CN112433067A - Low-cross-axis crosstalk sensitive structure and manufacturing method thereof - Google Patents
Low-cross-axis crosstalk sensitive structure and manufacturing method thereof Download PDFInfo
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- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
- G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
- G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
- G01P15/12—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values by alteration of electrical resistance
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
- G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
- G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
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Abstract
The invention relates to a low cross-axis crosstalk sensitive structure and a manufacturing method thereof, wherein the sensitive structure is positioned right below a diffraction grating in an optical micro-accelerometer, and comprises the following components: the mass inertia block, the silicon substrate, the cantilever beam and the glass substrate with the cavity; the low cross-axis crosstalk sensitive structure comprises: the mass inertia block, the silicon substrate, the cantilever beam and the glass substrate with the cavity; a cavity is longitudinally arranged in the middle of the silicon substrate, and the inertia mass block is arranged in the cavity of the silicon substrate; the cantilever beams are of a snake-shaped winding structure and comprise a plurality of cantilever beams, and two ends of each cantilever beam are respectively connected with the inertial mass block and the inner wall of the silicon substrate cavity; the outer edge of the glass substrate is fixedly connected with the outer edge of the silicon substrate, and the cavity of the glass substrate is communicated with the cavity of the silicon substrate. The scheme not only has high acceleration-displacement sensitivity and measurement accuracy, but also greatly inhibits the influence of cross-axis crosstalk and is convenient for large-scale production.
Description
Technical Field
The invention relates to the technical field of optical MEMS accelerometer sensors, in particular to a sensitive structure for realizing low cross axis crosstalk based on a double-device-layer SOI substrate and a manufacturing method thereof.
Background
Acceleration is a physical quantity that describes the change in the speed of an object, is the rate of change of the speed vector with respect to time, and is also a vector. The acceleration of an object is difficult to be directly measured, and the acceleration is usually converted into force to be indirectly measured by means of an inertial mass block in practice, so that the basic measurement principle is based on Newton's second theorem, an accelerometer usually comprises an acceleration sensitive unit, a displacement measurement unit and a feedback control unit, external input acceleration enables the inertial mass block in the sensitive unit to generate displacement which has a corresponding relation with the input acceleration, and a displacement measurement system obtains the input acceleration by measuring the displacement. The accelerometer generally consists of a sensitive unit, a displacement measurement unit and a signal processing unit, is a core device of an inertial navigation system, plays an important role in a plurality of application fields such as attitude detection, seismic detection, terrain detection, vibration measurement, gravity gradient measurement and the like, and has application scenes across civil, industrial and military fields. With the updating of weaponry and the continuous improvement of inertial navigation precision requirements, and the emergence of new equipment such as kinetic energy weapons, gravity gradiometers and the like, the performance requirements of accelerometers are also higher and higher. The performance indicators measuring the accelerometer are: sensitivity, resolution, dynamic range, operating bandwidth, cross-axis crosstalk magnitude, and the like. Wherein the cross-axis crosstalk reflects the effect of acceleration applied in the non-sensitive direction on the acceleration measurement of the sensitive axis of the accelerometer.
Compared with the traditional accelerometer, the MEMS accelerometer has the advantages of high sensitivity, low noise, small volume, light weight, low cost, easy integration and the like, and is an important development direction of the accelerometer. Compared with capacitive, piezoelectric, piezoresistive and tunneling current MEMS accelerometers, the optical MEMS accelerometer has the advantages of high sensitivity, electromagnetic interference resistance, fast response, easiness in integration and the like. Therefore, optical MEMS accelerometers are becoming a new development hotspot for MEMS accelerometers.
The optical MEMS accelerometer based on the diffraction grating is a combination of a high-precision optical displacement measuring unit and a high-sensitivity MEMS sensitive unit, and can provide acceleration measuring sensitivity of more than 2000V/g and acceleration measuring resolution [ Lu, Q ] of a mu g level; bai, j.; wang, k.; j Microelectromech S2017, 26, (4), 859-. U.S. Pat. No. US8783106B1, "micro-machined force-based feedback accelerometer with optical displacement detection", discloses a force feedback optical accelerometer based on a diffraction grating and a MEMS acceleration sensitive unit constructed on an SOI, in which an inertial mass block and a base frame thereof are fabricated on a three-layer SOI, and a cantilever beam is used to connect the mass block and the frame. When the accelerometer is subjected to external acceleration, the mass block moves out of the plane, and the displacement of the inertial mass block is measured through the displacement measuring unit based on the diffraction grating, so that the measurement of the input acceleration is realized. Although the existing optical micro-accelerometer based on diffraction grating can provide high acceleration measurement accuracy, if the acceleration sensitive structure is not improved, the cross-axis crosstalk of the existing optical micro-accelerometer seriously affects the further improvement of the accelerometer measurement accuracy. Therefore, cross-axis crosstalk is an important performance index for measuring the accelerometer, and the cross-axis crosstalk is as small as possible for the high-precision accelerometer so as to avoid the influence on the overall performance.
At present, a certain amount of research has been made on cross-axis crosstalk in MEMS accelerometers worldwide, and Beijing university has realized a Low-crosstalk capacitive Micro accelerometer by designing a highly symmetric sandwich structure based on a dual device layer SOI substrate, where the cross-axis crosstalk effect is only 0.356%, but the measurement sensitivity is only 1.096V/g, and the Low cross-axis crosstalk Micro-gram and g.yang are not suitable for use in high-precision accelerometer sensors [ q.hu, c.gao, y.hao, y.zhang and g.yang, "Low cross-axis sensitivity Micro-gram Micro electrochemical mechanical system and window capacitive accelerometer," Micro & Nano letters.6,510-514(2011) ]. A.ravi Sankara et al, the university of Wiwolol, India, reduced the cross-axis crosstalk effect to 0.37% by adjusting the position of the center of gravity of the mass by depositing gold on the mass, but this solution required a tight control of the thickness and uniformity of the deposited gold film, and the experimental solution with a great deal of randomness was not conducive to mass production [ A.ravi Sankara and S.Datb, "A very-low cross-axis sensitive interfacial activity tester with an electrically connected gold layer atom a thickness reduction process of mass" Sensors and a catalyst A. physical.189,125-133(2013) ]. Starting from the symmetry design of a sensitive unit, the Luqian wave of Zhejiang university and the like prepare a highly symmetrical structure design with the coplanar center plane of a mass center of a sensitive mass block and a cantilever beam through a specially designed micro-processing process, and are limited by the influences of factors such as uneven thickness of upper and lower silicon layers of an SOI (silicon on insulator) sheet, bending of the cantilever beam caused by residual stress generated by etching, low modal frequency ratio of a non-sensitive shaft and a sensitive shaft of the structure, unfavorable reduction of parasitic excitation effect and the like caused by high-frequency vibration, and cross-axis crosstalk effect is only reduced to 3.84% and does not reach theoretical expectation [ Lu, Q ]; bai, j.; wang, k.; j MicroElectromech S2017, 26, (4), 859-; patent numbers: CN201510881229 ].
Disclosure of Invention
In order to solve the problem of cross-axis crosstalk in a high-precision uniaxial optical MEMS accelerometer based on a diffraction grating, the invention provides a sensitive structure for realizing low cross-axis crosstalk based on a double-device-layer SOI substrate and a manufacturing method thereof, namely a micro-acceleration sensitive structure with double-layer cantilever beams symmetrically distributed based on a seven-layer SOI substrate and a micro-processing manufacturing method thereof.
The low cross-axis crosstalk sensitive structure comprises: the mass inertia block, the silicon substrate, the cantilever beam and the glass substrate with the cavity;
a cavity is longitudinally arranged in the middle of the silicon substrate, and the inertia mass block is arranged in the cavity of the silicon substrate;
the cantilever beams are of a snake-shaped winding structure and comprise a plurality of cantilever beams, and two ends of each cantilever beam are respectively connected with the inertial mass block and the inner wall of the silicon substrate cavity; the outer edge of the glass substrate is fixedly connected with the outer edge of the silicon substrate, and the cavity of the glass substrate is communicated with the cavity of the silicon substrate.
Furthermore, the inertia mass block and the silicon substrate are both manufactured by superposing seven layers of SOI (silicon on insulator) substrates; the seven-layer SOI substrate sequentially comprises the following components from top to bottom: the device comprises an oxide layer I, a device layer I, an oxygen burying layer I, a substrate layer, an oxygen burying layer II, a device layer II and an oxide layer II;
the device layer I and the device layer II are monocrystalline silicon with the same thickness; the oxide layer I, the oxygen burying layer II and the oxide layer II are made of silicon dioxide with the same thickness.
Further, the number of the cantilever beams is 8, and the cantilever beams are divided into an upper layer and a lower layer; one end of the upper cantilever beam is integrally connected with the inner edge of the device layer I, and one end of the lower cantilever beam is integrally connected with the inner edge of the device layer II; the cantilever beams in the upper layer and the lower layer are symmetrically distributed.
Furthermore, in the orthographic projection of 8 cantilever beams, the included angle between two adjacent cantilever beams is 45 degrees.
Furthermore, the thickness of the cantilever beam is the same as that of the device layer I and the device layer II.
Furthermore, the upper surface of the inertia mass block is plated with a reflecting film, and the lower surface of the inertia mass block is plated with a feedback coil.
Meanwhile, the invention provides a manufacturing method of the low cross-axis crosstalk sensitive structure, which comprises the following steps:
manufacturing a reflecting film and a magnetic feedback coil in a mass block area on an SOI substrate by utilizing photoetching, film coating and stripping processes;
an upper protective layer of an upper cantilever beam is manufactured on an oxide layer I of the SOI substrate by photoetching and reactive ion beam etching;
etching an upper cantilever beam on a device layer I in the SOI substrate by utilizing deep reactive ion beams, wherein the thickness of the cantilever beam is the thickness of the device layer I;
etching a buried oxide layer I in the SOI substrate by utilizing reactive ion beams to manufacture a lower protective layer of the upper cantilever beam;
manufacturing an upper protective layer of the lower cantilever beam on an oxide layer II of the SOI substrate by reverse side overlay and reactive ion beam etching;
manufacturing a lower cantilever beam on a device layer II of the SOI substrate by utilizing deep reactive ion beam etching, wherein the lower cantilever beam is not opposite to the upper cantilever beam and rotates 45 degrees relative to the upper cantilever beam, and the thickness of the cantilever beam is the thickness of the device layer II;
etching the buried oxide layer II in the SOI substrate by utilizing reactive ion beams to manufacture a lower protective layer of the lower cantilever beam;
manufacturing an inertia mass block on a basal layer of the SOI substrate by utilizing deep reactive ion beam etching;
removing the remaining exposed oxide layer in the SOI substrate by wet etching to release the cantilever beam and mass block structure;
releasing the residual stress of the sensitive structure through annealing;
and encapsulating a cantilever beam-mass block-base structure processed by the SOI substrate and a glass substrate with a cavity manufactured in advance to form the uniaxial optical micro-accelerometer with low cross-axis crosstalk.
Furthermore, before and after the etching of the cantilever beam structure of the device layer I is completed, the oxide layer I and the buried oxide layer I above and below the device layer I need to be pre-etched.
Further, after the cantilever beam structure of the device layer II is etched, the oxide layer II and the buried oxide layer II above and below the device layer II need to be pre-etched; and meanwhile, the residual glue covered on the cantilever beam pattern is used as a mask to carry out deep reactive ion beam etching on the substrate layer in the next step.
Furthermore, when glue is coated on the oxide layer II of the SOI substrate, the thickness of the glue is ensured to be capable of bearing the etching of the oxide layer II, the device layer II, the oxygen buried layer II and the basal layer.
In the photoresist removing process after releasing the cantilever beam structure, organic cleaning, acid cleaning, dry plasma photoresist removing and the like are combined to remove the photoresist so as to ensure the integrity and the clean surface of the micro-mechanical structure.
In order to avoid the structure fracture caused in the scribing process, a separation groove can be set on the mask plate, and the substrate layer is separated into independent structural units after the etching is finished.
The invention has the beneficial effects that: 1. the design of the cantilever beam can realize the acceleration-displacement high sensitivity of the MEMS acceleration sensitive structure; 2. by adopting the design of double-layer symmetrical distribution, when the inertial mass block is subjected to the acceleration in the non-sensitive axis direction, the upper cantilever beam and the lower cantilever beam are subjected to the equal torque and the opposite torque, so that the torsion cannot occur, the sensitive axial displacement and the rotation of the mass block caused by the non-sensitive axial acceleration are fundamentally eliminated, and the off-axis crosstalk is inhibited; 3. the adopted micro-processing technology is mostly mature photoetching and etching technology, can ensure higher depth-to-width ratio and side wall verticality, can be compatible with IC technology, and realizes batch production; 4. the damage of the sensitive structure of the MEMS accelerometer due to overlarge pressure difference or stress mismatch in the etching and releasing processes is optimized, and the success rate of the flow sheet is improved on the premise of ensuring the suppression of crosstalk.
Drawings
Fig. 1 is a schematic top view of a sensitive structure according to an embodiment of the present invention;
FIG. 2 is a schematic cross-sectional view of a sensitive structure provided in an embodiment of the present invention;
FIG. 3 is a schematic diagram of a sensitive structure package according to an embodiment of the present invention;
FIG. 4 is a diagram of the fabrication of a reflective film on the upper surface and an electromagnetic feedback coil on the lower surface of the inertial mass;
FIG. 5 is a diagram of an upper protective oxide layer of an upper cantilever beam formed by etching the oxide layer I;
FIG. 6 is a diagram illustrating fabrication of an upper cantilever beam;
FIG. 7 is a diagram of etching a buried oxide layer I to form a lower protective oxide layer of an upper cantilever;
FIG. 8 is a diagram of an upper protective oxide layer of a lower cantilever beam formed by etching an oxide layer II;
FIG. 9 is a lower cantilever beam pattern;
FIG. 10 is a diagram of etching an oxygen buried layer II to form a lower protective oxide layer of a lower cantilever;
FIG. 11 illustrates the fabrication of a sensitive unit inertial mass block structure;
FIG. 12 illustrates the photoresist stripping, cleaning, annealing, and bonding of the glass substrate pedestal.
In the drawings, the components represented by the respective reference numerals are listed below:
1. silicon substrate, 2, cantilever beam, 3, inertial mass block, 4, oxide layer I, 5, device layer I, 6, buried oxide layer I, 7, basal layer, 8, buried oxide layer II, 9, device layer II, 10, oxide layer II, 11, reflective film, 12, magnetic feedback coil, 13, glass substrate.
Detailed Description
The principles and features of this invention are described below in conjunction with the following drawings, which are set forth by way of illustration only and are not intended to limit the scope of the invention.
The principle of the present invention for suppressing cross-axis crosstalk of a sensitive structure of an optical MEMS accelerometer will be described in detail below with reference to the accompanying drawings. The micromechanical acceleration sensitive structure for suppressing crosstalk according to the present invention is shown in fig. 3, and is fabricated from a special customized seven-layer SOI substrate as shown in fig. 2. The substrate is a symmetrical structure of an oxide layer I4, a single crystal silicon device layer I5, a buried oxide layer I6, a base layer 7 in an SOI substrate, a buried oxide layer II8, a single crystal silicon device layer II9 and an oxide layer II10, wherein the device layer II5 and the device layer II9, the oxide layer I4, the buried oxide layer I6, the buried oxide layer II8 and the oxide layer II10 are respectively symmetrical about the base layer 7, namely an SOI central plane. The specific size of the symmetrical SOI substrate can be changed according to actual requirements, in this embodiment, the device layer I and the device layer II are single crystal silicon with a crystal orientation (100), and the oxide layer I, the oxide layer II, the buried oxide layer I, and the buried oxide layer II are all silicon dioxide. The thickness of the inertia mass block 3 is equal to the total thickness of the SOI substrate; the thickness of the silicon substrate 1 is also equal to the total thickness of the SOI substrate; the cantilever beam 2 is respectively constructed on the single crystal silicon device layer I5 and the single crystal silicon device layer II9, and the thicknesses of the cantilever beam and the single crystal silicon device layer are the same. Four cantilever beams are symmetrically distributed on each device layer, and the upper and lower cantilever beams are not opposite and have a difference of 45 degrees.
After the sensitive structure is packaged with the glass substrate 13, the inertial mass block 3 and the cantilever beam 2 can be suspended and applied to a high-precision uniaxial optical micro-accelerometer; in the high-precision uniaxial optical micro-accelerometer, the sensitive structure is positioned right below the diffraction grating, the reflecting film on the upper surface of the inertial mass block and the diffraction grating form a grating interference diffraction cavity, and the optical displacement measuring unit formed by the grating interference diffraction cavity can obtain the magnitude of externally applied acceleration by measuring the displacement of the inertial mass block.
Because the double-layer cantilever beams of the MEMS acceleration sensitive structure for inhibiting the cross-axis crosstalk are symmetrically designed, when the inertial mass block is input by the insensitive axial acceleration, the upper and lower cantilever beams caused by the insensitive axial acceleration are subjected to torques with equal magnitude and opposite directions, so that the total torque is zero, the inertial mass block cannot generate extra torsion and sensitive axial displacement, the insensitive axial acceleration cannot influence subsequent optical displacement measurement and acceleration measurement, and the purpose of inhibiting the cross-axis crosstalk is achieved.
Meanwhile, the thickness of the device layer is very small relative to the thickness of the SOI, so that the micro acceleration sensitive structure can have high acceleration-displacement sensitivity.
Referring to fig. 4 to 12, the present invention further provides a micro-processing method for manufacturing the MEMS acceleration sensitive structure for suppressing cross-axis crosstalk, which specifically includes the following steps: FIG. 4: manufacturing a reflecting film on the upper surface of the SOI substrate, and manufacturing an electromagnetic feedback coil on the lower surface of the SOI substrate; FIG. 5 is a graph of an upper protective oxide layer of an upper cantilever beam formed by etching an oxide layer I4 in the SOI substrate; FIG. 6 is a schematic diagram of cantilever beam 2 formed on device layer I5 in the SOI substrate; FIG. 7 is a graph of a lower protective oxide layer of an upper cantilever beam formed by etching an oxide layer I6 in the SOI substrate; FIG. 8 is a graph of an upper protective oxide layer of a lower cantilever beam formed by etching an oxide layer II8 in the SOI substrate; FIG. 9 is a schematic diagram of a cantilever beam 2 formed on a lower device layer II9 in the SOI substrate; FIG. 10 illustrates the etching of oxide layer II10 in the SOI substrate to create a lower protective oxide layer pattern for the lower cantilever beam; FIG. 11 is a structure of a sensitive unit inertial mass block 3 manufactured on a device layer 7 in the SOI substrate; fig. 12 is a process of removing photoresist, cleaning, annealing, and bonding a glass substrate base 13 in the SOI substrate.
The specific implementation flow is as follows: before the step of fig. 4, standard RCA cleaning is required to be performed on the SOI substrate; when the step of fig. 4 is executed, firstly, the double-layer glue is used as a mask, a mask pattern for coating is made in a photoetching mode, then a chromium film and a gold film are respectively plated in a magnetron sputtering or electron beam evaporation mode, and finally, a stripping process is adopted to remove a metal film layer in a non-structural area, so that a reflection film 11 and a magnetic feedback coil 12 on the surface of the structure are obtained; when the step of fig. 5 is executed, firstly, the thin glue is used as a mask, the graph of the cantilever beam 2 is transferred to the oxide layer I4 of the SOI in a photoetching mode, and then the reaction ion beam etching is used for etching the shape structure of the cantilever beam on the oxide layer I4, wherein the shape structure is used as an upper protective layer of the cantilever beam 2; in performing the step of FIG. 6, the cantilever beam 2 is etched on the device layer I5 using deep reactive ion beam etching; when the step of fig. 7 is executed, the cantilever-shaped structure is etched on the oxide layer I6 by reactive ion beam etching, and the cantilever-shaped structure is used as a lower protection layer of the upper cantilever; when the step of fig. 8 is executed, the thick glue is used as a mask, the pattern of the cantilever beam 2 is transferred to the oxide layer II10 of the SOI in a reverse side overlay manner, and then the reactive ion beam etching is used to etch the shape structure of the cantilever beam on the oxide layer II10, which is used as an upper protection layer of the lower cantilever beam; when the step of fig. 9 is executed, the cantilever structure 2 is etched on the device layer II9 by deep reactive ion beam etching, which is not directly opposite to the upper cantilever and rotates 45 degrees relative to the upper cantilever; when the step of fig. 10 is executed, the cantilever-shaped structure is etched on the oxide layer II8 by reactive ion beam etching, which is used as a lower protection layer of the lower cantilever; in performing the step of fig. 11, the inertial mass 3 is etched on the base layer 7 using a deep reactive ion beam etching system; then, removing the residual exposed oxide layer in the SOI substrate by wet etching to release the cantilever beam and inertial mass block structure; and finally, releasing the residual stress of the sensitive structure through annealing.
Theoretically, the cross axis crosstalk of the MEMS acceleration sensitive structure for inhibiting the cross axis crosstalk is less than 0.01 percent, and when the thickness difference of the upper layer cantilever beam and the lower layer cantilever beam is not more than 0.5 mu m, the process error of the current SOI chip device layer manufacturing process is considered; in addition, the frequency separation ratio of the non-sensitive axis and sensitive axis working modes of the structure is about 12: compared with a single-layer structure, the improvement is more than 5 times, and the high-order mechanical modal disturbance resistance of the sensitive head can be effectively improved.
In summary, the present invention provides a sensitive structure based on a dual device layer SOI substrate for realizing low cross-axis crosstalk and a method for manufacturing the same. The invention makes the base 1, the cantilever beam 2 and the inertia mass block 3 on a specially designed seven-layer SOI substrate, and adopts the design of double-layer symmetrical distribution, when the inertia mass block 3 is accelerated in the direction of a non-sensitive shaft, the upper and lower cantilever beams will not be twisted by the equal and opposite moments, thus fundamentally eliminating the sensitive axial displacement and rotation of the mass block caused by the non-sensitive axial acceleration and inhibiting the cross-shaft crosstalk influence. The micro-processing manufacturing method provided by the invention is proved to be practical and effective by the embodiment and can be compatible with the IC process, and a foundation is laid for mass production.
The above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the invention, and any modifications, equivalents, improvements and the like that fall within the spirit and principle of the present invention are intended to be included therein.
Claims (10)
1. A sensitive structure with low cross-axis crosstalk is characterized in that the sensitive structure is positioned right below a diffraction grating in an optical micro-accelerometer, can be integrally packaged with the diffraction grating and is a passive device; the sensitive structure comprises: the mass inertia block, the silicon substrate, the cantilever beam and the glass substrate with the cavity;
a cavity is longitudinally arranged in the middle of the silicon substrate, and the inertia mass block is arranged in the cavity of the silicon substrate;
the cantilever beams are of a snake-shaped winding structure and comprise a plurality of cantilever beams, and two ends of each cantilever beam are respectively connected with the inertial mass block and the inner wall of the silicon substrate cavity; the outer edge of the glass substrate is fixedly connected with the outer edge of the silicon substrate, and the cavity of the glass substrate is communicated with the cavity of the silicon substrate.
2. The low cross-axis crosstalk sensitive structure of claim 1, wherein the proof mass and the silicon substrate are both fabricated by stacking seven layers of SOI substrates; the seven-layer SOI substrate sequentially comprises the following components from top to bottom: the device comprises an oxide layer I, a device layer I, an oxygen burying layer I, a substrate layer, an oxygen burying layer II, a device layer II and an oxide layer II;
the device layer I and the device layer II are monocrystalline silicon with the same thickness; the oxide layer I, the oxygen burying layer II and the oxide layer II are made of silicon dioxide with the same thickness.
3. The low cross-axis crosstalk sensitive structure of claim 2, wherein said cantilever beams comprise 8 and are divided into an upper layer and a lower layer; one end of the upper cantilever beam is integrally connected with the inner edge of the device layer I, and one end of the lower cantilever beam is integrally connected with the inner edge of the device layer II; the cantilever beams in the upper layer and the lower layer are symmetrically distributed.
4. The low cross-axis crosstalk sensitive structure of claim 3, wherein in the orthographic projection of 8 of said cantilevered beams, an included angle between two adjacent cantilevered beams is 45 °.
5. The low cross-axis crosstalk sensitive structure according to any of claim 4, wherein the cantilever beams have a thickness that is the same as the thickness of device layer I and device layer II.
6. The low cross-axis crosstalk sensitive structure of claim 1 wherein an upper surface of said inertial mass is plated with a reflective film and a lower surface of said inertial mass is plated with a feedback coil.
7. A method of fabricating a low cross-axis crosstalk sensitive structure according to any of claims 2-6, comprising the steps of:
manufacturing a reflecting film and a magnetic feedback coil in a mass block area on an SOI substrate by utilizing photoetching, film coating and stripping processes;
an upper protective layer of an upper cantilever beam is manufactured on an oxide layer I of the SOI substrate by photoetching and reactive ion beam etching;
etching an upper cantilever beam on a device layer I in the SOI substrate by utilizing deep reactive ion beams, wherein the thickness of the cantilever beam is the thickness of the device layer I;
etching a buried oxide layer I in the SOI substrate by utilizing reactive ion beams to manufacture a lower protective layer of the upper cantilever beam;
manufacturing an upper protective layer of the lower cantilever beam on an oxide layer II of the SOI substrate by reverse side overlay and reactive ion beam etching;
manufacturing a lower cantilever beam on a device layer II of the SOI substrate by utilizing deep reactive ion beam etching, wherein the lower cantilever beam is not opposite to the upper cantilever beam and rotates 45 degrees relative to the upper cantilever beam, and the thickness of the cantilever beam is the thickness of the device layer II;
etching the buried oxide layer II in the SOI substrate by utilizing reactive ion beams to manufacture a lower protective layer of the lower cantilever beam;
manufacturing an inertia mass block on a basal layer of the SOI substrate by utilizing deep reactive ion beam etching;
removing the remaining exposed oxide layer in the SOI substrate by wet etching to release the cantilever beam and mass block structure;
releasing the residual stress of the sensitive structure through annealing;
and encapsulating a cantilever beam-mass block-base structure processed by the SOI substrate and a glass substrate with a cavity manufactured in advance to form the uniaxial optical micro-accelerometer with low cross-axis crosstalk.
8. The method of fabricating a low cross-axis crosstalk sensitive structure according to claim 7,
before and after the etching of the cantilever beam structure of the device layer I is completed, the oxide layer I and the buried oxide layer I above and below the device layer I need to be pre-etched.
9. The method of fabricating a low cross-axis crosstalk sensitive structure according to claim 7,
after the etching of the cantilever beam structure of the device layer II is finished, pre-etching an oxide layer II and an oxygen buried layer II above and below the device layer II; and meanwhile, the residual glue covered on the cantilever beam pattern is used as a mask to carry out deep reactive ion beam etching on the substrate layer in the next step.
10. The method of fabricating a low cross-axis crosstalk sensitive structure according to claim 7,
when the oxide layer II of the SOI substrate is coated with glue, the thickness of the glue is ensured to be capable of bearing the etching of the oxide layer II, the device layer II, the oxygen buried layer II and the basal layer.
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