CN112708856A - Ion plating process for vacuum vessel - Google Patents
Ion plating process for vacuum vessel Download PDFInfo
- Publication number
- CN112708856A CN112708856A CN202011420077.6A CN202011420077A CN112708856A CN 112708856 A CN112708856 A CN 112708856A CN 202011420077 A CN202011420077 A CN 202011420077A CN 112708856 A CN112708856 A CN 112708856A
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- Prior art keywords
- vacuum vessel
- ion plating
- plating process
- shell
- positioning
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- 238000007733 ion plating Methods 0.000 title claims abstract description 55
- 238000000034 method Methods 0.000 title claims abstract description 49
- 229910021645 metal ion Inorganic materials 0.000 claims abstract description 21
- 238000007747 plating Methods 0.000 claims abstract description 9
- 239000000463 material Substances 0.000 claims abstract description 4
- 238000005485 electric heating Methods 0.000 claims description 15
- 238000005192 partition Methods 0.000 claims description 4
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 239000011324 bead Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 238000000151 deposition Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention provides an ion plating process for a vacuum vessel, and belongs to the technical field of ion plating. It has solved prior art and has had the poor problem of stability. The ion plating process for the vacuum vessel comprises the following steps: A. preparing: the vacuum plating device comprises a shell with a cavity inside, a connecting frame used for placing a vacuum vessel workpiece is arranged in the shell, a door plate capable of being opened and closed is arranged on the shell, and the interior of the shell is cleaned after the door plate is opened; B. placing a workpiece: placing a vacuum vessel workpiece to be processed on a workpiece rack, and then closing the door plate; C. ion plating operation: the shell is connected with a metal ion input device, and after the metal ion input device works, metal ions generated in the shell are attached to the outer side of a vacuum vessel workpiece; D. shutting down and taking materials: and after the vacuum plating device stops working, opening the door plate to take out the workpieces on the workpiece rack in order. The vacuum vessel has high stability of the ion plating process.
Description
Technical Field
The invention belongs to the technical field of ion plating, and relates to an ion plating process for a vacuum vessel.
Background
The ion plating process is a method of partially ionizing a gas or an evaporated substance by a gas discharge under vacuum and depositing the evaporated substance or a reactant thereof on a substrate under bombardment of ions of the gas or the evaporated substance.
In order to realize industrial batch operation, a plurality of workpieces are usually placed in a processing device in order in the existing ion plating process, and the workpieces are fixed in the processing process, so that the ion plating processing effect is poor and the stability is poor.
Disclosure of Invention
The invention aims to provide a vacuum vessel ion plating process with high stability and high operation efficiency aiming at the problems in the prior art.
The purpose of the invention can be realized by the following technical scheme:
a vacuum vessel ion plating process is characterized by comprising the following steps:
A. preparing: the vacuum plating device comprises a shell with a cavity inside, a connecting frame used for placing a vacuum vessel workpiece is arranged in the shell, a door plate capable of being opened and closed is arranged on the shell, and the interior of the shell is cleaned after the door plate is opened;
B. placing a workpiece: placing a vacuum vessel workpiece to be processed on a workpiece rack, and then closing the door plate;
C. ion plating operation: the shell is connected with a metal ion input device, and after the metal ion input device works, metal ions generated in the shell are attached to the outer side of a vacuum vessel workpiece;
D. shutting down and taking materials: and after the vacuum plating device stops working, opening the door plate to take out the workpieces on the workpiece rack in order.
In the vacuum vessel ion plating process, an upper rotary table is axially and fixedly connected to the upper part in the shell, a lower rotary table is axially and fixedly connected to the lower part in the shell, a first positioning table is axially and fixedly connected to the lower part of the upper rotary table, a second positioning table is axially and fixedly connected to the upper part of the lower rotary table, the first positioning table is just opposite to the second positioning table, a first connecting part is arranged at the lower part of the first positioning table, a second connecting part is arranged at the upper part of the second positioning table, the connecting frame is in a long rod shape, the upper end of the first connecting frame is detachably connected to the first connecting part, the lower end of the connecting frame is detachably connected to the second connecting part, the vacuum vessel ion plating process further comprises a first connecting shaft, two ends of the first connecting shaft are respectively and fixedly connected to the middle parts of the upper rotary table and the lower rotary table, a first driving part for driving the upper rotary table to, the driving piece II is connected with the upper rotary disc and can drive the upper rotary disc to continuously rotate.
According to the vacuum vessel ion plating process, the connecting frame is detachably connected between the first positioning disk and the second positioning disk, and the connecting frame can continuously rotate along with the first positioning disk under the action of the second driving piece. The upper rotary table and the lower rotary table continuously rotate under the action of the first driving piece.
It can be seen that the vacuum vessel located on the connection frame can continuously rotate in the ion plating process to ensure the stability of the ion plating, and the metal film can be stably plated on the outer side of the vacuum vessel, and the specific metal material can be selected according to the actual situation, for example: titanium or chromium.
In the operation process, the vacuum vessel is stably connected to the connecting frame, then the connecting frame is arranged in the shell, and the door plate is closed after the connecting frame is arranged in the shell.
The metal ion input device is the existing common equipment, and can stably input metal ions into the shell under the action of the metal ion input device. Since the link frame is continuously rotated during the ion plating process, a metal film is uniformly formed on the outer side of the vacuum vessel.
Of course, after the door panel is closed, the shell is in a vacuum state.
In the ion plating process of the vacuum vessel, the first connecting shafts are distributed in a plurality of numbers, and the centers of more than one rotating discs of the plurality of connecting shafts are circumferentially and uniformly distributed on the basis.
In the ion plating process of the vacuum vessel, the vacuum vessel further comprises an electric heating pipe, wherein the electric heating pipe is fixedly connected to the lower turntable and is positioned on the inner side of the connecting shafts.
The electric heating pipe is located at the center, and the connecting shafts which are uniformly distributed in the circumferential direction can avoid the electric heating pipe. The electric heating tube at the center can ensure that the temperature of all parts in the shell is consistent as much as possible.
In the ion plating process of the vacuum vessel, the first connecting part, the second connecting part corresponding to the first connecting part and the connecting frame form a positioning unit for positioning the vacuum vessel, the number of the positioning units is a plurality, and the plurality of the positioning units are uniformly distributed at the edge of the positioning disc in the circumferential direction.
A plurality of vacuum household utensils can be handled simultaneously in the setting of a plurality of positioning unit, of course, because each vacuum household utensils all contactless in the processing procedure, its ion plating stability of effectual improvement.
In the above-mentioned vacuum vessel ion plating process, the connection frame includes a frame body in a long frame shape, a plurality of parting beads are arranged in the frame body along the length direction, and the upper parts of the parting beads are provided with positioning parts matched with the inner side of the vacuum vessel.
Each division bar is provided with a positioning part, and the positioning parts are matched with the inner cavity of the vacuum vessel, so that the vacuum vessel can be reversely buckled behind the positioning parts to ensure that a plurality of vacuum vessels are orderly and stably connected on the same connecting frame.
In the vacuum vessel ion plating process, the first connecting part is a sheet-shaped first body and is provided with an L-shaped first clamping groove, the first clamping groove comprises a horizontally arranged first groove section and a vertically arranged second groove section, the left end of the first groove section is positioned on the left side of the first body, the second groove section is vertically arranged at the lower end of the first groove section, and the upper end of the second groove section is communicated with the right end of the first groove section.
In the vacuum vessel ion plating process, the connecting part II is a sheet-shaped body II and is provided with an L-shaped clamping groove II, the clamping groove II comprises a horizontally arranged groove section III and a vertically arranged groove section IV, the left end of the groove section III is positioned on the left side of the body II, the groove section IV is vertically arranged at the lower end of the groove section III, and the upper end of the groove section IV is communicated with the right end of the groove section III.
The upper end and the lower end of the body are respectively provided with a hook, the hook at the upper end of the body is embedded into the groove section I and is clamped at the groove section II, and the hook at the lower end of the body is embedded into the groove section III and is clamped at the groove section IV. The structure enables the connecting frame to be stably connected between the first positioning plate and the second positioning plate.
In the above-mentioned vacuum vessel ion plating process, the temperature of the electric heating tube after being electrified is 200-240 ℃.
In the vacuum vessel ion plating process, the first positioning plate and the second positioning plate rotate synchronously at a rotating speed of 3-5 seconds per circle.
In the vacuum vessel ion plating process, the upper turntable and the lower turntable rotate synchronously at a speed of 3-5 seconds per turn.
In the ion plating process of the vacuum vessel, the ion plating treatment time of the vacuum vessel is 40-50 minutes.
Compared with the prior art, the vacuum vessel ion plating process can keep a higher set temperature in the shell in the processing process, and the vacuum vessel continuously rotates at a constant speed in the ion plating process, so that metal ions input into the shell by the metal ion input device can be stably attached to the outer side of the metal vessel, and the ion plating stability is higher.
Meanwhile, a plurality of positioning units are arranged between the first positioning plate and the second positioning plate, and a plurality of vacuum vessels can be orderly and stably connected to the connecting frame of each positioning unit, so that the operation efficiency is high, and the practical value is high.
Drawings
FIG. 1 shows a vacuum plating apparatus used in the ion plating process of a vacuum vessel.
In the figure, 1, a housing; 2. a connecting frame; 2a, a frame body; 2b, parting beads; 2c, a positioning part; 3. a door panel; 4. a metal ion input device; 5. an upper turntable; 6. a lower turntable; 7. positioning a first plate; 8. a second positioning plate; 9. a first connecting shaft; 10. a second connecting shaft; 11. an electric heating tube; 12. a first body; 12a, a first groove section; 12b, a second groove section; 13. a second body; 13a and a third groove section; 13b and a groove section four.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention, and it is apparent that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be obtained by a person skilled in the art without any inventive step based on the embodiments of the present invention, are within the scope of the present invention.
It will be understood that when an element is referred to as being "mounted on" another element, it can be directly mounted on the other element or intervening elements may also be present. When a component is referred to as being "disposed on" another component, it can be directly on the other component or intervening components may also be present. When an element is referred to as being "secured to" another element, it can be directly secured to the other element or intervening elements may also be present.
Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The terminology used herein in the description of the invention is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. As used herein, the term "or/and" includes any and all combinations of one or more of the associated listed items.
The ion plating process for the vacuum vessel comprises the following steps:
A. preparing: the vacuum plating device comprises a shell 1 with a cavity inside, a connecting frame 2 used for placing a vacuum vessel workpiece is arranged in the shell 1, a door panel 3 capable of being opened and closed is arranged on the shell 1, and the interior of the shell 1 is cleaned after the door panel 3 is opened;
B. placing a workpiece: placing a vacuum vessel workpiece to be processed on the workpiece rack 2, and then closing the door panel 3;
C. ion plating operation: the shell 1 is connected with a metal ion input device 4, and after the metal ion input device 4 works, metal ions generated in the shell 1 are attached to the outer side of a vacuum vessel workpiece;
D. shutting down and taking materials: after the vacuum plating device stops working, the door plate 3 is opened to take out the workpieces on the workpiece rack 2 in order.
As shown in figure 1, an upper rotary table 5 is axially and fixedly connected to the upper part in a shell 1, a lower rotary table 6 is axially and fixedly connected to the lower part in the shell 1, a first positioning table 7 is axially and fixedly connected to the lower part of the upper rotary table 5, a second positioning table 8 is axially and fixedly connected to the upper part of the lower rotary table 6, the first positioning table 7 is opposite to the second positioning table 8, a first connecting part is arranged at the lower part of the first positioning table 7, a second connecting part is arranged at the upper part of the second positioning table 8, the connecting frame 2 is in a long rod shape, the upper end of the first connecting frame 2 is detachably connected to the first connecting part, the lower end of the second connecting frame 2 is detachably connected to the second connecting part, a first connecting shaft 9 is further included, two ends of the first connecting shaft 9 are respectively and fixedly connected to the middle parts of the upper rotary table 5 and the lower rotary table 5, a first driving part for driving the upper rotary table 5 to, the upper rotary table 5 is connected with a second driving piece, and the second driving piece is connected with the upper rotary table 5 and can drive the upper rotary table 5 to continuously rotate.
The number of the first connecting shafts 9 is a plurality, and the centers of the rotating discs 5 above the first connecting shafts 9 are circumferentially and uniformly distributed on the basis.
The electric heating device is characterized by further comprising an electric heating pipe 11, wherein the electric heating pipe 11 is fixedly connected to the lower rotating disc 6, and the electric heating pipe 11 is located on the inner side of the first connecting shafts 9.
The first connecting part, the second connecting part corresponding to the first connecting part and the connecting frame 2 form a positioning unit for positioning the vacuum vessel, the number of the positioning units is a plurality, and the plurality of positioning units are circumferentially and uniformly distributed at the edge of the first positioning disk 7.
The connecting frame 2 comprises a long frame body 2a, a plurality of partition bars 2b are arranged inside the frame body 2a along the length direction of the frame body, and the upper parts of the partition bars 2b are provided with positioning parts 2c matched with the inner sides of the vacuum vessels.
The first connecting part is a sheet-shaped body I12 and is provided with an L-shaped first clamping groove I, the first clamping groove I comprises a horizontally arranged groove section I12 a and a vertically arranged groove section II 12b, the left end of the groove section I12 a is positioned on the left side of the body I12, and the groove section II 12b is vertically arranged at the lower end of the groove section I12 a, and the upper end of the groove section II 12b is communicated with the right end of the groove section I12 a.
The connecting part II is a sheet-shaped body II 13 and is provided with an L-shaped clamping groove II, the clamping groove II comprises a horizontally arranged groove section III 13a and a vertically arranged groove section IV 13b, the left end of the groove section III 13a is positioned on the left side of the body II 13, and the groove section IV 13b is vertically arranged at the lower end of the groove section III 13a, and the upper end of the groove section IV 13b is communicated with the right end of the groove section III 13 a.
The temperature of the electric heating tube 11 is 200-240 ℃ after being electrified.
The first positioning disk 7 and the second positioning disk 8 rotate synchronously, and the rotating speed is 3-5 seconds per circle.
The upper rotary table 5 and the lower rotary table 6 rotate synchronously at the rotating speed of 3-5 seconds/circle.
The ion plating treatment time of the vacuum vessel is 40-50 minutes.
According to the vacuum vessel ion plating process, the connecting frame is detachably connected between the first positioning disk and the second positioning disk, and the connecting frame can continuously rotate along with the first positioning disk under the action of the second driving piece. The upper rotary table and the lower rotary table continuously rotate under the action of the first driving piece.
It can be seen that the vacuum vessel located on the connection frame can continuously rotate in the ion plating process to ensure the stability of the ion plating, and the metal film can be stably plated on the outer side of the vacuum vessel, and the specific metal material can be selected according to the actual situation, for example: titanium or chromium.
In the operation process, the vacuum vessel is stably connected to the connecting frame, then the connecting frame is arranged in the shell, and the door plate is closed after the connecting frame is arranged in the shell.
The metal ion input device is the existing common equipment, and can stably input metal ions into the shell under the action of the metal ion input device. Since the link frame is continuously rotated during the ion plating process, a metal film is uniformly formed on the outer side of the vacuum vessel.
Of course, after the door panel is closed, the shell is in a vacuum state.
The features of the above-described embodiments may be arbitrarily combined, and for the sake of brevity, all possible combinations of the features in the above-described embodiments are not described, but should be construed as being within the scope of the present disclosure as long as there is no contradiction between the combinations of the features.
It should be understood by those skilled in the art that the above embodiments are only for illustrating the present invention and are not to be used as a limitation of the present invention, and that suitable changes and modifications of the above embodiments are within the scope of the claimed invention as long as they are within the spirit and scope of the present invention.
Claims (10)
1. A vacuum vessel ion plating process is characterized by comprising the following steps:
A. preparing: the vacuum plating device comprises a shell with a cavity inside, a connecting frame used for placing a vacuum vessel workpiece is arranged in the shell, a door plate capable of being opened and closed is arranged on the shell, and the interior of the shell is cleaned after the door plate is opened;
B. placing a workpiece: placing a vacuum vessel workpiece to be processed on a workpiece rack, and then closing the door plate;
C. ion plating operation: the shell is connected with a metal ion input device, and after the metal ion input device works, metal ions generated in the shell are attached to the outer side of a vacuum vessel workpiece;
D. shutting down and taking materials: and after the vacuum plating device stops working, opening the door plate to take out the workpieces on the workpiece rack in order.
2. The vacuum vessel ion plating process according to claim 1, wherein an upper rotary plate is axially fixed to an upper portion in the housing, a lower rotary plate is axially fixed to a lower portion in the housing, a first positioning plate is axially fixed to a lower portion of the upper rotary plate, a second positioning plate is axially fixed to an upper portion of the lower rotary plate, the first positioning plate faces the second positioning plate, a first connecting portion is arranged on a lower portion of the first positioning plate, a second connecting portion is arranged on an upper portion of the second positioning plate, the connecting frame is in a long rod shape, an upper end of the first connecting frame is detachably connected to the first connecting portion, a lower end of the connecting frame is detachably connected to the second connecting portion, the process further comprises a first connecting shaft, two ends of the first connecting shaft are respectively fixedly connected to middle portions of the upper rotary plate and the lower rotary plate, a first driving member for driving the upper rotary plate to continuously rotate is arranged on the housing, and a second connecting, the upper rotary table is connected with a driving part II, and the driving part II is connected with the upper rotary table and can drive the upper rotary table to continuously rotate.
3. The vacuum vessel ion plating process of claim 2, wherein the number of the first connecting shafts is a plurality, and the centers of more than one rotating discs of the plurality of connecting shafts are circumferentially and uniformly distributed on the basis of the centers.
4. The vacuum vessel ion plating process of claim 3, further comprising an electric heating tube, wherein the electric heating tube is fixedly connected to the lower turntable and is located at an inner side of the connecting shafts.
5. The vacuum vessel ion plating process of claim 4, wherein the first connecting part, the second connecting part corresponding to the first connecting part and the connecting frame form a plurality of positioning units for positioning the vacuum vessel, and the plurality of positioning units are circumferentially and uniformly distributed at one edge of the positioning disc.
6. The vacuum vessel ion plating process as claimed in claim 5, wherein the connection frame comprises a long frame body, a plurality of partition bars are arranged in the frame body along the length direction of the frame body, and the upper parts of the partition bars are provided with positioning parts matched with the inner side of the vacuum vessel.
7. The vacuum vessel ion plating process as claimed in claim 6, wherein the connecting portion one is a sheet-shaped body one and has thereon a slot one in an L shape, the slot one includes a horizontally disposed slot section one and a vertically disposed slot section two, the left end of the slot section one is located at the left side of the body one, the slot section two is vertically disposed at the lower end of the slot section one and the upper end of the slot section two is communicated with the right end of the slot section one.
8. The vacuum vessel ion plating process as claimed in claim 7, wherein the connecting portion two is a sheet-shaped body two and has thereon a slot two in an L shape, the slot two includes a horizontally disposed slot section three and a vertically disposed slot section four, the left end of the slot section three is located at the left side of the body two, the slot section four is vertically disposed at the lower end of the slot section three, and the upper end of the slot section four is communicated with the right end of the slot section three.
9. The vacuum vessel ion plating process as claimed in claim 8, wherein the temperature of the electric heating tube after being electrified is 200-240 ℃.
10. The vacuum vessel ion plating process of claim 9, wherein the first positioning plate and the second positioning plate rotate synchronously at a speed of 3-5 seconds per turn.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011420077.6A CN112708856A (en) | 2020-11-30 | 2020-11-30 | Ion plating process for vacuum vessel |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011420077.6A CN112708856A (en) | 2020-11-30 | 2020-11-30 | Ion plating process for vacuum vessel |
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| Publication Number | Publication Date |
|---|---|
| CN112708856A true CN112708856A (en) | 2021-04-27 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202011420077.6A Pending CN112708856A (en) | 2020-11-30 | 2020-11-30 | Ion plating process for vacuum vessel |
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| CN (1) | CN112708856A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113718222A (en) * | 2021-08-12 | 2021-11-30 | 浙江安胜科技股份有限公司 | PVD vacuum magnetron sputtering composite coloring process for surface of vacuum vessel |
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| CN101294270A (en) * | 2008-06-06 | 2008-10-29 | 东北大学 | Equipment and method for producing nichrome composite plate with vacuum arc ion plating |
| US20090145745A1 (en) * | 2007-06-05 | 2009-06-11 | Boling Norman L | Thin film coating system and method |
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| KR20200021698A (en) * | 2018-08-21 | 2020-03-02 | (주)보림시스템 | Tapering jig for evenly coating on working blade of tool |
| CN210683935U (en) * | 2019-09-24 | 2020-06-05 | 上海良勤实业有限公司 | Vacuum coating device for car lamp cover |
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2020
- 2020-11-30 CN CN202011420077.6A patent/CN112708856A/en active Pending
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| US20090145745A1 (en) * | 2007-06-05 | 2009-06-11 | Boling Norman L | Thin film coating system and method |
| CN101294270A (en) * | 2008-06-06 | 2008-10-29 | 东北大学 | Equipment and method for producing nichrome composite plate with vacuum arc ion plating |
| KR20200021698A (en) * | 2018-08-21 | 2020-03-02 | (주)보림시스템 | Tapering jig for evenly coating on working blade of tool |
| CN109182984A (en) * | 2018-09-21 | 2019-01-11 | 西安浩元航空科技有限公司 | A method of TiCN coating is prepared for screw tap surface |
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| CN210683935U (en) * | 2019-09-24 | 2020-06-05 | 上海良勤实业有限公司 | Vacuum coating device for car lamp cover |
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| CN113718222A (en) * | 2021-08-12 | 2021-11-30 | 浙江安胜科技股份有限公司 | PVD vacuum magnetron sputtering composite coloring process for surface of vacuum vessel |
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Application publication date: 20210427 |