CN112525071B - Method for inhibiting non-uniformity influence of optical material in large-aperture interferometer - Google Patents
Method for inhibiting non-uniformity influence of optical material in large-aperture interferometer Download PDFInfo
- Publication number
- CN112525071B CN112525071B CN202011357852.8A CN202011357852A CN112525071B CN 112525071 B CN112525071 B CN 112525071B CN 202011357852 A CN202011357852 A CN 202011357852A CN 112525071 B CN112525071 B CN 112525071B
- Authority
- CN
- China
- Prior art keywords
- aperture
- caliber
- refractive index
- wavefront
- small
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/02075—Reduction or prevention of errors; Testing; Calibration of particular errors
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Instruments For Measurement Of Length By Optical Means (AREA)
Abstract
The invention discloses a method for inhibiting the influence of the nonuniformity of optical materials in a large-aperture interferometer, which provides an analog simulation and correction scheme for the influence of the nonuniformity of materials of a large-aperture collimating lens and a TF standard flat plate in the large-aperture interferometer. Firstly, establishing a beam expanding system model in optical design software Zemax; adopting polynomial expression to represent refractive index non-uniformity of the large-caliber optical material; and modeling the large-caliber collimating lens with three-dimensional distribution of refractive index and a standard flat plate by adopting the self-defined surface type in Zemax, and simulating and analyzing the influence of the non-uniformity of the refractive index of the large-caliber material. On the basis of accurate modeling of a beam expanding system, the influence of the nonuniformity of the large-aperture optical material is inhibited by optimizing the surface shape parameters of the front surfaces of the small-aperture collimating lens and the TF standard flat plate. The invention accurately models the three-dimensional distribution of the refractive index of the large-caliber optical material, inhibits the non-uniform influence of the large-caliber optical material by optimizing the parameters of the small-caliber collimating lens, and has high precision and good practicability.
Description
Technical Field
The invention relates to the field of optical design of precision optical instruments, in particular to a method for inhibiting the influence of non-uniformity of an optical material in a large-aperture interferometer.
Background
The interferometer is an instrument adopting an optical interference detection technology, can realize non-contact measurement of wavelength magnitude, and is one of the most effective and accurate means for detecting optical elements and optical systems. With the development of scientific technology, large-scale optical elements are gradually widely applied in advanced scientific fields such as astronomy, aerospace, energy and the like, and the detection requirements of large-aperture optical elements are increasing day by day. The large-aperture interferometer can directly measure the surface shape of the large-aperture optical element, and the method has high precision and high measurement efficiency.
The effect of the non-uniformity of the optical material is that the optical path difference of light passing through a certain thickness of the optical material is different due to the non-uniform refractive index distribution of the optical material. The optical path length difference of light passing through the optical material can be expressed as δ ═ Δ n · d. Where Δ n is the refractive index non-uniformity and d is the thickness of the optical material. The refractive index non-uniformity of current optical materials mayTo achieve 10 -6 In the small-caliber interferometer, the thickness of the optical material is more than ten millimeters, and the value of the wavefront error pv caused by the nonuniformity of the optical material obtained by an optical path difference calculation formula is not more than lambda/4. The wavefront error is within the tolerance range of the system aberration and does not influence the measurement result. In a large-aperture interferometer system, due to the fact that the aperture of the optical lens is large, the thickness of a corresponding material can reach more than one hundred millimeters, and the wave front error pv value obtained through an optical path difference calculation formula can reach more than 1 lambda. The wavefront error causes non-negligible aberration to the collimated wavefront of the system, which then causes transmission distortion of the wavefront and affects the accuracy of the interferometric measurement. Therefore, in the design process of the large-aperture interferometer, the aberration of the system must be compensated by considering the effect of the non-uniformity of the large-aperture optical material and adopting an appropriate manner. The traditional optical material heterogeneity analysis is mainly an additional wave aberration method. The basic idea of this method is to add interferometrically measured wavefront data of the optical material directly to the system wavefront aberrations. In Zemax, the optical material wave aberration distribution obtained by interferometry is described by a Zernike polynomial, and then the corresponding Zernike coefficients are input by setting the mirror surface to be a Fringe Zernike Sag type, so that the two-dimensional simulation of the non-uniformity can be realized. However, the additional wave aberration method obtains the wave aberration of the flat optical material when measuring the optical material, and the optical material in the actual optical path is not necessarily a flat plate any more, and the measured wave aberration cannot accurately represent the aberration caused by the actual light passing through the optical material. Therefore, the simulation accuracy of this approximation processing method is not high. The Changchun optical machine Yangxiang adopts a three-dimensional ray tracing aberration simulation method for an extremely small aberration optical system in the influence of material refractive index non-uniformity on the image quality of the extremely small aberration optical system (advances in laser and optoelectronics, 2013(11): 181-. Compared with the traditional two-dimensional simulation, the precision is greatly improved. But this method only simulates the effect of material non-uniformity and does not provide a feasible aberration compensation scheme. Material nonuniformity in high-accuracy optical system of Liuyan boat of Zhejiang universityInfluence of sex on imaging quality (report of photonics, 2013,42(004): 451-. A compensation method for obtaining better system performance by pre-selecting the best position of blank glass for processing lens through computer simulation to find the best assembling position is provided. However, the large-aperture optical material in the large-aperture interferometer cannot select the optimal material position in advance, and the method is not suitable.
Disclosure of Invention
The invention aims to provide a method for inhibiting the non-uniformity influence of optical materials in a large-aperture interferometer, which adopts a simple and easy-to-operate Zemax simulation scheme and a practical aberration compensation scheme for inhibiting the non-uniformity influence of the optical materials in the large-aperture interferometer by the non-uniform distribution of various large-aperture materials on the large-aperture interferometer.
The technical solution for realizing the purpose of the invention is as follows: a method for inhibiting the non-uniformity influence of optical materials in a large-aperture interferometer comprises the following steps:
the large-aperture interferometer beam expanding system light path comprises a small-port wavefront emergent module, a first reflector, a small-aperture collimator, a second reflector, a third reflector, a large-aperture collimator and a TF standard flat plate.
The small-port wavefront emergent module generates small-caliber collimated wavefronts, the small-caliber collimated wavefronts are folded and reflected by the first reflector, expanded to the second reflector through the small-caliber collimating mirror, folded and reflected to the large-caliber collimating mirror through the second reflector and the third reflector, and changed into collimated light to be emergent through the large-caliber collimating mirror, after the collimated light passes through the TF standard flat plate, one part of light is reflected on the rear surface of the TF standard flat plate to form reference light, and the other part of light is collimated to be emergent into test light through the TF standard flat plate; the first reflector, the second reflector and the third reflector are all used for folding the light path, so that the light path structure is more compact, and the layout form of the light path is not unique.
Step 1, selecting according to the data of the refractive index distribution of the large-caliber optical materialSelecting a rotationally symmetric even polynomial or a non-rotationally symmetric Zernike polynomial to represent the refractive index distribution N of the large-caliber optical material; wherein, even degree polynomial of rotational symmetry
Wherein N is 0 Is the refractive index of the center point of the optical material, r is the normalized radius, n 2 、n 4 、n 6 、n 8 Is the coefficient of each polynomial;
non-rotationally symmetric Zernike polynomial N ═ N 0 +a 4 Z 4 +a 5 Z 5 +a 6 Z 6 +a 7 Z 7 +a 8 Z 8 +a 9 Z 9 (ii) a Wherein N is 0 Refractive index, Z, being the center point of the optical material 4 、Z 5 、Z 6 、Z 7 、Z 8 、Z 9 Is a zernike polynomial; a is 4 、a 5 、a 6 、a 7 、a 8 、a 9 Is the coefficient of each polynomial; wherein r is 2 ＝x 2 +y 2 ；Z 4 ＝2x 2 +2y 2 -1；Z 5 ＝xy；Z 6 ＝x 2 -y 2 ；Z 7 ＝3x 2 y+y 3 -2y；Z 8 ＝3x 3 +3y 2 x-2x；Z 9 ＝3x 2 y-y 3 (ii) a Wherein r is the normalized radius, and x and y are the normalized coordinates in the rectangular coordinate system. The terms of the even-order polynomial or Zernike polynomial are selected according to the refractive index profile data characteristics.
Step 2, modifying a dynamic link library file in the Zemax custom surface type, writing a required lens surface type expression into the dynamic link library file, and then writing the refractive index distribution N of the large-aperture optical material and the derivative of the N in the direction of X, Y, Z: dN/dx, dN/dy and dN/dz to obtain a modified custom face type; the setting of the face type expression in the dynamic link library file is in case3 and case5, and the setting of the refractive index distribution expression is in case 6.
Step 3, substituting the modified custom surface type into a Zemax design light path of the large-aperture interferometer to replace original large-aperture lens surface shape data to obtain a wavefront map after the lens material non-uniformity is influenced;
and 4, optimizing the shape parameters of the small-caliber collimating mirror and the shape parameters of the front surface of the TF standard flat plate by taking the emergent wavefront quality of the beam expanding system as an optimization target according to the wavefront map obtained in the step 3, wherein when the shape parameters are optimized, the spherical surface is firstly used for curvature optimization, and if the obtained emergent wavefront meets the index that the pv value is better than lambda/4, the optimization is stopped. Otherwise, the front surface shapes of the small-caliber collimating lens and the TF standard flat plate are adjusted to be even aspheric surfaces, 4 th order and 6 th order of the even aspheric surfaces are optimized, and the index that the exiting wavefront meets the condition that the pv value is superior to lambda/4 is obtained.
Compared with the prior art, the invention has the remarkable advantages that:
(1) when the influence of the nonuniformity of the optical material on the beam expanding system is simulated, a refractive index expression in three-dimensional distribution is adopted, so that the light ray tracing result is more accurate.
(2) The non-uniform refractive index surface type is set by adopting the self-defined surface type of Zemax, so that the method is simpler, more flexible and easier to modify, and the operation speed is higher.
(3) The influence of the nonuniformity of the large-aperture lens material is compensated by optimizing the parameters of the small-aperture collimating lens at the front end of the beam expanding system, so that the processing difficulty is low and the practicability is high.
Drawings
FIG. 1 is a schematic diagram of a beam expanding system of a large aperture interferometer of the present invention.
FIG. 2 is a refractive index profile for a large aperture lens, wherein (a) is a profile characterized by a rotationally symmetric even-order polynomial and (b) is a profile characterized by a non-rotationally symmetric Zernike polynomial.
FIG. 3 is a graph of the exit wavefront of a beam expanding system without regard to refractive index non-uniformity.
Fig. 4 is a diagram of the emergent wavefront of the beam expanding system of the large-aperture collimating mirror considering refractive index non-uniformity, wherein (a) is a diagram of the wavefront caused by refractive index distribution characterized by even-order polynomial, and (b) is a diagram of the wavefront caused by refractive index distribution characterized by Zernike polynomial.
FIG. 5 is a diagram of the wavefront of a TF standard plate considering refractive index non-uniformity, where (a) is the wavefront due to a refractive index profile characterized by an even-order polynomial and (b) is the wavefront due to a refractive index profile characterized by a Zernike polynomial.
FIG. 6 is a diagram of an exit wavefront after optimization of a beam expanding system, wherein (a) is a diagram of a wavefront after optimization of refractive index distribution characterized by an even-order polynomial, and (b) is a diagram of a wavefront after optimization of refractive index distribution characterized by a Zernike polynomial.
FIG. 7 is a diagram of the emergent wavefront after optimization of the TF standard flat plate, wherein (a) is a diagram of the wavefront after optimization of the refractive index distribution characterized by an even-order polynomial, and (b) is a diagram of the wavefront after optimization of the refractive index distribution characterized by a Zernike polynomial.
FIG. 8 is a flowchart of a method for suppressing the non-uniformity effect of optical materials in a large-aperture interferometer according to the present invention.
Detailed Description
In order to make the aforementioned objects, features and advantages of the present invention comprehensible, embodiments accompanied with figures are described in detail below.
With reference to fig. 1 and 8, a method for suppressing the non-uniformity of an optical material in a large-aperture interferometer according to the present invention includes the following steps:
the large-aperture interferometer beam expanding system light path comprises a small-aperture collimating wavefront 1, a first reflector 2, a small-aperture collimating mirror 3, a second reflector 4, a third reflector 5, a large-aperture collimating mirror 6 and a TF standard flat plate 7.
The small-caliber collimating wavefront 1 is folded and reflected by the first reflector 2, expanded by the small-caliber collimating mirror 3, folded by the second reflector 4 and the third reflector 5, collimated and emitted after passing through the large-caliber collimating mirror 6, part of collimated light passes through the TF standard flat plate 7, is reflected by the surface of the TF7 to form reference light, and the other part of collimated light passes through the TF standard flat plate 7 and is emitted to form test light. The first reflector 2, the second reflector 4 and the third reflector 5 are all used for folding the light path, so that the light path structure is more compact, and the light path layout form is not unique.
Step 1, combining the refractive index distribution of two large-caliber optical materials shown in figure 2Data, FIG. 2(a) is a rotationally symmetric even polynomial
FIG. 2(b) shows a non-rotationally symmetric Zernike polynomial with the formula N ═ N 0 +a 4 Z 4 +a 5 Z 5 +a 6 Z 6 +a 7 Z 7 +a 8 Z 8 +a 9 Z 9 A characterized refractive index profile; wherein N is 0 Is the refractive index of the center point of the optical material, r is the normalized radius, n 2 、n 4 、n 6 、n 8 Is the coefficient of each polynomial; z 4 、Z 5 、Z 6 、Z 7 、Z 8 、Z 9 Is a zernike polynomial; a is 4 、a 5 、a 6 、a 7 、a 8 、a 9 Is the coefficient of each polynomial; wherein r is 2 ＝x 2 +y 2 ；Z 4 ＝2x 2 +2y 2 -1；Z 5 ＝xy；Z 6 ＝x 2 -y 2 ；Z 7 ＝3x 2 y+y 3 -2y；Z 8 ＝3x 3 +3y 2 x-2x；Z 9 ＝3x 2 y-y 3 (ii) a Wherein x and y are normalized coordinates under a rectangular coordinate system.
Step 2, modifying the dynamic link library file in the Zemax self-defined surface type, writing a required lens surface type expression into the dynamic link library file, and then writing into the refractive index distribution polynomial N in the step 1 and the derivatives of N in the X, Y and Z directions: dN/dx, dN/dy, dN/dz. The setting of the face type expression in the dynamic link library file is in case3 and case5, and the setting of the refractive index distribution expression is in case 6.
And 3, substituting the customized surface type modified in the step 2 into a Zemax designed light path of the large-aperture interferometer to replace original large-aperture lens surface shape data by combining with the images shown in the figures 3-5, and obtaining a wavefront map after the lens material is affected by the nonuniformity.
And 4, optimizing the shape parameters of the small-aperture collimating mirror in the beam expanding system and the shape parameters of the front surface of the TF standard flat plate by taking the emergent wavefront quality of the beam expanding system as an optimization target according to the wavefront map obtained in the step 3 in combination with the graphs shown in the figures 6 and 7, wherein when the shape parameters are optimized, the spherical surface is firstly used for curvature optimization, and if the obtained emergent wavefront meets the index that the pv value is better than lambda/4, the optimization is stopped. Otherwise, the front surface shapes of the small-caliber collimating mirror and the TF standard flat plate are adjusted to be even aspheric surfaces, 4 th and 6 th orders of the even aspheric surfaces are optimized, and the index that the pv value of the emergent wavefront is superior to lambda/4 is obtained. And controlling the focal length of the small-caliber collimating lens to be unchanged when the parameters of the small-caliber collimating lens in the beam expanding system are optimized.
Example 1
The large-aperture interferometer shown in fig. 1 includes a large-aperture interferometer beam expansion system and a small-port wavefront exit module, where the large-aperture interferometer beam expansion system includes a first reflector 2, a small-aperture collimator 3, a second reflector 4, a third reflector 5, a large-aperture collimator 6, and a TF standard flat plate 7; the small-port wavefront emergent module generates a small-caliber collimated wavefront 1, the small-caliber collimated wavefront 1 is folded and reflected by the first reflector 2, expanded to the second reflector 4 through the small-caliber collimating mirror 3, folded and reflected to the large-caliber collimating mirror 6 through the second reflector 4 and the third reflector 5, and changed into collimated light to be emergent after passing through the large-caliber collimating mirror 6, after the collimated light passes through the TF standard flat plate 7, one part of light is reflected by the rear surface of the TF standard flat plate 7 to form reference light, and the other part of light is collimated and emergent through the TF standard flat plate 7 to form test light;
with reference to fig. 1 to 8, a method for suppressing the non-uniformity of an optical material in a large-aperture interferometer with a diameter of 1m and a working wavelength of 633 nm. The apertures of the large-aperture collimating mirror 6 and the TF standard flat plate 7 are 1080mm, the material is BK7 glass, and the non-uniformity of the glass material is 5x10 -6 . The invention provides a method for inhibiting the non-uniformity influence of an optical material in a large-aperture interferometer, which comprises the following steps: step 1, combining the refractive index distribution data of two large-caliber optical materials shown in fig. 2, wherein fig. 2(a) is an even-order polynomial with rotational symmetry
A characterised refractive index profile, wherein N 0 Refractive index at 633nm, N, of BK7 material centered in the lens 0 ＝1.5109；n 2 ＝-4.795×10 -11 ；n 4 ＝-4.795×10 -16 ；n 6 ＝2.819×10 -21 ；n 8 0. FIG. 2(b) shows a non-rotationally symmetric Zernike polynomial with the formula N ═ N 0 +a 4 Z 4 +a 5 Z 5 +a 6 Z 6 +a 7 Z 7 +a 8 Z 8 +a 9 Z 9 A characterized refractive index profile wherein 4 ＝6.9×10 -12 、a 5 ＝0、a 6 ＝2.7×10 -12 、a 7 ＝1.2×10 -15 、a 8 ＝3.5×10 -16 、a 9 ＝-3.5×10 -16 . The degree of the even-order polynomial or Zernike polynomial can be further extended according to refractive index profile data, where r 2 ＝x 2 +y 2 ；Z 4 ＝2x 2 +2y 2 -1；Z 5 ＝xy；Z 6 ＝x 2 -y 2 ；Z 7 ＝3x 2 y+y 3 -2y；Z 8 ＝3x 3 +3y 2 x-2x；Z 9 ＝3x 2 y-y 3 (ii) a Wherein x and y are normalized coordinates under a rectangular coordinate system. The materials and refractive index distribution of the TF standard flat plate 7 and the large-aperture collimating mirror 6 in the example are consistent.
And 2, modifying the dynamic link library file in the Zemax self-defined surface type, and writing a required lens surface type expression into the dynamic link library file, wherein the lens surface type of the example is an even aspheric surface. And writing the refractive index distribution polynomial N in the step 1 and derivatives of N in X, Y and Z directions: dN/dx, dN/dy, dN/dz. The setting of the face type expression in the dynamic link library file is in case3 and case5, and the setting of the refractive index distribution expression is in case 6.
And 3, substituting the customized surface type modified in the step 2 into a Zemax designed light path of the large-aperture interferometer to replace the original surface shape data of the large-aperture lens 6 to obtain a wavefront map after the influence of the non-uniformity of the lens material by combining with the images shown in the figures 3-5. In this example, the wavefront aberration of the beam expanding system is shown in fig. 3 and pv is 0.0403 λ without considering refractive index non-uniformity of the large-diameter collimating mirror 6, the wavefront aberration of the beam expanding system is shown in fig. 4 after considering two refractive index distribution forms, fig. 4(a) is the wavefront aberration caused by the refractive index of the even-order polynomial distribution, fig. 4(b) is the wavefront aberration caused by the refractive index of the Zernike polynomial distribution, and pv is 0.5926 λ and 0.7137 λ, respectively. It is also possible to obtain the wavefront aberration of the expanded beam system after the TF standard plate 7 considers two refractive index distribution forms as shown in fig. 5, and pv values are 1.8476 λ and 1.1834 λ, respectively.
And 4, optimizing the shape parameters of the small-aperture collimating mirror in the beam expanding system and the shape parameters of the front surface of the TF standard flat plate by taking the emergent wavefront quality of the beam expanding system as an optimization target according to the wavefront map obtained in the step 3 in combination with the graph shown in FIG. 6 and FIG. 7, wherein when the shape parameters are optimized, the curvature optimization is firstly carried out by using the spherical surface, and if the obtained emergent wavefront meets the index that the pv value is better than lambda/4, the optimization is stopped. Otherwise, the front surface shapes of the small-caliber collimating lens and the TF standard flat plate are adjusted to be even aspheric surfaces, 4 th order and 6 th order of the even aspheric surfaces are optimized, and the index that the exiting wavefront meets the condition that the pv value is superior to lambda/4 is obtained. The focal length of the small-caliber collimating lens 3 in the beam expanding system needs to be controlled to be unchanged when the surface shape of the small-caliber collimating lens is optimized. The wave aberration after optimization for the beam expanding system of both refractive index profiles is shown in fig. 6, with pv values of 0.0811 λ and 0.2420 λ, respectively. The optimized wave aberration of the TF standard plate 7 is shown in fig. 7, and the values of the wave aberration pv are 0.0001 λ and 0.1761 λ, respectively. Meet the design requirements.
The embodiment realizes the suppression of the influence on the nonuniformity of the optical material in the large-aperture interferometer through a series of measures. The collimating wavefront meeting the design requirement is finally obtained, and the embodiment shows that the method can well realize the optimization of the wave aberration of the beam expanding system under the condition that the nonuniformity of the optical material is complex and various. The method is high in precision, good in practicability and strong in flexibility.
Claims (9)
1. A method for inhibiting the non-uniformity influence of optical materials in a large-aperture interferometer is characterized by comprising the following steps:
the large-aperture interferometer comprises a large-aperture interferometer beam expanding system and a small-port wavefront emergent module, wherein the large-aperture interferometer beam expanding system comprises a first reflector (2), a small-aperture collimator lens (3), a second reflector (4), a third reflector (5), a large-aperture collimator lens (6) and a TF standard flat plate (7); the small-port wavefront emergent module generates a small-caliber collimating wavefront (1), the small-caliber collimating wavefront (1) is folded and reflected by the first reflector (2), expanded to the second reflector (4) through the small-caliber collimating mirror (3), folded and reflected to the large-caliber collimating mirror (6) through the second reflector (4) and the third reflector (5), and changed into collimated light to be emergent after passing through the large-caliber collimating mirror (6), after the collimated light passes through the TF standard flat plate (7), one part of light is reflected through the rear surface of the TF standard flat plate (7) to form reference light, and the other part of light is collimated to be emergent to be test light through the TF standard flat plate (7);
step 1, selecting a rotationally symmetric even polynomial or a non-rotationally symmetric Zernike polynomial to represent the refractive index distribution N of the large-caliber optical material according to the data of the refractive index distribution of the large-caliber optical material;
step 2, modifying a dynamic link library file in the Zemax custom surface type, writing a required lens surface type expression into the dynamic link library file, and then writing the refractive index distribution N of the large-aperture optical material and the derivative of the N in the direction of X, Y, Z: dN/dx, dN/dy and dN/dz to obtain a modified custom face type;
step 3, the modified customized surface type is brought into a Zemax design light path of the large-aperture interferometer to replace original large-aperture lens surface shape data, and a wavefront map after the lens material non-uniformity influence is obtained;
step 4, according to a wavefront image after the non-uniformity influence of a lens material, optimizing the surface shape parameter of a small-aperture collimating lens (3) and the surface shape parameter of the front surface of a TF standard flat plate (7) in the large-aperture interferometer beam expanding system by taking the emergent wavefront quality of the large-aperture interferometer beam expanding system as an optimization target, performing curvature optimization by using a spherical surface when the surface shape parameter is optimized, and stopping the optimization if the obtained emergent wavefront meets the index that the pv value is better than lambda/4; otherwise, the front surface shapes of the small-caliber collimating lens (3) and the TF standard flat plate (7) are adjusted to be even aspheric surfaces, the 4 th order and the 6 th order of the even aspheric surfaces are optimized, and the index that the pv value of the emergent wavefront is better than lambda/4 is obtained.
2. The method of suppressing the effects of non-uniformities in optical materials in large-aperture interferometers according to claim 1, wherein: in step 1, a rotationally symmetric even polynomial
Wherein N is 0 Is the refractive index of the center point of the optical material, r is the normalized radius, n 2 、n 4 、n 6 、n 8 Is the coefficient of each polynomial;
non-rotationally symmetric Zernike polynomial N ═ N 0 +a 4 Z 4 +a 5 Z 5 +a 6 Z 6 +a 7 Z 7 +a 8 Z 8 +a 9 Z 9 (ii) a Wherein N is 0 Refractive index, Z, being the center point of the optical material 4 、Z 5 、Z 6 、Z 7 、Z 8 、Z 9 Is a zernike polynomial; a is 4 、a 5 、a 6 、a 7 、a 8 、a 9 Is the polynomial coefficient.
3. The method of suppressing the effects of non-uniformities in optical materials in large-aperture interferometers according to claim 1 or 2, wherein: in the step 1, the terms of the even-order polynomial or the Zernike polynomial are selected according to the refractive index distribution data characteristics.
4. The method of suppressing the effects of non-uniformities in optical materials in large-aperture interferometers according to claim 2, wherein: in the step 1, r 2 ＝x 2 +y 2 ；Z 4 ＝2x 2 +2y 2 -1；Z 5 ＝xy；Z 6 ＝x 2 -y 2 ；Z 7 ＝3x 2 y+y 3 -2y；Z 8 ＝3x 3 +3y 2 x-2x；Z 9 ＝3x 2 y-y 3 (ii) a Wherein r is the normalized radius, and x and y are the normalized coordinates in the rectangular coordinate system.
5. The method of suppressing the effects of non-uniformities in optical materials in large-aperture interferometers according to claim 1, wherein: in the step 1, the data according to the refractive index distribution of the large-caliber optical material refers to the refractive index distribution of the material according to the large-caliber collimating mirror (6) and the TF standard flat plate (7).
6. The method of suppressing the effects of non-uniformities in optical materials in large-aperture interferometers according to claim 1, wherein: in the step 2, the setting of the surface type expression in the dynamic link library file is in case3 and case5, and the setting of the refractive index distribution expression is in case 6.
7. The method of suppressing the effects of non-uniformities in optical materials in large-aperture interferometers according to claim 1, wherein: in the step 4, the focal length of the small-caliber collimating mirror (3) in the large-caliber interferometer beam expanding system needs to be controlled to be unchanged when the parameters of the small-caliber collimating mirror are optimized.
8. The method of suppressing the effects of non-uniformities in optical materials in large-aperture interferometers according to claim 1, wherein: the first reflector (2), the second reflector (4) and the third reflector (5) are all used for folding the light path, and the layout form is not unique.
9. The method of suppressing the effects of non-uniformities in optical materials in large-aperture interferometers according to claim 1, wherein: the small-port wavefront emergent module is an interferometer device which can carry out optical detection independently.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011357852.8A CN112525071B (en) | 2020-11-27 | 2020-11-27 | Method for inhibiting non-uniformity influence of optical material in large-aperture interferometer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011357852.8A CN112525071B (en) | 2020-11-27 | 2020-11-27 | Method for inhibiting non-uniformity influence of optical material in large-aperture interferometer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN112525071A CN112525071A (en) | 2021-03-19 |
| CN112525071B true CN112525071B (en) | 2022-08-16 |
Family
ID=74994267
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202011357852.8A Active CN112525071B (en) | 2020-11-27 | 2020-11-27 | Method for inhibiting non-uniformity influence of optical material in large-aperture interferometer |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN112525071B (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113847882B (en) * | 2021-09-08 | 2023-02-28 | 南京理工大学 | Large-caliber vertical absolute inspection method based on gravity deformation and refractive index non-uniformity compensation |
| CN116586640B (en) * | 2023-07-14 | 2023-09-22 | 中国科学院长春光学精密机械与物理研究所 | Spherical test board, manufacturing method thereof and calibration method of transfer function of interferometer |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108919486A (en) * | 2018-08-20 | 2018-11-30 | 南京理工大学 | The hot optical characteristics characterization and optimization method of optical window under low-temperature vacuum environment |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60242304A (en) * | 1984-05-17 | 1985-12-02 | Agency Of Ind Science & Technol | Hologram interferometer for measuring surface shape of large-aperture plane mirror |
| CN103335982B (en) * | 2013-06-21 | 2016-05-11 | 中国科学院上海光学精密机械研究所 | Utilize wavelength tuning phase-shifting interferometer to measure the method for parallel flat optical homogeneity |
| CN103499330B (en) * | 2013-10-10 | 2015-07-08 | 北京空间机电研究所 | Optical lead-out method for vertex normal of large-caliber concave non-spherical reflector |
| CN104121867B (en) * | 2014-08-06 | 2017-01-18 | 哈尔滨理工大学 | Aspheric lens computer-generated holography interference detecting method based on liquid crystal spatial light modulator |
| CN106092514B (en) * | 2015-04-28 | 2018-10-02 | 南京理工大学 | Optical heterogeneity measuring device and method based on dual wavelength fizeau interferometer |
| CN204855372U (en) * | 2015-07-10 | 2015-12-09 | 中国科学院西安光学精密机械研究所 | Heavy -calibre uniaxial crystal refracting index homogeneity measuring device |
-
2020
- 2020-11-27 CN CN202011357852.8A patent/CN112525071B/en active Active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108919486A (en) * | 2018-08-20 | 2018-11-30 | 南京理工大学 | The hot optical characteristics characterization and optimization method of optical window under low-temperature vacuum environment |
Also Published As
| Publication number | Publication date |
|---|---|
| CN112525071A (en) | 2021-03-19 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN110567393B (en) | Large-curvature-radius free-form surface mirror surface shape interference measurement device and method | |
| CN110188321B (en) | Primary and secondary mirror calibration method based on neural network algorithm | |
| CN112525071B (en) | Method for inhibiting non-uniformity influence of optical material in large-aperture interferometer | |
| CN107421436B (en) | Aspherical interferometer measuration system and method based on the spatial light modulator plane of reference | |
| Hao et al. | Virtual interferometer calibration method of a non-null interferometer for freeform surface measurements | |
| Pruss et al. | Measuring aspheres quickly: tilted wave interferometry | |
| CN104570621A (en) | Feedback regulation method for optical grating diffraction wave surface error in double-beam exposure system | |
| Kreischer | Retrace error: interferometry's dark little secret | |
| CN111929037A (en) | Optical wedge compensator calibration system and calibration method thereof | |
| Zhang et al. | SPGD and Newton iteration mixed algorithm used in freeform surface metrology | |
| CN108061514A (en) | It is a kind of that aspherical dynamic modelling method is detected using axial scan optical interferometry | |
| Schober et al. | Tilted Wave Fizeau Interferometer for flexible and robust asphere and freeform testing | |
| CN112902875B (en) | Aspheric reflector curvature radius detection device and method | |
| Wang et al. | Calibration of geometrical aberration in transmitted wavefront testing of refractive optics with deflectometry | |
| Li et al. | Interferometry with flexible point source array for measuring complex freeform surface and its design algorithm | |
| Garbusi et al. | Advanced studies on the measurement of aspheres and freeform surfaces with the tilted-wave interferometer | |
| CN109002567A (en) | Computer Aided Assembly Process Planning method based on actual optical system adjustment light path | |
| CN109612405B (en) | Large-caliber convex cone mirror surface shape detection system and detection method | |
| Gao et al. | A flexible angle compensation method for freeform surface testing based on tip/tilt mirror | |
| Gu et al. | Design and error calibration of an on-axis deflectometric microscope system | |
| Wang et al. | Mixed compensation for the testing of large convex aspheres | |
| CN104776811A (en) | Surface shape detection method of larger-aperture and batched off-axis sub-mirrors | |
| CN114137736B (en) | Large-aperture optical element adjusting device and adjusting method thereof | |
| Xue et al. | Near-null interferometric test of aspheric cylinders utilizing a partial null lens | |
| Wang et al. | Method for testing freeform surfaces based on a Shack-Hartmann sensor with plane wavefront scanning and stitching |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |