CN112276788A

CN112276788A - Grinding and polishing disc surface for ceramic material surface

Info

Publication number: CN112276788A
Application number: CN202011163753.6A
Authority: CN
Inventors: 刘时坤
Original assignee: Hunan Yuanhong Special Ceramics Co ltd
Current assignee: Hunan Yuanhong Special Ceramics Co ltd
Priority date: 2020-10-27
Filing date: 2020-10-27
Publication date: 2021-01-29

Abstract

The invention discloses a grinding and polishing disk surface for a ceramic material surface, which comprises a disk body, wherein a buffer cushion layer is formed on the surface of the disk body, and a polishing pad with a pad block is formed on the buffer cushion layer to serve as a grinding structure; the liner block comprises three layers of rubber liners which are arranged in a laminated mode, the thicknesses of an upper layer rubber liner, a middle layer rubber liner and a lower layer rubber liner in the three layers of rubber liners are decreased gradually, and polyether-ether-ketone liner materials are formed between the upper layer rubber liner and the middle layer rubber liner, between the middle layer rubber liner and the lower layer rubber liner and on the lower surface of the lower layer rubber liner; the polishing pad is of a multi-layer composite structure and comprises a nitrile rubber layer, an inner felt layer and a pile blanket formed on the surface of the inner felt layer from top to bottom. The invention can obviously improve the surface polishing efficiency and polishing effect of the small-size ceramic wafer, reduce the consumption of the polishing agent and improve the precision of the polished workpiece.

Description

Grinding and polishing disc surface for ceramic material surface

Technical Field

The invention relates to a surface polishing technology in the field of material processing, in particular to a grinding and polishing disk surface for a ceramic material surface.

Background

Grinding and polishing refer to an operation treatment process for modifying the surface of a workpiece by using a flexible polishing tool and abrasive particles or other polishing media to obtain a smooth surface. In the preparation technology of the ceramic valve plate and the valve core, the sintering shrinkage rate of the ceramic part is large, so that the dimensional accuracy of a sintered ceramic body cannot be ensured, the bottom of the sintered ceramic body is not flat or a large amount of burrs are generated, and the end faces of the ceramic valve plate, the valve core and other sealing ceramic materials are required to be ground and polished frequently to obtain better surface smoothness and flatness, so that the sealing performance of the valve and the stability of the valve in a working state are ensured.

However, the sintered and formed ceramic piece has the characteristics of high hardness, high strength and large brittleness, and the processing difficulty is high, and the ceramic polishing machine is generally used for processing, and is used as precision polishing equipment, the main working part of the ceramic polishing machine is a polishing disk, a material to be polished is placed in a polishing area of the polishing disk, and the relative movement of the polishing disk and the ceramic piece is matched with the disk surface pressure, so that the workpiece and the polishing disk are subjected to relative operation friction to achieve the polishing purpose. However, in the prior art, the design of the polishing disk is too simple, the polishing disk surface wrapped by a single material is matched with a polishing agent for grinding and polishing, when a large-size ceramic piece is processed, the effect is good, the cost is low, when the polishing disk is used for processing small-size ceramic pieces such as ceramic valve plates and the like, the rejection rate is high, and when the size precision of a workpiece has high requirements, the technical requirements of processing are difficult to achieve.

Disclosure of Invention

The present invention is to provide a polishing disc surface for grinding the surface of a ceramic material, so as to solve the above-mentioned drawbacks in the prior art.

The technical problem solved by the invention is realized by adopting the following technical scheme:

the grinding and polishing disc surface for the surface of a ceramic material comprises a grinding disc body, wherein a buffer cushion layer is formed on the surface of the grinding disc body, and a grinding structure is formed on the buffer cushion layer and comprises a lining block and a polishing pad attached to the surface of the lining block;

the lining block comprises three layers of rubber gaskets which are arranged in a laminated mode, the single-layer thickness of the three layers of rubber gaskets is 0.8-10 mm, the thickness of an upper layer rubber gasket in the three layers of rubber gaskets is larger than that of a middle layer rubber gasket, the thickness of the middle layer rubber gasket is larger than that of a lower layer rubber gasket, and polyether-ether-ketone lining materials are formed between the upper layer rubber gasket and the middle layer rubber gasket, between the middle layer rubber gasket and the lower layer rubber gasket and on the lower surface of the lower layer rubber gasket;

the polishing pad is of a multi-layer composite structure and comprises a nitrile rubber layer, an inner felt layer and a pile blanket formed on the surface of the inner felt layer, wherein the nitrile rubber layer and the inner felt layer are arranged from top to bottom.

As a further limitation, the upper part of the grinding disc body is connected with a lifting bracket, and the grinding disc body can move up and down through the lifting bracket.

As a further limitation, an adjusting bracket is further arranged in front of the cushion pad layer and the grinding disc body, the adjusting bracket comprises a panel and a bottom plate, the panel is fixedly connected with the grinding structure, the bottom plate is fixedly connected with the grinding disc body, a gap space is arranged between the panel and the bottom plate, and the panel and the bottom plate are connected and fixed in the gap space through a plurality of independent elastic connecting pieces;

the resilient coupling is preferably a high density rubber pad or spring.

As further limited, the cushion layer is a whole block of integrally formed polyurethane foam-rubber cushion, and the cross section of the polyurethane foam-rubber cushion is consistent with the disc surface of the grinding disc body and is fixed on the lower surface of the grinding disc body.

By way of further limitation, the three layers of rubber gaskets are all formed by molding the vulcanized alkyl rubber layer.

By further limitation, the thickness of the upper layer rubber gasket is 5-6 mm, the thickness of the middle layer rubber gasket is 3-4 mm, and the thickness of the lower layer rubber gasket is 1-2 mm; and the thickness of the polyetheretherketone lining is 3 mm.

As a further limitation, the thickness of the nitrile rubber layer is 3-6 mm.

As a further limitation, the pile length of the pile part of the pile face blanket is 3-5 mm, and the whole pile face blanket is used for carrying out outer side edge covering and fixing on the whole polishing disk at the outer edge.

By way of further limitation, the pile-faced carpet is one of a nylon carpet, a polypropylene carpet, and a polyester carpet.

Has the advantages that: the grinding and polishing disc surface used for the ceramic material surface can be used for efficiently grinding and polishing the ceramic material by matching with the polishing agent, can obviously shorten the polishing processing time and reduce the required milled powder concentration, is particularly suitable for surface polishing of small-size and thin-sheet ceramic material sheets, has higher polishing efficiency and polishing precision and high yield, can not generate the phenomenon of product fragment in the processing, can effectively reduce the concentration and the dosage of the required polishing agent, and prolongs the service life of the polishing disc of the polishing machine.

Drawings

FIG. 1 is a cross-sectional view of a preferred embodiment of the present invention.

Wherein: 1. fixing the buckle plate; 2. fixing the bolt; 3. a grinding disc body; 4. a base plate; 5. an elastic connecting member; 6. a panel; 7. a cushion layer; 8. a lifting support; 9. an upper rubber liner; 10. an upper poly ether ketone lining material; 11. a middle layer rubber gasket; 12. middle layer polyetheretherketone lining material; 13. a lower rubber pad; 14. a lower polyetheretherketone liner; 15. a nitrile rubber layer; 16. an inner felt layer; 17. pile face blanket.

Detailed Description

In order to make the technical means, the creation characteristics, the achievement purposes and the effects of the invention easy to understand, the invention is further explained below by combining the specific drawings.

Referring to fig. 1, a preferred embodiment of an abrasive polishing disk surface for ceramic material surfaces includes a disk body 3 and abrasive structures formed on the disk body 3. In this embodiment, the lifting support 8 is connected on the upper portion of the grinding disc body 3, and the lifting support 8 is controlled to ascend and descend by the external lifting motor of the lifting support 8 and the lifting positioning mechanism, and meanwhile, the grinding disc body 3 is externally connected with the rotating motor and further controls the grinding disc body 3 to rotate, so that the grinding structure is matched with the grinding structure to grind the surface of the workpiece which is in contact with the grinding surface of the grinding structure so as to complete the grinding operation.

The lower surface of the grinding disc body 3 is provided with an adjusting bracket in a molding way, the adjusting bracket comprises two disc structures which are arranged in parallel, the two disc structures respectively form a bottom plate 4 and a panel 6, wherein the bottom plate 4 is fixedly connected with the grinding disc body 3, the panel 6 is fixedly connected with the grinding structure, a gap space layer with the height of 3mm is arranged between the bottom plate 4 and the panel 6, and a plurality of high-density rubber cushion blocks are arranged in the gap space layer at intervals and serve as elastic connecting pieces 5. The cross sectional dimension of adjustment support is less than the surface dimension of mill disk body 3 to laminate on the lower surface of mill disk body 3, and there is cushion 7 at the surface shaping of adjustment support, this cushion 7 is the polyurethane foam-rubber cushion who is a monoblock integrated into one piece, the cross sectional shape of cushion 7 is unanimous with the quotation shape on the 3 lower surfaces of mill disk body, and at outer outsourcing adjustment support, through the adhesive adhesion on the upper surface of cushion 7 on the lower surface of mill disk body 3 and panel 6.

And the abrasive structure includes a pad and a polishing pad conforming to a surface of the pad. The lining block is of a prefabricated structure, is formed on the lower surface of a cushion layer 7 and comprises three layers of rubber gaskets which are arranged in a laminated mode, wherein the three layers of rubber gaskets are formed by vulcanized alkyl rubber layers, the thickness of an upper layer rubber gasket 9 is 5mm, the thickness of a middle layer rubber gasket 11 is 4mm, the thickness of a lower layer rubber gasket 13 is 1mm, an upper layer polyether ether ketone lining material 10, a middle layer polyether ether ketone lining material 12 and a lower layer polyether ether ketone lining material 14 are formed between the upper layer rubber gasket and the middle layer rubber gasket, between the middle layer rubber gasket and the lower layer rubber gasket and on the lower surface of the lower layer rubber gasket respectively, and the thicknesses of the upper layer polyether ether ketone lining material 10, the middle layer polyether ether ketone lining material 12 and the lower layer polyether ether ketone lining material 14 are all 3 mm; the polishing pad is of a multi-layer composite structure, the uppermost layer of the polishing pad is a butyronitrile rubber layer 15 with the thickness of 3mm, an inner felt layer 16 and a suede blanket 17 are sequentially formed on the lower surface of the butyronitrile rubber layer 15, the suede blanket 17 is formed on the surface of the inner felt layer and is of a peelable structure with the butyronitrile rubber layer 15, the suede blanket 17 is a polypropylene blanket, the pile length of a napped part on the blanket surface is 3-5 mm, and the upper surface of a workpiece placed under the surface of the grinding polishing disc is ground by taking the outer surface of the suede blanket 17 as a grinding processing surface.

In order to ensure the stability of the suede blanket 17 during processing, the outer edge of the suede blanket 17 is wrapped to the outer edge of the upper surface of the grinding disc body 3, and the position of the outer edge of the upper surface of the grinding disc body 3 is fixed through the combination of the fixing buckle plate 1 and the fixing bolt 2. The polishing pad can be replaced as a whole after the pile of the pile portion of the pile blanket 17 is worn to ensure the processing effect, or only the carpet portion including the inner layer of the pile blanket 16 and the pile blanket 17 can be replaced to reduce the cost.

The foregoing shows and describes the general principles, essential features, and advantages of the invention. It will be understood by those skilled in the art that the present invention is not limited to the embodiments described above, which are described in the specification and illustrated only to illustrate the principle of the present invention, but that various changes and modifications may be made therein without departing from the spirit and scope of the present invention, which fall within the scope of the invention as claimed. The scope of the invention is defined by the appended claims and equivalents thereof.

Claims

1. The grinding and polishing disc surface for the surface of a ceramic material comprises a disc body, and is characterized in that a buffer layer is formed on the surface of the disc body, a grinding structure is formed on the buffer layer, and the grinding structure comprises a lining block and a polishing pad attached to the surface of the lining block;

2. The abrasive polishing disk surface for ceramic material surfaces as set forth in claim 1, wherein said upper portion of said disk body is connected to a lifting bracket and the up-and-down movement of said disk body is effected by said lifting bracket.

3. The disc surface of the grinding and polishing disc for the surface of ceramic materials as claimed in claim 1, wherein an adjusting bracket is further disposed in front of the cushion layer and the disc body, the adjusting bracket includes a face plate and a bottom plate, the face plate is fixedly connected to the grinding structure, the bottom plate is fixedly connected to the disc body, a gap space is disposed between the face plate and the bottom plate, and the face plate and the bottom plate are connected and fixed by a plurality of independent elastic connecting pieces.

4. The abrasive polishing disk surface for ceramic material surfaces of claim 3 wherein said resilient connecting member is a high density rubber pad or spring.

5. The disc surface of a polishing disc for grinding ceramic material surfaces as recited in claim 1, wherein said cushion layer is a one-piece integrally formed polyurethane foam pad having a cross-sectional shape conforming to the disc surface shape of said disc body and fixed to the lower surface of said disc body.

6. The abrasive polishing disk surface for ceramic materials as claimed in claim 1, wherein the three rubber pads are formed of a vulcanized alkyl rubber layer.

7. The disc surface of the grinding and polishing disc for the surface of ceramic materials as claimed in claim 1, wherein the thickness of the upper rubber pad is 5 to 6mm, the thickness of the middle rubber pad is 3 to 4mm, and the thickness of the lower rubber pad is 1 to 2 mm; and the thickness of the polyetheretherketone lining is 3 mm.

8. The abrasive polishing disk surface for ceramic material surfaces as claimed in claim 1, wherein said nitrile rubber layer has a thickness of 3 to 6 mm.

9. The abrasive polishing disk surface for ceramic material surface as claimed in claim 1, wherein pile length of pile portion of said pile blanket is 3-5 mm, and the whole pile blanket is externally bound and fixed to the polishing disk at outer edge.

10. The abrasive polishing disk surface for ceramic material surfaces of claim 1 wherein said pile blanket is one of a nylon blanket, a polypropylene blanket, and a polyester blanket.