl]-n-(6-hydrazinyl-6-oxohexyl)pentanamide Chemical compound N1C(=O)N[C@@H]2[C@H](CCCCC(=O)NCCCCCC(=O)NN)SC[C@@H]21 IJJWOSAXNHWBPR-HUBLWGQQSA-N 0.000 claims description 11
- 238000001259 photo etching Methods 0.000 claims description 11
- 238000013519 translation Methods 0.000 claims description 11
- 230000005540 biological transmission Effects 0.000 claims description 10
- 238000004804 winding Methods 0.000 claims description 7
- 238000010586 diagram Methods 0.000 description 18
- 238000000034 method Methods 0.000 description 14
- 235000012431 wafers Nutrition 0.000 description 13
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 11
- 229910052710 silicon Inorganic materials 0.000 description 11
- 239000010703 silicon Substances 0.000 description 11
- 230000014616 translation Effects 0.000 description 9
- 101150118300 cos gene Proteins 0.000 description 7
- 238000001459 lithography Methods 0.000 description 6
- 238000013461 design Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 230000009977 dual effect Effects 0.000 description 3
- 101100234408 Danio rerio kif7 gene Proteins 0.000 description 2
- 101100221620 Drosophila melanogaster cos gene Proteins 0.000 description 2
- 208000006011 Stroke Diseases 0.000 description 2
- 101100398237 Xenopus tropicalis kif11 gene Proteins 0.000 description 2
- 238000013208 measuring procedure Methods 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 230000001360 synchronised effect Effects 0.000 description 2
- 230000001276 controlling effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
The invention discloses a rotation measurement and control device of a rotation platform, which comprises: the device comprises a rotating platform, a magnetic suspension plane rotating motor and a cylindrical grating interferometer, wherein the cylindrical grating interferometer comprises a cylindrical grating ruler, a plurality of grating ruler reading heads and a plane interferometer positioned at the bottom of the cylindrical grating ruler, and the cylindrical grating interferometer is used for measuring the rotating angle of the rotating platform, the offset in the horizontal direction and the vertical direction and the inclination in the vertical direction; and the magnetic suspension plane rotating motor is used for controlling the rotation of the rotating platform according to the measurement result of the cylindrical grating interferometer and compensating the offset in the horizontal direction and the vertical direction and the inclination in the vertical direction. The invention adopts the magnetic suspension plane rotating motor to rotationally drive the rotating platform for bearing the workpiece platform, and adopts the cylindrical grating interferometer to carry out real-time measurement, feedback compensation and control on the rotation angle and the offset, thereby ensuring that the rotating platform can accurately exchange the workpiece platform to the corresponding station.
Description
Technical Field
The invention relates to the technical field of integrated circuit manufacturing lithography equipment, in particular to a rotation measurement and control device of a rotation platform.
Background
In order to improve the efficiency of photoetching treatment, two workpiece tables are arranged on a photoetching machine corresponding to a measuring station and an exposure station, and silicon wafers are respectively placed on each workpiece table, and meanwhile, the measuring and exposure procedures of the silicon wafers are carried out. The method comprises the steps of carrying out processes such as coordinate alignment and leveling on a silicon wafer on a measuring station, and carrying out processes such as alignment and exposure on a silicon wafer mask on an exposure station. Then, the positions of the two workpiece stages are exchanged, the silicon wafer processed by the measuring procedure is exchanged to an exposure station along with the workpiece stages for exposure treatment, and the silicon wafer processed by the previous exposure procedure can be replaced by a new silicon wafer, and the measuring procedure is carried out on the measuring station.
In the prior art, in the exchange process of the workpiece table, the position sensor used for alignment and other purposes is arranged at the corner of the workpiece table to be aligned with the station, and the position sensor can only play a role when the workpiece table basically reaches the corresponding area of the station, but in the exchange process of the workpiece table, more accurate exchange control, feedback adjustment and the like cannot be performed, so that after the exchange of the workpiece table is completed, larger position deviation possibly occurs, long time is required for calibration, and the photoetching processing efficiency is seriously influenced.
Disclosure of Invention
The invention aims to overcome the defects in the prior art and provides a rotation measurement and control device of a rotation platform of a photoetching machine.
In order to achieve the above purpose, the technical scheme of the invention is as follows:
a rotation measurement and control device of a rotation platform comprises:
a rotating platform for carrying the workpiece table;
a magnetic suspension plane rotating motor arranged between the rotating platform and a bottom plate of the photoetching machine;
the cylindrical grating interferometer is arranged at the rotation center of the rotary platform and comprises a cylindrical grating ruler, a plurality of grating ruler reading heads and a plane interferometer positioned at the bottom of the cylindrical grating ruler, and the cylindrical grating interferometer is used for measuring the rotation angle of the rotary platform, the offset in the horizontal direction and the vertical direction and the inclination in the vertical direction;
and the magnetic suspension plane rotating motor is used for controlling the rotation of the rotating platform according to the measurement result of the cylindrical grating interferometer and compensating the offset in the horizontal direction and the vertical direction and the inclination in the vertical direction.
Further, a grating ruler reading head of the cylindrical grating interferometer and the plane interferometer are arranged on the rotary platform, a cylindrical grating ruler of the cylindrical grating interferometer is arranged on a measuring support above the rotary platform, and a plane reflecting mirror is arranged at the bottom of the cylindrical grating ruler.
Further, the plurality of grating ruler reading heads and the plane interferometer are arranged on the reading head assembly, the reading head assembly is fixed on a lifting mechanism, and the lifting mechanism is used for lifting the reading head assembly to a measuring position corresponding to the cylindrical grating ruler before the rotary platform starts to rotate and lowering the reading head assembly to be lower than the bottom surface of the cylindrical grating ruler after the rotary platform finishes rotating.
Further, the plurality of grating ruler reading heads are at least 5 grating ruler reading heads, an X axis, a Y axis and a Z axis are used for representing a space coordinate system where the grating ruler reading heads are located, wherein the vertical direction passing through the rotation center is used as the Z axis, the X axis and the Y axis are located on a rotation plane of the rotation platform, three at least 3 grating ruler reading heads are arranged on the plane formed by the X axis and the Y axis at intervals of 90 degrees, and at a preset distance position right above or right below at least two grating ruler reading heads which are separated by 90 degrees, 1 grating ruler reading head is respectively arranged. .
Further, the grating ruler reading head of the cylindrical grating ruler comprises: a laser light source, a partially transmissive mirror, a phase retarder, and a scanning detector,
part of the light beam emitted by the laser light source is reflected by the partial transmission reflector, passes through the phase retarder and irradiates the scanning detector to form a reference light path;
the other part of the light beam emitted by the laser light source irradiates the cylindrical grating ruler after being transmitted by the partial transmission reflector, irradiates the scanning detector after being diffracted by the cylindrical grating ruler, and forms a test light path;
when the rotating platform is in a motion state, a frequency difference exists between the light beam of the test light path and the light beam of the reference light path, and interference light is generated on the scanning detector.
Further, the phase retarder generates a phase retardation of pi/2, and the cylindrical grating interferometer calculates the amount of motion of the rotating stage by:
the phase difference between the light beam of the test light path and the light beam of the reference light path is expressed as:
△ω△t＝2π△t(1/v)
wherein Deltat is a unit time difference, deltaω is a frequency variation of the light beam of the test light path and the light beam of the reference light path in the unit time difference Deltat, v is a movement speed of the rotating platform,
the scanning detector measures the light intensity change of interference light corresponding to the unit time difference delta t, calculates the phase difference according to the light intensity change, calculates v according to the formula, integrates time according to the movement speed corresponding to each delta t to obtain the movement position of the rotary platform, and the initial value of the movement speed is 0.
Further, the magnetic levitation planar rotating electric machine includes: the rotor coil is arranged at the bottom of the rotary platform, and the annular Hall Bach permanent magnet array is arranged on a bottom plate of the photoetching machine and used as a stator.
Further, the mover coil includes:
at least 4 groups of r coils which are uniformly distributed on the circumference, wherein the winding direction of the r coils is the tangential direction of the annular Hall Bach permanent magnet array and is used for adjusting the central position of the rotating platform;
at least 3 groups of phi coils uniformly distributed on the circumference, wherein the winding direction of the phi coils is along the radial direction of the annular Hall Bach permanent magnet array, and the phi coils are used for generating magnetic levitation force for supporting the rotating platform and rotating around a rotating shaft in a levitated state.
Further, each group of phi coils and each group of r coils has a transverse period equal to 2/3 times the period of the annular Hall Bach permanent magnet array.
Further, the space coordinate system of the r coil and the phi coil is represented by an X axis, a Y axis and a Z axis, the vertical direction passing through the rotation center is taken as the Z axis, the X axis and the Y axis are positioned on the rotation plane of the rotation platform,
compensating for the offset in the X-axis direction by synchronously adjusting the current and phase of the r-coil located in the positive X-axis direction or the r-coil located in the negative X-axis direction, causing translation of the rotating platform;
compensating for the offset in the Y-axis direction by synchronously adjusting the current and phase of the r-coil in the Y-axis positive direction or the r-coil in the Y-axis negative direction to cause translation of the rotating platform;
the current and the phase of each group of phi coils are synchronously adjusted, and the integral levitation force of the rotary platform is changed to compensate the offset in the Z-axis direction;
the current and the phase of phi coils positioned on the same side of the X axis are synchronously adjusted to cause the change of the levitation force of the rotating platform so as to compensate the inclination caused by rotation around the X axis;
the current and the phase of phi coils positioned on the same side of the Y axis are synchronously adjusted to cause the change of the levitation force of the rotating platform so as to compensate the inclination caused by rotation around the Y axis;
the rotation amount of the rotating platform around the Z axis is controlled by synchronously adjusting the current and the phase of each group of r coils to cause clockwise or anticlockwise tangential force.
The rotary measurement and control device of the rotary platform of the photoetching machine adopts the magnetic suspension plane rotary motor to rotationally drive the rotary platform bearing the workpiece platform, and in the process of rotation, the cylindrical grating interferometer is used for measuring the rotation angle and the offset in real time and feeding back to the magnetic suspension plane rotary motor for real-time position compensation and rotation control, thereby ensuring that the rotary platform can accurately exchange the workpiece platform to the corresponding station, reducing the time required by the position calibration of the workpiece platform and improving the photoetching treatment efficiency.
Drawings
FIG. 1 is a schematic diagram of a lithographic apparatus according to a preferred embodiment of the invention.
FIG. 2 is a schematic diagram of an arrangement of a horizontal dual-frequency interferometer according to a preferred embodiment of the present invention.
FIG. 3 is a schematic diagram of the operation of a cylindrical grating interferometer according to a preferred embodiment of the present invention.
FIG. 4 is a schematic diagram of a lifting structure of a cylindrical grating interferometer according to a preferred embodiment of the present invention.
Fig. 5 is a schematic diagram of the principle of measuring translation of a rotary platform in the horizontal direction and tilting in the vertical direction according to a preferred embodiment of the present invention.
FIG. 6 is a schematic diagram of a measuring principle of a rotating platform according to a preferred embodiment of the present invention, which rotates around a Z axis and moves up and down along the Z axis.
FIG. 7 is a schematic diagram of a magnetic levitation rotation mechanism of a rotating platform of a lithographic apparatus according to a preferred embodiment of the invention.
Fig. 8 is a schematic diagram of a magnetic levitation motor according to a preferred embodiment of the present invention.
Fig. 9 is a schematic diagram of a magnetic levitation planar rotating motor according to a preferred embodiment of the present invention for performing position compensation and rotation control.
FIG. 10 is a flow chart of a workpiece stage position exchange according to a preferred embodiment of the invention.
Detailed Description
The following describes the embodiments of the present invention in further detail with reference to the accompanying drawings.
In the following detailed description of the embodiments of the present invention, the structures of the present invention are not drawn to a general scale, and the structures in the drawings are partially enlarged, deformed, and simplified, so that the present invention should not be construed as being limited thereto.
In the following description of the present invention, reference is made to fig. 1, and fig. 1 is a schematic structural view of a lithographic apparatus according to a preferred embodiment of the present invention. As shown in FIG. 1, a lithographic apparatus of the present invention employs a frame design of dual work stations 11, 15, one work station 11 corresponding to a measurement station 13 in the lithographic apparatus and the other work station 15 corresponding to an exposure station 14 in the lithographic apparatus. The measuring station 13 is provided with a measuring mechanism of the lithography device, and the exposure station 14 is provided with a projection objective of the lithography device. The dual work stations (short range work stations (Short Stroke Stage)) 11, 15 may specifically include: a first workpiece stage 11, which is disposed correspondingly below the measuring station, and a second workpiece stage 15, which is disposed correspondingly below the exposure station.
The first workpiece stage 11 and the second workpiece stage 15 can simultaneously perform operations on 2 different wafers (silicon wafers) 1 and 2, and can perform relative horizontal rotation after the operations on the wafers 1 and 2 placed respectively are completed, so that the positions of the two workpiece stages are exchanged between the measuring station 13 and the exposing station 14, and standby time except exposure can be saved, and productivity can be improved.
Please refer to fig. 1. The first stage 11 and the second stage 15 are provided together on both ends of one rotary stage (long-range stage (Long stroke stage)) 17, and the rotary stage 17 is provided on a bottom plate 16 of the lithographic apparatus. The rotary stage 17 is rotatable horizontally with respect to the base plate 16 to bring the first and second work stages 11, 15 into exchange positions between the measuring station 13 and the exposure station 14.
The four corners of the first and second work tables 11 and 15 may be provided with sensors 12 for alignment or the like, for example, transmission image sensors (Transmission Image Sensor, TIS) or the like. A levitation mechanism (e.g., in the form of a conventional lorentz motor) 10 may be employed between the first and second work-piece stages 11, 15 and the rotary stage 17 to effect 3 translations and 3 tilting actions of the first and second work-piece stages 11, 15 relative to the rotary stage 17.
Referring to fig. 2, fig. 2 is a schematic layout diagram of a horizontal dual-frequency interferometer according to a preferred embodiment of the present invention. The first workpiece stage 11 and the second workpiece stage 15 can respectively perform position measurement and control through a set of horizontal dual-frequency interferometers, i.e. a set of horizontal dual-frequency interferometers are respectively arranged corresponding to the first workpiece stage 11 and the second workpiece stage 15 for performing position measurement and control.
Preferably, the horizontal dual-frequency interferometer may employ a horizontal dual-frequency interferometer having at least 6 axes to correspond to 6 degrees of freedom of the first and second work stages 11 and 15 in three dimensions with respect to the rotary stage 17: i.e. 3 translations, 3 tilts. The lines indicated by X1, X2, X3, Y1, Y2, Y3, Z1 and Z2 in the figure represent the measuring light paths of the horizontal dual-frequency interferometer along the X-axis, the Y-axis and the Z-axis, respectively. Above the rotating stage 17 there may be provided a measurement mount (not shown) for the lithographic apparatus, on which a Z-axis horizontal dual frequency interferometer mirror 20 may be fixed.
The above describes the basic structure of the lithography machine according to the embodiment of the present invention, and on the basis of the basic structure of the lithography machine, the embodiment of the present invention provides a rotation measurement and control device for a rotation platform, which is used for improving the position accuracy of the rotation platform in the rotation process, and ensuring that the workpiece platform performs accurate position exchange.
The rotation measurement and control device of the rotation platform comprises: a rotary table 17 for carrying a workpiece table, and a magnetically levitated planar rotary motor arranged between the rotary table 17 and a bottom plate 16 of the lithographic apparatus, which magnetically levitated planar rotary motor can serve as a support mechanism and a rotary drive mechanism for the rotary table 17.
Referring to fig. 1, the rotation measurement and control device further includes a cylindrical grating interferometer disposed at a rotation center of the rotary platform 17, for performing position measurement of a plurality of degrees of freedom of the rotary platform 17 during rotation. The cylindrical grating interferometer comprises a cylindrical grating scale 18, a plurality of grating scale reading heads 19 and a planar interferometer (not shown) located at the bottom of the cylindrical grating scale. A cylindrical grating interferometer may be used to measure the rotation angle of the rotary stage 17, the offset in the horizontal and vertical directions, and the tilt in the vertical direction. The measurement result of the cylindrical grating interferometer is provided for a magnetic suspension plane rotating motor, the magnetic suspension plane rotating motor carries out rotation control on the rotating platform according to the measurement result, and offset in the horizontal direction and the vertical direction and inclination in the vertical direction are compensated, so that the rotating platform drives the workpiece platform to carry out accurate position exchange. The working principle of each part of the rotation measurement and control device of the invention will be described below.
Fig. 3 is a schematic diagram illustrating the operation of a cylindrical grating interferometer according to a preferred embodiment of the present invention. FIG. 3 (a) shows the position distribution of the grating scale heads, in an embodiment of the invention, the plurality of grating scale heads is at least 5 gratingsThe scale reading heads, for example, 5 grating scale reading heads in fig. 3 (a), are labeled x1, x2, y1, y2, y3, respectively, and the plane interferometer is labeled z1. In the figure, the X axis, the Y axis and the Z axis represent a space coordinate system where the grating ruler reading heads are located, the vertical direction passing through the rotation center is taken as the Z axis, the X axis and the Y axis are located on the rotation plane of the rotation platform, and at least 5 grating ruler reading heads can be arranged in the following manner: three at least 3 grating ruler reading heads are arranged on a plane formed by the X axis and the Y axis at intervals of 90 degrees so as to meet the measurement requirement of rotation and translation of an XY plane (the plane formed by the X axis and the Y axis), and 1 grating ruler reading head is respectively arranged at a preset distance right above or right below at least two grating ruler reading heads which are separated by 90 degrees, namely at a preset coordinate in the Z axis direction so as to meet the requirement of inclination measurement in the vertical direction. As an example, referring to fig. 3 (a), the above-mentioned 5 grating scale reading heads are respectively marked with the following spatial coordinate positions: x1 has a coordinate (X) on the +X axis 0 0, 0), X2 is set as a coordinate (X) on the XZ plane (plane formed by the X axis and the Z axis) 0 0, Δz), Y1 has a coordinate (0, Y) on the +Y axis 0 0), Y2 has a coordinate on the-Y axis of (0, -Y) 0 0), Y3 is also on the YZ plane (plane formed by the Y axis and the Z axis), and the coordinates are (0, -Y) 0 Δz), Z1 is on the-Z axis, and the coordinates are (0, -Z) 0 ). It should be noted that the above-mentioned coordinate values are defined only for describing the spatial positions, and in practical application, the coordinate values may be adjusted according to the definition of the coordinate system, for example, Y1 and Y2 set on the Y axis may be set on the corresponding positions on the X axis, X1 on the X axis may be set on the corresponding positions on the Y axis, and for example, the positions of Y1 and Y2 may be exchanged, that is, Y1 is set on the-Y axis, and Y2 is set on the +y axis.
The working principle of the five grating ruler reading heads is to measure the movement speed of the rotary platform based on the Doppler frequency shift effect, and then the movement position of the rotary platform is obtained through integration of time. The movement speed and movement position referred to herein may include all degrees of freedom of the rotary stage other than vertical movement along the Z-axis direction, including translational movement along the X-axis and Y-axis directions, rotational movement about the Z-axis, X-axis, and Y-axis. The vertical motion in the Z-axis direction is measured by a planar interferometer Z1, and the principle can be realized by adopting the technical principle of a Michelson interferometer.
Further, referring to fig. 3 (b), the grating scale reading head may comprise: a laser light source, a partially transmissive mirror, a phase retarder, and a scanning detector,
a part of light beams (marked as incident light in the figure) emitted by the laser light source is reflected by a partial transmission reflector and then irradiated to the scanning detector through a phase retarder to form a reference light path r;
the other part of the light beam emitted by the laser light source irradiates the cylindrical grating ruler after being transmitted by the partial transmission reflector, irradiates the scanning detector after being diffracted by the cylindrical grating ruler, and forms a test light path t;
when the rotating platform is in a motion state, a frequency difference exists between the light beam of the test light path and the light beam of the reference light path, and interference light is generated on the scanning detector. Where the 0 th order represents reflected light without diffraction and the-1 st order represents the first diffraction order, in embodiments of the present invention, it is preferable to use the interference effect of the diffracted light of the-1 st order with the light beam on the reference light path for measurement.
The principle of position measurement of the grating scale reading head will be further described with reference to fig. 3 (c) and 3 (d). The frequency of the light beam of the reference light path is omega, the frequency of the light beam of the test light path changes delta omega due to Doppler effect, two light beams interfere, in addition, a phase delay device is arranged on the reference light path to generate pi/2 phase delay, and the light intensity detected by the scanning detector can be expressed as:
i(t)＝{E r cos(ω+△ω)t+E t cos(ωt+π/2)} 2
＝0.5E r 2 [1+cos2(ω+△ω)t]+0.5E t 2 [1+cos2(ωt+π/2)]+E r E t cos[(2ω+△ω)t+π/2]+E r E t cos[(△ω)t-π/2]
formula (1)
The light intensity can be expressed approximately as a direct proportional relationship as follows:
i(t)∝0.5E r 2 +0.5E t 2 +E r E t cos[(△ω)t-π/2]
formula (2)
Wherein i (t) is the light intensity of the interference light detected by the scanning detector, E r Amplitude of light beam as reference path, E t To test the amplitude of the light beam in the light path, the light intensities of the two paths can be adjusted to be consistent by adjusting the light transmittance ratio of the partial transmission reflector, so that E r And E is t Equal. As can be seen from the formula (2), the variation waveform of the light intensity of the interference light conforms to the waveform of the cosine curve, the waveform corresponding to cos (Deltaomega) t is the waveform shown in FIG. 3 (c), and after the phase of pi/2 is delayed by the phase retarder, cos [ (Deltaomega) t-pi/2]=sin (Δω) t, and the waveform thereof corresponds to the waveform shown in fig. 3 (d). After the phase delay processing, the direction of the frequency shift can be better judged, and the movement direction of the rotary platform can be judged.
The time information is recorded in real time, the light intensity information of the interference light is obtained by detecting the light intensity information by a scanning detector, and omega and E are calculated r Determined by the original laser source, E t Determined by the original laser source and partially transmissive mirror, these three values are also known quantities. Therefore, the phase difference corresponding to the unit time difference Δt can be calculated by the formula (1), and this phase difference can be expressed as:
△ω△t＝2π△t(1/v)
formula (3)
Wherein Δt is a unit time difference, Δω is a frequency variation of the light beam of the test light path and the light beam of the reference light path in Δt, and v is a movement speed of the rotating platform. The scanning detector measures the light intensity variation of the interference light corresponding to the Δt time difference, namely, the light intensity of the interference light at the time t1 and t2 (Δt=t2-t 1) can be measured and calculated, then the light intensity variation is calculated based on the formula (1), and then the phase difference (Δω Δt) is calculated according to the light intensity variation, and v is calculated by the formula (3). And integrating time according to the motion speed corresponding to each Deltat to obtain the motion position of the rotary platform, wherein the initial value of the motion speed is 0. The above-mentioned movement speed may be a relative movement speed of the rotary stage with respect to each degree of freedom of the cylindrical grating scale, and may include translational movement along the X-axis and the Y-axis, rotational movement about the Z-axis, the X-axis, and the Y-axis, and correspondingly, the movement position obtained by the relative movement speed also corresponds to the amounts of offset along the X-axis and the Y-axis, and rotational movement about the Z-axis, the X-axis, and the Y-axis. Which of the above degrees of freedom the speed of movement and the amount of movement detected by each grating scale reading head is depends on the set position of the grating scale reading head, as will be further described below.
Fig. 4 is a schematic diagram showing a liftable structure of a cylindrical grating interferometer according to a preferred embodiment of the present invention. The cylindrical grating interferometer according to the embodiment of the present invention may adopt a split design, the grating scale reading head 19 and the plane interferometer 22 may be disposed on the rotating platform 17, the cylindrical grating scale 18 of the cylindrical grating interferometer is disposed on a measurement support above the rotating platform 17, and a plane mirror (not shown) for measuring the plane interferometer 22 is disposed at the bottom of the cylindrical grating scale 18, and the plane mirror can reflect the laser emitted by the plane interferometer 22 back for measuring the position of the rotating platform in the vertical direction. Specifically, a plurality of grating scale reading heads 19 and plane interferometers 22 are mounted on a reading head assembly 21, and the reading head assembly 21 is fixed on a lifting mechanism, wherein the lifting mechanism is used for lifting the reading head assembly to a measuring position corresponding to the cylindrical grating scale before the rotary platform starts to rotate, and lowering the reading head assembly to be lower than the bottom surface of the cylindrical grating scale 18 after the rotary platform finishes rotating.
As shown in fig. 4, which shows a state in which the head assembly 21 is raised and lowered by the lifting mechanism of the bottom, and a relative positional relationship with the cylindrical grating scale 18, fig. 4a is a state in which the head assembly 21 is lowered, and fig. 4b is a state in which the head assembly 21 is raised. The readhead assembly 21 arranged on the rotary platform 17 and the cylindrical grating scale 18 arranged on the measuring support form a separable cylindrical grating interferometer, and in the state shown in fig. 4b, the readhead assembly 21 and the cylindrical grating scale 18 form a complete cylindrical grating interferometer in a detectable state, and in the state shown in fig. 4a, the cylindrical grating interferometer is in a separated non-detection state.
Further, the reading head assembly 21 is in a square structure as a whole, a square recess for accommodating the reading head assembly is formed in the rotation center of the rotary platform 17, a plurality of linear guide rail mechanisms in the vertical direction are arranged between the outer side wall of the reading head assembly 21 and the inner side wall of the square recess, and the lifting mechanism is arranged at the bottom of the square recess. As shown in the lowered state of fig. 4 (a), the reading head assembly 21 is lowered into the square recess in the drawing, and the reading head assembly 21 and the square recess do not rotate, as shown in the raised state of fig. 4 (b), the lower portion of the reading head assembly 21 remains in the square recess in the raised state of the reading head assembly 21, and thus, relative rotation does not occur between the reading head assembly 21 and the square recess in the raised state. When the rotary stage rotates, the reading head assembly 21 and the rotary stage rotate together in synchronization. Preferably, when the lifting mechanism is lowered to the lowest point, the highest point of the reading head assembly 21 is equal to or lower than the upper edge of the square recess, as shown in the lowered state of fig. 4 (a), and the edge of the reading head assembly is substantially flush with the upper edge of the square recess.
Through the framework of liftable separation, on one hand, the rotation angle of the rotary platform can be precisely measured in the process of rotating and exchanging the workpiece table so as to ensure the rotation precision, and on the other hand, after the workpiece table rotates and exchanges, the cylindrical grating ruler and the reading head assembly can be separated in a descending way through the way of enabling the reading head assembly to descend, so that the reading head assembly is prevented from colliding with the cylindrical grating ruler in the scanning and stepping processes of the workpiece table.
Referring to fig. 5 and 6, a measurement principle of each degree of freedom of the rotary platform is further described, fig. 5 is a schematic diagram of a measurement principle of translation of the rotary platform in a horizontal direction and tilting in a vertical direction according to a preferred embodiment of the present invention, and fig. 6 is a schematic diagram of a measurement principle of rotation of the rotary platform around a Z-axis and up-down movement along the Z-axis according to a preferred embodiment of the present invention.
Fig. 5 and 6 show the different grating scale reading heads and the set positions of the planar interferometers. As shown in fig. 5 (a), X1 and X2 measure the amount of offset of the rotation in the Y-axis direction and the amount of inclination along the X-axis. The amount of offset of the rotary stage in the X-axis direction and the amount of inclination along the Y-axis are measured as in fig. 5 (b) Y2 and Y3. As shown in fig. 6 (a), in the case where the change in the phase of the same direction and the same magnitude of the three of X1, Y1 and Y2 indicates the rotation of the rotary table about the Z axis, under this condition, the measured rotation amount of the rotary table about the Z axis can be determined, and if the three of X1, Y1 and Y2 do not satisfy the condition of the phase change of the same direction and the same magnitude, the rotation amount about the Z axis can be determined by compensating the offset amounts in the X axis and the Y axis directions and the tilt amounts along the X and Y axes. As shown in fig. 6 (b), z1 measures the offset of the rotary stage along the z-axis, i.e., the offset in the vertical direction.
In addition, as shown in fig. 6, the grating scale reading head is built in the reading head assembly, and is fixed by two cuboid clamping, the internal structure of the grating scale reading head can be regarded as a Doppler interferometer, and a window is opened on one side of the grating scale reading head facing the cylindrical grating scale so as to emit and receive light beams, and the window can be blocked by a flat plate capable of moving up and down when not in use so as to prevent pollution.
The working principle of the magnetic levitation planar rotating motor according to the embodiment of the present invention is described below. Referring to fig. 7, fig. 7 is a schematic diagram of a magnetic suspension rotating mechanism of a rotating platform of a lithography machine according to a preferred embodiment of the invention. A magnetically levitated planar rotating electrical machine 23 is provided between the rotating platform 17 and the base plate 16 of the lithographic apparatus, and further, the magnetically levitated planar rotating electrical machine 23 may be provided on a balancing mass of the base plate 16. The magnetically levitated planar rotary motor 23 is disposed at the rotation center of the rotary stage 17 for driving the rotary stage 17 to rotate in the horizontal direction to realize the positional exchange of the first and second work stages 11 and 15 between the measuring station 13 and the exposing station 14. In addition, magnetic levitation plane motors 24 can be arranged at two ends of the bottom surface of the rotary platform 17, the magnetic levitation plane motors 24 and the magnetic levitation plane rotary motors 23 work at different stages, when the rotary platform 17 rotates, the magnetic levitation plane motors 24 are powered off, the magnetic levitation plane rotary motors 23 are powered on to be in a working state, when the rotary platform 17 rotates, the rotary platform stops working, the magnetic levitation plane motors 24 are powered on to start working, macro motion (such as 10 μm) of the short-range workpiece table is regulated, and micro motion (such as 0.256 μm) of the short-range workpiece table is realized by micro motion motors (such as lorentz motors) of the short-range workpiece table.
Referring to fig. 8, fig. 8 is a schematic diagram of a magnetic levitation motor according to a preferred embodiment of the present invention. Fig. 8 (a) and 8 (c) are schematic design diagrams of a planar magnetic levitation motor (abbreviated as planar motor in the figures) comprising a hall-based permanent magnet array as a stator disposed below, and an X coil and a Y coil as a mover disposed above the hall-based permanent magnet array, wherein winding directions of the X coil and the Y coil are perpendicular to each other. The X-coil and the Y-coil may provide driving forces in the X-direction and the Y-direction, respectively. As shown in fig. 8 (a), the transverse period (Pc in the drawing) of the X coil and the Y coil is equal to 2/3 times of the period (Pm in the drawing) of the permanent magnet at the bottom of the coil, that is, three-phase four-pole arrangement, when three coils of the X coil or the Y coil in fig. 8 (a) are respectively sequentially energized with three-phase alternating currents, the generated magnetic levitation force of the whole set of coils is constant, so that stable magnetic levitation force can be provided. The above-mentioned magnetic levitation planar motors provided at both ends of the bottom surface of the rotary table 17 in fig. 7 may have the structure shown in fig. 8 (a) and 8 (c).
Fig. 8 (b) and 8 (d) are schematic designs of the magnetic levitation planar rotating electric machine of the present invention. The magnetic levitation planar rotating electric machine (abbreviated as rotating electric machine in the drawing) may include: the rotor coil is arranged at the bottom of the rotary platform, and the annular Hall Bach permanent magnet array is arranged on a bottom plate of the photoetching machine and used as a stator of the rotary motor, and the annular Hall Bach permanent magnet array is in a rotationally symmetrical form. Wherein, the mover coil includes: at least 4 groups of r coils which are uniformly distributed on the circumference, wherein the winding direction of the r coils is the tangential direction of the annular Hall Bach permanent magnet array and is used for adjusting the middle of the rotating platformA heart position; and at least 3 groups uniformly distributed on circumferenceCoil, said->The winding direction of the coil is along the radial direction of the annular hall-bah permanent magnet array for generating a magnetic levitation force supporting the rotating platform and performing rotation about a rotation shaft in a levitated state. As a preferred example, 4 groups of r coils and 16 groups of +.>Coils, wherein every 4 groups +.>The coils are arranged adjacent to 1 group of r coils, in actual operation every 4 groups +.>The coils as a whole are current and phase regulated, so that in the following description every 4 groups of adjacent coils are arranged +.>The coils are described as a group, i.e. corresponding to the 4 groups +.>Coils and 4 groups of r coils, r coils of adjacent groups and +.>The coils are 90 degrees from each other, and are uniformly distributed on the circumference. By means of->The current and the phase of the coil are controlled, and the rotating platform is driven to rotate 180 degrees around the rotating shaft in a floating state, so that the workpiece platform is realizedIs a location exchange of (a).
Referring to FIG. 8 (b), each group is identical to the principle of the X coil and Y coil in FIG. 8 (a)The coils and each group of r-coils have a transverse period (Pc) equal to 2/3 times the period (Pm) of the annular Hall Bach permanent magnet array, i.e. a three-phase quadrupole arrangement, each group +.>When three-phase alternating current is sequentially supplied to each of the coils and the r-coil, the +.>The coils and the r-coil provide stable magnetic levitation force, but since the r-coil is used to adjust the center position of the rotating platform (i.e., provide the driving force for translational movement), the r-coil is not used if the center position is unchanged. But->The coil provides a rotational force, the rotation in the rotary platform is mainly by +.>Coil is driven, thus->The coil provides both rotational force and magnetic levitation force.
As described above, the cylindrical grating interferometer can perform 6 degrees of freedom measurement and control including offsets Δx, Δy, Δz along the X-axis, Y-axis, Z-axis and rotation amounts Rx, ry, rz around X, Y, Z, where Rx, ry corresponds to the amount of tilt of the rotating stage in the vertical direction, and Rz is the rotation amount of the rotating stage, which is in the range of 0 ° to 180 ° for the case where the rotating stage carries two work stages. The above-mentioned offset amounts Δx, Δy, Δz and the rotation amounts Rx, ry are required to be corrected, and therefore, the detected offset amounts and the detected inclination amounts are separately supplied to the magnetic levitation planar rotating motor to compensate, and Rz is used for feedback control to the magnetic levitation planar rotating motor, which determines the rotation progress of the rotating platform according to Rz, and stops the rotation after the rotating platform rotates to a predetermined angle.
Specifically, referring to fig. 9, fig. 9 is a schematic diagram of a magnetic levitation planar rotating motor according to a preferred embodiment of the present invention for performing position compensation and rotation control by using r-coil and rotation controlControl of the current and phase of the coil.
As shown in FIG. 9, the r-coil and Z-axis are represented by an X-axis, a Y-axis and a Z-axisThe space coordinate system where the coil is located takes the vertical direction passing through the rotation center as a Z axis (not shown), and the X axis and the Y axis are located on the rotation plane of the rotation platform. The specific compensation and driving modes comprise:
by synchronously adjusting the r coil A positioned in the positive direction of the X axis r And B r Or r coil D located in the negative direction of X axis r And C r To cause translation of the rotating stage to compensate for the offset Δx in the X-axis direction;
by synchronously adjusting the r coil B positioned in the positive direction of the Y axis r And D r Or r coil A located in the negative direction of the Y axis r And C r To cause translation of the rotating stage to compensate for the offset in the Y-axis direction;
by adjusting groups synchronouslyThe current and the phase of the coil change the integral levitation force of the rotary platform to compensate the offset delta Y in the Z-axis direction;
by synchronous adjustment of the positions on the same side of the X axisCoil->And->Or->And->To cause a change in levitation force of the rotary stage to compensate for the amount of tilt Rx caused by rotation about the X-axis;
by synchronous adjustment of the positions on the same side of the Y axisCoil->And->Or->And->To cause a change in the levitation force of the rotating platform to compensate for the amount of tilt Ry caused by rotation about the Y axis;
by adjusting the r-coils of each group synchronouslyTo induce a tangential force, clockwise or counterclockwise, to drive the rotating platform to rotate about the Z-axis and to control the amount of rotation Rz.
Referring to FIG. 10, a flow chart of a workpiece stage position exchange according to a preferred embodiment of the invention is shown. The flow shown in the figure is a flow in which the double workpiece tables are rotated 180 degrees by the rotary platform to realize station exchange. And respectively executing the exposure and alignment of the silicon wafer on the exposure station and the measurement station, and starting the position exchange processing entering the workpiece table after the round of processing is executed.
Firstly, a magnetic levitation planar motor (abbreviated as planar motor in the figure) used for exposure and measurement procedures stops working, and a magnetic levitation planar rotating motor (abbreviated as rotating motor in the figure) is started to drive a rotating platform to rotate. In the rotating process, the cylindrical grating interferometer monitors 6 degrees of freedom DeltaX, deltaY, deltaZ and Rx, ry and Rz in real time and feeds back the degrees of freedom to the magnetic levitation plane rotating motor in real time, current and phases of each coil are adjusted to compensate DeltaX, deltaY, deltaZ and Rx and Ry in real time, when the rotation quantity Rz of the rotating platform reaches 180 degrees, the rotation is finished, the reading head assembly of the cylindrical grating interferometer descends, the cylindrical grating ruler and the reading head assembly are separated, the magnetic levitation plane rotating motor stops working, and the magnetic levitation plane motor starts working to provide levitation force support for the rotating platform. Finally, the horizontal dual-frequency interferometer used for monitoring the workpiece table in real time in the exposure process is cleared, the workpiece table is detected, and then a new round of silicon wafer exposure and silicon wafer alignment program is started.
The foregoing description is only of the preferred embodiments of the present invention, and the embodiments are not intended to limit the scope of the invention, so that all the equivalent structural changes made in the description and drawings of the present invention are included in the scope of the invention.
Claims (9)
1. The utility model provides a rotation measurement and control device of rotary platform which characterized in that includes: a rotating platform for carrying the workpiece table;
a magnetic suspension plane rotating motor arranged between the rotating platform and a bottom plate of the photoetching machine;
the cylindrical grating interferometer is arranged at the rotation center of the rotary platform and comprises a cylindrical grating ruler, a plurality of grating ruler reading heads and a plane interferometer positioned at the bottom of the cylindrical grating ruler, and the cylindrical grating interferometer is used for measuring the rotation angle of the rotary platform, the offset in the horizontal direction and the vertical direction and the inclination in the vertical direction;
the grating ruler reading head of the cylindrical grating ruler comprises: the laser device comprises a laser light source, a partial transmission reflector, a phase retarder and a scanning detector, wherein part of light beams emitted by the laser light source is reflected by the partial transmission reflector and then irradiated to the scanning detector after passing through the phase retarder to form a reference light path;
the other part of the light beam emitted by the laser light source irradiates the cylindrical grating ruler after being transmitted by the partial transmission reflector, irradiates the scanning detector after being diffracted by the cylindrical grating ruler, and forms a test light path;
when the rotating platform is in a motion state, a frequency difference exists between the light beam of the test light path and the light beam of the reference light path, and interference light is generated on the scanning detector;
and the magnetic suspension plane rotating motor is used for controlling the rotation of the rotating platform according to the measurement result of the cylindrical grating interferometer and compensating the offset in the horizontal direction and the vertical direction and the inclination in the vertical direction.
2. The rotary measurement and control device of the rotary platform according to claim 1, wherein a grating ruler reading head of the cylindrical grating interferometer and the planar interferometer are arranged on the rotary platform, a cylindrical grating ruler of the cylindrical grating interferometer is arranged on a measurement support above the rotary platform, and a planar reflector is arranged at the bottom of the cylindrical grating ruler.
3. The rotational measurement and control apparatus of claim 2, wherein the plurality of grating scale readheads and planar interferometers are mounted on a readhead assembly that is secured to a lifting mechanism for lifting the readhead assembly to a measurement position corresponding to the cylindrical grating scale before rotation of the rotational platform is initiated and for lowering the readhead assembly below the bottom surface of the cylindrical grating scale after rotation of the rotational platform is completed.
4. A rotation measurement and control device for a rotary platform according to any one of claims 1 to 3, wherein the plurality of grating scale reading heads are at least 5 grating scale reading heads, and the space coordinate system where the grating scale reading heads are located is represented by an X axis, a Y axis and a Z axis, wherein the vertical direction passing through the rotation center is taken as the Z axis, the X axis and the Y axis are located on a rotation plane of the rotary platform, three at least 3 grating scale reading heads are arranged at 90 degrees apart on a plane formed by the X axis and the Y axis, and at a predetermined distance directly above or directly below at least two of the grating scale reading heads at 90 degrees, 1 grating scale reading head is respectively arranged.
5. The rotation measurement and control device of a rotary platform according to claim 1, wherein the phase retarder generates a phase retardation of pi/2, and the cylindrical grating interferometer calculates the amount of motion of the rotary platform by:
the phase difference between the light beam of the test light path and the light beam of the reference light path is expressed as:
△ω△t＝2π△t(1/v)
wherein Deltat is a unit time difference, deltaω is a frequency variation of the light beam of the test light path and the light beam of the reference light path in the unit time difference Deltat, v is a movement speed of the rotating platform,
the scanning detector measures the light intensity change of interference light corresponding to the unit time difference delta t, calculates the phase difference according to the light intensity change, calculates v according to the formula, integrates time according to the movement speed corresponding to each delta t to obtain the movement position of the rotary platform, and the initial value of the movement speed is 0.
6. A rotation measurement and control device of a rotary platform according to any one of claims 1 to 3, wherein the magnetic levitation planar rotary motor comprises: the rotor coil is arranged at the bottom of the rotary platform, and the annular Hall Bach permanent magnet array is arranged on a bottom plate of the photoetching machine and used as a stator.
7. The rotation measurement and control device of the rotation platform according to claim 6, wherein the mover coil includes:
at least 4 groups of r coils which are uniformly distributed on the circumference, wherein the winding direction of the r coils is the tangential direction of the annular Hall Bach permanent magnet array and is used for adjusting the central position of the rotating platform;
at least 3 groups of phi coils uniformly distributed on the circumference, wherein the winding direction of the phi coils is along the radial direction of the annular Hall Bach permanent magnet array, and the phi coils are used for generating magnetic levitation force for supporting the rotating platform and rotating around a rotating shaft in a levitated state.
8. The rotational measurement and control device of the rotational platform of claim 7, wherein each set of phi coils and each set of r coils has a transverse period equal to 2/3 times the period of the annular hall-ch permanent magnet array.
9. The rotation measurement and control device of the rotary platform according to claim 8, wherein,
the space coordinate system where the r coil and the phi coil are positioned is represented by an X axis, a Y axis and a Z axis, the vertical direction passing through the rotation center is taken as the Z axis, the X axis and the Y axis are positioned on the rotation plane of the rotation platform,
compensating for the offset in the X-axis direction by synchronously adjusting the current and phase of the r-coil located in the positive X-axis direction or the r-coil located in the negative X-axis direction, causing translation of the rotating platform;
compensating for the offset in the Y-axis direction by synchronously adjusting the current and phase of the r-coil in the Y-axis positive direction or the r-coil in the Y-axis negative direction to cause translation of the rotating platform;
the current and the phase of each group of phi coils are synchronously adjusted, and the integral levitation force of the rotary platform is changed to compensate the offset in the Z-axis direction;
the current and the phase of phi coils positioned on the same side of the X axis are synchronously adjusted to cause the change of the levitation force of the rotating platform so as to compensate the inclination caused by rotation around the X axis;
the current and the phase of phi coils positioned on the same side of the Y axis are synchronously adjusted to cause the change of the levitation force of the rotating platform so as to compensate the inclination caused by rotation around the Y axis;
the rotation amount of the rotating platform around the Z axis is controlled by synchronously adjusting the current and the phase of each group of r coils to cause clockwise or anticlockwise tangential force.
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