CN112164702A - Matrix type radiographic imaging plate preparation method - Google Patents
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- CN112164702A CN112164702A CN202010907766.3A CN202010907766A CN112164702A CN 112164702 A CN112164702 A CN 112164702A CN 202010907766 A CN202010907766 A CN 202010907766A CN 112164702 A CN112164702 A CN 112164702A
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- 238000003384 imaging method Methods 0.000 title claims abstract description 82
- 239000011159 matrix material Substances 0.000 title claims abstract description 34
- 238000002360 preparation method Methods 0.000 title abstract description 14
- 239000000463 material Substances 0.000 claims abstract description 47
- 238000001514 detection method Methods 0.000 claims abstract description 33
- 238000000034 method Methods 0.000 claims abstract description 30
- 238000007731 hot pressing Methods 0.000 claims abstract description 22
- 239000002250 absorbent Substances 0.000 claims abstract description 20
- 230000002745 absorbent Effects 0.000 claims abstract description 20
- 239000011241 protective layer Substances 0.000 claims abstract description 17
- 239000011230 binding agent Substances 0.000 claims abstract description 16
- 239000010410 layer Substances 0.000 claims abstract description 14
- 239000011347 resin Substances 0.000 claims abstract description 12
- 229920005989 resin Polymers 0.000 claims abstract description 12
- 239000000203 mixture Substances 0.000 claims abstract description 8
- 238000007650 screen-printing Methods 0.000 claims abstract description 8
- 239000011248 coating agent Substances 0.000 claims abstract description 5
- 238000000576 coating method Methods 0.000 claims abstract description 5
- 238000005507 spraying Methods 0.000 claims abstract description 5
- 238000002156 mixing Methods 0.000 claims description 15
- 239000004005 microsphere Substances 0.000 claims description 12
- 238000009826 distribution Methods 0.000 claims description 11
- 239000002245 particle Substances 0.000 claims description 11
- 238000007689 inspection Methods 0.000 claims description 7
- 239000008187 granular material Substances 0.000 claims description 6
- 229910001626 barium chloride Inorganic materials 0.000 claims description 4
- 229910005693 GdF3 Inorganic materials 0.000 claims description 3
- 239000004677 Nylon Substances 0.000 claims description 3
- 239000002033 PVDF binder Substances 0.000 claims description 3
- 239000004433 Thermoplastic polyurethane Substances 0.000 claims description 3
- 238000000498 ball milling Methods 0.000 claims description 3
- 229920002678 cellulose Polymers 0.000 claims description 3
- 239000001913 cellulose Substances 0.000 claims description 3
- 238000004140 cleaning Methods 0.000 claims description 3
- 239000003822 epoxy resin Substances 0.000 claims description 3
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Inorganic materials [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 claims description 3
- 229920001778 nylon Polymers 0.000 claims description 3
- 238000005498 polishing Methods 0.000 claims description 3
- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims description 3
- 229920000767 polyaniline Polymers 0.000 claims description 3
- 229920000647 polyepoxide Polymers 0.000 claims description 3
- 239000004926 polymethyl methacrylate Substances 0.000 claims description 3
- 229920002981 polyvinylidene fluoride Polymers 0.000 claims description 3
- 239000000758 substrate Substances 0.000 claims description 3
- 229920002803 thermoplastic polyurethane Polymers 0.000 claims description 3
- 238000002059 diagnostic imaging Methods 0.000 claims description 2
- 229920002401 polyacrylamide Polymers 0.000 claims description 2
- 238000007790 scraping Methods 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims 7
- 239000002270 dispersing agent Substances 0.000 claims 3
- 239000002131 composite material Substances 0.000 claims 1
- 239000000243 solution Substances 0.000 description 21
- 238000006243 chemical reaction Methods 0.000 description 15
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 9
- 229910017604 nitric acid Inorganic materials 0.000 description 9
- 150000002500 ions Chemical class 0.000 description 8
- 238000001035 drying Methods 0.000 description 5
- 229920000139 polyethylene terephthalate Polymers 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 238000005406 washing Methods 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 4
- 239000002243 precursor Substances 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 239000008367 deionised water Substances 0.000 description 3
- 229910021641 deionized water Inorganic materials 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000004806 packaging method and process Methods 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- 238000005303 weighing Methods 0.000 description 2
- 229920002799 BoPET Polymers 0.000 description 1
- 229910002637 Pr6O11 Inorganic materials 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910000329 aluminium sulfate Inorganic materials 0.000 description 1
- LDDQLRUQCUTJBB-UHFFFAOYSA-N ammonium fluoride Chemical compound [NH4+].[F-] LDDQLRUQCUTJBB-UHFFFAOYSA-N 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 1
- 238000003745 diagnosis Methods 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- NLQFUUYNQFMIJW-UHFFFAOYSA-N dysprosium(III) oxide Inorganic materials O=[Dy]O[Dy]=O NLQFUUYNQFMIJW-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005401 electroluminescence Methods 0.000 description 1
- RSEIMSPAXMNYFJ-UHFFFAOYSA-N europium(III) oxide Inorganic materials O=[Eu]O[Eu]=O RSEIMSPAXMNYFJ-UHFFFAOYSA-N 0.000 description 1
- 229920002313 fluoropolymer Polymers 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 231100000252 nontoxic Toxicity 0.000 description 1
- 230000003000 nontoxic effect Effects 0.000 description 1
- 238000013086 organic photovoltaic Methods 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14665—Imagers using a photoconductor layer
- H01L27/14676—X-ray, gamma-ray or corpuscular radiation imagers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
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- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
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Abstract
The invention relates to a matrix type radiographic imaging plate preparation method; the nano-radiation detector comprises a nano-radiation detection material, a reflecting layer, an absorbent, a resin binder and a protective layer; the method is characterized in that a binder, an absorbent and a ray detection material are banburied and granulated according to a proportion, then the granulated mixture is placed in a mold, a reflective film is added at the bottom of the mold, the material is prepared into a plate by hot pressing in a hot pressing mode, then a protective layer is prepared on the surface by screen printing, spraying and blade coating modes, simultaneously a matrix array is prepared on the surface of an imaging plate to obtain a required ray imaging plate, and the matrix imaging plate is matched with a TFT imaging device for use to realize ray imaging.
Description
Technical Field
The present invention belongs to the technical field of radiographic imaging in medical treatment, industry and security inspection.
Background
The existing X-ray imaging is widely used for real-time images of medical diagnosis, large-scale security inspection imaging and the like, and the structure of the existing imaging sensor technical product mainly comprises the following components: the device comprises a ray fluorescent plate, an inorganic semiconductor light sensing element, a control supporting circuit and the like, wherein the semiconductor light sensing element is mainly amorphous silicon, amorphous selenium, a CMOS, a CCD and the like, and solid semiconductor devices of the semiconductor light sensing element form a complex matrix photosensitive pixel panel and convert a fluorescent image into an electric signal so as to form digital image generation and storage. The defects of the prior art are that the array formed by the inorganic semiconductor device has a complex process structure, cannot be bent, is limited in imaging area, large in pixel, high in cost, large in device volume and the like. Chinese patent: 201016215901, 2012103939402, 2006100644606 and 2014103057586, and U.S. Pat. Nos. 9735194 and 5093576 disclose the preparation principle and process of the prior art.
The invention relates to a matrix type radiographic imaging plate preparation method; the nano-radiation detector comprises a nano-radiation detection material, a reflecting layer, an absorbent, a resin binder and a protective layer; the method is characterized in that a binder, an absorbent and a ray detection material are banburied and granulated according to a proportion, then the granulated mixture is placed in a mold, a reflective film is added at the bottom of the mold, the material is prepared into a plate by hot pressing in a hot pressing mode, then a protective layer is prepared on the surface by screen printing, spraying and blade coating modes, simultaneously a matrix array is prepared on the surface of an imaging plate to obtain a required ray imaging plate, and the matrix imaging plate is matched with a TFT imaging device for use to realize ray imaging.
The invention can be used in the technical field of X-ray imaging in medical treatment, industry and security inspection, and can also be used for portable three-dimensional X-ray imaging, neutron imaging, proton imaging and the like.
Disclosure of Invention
The invention relates to a matrix type radiographic imaging plate preparation method; the nano-radiation detector comprises a nano-radiation detection material, a reflecting layer, an absorbent, a resin binder and a protective layer; the method is characterized in that a binder, an absorbent and a ray detection material are banburied and granulated according to a proportion, then the granulated mixture is placed in a mold, a reflective film is added at the bottom of the mold, the material is prepared into a plate by hot pressing in a hot pressing mode, then a protective layer is prepared on the surface by screen printing, spraying and blade coating modes, simultaneously a matrix array is prepared on the surface of an imaging plate to obtain a required ray imaging plate, and the matrix imaging plate is matched with a TFT imaging device for use to realize ray imaging.
The nano-ray detection material is ZnS; ag. BaFCl; eu, BaCl2GOS; tb and GOS; pr, one or more of; the particle size distribution range is 100-300 nm. The reflecting layer in the invention is a backlight reflecting film consisting of a PET substrate and a diffusant, wherein the diffusant is one or more of PMMA microspheres, PC microspheres, PS microspheres and PET microspheres, and the particle size distribution of the diffusant is 100-300 nm; the back of the imaging plate is arranged, so that the light flash is reduced, and the imaging efficiency is improved.
The absorbent of the invention is6LiF、6LiCl、6Li2CO3、152Gd2O3、152GdF3One or more of; the ray detection material is added with the absorbent, so that the ray can be absorbed and converted, and the safety is improved; the resin binder is one or more of epoxy resin, polyaniline, nylon, cellulose, TPU and PVDF; the protective layer is one or more of UV ink, polyacrylamide ink and fluorosilicone resin ink, and plays a role in preventing moisture and scraping on the surface of the imaging plate.
A method for preparing a matrix type radiographic imaging plate; the method is characterized in that an absorbent is added into a nano-ray detection material according to the weight ratio of 10-30%, then ball milling and mixing are carried out for 2-8 hours, a resin binder is added into the nano-ray detection material according to the weight ratio of 3-5% after uniform mixing, the mixture is placed into an internal mixer for mixing, and the material is extruded and cut into granules in a double-screw granulator after uniform mixing to prepare master batches with the diameter of 1-3 mm. Placing the granulated material into a hot-pressing mould, adding a reflective layer at the bottom of the mould, wherein the hot-pressing temperature is 150-400 ℃, the pressure is 30-100MPa, the hot-pressing time is 10-30min, preparing a protective layer on the surface by screen printing after the hot-pressing is finished, and then preparing a matrix array on the surface of an imaging plate by surface cleaning, polishing and carving processes to obtain the required radiographic imaging plate, wherein the thickness of the imaging plate is adjustable within the range of 0.1-5 mm; the matrix imaging plate and the TFT imaging device are matched for use, so that radiographic imaging can be realized, and the method has a good application prospect in the fields of medical imaging, customs security inspection and nuclear industry detection.
Drawings
FIG. 1 is a cross-sectional view of a matrix radiographic panel
FIG. 2 is a plan view of a matrix radiographic panel
The structure in the figure is as follows: the light-reflecting layer 1, the ray imaging layer 2, the protective layer 3, the ray detection of 4 nanometers, the absorbent 5, the ray matrix array 6 and the TFT matrix 7.
Detailed Description
The invention relates to a matrix type radiographic imaging plate preparation method; the nano-radiation detector comprises a nano-radiation detection material, a reflecting layer, an absorbent, a resin binder and a protective layer; the method is characterized in that a binder, an absorbent and a ray detection material are banburied and granulated according to a proportion, then the granulated mixture is placed in a mold, a reflective film is added at the bottom of the mold, the material is prepared into a plate by hot pressing in a hot pressing mode, then a protective layer is prepared on the surface by screen printing, spraying and blade coating modes, simultaneously a matrix array is prepared on the surface of an imaging plate to obtain a required ray imaging plate, and the matrix imaging plate is matched with a TFT imaging device for use to realize ray imaging.
The nano-ray detection material is ZnS; ag. BaFCl; eu, BaCl2GOS; tb and GOS; pr, one or more of; the particle size distribution range is 100-300 nm.
In the invention, the material GOS is detected by nano rays; the synthesis process of Tb comprises the following steps: gd is added2O3、Tb2O3、Dy2O3、Sr2O3According to the weight ratio of 1: 0.05:0.001: weighing 0.0005, placing the weighed materials in a beaker, adding nitric acid to dissolve the nitric acid, heating and volatilizing redundant nitric acid on an electric furnace, adding deionized water with the weight being 500 times of the total weight to dilute the nitric acid, cooling the nitric acid, adding 100ml of EDTA solution with the mass fraction being 10% -15%, placing the EDTA solution in a microwave reaction kettle to react, centrifuging, washing and drying the EDTA solution after the reaction is finished, then adding high-purity sulfur with the weight ratio being 3% -5%, placing the EDTA solution in an atmosphere protection furnace to react, introducing nitrogen into the furnace to protect the furnace, and setting the furnace temperature at 200 ℃ and 500 ℃; the reaction time is 1-3 hours, the nano-ray detection material is obtained after the reaction is finished and is washed and dried, the particle size distribution is 100-200nm, and the emission wavelength is 520nm。
The nano-ray detection material ZnS is adopted in the invention; the preparation method of Ag is as follows: mixing Ag (NO)3) Dissolve to 5x10-4g/ml solution, thallium metal dissolved by nitric acid to 5x10-5g/ml solution of Al2（SO4）3Is prepared into 2x10-4g/ml solution, then mixing the components in a weight ratio of 1: 0.05: 0.005: 0.01 taking ZnS, an Ag ion solution, a Tl ion solution and an Al ion solution in sequence, placing the ZnS, the Ag ion solution, the Tl ion solution and the Al ion solution in a watch glass, adding deionized water, uniformly stirring, drying to obtain a precursor, placing the dried precursor in a tube furnace, introducing circulating argon into the furnace, setting the furnace temperature at 800 ℃, reacting for 30-60min, carrying out surface silicification treatment on the material obtained after washing and drying after the reaction is finished to obtain the nano-ray detection material with excellent moisture resistance, wherein the particle size distribution is 150 ion-doped 300nm, and the emission wavelength is 430 ion-doped 480 nm.
In the invention, the material GOS is detected by nano rays; the Pr preparation method comprises the following steps: gd is added2O3、Pr6O11、CeO2According to the weight ratio of 1: 0.025:0.0001, weighing, placing in a beaker, adding nitric acid, dissolving, heating and volatilizing redundant nitric acid on an electric furnace, adding deionized water 300 times of the total weight for dilution, cooling, adding 80ml of oxalic acid solution with the mass fraction of 15% -30%, placing in a microwave reaction kettle for reaction, centrifuging, washing, drying after the reaction is finished, adding high-purity sulfur with the weight ratio of 3% -5%, uniformly grinding, placing in an atmosphere protection furnace for reaction, introducing nitrogen gas for protection in the furnace, and setting the furnace temperature at 300-600 ℃; the reaction time is 1-2 hours, the nano-ray detection material is obtained after the reaction is finished and is washed and dried, the particle size distribution is 200-300nm, and the emission wavelength is 530 nm.
In the invention, nano-ray detection material BaFCl; the Eu preparation method comprises the following steps: eu is mixed2O3Dissolving with nitric acid to obtain 0.5mol/L solution, adding NH4F is dissolved to prepare 5x10-2g/ml solution of BaCl2Dissolving to prepare a solution of 0.1g/ml, and then mixing the solution according to a volume ratio of 1: 1: 0.01 taking BaCl in sequence2Solution, NH4Solution F, Eu2O3Placing the solution in a microwave reaction kettle, setting the temperature at 50-70 ℃, and reactingStirring for 1-3 hours for reaction, and after the reaction is finished, centrifugally washing to obtain a precursor material; placing the precursor in a gas-anger reaction furnace, setting the temperature at 200-2-1N2And (3) reacting the mixed reducing gas, washing after the reaction is finished, and drying to obtain the nano-ray detection material with the particle size distribution of 100-150nm and the emission wavelength of 430 nm.
The reflecting layer in the invention is a backlight reflecting film consisting of a PET substrate and a diffusant, wherein the diffusant is one or more of PMMA microspheres, PC microspheres, PS microspheres and PET microspheres, and the particle size distribution of the diffusant is 100-300 nm; the particle size of the diffusant is selected to be in the same distribution range as that of the nano-ray detection material, so that the light flash can be effectively reduced, and the imaging efficiency is improved.
The absorbent of the invention is6LiF、6LiCl、6Li2CO3、152Gd2O3、152GdF3One or more of; the ray can be absorbed and converted by adding the absorbent into the nano ray detection material, so that the safety is improved; the resin binder is one or more of epoxy resin, polyaniline, nylon, cellulose, TPU and PVDF; the protective layer in the invention is made of film materials for preventing water molecules from permeating, the materials are one or a combination of more of a fluoroplastic film, a PET film plated with silicon oxide and a metal aluminum foil film, and the materials can effectively prevent oxygen and water molecules from permeating, thereby avoiding the defects of organic electroluminescence and organic photovoltaic cells. The packaging is mainly aimed at an organic matrix photoelectric sensor film and a TFT film layer, the service life of the packaged organic photosensitive material is prolonged by 5-10 times, the use effect in a high-temperature humid environment is more obvious, and the traditional glass packaging can cause the organic photosensitive material not to be bent.
A method for preparing a matrix type radiographic imaging plate; the method is characterized in that an absorbent is added into a nano-ray detection material according to the weight ratio of 10-30%, then ball milling and mixing are carried out for 2-8 hours, a resin binder is added into the nano-ray detection material according to the weight ratio of 3-5% after uniform mixing, the mixture is placed into an internal mixer for mixing, and the material is extruded and cut into granules in a double-screw granulator after uniform mixing to prepare master batches with the diameter of 1-3 mm. Placing the granulated material into a hot-pressing mould, adding a reflective layer at the bottom of the mould, wherein the hot-pressing temperature is 150-400 ℃, the pressure is 30-100MPa, the hot-pressing time is 10-30min, preparing a protective layer on the surface by screen printing after the hot-pressing is finished, and then preparing a matrix array on the surface of an imaging plate by surface cleaning, polishing and carving processes to obtain the required radiographic imaging plate, wherein the thickness of the imaging plate is adjustable within the range of 0.1-5 mm; the matrix array imaging plate is combined with the TFT imaging module, and the color imaging of a ray device can be realized by utilizing a photoelectric conversion and image processing system. The invention can be used in the technical field of X-ray imaging in medical treatment, industry and security inspection, and can also be used for portable three-dimensional X-ray imaging, neutron imaging, proton imaging and the like, or used for detecting high-energy ions.
The invention has the advantages that
1) The matrix type radiographic imaging plate preparation method is simple in synthesis process, easy to control in process and capable of reducing cost.
2) The matrix type radiographic imaging plate preparation method is non-toxic and harmless, low in cost, long in service life and high in efficiency.
3) The matrix type radiographic imaging plate preparation method has the advantages of being simple in structure, low in cost, capable of forming flexible devices, capable of forming transparent imaging, convenient to carry, capable of achieving one-time multi-angle imaging, suitable for large-area preparation of X-rays and timely display, and capable of being used for CT and PET human body high-definition detection images. The invention can be used in the technical field of X-ray imaging in medical treatment, industry and security inspection, and can also be used for portable three-dimensional X-ray imaging, neutron imaging, proton imaging and the like, or used for detecting high-energy ions.
While the foregoing is directed to the preferred embodiment of the present invention, it will be apparent to those skilled in the art that various changes and modifications can be made herein without departing from the spirit and scope of the invention.
Claims (8)
1. A method for preparing a matrix type radiographic imaging plate; the nano-radiation detector comprises a nano-radiation detection material, a reflecting layer, an absorbent, a resin binder and a protective layer; the method is characterized in that a binder, an absorbent and a ray detection material are banburied and granulated according to a proportion, then the granulated mixture is placed in a mold, a reflective film is added at the bottom of the mold, the material is prepared into a plate by hot pressing in a hot pressing mode, then a protective layer is prepared on the surface by screen printing, spraying and blade coating modes, simultaneously a matrix array is prepared on the surface of an imaging plate to obtain a required ray imaging plate, and the matrix imaging plate is matched with a TFT imaging device for use to realize ray imaging.
2. The method for manufacturing a matrix-type radiographic panel according to claim 1; the method is characterized in that the nano ray detection material is ZnS; ag. BaFCl; eu, BaCl2GOS; tb and GOS; pr, one or more of; the particle size distribution range is 100-300 nm.
3. The method for manufacturing a matrix-type radiographic panel according to claim 1; the light reflecting layer is a backlight reflecting film consisting of a PET substrate and a dispersing agent, wherein the dispersing agent is one or more of PMMA microspheres, PC microspheres, PS microspheres and PET microspheres, and the particle size distribution of the dispersing agent is 100-300 nm; the back of the imaging plate is arranged, so that the light flash is reduced, and the imaging efficiency is improved.
4. The method for manufacturing a matrix-type radiographic panel according to claim 1; characterized in that the absorbent is6LiF、6LiCl、6Li2CO3、152Gd2O3、152GdF3One or more of; the ray detection material can absorb and convert the ray by adding the absorbent, thereby improving the safety.
5. The method for manufacturing a matrix-type radiographic panel according to claim 1; the composite material is characterized in that the resin binder is one or more of epoxy resin, polyaniline, nylon, cellulose, TPU and PVDF.
6. The method for manufacturing a matrix-type radiographic panel according to claim 1; the protective layer is one or more of UV ink, polyacrylamide ink and fluorosilicone ink, and plays a role in preventing moisture and scraping on the surface of the imaging plate.
7. The method for manufacturing a matrix-type radiographic panel according to claim 1; the method is characterized in that an absorbent is added into a nano-ray detection material according to the weight ratio of 10-30%, then ball milling and mixing are carried out for 2-8 hours, a resin binder is added into the nano-ray detection material according to the weight ratio of 3-5% after uniform mixing, the mixture is placed into an internal mixer for mixing, and the material is extruded and cut into granules in a double-screw granulator after uniform mixing to prepare master batches with the diameter of 1-3 mm.
8. The method for manufacturing a matrix-type radiographic panel according to claim 1; the method is characterized in that a granulated material is placed into a hot-pressing die, a reflective layer is added at the bottom of the die, the hot-pressing temperature is 150-400 ℃, the pressure is 30-100MPa, the hot-pressing time is 10-30min, a protective layer is prepared on the surface through screen printing after the hot-pressing is finished, then a matrix array is prepared on the surface of an imaging plate through surface cleaning, polishing and carving processes, and the required radiographic imaging plate is obtained, wherein the thickness of the imaging plate is adjustable within the range of 0.1-5 mm; the matrix imaging plate and the TFT imaging device are matched for use, so that radiographic imaging can be realized, and the method has a good application prospect in the fields of medical imaging, customs security inspection and nuclear industry detection.
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| CN202010907766.3A CN112164702B (en) | 2020-09-02 | 2020-09-02 | Matrix type radiographic imaging plate preparation method |
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| CN107077902A (en) * | 2014-12-11 | 2017-08-18 | 西门子保健有限责任公司 | Perovskite particle with the coating being made up of semi-conducting material |
| CN109671737A (en) * | 2018-12-24 | 2019-04-23 | 上海洞舟实业有限公司 | A kind of organic X-ray imaging plate |
| US20190161361A1 (en) * | 2016-07-26 | 2019-05-30 | Sumitomo Metal Mining Co., Ltd. | Near-infrared absorbing fine particle dispersion liquid, near-infrared absorbing fine particle dispersion body, near-infrared absorbing transparent substrate, near-infrared absorbing laminated transparent substrate |
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| US6340436B1 (en) * | 1997-07-08 | 2002-01-22 | Hitachi Medical Corporation | Phosphor, and radiation detector and X-ray CT unit each equipped therewith |
| US20090302226A1 (en) * | 2005-02-08 | 2009-12-10 | Yissum Research Development Company Of The Hebrew University Of Jerusalem | Solid-state neutron and alpha particles detector and methods for manufacturing and use thereof |
| CN107077902A (en) * | 2014-12-11 | 2017-08-18 | 西门子保健有限责任公司 | Perovskite particle with the coating being made up of semi-conducting material |
| US20190161361A1 (en) * | 2016-07-26 | 2019-05-30 | Sumitomo Metal Mining Co., Ltd. | Near-infrared absorbing fine particle dispersion liquid, near-infrared absorbing fine particle dispersion body, near-infrared absorbing transparent substrate, near-infrared absorbing laminated transparent substrate |
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