CN112353023A - Chlorine dioxide gas slow-release sterilization mask - Google Patents

Chlorine dioxide gas slow-release sterilization mask Download PDF

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CN112353023A
CN112353023A CN202011247912.0A CN202011247912A CN112353023A CN 112353023 A CN112353023 A CN 112353023A CN 202011247912 A CN202011247912 A CN 202011247912A CN 112353023 A CN112353023 A CN 112353023A
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chlorine dioxide
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water
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郝维军
臧子宜
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Shenzhen Jiadesheng Environmental Protection Technology Co ltd
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    • A—HUMAN NECESSITIES
    • A41—WEARING APPAREL
    • A41D—OUTERWEAR; PROTECTIVE GARMENTS; ACCESSORIES
    • A41D13/00—Professional, industrial or sporting protective garments, e.g. surgeons' gowns or garments protecting against blows or punches
    • A41D13/05—Professional, industrial or sporting protective garments, e.g. surgeons' gowns or garments protecting against blows or punches protecting only a particular body part
    • A41D13/11—Protective face masks, e.g. for surgical use, or for use in foul atmospheres
    • A41D13/1192—Protective face masks, e.g. for surgical use, or for use in foul atmospheres with antimicrobial agent
    • A—HUMAN NECESSITIES
    • A41—WEARING APPAREL
    • A41D—OUTERWEAR; PROTECTIVE GARMENTS; ACCESSORIES
    • A41D27/00—Details of garments or of their making
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
    • A61L2/00—Methods or apparatus for disinfecting or sterilising materials or objects other than foodstuffs or contact lenses; Accessories therefor
    • A61L2/16—Methods or apparatus for disinfecting or sterilising materials or objects other than foodstuffs or contact lenses; Accessories therefor using chemical substances
    • A61L2/20—Gaseous substances, e.g. vapours
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
    • A61L9/00—Disinfection, sterilisation or deodorisation of air
    • A61L9/015—Disinfection, sterilisation or deodorisation of air using gaseous or vaporous substances, e.g. ozone
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18—Manufacture of films or sheets
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
    • A61L2209/00—Aspects relating to disinfection, sterilisation or deodorisation of air
    • A61L2209/20—Method-related aspects
    • A61L2209/21—Use of chemical compounds for treating air or the like
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2303/00—Characterised by the use of starch, amylose or amylopectin or of their derivatives or degradation products
    • C08J2303/02—Starch; Degradation products thereof, e.g. dextrin
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2305/00—Characterised by the use of polysaccharides or of their derivatives not provided for in groups C08J2301/00 or C08J2303/00
    • C08J2305/08—Chitin; Chondroitin sulfate; Hyaluronic acid; Derivatives thereof

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Abstract

The invention discloses a chlorine dioxide gas slow-release sterilization mask, which relates to the technical field of protective sterilization instruments and preparation thereof, and structurally comprises a mask body, an ear hanging part and a slow-release sterilization device, wherein the slow-release sterilization device comprises a slow-release chlorine dioxide film 1-1, and the slow-release chlorine dioxide film comprises a slow-release control layer and a chlorine dioxide release layer; the slow release control layer comprises alkali, and the chlorine dioxide release layer comprises a chlorine dioxide precursor and an acidic solid. The chlorine dioxide slow release film in the slow release sterilizing device comprises a slow release control layer containing alkali, and can effectively control the release speed of chlorine dioxide from the release reaction speed level when used in a high-humidity environment.

Description

Chlorine dioxide gas slow-release sterilization mask
Technical Field
The invention relates to a protective degerming device and the technical field of preparation thereof, in particular to a chlorine dioxide gas slow-release degerming mask.
Background
With global warming and the great change of climate conditions around the world, a variety of undiscovered highly contagious pathogens have emerged in recent years, and have many times formed serious public health incidents on a global scale, so that in recent years, the demand for daily protection has also arisen, and the field of daily protective sterilization apparatuses has been developed greatly. Wherein, the novel coronavirus pneumonia that erupts in 2019 late to 2020 early, because the hiddenly of its virus carrier and very strong infectivity, arouse people's worry, also consequently greatly increased medical protective facial mask's demand, but traditional medical protective facial mask only can play the effect of keeping off pathogen in the droplet, in daily life, this kind of gauze mask cover body self also can suffer pathogen contamination because wear for a long time, and then pollute the wearer when the wearer contacts gauze mask, and can not disinfect by near the air of wearer's mouth and nose.
With the attention of people to the mask, the chlorine dioxide slow-release component is combined to the mask in work, the problem is solved, the mask can slowly release chlorine dioxide gas, which is a popular green environment-friendly disinfection component without toxic and side effects in recent years, and the released chlorine dioxide gas can sterilize and disinfect the ambient atmosphere environment of the mask and the mask, so that the problem is well solved.
However, in the mask with the chlorine dioxide slow release assembly disclosed in the prior art, the chlorine dioxide slow release film adopts two main film structures, the main body is a water-soluble film material, and the water-soluble film material simply comprises solid acid and solid chlorite which can directly react to generate chlorine dioxide gas, and the two layers are adjacent to each other, so that the chlorine dioxide release reaction is too rapid, the slow release function can be realized only by the microporous film material in the buffer material layer, but the slow release is realized only by storing a small amount of chlorine dioxide gas released by reaction through the microporous structure, the slow release control cannot be realized from the reaction layer for releasing chlorine dioxide gas, and the slow release effect is not ideal.
Disclosure of Invention
The invention provides a novel chlorine dioxide gas slow-release sterilization mask which can realize the slow release of chlorine dioxide from the control of the speed of the release reaction of the chlorine dioxide gas, and the specific scheme is as follows:
the invention provides a chlorine dioxide gas slow-release sterilization mask which comprises a mask body, lug hanging parts and slow-release sterilization devices, wherein the lug hanging parts are arranged on the left side and the right side of the mask body; the slow-release degerming device comprises a slow-release chlorine dioxide film 1-1, wherein the slow-release chlorine dioxide film is sequentially provided with a water-soluble coating outer layer, a slow-release control layer, a chlorine dioxide release layer and a water-soluble coating inner layer from the outside to the inside of the mask; wherein, the slow release control layer comprises alkali, and the chlorine dioxide release layer comprises a chlorine dioxide precursor and an acidic solid.
Preferably, the chlorine dioxide release layer comprises solid slow-release chlorine dioxide particles and a water-soluble film material, and the chlorine dioxide precursor and the acidic solid are derived from the solid slow-release chlorine dioxide particles.
Preferably, the solid slow-release chlorine dioxide particles are of a multilayer structure and sequentially comprise a core part, a precursor layer, an isolation layer, an outer precursor layer and an acidification layer from inside to outside.
Preferably, in the solid slow-release chlorine dioxide particles, the core part comprises a spherical porous water-absorbing carrier material and alkali, the precursor layer comprises a powdery porous water-absorbing carrier material and a chlorine dioxide precursor, the isolation layer comprises a powdery porous water-absorbing carrier material starch adhesive, the outer precursor layer comprises a powdery porous water-absorbing carrier material and a chlorine dioxide precursor, and the acidification layer comprises a powdery porous water-absorbing carrier material and an acidic solid.
Preferably, the slow-release sterilizing device comprises a slow-release chlorine dioxide component 1, a slow-release chlorine dioxide film 1-1, a slow-release sleeve 2, an inner cover 3 and an outer cover 4; the slow-release chlorine dioxide component is of a cylindrical structure with one end open and the other end provided with a slow-release chlorine dioxide film, one side provided with the slow-release chlorine dioxide film is set as the outer side, and the chlorine dioxide film is provided with a through hole 1-2; the slow release sleeve is a hollow cylindrical structure with two open ends, the slow release chlorine dioxide component is arranged inside the slow release sleeve, and the outer wall of the slow release chlorine dioxide component is tightly attached to the inner wall of the slow release sleeve; the inner cover is of a hollow cylindrical structure with one open end at the outer side, the end wall at the non-open end is provided with an air vent 3-1, the inner cover is arranged at one end of the inner side of the slow release sleeve, and the inner wall of the inner cover is tightly attached to the outer wall of the slow release sleeve; the outer cover is a hollow cylindrical structure with the inner side and one open end, the end wall of the non-open end is provided with an air vent 4-1, the outer cover is arranged at one end of the outer side of the slow release sleeve, and the inner wall of the outer cover is tightly attached to the outer wall of the slow release sleeve.
Preferably, the preparation method of the slow-release chlorine dioxide film comprises the following steps:
(1) preparing a sustained release control layer;
(2) preparing a chlorine dioxide release layer;
(3) laminating the sustained release control layer and the chlorine dioxide release layer into a tablet;
(4) an outer layer and an inner layer of a water-soluble coating are prepared on both sides of the material to be tabletted, respectively.
The slow release control layer comprises alkali, and the chlorine dioxide release layer comprises a chlorine dioxide precursor and an acidic solid.
Preferably, the preparation method of the sustained-release control layer in the step (1) comprises the following steps: dispersing solid alkali in water-soluble film material solution, uniformly mixing, and casting to form a film.
Preferably, the solid base is added in an amount of 15-30% wt of the water-soluble film material solution. The solid alkali is one or more of sodium carbonate, potassium carbonate and sodium phosphate. The dosage of the water-soluble film material is based on the requirements of film formation, film thickness and the like.
Preferably, the preparation method of the chlorine dioxide release layer in the step (2) comprises the following steps:
1) soaking a spherical porous water-absorbing carrier material in alkali liquor, and drying to form a spherical object which is a solid core part for slowly releasing chlorine dioxide;
2) mixing a powdery porous water-absorbing carrier material with a chlorine dioxide precursor in a ball mill, adding deionized water into the obtained mixture, uniformly mixing, coating the mixture on the surface of the core part obtained in the step 1) by spraying, and drying to form an inner precursor layer;
3) mixing a powdery porous water-absorbing carrier material with a starch adhesive in a ball mill, adding deionized water, uniformly mixing, coating the surface of the inner precursor layer obtained in the step 2) by spraying, and drying to form an isolating layer;
4) mixing a powdery porous water-absorbing carrier material with a chlorine dioxide precursor in a ball mill, adding deionized water into the obtained mixture, uniformly mixing, coating the surface of the isolating layer obtained in the step 3) by spraying, and drying to form an outer precursor layer;
5) mixing a powdery porous water-absorbing carrier material with an acidic solid in a ball mill, adding deionized water into the obtained mixture, uniformly mixing, coating the mixture on the surface of the outer precursor layer obtained in the step 4) by spraying, and drying to form an acidification layer to obtain solid slow-release chlorine dioxide particles;
6) dispersing the solid slow-release chlorine dioxide particles obtained in the step 5) in a water-soluble film material solution, uniformly mixing, and then casting to form a film.
Preferably, the addition amount of the solid slow-release chlorine dioxide particles is 40-66 wt% of the water-soluble film material solution. The dosage of the water-soluble film material is based on the requirements of film formation, film thickness and the like.
Preferably, the spherical porous water absorbing material in the step 1) is one or two of a molecular sieve and mesoporous silicon, and the particle size is 0.01-0.1 mm.
Preferably, the alkali liquor in step 1) is one or more than two of sodium carbonate, potassium carbonate and sodium phosphate. The concentration of the alkali liquor is 0.5-1M.
The drying involved in the invention is hot air drying at 30-60 ℃.
Preferably, the powdery porous water absorption carrier material in the steps 2) to 5) is one or more than two of molecular sieve, mesoporous silicon, activated alumina and fumed silica, and the particle size is 0.003-0.008 mm.
Preferably, the chlorine dioxide precursor in step 2) is one or more than two of sodium chlorite, potassium chlorite, calcium chlorite and magnesium chlorite.
Preferably, the mass ratio of the powdery porous water absorption carrier material in the step 2) to the chlorine dioxide precursor and the deionized water is (2-9): (5-15): (3-20).
Preferably, the starch adhesive in step 3) comprises a composite starch adhesive or a bonding agent and the like, wherein the main component is starch or modified starch, and the starch adhesive can be purchased from the market or prepared by the existing published method.
Preferably, the mass ratio of the porous water-absorbing carrier material, the starch adhesive and the deionized water in the step 3) is (2-9): (2-7): (5-30).
Preferably, the mass ratio of the powdery porous water absorption carrier material in the step 4) to the chlorine dioxide precursor and the deionized water is (2-9): (3-8): (3-20).
Preferably, the acidic solid in step 5) is one or more of sodium sulfate, sodium phosphate, potassium sulfate and potassium phosphate.
Preferably, the mass ratio of the powdery porous water absorption carrier material in the step 5) to the acidic solid and the deionized water is (2-9): (5-11): (3-20).
Preferably, the core mass is assumed to be m1Inner precursor layer mass m2Outer precursor layer mass m3Mass of acidizing layer is m4And the total mass of the obtained solid slow-release chlorine dioxide particles is M, the following components are obtained: m is1＝μ1(m2+m3)，m4＝μ2(m2+m3)，m2+m3＝μ3M; where μ is a constant, μ10.01-0.2, mu20.005-0.1, mu3Is 0.2-0.7.
Preferably, the core particle diameter is set to d1The thickness of the inner precursor layer is L2The thickness of the isolation layer is LkThe thickness of the outer precursor layer is L3The thickness of the acidified layer is L4Then, there are:
Figure BDA0002770659050000061
preferably, the preparation method of the inner layer and the outer layer of the water-soluble coating in the step (4) comprises the following steps: dissolving the components of the water-soluble coating in water, coating the water-soluble coating on the surfaces of two sides of the material pressed into the tablet, and drying. The amount of the water-soluble coating component is based on the requirements of film formation, film thickness and the like.
Preferably, the water-soluble coating outer layer is set to have a thickness h1The thickness of the slow release control layer is h2The thickness of the chlorine dioxide release layer is h3The thickness of the inner layer of the water-soluble coating is h4Then, there are:
Figure BDA0002770659050000062
after the slow-release chlorine dioxide film with the multilayer film structure is prepared according to the method, the film is cut, punched and heat-sealed according to the product requirements, and then the film is installed in a slow-release sterilization device on a mask.
Preferably, the water-soluble film material is at least one of starch, polysaccharide, oligosaccharide, fructose, chitosan and hyaluronic acid.
Preferably, the water-soluble coating comprises at least one of sodium alginate, starch, glucose, hyaluronic acid and chitosan.
Advantageous effects
The invention has the beneficial effects that:
the chlorine dioxide slow release film in the slow release sterilizing device comprises a slow release control layer containing alkali and a chlorine dioxide release layer. Firstly, because the highest humidity of the using environment of the mask is usually higher (more water vapor is brought in during breathing), the invention adds the slow release control layer on the chlorine dioxide release layer partition wall in the multilayer film structure, when the environment humidity is too high, the chlorine dioxide release rate can be increased, the layer plays a role in properly slowing down the release rate of the chlorine dioxide, and the chlorine dioxide gas slow release is directly controlled from the chemical reaction angle of the chlorine dioxide release. Secondly, the invention also specifies the thickness algorithm relation among all layers of the multilayer film structure of the chlorine dioxide slow-release film, and the multilayer film structure prepared by adopting the proportional relation in the range has the most long-acting and stable release of the chlorine dioxide. Third, the present invention is not to simply prepare the solid acid and the solid chlorite, which can directly react to generate the chlorine dioxide gas, in adjacent layers as in the conventional mask structure, but to prepare the chlorine dioxide precursor as solid particles having a multi-layer structure, and to perform the dual regulation and control of the slow release of the chlorine dioxide by the action of the solid particles and the multi-layer structure. Fourthly, the regulation of the quality relation and the thickness relation of each layer of the solid slow-release chlorine dioxide particles avoids the negative influence of alkali in the solid particles on the activation speed and realizes the regulation of the release speed of the chlorine dioxide by the alkali. Fifthly, the invention adopts the simplest structure on the slow-release degerming device, can meet the use requirement with a simple structure, is convenient to use and reduces the production cost.
Drawings
Fig. 1 is a schematic structural diagram of a slow-release sterilizing device in a mask provided by the invention, wherein 1 is a slow-release chlorine dioxide component, 1-1 is a slow-release chlorine dioxide film, 1-2 is a through hole formed in the slow-release chlorine dioxide film, 2 is a slow-release sleeve, 3 is an inner cover, 3-1 is a vent hole formed in the inner end wall of the inner cover, 4 is an outer cover, and 4-1 is a vent hole formed in the outer end wall of the outer cover.
Detailed Description
The embodiments of the present invention are described below with reference to specific embodiments, and other advantages and effects of the present invention will be easily understood by those skilled in the art from the disclosure of the present specification. The invention is capable of other and different embodiments and of being practiced or of being carried out in various ways, and its several details are capable of modification in various respects, all without departing from the spirit and scope of the present invention.
The following examples and comparative examples are parallel runs, with the same processing steps and parameters, unless otherwise indicated.
Preparation example 1 preparation of solid sustained-release chlorine dioxide granules:
(1) soaking a spherical porous water-absorbing carrier material in alkali liquor, and drying to form a spherical object which is a solid core part for slowly releasing chlorine dioxide;
(2) mixing a powdery porous water-absorbing carrier material with a chlorine dioxide precursor in a ball mill, adding deionized water into the obtained mixture, uniformly mixing, coating the mixture on the surface of the core part obtained in the step (1) by spraying, and drying to form an inner precursor layer;
(3) mixing a powdery porous water-absorbing carrier material with a starch adhesive in a ball mill, adding deionized water, uniformly mixing, coating the surface of the inner precursor layer obtained in the step (2) by spraying, and drying to form an isolating layer;
(4) mixing a powdery porous water-absorbing carrier material with a chlorine dioxide precursor in a ball mill, adding deionized water into the obtained mixture, uniformly mixing, coating the surface of the isolating layer obtained in the step (3) by spraying, and drying to form an outer precursor layer;
(5) and (3) mixing the powdery porous water-absorbing carrier material with the acidic solid in a ball mill, adding deionized water into the obtained mixture, uniformly mixing, coating the mixture on the surface of the outer precursor layer obtained in the step (4) by spraying, and drying to form an acidification layer.
The spherical porous water absorbing material in the step (1) is a molecular sieve with the particle size of 0.01 mm.
The alkali liquor in the step (1) is sodium carbonate. The concentration of the alkali liquor is 1M.
And (3) the powdery porous water-absorbing carrier material in the steps (2) to (5) is a molecular sieve with the particle size of 0.005 mm.
The chlorine dioxide precursor in the step (2) is sodium chlorite.
The mass ratio of the powdery porous water absorption carrier material in the step (2) to the chlorine dioxide precursor and the deionized water is 4:10: 15.
The starch adhesive in the step (3) is a compound starch adhesive, the main component of which is starch or modified starch, and the starch adhesive is purchased from the market.
And (4) the mass ratio of the porous water-absorbing carrier material, the starch adhesive and the deionized water in the step (3) is 5:5: 17.
And (4) the mass ratio of the powdery porous water absorption carrier material to the chlorine dioxide precursor to the deionized water is 4:5: 15.
The acidic solid in the step (5) is potassium phosphate.
And (4) the mass ratio of the powdery porous water absorption carrier material to the acidic solid to the deionized water is 5:8: 18.
Let the core mass be m1Inner precursor layer mass m2Outer precursor layer mass m3Mass of acidizing layer is m4And the total mass of the obtained solid slow-release chlorine dioxide particles is M, the following components are obtained: m is1＝μ1(m2+m3)，m4＝μ2(m2+m3)，m2+m3＝μ3M; where μ is a constant, μ1Is 0.12, mu20.05, mu3Is 0.4.
Let the core particle diameter be d1The thickness of the inner precursor layer is L2The thickness of the isolation layer is LkThe thickness of the outer precursor layer is L3The thickness of the acidified layer is L4Then, there are:
Figure BDA0002770659050000091
the solid slow-release chlorine dioxide particles obtained in the preparation example are finally used in the mask product prepared in the example 1, and through the final performance detection (see below) result, it can be seen that after the mass/thickness ratio of each layer of the solid slow-release chlorine dioxide particles is limited by adopting the algorithm, the slow-release effect of chlorine dioxide can be obviously enhanced, and the time for stably releasing chlorine dioxide is obviously prolonged.
Preparation example 2 preparation of solid sustained-release chlorine dioxide granules:
(1) soaking a spherical porous water-absorbing carrier material in alkali liquor, and drying to form a spherical object which is a solid core part for slowly releasing chlorine dioxide;
(2) mixing a powdery porous water-absorbing carrier material with a chlorine dioxide precursor in a ball mill, adding deionized water into the obtained mixture, uniformly mixing, coating the mixture on the surface of the core part obtained in the step (1) by spraying, and drying to form an inner precursor layer;
(3) mixing a powdery porous water-absorbing carrier material with a starch adhesive in a ball mill, adding deionized water, uniformly mixing, coating the surface of the inner precursor layer obtained in the step (2) by spraying, and drying to form an isolating layer;
(4) mixing a powdery porous water-absorbing carrier material with a chlorine dioxide precursor in a ball mill, adding deionized water into the obtained mixture, uniformly mixing, coating the surface of the isolating layer obtained in the step (3) by spraying, and drying to form an outer precursor layer;
(5) and (3) mixing the powdery porous water-absorbing carrier material with the acidic solid in a ball mill, adding deionized water into the obtained mixture, uniformly mixing, coating the mixture on the surface of the outer precursor layer obtained in the step (4) by spraying, and drying to form an acidification layer.
The spherical porous water absorbing material in the step (1) is a molecular sieve with the particle size of 0.01 mm.
The alkali liquor in the step (1) is sodium carbonate. The concentration of the alkali liquor is 1M.
And (3) the powdery porous water-absorbing carrier material in the steps (2) to (5) is a molecular sieve with the particle size of 0.005 mm.
The chlorine dioxide precursor in the step (2) is sodium chlorite.
The mass ratio of the powdery porous water absorption carrier material in the step (2) to the chlorine dioxide precursor and the deionized water is 4:10: 15.
The starch adhesive in the step (3) is a compound starch adhesive, the main component of which is starch or modified starch, and the starch adhesive is purchased from the market.
And (4) the mass ratio of the porous water-absorbing carrier material, the starch adhesive and the deionized water in the step (3) is 5:5: 17.
And (4) the mass ratio of the powdery porous water absorption carrier material to the chlorine dioxide precursor to the deionized water is 4:5: 15.
The acidic solid in the step (5) is potassium phosphate.
And (4) the mass ratio of the powdery porous water absorption carrier material to the acidic solid to the deionized water is 5:8: 18.
The particle size of the prepared solid particles is basically the same as that of preparation example 1, but the thicknesses of the layers are respectively as follows: the core, inner precursor layer, isolation layer, outer precursor layer, acidified layer are all equal in thickness.
Preparation example 3 preparation of solid sustained-release chlorine dioxide granules:
(1) soaking a spherical porous water-absorbing carrier material in alkali liquor, and drying to form a spherical object which is a solid core part for slowly releasing chlorine dioxide;
(2) mixing a powdery porous water-absorbing carrier material with a chlorine dioxide precursor in a ball mill, adding deionized water into the obtained mixture, uniformly mixing, coating the mixture on the surface of the core part obtained in the step (1) by spraying, and drying to form an inner precursor layer;
(3) mixing a powdery porous water-absorbing carrier material with a starch adhesive in a ball mill, adding deionized water, uniformly mixing, coating the surface of the inner precursor layer obtained in the step (2) by spraying, and drying to form an isolating layer;
(4) mixing a powdery porous water-absorbing carrier material with a chlorine dioxide precursor in a ball mill, adding deionized water into the obtained mixture, uniformly mixing, coating the surface of the isolating layer obtained in the step (3) by spraying, and drying to form an outer precursor layer;
(5) and (3) mixing the powdery porous water-absorbing carrier material with the acidic solid in a ball mill, adding deionized water into the obtained mixture, uniformly mixing, coating the mixture on the surface of the outer precursor layer obtained in the step (4) by spraying, and drying to form an acidification layer.
The spherical porous water absorbing material in the step (1) is a molecular sieve with the particle size of 0.01 mm.
The alkali liquor in the step (1) is sodium carbonate. The concentration of the alkali liquor is 1M.
And (3) the powdery porous water-absorbing carrier material in the steps (2) to (5) is a molecular sieve with the particle size of 0.005 mm.
The chlorine dioxide precursor in the step (2) is sodium chlorite.
The mass ratio of the powdery porous water absorption carrier material in the step (2) to the chlorine dioxide precursor and the deionized water is 4:10: 15.
The starch adhesive in the step (3) is a compound starch adhesive, the main component of which is starch or modified starch, and the starch adhesive is purchased from the market.
And (4) the mass ratio of the porous water-absorbing carrier material, the starch adhesive and the deionized water in the step (3) is 5:5: 17.
And (4) the mass ratio of the powdery porous water absorption carrier material to the chlorine dioxide precursor to the deionized water is 4:5: 15.
The acidic solid in the step (5) is potassium phosphate.
And (4) the mass ratio of the powdery porous water absorption carrier material to the acidic solid to the deionized water is 5:8: 18.
The average particle mass of the prepared solid particles was substantially the same as that of preparation example 1, except that the mass of the core part, the inner precursor layer, the separation layer, the outer precursor layer, and the acidified layer each accounted for 20% wt of the total mass.
Preparation example 4 preparation of a sustained-release chlorine dioxide film:
(1) preparing a sustained release control layer;
(2) preparing a chlorine dioxide release layer;
(3) laminating the sustained release control layer and the chlorine dioxide release layer into a tablet;
(4) an outer layer and an inner layer of a water-soluble coating are prepared on both sides of the material to be tabletted, respectively.
The slow release control layer comprises alkali, and the chlorine dioxide release layer comprises a chlorine dioxide precursor and an acidic solid.
The preparation method of the sustained-release control layer in the step (1) comprises the following steps: dispersing solid alkali in water-soluble film material solution, uniformly mixing, and casting to form a film.
The solid alkali is added in an amount of 15% wt of the water-soluble film material solution. The solid alkali is sodium carbonate. The dosage of the water-soluble film material is based on the requirements of film formation, film thickness and the like.
The preparation of the solid chlorine dioxide release layer in the step (2) comprises the following steps: dispersing the sustained-release chlorine dioxide particles obtained in the preparation example in a water-soluble film material solution, uniformly mixing, and casting to form a film.
The addition amount of the solid slow-release chlorine dioxide particles is 4 percent by weight of the water-soluble membrane material solution. The dosage of the water-soluble film material is based on the requirements of film formation, film thickness and the like.
The preparation method of the inner layer and the outer layer of the water-soluble coating in the step (4) comprises the following steps: dissolving the components of the water-soluble coating in water, coating the water-soluble coating on the surfaces of two sides of the material pressed into the tablet, and drying. The amount of the water-soluble coating component is based on the requirements of film formation, film thickness and the like.
Setting the outer layer thickness of the water-soluble coating to be h1The thickness of the slow release control layer is h2The thickness of the chlorine dioxide release layer is h3The thickness of the inner layer of the water-soluble coating is h4Then, there are:
Figure BDA0002770659050000141
after the slow-release chlorine dioxide film with the multilayer film structure is prepared according to the method, the film is cut, punched and heat-sealed according to the product requirements, and then the film is installed in a slow-release sterilization device on a mask.
The water-soluble film material is prepared by mixing starch and chitosan in a mass ratio of 1: 1.
The water-soluble coating comprises the components of sodium alginate and starch in a mass ratio of 1: 1.
The slow-release chlorine dioxide granules are the products obtained in the preparation example 1.
The slow-release chlorine dioxide film obtained in the preparation example is finally used in the mask product prepared in the example 1, and through the final performance detection (see below) result, it can be seen that after the interlayer thickness proportion of the slow-release chlorine dioxide film is limited by adopting the algorithm, the slow-release effect of chlorine dioxide can be obviously enhanced, and the time for stably releasing chlorine dioxide is obviously prolonged.
Preparation example 5 preparation of a sustained-release chlorine dioxide film:
(1) preparing a sustained release control layer;
(2) preparing a chlorine dioxide release layer;
(3) laminating the sustained release control layer and the chlorine dioxide release layer into a tablet;
(4) an outer layer and an inner layer of a water-soluble coating are prepared on both sides of the material to be tabletted, respectively.
The slow release control layer comprises alkali, and the chlorine dioxide release layer comprises a chlorine dioxide precursor and an acidic solid.
The preparation method of the sustained-release control layer in the step (1) comprises the following steps: dispersing solid alkali in water-soluble film material solution, uniformly mixing, and casting to form a film.
The solid alkali is added in an amount of 15% wt of the water-soluble film material solution. The solid alkali is sodium carbonate. The dosage of the water-soluble film material is based on the requirements of film formation, film thickness and the like.
The preparation of the solid chlorine dioxide release layer in the step (2) comprises the following steps: dispersing the sustained-release chlorine dioxide particles obtained in the preparation example in a water-soluble film material solution, uniformly mixing, and casting to form a film.
The addition amount of the solid slow-release chlorine dioxide particles is 4 percent by weight of the water-soluble membrane material solution. The dosage of the water-soluble film material is based on the requirements of film formation, film thickness and the like.
The preparation method of the inner layer and the outer layer of the water-soluble coating in the step (4) comprises the following steps: dissolving the components of the water-soluble coating in water, coating the water-soluble coating on the surfaces of two sides of the material pressed into the tablet, and drying. The amount of the water-soluble coating component is based on the requirements of film formation, film thickness and the like.
The thickness of the film prepared was the same as in preparation example 4, but the thickness of each layer in the film was the same.
After the slow-release chlorine dioxide film with the multilayer film structure is prepared according to the method, the film is cut, punched and heat-sealed according to the product requirements, and then the film is installed in a slow-release sterilization device on a mask.
The water-soluble film material is prepared by mixing starch and chitosan in a mass ratio of 1: 1.
The water-soluble coating comprises the components of sodium alginate and starch in a mass ratio of 1: 1.
The slow-release chlorine dioxide granules are the products obtained in the preparation example 1.
Preparation example 6 preparation of a sustained-release chlorine dioxide film:
(1) preparing a sustained release control layer;
(2) preparing a chlorine dioxide release layer;
(3) laminating the sustained release control layer and the chlorine dioxide release layer into a tablet;
(4) an outer layer and an inner layer of a water-soluble coating are prepared on both sides of the material to be tabletted, respectively.
The slow release control layer comprises alkali, and the chlorine dioxide release layer comprises a chlorine dioxide precursor and an acidic solid.
The preparation method of the sustained-release control layer in the step (1) comprises the following steps: dispersing solid alkali in water-soluble film material solution, uniformly mixing, and casting to form a film.
The solid alkali is added in an amount of 15% wt of the water-soluble film material solution. The solid alkali is sodium carbonate. The dosage of the water-soluble film material is based on the requirements of film formation, film thickness and the like.
The preparation of the solid chlorine dioxide release layer in the step (2) comprises the following steps: dispersing the sustained-release chlorine dioxide particles obtained in the preparation example in a water-soluble film material solution, uniformly mixing, and casting to form a film.
The addition amount of the solid slow-release chlorine dioxide particles is 4 percent by weight of the water-soluble membrane material solution. The dosage of the water-soluble film material is based on the requirements of film formation, film thickness and the like.
The preparation method of the inner layer and the outer layer of the water-soluble coating in the step (4) comprises the following steps: dissolving the components of the water-soluble coating in water, coating the water-soluble coating on the surfaces of two sides of the material pressed into the tablet, and drying. The amount of the water-soluble coating component is based on the requirements of film formation, film thickness and the like.
Setting the outer layer thickness of the water-soluble coating to be h1The thickness of the slow release control layer is h2The thickness of the chlorine dioxide release layer is h3The thickness of the inner layer of the water-soluble coating is h4Then, there are:
Figure BDA0002770659050000161
after the slow-release chlorine dioxide film with the multilayer film structure is prepared according to the method, the film is cut, punched and heat-sealed according to the product requirements, and then the film is installed in a slow-release sterilization device on a mask.
The water-soluble film material is prepared by mixing starch and chitosan in a mass ratio of 1: 1.
The water-soluble coating comprises the components of sodium alginate and starch in a mass ratio of 1: 1.
The slow-release chlorine dioxide granules are the products obtained in the preparation example 2.
Preparation example 7 preparation of a sustained-release chlorine dioxide film:
(1) preparing a sustained release control layer;
(2) preparing a chlorine dioxide release layer;
(3) laminating the sustained release control layer and the chlorine dioxide release layer into a tablet;
(4) an outer layer and an inner layer of a water-soluble coating are prepared on both sides of the material to be tabletted, respectively.
The slow release control layer comprises alkali, and the chlorine dioxide release layer comprises a chlorine dioxide precursor and an acidic solid.
The preparation method of the sustained-release control layer in the step (1) comprises the following steps: dispersing solid alkali in water-soluble film material solution, uniformly mixing, and casting to form a film.
The solid alkali is added in an amount of 15% wt of the water-soluble film material solution. The solid alkali is sodium carbonate. The dosage of the water-soluble film material is based on the requirements of film formation, film thickness and the like.
The preparation of the solid chlorine dioxide release layer in the step (2) comprises the following steps: dispersing the sustained-release chlorine dioxide particles obtained in the preparation example in a water-soluble film material solution, uniformly mixing, and casting to form a film.
The addition amount of the solid slow-release chlorine dioxide particles is 4 percent by weight of the water-soluble membrane material solution. The dosage of the water-soluble film material is based on the requirements of film formation, film thickness and the like.
The preparation method of the inner layer and the outer layer of the water-soluble coating in the step (4) comprises the following steps: dissolving the components of the water-soluble coating in water, coating the water-soluble coating on the surfaces of two sides of the material pressed into the tablet, and drying. The amount of the water-soluble coating component is based on the requirements of film formation, film thickness and the like.
Setting the outer layer thickness of the water-soluble coating to be h1The thickness of the slow release control layer is h2The thickness of the chlorine dioxide release layer is h3The thickness of the inner layer of the water-soluble coating is h4Then, there are:
Figure BDA0002770659050000171
after the slow-release chlorine dioxide film with the multilayer film structure is prepared according to the method, the film is cut, punched and heat-sealed according to the product requirements, and then the film is installed in a slow-release sterilization device on a mask.
The water-soluble film material is prepared by mixing starch and chitosan in a mass ratio of 1: 1.
The water-soluble coating comprises the components of sodium alginate and starch in a mass ratio of 1: 1.
The slow-release chlorine dioxide granules are the products obtained in the preparation example 3.
Example 1 a chlorine dioxide gas slow-release sterilization mask was assembled according to the structure shown in fig. 1 and described below:
a chlorine dioxide gas slow-release sterilization mask comprises a mask body, ear-hooking parts and slow-release sterilization devices, wherein the ear-hooking parts are arranged on the left side and the right side of the mask body, and the slow-release sterilization devices are arranged in through holes in the mask body; the slow-release degerming device comprises a slow-release chlorine dioxide film 1-1, wherein the slow-release chlorine dioxide film is sequentially provided with a water-soluble coating outer layer, a slow-release control layer, a chlorine dioxide release layer and a water-soluble coating inner layer from the outside to the inside of the mask.
The slow-release sterilizing device comprises a slow-release chlorine dioxide component 1, a slow-release chlorine dioxide film 1-1, a slow-release sleeve 2, an inner cover 3 and an outer cover 4; the slow-release chlorine dioxide component is of a cylindrical structure with one end open and the other end provided with a slow-release chlorine dioxide film, one side provided with the slow-release chlorine dioxide film is set as the outer side, and the chlorine dioxide film is provided with a through hole 1-2; the slow release sleeve is a hollow cylindrical structure with two open ends, the slow release chlorine dioxide component is arranged inside the slow release sleeve, and the outer wall of the slow release chlorine dioxide component is tightly attached to the inner wall of the slow release sleeve; the inner cover is of a hollow cylindrical structure with one open end at the outer side, the end wall at the non-open end is provided with an air vent 3-1, the inner cover is arranged at one end of the inner side of the slow release sleeve, and the inner wall of the inner cover is tightly attached to the outer wall of the slow release sleeve; the outer cover is a hollow cylindrical structure with the inner side and one open end, the end wall of the non-open end is provided with an air vent 4-1, the outer cover is arranged at one end of the outer side of the slow release sleeve, and the inner wall of the outer cover is tightly attached to the outer wall of the slow release sleeve.
The slow release chlorine dioxide film of this example was from preparative example 4.
Example 2 a chlorine dioxide gas slow-release sterilization mask was assembled according to the structure shown in fig. 1 and described below:
a chlorine dioxide gas slow-release sterilization mask comprises a mask body, ear-hooking parts and slow-release sterilization devices, wherein the ear-hooking parts are arranged on the left side and the right side of the mask body, and the slow-release sterilization devices are arranged in through holes in the mask body; the slow-release degerming device comprises a slow-release chlorine dioxide film 1-1, wherein the slow-release chlorine dioxide film is sequentially provided with a water-soluble coating outer layer, a slow-release control layer, a chlorine dioxide release layer and a water-soluble coating inner layer from the outside to the inside of the mask.
The slow-release sterilizing device comprises a slow-release chlorine dioxide component 1, a slow-release chlorine dioxide film 1-1, a slow-release sleeve 2, an inner cover 3 and an outer cover 4; the slow-release chlorine dioxide component is of a cylindrical structure with one end open and the other end provided with a slow-release chlorine dioxide film, one side provided with the slow-release chlorine dioxide film is set as the outer side, and the chlorine dioxide film is provided with a through hole 1-2; the slow release sleeve is a hollow cylindrical structure with two open ends, the slow release chlorine dioxide component is arranged inside the slow release sleeve, and the outer wall of the slow release chlorine dioxide component is tightly attached to the inner wall of the slow release sleeve; the inner cover is of a hollow cylindrical structure with one open end at the outer side, the end wall at the non-open end is provided with an air vent 3-1, the inner cover is arranged at one end of the inner side of the slow release sleeve, and the inner wall of the inner cover is tightly attached to the outer wall of the slow release sleeve; the outer cover is a hollow cylindrical structure with the inner side and one open end, the end wall of the non-open end is provided with an air vent 4-1, the outer cover is arranged at one end of the outer side of the slow release sleeve, and the inner wall of the outer cover is tightly attached to the outer wall of the slow release sleeve.
The slow release chlorine dioxide film of this example was from preparative example 5.
Comparative example 1 a chlorine dioxide gas slow-release sterilization mask was assembled according to the structure shown in fig. 1 and described below:
a chlorine dioxide gas slow-release sterilization mask comprises a mask body, ear-hooking parts and slow-release sterilization devices, wherein the ear-hooking parts are arranged on the left side and the right side of the mask body, and the slow-release sterilization devices are arranged in through holes in the mask body; the slow-release degerming device comprises a slow-release chlorine dioxide film 1-1, wherein the slow-release chlorine dioxide film is sequentially provided with a water-soluble coating outer layer, a slow-release control layer, a chlorine dioxide release layer and a water-soluble coating inner layer from the outside to the inside of the mask.
The slow-release sterilizing device comprises a slow-release chlorine dioxide component 1, a slow-release chlorine dioxide film 1-1, a slow-release sleeve 2, an inner cover 3 and an outer cover 4; the slow-release chlorine dioxide component is of a cylindrical structure with one end open and the other end provided with a slow-release chlorine dioxide film, one side provided with the slow-release chlorine dioxide film is set as the outer side, and the chlorine dioxide film is provided with a through hole 1-2; the slow release sleeve is a hollow cylindrical structure with two open ends, the slow release chlorine dioxide component is arranged inside the slow release sleeve, and the outer wall of the slow release chlorine dioxide component is tightly attached to the inner wall of the slow release sleeve; the inner cover is of a hollow cylindrical structure with one open end at the outer side, the end wall at the non-open end is provided with an air vent 3-1, the inner cover is arranged at one end of the inner side of the slow release sleeve, and the inner wall of the inner cover is tightly attached to the outer wall of the slow release sleeve; the outer cover is a hollow cylindrical structure with the inner side and one open end, the end wall of the non-open end is provided with an air vent 4-1, the outer cover is arranged at one end of the outer side of the slow release sleeve, and the inner wall of the outer cover is tightly attached to the outer wall of the slow release sleeve.
The slow release chlorine dioxide film of this example was obtained from preparative example 6.
Comparative example 2 a chlorine dioxide gas slow-release sterilizing mask was assembled according to the structure shown in fig. 1 and described below:
a chlorine dioxide gas slow-release sterilization mask comprises a mask body, ear-hooking parts and slow-release sterilization devices, wherein the ear-hooking parts are arranged on the left side and the right side of the mask body, and the slow-release sterilization devices are arranged in through holes in the mask body; the slow-release degerming device comprises a slow-release chlorine dioxide film 1-1, wherein the slow-release chlorine dioxide film is sequentially provided with a water-soluble coating outer layer, a slow-release control layer, a chlorine dioxide release layer and a water-soluble coating inner layer from the outside to the inside of the mask.
The slow-release sterilizing device comprises a slow-release chlorine dioxide component 1, a slow-release chlorine dioxide film 1-1, a slow-release sleeve 2, an inner cover 3 and an outer cover 4; the slow-release chlorine dioxide component is of a cylindrical structure with one end open and the other end provided with a slow-release chlorine dioxide film, one side provided with the slow-release chlorine dioxide film is set as the outer side, and the chlorine dioxide film is provided with a through hole 1-2; the slow release sleeve is a hollow cylindrical structure with two open ends, the slow release chlorine dioxide component is arranged inside the slow release sleeve, and the outer wall of the slow release chlorine dioxide component is tightly attached to the inner wall of the slow release sleeve; the inner cover is of a hollow cylindrical structure with one open end at the outer side, the end wall at the non-open end is provided with an air vent 3-1, the inner cover is arranged at one end of the inner side of the slow release sleeve, and the inner wall of the inner cover is tightly attached to the outer wall of the slow release sleeve; the outer cover is a hollow cylindrical structure with the inner side and one open end, the end wall of the non-open end is provided with an air vent 4-1, the outer cover is arranged at one end of the outer side of the slow release sleeve, and the inner wall of the outer cover is tightly attached to the outer wall of the slow release sleeve.
The slow release chlorine dioxide film of this example was from preparative example 7.
And (3) performance detection:
1. storage stability: according to the scheme provided by the invention, the chlorine dioxide precursor and the acid are stored in the solid slow-release chlorine dioxide particles, the chlorine dioxide precursor and the acid are separated and are not in direct contact, and the initial moisture is not contained in the chlorine dioxide particles, so that the storage stability is higher than that of all similar preparations on the market, the stability problem is not generated through stability detection in various forms, and the loss rate is almost zero; the mask is sealed by a vacuum bag before use, or sealing covers/sealing films are arranged on the inner side and the outer side of the slow-release degerming device in a false mode, and chlorine dioxide release reaction is carried out after the mask is opened for use.
2. The slow release sterilizing devices in the masks obtained in all the examples and comparative examples are partially and independently removed to carry out a chlorine dioxide release test, the opened slow release sterilizing devices with the same specification are used for replacing an aluminum film bag with air holes, which is filled with a composite breathable bag with the same size and is filled with a material to be tested, and the method in the CN201910357987.5 of the invention is adopted to test and compare the relative release rate of chlorine dioxide under the same room temperature environment, and the results are as follows:
chlorine dioxide release was detectable on the day of use for all examples, with essentially no induction period, and the chlorine dioxide release rate was stable for the next 47 days of example 1; example 2 also had essentially no induction period and the chlorine dioxide release rate leveled off over the next 33 days; comparative example 1 has no induction period, but the subsequent chlorine dioxide release is unstable and decays rapidly after reaching the peak release period on day 14; comparative example 2 the induction period was 3 days, almost no chlorine dioxide was released on the first day, the release started on the second day, and the release started immediately after the start of the release, and decayed rapidly after 15 days after the peak period.
On the basis of the above test, the humidity of the test environment is increased to 60%, and the test is repeated, the obtained curve trend is basically the same as the result, but the time for reaching the peak/stable chlorine dioxide release is greatly shortened: in all the examples, the release of chlorine dioxide can be detected within 1min after the use, the induction period is basically not existed, and the release rate of chlorine dioxide is stable within the next 51h in the example 1; example 2 also had essentially no induction period (1min) and the chlorine dioxide release rate leveled off over the next 37 h; comparative example 1 has no induction period (1min), but the subsequent release of chlorine dioxide is unstable and decays rapidly after 8h reaches the release peak; comparative example 2 the induction period was 4min and the release started immediately after rapid release and decayed rapidly 5h after reaching the peak period.
The comparative example data show that the method provided by the invention has the advantages that the slow release control layer containing the alkali can well control the release speed of the chlorine dioxide, and particularly, the effect of remarkably prolonging the release time of the chlorine dioxide can be achieved under the use condition with higher humidity; compared with the experimental effect of a comparative example, on the premise that the chlorine dioxide precursor and the acid are encapsulated by the solid particles, the thickness relation of each layer of the film based on the algorithm relation provided by the invention can further improve the slow release effect of the chlorine dioxide; even if the mass/thickness algorithm relation among the layers of the specific film provided by the invention is not adopted, the obtained film is still shorter than the induction period prepared by other methods, the release period of the chlorine dioxide is long, although the curve change of rapid attenuation after rapid release is generated, the horizontal axis span of the curve is larger, the slope is small, namely, the product chlorine dioxide release is more durable and stable; in addition, under the use condition of high humidity, the preparation for generating chlorine dioxide is not directly and simply prepared into an adjacent layered structure, and the release speed of the chlorine dioxide is also effectively controlled.
While the preferred embodiments and examples of the present invention have been described in detail, the present invention is not limited to the embodiments and examples, and various changes can be made without departing from the spirit of the present invention within the knowledge of those skilled in the art.

Claims (10)

1. The utility model provides a chlorine dioxide gas slow-release degerming gauze mask, includes the gauze mask body, hangers portion, slow-release bacteria removing device, its characterized in that: wherein the ear hanging parts are arranged at the left side and the right side of the mask body, and the slow-release bacteria removing device is arranged in a through hole on the mask body; the slow-release degerming device comprises a slow-release chlorine dioxide film (1-1), wherein the slow-release chlorine dioxide film is sequentially provided with a water-soluble coating outer layer, a slow-release control layer, a chlorine dioxide release layer and a water-soluble coating inner layer from the outside to the inside of the mask; wherein, the slow release control layer comprises alkali, and the chlorine dioxide release layer comprises a chlorine dioxide precursor and an acidic solid.
2. The chlorine dioxide gas slow-release sterilization mask according to claim 1, wherein: the chlorine dioxide release layer comprises solid slow-release chlorine dioxide particles and a water-soluble film material, and the chlorine dioxide precursor and the acidic solid are derived from the solid slow-release chlorine dioxide particles.
3. The chlorine dioxide gas slow-release sterilization mask according to claim 2, wherein: the solid slow-release chlorine dioxide particles are of a multilayer structure and sequentially comprise a core part, a precursor layer, an isolation layer, an outer precursor layer and an acidification layer from inside to outside.
4. The chlorine dioxide gas slow-release sterilization mask according to claim 3, wherein: in the solid slow-release chlorine dioxide particle, a core part comprises a spherical porous water-absorbing carrier material and alkali, a precursor layer comprises a powdery porous water-absorbing carrier material and a chlorine dioxide precursor, an isolation layer comprises a powdery porous water-absorbing carrier material starch adhesive, an outer precursor layer comprises a powdery porous water-absorbing carrier material and a chlorine dioxide precursor, and an acidification layer comprises a powdery porous water-absorbing carrier material and an acidic solid.
5. The chlorine dioxide gas slow-release sterilization mask according to claim 4, wherein: the slow-release sterilizing device comprises a slow-release chlorine dioxide component (1), a slow-release chlorine dioxide film (1-1), a slow-release sleeve (2), an inner cover (3) and an outer cover (4); wherein, the slow-release chlorine dioxide component is a cylindrical structure with one end open and the other end provided with a slow-release chlorine dioxide film, one side provided with the slow-release chlorine dioxide film is set as the outer side, and the chlorine dioxide film is provided with a through hole (1-2); the slow release sleeve is a hollow cylindrical structure with two open ends, the slow release chlorine dioxide component is arranged inside the slow release sleeve, and the outer wall of the slow release chlorine dioxide component is tightly attached to the inner wall of the slow release sleeve; the inner cover is of a hollow cylindrical structure with one open end at the outer side, the end wall at the non-open end is provided with an air vent (3-1) which is arranged at one end at the inner side of the slow release sleeve, and the inner wall of the slow release sleeve is tightly attached to the outer wall of the slow release sleeve; the outer cover is of a hollow cylindrical structure with the inner side and one open end, the end wall of the unopened end is provided with an air hole (4-1) which is arranged at one end of the outer side of the slow release sleeve, and the inner wall of the slow release sleeve is tightly attached to the outer wall of the slow release sleeve.
6. The chlorine dioxide gas slow-release sterilization mask according to claim 5, wherein: the preparation method of the slow-release chlorine dioxide film comprises the following steps:
(1) preparing a sustained release control layer;
(2) preparing a chlorine dioxide release layer;
(3) laminating the sustained release control layer and the chlorine dioxide release layer into a tablet;
(4) an outer layer and an inner layer of a water-soluble coating are prepared on both sides of the material to be tabletted, respectively.
7. The chlorine dioxide gas slow-release sterilization mask according to claim 6, wherein: the preparation method of the chlorine dioxide release layer in the step (2) comprises the following steps:
1) soaking a spherical porous water-absorbing carrier material in alkali liquor, and drying to form a spherical object which is a solid core part for slowly releasing chlorine dioxide;
2) mixing a powdery porous water-absorbing carrier material with a chlorine dioxide precursor in a ball mill, adding deionized water into the obtained mixture, uniformly mixing, coating the mixture on the surface of the core part obtained in the step 1) by spraying, and drying to form an inner precursor layer;
3) mixing a powdery porous water-absorbing carrier material with a starch adhesive in a ball mill, adding deionized water, uniformly mixing, coating the surface of the inner precursor layer obtained in the step 2) by spraying, and drying to form an isolating layer;
4) mixing a powdery porous water-absorbing carrier material with a chlorine dioxide precursor in a ball mill, adding deionized water into the obtained mixture, uniformly mixing, coating the surface of the isolating layer obtained in the step 3) by spraying, and drying to form an outer precursor layer;
5) mixing a powdery porous water-absorbing carrier material with an acidic solid in a ball mill, adding deionized water into the obtained mixture, uniformly mixing, coating the mixture on the surface of the outer precursor layer obtained in the step 4) by spraying, and drying to form an acidification layer to obtain solid slow-release chlorine dioxide particles;
6) dispersing the solid slow-release chlorine dioxide particles obtained in the step 5) in a water-soluble film material solution, uniformly mixing, and then casting to form a film.
8. The chlorine dioxide gas slow-release sterilization mask according to claim 7, wherein: let the core mass be m1Inner precursor layer mass m2Outer precursor layer mass m3Mass of acidizing layer is m4And the total mass of the obtained solid slow-release chlorine dioxide particles is M, the following components are obtained: m is1＝μ1(m2+m3)，m4＝μ2(m2+m3)，m2+m3＝μ3M; where μ is a constant, μ10.01-0.2, mu20.005-0.1, mu3Is 0.2-0.7.
9. The chlorine dioxide gas slow-release sterilization mask according to claim 7, wherein: let the core particle diameter be d1The thickness of the inner precursor layer is L2The thickness of the isolation layer is LkThe thickness of the outer precursor layer is L3The thickness of the acidified layer is L4Then, there are:
Figure FDA0002770659040000031
10. the chlorine dioxide gas slow-release sterilization mask according to claim 6, wherein: the preparation method of the inner layer and the outer layer of the water-soluble coating in the step (4) comprises the following steps: dissolving the components of the water-soluble coating in water, coating the water-soluble coating on the surfaces of two sides of a material pressed into a tablet, and drying; setting the outer layer thickness of the water-soluble coating to be h1The thickness of the slow release control layer is h2The thickness of the chlorine dioxide release layer is h3The thickness of the inner layer of the water-soluble coating is h4Then, there are:
Figure FDA0002770659040000041
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101716362A (en) * 2009-12-08 2010-06-02 北京欧凯纳斯科技有限公司 Bactericidal disinfectant material containing chlorine dioxide, and application thereof
CN105994262A (en) * 2016-05-20 2016-10-12 武汉普优瑞科技有限公司 Chlorine dioxide gas slow-release component and preparation method thereof and aseptic mask with same
CN108349202A (en) * 2015-08-18 2018-07-31 威斯康星校友研究基金会 The chlorition activated from UV discharges ClO on demand2The method and composition of gas

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101716362A (en) * 2009-12-08 2010-06-02 北京欧凯纳斯科技有限公司 Bactericidal disinfectant material containing chlorine dioxide, and application thereof
CN108349202A (en) * 2015-08-18 2018-07-31 威斯康星校友研究基金会 The chlorition activated from UV discharges ClO on demand2The method and composition of gas
CN108349224A (en) * 2015-08-18 2018-07-31 威斯康星校友研究基金会 ClO2Release of the gas from agricultural product packaging film
CN105994262A (en) * 2016-05-20 2016-10-12 武汉普优瑞科技有限公司 Chlorine dioxide gas slow-release component and preparation method thereof and aseptic mask with same

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