CN112419885A

CN112419885A - Electronic device

Info

Publication number: CN112419885A
Application number: CN202010775201.4A
Authority: CN
Inventors: 钟岳宏; 李珉泽; 郑圣谚; 陈品妏; 翁嘉鸿; 余悌魁; 徐雅玲; 廖烝贤
Original assignee: AU Optronics Corp
Current assignee: AU Optronics Corp
Priority date: 2019-08-20
Filing date: 2020-08-03
Publication date: 2021-02-26
Anticipated expiration: 2040-08-03
Also published as: DE112020003935T5; TWI718021B; DE112020003935B4; DE112020003937B4; TWI753482B; WO2021031838A1; KR102409301B1; DE112020003937T5; TW202109499A; KR20210038670A; KR102524241B1; TW202109476A; KR20210033039A; TWI738389B; WO2021031836A1; TWI729815B; TW202109493A; TW202109495A; CN112419885B

Abstract

The invention discloses an electronic device which comprises a substrate, a transverse signal line, a first longitudinal signal line, a second longitudinal signal line and a first shielding longitudinal line. The transverse signal line, the first longitudinal signal line, the second longitudinal signal line and the first shielding longitudinal line are all arranged on the substrate. The first longitudinal signal line intersects the second longitudinal signal line. The second vertical signal line is connected with one of the horizontal signal lines. The vertical projection of the first shielding longitudinal line on the substrate is positioned between the vertical projection of the first longitudinal signal line on the substrate and the vertical projection of the second longitudinal signal line on the substrate.

Description

Electronic device

Technical Field

The invention relates to an electronic device.

Background

With the popularization of electronic products, the circuit layout in various electronic devices is also complicated. Thus, many adjacent lines may be used to convey different types of signals. However, the coupling effect between adjacent lines often affects the quality of signal transmission, resulting in unexpected functionality. Therefore, the layout of the circuit layout is often one of the design points in the electronic product.

Disclosure of Invention

The present invention provides an electronic device that is designed to help reduce coupling between lines to provide improved quality.

The electronic device comprises a substrate, a plurality of transverse signal lines, a first longitudinal signal line, a second longitudinal signal line and a first shielding longitudinal line. The plurality of transverse signal lines, the first longitudinal signal lines, the second longitudinal signal lines and the first shielding longitudinal lines are all arranged on the substrate. The first longitudinal signal line intersects the transverse signal line. The second longitudinal signal line intersects with the transverse signal line, and the second longitudinal signal line is connected with one of the transverse signal lines. The vertical projection of the first shielding longitudinal line on the substrate is positioned between the vertical projection of the first longitudinal signal line on the substrate and the vertical projection of the second longitudinal signal line on the substrate.

In an embodiment of the invention, the electronic device further includes a plurality of pixel structures disposed on the substrate. One of the plurality of pixel structures is surrounded by two adjacent ones of the transverse signal lines and the second longitudinal signal line and includes a pixel electrode. The pixel electrode overlaps the first vertical signal line or the second vertical signal line in a direction perpendicular to the substrate.

In an embodiment of the invention, the pixel electrode overlaps the first shielding vertical line.

In an embodiment of the invention, the pixel electrode crosses over the second vertical signal line, the pixel electrode has a central main portion, and the second vertical signal line overlaps the central main portion.

In an embodiment of the invention, the first shielding vertical line is a transparent trace.

In an embodiment of the invention, the electronic device further includes a common electrode line. The common electrode line is configured on the substrate. The common electrode line is located between two adjacent ones of the plurality of transverse signal lines.

In an embodiment of the invention, the common electrode line intersects the first vertical signal line and the second vertical signal line.

In an embodiment of the invention, the first shielding vertical line and the common electrode line are directly stacked.

In an embodiment of the invention, the electronic device further includes at least one insulating layer and a conductive structure penetrating the insulating layer. The insulating layer is arranged between the first shielding longitudinal line and the common electrode line, and the conducting structure electrically connects the first shielding longitudinal line and the common electrode line.

In an embodiment of the invention, the electronic device further includes a plurality of pixel structures disposed on the substrate. One of the pixel structures is located between two adjacent ones of the plurality of lateral signal lines and includes a pixel electrode. The film layer of the first shielding longitudinal line is positioned between the film layer of the common electrode line and the film layer of the pixel electrode.

In an embodiment of the invention, the electronic device further includes a plurality of pixel structures disposed on the substrate. One of the pixel structures is located between two adjacent ones of the plurality of lateral signal lines and includes a pixel electrode. The film layer of the common electrode wire is positioned between the film layer of the first shielding longitudinal line and the film layer of the pixel electrode.

In an embodiment of the invention, the common electrode line includes a first line and a second line. The first shielded longitudinal line overlaps the first line, the second line, or both.

In an embodiment of the invention, the electronic device further includes a second shielding longitudinal line. The first longitudinal signal line is positioned between the first shielding longitudinal line and the second shielding longitudinal line.

In an embodiment of the invention, the electronic device further includes a third shielding longitudinal line. The third shielding longitudinal line is positioned between the first longitudinal signal line and the second shielding longitudinal line.

In an embodiment of the invention, the electronic device further includes a fourth vertical signal line. The vertical projection of the first longitudinal signal line and the third longitudinal signal line on the substrate is positioned between the vertical projection of the second longitudinal signal line on the substrate and the vertical projection of the fourth longitudinal signal line on the substrate.

In an embodiment of the invention, the electronic device further includes a shielding electrode. The shielding electrode is connected with the first shielding longitudinal line.

In an embodiment of the invention, the first shielding longitudinal line is completely located between two adjacent transverse signal lines.

In an embodiment of the invention, the electronic device further includes a plurality of pixel structures disposed on the substrate. One of the pixel structures includes a pixel electrode. The vertical projection of the first shielding longitudinal line on the substrate is positioned outside the vertical projection of the pixel electrode on the substrate.

In an embodiment of the invention, the electronic device further includes a plurality of pixel structures and a third vertical signal line. The pixel structure arrays are arranged on the substrate. The second longitudinal signal line is positioned between the third longitudinal signal line and the first longitudinal signal line, the second longitudinal signal line and the third longitudinal signal line are positioned between two adjacent rows of the plurality of pixel structures.

In an embodiment of the invention, the electronic device further includes a second shielding longitudinal line disposed on the substrate. The vertical projection of the second shielding longitudinal line on the substrate is positioned between the vertical projection of the second longitudinal signal line on the substrate and the vertical projection of the third longitudinal signal line on the substrate.

Based on the above, in the electronic device according to the embodiment of the invention, the shielding trace is disposed between the adjacent lines for transmitting different signals, so as to reduce adverse effects caused by coupling between the lines. Furthermore, in some embodiments, the shielding trace may be a transparent trace. Therefore, when the electronic device is used for displaying a picture, the display aperture ratio of the electronic device can be reduced without being influenced by the shielding wires.

Drawings

Fig. 1 is a partial top view of an electronic device.

Fig. 2 is a partial top view schematic diagram of an electronic device according to an embodiment of the disclosure.

FIG. 3 is a schematic diagram of one embodiment of a cross-section along line A-A of the electronic device of FIG. 2.

Fig. 4 is a schematic view of another embodiment of a cross section along the cross-sectional line a-a in the electronic device of fig. 2.

Fig. 5 to 10 are partial schematic views of an electronic device according to an embodiment of the disclosure.

FIG. 11 is a schematic diagram of another embodiment of a cross-section of the electronic device of FIG. 2 taken along section line B-B.

FIG. 12 is a schematic diagram of another embodiment of a cross-section of the electronic device of FIG. 2 taken along section line B-B.

Fig. 13 to 19 are partial schematic views of an electronic device according to an embodiment of the disclosure.

Fig. 20 schematically shows an embodiment of a cross-sectional structure of the electronic device of fig. 19 along the cross-sectional line C-C.

FIG. 21 schematically illustrates one embodiment of a cross-sectional configuration of the electronic device of FIG. 19 along cross-sectional line D-D.

Fig. 22 schematically shows another embodiment of the cross-sectional structure of the electronic device of fig. 19 along the cross-sectional line C-C.

Fig. 23 schematically shows another embodiment of the cross-sectional structure of the electronic device of fig. 19 along the cross-sectional line D-D.

Fig. 24 schematically shows a further embodiment of the cross-sectional structure of the electronic device of fig. 19 along the cross-sectional line C-C.

Fig. 25 schematically shows a further embodiment of the cross-sectional structure of the electronic device of fig. 19 along the cross-sectional line D-D.

Fig. 26 is a schematic top view of an electronic device according to an embodiment of the disclosure.

Fig. 27 is a top view of an electronic device according to an embodiment of the disclosure.

FIG. 28 schematically illustrates one embodiment of a cross-sectional structure of the electronic device of FIG. 27 along section line E-E.

FIG. 29 schematically illustrates one embodiment of a cross-sectional configuration of the electronic device of FIG. 27 along cross-sectional line E-E.

Fig. 30 is a schematic partial top view of an electronic device according to an embodiment of the disclosure.

Fig. 31 is a schematic partial top view of an electronic device according to an embodiment of the disclosure.

Fig. 32 schematically shows an embodiment of a cross section of the electronic device 200A of fig. 31 at a position of the first shielding vertical line 250A.

Fig. 33 schematically shows another embodiment of a cross section of the electronic device 200A of fig. 31 where the first vertical shielding line 250A is located.

Fig. 34 to 36 are schematic partial top views of an electronic device according to an embodiment of the disclosure.

Fig. 37 schematically shows an embodiment of a cross-sectional structure of the electronic device 300 where the first shielding longitudinal line 350A is located.

Fig. 38 schematically shows another embodiment of a cross-sectional structure of the electronic device 300 where the first shielding longitudinal line 350A is located.

Fig. 39 schematically shows another embodiment of the cross-sectional structure of the electronic device 300.

Wherein, the reference numbers:

100', 100A-100Q, 200A-200C, 300 electronic device

110. 210, 310: substrate

120. 320, and (3) respectively: transverse signal line

130. DL, VL1, VL 2: longitudinal signal line

132. 232, 332: first longitudinal signal line

134. 234, 334: second longitudinal signal line

136. 236, 336: third longitudinal signal line

138: fourth longitudinal signal line

140. 240, 340: pixel structure

142: active component

144. 244, 344: pixel electrode

150A-150D, 150K, 150L-150Q, 250A-250C, 350A: first shielding longitudinal line

150C1, 152C1, 150D1, 152D1, 150K1, 152K1, 150L1, 152L 1: extension part

150C2, 152C2, 150D2, 152D2, 150K2, 152K2, 150L2, 152L 2: overlapping part

152B to 152E, 152K to 152Q, and 252A to 252 c: second shielding longitudinal line

154E, 154G, 154P: shielding transverse wire

156F: third shielded longitudinal line

158M: shielding electrode

160: common electrode wire

162: first wire

164: second wire

244A: first sub-electrode

244B: second sub-electrode

A-A, B-B-, C-C, D-D, E-E: cutting line

BK: omitting blocks

CF: filter layer

D1: a first direction

D2: second direction

D3: thickness direction

I0-I3: insulating layer

MH: transverse trunk part

MV: longitudinal trunk

TH, VIA: conduction structure

SEC1, SEC 2: segment of

ST: stripe part

Detailed Description

The invention is described in detail below with reference to the drawings and specific examples, but the invention is not limited thereto.

Fig. 1 is a partial top view of an electronic device. In fig. 1, an electronic device 100' includes a substrate 110, a plurality of transverse signal lines 120, a plurality of longitudinal signal lines 130, and a plurality of pixel structures 140. The pixel structures 140 are disposed on the substrate 110 in an array arrangement. In other words, the pixel structures 140 are arranged in an array along the first direction D1 and the second direction D2 intersecting the first direction D1, wherein the first direction D1 can be understood as a transverse direction, and the second direction D2 can be understood as a longitudinal direction. Therefore, the lateral direction and the longitudinal direction described in the following embodiments can be regarded as the first direction D1 and the second direction D2 in fig. 1, respectively. Each pixel structure 140 is connected to one of the plurality of transverse signal lines 120. In addition, the plurality of vertical signal lines 130 may be divided into vertical signal lines DL directly connected to the pixel structures 140 and vertical signal lines VL not directly connected to the pixel structures 140. The pixel structures 140 aligned in a row along the second direction D2 are sandwiched between the two longitudinal signal lines DL, and each pixel structure 140 is connected to one of the longitudinal signal lines DL. In some embodiments, different pixel structures 140 arranged in the same column along the second direction D2 may be respectively connected to the longitudinal signal line DL at the first side and the longitudinal signal line DL at the opposite second side. Each vertical signal line VL is sandwiched between two columns of pixel structures 140 and between two vertical signal lines DL. In some embodiments, the vertical signal lines VL include, but are not limited to, the vertical signal lines VL1 connected to the horizontal signal lines 120 through the corresponding VIA structures VIA.

In some embodiments, each pixel structure 140 may include an active device 142 and a pixel electrode 144 connected to the active device 142, wherein each active device 142 may be a transistor having a gate, a source and a drain, the gate may be connected to one of the lateral signal lines 120, the source is connected to one of the longitudinal signal lines DL, and the drain is connected to the pixel electrode 144. In addition, each of the transverse signal lines 120 is connected to one of the longitudinal signal lines VL 1. Therefore, the signal of the gate of the active element 142 can be transmitted to the transverse signal line 120 through the longitudinal signal line VL1, and then input to the gate through the transverse signal line 120. Specifically, in order to avoid short circuit between the transverse signal line 120 and the longitudinal signal line 130, the transverse signal line 120 and the longitudinal signal line 130 may be formed of different film layers, and one or more insulating layers may be interposed between the transverse signal line 120 and the longitudinal signal line 130. In some embodiments, to transmit a signal from the vertical signal line VL1 to the horizontal signal line 120, a conductive structure VIA may be provided between the corresponding vertical signal line VL1 and the horizontal signal line 120. Thus, the signal required by the gate can be transmitted from the vertical signal line VL1 to the horizontal signal line 120 through the conducting structure VIA, and then transmitted to the gate through the horizontal signal line 120.

In some embodiments, the electronic device 100' may further include a driving circuit IC, and the driving circuit IC is located at one end of the vertical signal line 130. The vertical signal line DL and the vertical signal line VL1 can directly receive signals provided by the driving circuit IC, and the horizontal signal line 120 can receive corresponding signals through the vertical signal line VL 1. As a result, the electronic device 100 'can achieve a narrow frame design without providing wires or related circuits for transmitting signals at the two ends of the first direction D1, and the outline of the electronic device 100' is not limited. For example, from a top view perspective, the electronic device 100' may have a non-rectangular outline. In some embodiments, the vertical signal line VL in the electronic device 100' may further include a vertical signal line VL2, and the vertical signal line VL2 may not be used to transmit a signal required by the horizontal signal line 120, but may be input with a dc potential. For example, the vertical signal lines VL2 may not be connected to any of the horizontal signal lines 120, and may be applied to the implementation of touch control or other functions.

Fig. 2 is a partial top view schematic diagram of an electronic device according to an embodiment of the disclosure. The electronic device 100A of fig. 2 has a layout design substantially similar to that of the electronic device 100' of fig. 1, and therefore the same reference numerals are used to designate the same components in the description of the two devices. In fig. 2, the electronic device 100A includes a substrate 110, a plurality of horizontal signal lines 120, a plurality of vertical signal lines 130, a plurality of pixel structures 140, and a plurality of first shielding vertical lines 150A, wherein the plurality of horizontal signal lines 120, the plurality of vertical signal lines 130, the plurality of pixel structures 140, the plurality of first shielding vertical lines 150A, and the common electrode lines 160 are disposed on the substrate 110. The layout and connection relationship of the plurality of transverse signal lines 120, the plurality of longitudinal signal lines 130 and the plurality of pixel structures 140 are as described in fig. 1, for example, and are not repeated herein. For convenience of description, the signal lines around the single pixel structure 140 located in the middle in fig. 2 are mainly described below.

In the present embodiment, the extending direction of the transverse signal line 120 is, for example, the first direction D1 shown in fig. 1, and the extending direction of the longitudinal signal line 130 is, for example, the second direction D2 shown in fig. 1, wherein the transverse direction and the longitudinal direction intersect with each other, but the intersecting angle of the two is not limited to 90 degrees. The vertical signal lines 130 may include a first vertical signal line 132 and a second vertical signal line 134 located at one side of the pixel structures 140, wherein the first vertical signal line 132 is a vertical signal line directly connected to one of the pixel structures 140, and the second vertical signal line 134 may be connected to one of the horizontal signal lines 120 in the entire electronic device 100A. One of the pixel structures 140 is located between two adjacent ones of the transverse signal lines 120 and on one side of the second longitudinal signal line 134. The single pixel structure 140 may include an active device 142 and a pixel electrode 144, wherein three terminals of the active device 142 are respectively connected to the corresponding transverse signal line 120, the first longitudinal signal line 132 and the pixel electrode 144.

Here, the transverse signal line 120 is, for example, a scanning signal line for providing a scanning signal to the pixel structure 140, and the first longitudinal signal line 132 is for providing a data signal to the pixel structure 140. In other words, the first vertical signal line 132 and the second vertical signal line 134 are adjacent to each other, but are used for transmitting different types of signals. With such a circuit arrangement, the coupling of the first vertical signal line 132 and the second vertical signal line 134 may affect the signal transmission quality of each other. However, in the present embodiment, the vertical projection (i.e. the layout area in fig. 2) of the first shielding longitudinal line 150A on the substrate 110 is located between the vertical projection of the first longitudinal signal line 132 on the substrate 110 and the vertical projection of the second longitudinal signal line 134 on the substrate 110. In addition, the electronic device 100A may further include a common electrode line 160, and the first shielding vertical line 150A may be connected to the common electrode line 160 to be applied with a common potential. In this way, the first shielding vertical line 150A is disposed to help reduce the interference between the first vertical signal line 132 and the second vertical signal line 134 and to help ensure the signal transmission quality of the first vertical signal line 132 and the second vertical signal line 134, so that the functions (such as image display, touch sensing, etc.) performed by the electronic device can be expected. In fig. 2, the common electrode line 160 includes a first line 162 and a second line 164, wherein the first line 162 and the second line 164 are located between two adjacent transverse signal lines 120 and located on two opposite sides of the pixel structure 140. The first shielding longitudinal line 150A may overlap both the first line 162 and the second line 164, but not limited thereto.

In this embodiment, the vertical signal lines 130 may further include a third vertical signal line 136 and a fourth vertical signal line 138 on the other side of the pixel structure 140. The pixel structure 140 is located between the second vertical signal line 134 and the fourth vertical signal line 138, for example. The third longitudinal signal line 136 is located between the fourth longitudinal signal line 138 and the first longitudinal signal line 132. In addition, the vertical projection of the first vertical signal line 132 and the third vertical signal line 136 on the substrate 110 is located between the vertical projection of the second vertical signal line 134 on the substrate 110 and the vertical projection of the fourth vertical signal line 138 on the substrate 110. In addition, a shielding vertical line may not be disposed between the third vertical signal line 136 and the fourth vertical signal line 138, but this is not taken as an example. The third vertical signal line 136 is connected to other pixel structures in the same column, and the fourth vertical signal line 138 can be connected to a dc potential or one of the horizontal signal lines 120 in the whole electronic device 100A, but not limited thereto.

In the embodiment, the pixel electrode 144 of the pixel structure 140 may overlap the first vertical signal line 132, the second vertical signal line 134, the third vertical signal line 136, the fourth vertical signal line 138 and the first shielding vertical line 150A in a direction perpendicular to the substrate 110. Specifically, the pixel electrode 144 may cross the first vertical signal line 132, the first shielding vertical line 150A, and the third vertical signal line 136, and overlap a portion of the width of the second vertical signal line 134 and a portion of the width of the fourth vertical signal line 138. The first shielding vertical line 150A can be a transparent trace, so that the portion of the pixel electrode 144 overlapping the first shielding vertical line 150A can still be used as an effective display area. In this way, although the electronic device 100A is separately provided with the first shielding vertical line 150A, the display area is not reduced by the first shielding vertical line 150A.

In addition, in the present embodiment, the pixel electrode 144 may include a longitudinal main portion MV, a transverse main portion MH and a plurality of stripe portions ST, wherein the longitudinal main portion MV and the transverse main portion MH intersect in a cross shape to define four sub-regions, and the stripe portions ST are connected to the longitudinal main portion MV and the transverse main portion MH and extend from the longitudinal main portion MV and the transverse main portion MH in a substantially radial manner. However, in other embodiments, the pixel electrode 144 may have other patterns or be considered to be a complete rectangular shape.

FIG. 3 is a schematic diagram of one embodiment of a cross-section along line A-A of the electronic device of FIG. 2. As can be seen from fig. 2 and fig. 3, the common electrode line 160 is disposed on the substrate 110. In the present embodiment, the common electrode line 160 may be located in the same layer as the transverse signal line 120. The common electrode line 160 and the transverse signal line 120 are made of a material having good conductivity, such as a metal or an alloy. The common electrode line 160 and the transverse signal line 120 are located on a layer closer to the substrate 110 than other layers, for example, but not limited thereto.

After the common electrode line 160 and the transverse signal line 120 are manufactured, another conductive layer may be directly formed to manufacture the first shielding vertical line 150A, so that the first shielding vertical line 150A is directly overlapped on the common electrode line 160. In other words, the first shielding vertical line 150A directly contacts the common electrode line 160 without an intervening layer. The first shielding longitudinal line 150A may be a transparent conductive pattern. The material of the first shielding longitudinal line 150A may be metal oxide, for example: indium tin oxide, indium zinc oxide, aluminum tin oxide, aluminum zinc oxide, indium germanium zinc oxide, or other suitable oxide, or a stacked layer of at least two of the foregoing. Alternatively, the material of the first shielding longitudinal line 150A may be an organic transparent conductive material. In some embodiments, since the material of the first shielding vertical line 150A and the material of the common electrode line 160 have different properties, the common electrode line 160 and the transverse signal line are less likely to be damaged during the patterning process of the first shielding vertical line 150A. Therefore, the first shielding longitudinal line 150A may be directly stacked on the common electrode line 160 without an intermediate layer.

After the first shielding vertical line 150A is fabricated, an insulating layer I1 may be formed on the substrate 110, and then the vertical signal line 130 is fabricated. Here, the vertical signal line 130 intersects the horizontal signal line 120 and the common electrode line 160. The insulating layer I1 is thus provided to separate the vertical signal lines 130 from the common electrode lines 160 and also to separate the vertical signal lines 130 from the horizontal signal lines 120. In some embodiments, the insulating layer I1 may be made of an inorganic insulating material including silicon oxide, silicon nitride, or silicon oxynitride, or an organic insulating material including polymethyl methacrylate (PMMA), polyvinyl alcohol (PVA), polyvinyl phenol (PVP), or Polyimide (PI). The material of the vertical signal line 130 includes a material having good conductivity, such as metal or alloy.

After the vertical signal lines 130 are completed, one or more insulating layers or functional layers may be selectively formed on the substrate 110, wherein the insulating layer I2, the filter layer CF, and the insulating layer I3 are taken as an example in this embodiment, but not limited thereto. The insulating layers I2 and I3 may be made of inorganic insulating materials or organic insulating materials, wherein the inorganic insulating materials include silicon oxide, silicon nitride, or silicon oxynitride, and the organic insulating materials include polymethyl methacrylate (PMMA), polyvinyl alcohol (PVA), polyvinyl phenol (PVP), or Polyimide (PI). The filter layer CF may include color filter materials, such as red filter materials, green filter materials, and blue filter materials. In addition, the insulating layer I3 may have a thicker thickness for a flat layer, but not limited thereto.

The pixel electrode 144 may be formed on the insulating layer I3. The material of the pixel electrode 144 may include a transparent conductive material. The transparent conductive material may include metal oxides such as: indium tin oxide, indium zinc oxide, aluminum tin oxide, aluminum zinc oxide, indium germanium zinc oxide, or other suitable oxide, or a stacked layer of at least two of the foregoing. Alternatively, the transparent conductive material may be an organic transparent material. In some embodiments, the material of the pixel electrode 144 may be the same as the material of the first shielding vertical line 150A.

Fig. 4 is a schematic view of another embodiment of a cross section along the cross-sectional line a-a in the electronic device of fig. 2. In fig. 4, the first shielding vertical line 150A, the common electrode line 160, the insulating layer I1, the vertical signal line 130, the insulating layer I2, the filter layer CF, the insulating layer I3, and the pixel electrode 144 are sequentially stacked on the substrate 110. Specifically, the cross section of fig. 4 differs from the cross section of fig. 3 in the stacking order of the first shielding longitudinal line 150A and the common electrode line 160. Therefore, the material, stacking relationship, etc. of each film layer in the cross section of fig. 4 can be described with reference to fig. 3 without being repeated.

Fig. 5 is a partial schematic view of an electronic device according to an embodiment of the disclosure. The electronic device 100B of fig. 5 is substantially similar to the electronic device 100A of fig. 2, and thus reference is made to the same components described in the two embodiments. The electronic device 100B may include a substrate 110, a plurality of transverse signal lines 120, a plurality of longitudinal signal lines 130, a common electrode line 160, a first shielding longitudinal line 150B, and a second shielding longitudinal line 152B. Here, the vertical signal lines 130 may include a first vertical signal line 132, a second vertical signal line 134, a third vertical signal line 136, and a fourth vertical signal line 138. The relative relationship between the substrate 110, the transverse signal line 120, the first longitudinal signal line 132, the second longitudinal signal line 134, the third longitudinal signal line 136, the fourth longitudinal signal line 138, the pixel structure 140, the first shielding longitudinal line 150B and the common electrode line 160 can refer to the embodiment of fig. 2, and is not repeated here. Specifically, the present embodiment is different from the embodiment of fig. 2 in that the electronic device 100B further includes a second shielding longitudinal line 152B, and the length of the first shielding longitudinal line 150B is designed differently.

In the present embodiment, the first shielding longitudinal line 150B is located between the first longitudinal signal line 132 and the second longitudinal signal line 134, and the second shielding longitudinal line 152B is located between the third longitudinal signal line 136 and the fourth longitudinal signal line 138. In other words, the first longitudinal signal line 132 is located between the first shielding longitudinal line 150B and the second shielding longitudinal line 150B, and the third longitudinal signal line 136 is located between the first longitudinal signal line 132 and the second shielding longitudinal line 152B. The pixel structure 140 includes an active device 142 and a pixel electrode 144, and the second shielding vertical line 152B and the first shielding vertical line 150B are disposed on two opposite sides of the pixel electrode 144. In addition, the pixel electrode 144 may traverse the first shielding vertical line 150B and the second shielding vertical line 152B to extend to the second vertical signal line 134 and the fourth vertical signal line 138. In some embodiments, the first shielding vertical line 150B and the second shielding vertical line 152B are symmetrically distributed in the pixel structure 140, for example. That is, the distance from the first shielding vertical line 150B to the central axis of the pixel electrode 144 may be substantially the same as the distance from the second shielding vertical line 152B to the central axis of the pixel electrode 144, but not limited thereto.

In the present embodiment, the first shielding vertical line 150B and the second shielding vertical line 152B may both cross the first line 162 of the common electrode line 160, but do not cross the second line 164 of the common electrode line 160. In some embodiments, the first shielding longitudinal line 150B and the second shielding longitudinal line 152B may be spaced apart from the second line 164 by a distance. However, in other embodiments, the first longitudinal shielding line 150B and the second longitudinal shielding line 152B may both traverse the first line 162 and overlap the second line 164. Alternatively, in some other embodiments, the first shielding longitudinal line 150B and the second shielding longitudinal line 152B may both overlap the second line 164, but are both spaced apart from the first line 162. In general, the first shielding vertical line 150B and the second shielding vertical line 152B can receive a common potential to provide shielding effect as long as they can contact one or both of the first line 162 and the second line 164. In addition, the second shielding vertical line 152B may be a transparent conductive pattern, so that the pixel structure 140 can effectively display in the area of the second shielding vertical line 152B, and the effective display area of the pixel structure 140 is not reduced due to the arrangement of the second shielding vertical line 152B.

Fig. 6 is a partial schematic view of an electronic device according to an embodiment of the disclosure. The electronic device 100C of fig. 6 is substantially similar to the electronic device 100B of fig. 5, and thus reference is made to the same components described in the two embodiments. The electronic device 100C may include a substrate 110, a plurality of transverse signal lines 120, a plurality of longitudinal signal lines 130, a common electrode line 160, a first shielding longitudinal line 150C, and a second shielding longitudinal line 152C. Here, the vertical signal lines 130 may include a first vertical signal line 132, a second vertical signal line 134, a third vertical signal line 136, and a fourth vertical signal line 138. The relative relationship between the substrate 110, the transverse signal line 120, the first longitudinal signal line 132, the second longitudinal signal line 134, the third longitudinal signal line 136, the fourth longitudinal signal line 138, the pixel structure 140, the first shielding longitudinal line 150C, the second shielding longitudinal line 152C and the common electrode line 160 can refer to the foregoing embodiments, and is not repeated here. Specifically, the present embodiment is different from the embodiment of fig. 5 in that the widths of the first shielding vertical line 150C and the second shielding vertical line 152C in the electronic device 100C are designed differently.

In the present embodiment, the first shielding longitudinal line 150C has an extending portion 150C1 and an overlapping portion 150C2, the extending portion 150C1 extends in the gap between the first longitudinal signal line 132 and the second longitudinal signal line 134 and contacts the first line 162 of the common electrode line 160, and the overlapping portion 150C2 is connected to the extending portion 150C1 and overlaps the first longitudinal signal line 132. In addition, the second shielding longitudinal line 152C also has an extending portion 152C1 and an overlapping portion 152C2, the extending portion 152C1 extends in the gap between the third longitudinal signal line 136 and the fourth longitudinal signal line 138 and contacts the first line 162 of the common electrode line 160, and the overlapping portion 152C2 is connected to the extending portion 152C1 and overlaps the third longitudinal signal line 136. In the present embodiment, the overlapping portion 150C2 connects the middle section of the extending portion 150C1, and the overlapping portion 152C2 connects the middle section of the extending portion 152C1, but not limited thereto.

Fig. 7 is a partial schematic view of an electronic device according to an embodiment of the disclosure. The electronic device 100D of fig. 7 is substantially similar to the electronic device 100C of fig. 6, and thus reference is made to the same components described in the two embodiments. The electronic device 100D may include a substrate 110, a plurality of transverse signal lines 120, a plurality of longitudinal signal lines 130, a common electrode line 160, a first shielding longitudinal line 150D, and a second shielding longitudinal line 152D. Here, the vertical signal lines 130 may include a first vertical signal line 132, a second vertical signal line 134, a third vertical signal line 136, and a fourth vertical signal line 138. The relative relationship between the substrate 110, the transverse signal line 120, the first vertical signal line 132, the second vertical signal line 134, the third vertical signal line 136, the fourth vertical signal line 138, the pixel structure 140 and the common electrode line 160 can refer to the foregoing embodiments, and will not be repeated herein. Specifically, the present embodiment is different from the embodiment of fig. 6 in that the design of the first shielding longitudinal line 150D and the second shielding longitudinal line 152D at the overlapping portion in the electronic device 100D is different.

Specifically, the first shielding longitudinal line 150D has an extending portion 150D1 and an overlapping portion 150D2, the extending portion 150D1 extends in the gap between the first longitudinal signal line 132 and the second longitudinal signal line 134 and contacts the first line 162 of the common electrode line 160, and the overlapping portion 150D2 is connected to the extending portion 150D1 and overlaps the first longitudinal signal line 132. In addition, the overlapping portion 150D2 of the first shielding longitudinal line 150D may extend toward the second line 164 of the common electrode line 160 to overlap the second line 164. The second shielding longitudinal line 152D also has an extending portion 152D1 and an overlapping portion 152D2, the extending portion 152D1 extends in the gap between the third longitudinal signal line 136 and the fourth longitudinal signal line 138 and contacts the first line 162 of the common electrode line 160, and the overlapping portion 152D2 is connected to the extending portion 152D1 and overlaps the third longitudinal signal line 136. In addition, the overlapping portion 152D2 of the second shielding longitudinal line 152D may extend toward the second line 164 of the common electrode line 160 to overlap the second line 164.

Fig. 8 is a partial schematic view of an electronic device according to an embodiment of the disclosure. The electronic device 100E of fig. 8 is substantially similar to the electronic device 100B of fig. 5, and thus reference is made to the same components described in the two embodiments. The electronic device 100E may include a substrate 110, a plurality of transverse signal lines 120, a plurality of longitudinal signal lines 130, a common electrode line 160, a first shielding longitudinal line 150B, a second shielding longitudinal line 152B, and a shielding transverse line 154E. Here, the vertical signal lines 130 may include a first vertical signal line 132, a second vertical signal line 134, a third vertical signal line 136, and a fourth vertical signal line 138. The relative relationship between the substrate 110, the transverse signal line 120, the first longitudinal signal line 132, the second longitudinal signal line 134, the third longitudinal signal line 136, the fourth longitudinal signal line 138, the pixel structure 140, the first shielding longitudinal line 150B and the common electrode line 160 can refer to the embodiment of fig. 2, and the arrangement manner of the first shielding longitudinal line 150B and the second shielding longitudinal line 152B can refer to the embodiment of fig. 5, which is not repeated here. Specifically, the present embodiment is different from the embodiment of fig. 5 in that the electronic device 100E further includes a shielding transverse wire 154E.

The shielding transverse line 154E extends from the first shielding longitudinal line 150B in the transverse direction, crosses the first longitudinal signal line 132 and the third longitudinal signal line 136, and is connected to the second shielding longitudinal line 152B. The shielding transverse line 154E is connected to an intermediate portion of the first shielding longitudinal line 150B and to an intermediate portion of the second shielding longitudinal line 152B, so that the shielding transverse line 154E, the first shielding longitudinal line 150B, and the second shielding transverse line 152B form an H-shaped pattern. In the embodiment, the pixel electrode 144 of the pixel structure 140 has, for example, a transverse trunk MH, and an orthogonal projection of the shielding transverse line 154E on the substrate 110 may overlap an orthogonal projection of the transverse trunk MH on the substrate 110, but not limited thereto. In addition, the shielding horizontal line 154E may be a transparent conductive pattern, so that the pixel structure 140 can effectively display in the area of the shielding horizontal line 154E, without reducing the effective display area of the pixel structure 140 due to the arrangement of the shielding horizontal line 154E.

In some embodiments, since the shielding transverse line 154E connects the first shielding longitudinal line 150B and the second shielding transverse line 152B together, only one of the first shielding longitudinal line 150B and the second shielding transverse line 152B may be connected to the common electrode line 160. For example, only one of the first shielding longitudinal line 150B and the second shielding transverse line 152B may be connected to the first line 162 of the common electrode line 160, the second line 164 of the common electrode line 160, or both the first line 162 and the second line 164 of the common electrode line 160.

Fig. 9 is a partial schematic view of an electronic device according to an embodiment of the disclosure. The electronic device 100F of fig. 9 is substantially similar to the electronic device 100E of fig. 8, and thus reference is made to the same components described in the two embodiments. The electronic device 100F may include a substrate 110, a plurality of transverse signal lines 120, a plurality of longitudinal signal lines 130, a common electrode line 160, a first shielding longitudinal line 150B, a second shielding longitudinal line 152B, a shielding transverse line 154E, and a third shielding longitudinal line 156F. Here, the vertical signal lines 130 may include a first vertical signal line 132, a second vertical signal line 134, a third vertical signal line 136, and a fourth vertical signal line 138. The relative relationship between the substrate 110, the transverse signal line 120, the first longitudinal signal line 132, the second longitudinal signal line 134, the third longitudinal signal line 136, the fourth longitudinal signal line 138, the pixel structure 140 and the common electrode line 160 can refer to the embodiment in fig. 2, the arrangement manner of the first shielding longitudinal line 150B and the second shielding longitudinal line 152B can refer to the embodiment in fig. 5, and the arrangement manner of the shielding transverse line 154E can refer to the embodiment in fig. 8, which is not repeated here.

Specifically, the present embodiment is different from the embodiment of fig. 5 in that the electronic device 100F further includes a third shielding longitudinal line 156F. The third longitudinal shielding line 156F is located between the first longitudinal shielding line 150B and the second longitudinal shielding line 152B. The third shielding longitudinal line 156F may be connected to the shielding transverse line 154E, and the third shielding longitudinal line 156F and the shielding transverse line 154E are crossed to form a cross shape, but not limited thereto. In the present embodiment, the pixel electrode 144 of the pixel structure 140 has, for example, a longitudinal main portion MV and a transverse main portion MH, wherein an orthographic projection of the third shielding longitudinal line 156F on the substrate 110 may overlap an orthographic projection of the longitudinal main portion MV on the substrate 110, and an orthographic projection of the shielding transverse line 154E on the substrate 110 may overlap an orthographic projection of the transverse main portion MH on the substrate 110, but not limited thereto. In addition, the shielding horizontal line 154E and the third shielding vertical line 156F may be transparent conductive patterns, so that the pixel structure 140 can effectively display in the area of the shielding horizontal line 154E, without reducing the effective display area of the pixel structure 140 due to the arrangement of the shielding horizontal line 154E and the third shielding vertical line 156F.

Fig. 10 is a partial schematic view of an electronic device according to an embodiment of the disclosure. The electronic device 100G of fig. 10 is substantially similar to the electronic device 100A of fig. 2, and thus reference is made to the same components described in the two embodiments. The electronic device 100G may include a substrate 110, a plurality of transverse signal lines 120, a plurality of longitudinal signal lines 130, a common electrode line 160, a first shielding longitudinal line 150A, and a shielding transverse line 154G. Here, the vertical signal lines 130 may include a first vertical signal line 132, a second vertical signal line 134, a third vertical signal line 136, and a fourth vertical signal line 138. The relative relationship among the substrate 110, the transverse signal line 120, the first vertical signal line 132, the second vertical signal line 134, the third vertical signal line 136, the fourth vertical signal line 138, the pixel structure 140, the first shielding vertical line 150A and the common electrode line 160 can refer to the embodiment of fig. 2, and will not be repeated here.

Specifically, the present embodiment is different from the embodiment of fig. 2 in that the electronic device 100G further includes a shielding transverse wire 154G. The transverse shielding line 154G extends from the first longitudinal shielding line 150A to the transverse direction to cross the first longitudinal signal line 132, and the transverse shielding line 154G is connected to the end of the first longitudinal shielding line 150A. The orthographic projection of the shielding transverse line 154G on the substrate 110 may overlap the orthographic projection of the second line 164 of the common electrode line 160 on the substrate 110, and the arrangement may be entirely within the orthographic projection of the second line 164 of the common electrode line 160 on the substrate 110.

FIG. 11 is a schematic diagram of another embodiment of a cross-section of the electronic device of FIG. 2 taken along section line B-B. In fig. 11, the common electrode line 160, the transverse shielding line 154G, the insulating layer I1, the vertical signal line 130, the insulating layer I2, the filter layer CF, the insulating layer I3, and the pixel electrode 144 are sequentially stacked on the substrate 110, wherein the transverse shielding line 154G and the first vertical shielding line 150A are the same layer. The material of each film layer in this embodiment can be described with reference to fig. 3 and 4, and is not repeated. In the cross section of fig. 11, the section SEC1 shows the order in which the layers are stacked when the transverse shielding line 154G overlaps both the longitudinal signal line 130 and the common electrode line 160. Meanwhile, segment SEC2 shows the stacking sequence of the layers when the first shielding longitudinal line 150A and the shielding transverse line 154G overlap the common electrode line 160, wherein the number of layers and the stacking sequence of the layers in segment SEC2 are substantially the same as those in the cross-sectional structure of fig. 3. In the section SEC1, the shield transverse line 154G overlaps the first longitudinal signal line 132 in the thickness direction. However, an insulating layer I1 is provided between the shield transverse line 154G and the first longitudinal signal line 132. Therefore, the shield transverse line 154G and the first longitudinal signal line 132 are not short-circuited to each other.

FIG. 12 is a schematic diagram of another embodiment of a cross-section of the electronic device of FIG. 2 taken along section line B-B. In fig. 12, the transverse shielding line 154G, the common electrode line 160, the insulating layer I1, the longitudinal signal line 130, the insulating layer I2, the filter layer CF, the insulating layer I3, and the pixel electrode 144 are sequentially stacked on the substrate 110. Specifically, the cross section of fig. 12 differs from that of fig. 11 in the stacking order of the shield lateral lines 154G and the common electrode lines 160. Therefore, the material, stacking relationship, etc. of each film layer in the cross section of fig. 12 can be described with reference to fig. 11 without being repeated. In the cross-section of fig. 12, section SEC1 shows the film layers stacked in order with transverse shield line 154G overlapping both longitudinal signal lines 130 and common electrode lines 160. Meanwhile, segment SEC2 shows the stacking sequence of the layers when the first shielding longitudinal line 150A and the shielding transverse line 154G overlap the common electrode line 160, wherein the number of layers and the stacking sequence of the layers in segment SEC2 are substantially the same as those in the cross-sectional structure of fig. 4.

In section SEC1 of fig. 11 and 12, the overlapping relationship and film-layer stacking order of shielding horizontal lines 154G and longitudinal signal lines 130 may be applied to any of the embodiments of fig. 6 to 9. For example, the common electrode line 160 in the segment SEC1 is removed to form the cross-sectional structure of the overlapping portions 150C2 and 150D2 overlapping the first longitudinal signal line 132 in the embodiments of fig. 6 and 7. For example, the cross-sectional structure of the overlapping portions 150C2 and 150D2 overlapping the first vertical signal line 132 may include the substrate 110, the overlapping portion 150C2 or 150D2, the insulating layer I1, the first vertical signal line 132, the insulating layer I2, the filter layer CF, the insulating layer I3, and the pixel electrode 144 stacked in sequence. The overlapping portions 152C2 and 152D2 in the embodiment of fig. 6 and 7 overlap the cross-sectional structure of the third longitudinal signal line 134, and the shielding transverse line 154E in the embodiment of fig. 8 and 9 overlaps the cross-sectional structure of the first longitudinal signal line 132 and the third longitudinal signal line 136. For example, the cross-sectional structure of the overlapping portions 150C2 and 150D2 overlapping the third vertical signal line 134 may include the substrate 110, the overlapping portion 150C2 or 150D2, the insulating layer I1, the third vertical signal line 134, the insulating layer I2, the filter layer CF, the insulating layer I3, and the pixel electrode 144, which are sequentially stacked.

Fig. 13 is a partial schematic view of an electronic device according to an embodiment of the disclosure. The electronic device 100H of fig. 13 is substantially similar to the electronic device 100G of fig. 10, and thus reference is made to the same components described in the two embodiments. The electronic device 100H may include a substrate 110, a plurality of transverse signal lines 120, a plurality of longitudinal signal lines 130, a common electrode line 160, a first shielding longitudinal line 150A, a shielding transverse line 154G, and a second shielding longitudinal line 152B. Here, the vertical signal lines 130 may include a first vertical signal line 132, a second vertical signal line 134, a third vertical signal line 136, and a fourth vertical signal line 138. The relative relationship among the substrate 110, the transverse signal line 120, the first vertical signal line 132, the second vertical signal line 134, the third vertical signal line 136, the fourth vertical signal line 138, the pixel structure 140, the first shielding vertical line 150A and the common electrode line 160 can refer to the foregoing embodiments, and will not be repeated herein. Specifically, the present embodiment is different from the embodiment shown in fig. 10 in that the electronic device 100H further includes a second shielding longitudinal line 152H.

In the present embodiment, the first shielding longitudinal line 150A is located between the first longitudinal signal line 132 and the second longitudinal signal line 134, and the second shielding longitudinal line 152H is located between the third longitudinal signal line 136 and the fourth longitudinal signal line 138. The shielding transverse line 154G is connected between the end of the first shielding longitudinal line 150A and the end of the second shielding longitudinal line 152H to form a U-shaped pattern, but not limited thereto. The pixel structure 140 includes an active device 142 and a pixel electrode 144, and the first shielding vertical line 150A and the second shielding vertical line 152H are disposed on two opposite sides of the pixel electrode 144. The pixel electrode 144 may traverse the first vertical shielding line 150A and the second vertical shielding line 152H. The first shielding longitudinal line 150A and the second shielding longitudinal line 152H are made of transparent conductive materials, so that the display area of the pixel structure 140 is not shielded by the region where the first shielding longitudinal line 150A and the second shielding longitudinal line 152H are located, which is helpful to ensure the display effect of the electronic device 100H.

In the present embodiment, the U-shaped pattern formed by connecting the transverse shielding line 154G, the first longitudinal shielding line 150A and the second longitudinal shielding line 152H overlaps both the first line 162 of the common electrode line 160 and the second line 164 of the common electrode line 160, and the first longitudinal shielding line 150A and the second longitudinal shielding line 152H even cross the first line 162, but this is not taken as an example. In some embodiments, only one or two of the shielding transverse line 154G, the first shielding longitudinal line 150A and the second shielding longitudinal line 152H may overlap and contact the common electrode line 160. For example, the first shielding longitudinal line 150A and the second shielding longitudinal line 152H may have different lengths, such that one of the first shielding longitudinal line 150A and the second shielding longitudinal line 152H crosses the first line 162 and the other is spaced apart from the first line 162. Alternatively, in other embodiments, the shielding transverse line 154G connected between the first shielding longitudinal line 150A and the second shielding longitudinal line 152H may not overlap the second line 164.

Fig. 14 is a partial schematic view of an electronic device according to an embodiment of the disclosure. The electronic device 100I of fig. 14 is substantially similar to the electronic device 100H of fig. 13, and thus reference is made to the same components described in the two embodiments. The electronic device 100I may include a substrate 110, a plurality of transverse signal lines 120, a plurality of longitudinal signal lines 130, a common electrode line 160, a first shielding longitudinal line 150A, a shielding transverse line 154G, a second shielding longitudinal line 152H, and a shielding transverse line 154E. Here, the vertical signal lines 130 may include a first vertical signal line 132, a second vertical signal line 134, a third vertical signal line 136, and a fourth vertical signal line 138. The relative relationship between the substrate 110, the transverse signal line 120, the first vertical signal line 132, the second vertical signal line 134, the third vertical signal line 136, the fourth vertical signal line 138, the pixel structure 140, the first shielding vertical line 150A and the common electrode line 160 can refer to the foregoing embodiments, and will not be repeated herein.

Specifically, the present embodiment is different from the embodiment of fig. 13 in that the electronic device 100H further includes a shielding transverse wire 154E, wherein the shielding transverse wire 154E is disposed in a manner substantially the same as the shielding transverse wire 154E in fig. 8. The shielding transverse line 154E extends from the first shielding longitudinal line 150A in the transverse direction, crosses the first longitudinal signal line 132 and the third longitudinal signal line 136, and is connected to the second shielding longitudinal line 152H. The shield transverse line 154E is connected to an intermediate portion of the first shield longitudinal line 150A and to an intermediate portion of the second shield longitudinal line 152H. The pixel electrode 144 of the pixel structure 140 has, for example, a transverse trunk MH and a longitudinal trunk MV, the transverse trunk MH and the longitudinal trunk MV intersect in a cross shape, and an orthographic projection of the shielding transverse line 154E on the substrate 110 may overlap an orthographic projection of the transverse trunk MH on the substrate 110, but not limited thereto.

Fig. 15 is a partial schematic view of an electronic device according to an embodiment of the disclosure. The electronic device 100J of fig. 15 is substantially similar to the electronic device 100I of fig. 14, and thus reference is made to the same components described in the two embodiments. The electronic device 100J may include a substrate 110, a plurality of transverse signal lines 120, a plurality of longitudinal signal lines 130, a common electrode line 160, a first shielding longitudinal line 150A, a shielding transverse line 154G, a second shielding longitudinal line 152H, a shielding transverse line 154E, and a third shielding longitudinal line 156F. Here, the vertical signal lines 130 may include a first vertical signal line 132, a second vertical signal line 134, a third vertical signal line 136, and a fourth vertical signal line 138. The relative relationship between the substrate 110, the transverse signal line 120, the first vertical signal line 132, the second vertical signal line 134, the third vertical signal line 136, the fourth vertical signal line 138, the pixel structure 140, the first shielding vertical line 150A and the common electrode line 160 can refer to the foregoing embodiments, and will not be repeated herein.

Specifically, the present embodiment is different from the embodiment of fig. 13 in that the electronic device 100H further includes a third shielding longitudinal line 156F, wherein the third shielding longitudinal line 156F is disposed in a manner substantially the same as the third shielding longitudinal line 156F in fig. 9. The third longitudinal shielding line 156F is located between the first longitudinal shielding line 150A and the second longitudinal shielding line 152H. The third shielding longitudinal line 156F may be connected to the shielding transverse line 154E, and the third shielding longitudinal line 156F and the shielding transverse line 154E are crossed to form a cross shape, but not limited thereto. In the present embodiment, the pixel electrode 144 of the pixel structure 140 has, for example, a longitudinal main portion MV and a transverse main portion MH, wherein an orthographic projection of the third shielding longitudinal line 156F on the substrate 110 may overlap an orthographic projection of the longitudinal main portion MV on the substrate 110, and an orthographic projection of the shielding transverse line 154E on the substrate 110 may overlap an orthographic projection of the transverse main portion MH on the substrate 110, but not limited thereto.

Fig. 16 is a partial schematic view of an electronic device according to an embodiment of the disclosure. The electronic device 100K of fig. 16 is substantially similar to the electronic device 100H of fig. 13, and thus reference is made to the same components described in the two embodiments. The electronic device 100K may include a substrate 110, a plurality of transverse signal lines 120, a plurality of longitudinal signal lines 130, a common electrode line 160, a first shielding longitudinal line 150K, a shielding transverse line 154G, and a second shielding longitudinal line 152K. Here, the vertical signal lines 130 may include a first vertical signal line 132, a second vertical signal line 134, a third vertical signal line 136, and a fourth vertical signal line 138. The relative relationship between the substrate 110, the transverse signal line 120, the first vertical signal line 132, the second vertical signal line 134, the third vertical signal line 136, the fourth vertical signal line 138, the pixel structure 140, the first shielding vertical line 150A and the common electrode line 160 can refer to the foregoing embodiments, and will not be repeated herein.

Specifically, in the present embodiment, the layout and pattern design of the first shielding vertical line 150K and the second shielding vertical line 152K are substantially the same as those of the first shielding vertical line 150C and the second shielding vertical line 152C shown in fig. 6. However, in the electronic device 100K, the first shielding longitudinal line 150K and the first shielding longitudinal line 152K may extend to the second line 164 overlapping the common electrode line 160 and be connected together at their ends by the shielding transverse line 154G.

The first shielding longitudinal line 150K has an extension portion 150K1 and an overlapping portion 150K2, the extension portion 150K1 extends in the gap between the first longitudinal signal line 132 and the second longitudinal signal line 134 and contacts the first line 162 and the second line 164 of the common electrode line 160, and the overlapping portion 150K2 is connected to the extension portion 150K1 and overlaps the first longitudinal signal line 132. In addition, the second shielding longitudinal line 152K also has an extending portion 152K1 and an overlapping portion 152K2, the extending portion 152K1 extends in the gap between the third longitudinal signal line 136 and the fourth longitudinal signal line 138 and contacts the first line 162 of the common electrode line 160, and the overlapping portion 152K2 is connected to the extending portion 152K1 and overlaps the third longitudinal signal line 136. In the present embodiment, the overlapping portion 150K2 connects the middle section of the extending portion 150K1, and the overlapping portion 152K2 connects the middle section of the extending portion 152K1, but not limited thereto.

Fig. 17 is a partial schematic view of an electronic device according to an embodiment of the disclosure. The electronic device 100L of fig. 17 is substantially similar to the electronic device 100H of fig. 13, and thus reference is made to the same components described in the two embodiments. The electronic device 100L may include a substrate 110, a plurality of transverse signal lines 120, a plurality of longitudinal signal lines 130, a common electrode line 160, a first shielding longitudinal line 150L, a shielding transverse line 154G, and a second shielding longitudinal line 152L. Here, the vertical signal lines 130 may include a first vertical signal line 132, a second vertical signal line 134, a third vertical signal line 136, and a fourth vertical signal line 138. The relative relationship between the substrate 110, the transverse signal line 120, the first vertical signal line 132, the second vertical signal line 134, the third vertical signal line 136, the fourth vertical signal line 138, the pixel structure 140, the first shielding vertical line 150A and the common electrode line 160 can refer to the foregoing embodiments, and will not be repeated herein.

In the present embodiment, the layout and pattern design of the first shielding vertical line 150L and the second shielding vertical line 152L are substantially the same as those of the first shielding vertical line 150D and the second shielding vertical line 152D in fig. 7. The first shielding longitudinal line 150L may include an extension portion 150L1 between the first longitudinal signal line 132 and the second longitudinal signal line 134 and an overlap portion 150L2 overlapping the first longitudinal signal line 132. The second shielding longitudinal line 152L may include an extension portion 152L1 between the third longitudinal signal line 136 and the fourth longitudinal signal line 138 and an overlapping portion 152L2 overlapping the third longitudinal signal line 136. Further, the end of the first vertical shielding line 150L and the end of the second vertical shielding line 152L are connected by a horizontal shielding line 154G.

Fig. 18 is a partial schematic view of an electronic device according to an embodiment of the invention. The electronic device 100M in fig. 18 includes a substrate 110, a transverse signal line 120, a first vertical signal line 132, a second vertical signal line 134, a third vertical signal line 136, a fourth vertical signal line 138, a pixel structure 140, a first shielding vertical line 150M, a second shielding vertical line 152M, a shielding electrode 158M, and a common electrode line 160 including a first line 162 and a second line 164. In the present embodiment, the substrate 110, the transverse signal line 120, the first vertical signal line 132, the second vertical signal line 134, the third vertical signal line 136, the fourth vertical signal line 138, the pixel structure 140 and the common electrode line 160 are substantially the same as those in the embodiment of fig. 2, and therefore, specific structures, materials and relative arrangement relationships of these components can be described with reference to fig. 2, which is not repeated herein.

In fig. 18, the vertical projection of the first shielding longitudinal line 150M on the substrate 110 is located between the vertical projection of the first longitudinal signal line 132 on the substrate 110 and the vertical projection of the second longitudinal signal line 134 on the substrate 110, and the vertical projection of the second shielding longitudinal line 152M on the substrate 110 is located between the vertical projection of the third longitudinal signal line 136 on the substrate 110 and the vertical projection of the fourth longitudinal signal line 138 on the substrate 110. In addition, the first shielding vertical line 150M and the second shielding vertical line 152M are connected to the shielding electrode 158M, and the first shielding vertical line 150M and the second shielding vertical line 152M may extend toward the corresponding transverse signal line 120 and traverse the first line 162 of the common electrode line 160.

The shield electrode 158M is, for example, a full-face electrode, and traverses the first longitudinal signal line 132 and the third longitudinal signal line 136. The shielding electrode 158M is located substantially between the second longitudinal signal line 134 and the fourth longitudinal signal line 138 without overlapping the second longitudinal signal line 134 and the fourth longitudinal signal line 138. The orthographic projection of shield electrode 158M on substrate 110 overlaps the orthographic projection of pixel electrode 144 of pixel structure 140 on substrate 110. The shielding electrode 158M, the first shielding longitudinal line 150M and the second shielding longitudinal line 152M are integrally connected, and may be made of a transparent conductive material, for example. Therefore, although the shielding electrode 158M overlaps most of the area of the pixel electrode 144, it does not affect the effective display area of the pixel structure 140.

Fig. 19 is a partial schematic view of an electronic device according to an embodiment of the disclosure. The electronic device 100N of fig. 19 includes a substrate 110, a transverse signal line 120, a first longitudinal signal line 132, a second longitudinal signal line 134, a third longitudinal signal line 136, a fourth longitudinal signal line 138, a pixel structure 140 including an active device 142 and a pixel electrode 144, a first shielding longitudinal line 150N, a second shielding longitudinal line 152N, and a common electrode line 160 including a first line 162 and a second line 164. In the present embodiment, the arrangement, structure and stacking sequence of the substrate 110, the transverse signal line 120, the first vertical signal line 132, the second vertical signal line 134, the third vertical signal line 136, the fourth vertical signal line 138, the pixel structure 140 and the common electrode line 160 are substantially the same as those of the embodiment of fig. 2, and therefore the description thereof is provided with reference to fig. 2.

In the present embodiment, an orthographic projection of the first shielding longitudinal line 150N on the substrate 110 is located between an orthographic projection of the first longitudinal signal line 132 on the substrate 110 and an orthographic projection of the second longitudinal signal line 134 on the substrate 110, and an orthographic projection of the second shielding longitudinal line 152N on the substrate 110 is located between an orthographic projection of the third longitudinal signal line 136 on the substrate 110 and an orthographic projection of the fourth longitudinal signal line 138 on the substrate 110. In addition, the first shielding vertical line 150N and the second shielding vertical line 152N both cross and intersect the transverse signal line 120 and the first line 162 and the second line 164 of the common electrode line 160.

The transverse signal lines 120 and the common electrode lines 160 may be made of the same film, wherein the signals transmitted by the transverse signal lines 120 are scanning signals provided to the active devices 142, and the signals transmitted by the common electrode lines 160 are common potentials. The first shielding vertical line 150N and the second shielding vertical line 152N intersecting the horizontal signal line 120 and the common electrode line 160 must avoid electrical short-circuiting with the horizontal signal line 120 and the common electrode line 160. Therefore, the film layers of the first vertical shielding line 150N and the second vertical shielding line 152N may be different from the film layers of the transverse signal line 120 and the common electrode line 160. In addition, in the present embodiment, the first shielding vertical line 150N and the second shielding vertical line 152N may be electrically connected to the common electrode line 160 through the conducting structure TH to receive the common potential, but not limited thereto. In some embodiments, the conducting structure TH in the electronic device 100N may be omitted, and the first shielding vertical line 150N and the second shielding vertical line 152N may extend to a driving circuit (e.g., the driving circuit IC shown in fig. 1) of the electronic device 100N, and the driving circuit directly provides the required potential to the first shielding vertical line 150N and the second shielding vertical line 152N.

Fig. 20 schematically shows an embodiment of a cross-sectional structure of the electronic device of fig. 19 along cross-sectional line C-C, and fig. 21 schematically shows an embodiment of a cross-sectional structure of the electronic device of fig. 19 along cross-sectional line D-D. As shown in fig. 19, 20 and 21, the first shielding vertical line 150N, the insulating layer I0, the common electrode line 160, the insulating layer I1, the first vertical signal line 132, the insulating layer I2, the filter layer CF, the insulating layer I3 and the pixel electrode 144 are sequentially stacked on the substrate 110. The insulating layer I0, the insulating layer I1, the insulating layer I2, and the insulating layer I3 may be made of an inorganic insulating material or an organic insulating material, wherein the inorganic insulating material includes silicon oxide, silicon nitride, silicon oxynitride, or the like, and the organic insulating material includes polymethyl methacrylate (PMMA), polyvinyl alcohol (PVA), polyvinyl phenol (PVP), Polyimide (PI), or the like. The filter layer CF may include color filter materials, such as red filter materials, green filter materials, and blue filter materials. The material of the common electrode line 160 and the first longitudinal signal line 132 includes a metal or an alloy. The materials of the first shielding vertical line 150N and the pixel electrode 144 include transparent conductive materials. In addition, the layers of the transverse signal line 120 in fig. 19 are the same as the layers of the common electrode line 160, and the second shielding vertical line 152N in fig. 19 may be stacked in the same manner as the first shielding vertical line 150N in the cross-sectional structure.

As shown in fig. 20, the via structure TH electrically connects the first shielding vertical line 150N and the first line 162 of the common electrode line 160, and the via structure TH is a conductor structure penetrating through the insulating layer I0. Thus, the layers of the first shielding vertical line 150N are different from the layers of the common electrode line 160 and can be electrically connected to the common electrode line 160. When the common electrode line 160 and the transverse signal line 120 are the same, the first shielding vertical line 150N is not connected to the transverse signal line 120, and the transverse signal line 120 and the common electrode line 160 can be electrically independent from each other.

Fig. 22 schematically shows another embodiment of a cross-sectional structure of the electronic device of fig. 19 along a cross-sectional line C-C, and fig. 23 schematically shows another embodiment of a cross-sectional structure of the electronic device of fig. 19 along a cross-sectional line D-D. As shown in fig. 19, 22 and 23, the common electrode line 160, the insulating layer I1, the first vertical shielding line 150N, the insulating layer I2, the filter layer CF, the insulating layer I3 and the pixel electrode 144 are sequentially stacked on the substrate 110. In fig. 19, the layers of the transverse signal line 120 are the same as the layers of the common electrode line 160, and the second shielding vertical line 152N in fig. 19 may be stacked in the same manner as the first shielding vertical line 150N in the cross-sectional structure. In the present embodiment, the material of each film layer can be described with reference to fig. 20 and 21.

As shown in fig. 22, the via structure TH electrically connects the first shielding vertical line 150N and the first line 162 of the common electrode line 160, and the via structure TH is a conductor structure penetrating through the insulating layer I1. Thus, the layers of the first shielding vertical line 150N are different from the layers of the common electrode line 160 and can be electrically connected to the common electrode line 160. When the common electrode line 160 and the transverse signal line 120 are the same, the first shielding vertical line 150N is not connected to the transverse signal line 120, and the transverse signal line 120 and the common electrode line 160 can be electrically independent from each other.

In addition, in the present embodiment, the first vertical signal line 132 and the first shielding vertical line 150N are sandwiched between the insulating layer I1 and the insulating layer I2. However, the first longitudinal signal line 132 and the first shielding longitudinal line 150N may be made of different films. Therefore, the first longitudinal signal line 132 and the first shielding longitudinal line 150N may be members of different materials. For example, the material of the first vertical signal line 132 may include metal, alloy, etc., and the material of the first shielding vertical line 150N may include metal oxide, conductive material, etc. transparent conductive material.

Fig. 24 schematically shows a further embodiment of the cross-sectional structure of the electronic device of fig. 19 along the cross-sectional line C-C, and fig. 25 schematically shows a further embodiment of the cross-sectional structure of the electronic device of fig. 19 along the cross-sectional line D-D. As can be seen from fig. 19, 24 and 25, the first line 162 and the second line 164 of the common electrode line 160, the insulating layer I1, the first vertical signal line 132, the insulating layer I2, the first shielding vertical line 150N, the filter layer CF, the insulating layer I3 and the pixel electrode 144 are sequentially stacked on the substrate 110. In fig. 19, the layers of the transverse signal line 120 are the same as the layers of the common electrode line 160, and the second shielding vertical line 152N in fig. 19 may be stacked in the same manner as the first shielding vertical line 150N in the cross-sectional structure. In the present embodiment, the material of each film layer can be described with reference to fig. 20 and 21. In the present embodiment, the layer of the first shielding vertical line 150N is disposed on the insulating layer I2, and the layer of the common electrode line 160 is disposed under the insulating layer I1. Therefore, the conductive structure TH for electrically connecting the first shielding vertical line 150N to the common electrode line 160 may penetrate the insulating layer I1 and the insulating layer I2.

Fig. 20, fig. 22 and fig. 24 respectively show embodiments of the first shielding vertical line 150N in different stacking orders, but the disclosure is not limited thereto. In addition, the conducting structure TH may be omitted in some embodiments, and the first shielding vertical line 150N and the second shielding vertical line 152N may extend to a driving circuit disposed at the periphery of the electronic device 100N to receive a required signal.

Fig. 26 is a schematic top view of an electronic device according to an embodiment of the disclosure. The electronic device 100O of fig. 26 includes a substrate 110, a transverse signal line 120, a first longitudinal signal line 132, a second longitudinal signal line 134, a third longitudinal signal line 136, a fourth longitudinal signal line 138, a pixel structure 140 including an active device 142 and a pixel electrode 144, a first shielding longitudinal line 150O, a second shielding longitudinal line 152O, and a common electrode line 160 including a first line 162 and a second line 164. In the present embodiment, the arrangement, structure and stacking sequence of the substrate 110, the transverse signal line 120, the first vertical signal line 132, the second vertical signal line 134, the third vertical signal line 136, the fourth vertical signal line 138, the pixel structure 140 and the common electrode line 160 are substantially the same as those of the embodiment of fig. 19, and therefore, the related description is provided with reference to fig. 19 and the related description thereof.

In the present embodiment, an orthographic projection of the first shielding longitudinal line 150O on the substrate 110 is located between an orthographic projection of the first longitudinal signal line 132 on the substrate 110 and an orthographic projection of the second longitudinal signal line 134 on the substrate 110, and an orthographic projection of the second shielding longitudinal line 152O on the substrate 110 is located between an orthographic projection of the third longitudinal signal line 136 on the substrate 110 and an orthographic projection of the fourth longitudinal signal line 138 on the substrate 110. The first vertical shielding line 150O and the second vertical shielding line 152O do not overlap the transverse signal line 120 and do not overlap the second line 164 of the common electrode line 160.

In addition, the first shielding vertical line 150O and the second shielding vertical line 152O may be different from the film layer of the common electrode line 160. The first shielding vertical line 150O and the second shielding vertical line 152O may be connected to the first line 162 of the common electrode line 160 through a conductive structure to receive a common potential. Specifically, the stacking manner of the first shielding vertical line 150O and the second shielding vertical line 152O in the cross-sectional structure can be described with reference to fig. 20 to 24. In other words, the cross-sectional structures of fig. 20 to 24 can also be implemented as the electronic device 100O.

Fig. 27 is a top view of an electronic device according to an embodiment of the disclosure. The electronic device 100P of fig. 27 includes a substrate 110, a transverse signal line 120, a first longitudinal signal line 132, a second longitudinal signal line 134, a third longitudinal signal line 136, a fourth longitudinal signal line 138, a pixel structure 140 including an active device 142 and a pixel electrode 144, a first shielding longitudinal line 150P, a second shielding longitudinal line 152P, a shielding transverse line 154P, and a common electrode line 160 including a first line 162 and a second line 164. In the present embodiment, the arrangement, structure and stacking sequence of the substrate 110, the transverse signal line 120, the first vertical signal line 132, the second vertical signal line 134, the third vertical signal line 136, the fourth vertical signal line 138, the pixel structure 140 and the common electrode line 160 are substantially the same as those of the embodiment of fig. 2, and therefore, the related description is provided with reference to fig. 2 and the description thereof.

In the present embodiment, an orthographic projection of the first shielding longitudinal line 150P on the substrate 110 is located between an orthographic projection of the first longitudinal signal line 132 on the substrate 110 and an orthographic projection of the second longitudinal signal line 134 on the substrate 110, and an orthographic projection of the second shielding longitudinal line 152P on the substrate 110 is located between an orthographic projection of the third longitudinal signal line 136 on the substrate 110 and an orthographic projection of the fourth longitudinal signal line 138 on the substrate 110. The transverse shielding line 154P extends from the first longitudinal shielding line 150P to the transverse direction to cross the first longitudinal signal line 132 and the third longitudinal signal line 136, and the transverse shielding line 154P is connected between the first longitudinal shielding line 150P and the second longitudinal shielding line 152P. In addition, an orthographic projection of the shield transverse line 154P on the substrate 110 may overlap an orthographic projection of the second line 164 of the common electrode line 160 on the substrate 110.

FIG. 28 schematically illustrates one embodiment of a cross-sectional structure of the electronic device of FIG. 27 along section line E-E. As shown in fig. 27 and 28, the first vertical shielding line 150P, the horizontal shielding line 154P, the insulating layer I0, the common electrode line 160, the insulating layer I1, the first vertical signal line 132, the insulating layer I2, the filter layer CF, the insulating layer I3, and the pixel electrode 144 are sequentially stacked on the substrate 110. The insulating layer I0, the insulating layer I1, the insulating layer I2, and the insulating layer I3 may be made of an inorganic insulating material or an organic insulating material, wherein the inorganic insulating material includes silicon oxide, silicon nitride, silicon oxynitride, or the like, and the organic insulating material includes polymethyl methacrylate (PMMA), polyvinyl alcohol (PVA), polyvinyl phenol (PVP), Polyimide (PI), or the like. The filter layer CF may include color filter materials, such as red filter materials, green filter materials, and blue filter materials. The material of the common electrode line 160 and the first longitudinal signal line 132 includes a metal or an alloy. The materials of the first shielding vertical line 150P, the shielding horizontal line 154P, and the pixel electrode 144 include transparent conductive materials. In addition, the layers of the transverse signal line 120 in fig. 27 are the same as the layers of the common electrode line 160, and the second shielding vertical line 152P in fig. 27 may be stacked in the same manner as the first shielding vertical line 150P in the cross-sectional structure. As can be seen from fig. 28, the transverse shield wire 154P overlaps the first vertical signal wire 132 in the thickness direction D3.

FIG. 29 schematically illustrates one embodiment of a cross-sectional configuration of the electronic device of FIG. 27 along cross-sectional line E-E. As shown in fig. 27 and 29, the common electrode line 160, the insulating layer I1, the first vertical signal line 132, the insulating layer I2, the first shielding vertical line 150P, the shielding horizontal line 154P, the filter layer CF, the insulating layer I3, and the pixel electrode 144 are sequentially stacked on the substrate 110. The insulating layer I1, the insulating layer I2, and the insulating layer I3 may be made of inorganic insulating materials or organic insulating materials, wherein the inorganic insulating materials include silicon oxide, silicon nitride, silicon oxynitride, etc., and the organic insulating materials include polymethyl methacrylate (PMMA), polyvinyl alcohol (PVA), polyvinyl phenol (PVP), Polyimide (PI), etc. The filter layer CF may include color filter materials, such as red filter materials, green filter materials, and blue filter materials. The material of the common electrode line 160 and the first longitudinal signal line 132 includes a metal or an alloy. The materials of the first shielding vertical line 150P, the shielding horizontal line 154P, and the pixel electrode 144 include transparent conductive materials. In addition, the layers of the transverse signal line 120 in fig. 27 are the same as the layers of the common electrode line 160, and the second shielding vertical line 152P in fig. 27 may be stacked in the same manner as the first shielding vertical line 150P in the cross-sectional structure. In the present embodiment, the transverse shielding line 154P overlaps the first longitudinal signal line 132 in the thickness direction D3, and at least an insulating layer I2 is disposed between the film layer of the transverse shielding line 154P and the film layer of the first longitudinal signal line 132. Thus, although the transverse shielding wire 154P intersects the first longitudinal signal wire 132, the two wires are not electrically connected to each other.

Fig. 30 is a schematic partial top view of an electronic device according to an embodiment of the disclosure. The electronic device 100Q of fig. 30 includes a substrate 110, a transverse signal line 120, a first longitudinal signal line 132, a second longitudinal signal line 134, a third longitudinal signal line 136, a fourth longitudinal signal line 138, a pixel structure 140 including an active element 142 and a pixel electrode 144, a first shielding longitudinal line 150Q, a second shielding longitudinal line 152Q, a shielding transverse line 154G, and a common electrode line 160 including a first line 162 and a second line 164. In the present embodiment, the arrangement, structure and stacking sequence of the substrate 110, the transverse signal line 120, the first vertical signal line 132, the second vertical signal line 134, the third vertical signal line 136, the fourth vertical signal line 138, the pixel structure 140 and the common electrode line 160 are substantially the same as those in the embodiment of fig. 27, and therefore the description thereof is provided with reference to fig. 27.

In the present embodiment, the first shielding longitudinal line 150Q is located between the first longitudinal signal line 132 and the second longitudinal signal line 134, and the second shielding longitudinal line 152Q is located between the third longitudinal signal line 136 and the fourth longitudinal signal line 138. The first shielding vertical line 150Q and the second shielding vertical line 152Q may be electrically connected to the first line 162 of the common electrode line 160 through the conducting structure TH, respectively. The first shielding vertical line 150Q and the second shielding vertical line 152Q do not overlap the horizontal signal line 120, and the shielding horizontal line 154G is connected between the end of the first shielding vertical line 150Q and the end of the second shielding vertical line 152Q to form a U-shaped pattern, but not limited thereto. In addition, the shielding transverse line 154G may overlap the second line 164 of the common electrode line 160. The cross-sectional structures of the first shielding vertical line 150Q, the second shielding vertical line 152Q and the shielding horizontal line 154G may be the same as the first shielding vertical line 150P, the second shielding vertical line 152P and the shielding horizontal line 154P in fig. 28 and 29.

Fig. 31 is a schematic partial top view of an electronic device according to an embodiment of the disclosure. Fig. 31 shows a substrate 210, a first vertical signal line 232, a second vertical signal line 234, a third vertical signal line 236, a pixel electrode 244 of a pixel structure 240, a first shielding vertical line 250A, and a second shielding vertical line 252A of an electronic device 200A. Specifically, the electronic device 200A may be composed of the structure array arrangement shown in fig. 31, and the electronic device 200A may further include the horizontal signal lines and the active elements of the pixel structure 240, and the circuit structures, but the positions of these elements are indicated by omitting the blocks BK in fig. 31 for clarity of description of the arrangement of the vertical lines. In some embodiments, the arrangement of the lateral signal lines and the active devices can refer to the description of the embodiments such as fig. 2, but not limited thereto.

In the present embodiment, the pixel electrode 244 may include a first sub-electrode 244A and a second sub-electrode 244B, and the first sub-electrode 244A and the second sub-electrode 244B are respectively located at two opposite sides of the omitted block BK. The first vertical signal line 232 and the third vertical signal line 236 are located at the periphery of the pixel electrode 244. The second vertical signal line 234 substantially overlaps the central trunk portion MV of the first sub-electrode 244A of the pixel electrode 244. Specifically, the orthographic projection of the second longitudinal signal line 234 on the substrate 210 approximately overlaps the center line of the orthographic projection of the first sub-electrode 244A on the substrate 110 and also overlaps the center line of the orthographic projection of the second sub-electrode 244B on the substrate 110. The first shielding vertical line 250A and the second shielding vertical line 252A are respectively located at two opposite sides of the pixel electrode 244. Meanwhile, the vertical projection of the first shielding longitudinal line 250A on the substrate 210 is located between the vertical projection of the first longitudinal signal line 232 on the substrate 210 and the vertical projection of the second longitudinal signal line 234 on the substrate 210, and the vertical projection of the second shielding longitudinal line 252A on the substrate 210 is located between the vertical projection of the third longitudinal signal line 236 on the substrate 210 and the vertical projection of the second longitudinal signal line 234 on the substrate 210.

Fig. 32 schematically shows an embodiment of a cross section of the electronic device 200A of fig. 31 at a position of the first shielding vertical line 250A. As shown in fig. 32, the first shielding vertical line 250A, the insulating layer I1, the insulating layer I2, and the pixel electrode 244 may be sequentially stacked on the substrate 210. The insulating layer I1 and the insulating layer I2 may be made of inorganic insulating materials or organic insulating materials, wherein the inorganic insulating materials include silicon oxide, silicon nitride, silicon oxynitride, etc., and the organic insulating materials include polymethyl methacrylate (PMMA), polyvinyl alcohol (PVA), polyvinyl phenol (PVP), Polyimide (PI), etc. The material of the first shielding longitudinal line 250A and the pixel electrode 244 may include a transparent conductive material. In addition, in fig. 31, the layers of the first vertical signal line 232, the second vertical signal line 234 and the third vertical signal line 236 may be disposed between the insulating layer I1 and the insulating layer I2, and the second shielding vertical line 252A in the cross-sectional structure of fig. 31 may be stacked in the same manner as the first shielding vertical line 250A.

Fig. 33 schematically shows another embodiment of a cross section of the electronic device 200A of fig. 31 where the first vertical shielding line 250A is located. As shown in fig. 33, the first shielding vertical line 250A, the insulating layer I1, the insulating layer I2, and the pixel electrode 244 may be sequentially stacked on the substrate 210, and the filter layer CF and the third insulating layer I3 may be further disposed between the insulating layer I2 and the pixel electrode 244. In the present embodiment, the insulating layer I1, the insulating layer I2, and the insulating layer I3 may be made of an inorganic insulating material or an organic insulating material, wherein the inorganic insulating material includes silicon oxide, silicon nitride, silicon oxynitride, or the like, and the organic insulating material includes polymethyl methacrylate (PMMA), polyvinyl alcohol (PVA), polyvinyl phenol (PVP), Polyimide (PI), or the like. The filter layer CF may include color filter materials, such as red filter materials, green filter materials, and blue filter materials. The material of the first shielding longitudinal line 250A and the pixel electrode 244 may include a transparent conductive material. In addition, in fig. 31, the layers of the first vertical signal line 232, the second vertical signal line 234 and the third vertical signal line 236 may be disposed between the insulating layer I1 and the insulating layer I2, and the second shielding vertical line 252A in the cross-sectional structure of fig. 31 may be stacked in the same manner as the first shielding vertical line 250A.

In fig. 33, the film of the first shielding longitudinal line 250A is located between the insulating layer I1 and the substrate 210. In some embodiments, the first shielding longitudinal line 250A and the lateral signal line (not shown) may be formed of film layers stacked continuously, and thus the first shielding longitudinal line 250A may be connected to the lateral signal line (not shown). In other embodiments, the film layer of the first shielding longitudinal line 250A may be selectively located between the insulating layer I2 and the filter layer CF or between the filter layer CF and the insulating layer I3.

Fig. 34 is a schematic partial top view of an electronic device according to an embodiment of the disclosure. Fig. 34 shows a substrate 210, a first vertical signal line 232, a second vertical signal line 234, a third vertical signal line 236, a pixel electrode 244 of a pixel structure 240, a first shielding vertical line 250B, and a second shielding vertical line 252B of an electronic device 200B. Specifically, the electronic device 200B may be composed of the structure array arrangement shown in fig. 34, and the electronic device 200B may further include the horizontal signal lines and the active elements of the pixel structure 240, and the circuit structures, but the positions of these elements are indicated by omitting the blocks BK in fig. 34 for clarity of description of the arrangement of the vertical lines. In some embodiments, the arrangement of the lateral signal lines and the active devices can be described with reference to fig. 2 and other embodiments.

The electronic device 200B is similar to the electronic device 200A, and therefore the same reference numerals are used to designate the same components in the two embodiments and are referred to each other. Specifically, the electronic device 200B is different from the electronic device 200A mainly in the layout manner of the first shielding vertical line 250B and the second shielding vertical line 252B. In the present embodiment, the pixel electrode 244 may include a first sub-electrode 244A and a second sub-electrode 244B, the first sub-electrode 244A and the second sub-electrode 244B are located at two opposite sides of the omitted area, and neither the first shielding longitudinal line 250B nor the second shielding longitudinal line 252B overlaps the second sub-electrode 244B. In other words, the first shielding vertical line 250B and the second shielding vertical line 252B overlap only the first sub-electrode 244A. The first shielding longitudinal line 250B and the second shielding longitudinal line 252B are located on two opposite sides of the first sub-electrode 244A. The first shielding longitudinal line 250B is located between the first longitudinal signal line 232 and the second longitudinal signal line 234, and the second shielding longitudinal line 252B is located between the second longitudinal signal line 234 and the third longitudinal signal line 236. The stacking of the first shielding longitudinal line 250B and the second shielding longitudinal line 252B in the cross section can be described with reference to the first shielding longitudinal line 250A in fig. 32 and 33.

Fig. 35 is a schematic top view of a portion of an electronic device according to an embodiment of the disclosure. Fig. 34 shows a substrate 210, a first vertical signal line 232, a second vertical signal line 234, a third vertical signal line 236, a pixel electrode 244 of a pixel structure 240, a first shielding vertical line 250C, and a second shielding vertical line 252C of an electronic device 200C. Specifically, the electronic device 200C is similar to the electronic device 200A, and therefore the same reference numerals in the two embodiments refer to the same components and can be referred to each other.

The electronic device 200C is different from the electronic device 200A mainly in the layout manner of the first shielding vertical line 250C and the second shielding vertical line 252C. In the present embodiment, the pixel electrode 244 may include a first sub-electrode 244A and a second sub-electrode 244B, the first sub-electrode 244A and the second sub-electrode 244B are located at two opposite sides of the omitted area, and neither the first shielding vertical line 250C nor the second shielding vertical line 252C overlaps the first sub-electrode 244A. In other words, the first shielding vertical line 250C and the second shielding vertical line 252C overlap only the second sub-electrode 244B. The first shielding longitudinal line 250C and the second shielding longitudinal line 252C are located on two opposite sides of the second sub-electrode 244B. The first shielding longitudinal line 250C is located between the first longitudinal signal line 232 and the second longitudinal signal line 234, and the second shielding longitudinal line 252C is located between the second longitudinal signal line 234 and the third longitudinal signal line 236. The stacking of the first shielding longitudinal line 250C and the second shielding longitudinal line 252C in the cross section can be described with reference to the first shielding longitudinal line 250A in fig. 32 and 33.

Fig. 36 is a schematic top view of a portion of an electronic device according to an embodiment of the disclosure. Fig. 36 shows a substrate 310, a first vertical signal line 332, a second vertical signal line 334, a third vertical signal line 336, a pixel electrode 344 of a pixel structure 340, a first shielding vertical line 350A, and a second shielding vertical line 352A of an electronic device 300A. Specifically, the electronic device 300A may be composed of the structural array arrangement shown in fig. 36, and the electronic device 300A may further include the horizontal signal lines and the active elements of the pixel structure 240, and the circuit structures, but the positions of these elements are indicated by omitting blocks BK in fig. 36 for clarity of description of the arrangement of the vertical lines. In some embodiments, the arrangement of the lateral signal lines and the active devices can be described with reference to fig. 2 and other embodiments.

Fig. 36 shows two pixel structures 340, and the first vertical signal line 332, the second vertical signal line 334, and the third vertical signal line 336 are located between the two pixel structures 340. The second longitudinal signal line 334 is located between the first longitudinal signal line 332 and the third longitudinal signal line 336. In the present embodiment, the vertical projection of the first shielding longitudinal line 350A on the substrate 310 is located between the vertical projection of the first longitudinal signal line 332 on the substrate 310 and the vertical projection of the second longitudinal signal line 334 on the substrate 310, and the vertical projection of the second shielding longitudinal line 352A on the substrate 310 is located between the vertical projection of the second longitudinal signal line 334 on the substrate 310 and the vertical projection of the third longitudinal signal line 336 on the substrate 310. Therefore, the vertical projection of the first shielding longitudinal line 350A on the substrate 310 is located outside the vertical projection of the pixel electrode 344 on the substrate 310, and the vertical projection of the second shielding longitudinal line 352A on the substrate 310 is located outside the vertical projection of the pixel electrode 344 on the substrate 310.

In the present embodiment, the first shielding vertical line 350A and the second shielding vertical line 352A are, for example, transparent traces. In other words, the first shielding vertical line 350A and the second shielding vertical line 352A are made of transparent conductive material. In addition, the pixel electrode 344 is also made of a transparent material. In some embodiments, the pixel electrode 344, the first shielding longitudinal line 350A and the second shielding longitudinal line 352A may be the same layer, but in other embodiments, the layer of the pixel electrode 344 may be different from the layers of the first shielding longitudinal line 350A and the second shielding longitudinal line 352A.

Fig. 37 schematically shows an embodiment of a cross-sectional structure of the electronic device 300 where the first shielding longitudinal line 350A is located. As shown in fig. 37, the insulating layer I1, the insulating layer I2, the first shielding vertical line 350A, and the insulating layer I3 may be sequentially stacked on the substrate 310. The insulating layer I1, the insulating layer I2, and the insulating layer I3 may be made of inorganic insulating materials or organic insulating materials, wherein the inorganic insulating materials include silicon oxide, silicon nitride, silicon oxynitride, etc., and the organic insulating materials include polymethyl methacrylate (PMMA), polyvinyl alcohol (PVA), polyvinyl phenol (PVP), Polyimide (PI), etc. The first shielding longitudinal line 350A disposed between the insulating layer I2 and the insulating layer I3 may be made of a transparent conductive material, for example. In the present embodiment, the film layers of the first, second and third

longitudinal signal lines

332, 334 and 336 may be located between the insulating layer I1 and the insulating layer I2, and the film layer of the not-shown transverse signal line may be located between the substrate 310 and the insulating layer I1. In addition, the layer of the pixel electrode 344 may be disposed on the insulating layer I3, in other words, the insulating layer I3 may be disposed between the layer of the pixel electrode 344 and the layer of the first shielding longitudinal line 350A.

Fig. 38 schematically shows another embodiment of a cross-sectional structure of the electronic device 300 where the first shielding longitudinal line 350A is located. The cross-sectional structure of fig. 38 is similar to that of fig. 37, and therefore the same reference numerals are given to the same components in both embodiments. As shown in fig. 38, the insulating layer I1, the insulating layer I2, the first shielding vertical line 350A, the filter layer CF and the insulating layer I3 may be sequentially stacked on the substrate 310. The stacking order and material of the insulating layer I1, the insulating layer I2, the first shielding vertical line 350A, and the insulating layer I3 can be described with reference to fig. 37. The filter layer CF may include color filter materials, such as red filter materials, green filter materials, and blue filter materials.

Fig. 39 schematically shows another embodiment of the cross-sectional structure of the electronic device 300. Fig. 39 shows that, in addition to the first vertical signal lines 332, the pixel electrodes 344, and the first shielding vertical lines 350A in fig. 36, the horizontal signal lines 320 provided in the block BK are also omitted to explain the stacked relationship of the respective members in the electronic device 300. As shown in fig. 39, the transverse signal line 320, the insulating layer I1, the first longitudinal signal line 332, the insulating layer I2, and the pixel electrode 344 may be sequentially stacked on the substrate 310, and the pixel electrode 344 and the first longitudinal signal line 332 may be the same layer.

In summary, in the electronic device according to the embodiment of the invention, the shielding lines (e.g., the first shielding vertical line, the second shielding vertical line, etc.) are disposed between different signal lines. The shield lines may be connected to a common potential to provide signal shielding to mitigate interference between signal lines. Therefore, the electronic device according to the embodiment of the present disclosure can have better quality.

The present invention may be embodied in other specific forms without departing from the spirit or essential attributes thereof, and it should be understood that various changes and modifications can be effected therein by one skilled in the art without departing from the spirit and scope of the invention as defined in the appended claims.

Claims

1. An electronic device, comprising:

a substrate;

a plurality of transverse signal lines configured on the substrate;

the first longitudinal signal line is configured on the substrate and is intersected with the plurality of transverse signal lines;

the second longitudinal signal line is configured on the substrate and is intersected with the plurality of transverse signal lines, and the second longitudinal signal line is connected with one of the plurality of transverse signal lines; and

the first shielding longitudinal line is configured on the substrate, and the vertical projection of the first shielding longitudinal line on the substrate is positioned between the vertical projection of the first longitudinal signal line on the substrate and the vertical projection of the second longitudinal signal line on the substrate.

2. The electronic device of claim 1, further comprising a plurality of pixel structures disposed on the substrate, wherein one of the plurality of pixel structures is surrounded by two adjacent ones of the plurality of transverse signal lines and the second longitudinal signal line and comprises a pixel electrode, wherein the pixel electrode overlaps the first longitudinal signal line or the second longitudinal signal line in a direction perpendicular to the substrate.

3. The electronic device of claim 2, wherein the pixel electrode overlaps the first shielding vertical line.

4. The electronic device of claim 2, wherein the pixel electrode crosses over the second vertical signal line, the pixel electrode has a central main portion, and the second vertical signal line overlaps the central main portion.

5. The electronic device according to claim 1, wherein the first shielding vertical line is a transparent trace.

6. The electronic device according to claim 1, further comprising a common electrode line disposed on the substrate, the common electrode line being located between two adjacent ones of the plurality of transverse signal lines.

7. The electronic device according to claim 6, wherein the common electrode line intersects the first vertical signal line and the second vertical signal line.

8. The electronic device according to claim 6, wherein the first shielding vertical line and the common electrode line are directly stacked on each other.

9. The electronic device according to claim 6, further comprising at least one insulating layer disposed between the first shielding vertical line and the common electrode line, and a conductive structure penetrating the at least one insulating layer and electrically connecting the first shielding vertical line and the common electrode line.

10. The electronic device of claim 6, further comprising a plurality of pixel structures disposed on the substrate, one of the plurality of pixel structures being located between two adjacent ones of the plurality of transverse signal lines and including a pixel electrode, wherein the first vertical shielding line is located between the common electrode line and the pixel electrode.

11. The electronic device of claim 6, further comprising a plurality of pixel structures disposed on the substrate, one of the plurality of pixel structures being located between two adjacent ones of the plurality of transverse signal lines and including a pixel electrode, wherein the layer of the common electrode line is located between the layer of the first vertical shielding line and the layer of the pixel electrode.

12. The electronic device according to claim 6, wherein the common electrode line comprises a first line and a second line, and the first shielding longitudinal line overlaps the first line, the second line or both.

13. The electronic device of claim 1, further comprising a second shielding longitudinal line, wherein the first longitudinal signal line is located between the first shielding longitudinal line and the second shielding longitudinal line.

14. The electronic device of claim 13, further comprising a third vertical signal line, the third vertical signal line being located between the first vertical signal line and the second shielding vertical line.

15. The electronic device of claim 14, further comprising a fourth vertical signal line, wherein a vertical projection of the first vertical signal line and the third vertical signal line on the substrate is located between a vertical projection of the second vertical signal line on the substrate and a vertical projection of the fourth vertical signal line on the substrate.

16. The electronic device of claim 1, further comprising a shielding electrode connected to the first shielding longitudinal line.

17. The electronic device of claim 1, wherein the first shielding longitudinal line is completely located between two adjacent ones of the plurality of transverse signal lines.

18. The electronic device of claim 1, further comprising:

the pixel structure comprises a pixel electrode, wherein the vertical projection of the first shielding longitudinal line on the substrate is positioned outside the vertical projection of the pixel electrode on the substrate.

19. The electronic device of claim 1, further comprising a plurality of pixel structures and a third vertical signal line, wherein the plurality of pixel structures are arranged on the substrate in an array, the second vertical signal line is located between the third vertical signal line and the first vertical signal line, the second vertical signal line and the third vertical signal line are located between two adjacent rows of the plurality of pixel structures.

20. The electronic device according to claim 19, further comprising a second vertical shielding line disposed on the substrate, wherein a vertical projection of the second vertical shielding line on the substrate is located between a vertical projection of the second vertical signal line on the substrate and a vertical projection of the third vertical signal line on the substrate.