CN112782795A - Method for preparing submicron grating with half period - Google Patents
Method for preparing submicron grating with half period Download PDFInfo
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- CN112782795A CN112782795A CN202110122787.9A CN202110122787A CN112782795A CN 112782795 A CN112782795 A CN 112782795A CN 202110122787 A CN202110122787 A CN 202110122787A CN 112782795 A CN112782795 A CN 112782795A
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Abstract
The invention discloses a method for preparing a submicron grating with a half period, which relates to the fields of optics, micro-machining, advanced manufacturing and the like, solves the problem that the existing grating copying technology can only copy a 1:1 grating, and prepares a submicron sub-grating with a half period by utilizing a submicron master grating. The method comprises the following steps: firstly, preparing a PDMS soft template of a submicron master grating, and preparing a material film to be used on a clean substrate; then, tightly attaching the PDMS soft template of the submicron master grating with the prepared material film, and then placing the whole PDMS soft template and the prepared material film on a heating plate for heating for 5 minutes, wherein the heating temperature is higher than the glass transition temperature of the used film material; and finally, taking the substrate and the PDMS soft template off the heating plate, cooling to room temperature, and separating the substrate and the PDMS soft template to prepare the submicron sub-grating with the period being halved on the substrate. The invention is suitable for the preparation field of submicron gratings.
Description
Technical Field
The invention relates to the fields of optics, micro-machining, advanced manufacturing and the like, in particular to a method for preparing a submicron grating with a half period.
Background
A grating is an optical element that can spatially modulate the amplitude or phase of an incident optical wave, also known as a diffraction grating. The grating, as a light splitting device, has been widely used in various aspects such as integrated optical circuits, optical communications, optical computing, optical information processing, lasers, and the like, through hundreds of years of development.
The existing grating manufacturing technology mainly comprises a mechanical scribing technology, a laser interference technology and a grating copying technology. The mechanical scribing technology is characterized in that a series of parallel scratches are destructively scribed on a substrate, belongs to an amplitude grating, and has high diffraction efficiency, low production efficiency, high equipment requirement and high cost; the laser interference technology is a method for obtaining a grating in sinusoidal distribution by using two beams of laser to interfere at a certain angle, using a holographic negative film to sense light and washing, and the obtained grating has wide spectral range and higher resolution, but the processing technology has extremely high requirements and higher cost; the grating duplicating technology is a method for making the grating duplicate with the same structure by using the master grating, which is used to replace the expensive original grating, and the commonly used grating duplicating technology includes nano-imprinting technology and soft lithography technology. Compared with the former two grating preparation technologies, the grating replication technology remarkably reduces the manufacturing cost of the grating, and solves the problems of batch manufacturing and large-scale application of the grating.
However, the existing grating replication technology can only realize complete replication of the 1:1 mother grating structure, and can not prepare the sub-grating structure with smaller period size. No report related to the preparation of the sub-grating with half period by using the mother grating is seen at home or abroad.
Disclosure of Invention
The method can solve the problems of high cost and high technical requirement of the traditional grating preparation method, and more importantly, breaks through the rule that the traditional grating copying technology can only carry out 1:1 copying, and prepares the sub-grating with the period size reduced by half. The invention provides a method for preparing a submicron grating with half period.
The technical scheme of the invention is as follows:
a method of making a submicron grating having a halved period, comprising the steps of:
s1: the preparation method of the PDMS soft template of the submicron master grating comprises the following steps:
s11: mixing and uniformly stirring a PDMS (polydimethylsiloxane) body material and a curing agent in a beaker according to the volume ratio of 10:1, and standing the mixed solution in air for 1 hour to sufficiently remove bubbles;
s12: pouring the mixed liquid without bubbles in the S11 onto the submicron mother grating to be copied, enabling the mixed liquid to completely cover the submicron mother grating, standing for 1 hour, and then placing the whole on a hot plate at 60 ℃ for heating for 1 hour to solidify the mixed liquid; naturally cooling to room temperature, and then removing the cured PDMS material from the submicron master grating, thereby obtaining the PDMS soft template of the submicron master grating;
s2: preparing a film material on a substrate, comprising the following steps: cleaning the substrate, rotationally coating a liquid film material on the substrate, standing for 10 minutes, and heating the whole substrate on a heating plate to cure the film material, wherein the thickness of the film material is controlled to be 50nm to 100 nm;
s3: the preparation of the submicron sub-grating with half period comprises the following steps:
s31: cleaning one surface of the PDMS soft template of the submicron master grating prepared in the step S1, which is provided with the submicron structure, for 1 minute by using an ultraviolet ozone cleaning machine, and then adhering the surface of the PDMS soft template to the surface of the thin film material on the substrate in the step S2, so that the PDMS soft template and the substrate are tightly adhered together;
s32: the two are integrally placed on a heating plate for heating, and the heating temperature is higher than the glass transition temperature of the used film material, so that the film material can migrate and flow in a molten state; and heating for 5 minutes, taking the two whole bodies off a hot plate, cooling to room temperature, and separating the PDMS soft template of the submicron master grating from the substrate to prepare the submicron sub grating with the half period on the substrate.
The sub-micron master grating used in step S1 is a sinusoidal grating or a rectangular grating; the period of the submicron master grating is 200nm to 1 μm, and the depth of the submicron structure on the grating is not less than the thickness of the thin film material in S2.
The substrate in the step S2 is a quartz plate, a glass plate, or a silicon plate.
The thin film material in step S2 is a photoresist material, a PS material, a PMMA material, or a PC material.
The invention has the following beneficial effects: the technical scheme of the invention can be implemented by only obtaining one master grating without expensive equipment support. The submicron grating PDMS soft template has simple manufacturing process and low material cost, can be repeatedly used, and the used film material is also easily obtained, so the whole manufacturing cost is extremely low, and the operation is simple and feasible. As is known to all, the price of the grating depends on the number of lines in each millimeter to a great extent, and the invention can realize that the number of lines in each millimeter of the sub-grating is doubled relative to that of the mother grating, thereby having larger application prospect and extremely high economic value.
Drawings
FIG. 1 is a flow chart of a process for preparing a submicron grating with half period.
In the figure: 1. the device comprises a PDMS soft template of a submicron master grating, 2, a thin film material, 3 and a substrate.
Detailed Description
The specific implementation mode is as follows: a method for preparing a submicron grating with half period is completed by the following steps:
s1: the preparation method of the PDMS soft template of the submicron master grating comprises the following steps:
s11: mixing and uniformly stirring a PDMS (polydimethylsiloxane) body material and a curing agent in a beaker according to the volume ratio of 10:1, and standing the mixed solution in air for 1 hour to sufficiently remove bubbles;
s12: pouring the mixed liquid without bubbles in the S11 onto the submicron mother grating to be copied, enabling the mixed liquid to completely cover the submicron mother grating, standing for 1 hour, and then placing the whole on a hot plate at 60 ℃ for heating for 1 hour to solidify the mixed liquid; naturally cooling to room temperature, and then removing the cured PDMS material from the submicron master grating, thereby obtaining the PDMS soft template of the submicron master grating;
s2: preparing a film material on a substrate, comprising the following steps: cleaning the substrate, rotationally coating a liquid film material on the substrate, standing for 10 minutes, and heating the whole substrate on a heating plate to cure the film material, wherein the thickness of the film material is controlled to be 50nm to 100 nm;
s3: the preparation of the submicron sub-grating with half period comprises the following steps:
s31: cleaning one surface of the PDMS soft template of the submicron master grating prepared in the step S1, which is provided with the submicron structure, for 1 minute by using an ultraviolet ozone cleaning machine, and then adhering the surface of the PDMS soft template to the surface of the thin film material on the substrate in the step S2, so that the PDMS soft template and the substrate are tightly adhered together;
s32: the two are integrally placed on a heating plate for heating, and the heating temperature is higher than the glass transition temperature of the used film material, so that the film material can migrate and flow in a molten state; and heating for 5 minutes, taking the two whole bodies off a hot plate, cooling to room temperature, and separating the PDMS soft template of the submicron master grating from the substrate to prepare the submicron sub grating with the half period on the substrate. In this embodiment, the sub-micron master grating in step S1 is a sinusoidal grating or a rectangular grating; the period of the submicron master grating is 200nm to 1 μm, and the depth of the submicron structure on the grating is not less than the thickness of the thin film material described in S2.
In this embodiment, the curing temperature and time of the PDMS soft template of the sub-micron master grating described in step S11 may be adjusted according to actual conditions.
The substrate in step S2 in this embodiment is a quartz plate, a glass plate, or a silicon plate.
The thin film material in step S2 in this embodiment is a photoresist material, a PS material, a PMMA material, or a PC material, and can adopt, but not limited to, the above materials.
The uv ozone cleaning time in step S31 in this embodiment can be adjusted according to actual conditions.
In step S32 in the present embodiment, both are placed on a hot plate and heated for 5 minutes, and the heating temperature and time can be adjusted according to the actual situation.
The foregoing is only an embodiment of the present invention, and it should be noted that, for those skilled in the art, modifications such as changing the coating and curing manner of the film material, changing the thickness of the film material, changing the shape and size of the grating master structure, changing the substrate material, etc. may be made without departing from the spirit of the present invention, and these modifications should be considered to be within the scope of the present invention.
Claims (4)
1. A method of making a submicron grating having a halved period, comprising the steps of:
s1: the preparation method of the PDMS soft template of the submicron master grating comprises the following steps:
s11: mixing and uniformly stirring a PDMS (polydimethylsiloxane) body material and a curing agent in a beaker according to the volume ratio of 10:1, and standing the mixed solution in air for 1 hour to sufficiently remove bubbles;
s12: pouring the mixed liquid without bubbles in the S11 onto the submicron mother grating to be copied, enabling the mixed liquid to completely cover the submicron mother grating, standing for 1 hour, and then placing the whole on a hot plate at 60 ℃ for heating for 1 hour to solidify the mixed liquid; naturally cooling to room temperature, and then removing the cured PDMS material from the submicron master grating, thereby obtaining the PDMS soft template of the submicron master grating;
s2: preparing a film material on a substrate, comprising the following steps: cleaning the substrate, rotationally coating a liquid film material on the substrate, standing for 10 minutes, and heating the whole substrate on a heating plate to cure the film material, wherein the thickness of the film material is controlled to be 50nm to 100 nm;
s3: the preparation of the submicron sub-grating with half period comprises the following steps:
s31: cleaning one surface of the PDMS soft template of the submicron master grating prepared in the step S1, which is provided with the submicron structure, for 1 minute by using an ultraviolet ozone cleaning machine, and then adhering the surface of the PDMS soft template to the surface of the thin film material on the substrate in the step S2, so that the PDMS soft template and the substrate are tightly adhered together;
s32: the two are integrally placed on a heating plate for heating, and the heating temperature is higher than the glass transition temperature of the used film material, so that the film material can migrate and flow in a molten state; and heating for 5 minutes, taking the two whole bodies off a hot plate, cooling to room temperature, and separating the PDMS soft template of the submicron master grating from the substrate to prepare the submicron sub grating with the half period on the substrate.
2. The method of claim 1, wherein the submicron master grating used in step S1 is a sinusoidal grating or a rectangular grating; the period of the submicron master grating is 200nm to 1 μm, and the depth of the submicron structure on the grating is not less than the thickness of the thin film material in S2.
3. The method of claim 1, wherein the substrate in step S2 is a quartz plate, a glass plate, or a silicon plate.
4. The method of claim 1, wherein the thin film material of step S2 is a photoresist material, a PS material, a PMMA material, or a PC material.
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