CN112176279A

CN112176279A - Metal shade

Info

Publication number: CN112176279A
Application number: CN201910589664.9A
Authority: CN
Inventors: 李仲仁; 赖元章
Original assignee: Finemat Applied Materials Co ltd
Current assignee: Finemat Applied Materials Co ltd
Priority date: 2019-07-02
Filing date: 2019-07-02
Publication date: 2021-01-05

Abstract

The invention relates to a metal mask, which comprises a mask plate body made of metal materials and etching structures formed on one side or two sides of the mask plate body, wherein each etching structure is provided with at least one patterned etching groove, the mask plate body is provided with a plate body base part on the side edge of the patterned etching groove along the plate thickness direction, a patterned rib part is formed in the patterned etching groove of the etching structure on one side or two sides of the mask plate body, or symmetrical or asymmetrical etching structures are formed on two sides of the mask plate body, so that the plate body base part is positioned at the middle position in the plate thickness of the mask plate body, the mechanical strength of the metal mask is effectively improved under the condition that the thickness of the mask plate body is not changed by the metal mask, and the metal mask has the effect of improving a piece adhered.

Description

Metal shade

Technical Field

The present invention relates to a metal mask, and more particularly, to a metal mask for forming a patterned film on a surface of a glass substrate or a flexible substrate, which provides a partial shielding function in a film deposition method.

Background

In the manufacturing process of the Organic Light-Emitting Diode (OLED) display, as shown in fig. 6, when a Physical Vapor Deposition (PVD) or a Chemical Vapor Deposition (CVD) is performed on the surface of a glass substrate or a flexible substrate, and a metal mask 40 having a plurality of patterned film holes 41 is combined to perform a film-coating manufacturing method, the shadow effect (shadow effect) can be prevented, and the metal mask 40 is performed in a state of contacting the substrate 50 (such as the glass substrate or the flexible substrate).

In the foregoing method for manufacturing a plating film, since the surfaces of the metal mask 40 and the substrate 50 (e.g., a glass substrate or a flexible substrate) are smooth, the sticking phenomenon is likely to occur between the metal mask 40 and the substrate 50 (e.g., a glass substrate or a flexible substrate) in a vacuum environment. In order to solve the problem of the sticking in the foregoing plating manufacturing method, as shown in fig. 7, most manufacturers currently perform half etching on the metal mask 60 to form half etching grooves 62 on one side of the metal mask 60 with respect to the peripheral region of the patterned plating hole 61.

However, the difficulty of the semi-etching process for controlling the precision etching process is high, which results in high product defect rate of the metal mask and relatively high manufacturing cost. Moreover, when the metal mask is under unbalanced tensile force, an unbalanced strain is generated, which causes problems such as deformation or warpage of a local portion of the metal mask, thereby affecting the quality of the plated film.

In addition, in the foregoing method for manufacturing a plated film, when the plating step is completed and the vacuum is released, the contact area between the metal mask and the glass substrate or the flexible substrate is easily separated during the process, and the problem of poor appearance such as scratch and abrasion is easily caused by the sheet adhesion phenomenon of the local low vacuum, which causes friction between the metal mask and two objects made of different materials such as the glass substrate or the flexible substrate.

Disclosure of Invention

The technical problem to be solved by the invention is as follows: a metal mask is provided to solve the problem that the structure of the existing metal mask is difficult to achieve better mechanical strength after half etching for improving the sticking problem.

The technical solution proposed by the present invention is: providing a metal mask, which comprises a mask plate body made of a metal material, wherein the mask plate body is defined with a contact area and a peripheral area positioned at the periphery of the contact area, and a plurality of coating film pattern holes and a shielding part positioned between adjacent coating film pattern holes are arranged in the contact area; wherein:

the metal mask comprises an etching structure, wherein the etching structure is formed on one side of the mask plate body, the other side edge of the etching structure along the plate thickness direction of the mask plate body is provided with a plate body base part, the etching structure comprises at least one patterning etching groove and at least one patterning rib part positioned in the patterning etching groove, the etching depth of the patterning etching groove is smaller than or equal to the thickness of the plate body base part, and the patterning rib part is connected with the plate body base part.

In the metal mask, the total area of the etching structures in the shielding portion is greater than or equal to 20% and less than or equal to 85% of the total area of the contact region.

In the metal mask, the groove width of the patterned etching groove is greater than or equal to the rib width of the patterned rib, the patterned etching groove of the etching structure comprises a plurality of groove units, and the groove units are connected into a whole, so that the patterned etching groove of the etching structure forms a continuous pattern.

In the metal mask, the groove width of the patterned etching groove is greater than or equal to the rib width of the patterned rib, the patterned etching groove of the etching structure comprises a plurality of groove units, the groove units are not completely connected, the pattern of the patterned etching groove of the etching structure is a discontinuous pattern, the patterned rib positioned in the patterned etching groove forms a continuous pattern, and the patterned rib is connected with the peripheral area of the mask plate body.

The other technical solution proposed by the invention is as follows: providing a metal mask, which comprises a mask plate body made of a metal material, wherein the mask plate body is defined with a contact area and a peripheral area positioned at the periphery of the contact area, and a plurality of coating film pattern holes and a shielding part positioned between adjacent coating film pattern holes are arranged in the contact area; wherein:

the metal mask comprises two etching structures, wherein the two etching structures are respectively formed on two opposite sides of a mask plate body, a plate body base part is arranged between the two etching structures of the mask plate body, each etching structure comprises at least one patterning etching groove and at least one patterning rib part positioned in the patterning etching groove, the total etching depth of the patterning etching grooves of the two etching structures is smaller than or equal to the thickness of the plate body base part, and the patterning rib parts are connected with the plate body base part.

In the metal mask, the total area of the etching structures in the shielding portion is greater than or equal to 20% and less than or equal to 85% of the total area of the contact region, and the groove width of the patterned etching grooves is greater than or equal to the rib width of the patterned ribs.

In the metal mask, the patterned etching trench of the etching structure includes a plurality of trench units, and the trench units are connected together to form a continuous pattern in the patterned etching trench of the etching structure.

In the metal mask, the patterned etching groove of the etching structure comprises a plurality of groove units, the groove units are not completely connected, the pattern of the patterned etching groove of the etching structure is a discontinuous pattern, and the patterned rib part in the patterned etching groove forms a continuous pattern and is connected with the peripheral area of the mask plate body.

the metal mask comprises two etching structures, wherein the two etching structures are respectively formed on two opposite sides of a mask plate body, a plate body base part is arranged between the two etching structures of the mask plate body, each etching structure is provided with a patterned etching groove, and the total etching depth of the patterned etching grooves of the two etching structures is smaller than or equal to the thickness of the plate body base part.

The metal mask has the beneficial effects that the metal mask maintains the effect of improving the adhesive sheet of the coating manufacturing method by utilizing the patterned etching grooves formed on one side or both sides of the mask plate body, and the metal mask also forms patterned rib parts in the patterned etching grooves of the etching structure on one side or both sides of the mask plate body or utilizes the etching structures on both sides of the mask plate body to enable the base part of the plate body to be positioned at the middle position in the plate thickness of the mask plate body and the like, so that the mechanical strength of the metal mask is effectively improved by utilizing the metal mask under the condition that the thickness of the mask plate body is not changed by the metal mask.

When the patterned etching grooves on one side or two sides of the shielding plate body are provided with the patterned ribs, the plurality of groove units in the patterned etching grooves can be connected into a whole, so that the patterns of the patterned etching grooves of the etching structure are continuous patterns, the metal shielding plate is beneficial to quickly removing vacuum suction force when the metal shielding plate is in vacuum release, and the problem of scratching caused by friction of different materials between the metal shielding plate and the substrate is reduced. When the groove units are not connected, the pattern of the patterned etching groove of the etching structure is a discontinuous pattern, the patterned rib parts are connected to form a continuous pattern and are connected with the peripheral area of the mask plate body, so that the tension applied to the peripheral area of the mask plate body can be transmitted to the hole edge of each coating pattern hole of the contact area through the plate body base part and the patterned rib parts forming the continuous pattern, and a uniform strain effect can be generated.

The metal shade can also utilize the structure that the patterned etching grooves on the two sides of the shade plate body are provided with the single patterned etching groove, which is beneficial to quickly removing the vacuum suction force when the metal shade is in vacuum release, and reducing the problem of scratching caused by friction of different materials between the metal shade and the substrate.

Drawings

FIG. 1 is a schematic plan view of a metal mask according to a first preferred embodiment of the present invention.

Fig. 2 is a partial plan view of the metal mask of fig. 1 according to a first preferred embodiment.

FIG. 3 is a partial plan view of a second preferred embodiment of the metal mask of the present invention.

FIG. 4 is a partial schematic plan view of a metal mask according to a third preferred embodiment of the present invention.

FIG. 5 is a reference diagram illustrating the use of the metal mask of FIG. 4 in contact with a substrate for coating.

FIG. 6 is a schematic plan view of a conventional first metal mask in contact with a substrate for coating.

Fig. 7 is a schematic plan view of a conventional second metal mask.

The reference numerals are briefly described:

10A, 10B, 10C mask plate

101 first side, 102 second side

11 contact area, 111 plating pattern holes

112 shielding part, 113 hole edge

12 peripheral region, 13A, 13B, 13C plate base

20A, 20B, 20C etching structure, 21A, 21B, 21C patterning etching groove

211A, 211B trench cells, 22A, 22B patterned ribs

D thickness of the mask plate, H etching depth

W1 groove Width of patterned etch grooves, W2 Rib Width of patterned Ribs

30 base plate

40 metal mask

50 base plate

60 metal mask

61 patterned coating hole

62 half etch bath.

Detailed Description

The technical means adopted by the invention to achieve the preset purpose are further described below by combining the accompanying drawings and the preferred embodiments of the invention.

According to the technical solutions disclosed in the above summary, the metal mask of the present invention can be implemented in at least the following various embodiments. As shown in fig. 1 to 4, in the preferred embodiment disclosed in the drawings, it can be seen that the metal mask includes a

mask plate body

10A, 10B, 10C formed of a metal material and one or two

etching structures

20A, 20B, 20C formed in the

mask plate body

10A, 10B, 10C.

Two opposite sides of the

mask plate

10A, 10B, 10C are a first side 101 and a second side 102, respectively, as shown in fig. 1 and 2, when the etching structure 20A is one, the etching structure 20A is formed on a single side of the mask plate 10A, that is, the etching structure 20A is formed on either one of the first side 101 and the second side 102 of the mask plate 10A, and the other side of the mask plate 10A opposite to the etching structure is a plate base 13A; as shown in fig. 3 and 4, when there are two

etching structures

20B and 20C, two

etching structures

20B and 20C are formed on two opposite sides of the

mask plate

10B and 10C, that is, two

etching structures

20B and 20C are respectively formed on the first side 101 and the second side 102 of the

mask plate

10B and 10C, and the

mask plate

10B and 10C has a

plate base

13B and 13C between the two

etching structures

20B and 20C.

As shown in fig. 1 to 4, each of the

mask plates

10A, 10B, and 10C defines a contact area 11 and a peripheral area 12 located at the periphery of the contact area 11, the contact area 11 is used for contacting a substrate to be coated (such as a glass substrate or a flexible substrate), the peripheral area 12 provides a fixed portion, the contact area 11 is provided with a plurality of coating pattern holes 111 and a shielding portion 112 located between adjacent coating pattern holes 111, and each of the coating pattern holes 111 penetrates through a through hole of the

mask plate

10A, 10B, and 10C.

As shown in fig. 1 to 4, the

etching structures

20A, 20B, and 20C are formed at least in the shielding portion 112 of the contact region 11 by etching means, and the

etching structures

20A, 20B, and 20C are further formed in the peripheral region 12 according to the product requirement of the metal mask, wherein the

etching structures

20A, 20B, and 20C do not penetrate through the shielding portion 112 of the contact region 11, and the area of the

etching structures

20A, 20B, and 20C within the shielding portion 112 is greater than or equal to 20% of the total area of the contact region 11 (i.e. the total area of the shielding portion 112 and the area of the plurality of plating pattern holes 111), and is preferably less than or equal to 85% of the total area of the contact region 11.

As shown in fig. 1-3, the

etched feature

20A, 20B, 20C includes at least one patterned etched trench 21A, 21B, or the

etched feature

20A, 20B may further include at least one patterned

rib

22A, 22B. When the

etching structure

20A, 20B includes the patterned etching grooves 21A, 21B and the patterned

ribs

22A, 22B, the groove width W1 of the patterned etching grooves 21A, 21B is preferably greater than or equal to the rib width W2 of the patterned

ribs

22A, 22B.

In the first preferred embodiment of the metal mask shown in fig. 1 and 2, the etching structure 20A is formed on a single side of the mask plate body 10A, and the other side of the mask plate body 10A relative to the etching structure 20A is a plate body base 13A, i.e. when the etching structure 20A is formed on the first side 101 of the mask plate body 10A, the second side 102 of the mask plate body 10A has a plate body base 13A; conversely, when the etched structure 20A is formed on the second side 102 of the mask plate 10A, the first side 101 of the mask plate 10A has a plate base 13A. The etching depth H of the etched structure 20A is preferably less than or equal to one-half of the plate thickness D of the

mask plate

10A, 10B, 10C, i.e. the thickness of the plate base 13 is greater than or equal to the etching depth H of the

etched structure

20A, 20B, 20C.

As shown in fig. 1 and fig. 2, in the first preferred embodiment of the metal mask, the etching structure 20A includes a plurality of patterned etching grooves 21A and a plurality of patterned ribs 22A, a groove width W1 of the patterned etching grooves 21A is greater than or equal to a rib width W2 of the patterned ribs 22A, and an etching depth H of the patterned etching grooves 21A is less than or equal to the thickness of the board body base 13A. The mechanical strength of the mask plate 10A can be effectively improved by providing the etching structure 20A on one side thereof with a patterned rib 22A connecting the plate base 13A.

The patterned etching bath 21A of the etching structure 20A includes a plurality of trench units 211A, and the trench units 211A can be connected together, so that the pattern of the patterned etching bath 21A of the etching structure 20A is a continuous pattern, which is helpful for rapidly removing the vacuum suction force when the metal mask is used for releasing the vacuum. Alternatively, the plurality of trench units 211A may not be connected to each other, so that the pattern of the patterned etching grooves 21A of the etching structure 20A is discontinuous, and the plurality of patterned ribs are connected to form a continuous pattern and can be connected to the peripheral region 12 of the mask plate 10A, so that the tension applied to the peripheral region 12 of the mask plate 10A can be transmitted to the hole edge of each plating pattern hole 111 of the contact region 11 through the plate base and the patterned ribs constituting the continuous pattern, thereby generating a uniform strain effect.

As shown in fig. 3, the first side 101 and the second side 102 of the mask plate 10B each have one of the etching structures 20B, the mask plate 10B has a plate base 13B between the two etching structures 20B, and the two etching structures 20B may be symmetrical or asymmetrical structures, and it is preferable that the two etching structures 20B are symmetrical structures in the present preferred embodiment. The sum of the etching depths H of the two etching structures 20B is preferably equal to or less than one-half of the plate thickness D of the mask plate 10B, that is, the thickness of the plate base 13B is equal to or greater than the sum of the etching depths H of the two etching structures 20B.

In the second preferred embodiment of the metal mask as shown in fig. 3, each of the etching structures 20B includes a plurality of patterned etching grooves 21B and a plurality of patterned ribs 22B, a groove width W1 of the patterned etching grooves 21B is greater than or equal to a rib width W2 of the patterned ribs 22B, and a total of etching depths H1 and H2 of the patterned etching grooves 21B of the two etching structures 20B is less than or equal to the thickness of the board base 13. The mechanical strength of the mask plate 10B can be effectively enhanced by the etching structures 20B on the first side 101 and the second side 102 of the mask plate having the patterned ribs 22B connecting the plate base 13B.

The patterned etching groove 21B of the etching structure 20B comprises a plurality of trench units 211B, and the trench units 211B can be connected into a whole, so that the pattern of the patterned etching groove 21B of the etching structure 20B is a continuous pattern, which is helpful for rapidly removing the vacuum suction force when the metal mask is used for releasing the vacuum. Alternatively, the plurality of groove units 211B may not be connected to each other, so that the pattern of the patterned etching grooves 21B of the etching structure 20B is discontinuous, and the plurality of patterned ribs 22B are connected to each other to form a continuous pattern, and can be connected to the peripheral region 12 of the mask plate 10B, so that the tension applied to the peripheral region 12 of the mask plate 10B can be transmitted to the edge of each plating pattern hole 111 of the contact region 11 via the plate base 13 and the patterned ribs 22B constituting the continuous pattern, thereby generating a uniform strain effect.

As shown in fig. 4, the first side 101 and the second side 102 of the mask plate 10C each have one etching structure 20C, the mask plate 10C has a plate base 13C between two etching structures 20C, and the two etching structures 20C may be symmetrical or asymmetrical structures, and the present preferred embodiment discloses that the two etching structures 20C are symmetrical structures. The sum of the etching depths H of the two etching structures 20C is equal to or less than half of the plate thickness D of the mask plate 10C, that is, the thickness of the plate base 13C is equal to or greater than the sum of the etching depths H of the two etching structures 20C.

Each of the etching structures 20C has a patterned etching trench 21C, and the structure of the single patterned etching trench 21C is helpful for rapidly releasing the vacuum suction force when the metal mask is evacuated. In addition, by using the structure of two etching structures 20C, and the substrate base 13C is located between the two etching structures 20C, the etching depth of the patterned etching grooves 21C on both sides is shortened, thereby reducing the difficulty of the manufacturing method, and the tension applied to the peripheral region 12 of the mask substrate 10C can be directly transmitted to the hole edge of each plating pattern hole 111 of the contact region 11 through the substrate base 13C, so as to generate a uniform strain effect.

The metal mask of the present invention can be applied to a method for forming a film on a surface of a substrate such as a glass substrate or a flexible substrate by combining a Physical Vapor Deposition (PVD) or a Chemical Vapor Deposition (CVD) method in a manufacturing process of an Organic Light Emitting Diode (OLED) display, wherein the metal mask is fixed by a fixing mechanism at a peripheral region thereof as shown in fig. 5, and a contact region 11 of a mask plate 10B is brought into contact with a predetermined film-forming surface of a substrate 30 to be film-formed (such as a glass substrate or a flexible substrate), and then a portion of a film-forming material dissociated by the Physical Vapor Deposition (PVD) or the Chemical Vapor Deposition (CVD) method is deposited at a specific position on the surface of the substrate 30 through a film-forming pattern hole 111 in the metal mask to form a film.

It can be seen from the above description that, in the invention, through the structure of the metal mask, the metal mask maintains the effect of improving the adhesion of the film-coating manufacturing method by forming the patterned etching grooves on one side or both sides of the mask plate, and the metal mask further forms the patterned ribs in the patterned etching grooves of the etching structures on one side or both sides of the mask plate, or uses the etching structures on both sides of the mask plate to position the base of the plate at the middle position of the thickness of the mask plate, so that the mechanical strength of the metal mask can be effectively improved without changing the thickness of the mask plate.

Although the present invention has been described with reference to the preferred embodiments, it should be understood that various changes, substitutions and alterations can be made herein without departing from the spirit and scope of the invention as defined by the appended claims.

Claims

1. A metal shade comprises a shade plate body made of metal materials, wherein the shade plate body is defined with a contact area and a peripheral area positioned at the periphery of the contact area, and a plurality of film coating pattern holes and shade parts positioned between the adjacent film coating pattern holes are arranged in the contact area; the method is characterized in that:

2. The metal mask of claim 1, wherein the total area of the etching features within the shielding portion is greater than or equal to 20% and less than or equal to 85% of the total area of the contact region.

3. The metal mask according to claim 1 or 2, wherein the groove width of the patterned etching grooves is greater than or equal to the rib width of the patterned ribs, and the patterned etching grooves of the etched structures comprise a plurality of groove units which are integrally connected, so that the patterned etching grooves of the etched structures form a continuous pattern.

4. The metal mask according to claim 1 or 2, wherein the groove width of the patterned etch trench is greater than or equal to the rib width of the patterned rib, the patterned etch trench of the etched structure comprises a plurality of groove units, the groove units are not completely connected, the pattern of the patterned etch trench of the etched structure is a discontinuous pattern, the patterned rib in the patterned etch trench forms a continuous pattern, and the patterned rib connects the peripheral regions of the mask plate body.

5. A metal shade comprises a shade plate body made of metal materials, wherein the shade plate body is defined with a contact area and a peripheral area positioned at the periphery of the contact area, and a plurality of film coating pattern holes and shade parts positioned between the adjacent film coating pattern holes are arranged in the contact area; the method is characterized in that:

6. The metal mask of claim 5, wherein the total area of the etching structures within the shielding portion is greater than or equal to 20% and less than or equal to 85% of the total area of the contact region, and the groove width of the patterned etching grooves is greater than or equal to the rib width of the patterned ribs.

7. The metal mask according to claim 5 or 6, wherein the patterned etching trenches of the etching structure comprise a plurality of trench units, and the trench units are integrally connected, so that the patterned etching trenches of the etching structure form a continuous pattern.

8. The metal mask according to claim 5 or 6, wherein the patterned etch trenches of the etched structures comprise a plurality of trench cells, the plurality of trench cells are not completely connected, the pattern of the patterned etch trenches of the etched structures is a discontinuous pattern, the patterned ribs in the patterned etch trenches form a continuous pattern and connect the peripheral regions of the mask plate body.

9. A metal shade comprises a shade plate body made of metal materials, wherein the shade plate body is defined with a contact area and a peripheral area positioned at the periphery of the contact area, and a plurality of film coating pattern holes and shade parts positioned between the adjacent film coating pattern holes are arranged in the contact area; the method is characterized in that:

10. The metal mask of claim 9, wherein the total area of the etching features within the shielding portion is greater than or equal to 20% and less than or equal to 85% of the total area of the contact region.