CN112346156A - Structural color substrate, optical element, manufacturing method of optical element and display device - Google Patents
Structural color substrate, optical element, manufacturing method of optical element and display device Download PDFInfo
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- CN112346156A CN112346156A CN201911400005.2A CN201911400005A CN112346156A CN 112346156 A CN112346156 A CN 112346156A CN 201911400005 A CN201911400005 A CN 201911400005A CN 112346156 A CN112346156 A CN 112346156A
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1814—Diffraction gratings structurally combined with one or more further optical elements, e.g. lenses, mirrors, prisms or other diffraction gratings
- G02B5/1819—Plural gratings positioned on the same surface, e.g. array of gratings
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1866—Transmission gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
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- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
- G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
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Abstract
The invention relates to a structural color substrate, an optical element, a manufacturing method of the optical element and a display device, wherein the structural color substrate comprises a substrate, a plurality of pixel wall structures and a plurality of nano protrusions, the pixel wall structures are arranged on the substrate in parallel, and two adjacent pixel wall structures define a pixel band; a plurality of nano-bulges are respectively and independently arranged in each pixel band, and the nano-bulges in the pixel bands are arranged in an array mode. The pixel band is limited through the pixel wall structure, a plurality of nano protrusions are arranged in each pixel band, the nano protrusions in each pixel band are arranged periodically, and the tone of a certain wavelength can be selectively enhanced by adjusting the interval period of the nano protrusions, so that the tone of the diffraction color can be adjusted. The nano-projections are in a physical structure, so that the nano-projections are stable and reliable, and the problem that the colloidal particle spacing of colloidal crystal particles in the traditional colloidal ink is difficult to control is solved.
Description
Technical Field
The invention relates to the technical field of structural color display, in particular to a structural color substrate, an optical element, a manufacturing method of the optical element and a display device.
Background
The conventional color reproduction process, which requires the use of ink, pigment, dye, etc., relies on pigment molecules to selectively absorb, reflect and transmit wavelengths of a specific visible light wave range under external illumination to develop different color senses, and the colors belong to pigment colors. The color of the colorant is degraded with time and environment and is difficult to exist for a long time, and the colorant has biotoxicity and poor biocompatibility and environmental compatibility.
The structural color closely related to the microstructure is a completely different color display reproduction than the pigment coloring. Structural color is the color that results from the enhancement of light selective interference (refraction, diffuse reflection, diffraction, or interference) due to the light passing through the periodic microstructure. The structural color has the excellent characteristics of high chroma, permanent color retention, iridescence, polarization effect and the like, has no influence of pigment molecules, and is a very environment-friendly color forming system. The traditional method for obtaining structural color is to use colloidal ink, but the colloidal particle distance is difficult to control, the problem that the formed color is not bright exists, and the like, and the method is difficult to popularize in a large range.
Therefore, improvements of the current structural color substrate, the optical element, the manufacturing method thereof, and the display device are still needed.
Disclosure of Invention
Therefore, it is necessary to provide a structural color substrate, an optical element, a manufacturing method thereof and a display device to solve the problem that the pitch of colloidal particles is difficult to control and the formed color is not vivid in the conventional method for obtaining the structural color by using the colloidal ink.
A structural color substrate comprising:
a substrate;
the pixel structures are arranged on the substrate in parallel, and two adjacent pixel wall structures define a pixel band;
the pixel structure comprises a plurality of pixel bands, a plurality of nano bulges and a plurality of pixel arrays, wherein the plurality of nano bulges are arranged in the pixel bands respectively and independently.
In one embodiment, the pixel bands are divided into a first type of pixel band, a second type of pixel band and a third type of pixel band;
in the first pixel band, the distance between adjacent nano protrusions is 600-750 nm, the diameter of the bottom surface of the peak of each nano protrusion is 400-600 nm, and the peak height is 650-800 nm;
in the second type of pixel band, the distance between adjacent nano protrusions is 500-600 nm, the diameter of the bottom surface of the peak of each nano protrusion is 300-480 nm, and the peak height is 600-750 nm;
in the third type of pixel strip, the distance between adjacent nano protrusions is 400-500 nm, the diameter of the bottom surface of the peak of each nano protrusion is 270-430 nm, and the peak height is 550-650 nm.
In one embodiment, the first type of pixel strip, the second type of pixel strip and the third type of pixel strip are alternately arranged in sequence.
In one embodiment, the height of the pixel wall structure is not lower than the height of the nano-bump.
In one embodiment, the distance between the adjacent pixel wall structures is 100-400 μm.
In one embodiment, the width of the pixel wall structure is 15-30 μm.
In one embodiment, the height of the pixel wall structure is 1.5-3 μm.
An optical element, comprising:
the structural color substrate of any of the embodiments above;
a reflective layer covering at least a portion of a surface of at least one of the nano-projections;
and the transparent refraction layer is arranged on one side of the reflection layer far away from the structural color substrate.
In one embodiment, the optical element further comprises:
and the packaging layer covers the transparent refraction layer and the pixel wall structure.
In one embodiment, the material forming the reflective layer includes at least one of silver, gold, copper, ruthenium, osmium, iridium, and platinum.
In one embodiment, the thickness of the reflecting layer is 100-300 nm.
In one embodiment, the refractive index of the transparent refractive layer is not less than 1.5.
In one embodiment, the thickness of the transparent refraction layer is 1.5-5 μm.
In one embodiment, the reflective layer covers a portion of the nano-protrusions, and the thickness of the reflective layer covered on different nano-protrusions is not exactly the same.
A method of making an optical element comprising the steps of:
providing the structural color substrate of any of the embodiments above;
acquiring image color parameters of a target pattern;
printing nano metal ink on the structural color substrate according to the image color parameters and the printing path to form a patterned structural color substrate;
and drying the patterned structural color substrate to obtain the optical element.
In one embodiment, the image color parameters of the target pattern are obtained by:
rasterizing the target pattern to obtain digital parameters;
and determining the image color parameters of the number of the printed nano metal ink drops according to the digital parameters.
In one embodiment, when the nano metal ink is printed on the structural color substrate, the gray scale change of the pattern color is realized by controlling the amount of the nano metal ink printed on each area on the structural color substrate.
A display device comprising an optical element as described above or an optical element made by a method as described above.
Compared with the prior art, the structural color substrate, the optical element, the manufacturing method of the optical element and the display device have the following beneficial effects:
the structure color substrate limits pixel bands through the pixel wall structure, a plurality of nano-bulges are independently arranged in each pixel band, and the nano-bulges in the pixel bands are arranged in an array mode. By adjusting the distance between adjacent nano-projections in the same pixel band, the tone of a certain wavelength can be selectively enhanced, thereby achieving the purpose of adjusting the tone of diffraction colors. In each pixel strip, a plurality of adjacent nano-protrusions can form a sub-pixel unit, so that each pixel strip can be regarded as a plurality of same sub-pixel units arranged in the longitudinal direction, and the same sub-pixel units can display the same tone. Because the plurality of pixel strips are arranged in parallel, namely, a plurality of sub-pixel units arranged in an array are formed on the structural color substrate, wherein the plurality of sub-pixel units in the same pixel strip are the same. Further, one pixel unit may be formed among several sub-pixel units adjacent in the transverse direction, for example, three sub-pixel units adjacent in the transverse direction may form one pixel unit, and the first sub-pixel unit, the second sub-pixel unit, and the third sub-pixel unit form one pixel unit, and the formed pixel unit may display a desired color tone through cooperation of three different sub-pixel units. Therefore, a plurality of pixel units arranged in an array mode can be formed on the structural color substrate, and required pattern display is finally formed through matching of the pixel units. That is, by controlling whether each sub-pixel unit participates in diffraction light emission, the whole can be controlled to display a specific pattern. The nano-projections are in a physical structure, so that the nano-projections are stable and reliable, and the problem that the colloidal particle spacing of colloidal crystal particles in the traditional colloidal ink is difficult to control is solved.
According to the optical element and the manufacturing method thereof, the reflecting layer is formed on the surface of the nano protrusion, the incident light is selectively interfered and enhanced to generate the structural color, the transparent refraction layer is formed on the reflecting layer, the refractive index of the transparent refraction layer is larger than that of the reflecting layer, the refractive index difference of structural color display is increased, and the photonic crystal structure is generated, so that the color display is enhanced, and the structural color display is practical. The nano-projections are in a physical structure, so that the nano-projections are stable and reliable, and the problem that the colloidal particle spacing of colloidal crystal particles in the traditional colloidal ink is difficult to control is solved.
The above-described display device comprises the optical element described above or the optical element manufactured by the method described above, and thus can have all the features and advantages of the optical element or the method described above.
Drawings
FIG. 1 is a schematic structural diagram of a structural color substrate according to an embodiment;
FIG. 2 is a schematic diagram of a reflective layer formed on the structural color substrate shown in FIG. 1;
FIG. 3 is a schematic structural diagram of an optical device including the structural color substrate shown in FIG. 1.
Reference numerals:
100: a structural color substrate; 110: a substrate; 120: a pixel wall structure; 140: and (4) nano-bumps.
Detailed Description
To facilitate an understanding of the invention, the invention will now be described more fully with reference to the accompanying drawings. Preferred embodiments of the present invention are shown in the drawings. This invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete.
It will be understood that when an element is referred to as being "disposed on" another element, it can be directly on the other element or intervening elements may also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present.
Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The terminology used in the description of the invention herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. As used herein, the term "and/or" includes any and all combinations of one or more of the associated listed items.
As shown in fig. 1, a structural color substrate 100 according to an embodiment of the invention includes a substrate 110, a pixel wall structure 120, and a nano-bump 140.
The pixel wall structures 120 are multiple, and the multiple pixel wall structures 120 are disposed in parallel on the substrate 110. Two adjacent pixel wall structures 120 define pixel bands, a plurality of nano-protrusions 140 are independently arranged in each pixel band, and the nano-protrusions 140 in the pixel bands are arranged in an array.
The distances between the nano-protrusions 140 arranged in an array in the same pixel strip are the same, i.e. the nano-protrusions are arranged periodically. The distance between the nano-protrusions 140 in the same pixel strip in the present invention refers to a periodic pitch, for example, the distance between the center points of the bottom surfaces of adjacent nano-protrusions. The distance between the nano-protrusions 140 arranged in an array in different pixel strips may be different.
The nano-protrusions 140 are of a nano-scale, for example, the distance between adjacent nano-protrusions 140, i.e., the pitch period of the nano-protrusions, is 400 to 700 nm.
When the scale is scaled to the mesoscopic range, the dimensions of the material are comparable to those of the light waves, which have a modulating effect on the transmission of the light waves, so that the light waves have the effect of additive constructive or additive cancellation. By adjusting the size of the microstructure of the material, light waves with different wavelengths enhanced can be obtained, and a series of colors from blue light to red light can be obtained. The hue of the color corresponds to the size of the microstructure: in the range of the microstructure capable of generating the structural color corresponding to the structural size, the larger the size of the microstructure is, the longer the wavelength of the generated color is, namely, the redder the color is; the smaller the microstructure size, the shorter the wavelength of the color it produces, i.e., the bluer. Therefore, the size of the microstructure array corresponding to the color tone one to one can be obtained. The invention can selectively strengthen the tone of a certain wavelength by adjusting the pitch period of the nano-projections, thereby realizing the adjustment of the diffraction color tone.
As shown in fig. 2, the substrate 100 with structural color may be formed by forming a reflective layer 20 on part or all of the nano-protrusions 140 by inkjet printing, and the like, so as to selectively interfere and enhance incident light to generate structural color, and "light up" the microstructure at a specific position, which is equivalent to constituting a "light-emitting" pixel region.
The structural color substrate 100 defines pixel bands through the pixel wall structure 120, a plurality of nano protrusions 140 are arranged in each pixel band, the nano protrusions 140 are independently arranged in each pixel band, the nano protrusions in the pixel bands are arranged in an array mode, the distances among the nano protrusions 140 in the same pixel band are the same, and the tone of a certain wavelength can be selectively enhanced by adjusting the distance among the adjacent nano protrusions in the same pixel band, so that the tone of diffraction color can be adjusted. In each pixel strip, a plurality of adjacent nano-protrusions can form a sub-pixel unit, so that each pixel strip can be regarded as a plurality of same sub-pixel units arranged in the longitudinal direction, and the same sub-pixel units can display the same tone. Because the plurality of pixel strips are arranged in parallel, namely, a plurality of sub-pixel units arranged in an array are formed on the structural color substrate, wherein the plurality of sub-pixel units in the same pixel strip are the same. Further, one pixel unit may be formed among several sub-pixel units adjacent in the transverse direction, for example, three sub-pixel units adjacent in the transverse direction may form one pixel unit, and the first sub-pixel unit, the second sub-pixel unit, and the third sub-pixel unit form one pixel unit, and the formed pixel unit may display a desired color tone through cooperation of three different sub-pixel units. Therefore, a plurality of pixel units arranged in an array mode can be formed on the structural color substrate, and required pattern display is finally formed through matching of the pixel units. That is, by controlling whether each sub-pixel unit participates in diffraction light emission, the whole can be controlled to display a specific pattern. The nano-protrusions 140 are of a physical structure, so that the nano-protrusions are stable and reliable, and the problem that the colloidal particle spacing of colloidal crystal particles in the traditional colloidal ink is difficult to control is solved.
The structural color substrate disclosed by the invention regulates and controls the specific hue of the substrate through the microstructure morphology, and the purity (color saturation) of the generated structural color is influenced by the height of a convex peak of a nano-convex, the distance between the convex peaks, the size and the shape of the convex peak and the like. For the generation of structural color, the mutual restriction of the pitch, peak height and peak bottom diameter of the nano-protrusions 140 on the bottom surface diameter and peak height has a great influence on the saturation of the generated color, and too high or too low is not beneficial to the generation of color with high purity.
As shown in fig. 1, in one example, the pixel strips are divided into a first type of pixel strip 131, a second type of pixel strip 132, and a third type of pixel strip 133. The distances among the nano-bumps in the same type of pixel strip are the same.
In the first-type pixel band 131, the distance between adjacent nano-protrusions 140 is 600-750 nm, the diameter of the bottom surface of the peak is 400-600 nm, the peak height is 650-800 nm, and the diffraction color is red.
In the second type of pixel band 132, the distance between adjacent nano-protrusions 140 is 500-600 nm, the diameter of the bottom surface of the peak is 300-480 nm, the peak height is 600-750 nm, and the diffraction color is green.
In the third type of pixel zone 133, the distance between adjacent nano-protrusions 140 is 400 to 500nm, the diameter of the bottom surface of the peak is 270 to 430nm, the peak height is 550 to 650nm, and the diffraction color appears blue.
In the specific example shown in fig. 1, within the first type of pixel band 131, the distance between adjacent nano-protrusions 140 is 650nm, the diameter of the bottom surface of the peak of the nano-protrusion 140 is 500nm, and the peak height is 750 nm. In the second type of pixel band 132, the distance between adjacent nano-protrusions 140 is 550nm, the diameter of the bottom surface of the peak of the nano-protrusion 140 is 400nm, and the peak height is 670 nm. In the third type of pixel band 133, the distance between adjacent nano-protrusions 140 is 450nm, the diameter of the bottom surface of the peak of the nano-protrusion 140 is 365nm, and the peak height is 570 nm.
The first type pixel strips 131, the second type pixel strips 132 and the third type pixel strips 133 are alternately arranged in sequence. The primary color microstructure array unit is used as a repeating unit on the substrate 110, and can be infinitely repeated to form a display basic structure of the whole picture.
Each stripe-shaped pixel band may be regarded as a plurality of sub-pixels closely arranged in a longitudinal direction. In the specific example shown in fig. 1, one first-type pixel band 131 may be regarded as a plurality of red sub-pixels formed to be closely arranged in the longitudinal direction, one second-type pixel band 132 may be regarded as a plurality of green sub-pixels formed to be closely arranged in the longitudinal direction, and one third-type pixel band 133 may be regarded as a plurality of blue sub-pixels formed to be closely arranged in the longitudinal direction, and the red, green and blue sub-pixels adjacent in the lateral direction may constitute one RGB pixel unit, that is, in the adjacent three pixel bands, there may be a plurality of RGB pixel units arranged in the longitudinal direction, and thus, a plurality of RGB pixel units arranged in an array may be formed. Further, by controlling whether each sub-pixel participates in diffraction light emission, it is possible to control the entire display to have a specific pattern.
The matching of three primary colors displayed by the nano-protrusions 140 with three different periods can facilitate the display of more colors. In other examples, the nano-protrusions 140 forming a single period may also exhibit other colors, such as red, orange, yellow, green, cyan, blue, and violet as primary colors. On the chromaticity diagram, any three points (not on the same straight line) or a plurality of points form a convex polygon, and all colors in the inner range of the convex polygon can be synthesized by the hues with the convex polygon as the vertex through a certain mixing ratio. The color tone of the convex polygon vertex is called primary color, and the most common colors include three primary colors of RGB, CMYK four primary colors (Cyan, Magenta, Yellow, black), and the like. The present invention describes the structural color substrate by taking RGB as an example, but the protection scope is far beyond this, any color tone that can be enclosed into a convex polygon on the chromaticity diagram can be used as the primary color, and the number of the displayed primary colors is not limited to three. The preparation process, the realization method and the display principle are similar regardless of the display of several primary colors.
The height of the pixel wall structure 120 is not less than the height of the nano-projection 140.
In one example, the height of the pixel wall structure 120 is higher than the height of the nano-bump 140. The nano protrusions 140 with different periods are separated by the pixel wall structure 120, and the height of the pixel wall structure 120 is higher than that of the nano protrusions 140, so that the flow of the dropped nano metal ink droplets is limited in the subsequent process, the mixing of the different nano protrusions due to the flow of the ink is avoided, and the defects of subsequent display deviation and the like due to the flow of the ink are avoided as much as possible.
In this example, the strip-shaped pixel wall structure 120 not only saves the manufacturing process, but also reduces the difficulty of inkjet printing, and meanwhile, the ink material is limited to a specified area and is not easy to move, so that ultra-high resolution fine printing can be realized.
Thus, there are 2 arrays in this display system: one is an array of nano-bumps 140 with different periods, and the other is an array of pixel wall structures 120 separating the different nano-bumps 140. The nano-protrusions 140 are processed in a nano-scale manner, and can be realized by methods such as electron beam lithography and nano-imprinting. For example, a thin film is formed on a surface of a substrate such as quartz by evaporating a metal layer, spin-coating an electron beam resist thereon, and baking. And then patterning the film by using an electron beam lithography system to form a patterned photoresist microstructure. And etching the substrate by dry etching to form a nano bump with high precision as a nano imprinting mold. Then, the nano-bump can be manufactured by a nano-imprinting process.
The pixel wall structure 120 is processed in micron scale and can be realized by photoetching, wet etching, silk screen printing and other methods. The process type and the window that can be selected are wide, and general photolithography can be completed, for example, a material with photosensitive property can be directly manufactured on the substrate 110 on which the nano-protrusions 140 are manufactured as the pixel wall structures 120, or the pixel wall structures 120 can be formed first by a more complicated photolithography process, and then the nano-protrusions 140 can be formed between the pixel wall structures 120 by nano-imprinting. In addition, a proper process can be selected, and the nano-projection array with the pixel wall structure can be manufactured at one time by nano-imprinting of an electron beam lithography system.
In one example, the width of the pixel wall structure 120 is between 15 μm and 30 μm, and the height is 1.5 μm to 3 μm.
In one example, the distance between the adjacent pixel wall structures is 100-400 μm.
Further, as shown in fig. 3, the present invention also provides an optical element 200, which includes any of the above-mentioned exemplary structural color substrates, a reflective layer 210 and a transparent refractive layer 220. Thus, the optical element can have all the features and advantages of the structured color substrate described above.
The reflective layer 210 covers at least a portion of the surface of at least one nano-bump 140, i.e. the reflective layer 210 covers part or all of the surface of the nano-bump 140, and the transparent refractive layer 220 is disposed on the reflective layer 210.
In one example, the transparent refractive layer 220 has a refractive index greater than that of the reflective layer 210.
In one example, the reflective layer 210 is made of a metal, such as at least one of silver, gold, copper, ruthenium, osmium, iridium, and platinum. In a specific example, the reflective layer 210 is made of silver. The reflective layer 210 may be formed by printing nano-metal ink on the nano-bump 140 and sintering the printed nano-metal ink into a film. The nano-silver can be conveniently prepared into nano-ink, and the formation of a film on the nano-projection 140 can be more easily realized.
The color displayed by the optical element 200 can be precisely controlled by the presence or absence of the reflective layer 210, which controls the color tone, or the thickness of the reflective layer 210, which controls the gray scale. Gray scale variations of the image are formed by controlling the thickness of the reflective layer 210, thereby modulating the light reflection, i.e., controlling the brightness of the color.
In one example, the reflective layer 210 has a thickness of 100 to 300 nm.
The core of the generation of structural color is the generation of photonic crystal structure, which requires large refractive index difference when light waves are transmitted among various media. By disposing a transparent dielectric material of high refractive index over the reflective layer 210, display of structural colors can be achieved.
In one example, the transparent refractive layer 220 includes a polymer matrix and inorganic nanoparticles dispersed in the polymer matrix. Wherein, the inorganic nano-particles have high refractive index, and can be but not limited to one or more of titanium dioxide and zirconium oxide.
In one example, the transparent refractive layer 220 has a refractive index of not less than 1.5. In one example, the transparent refractive layer 220 has a refractive index of 1.5 to 2.
In one example, the transparent refractive layer 220 has a thickness of 1.5 to 5 μm. In some specific examples, the thickness of the transparent refractive layer 220 is 2 μm, 3 μm, 4 μm.
As shown in fig. 3, in one example, the optical element 200 further includes an encapsulation layer 230, and the encapsulation layer 230 covers the transparent refraction layer 220 and the pixel wall structure 120. I.e., the encapsulation layer 230 is disposed over the transparent refractive layer 220.
Further, the present invention also provides a method for manufacturing the optical element 200, which includes the following steps:
step S100, providing the structural color substrate 100 of any of the above examples;
step S200, obtaining image color parameters of a target pattern;
step S300, according to the image color parameters and the printing path, printing nano metal ink on the structural color substrate 100 to form a patterned structural color substrate;
step S400, drying the patterned structural color substrate to obtain the optical element.
In one example, step S100 includes:
step S101, manufacturing or providing a substrate 110;
step S102, manufacturing a plurality of pixel wall structures 120 on a substrate 110, where the plurality of pixel wall structures 120 are arranged in parallel, and two adjacent pixel wall structures 120 define a pixel strip;
step S103, a plurality of nano bumps 140 are fabricated in each pixel band, the nano bumps 140 in each pixel band are arranged in an array, and the distances between the nano bumps 140 in the same pixel band are the same.
In one example, the material can be fabricated by photolithography, wet etching, or screen printing. Specifically, the process type and the window that can be selected are wide, and general photolithography can be completed, for example, a material with photosensitive property can be directly manufactured on the substrate 110 on which the nano-protrusions 140 are manufactured as the pixel wall structures 120, or the pixel wall structures 120 can be formed first by a more complicated photolithography process, and then the nano-protrusions 140 can be formed between the pixel wall structures 120 by nano-imprinting. In addition, a proper process can be selected, and the nano-projection array with the pixel wall structure can be manufactured at one time by nano-imprinting of an electron beam lithography system.
In one example, the nano-bump 140 is fabricated by photolithography or nano-imprinting the substrate 110. For example, a thin film is formed on a surface of a substrate such as quartz by evaporating a metal layer, spin-coating an electron beam resist thereon, and baking. And then patterning the film by using an electron beam lithography system to form a patterned photoresist microstructure. And etching the substrate by dry etching to form a nano bump with high precision as a nano imprinting mold. Then, the nano-bump can be manufactured by a nano-imprinting process.
In one example, the image color parameters of the target pattern are obtained by:
rasterizing the target pattern to obtain digital parameters;
and determining the image color parameters of the number of the printed nano metal ink drops according to the digital parameters.
For example, by rasterizing the target pattern, RGB values of each region point on the target pattern can be obtained, and according to the RGB values of each region point, a print path is internally calculated, so that the nano-metal ink with a corresponding drop number is printed in each region on the structural color substrate 100, which is equivalent to "lighting" a corresponding sub-pixel unit, and a color result perceived by the eye of the whole body after color mixing is obtained on a macro scale.
More specifically, the displayed color can be accurately controlled by the existence or the quantity of the nano metal ink printed in a unit area, the existence or the quantity of the color tone can be controlled, and the quantity of the gray scale can be controlled. The thickness of the reflective layer 210 can be controlled by controlling the number of ink drops printed by the nano-metal ink, thereby adjusting the light reflection, i.e., controlling the brightness of the color, i.e., forming the gray scale variation of the image. According to different color requirements of the required image, the substrate is patterned and then converted into the printing amount of the required nano metal ink, so that patterned data for printing the drop number of the nano metal ink is obtained, and the ink-jet printing equipment prints the patterned ink by internally calculating a printing path according to the patterned data of the ink, so that the color values of the original image, such as chromaticity, brightness, saturation, gray scale and the like, are represented, and the color reproduction of the original design is realized.
Therein is provided withIn one example, the volume of the printed silver ink in each region on the substrate 110 is 0-0.001 pL/mum2By controlling the volume of the micro-droplets and the volume step, 10-50-level different gray level reproduction can be realized for each color. For example, 20 different gray levels, the volume step is 0.0005 pL/mum2。
In the illustrated embodiment, in a primary color microstructure array, the same color is formed between every two pixel wall structures 120, which can effectively improve the efficiency of inkjet printing and reduce the process cost. In the ink-jet printing process, a plurality of nozzles are used, and the volume, speed, angle and the like of the ejection of some nozzles inevitably deviate from target values, so that the printing defects such as inaccurate dropping positions are caused. In the example, all the nozzles can be used for printing a whole row of ink drops on the printing test substrate, the ink jet waveform and the ink jet time sequence of each nozzle are automatically calibrated according to the shape of a curve formed by the ink drops of the printing result, the ink jet dropping positions are corrected to be on a straight line through several times of compensation, the correction is not needed in the other direction, the ink can be automatically leveled, uniform pixels are formed, the process complexity is reduced, and the accurate deposition of the ink drops is facilitated. By matching the strip-shaped pixel wall structure 120 in the printing mode, the printing production efficiency can be greatly improved, and the realization difficulty of technologies such as ink-jet printing and the like can be reduced. The printing resolution is guaranteed, the printing efficiency is improved, and the printing difficulty is reduced.
In one example, the nano-metal ink comprises the following raw materials: 10 wt% of nano metal particles, 50 wt% of ethylene glycol, 20 wt% of triethylene glycol monomethyl ether and 20 wt% of isopropanol. In one example, nano-silver is adopted as the nano-metal particles, and the particle size of the nano-silver is less than 50 nm. And in the printing process, the temperature of the printing platform is kept between 40 and 50 ℃, so that the solvent is quickly volatilized in the printing process, and finally, the silver film layer is formed after UV curing, baking and drying. It is noted that the nano-metal particles may be the material forming the reflective layer described above, i.e., the nano-metal particles may include at least one of silver, gold, copper, ruthenium, osmium, iridium, and platinum.
In one example, the transparent refractive layer 220 is formed on the reflective layer 210 by coating a polymer material containing high refractive index inorganic nanoparticles, which can be crosslinked by UV or high temperature, on the reflective layer 210, and curing to form a layer of high refractive index material, wherein the coating can be performed by drop coating, blade coating, slit coating, or the like.
In a specific example, the transparent refraction layer 220 is formed by coating with Norland NOA170 uv-curable glue, and the core material thereof is a zirconia nanocrystal material with a refractive index of 1.7.
The structural color RGB display principle is similar to the traditional display RGB, and RGB is mixed in different brightness in a micro range through patterning selection, so that the overall eye-perceived color result after color mixing is obtained on a macro scale. The application structural color display substrate just has realized the latent image that shows the image through the ink-jet printing silver ink when preparation shows the essential substance earlier stage, makes the image show in specific angle under white light environment is arranged in to processes such as drying again, can appear the display pattern of different tones in different angles, follow-up image can not change yet, belongs to static image display, because the image can present different colour feelings along with the angle, can be applied to fields such as anti-fake, domestic application, sensor.
Unlike the conventional RGB display scheme (in which RGB sub-pixels are controlled by voltage or current during actual display to mix RGB at different ratios to generate a specific color in one pixel), microstructures corresponding to three primary colors are prepared in advance, and then the microstructures at specific positions are selectively "lit" by a patterning method of an inkjet printing technology, so that a certain color at a specific position is displayed. The brightness of the sub-pixel is determined by the volume of the printing ink on the unit area of the sub-pixel, and the purpose of mixing RGB in different proportions in the display process can be realized by dropping specific ink on the specific sub-pixel at a specific position through ink-jet printing, so that the display of different tones is realized. Thereby realizing image display.
In the optical element 200 and the manufacturing method thereof, the reflective layer 210 is formed on the surface of the nano-protrusion 140, the selective interference and the reinforcement of the incident light are performed to generate the structural color, the transparent refractive layer 220 is formed on the reflective layer 210, the refractive index of the transparent refractive layer 220 is greater than that of the reflective layer 210, the refractive index difference of the structural color display is increased, and the photonic crystal structure is generated, so that the color display is enhanced, and the structural color display is practical. The nano-protrusions 140 are of a physical structure, so that the nano-protrusions are stable and reliable, and the problem that the colloidal particle spacing of colloidal crystal particles in the traditional colloidal ink is difficult to control is solved.
The optical element 200 and the color display formed by the inkjet printing method of the present application can be applied to the field of light emitting display, and can be used for dynamic display to display video images as long as addressing is possible.
Further, the present invention also provides a display device comprising the optical element described above or the optical element manufactured by the method described above. Thus, the display device may have all the features and advantages of the optical elements or methods described above.
The technical features of the embodiments described above may be arbitrarily combined, and for the sake of brevity, all possible combinations of the technical features in the embodiments described above are not described, but should be considered as being within the scope of the present specification as long as there is no contradiction between the combinations of the technical features.
The above-mentioned embodiments only express several embodiments of the present invention, and the description thereof is more specific and detailed, but not construed as limiting the scope of the invention. It should be noted that, for a person skilled in the art, several variations and modifications can be made without departing from the inventive concept, which falls within the scope of the present invention. Therefore, the protection scope of the present patent shall be subject to the appended claims.
Claims (12)
1. A structural color substrate, comprising:
a substrate;
the pixel structures are arranged on the substrate in parallel, and two adjacent pixel wall structures define a pixel band;
the pixel structure comprises a plurality of pixel bands, a plurality of nano bulges and a plurality of pixel arrays, wherein the plurality of nano bulges are arranged in the pixel bands respectively and independently.
2. The structured color substrate of claim 1, wherein the pixel bands are divided into a first type of pixel band, a second type of pixel band, and a third type of pixel band;
in the first pixel band, the distance between adjacent nano protrusions is 600-750 nm, the diameter of the bottom surface of the peak of each nano protrusion is 400-600 nm, and the peak height is 650-800 nm;
in the second type of pixel band, the distance between adjacent nano protrusions is 500-600 nm, the diameter of the bottom surface of the peak of each nano protrusion is 300-480 nm, and the peak height is 600-750 nm;
in the third type of pixel strip, the distance between adjacent nano protrusions is 400-500 nm, the diameter of the bottom surface of the peak of each nano protrusion is 270-430 nm, and the peak height is 550-650 nm.
3. The structural color substrate of claim 2 wherein the first type of pixel strip, the second type of pixel strip, and the third type of pixel strip are alternately arranged in sequence.
4. The structural color substrate of any one of claims 1 to 3, wherein the height of the pixel wall structure is not less than the height of the nano-protrusions; and/or
The distance between the adjacent pixel wall structures is 100-400 mu m; and/or
The width of the pixel wall structure is 15-30 mu m; and/or
The height of the pixel wall structure is 1.5-3 mu m.
5. An optical element, comprising:
the structural color substrate of any one of claims 1 to 4;
a reflective layer covering at least a portion of a surface of at least one of the nano-projections;
and the transparent refraction layer is arranged on one side of the reflection layer far away from the structural color substrate.
6. The optical element of claim 5, further comprising:
and the packaging layer covers the transparent refraction layer and the pixel wall structure.
7. The optical element of claim 6, wherein the reflective layer is formed from a material comprising at least one of silver, gold, copper, ruthenium, osmium, iridium, and platinum; and/or
The thickness of the reflecting layer is 100-300 nm; and/or
The refractive index of the transparent refraction layer is not less than 1.5; and/or
The thickness of the transparent refraction layer is 1.5-5 mu m.
8. An optical element as recited in any one of claims 5 to 7, wherein said reflective layer covers a portion of said nano-projections, and wherein the thickness of said reflective layer covered on different ones of said nano-projections is not exactly the same.
9. A method of making an optical element, comprising the steps of:
providing a structural color substrate according to any one of claims 1 to 4;
acquiring image color parameters of a target pattern;
printing nano metal ink on the structural color substrate according to the image color parameters and the printing path to form a patterned structural color substrate;
and drying the patterned structural color substrate to obtain the optical element.
10. The production method according to claim 9, wherein the image color parameter of the target pattern is obtained by:
rasterizing the target pattern to obtain digital parameters;
and determining the image color parameters of the number of the printed nano metal ink drops according to the digital parameters.
11. The method of claim 9, wherein the amount of the nano-metal ink printed on each region of the structural color substrate is controlled to achieve a gray scale change in the color of the pattern when the nano-metal ink is printed on the structural color substrate.
12. A display device comprising the optical element according to any one of claims 5 to 8 or the optical element manufactured by the method according to any one of claims 9 to 11.
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| CN114706152A (en) * | 2022-03-15 | 2022-07-05 | 清华大学 | Processing method and system of patterned blazed grating |
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| US20100307705A1 (en) * | 2007-12-21 | 2010-12-09 | Giesecke & Devrient Gmbh | Security element |
| CN105555543A (en) * | 2013-05-10 | 2016-05-04 | Idit技术集团 | Nanostructure array diffractive optics for RGB and CMYK color displays |
| CN108321170A (en) * | 2018-01-16 | 2018-07-24 | 南方科技大学 | Method for manufacturing high-efficiency light conversion color display pixel film |
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| US20100307705A1 (en) * | 2007-12-21 | 2010-12-09 | Giesecke & Devrient Gmbh | Security element |
| CN105555543A (en) * | 2013-05-10 | 2016-05-04 | Idit技术集团 | Nanostructure array diffractive optics for RGB and CMYK color displays |
| CN108321170A (en) * | 2018-01-16 | 2018-07-24 | 南方科技大学 | Method for manufacturing high-efficiency light conversion color display pixel film |
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